JPH0377860A - Purification of 2-acylamido-2-methylpropanesulfonic acid - Google Patents
Purification of 2-acylamido-2-methylpropanesulfonic acidInfo
- Publication number
- JPH0377860A JPH0377860A JP21545189A JP21545189A JPH0377860A JP H0377860 A JPH0377860 A JP H0377860A JP 21545189 A JP21545189 A JP 21545189A JP 21545189 A JP21545189 A JP 21545189A JP H0377860 A JPH0377860 A JP H0377860A
- Authority
- JP
- Japan
- Prior art keywords
- ams
- acid
- acetic acid
- formula
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000746 purification Methods 0.000 title description 5
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims abstract description 57
- 229920000536 2-Acrylamido-2-methylpropane sulfonic acid Polymers 0.000 claims abstract description 12
- XHZPRMZZQOIPDS-UHFFFAOYSA-N 2-Methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(C)(C)NC(=O)C=C XHZPRMZZQOIPDS-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000000605 extraction Methods 0.000 claims abstract description 12
- 150000003839 salts Chemical class 0.000 claims abstract description 12
- 239000003381 stabilizer Substances 0.000 claims abstract description 12
- 239000002253 acid Substances 0.000 claims abstract description 11
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 11
- 239000002904 solvent Substances 0.000 claims abstract description 6
- 125000003277 amino group Chemical group 0.000 claims abstract description 5
- 159000000009 barium salts Chemical class 0.000 claims abstract description 5
- 150000007522 mineralic acids Chemical class 0.000 claims abstract description 5
- 150000007524 organic acids Chemical class 0.000 claims abstract description 5
- 125000003118 aryl group Chemical group 0.000 claims abstract description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 3
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 23
- 159000000007 calcium salts Chemical class 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 4
- 235000005985 organic acids Nutrition 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 2
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- 125000004434 sulfur atom Chemical group 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 1
- 229960000583 acetic acid Drugs 0.000 abstract description 20
- 150000001875 compounds Chemical class 0.000 abstract description 13
- 239000012362 glacial acetic acid Substances 0.000 abstract description 6
- 239000000835 fiber Substances 0.000 abstract description 2
- 239000005518 polymer electrolyte Substances 0.000 abstract description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 abstract 1
- 229910052791 calcium Inorganic materials 0.000 abstract 1
- 239000011575 calcium Substances 0.000 abstract 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 1
- 239000006076 specific stabilizer Substances 0.000 abstract 1
- 239000013078 crystal Substances 0.000 description 15
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 9
- 239000000654 additive Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 7
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- HIFJUMGIHIZEPX-UHFFFAOYSA-N sulfuric acid;sulfur trioxide Chemical compound O=S(=O)=O.OS(O)(=O)=O HIFJUMGIHIZEPX-UHFFFAOYSA-N 0.000 description 6
- 238000001914 filtration Methods 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- IWOUKMZUPDVPGQ-UHFFFAOYSA-N barium nitrate Chemical compound [Ba+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O IWOUKMZUPDVPGQ-UHFFFAOYSA-N 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 239000004202 carbamide Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- RHUYHJGZWVXEHW-UHFFFAOYSA-N 1,1-Dimethyhydrazine Chemical compound CN(C)N RHUYHJGZWVXEHW-UHFFFAOYSA-N 0.000 description 2
- GWEHVDNNLFDJLR-UHFFFAOYSA-N 1,3-diphenylurea Chemical compound C=1C=CC=CC=1NC(=O)NC1=CC=CC=C1 GWEHVDNNLFDJLR-UHFFFAOYSA-N 0.000 description 2
- LSBDFXRDZJMBSC-UHFFFAOYSA-N 2-phenylacetamide Chemical compound NC(=O)CC1=CC=CC=C1 LSBDFXRDZJMBSC-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical compound NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- PMDCZENCAXMSOU-UHFFFAOYSA-N N-ethylacetamide Chemical compound CCNC(C)=O PMDCZENCAXMSOU-UHFFFAOYSA-N 0.000 description 2
