JPH0380050B2 - - Google Patents
Info
- Publication number
- JPH0380050B2 JPH0380050B2 JP61076543A JP7654386A JPH0380050B2 JP H0380050 B2 JPH0380050 B2 JP H0380050B2 JP 61076543 A JP61076543 A JP 61076543A JP 7654386 A JP7654386 A JP 7654386A JP H0380050 B2 JPH0380050 B2 JP H0380050B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- chamber
- vacuum processing
- buffer chamber
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 235000014676 Phragmites communis Nutrition 0.000 claims description 19
- 239000010453 quartz Substances 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 11
- 230000008878 coupling Effects 0.000 claims 1
- 238000010168 coupling process Methods 0.000 claims 1
- 238000005859 coupling reaction Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 description 14
- 230000005855 radiation Effects 0.000 description 12
- 238000000034 method Methods 0.000 description 9
- 238000004544 sputter deposition Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 238000004891 communication Methods 0.000 description 3
- 230000032258 transport Effects 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、真空処理装置に係り、特にスパツタ
装置、CVD装置等の真空処理装置に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a vacuum processing apparatus, and particularly to a vacuum processing apparatus such as a sputtering apparatus or a CVD apparatus.
従来の真空処理装置では、例えば、特開昭60−
76115号公報に記載のように、試料の処理時に試
料を加熱する赤外線ヒータを試料ホルダーに内蔵
させたものが知られている。
In conventional vacuum processing equipment, for example,
As described in Japanese Patent No. 76115, a sample holder is known in which an infrared heater that heats the sample during sample processing is built into the sample holder.
一方、例えば、スパツタ装置においては、例え
ば、特開昭60−52574号公報に記載のように、ス
パツタ成膜処理前に試料は、ベーク処理やプラズ
マエツチ処理される。この場合、このような処理
は、試料を保持する試料ホルダーを各処理室に順
次移動させて連続的に実施される。 On the other hand, in a sputtering apparatus, for example, the sample is subjected to a baking process or a plasma etching process before the sputtering film forming process, as described in, for example, Japanese Unexamined Patent Publication No. 60-52574. In this case, such processing is performed continuously by sequentially moving the sample holder holding the sample to each processing chamber.
上記特開昭60−52574号公報に記載のスパツタ
ー装置のような、真空排気されるバツフア室と、
該バツフア室に連通して設けられた試料着脱室及
び複数の処理室と、該試料着脱室、処理室にそれ
ぞれ同時対応可能に試料ホルダーを有しバツフア
室内に設けられた搬送手段とを備え、該搬送手段
でそれぞれの試料ホルダーを隣合う試料着脱室、
処理室に対応させて順次移動させ試料ホルダーに
垂直保持された試料を連続して処理する真空処理
装置では、処理室での試料の処理がどのような処
理かによつてある処理室では試料を所定の処理温
度に加熱する必要が生じる。例えば、上記公報に
記載のスパツター装置では、試料がベーク処理さ
れる処理室、スパツタ成膜処理される処理室で
は、試料を所定の処理温度に加熱する必要が生
じ、試料がプラズマエツチ処理される処理室で
は、試料を所定の処理温度に加熱する必要はな
い。
A buffer chamber that is evacuated, such as the sputtering device described in the above-mentioned Japanese Patent Application Laid-Open No. 60-52574,
A sample attachment/detachment chamber and a plurality of processing chambers are provided in communication with the buffer chamber, and a transfer means is provided in the buffer chamber and has a sample holder capable of simultaneously handling each of the sample attachment/detachment chamber and the processing chamber, The transport means transports each sample holder to an adjacent sample loading/unloading chamber,
In vacuum processing equipment, which sequentially processes samples held vertically in a sample holder by moving them sequentially according to the processing chamber, the sample may be moved in a certain processing chamber depending on the type of processing the sample is being processed in the processing chamber. It becomes necessary to heat to a predetermined processing temperature. For example, in the sputtering apparatus described in the above-mentioned publication, it is necessary to heat the sample to a predetermined processing temperature in the processing chamber where the sample is subjected to the baking process and the process chamber where the sputtering process is performed, and the sample is subjected to the plasma etching process. There is no need to heat the sample to a predetermined processing temperature in the processing chamber.
