JPH0385466U - - Google Patents

Info

Publication number
JPH0385466U
JPH0385466U JP14643489U JP14643489U JPH0385466U JP H0385466 U JPH0385466 U JP H0385466U JP 14643489 U JP14643489 U JP 14643489U JP 14643489 U JP14643489 U JP 14643489U JP H0385466 U JPH0385466 U JP H0385466U
Authority
JP
Japan
Prior art keywords
vacuum chamber
opening
thin film
chamber
processing chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14643489U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14643489U priority Critical patent/JPH0385466U/ja
Publication of JPH0385466U publication Critical patent/JPH0385466U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP14643489U 1989-12-21 1989-12-21 Pending JPH0385466U (pt)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14643489U JPH0385466U (pt) 1989-12-21 1989-12-21

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14643489U JPH0385466U (pt) 1989-12-21 1989-12-21

Publications (1)

Publication Number Publication Date
JPH0385466U true JPH0385466U (pt) 1991-08-29

Family

ID=31693017

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14643489U Pending JPH0385466U (pt) 1989-12-21 1989-12-21

Country Status (1)

Country Link
JP (1) JPH0385466U (pt)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010526446A (ja) * 2007-05-09 2010-07-29 ライボルト オプティクス ゲゼルシャフト ミット ベシュレンクテル ハフツング フラットな基板の処理装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5590438A (en) * 1978-12-27 1980-07-09 Hitachi Ltd Plasma surface treatment device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5590438A (en) * 1978-12-27 1980-07-09 Hitachi Ltd Plasma surface treatment device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010526446A (ja) * 2007-05-09 2010-07-29 ライボルト オプティクス ゲゼルシャフト ミット ベシュレンクテル ハフツング フラットな基板の処理装置

Similar Documents

Publication Publication Date Title
JPH0167739U (pt)
JPH0385466U (pt)
JPH01108930U (pt)
JPS61148499U (pt)
JPS6245830U (pt)
JPH0183065U (pt)
JPH0195725U (pt)
JPH01120328U (pt)
JPS63142824U (pt)
JPH01154630U (pt)
JPH069490Y2 (ja) 半導体ウエハのプラズマアツシング装置
JPH0167738U (pt)
JPS61159590U (pt)
JPS62152436U (pt)
JPS62197850U (pt)
JPS62118133U (pt)
JPS61164024U (pt)
JPS6365218U (pt)
JPS60179033U (ja) 放電電極
JPS6192052U (pt)
JPH01180646U (pt)
JPS6236065U (pt)
JPS61172456U (pt)
JPS61108358U (pt)
JPH0274363U (pt)