JPH0384760A - Cartridge type magnetic tape device - Google Patents
Cartridge type magnetic tape deviceInfo
- Publication number
- JPH0384760A JPH0384760A JP1220274A JP22027489A JPH0384760A JP H0384760 A JPH0384760 A JP H0384760A JP 1220274 A JP1220274 A JP 1220274A JP 22027489 A JP22027489 A JP 22027489A JP H0384760 A JPH0384760 A JP H0384760A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic tape
- maintenance information
- writing
- processing
- reading
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1220274A JP2550719B2 (en) | 1989-08-29 | 1989-08-29 | Cartridge type magnetic tape unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1220274A JP2550719B2 (en) | 1989-08-29 | 1989-08-29 | Cartridge type magnetic tape unit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0384760A true JPH0384760A (en) | 1991-04-10 |
JP2550719B2 JP2550719B2 (en) | 1996-11-06 |
Family
ID=16748606
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1220274A Expired - Lifetime JP2550719B2 (en) | 1989-08-29 | 1989-08-29 | Cartridge type magnetic tape unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2550719B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9164389B2 (en) | 2013-08-29 | 2015-10-20 | Samsung Electronics Co., Ltd. | Patterning method using electron beam and exposure system configured to perform the same |
-
1989
- 1989-08-29 JP JP1220274A patent/JP2550719B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9164389B2 (en) | 2013-08-29 | 2015-10-20 | Samsung Electronics Co., Ltd. | Patterning method using electron beam and exposure system configured to perform the same |
Also Published As
Publication number | Publication date |
---|---|
JP2550719B2 (en) | 1996-11-06 |
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