従つて、試料ホルダーに赤外線ヒータを単に内
蔵させただけでは、試料の加熱の要、不要によつ
て赤外線ヒータへの通電を外部の電源の切り替え
を行わなければならず、このため、処理操作が複
雑になり、場合によつては、誤操作を生じる危険
性がある。また、試料ホルダーに赤外線ヒータを
単に内蔵させただけでは、試料を効率良く加熱す
る上で未だ解決すべき問題を有する。 Therefore, if an infrared heater is simply built into the sample holder, the power supply to the infrared heater must be switched from an external power source depending on whether or not heating the sample is necessary, which makes processing operations difficult. It becomes complicated, and in some cases, there is a risk of erroneous operation. Furthermore, simply incorporating an infrared heater into the sample holder still leaves problems to be solved in terms of efficiently heating the sample.
本発明の目的は、試料を垂直保持する試料ホル
ダーを各真空処理室に対応し移動させて試料の加
熱を要する真空処理と試料の加熱を要しない真空
処理とを連続して実施する場合の処理操作を効率
良く試料加熱し簡単化できる真空処理装置を提供
することにある。 The purpose of the present invention is to move a sample holder that vertically holds a sample to each vacuum processing chamber to perform vacuum processing that requires heating of the sample and vacuum processing that does not require heating of the sample in succession. An object of the present invention is to provide a vacuum processing device that can efficiently heat a sample and simplify its operation.
上記目的は、真空排気されるバツフア室と、該
バツフア室に連通して設けられた試料着脱室と、
前記バツフア室に連通して設けられた複数の真空
処理室と、前記試料着脱室、真空処理室にそれぞ
れ同時対応可能に試料ホルダーを有し前記バツフ
ア室内にも設けられた搬送手段とを備え、該搬送
手段でそれぞれの前記試料ホルダーを隣合う前記
試料着脱室、真空処理室に対応させて順次移動さ
せ前記試料ホルダーに垂直保持された試料を連続
して真空処理する装置において、前記試料ホルダ
ーの試料垂直保持面に透明石英板を設け該透明石
英板に垂直保持された前記試料を前記透明石英板
を介して加熱する赤外線放射ヒータを前記透明石
英板で覆つて前記試料ホルダーの全てに内蔵さ
せ、磁気感応形リードスイツチを前記試料ホルダ
ーのそれぞれに対応して真空排気される前記バツ
フア室内の前記搬送手段に設け、それぞれの前記
赤外線放射ヒータの一端を導入端子に接続し、そ
れぞれの前記赤外線放射ヒータの他端をそれぞれ
対応する前記磁気感応形リードスイツチに接続
し、それぞれの前記磁気感応形リードスイツチを
前記導入端子に接続し、前記磁気感応形リードス
イツチ作動用の磁気手段を前記試料を所定の処理
温度に加熱して真空処理する必要がある前記真空
処理室に対応し真空排気される前記バツフア室内
に設け、前記導入端子を前記バツフア室外のカツ
プリングを介して前記バツフア室外の電源に接続
したものとすることにより、達成される。
The above purpose is to provide a buffer chamber that is evacuated, a sample attachment/detachment chamber that is connected to the buffer chamber,
A plurality of vacuum processing chambers are provided in communication with the buffer chamber, and a transfer means is provided also in the buffer chamber and has a sample holder capable of simultaneously handling each of the sample attachment/detachment chamber and the vacuum processing chamber, In an apparatus for successively vacuum-processing a sample vertically held in the sample holder by sequentially moving each of the sample holders in correspondence with the adjacent sample attachment/detachment chamber and vacuum processing chamber by the transfer means, the sample holder is A transparent quartz plate is provided on a vertical sample holding surface, and an infrared radiation heater for heating the sample vertically held on the transparent quartz plate via the transparent quartz plate is covered with the transparent quartz plate and built into all of the sample holders. , a magnetically sensitive reed switch is provided in the transfer means in the buffer chamber which is evacuated corresponding to each of the sample holders, one end of each of the infrared radiation heaters is connected to an introduction terminal, and each of the infrared radiation The other end of the heater is connected to the corresponding magnetically sensitive reed switch, each magnetically sensitive reed switch is connected to the introduction terminal, and the magnetic means for operating the magnetically sensitive reed switch is connected to the sample. It is provided in the buffer chamber which is evacuated and corresponds to the vacuum processing chamber which needs to be heated to a processing temperature of This is achieved by making it a reality.
