JPH0385632U - - Google Patents
Info
- Publication number
- JPH0385632U JPH0385632U JP14699689U JP14699689U JPH0385632U JP H0385632 U JPH0385632 U JP H0385632U JP 14699689 U JP14699689 U JP 14699689U JP 14699689 U JP14699689 U JP 14699689U JP H0385632 U JPH0385632 U JP H0385632U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- outline
- input
- data
- lithography device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14699689U JPH0385632U (enExample) | 1989-12-22 | 1989-12-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14699689U JPH0385632U (enExample) | 1989-12-22 | 1989-12-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0385632U true JPH0385632U (enExample) | 1991-08-29 |
Family
ID=31693530
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14699689U Pending JPH0385632U (enExample) | 1989-12-22 | 1989-12-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0385632U (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003059795A (ja) * | 2001-08-08 | 2003-02-28 | Sony Corp | 描画用パターンの分割処理方法、描画用パターンの分割処理装置、描画方法、マスク、マスクの作成方法、半導体装置、半導体装置の製造方法、描画用パターンの分割処理プログラム及びこのプログラムを記録したコンピュータ読みとり可能な記録媒体 |
| JP2014165334A (ja) * | 2013-02-25 | 2014-09-08 | National Institute Of Advanced Industrial & Technology | 電子ビーム露光方法 |
-
1989
- 1989-12-22 JP JP14699689U patent/JPH0385632U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003059795A (ja) * | 2001-08-08 | 2003-02-28 | Sony Corp | 描画用パターンの分割処理方法、描画用パターンの分割処理装置、描画方法、マスク、マスクの作成方法、半導体装置、半導体装置の製造方法、描画用パターンの分割処理プログラム及びこのプログラムを記録したコンピュータ読みとり可能な記録媒体 |
| JP2014165334A (ja) * | 2013-02-25 | 2014-09-08 | National Institute Of Advanced Industrial & Technology | 電子ビーム露光方法 |