磁気感応形スイツチは、磁気手段により作動す
る。この作動によつて加熱手段には電源より通電
が開始され、これにより試料は加熱される。した
がつて、加熱して試料を処理する必要がある処理
室に対応してのみ磁気手段を設けることで、外部
の電源の切替操作が不要になる。
Magnetically sensitive switches operate by magnetic means. As a result of this operation, the heating means starts to be energized by the power source, thereby heating the sample. Therefore, by providing the magnetic means only in the processing chamber where the sample needs to be heated and processed, the switching operation of the external power source becomes unnecessary.
以下、本発明の一実施例を第１図，第２図によ
り説明する。
An embodiment of the present invention will be described below with reference to FIGS. 1 and 2.
第１図で、バツフア室１０は、縦断面略Ｕ字形
の空間を有している。バツフア室１０には、その
円周方向で試料着脱室２０、処理室（図示省
略）、処理室（図示省略）、処理室２１、処理
室（図示省略）、処理室（図示省略）がバツ
フア室１０と連通して設けられている。バツフア
室１０の底部空間には、回転テーブル３０が回転
可能に設けられている。回転軸３１は、下端部を
バツフア室１０の底部空間に突出しバツフア室１
０の気密を保持してバツフア室１０に回転自在に
設けられている。回転テーブル３０は、回転軸３
１の下端に略水平に設けられている。回転軸３１
の上端には、駆動歯車３２が設けられている。駆
動歯車３２には、駆動歯車３３が噛合されてい
る。駆動歯車３３は、駆動装置３４に設けられて
いる。回転ドラム３５は、各室に対応する面を有
しバツフア室１０内で回転テーブル３０に設けら
れている。試料ホルダー４０は、回転ドラム３５
の各室に対応する面に各室と対応する位置で回転
ドラム３５に設けられている。したがつて、この
場合、試料ホルダー４０は、被処理面垂直姿勢で
試料５０を保持する。また、試料ホルダー４０の
個数は、この場合、６個である。加熱手段は、こ
の場合、赤外線放射ヒータ６０であり、赤外線放
射ヒータ６０は、試料ホルダー４０に内蔵されて
いる。なお、試料ホルダー４０の試料特許面に
は、透明石英板（図示省略）が設けられている。
磁気感応形リードスイツチ６１は、この場合、回
転ドラム３５の頂部に設けられている。磁気感応
形リードスイツチ６１の作動用の磁気手段は、こ
の場合、永久磁石６２である。永久磁石６２は、
試料５０を加熱して処理する必要のある室、この
場合、処理室〜処理室に対応した位置で、磁
気感応形リードスイツチ６１に対応可能にバツフ
ア室１０に設けられている。 In FIG. 1, the buffer chamber 10 has a generally U-shaped space in vertical section. The buffer chamber 10 includes, in the circumferential direction, a sample loading/unloading chamber 20, a processing chamber (not shown), a processing chamber (not shown), a processing chamber 21, a processing chamber (not shown), and a processing chamber (not shown). It is provided in communication with 10. A rotary table 30 is rotatably provided in the bottom space of the buffer chamber 10. The rotating shaft 31 has a lower end protruding into the bottom space of the buffer chamber 10 .
It is rotatably provided in the buffer chamber 10 while maintaining zero airtightness. The rotary table 30 has a rotary shaft 3
It is provided approximately horizontally at the lower end of 1. Rotating shaft 31
A drive gear 32 is provided at the upper end of the . A drive gear 33 is meshed with the drive gear 32 . The drive gear 33 is provided in a drive device 34. The rotating drum 35 has a surface corresponding to each chamber and is provided on the rotating table 30 within the buffer chamber 10. The sample holder 40 is attached to the rotating drum 35
The rotary drum 35 is provided on a surface corresponding to each chamber at a position corresponding to each chamber. Therefore, in this case, the sample holder 40 holds the sample 50 in a position perpendicular to the surface to be processed. Further, the number of sample holders 40 is six in this case. In this case, the heating means is an infrared radiation heater 60, and the infrared radiation heater 60 is built into the sample holder 40. Note that a transparent quartz plate (not shown) is provided on the sample patent surface of the sample holder 40.
A magnetically sensitive reed switch 61 is provided at the top of the rotating drum 35 in this case. The magnetic means for actuation of the magnetically sensitive reed switch 61 is in this case a permanent magnet 62. The permanent magnet 62 is
A magnetically sensitive reed switch 61 is provided in the buffer chamber 10 at a position corresponding to a chamber in which the sample 50 needs to be heated and processed, in this case, from processing chamber to processing chamber.
第１図，第２図で、６個の試料ホルダー４０に
それぞれ内蔵された赤外線放射ヒータ６０は、磁
気感応形リードスイツチ６１を介して電源６３に
並列接続されている。即ち、各赤外線放射ヒータ
６０の一端は、導入端子６４に接続され、他端
は、それぞれ対応する磁気感応形リードスイツチ
６１に接続されている。また、各磁気感応形リー
ドスイツチ６１は、導入端子６４に接続されてい
る。電源６３と導入端子６４とは、スリツプリン
グ６５を介して接続されている。スリツプリング
６５は、回転軸３１の上端に設けられている。電
源６３は、電圧調整機能を有している。なお、第
１図で、バツフア室１０内は真空排気され、各室
はそれぞれ独立に真空排気可能である。 In FIGS. 1 and 2, infrared radiation heaters 60 built into each of the six sample holders 40 are connected in parallel to a power source 63 via a magnetically responsive reed switch 61. That is, one end of each infrared radiation heater 60 is connected to the introduction terminal 64, and the other end is connected to the corresponding magnetically sensitive reed switch 61. Further, each magnetically sensitive reed switch 61 is connected to an introduction terminal 64. The power supply 63 and the introduction terminal 64 are connected via a slip ring 65. The slip ring 65 is provided at the upper end of the rotating shaft 31. The power supply 63 has a voltage adjustment function. In FIG. 1, the inside of the buffer chamber 10 is evacuated, and each chamber can be evacuated independently.
第１図，第２図で、試料５０は、搬送手段（図
示省略）により試料着脱室２０に搬入されて試料
ホルダー４０に渡され試料保持面に保持される。
その後、駆動装置３４を作動させることで試料５
０を保持した試料ホルダー４０はバツフア室１０
内を1/6回転させられ、これにより、試料５０を
保持した試料ホルダー４０は、処理室に対応し
た位置に至る。処理室での試料５０の処理中に
試料着脱室２０と対応した位置にある試料ホルダ
ー４０には、別の試料５０が保持される。このよ
うに、駆動装置３４の作動で試料ホルダー４０を
１／６毎回転させることで、試料ホルダー４０には、
順次試料５０が保持され、保持された試料５０
は、処理室〜処理室で順次処理される。この
場合、永久磁石６２は、処理室〜処理室に対
応して設けられているため、処理室〜処理室
に対応した位置に試料ホルダー４０が至つた時点
で、各磁気感応形リードスイツチ６１が作動し各
赤外線放射ヒータ６０に通電が開始される。これ
により試料ホルダー４０に保持された試料５０は
所定温度に加熱されて処理室〜処理室で所定
処理される。 In FIGS. 1 and 2, a sample 50 is carried into the sample attachment/detachment chamber 20 by a transport means (not shown), transferred to the sample holder 40, and held on the sample holding surface.
Thereafter, by operating the drive device 34, the sample 5
The sample holder 40 holding 0 is placed in the buffer chamber 10.
The sample holder 40 holding the sample 50 reaches a position corresponding to the processing chamber. Another sample 50 is held in the sample holder 40 located at a position corresponding to the sample attachment/detachment chamber 20 while the sample 50 is being processed in the processing chamber. In this way, by rotating the sample holder 40 every 1/6 rotation by the operation of the drive device 34, the sample holder 40 has
The samples 50 are held in sequence, and the held samples 50 are
are sequentially processed in the processing chamber to processing chamber. In this case, since the permanent magnets 62 are provided corresponding to the processing chambers, each magnetically sensitive reed switch 61 is activated when the sample holder 40 reaches the position corresponding to the processing chambers. The infrared radiation heaters 60 are activated and energization of each infrared radiation heater 60 is started. Thereby, the sample 50 held in the sample holder 40 is heated to a predetermined temperature and subjected to a predetermined process in the processing chambers.
本実施例では、次のような効果が得られる。 In this embodiment, the following effects can be obtained.
(1) 永久磁石を設けた位置でのみ赤外線放射ヒー
タの点灯が行えるため、外部の電源の切替操作
が不要となり、試料ホルダーを各処理室に対し
て順次移動させて試料の加熱を要する処理室と
試料加熱を要しない処理とを連続して実施する
場合の処理操作る簡単化できる。(1) Since the infrared radiation heater can be turned on only at the position where the permanent magnet is installed, there is no need to switch the external power supply, and the sample holder can be moved to each processing chamber in sequence to heat the sample. Processing operations can be simplified when processing and processing that does not require sample heating are performed consecutively.
(2) 永久磁石を設た位置でのみ赤外線放射ヒータ
の点灯が行えるため、誤操作を生じる危険性が
ない。(2) Since the infrared radiant heater can be turned on only at the position where the permanent magnet is installed, there is no risk of erroneous operation.
(3) 試料ホルダーの透明石英板に垂直保持された
試料を該透明石英板を介して赤外線放射ヒータ
により加熱できるため、試料ホルダーの試料垂
直保持面に保持された試料を効率良く加熱する
ことができる。(3) Since the sample held vertically on the transparent quartz plate of the sample holder can be heated by the infrared radiation heater via the transparent quartz plate, the sample held on the vertical sample holding surface of the sample holder can be heated efficiently. can.
なお、上記実施例では、永久磁石を固定して設
けているが、磁気感応形リードスイツチを作動、
不作動選択可能に永久磁石を設けても良い。即
ち、永久磁石を取外し可能に設けるとか、磁気感
応形リードスイツチに影響を及ぼさないような位
置に移動可能に設けるとかは、その具体的な一例
である。このように永久磁石を設けた場合は、例
えば、同一処理室で加熱して試料を処理すると
か、加熱しないで試料を処理するとかの処理の変
更にフレキシビリテイに対応することができる。
また、磁気手段としては、この他の電磁石を用い
ても良い。 In the above embodiment, the permanent magnet is fixedly provided, but the magnetically sensitive reed switch is actuated.
A permanent magnet may be provided to enable selection of non-operation. Specifically, one specific example is to provide the permanent magnet in a removable manner, or to provide it in a movable manner to a position that does not affect the magnetically sensitive reed switch. When a permanent magnet is provided in this manner, it is possible to respond flexibly to changes in processing, such as processing a sample by heating or processing a sample without heating in the same processing chamber, for example.
Furthermore, other electromagnets may be used as the magnetic means.
本発明によれば、試料を垂直保持する試料ホル
ダーを各真空処理室に対応し移動させて試料の加
熱を要する真空処理と試料の加熱を要しない真空
処理とを連続して実施する場合の処理操作を効率
良く試料加熱し簡単化できるという効果がある。
According to the present invention, a sample holder that holds the sample vertically is moved to each vacuum processing chamber to perform vacuum processing that requires heating the sample and vacuum processing that does not require heating the sample in succession. This has the effect of efficiently heating the sample and simplifying the operation.
第１図は、本発明の一実施例の真空処理装置の
縦断面図、第２図は、第１図の電気回路図であ
る。
１０……バツフア室、２０……試料着脱室、２
１……処理室、３０……回転テーブル、３１…
…回転軸、３２，３３……駆動歯車、３４……駆
動装置、３５……回転ドラム、４０……試料ホル
ダー、６０……赤外線放射ヒータ、６１……磁気
感応形リードスイツチ、６２……永久磁石、６３
……電源、６４……導入端子、６５……スリツプ
リング。
FIG. 1 is a longitudinal sectional view of a vacuum processing apparatus according to an embodiment of the present invention, and FIG. 2 is an electric circuit diagram of FIG. 1. 10...Buffer chamber, 20...Sample attachment/detachment chamber, 2
1...processing room, 30...rotary table, 31...
...Rotating shaft, 32, 33... Drive gear, 34... Drive device, 35... Rotating drum, 40... Sample holder, 60... Infrared radiation heater, 61... Magnetic sensitive reed switch, 62... Permanent magnet, 63
...Power supply, 64...Introduction terminal, 65...Slip ring.
Claims (1)
に連通して設けられた試料着脱室と、前記バツフ
ア室に連通して設けられた複数の真空処理室と、
前記試料着脱室、真空処理室にそれぞれ同時対応
可能に試料ホルダーを有し前記バツフア室内にも
設けられた搬送手段とを備え、該搬送手段でそれ
ぞれの前記試料ホルダーを隣合う前記試料着脱
室、真空処理室に対応させて順次移動させ前記試
料ホルダーに垂直保持された試料を連続して真空
処理する装置において、 前記試料ホルダーの試料垂直保持面に透明石英
板を設け該透明石英板に垂直保持された前記試料
を前記透明石英板を介して加熱する赤外線放射ヒ
ータを前記透明石英板で覆つて前記試料ホルダー
の全てに内蔵させ、 磁気感応形リードスイツチを前記試料ホルダー
のそれぞれに対応して真空排気される前記バツフ
ア室内の前記搬送手段に設け、 それぞれの前記赤外線放射ヒータの一端を導入
端子に接続し、 それぞれの前記赤外線放射ヒータの他端をそれ
ぞれ対応する前記磁気感応形リードスイツチに接
続し、 それぞれの前記磁気感応形リードスイツチを前
記導入端子に接続し、 前記磁気感応形リードスイツチ作動用の磁気手
段を前記試料を所定の処理温度に加熱して真空処
理する必要がある前記真空処理室に対応し真空排
気される前記バツフア室内に設け、 前記導入端子を前記バツフア室外のカツプリン
グを介して前記バツフア室外の電源に接続したこ
とを特徴とする真空処理装置。 ２ 前記磁気手段を、前記真空処理室の内で前記
試料を所定の処理温度に加熱して真空処理する必
要がある真空処理室にのみ対応して設けた特許請
求の範囲第１項記載の真空処理装置。 ３ 前記磁気手段を、取外し可能に前記真空処理
室に対応して設けた特許請求の範囲第１項記載の
真空処理装置。 ４ 前記磁気手段を、前記磁気感応形リードスイ
ツチに影響を及ぼさない位置に移動可能に前記処
理室に設けた特許請求の範囲第１項記載の真空処
理装置。[Scope of Claims] 1. A buffer chamber that is evacuated, a sample attachment/detachment chamber that communicates with the buffer chamber, and a plurality of vacuum processing chambers that communicate with the buffer chamber.
A transport means is provided also in the buffer chamber, the transport means having a sample holder capable of simultaneously handling each of the sample mounting and dismounting chamber and the vacuum processing chamber; In an apparatus for continuously vacuum processing a sample vertically held in the sample holder, which is moved sequentially in correspondence with a vacuum processing chamber, a transparent quartz plate is provided on the vertical sample holding surface of the sample holder, and the sample is held vertically on the transparent quartz plate. An infrared radiant heater that heats the sample through the transparent quartz plate is covered with the transparent quartz plate and built into all of the sample holders, and a magnetically sensitive reed switch is installed in a vacuum state corresponding to each of the sample holders. provided in the conveying means in the buffer chamber to be evacuated, one end of each of the infrared radiant heaters is connected to an introduction terminal, and the other end of each of the infrared radiant heaters is connected to the corresponding magnetically sensitive reed switch. , each of the magnetically sensitive reed switches is connected to the introduction terminal, and the magnetic means for operating the magnetically sensitive reed switch is connected to the vacuum processing chamber in which it is necessary to heat the sample to a predetermined processing temperature and perform vacuum processing. A vacuum processing apparatus, characterized in that the vacuum processing apparatus is provided in the buffer chamber which is evacuated to correspond to the above, and the introduction terminal is connected to a power source outside the buffer chamber via a coupling outside the buffer chamber. 2. The vacuum according to claim 1, wherein the magnetic means is provided only for a vacuum processing chamber in which it is necessary to heat the sample to a predetermined processing temperature and perform vacuum processing within the vacuum processing chamber. Processing equipment. 3. The vacuum processing apparatus according to claim 1, wherein the magnetic means is removably provided corresponding to the vacuum processing chamber. 4. The vacuum processing apparatus according to claim 1, wherein the magnetic means is provided in the processing chamber so as to be movable to a position where it does not affect the magnetically sensitive reed switch.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7654386A JPS62234539A (en) | 1986-04-04 | 1986-04-04 | Vacuum treating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7654386A JPS62234539A (en) | 1986-04-04 | 1986-04-04 | Vacuum treating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62234539A JPS62234539A (en) | 1987-10-14 |
| JPH0380050B2 true JPH0380050B2 (en) | 1991-12-20 |
Family
ID=13608182
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7654386A Granted JPS62234539A (en) | 1986-04-04 | 1986-04-04 | Vacuum treating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62234539A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2743379B2 (en) * | 1988-05-06 | 1998-04-22 | 日産自動車株式会社 | Transmission hydraulic control device |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5327457A (en) * | 1976-08-26 | 1978-03-14 | Meisei Electric Co Ltd | Time informing device for clock |
| JPS58170531A (en) * | 1982-03-30 | 1983-10-07 | Toshiba Corp | Vacuum sample heating apparatus |
| JPS58170532A (en) * | 1982-03-30 | 1983-10-07 | Toshiba Corp | Vacuum heating apparatus |
| JPS59179786A (en) * | 1983-03-30 | 1984-10-12 | Hitachi Ltd | Continuous sputtering device |
| JPS6052574A (en) * | 1983-09-02 | 1985-03-25 | Hitachi Ltd | Continuous sputtering device |
| JPS6076115A (en) * | 1983-10-01 | 1985-04-30 | Ulvac Corp | Heating device of substrate |
-
1986
- 1986-04-04 JP JP7654386A patent/JPS62234539A/en active Granted
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5327457A (en) * | 1976-08-26 | 1978-03-14 | Meisei Electric Co Ltd | Time informing device for clock |
| JPS58170531A (en) * | 1982-03-30 | 1983-10-07 | Toshiba Corp | Vacuum sample heating apparatus |
| JPS58170532A (en) * | 1982-03-30 | 1983-10-07 | Toshiba Corp | Vacuum heating apparatus |
| JPS59179786A (en) * | 1983-03-30 | 1984-10-12 | Hitachi Ltd | Continuous sputtering device |
| JPS6052574A (en) * | 1983-09-02 | 1985-03-25 | Hitachi Ltd | Continuous sputtering device |
| JPS6076115A (en) * | 1983-10-01 | 1985-04-30 | Ulvac Corp | Heating device of substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62234539A (en) | 1987-10-14 |
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