- XGEGHDBEHXKFPX-UHFFFAOYSA-N N-methyl urea Chemical compound CNC(N)=O XGEGHDBEHXKFPX-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- FZERHIULMFGESH-UHFFFAOYSA-N N-phenylacetamide Chemical compound CC(=O)NC1=CC=CC=C1 FZERHIULMFGESH-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
- ZCCIPPOKBCJFDN-UHFFFAOYSA-N calcium nitrate Chemical compound [Ca+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ZCCIPPOKBCJFDN-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229940093915 gynecological organic acid Drugs 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 150000002484 inorganic compounds Chemical class 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Chemical compound O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- HQDAJGNZGNZGCO-UHFFFAOYSA-N (propan-2-ylideneamino)urea Chemical compound CC(C)=NNC(N)=O HQDAJGNZGNZGCO-UHFFFAOYSA-N 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- YBBLOADPFWKNGS-UHFFFAOYSA-N 1,1-dimethylurea Chemical compound CN(C)C(N)=O YBBLOADPFWKNGS-UHFFFAOYSA-N 0.000 description 1
- 229940057054 1,3-dimethylurea Drugs 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- LUBJCRLGQSPQNN-UHFFFAOYSA-N 1-Phenylurea Chemical compound NC(=O)NC1=CC=CC=C1 LUBJCRLGQSPQNN-UHFFFAOYSA-N 0.000 description 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- VSNHCAURESNICA-NJFSPNSNSA-N 1-oxidanylurea Chemical compound N[14C](=O)NO VSNHCAURESNICA-NJFSPNSNSA-N 0.000 description 1
- WGTASENVNYJZBK-UHFFFAOYSA-N 3,4,5-trimethoxyamphetamine Chemical compound COC1=CC(CC(C)N)=CC(OC)=C1OC WGTASENVNYJZBK-UHFFFAOYSA-N 0.000 description 1
- 229920002972 Acrylic fiber Polymers 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- CBOCVOKPQGJKKJ-UHFFFAOYSA-L Calcium formate Chemical compound [Ca+2].[O-]C=O.[O-]C=O CBOCVOKPQGJKKJ-UHFFFAOYSA-L 0.000 description 1
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 description 1
- RYECOJGRJDOGPP-UHFFFAOYSA-N Ethylurea Chemical compound CCNC(N)=O RYECOJGRJDOGPP-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- MGJKQDOBUOMPEZ-UHFFFAOYSA-N N,N'-dimethylurea Chemical compound CNC(=O)NC MGJKQDOBUOMPEZ-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 229960001413 acetanilide Drugs 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- ITHZDDVSAWDQPZ-UHFFFAOYSA-L barium acetate Chemical compound [Ba+2].CC([O-])=O.CC([O-])=O ITHZDDVSAWDQPZ-UHFFFAOYSA-L 0.000 description 1
- NKQIMNKPSDEDMO-UHFFFAOYSA-L barium bromide Chemical compound [Br-].[Br-].[Ba+2] NKQIMNKPSDEDMO-UHFFFAOYSA-L 0.000 description 1
- 229910001620 barium bromide Inorganic materials 0.000 description 1
- WDIHJSXYQDMJHN-UHFFFAOYSA-L barium chloride Chemical compound [Cl-].[Cl-].[Ba+2] WDIHJSXYQDMJHN-UHFFFAOYSA-L 0.000 description 1
- 229910001626 barium chloride Inorganic materials 0.000 description 1
- UXFOSWFWQAUFFZ-UHFFFAOYSA-L barium(2+);diformate Chemical compound [Ba+2].[O-]C=O.[O-]C=O UXFOSWFWQAUFFZ-UHFFFAOYSA-L 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 1
- VSGNNIFQASZAOI-UHFFFAOYSA-L calcium acetate Chemical compound [Ca+2].CC([O-])=O.CC([O-])=O VSGNNIFQASZAOI-UHFFFAOYSA-L 0.000 description 1
- 235000011092 calcium acetate Nutrition 0.000 description 1
- 239000001639 calcium acetate Substances 0.000 description 1
- 229960005147 calcium acetate Drugs 0.000 description 1
- 229910001622 calcium bromide Inorganic materials 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- WGEFECGEFUFIQW-UHFFFAOYSA-L calcium dibromide Chemical compound [Ca+2].[Br-].[Br-] WGEFECGEFUFIQW-UHFFFAOYSA-L 0.000 description 1
- 235000019255 calcium formate Nutrition 0.000 description 1
- 239000004281 calcium formate Substances 0.000 description 1
- 229940044172 calcium formate Drugs 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- YQLZOAVZWJBZSY-UHFFFAOYSA-N decane-1,10-diamine Chemical compound NCCCCCCCCCCN YQLZOAVZWJBZSY-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- FGRVOLIFQGXPCT-UHFFFAOYSA-L dipotassium;dioxido-oxo-sulfanylidene-$l^{6}-sulfane Chemical compound [K+].[K+].[O-]S([O-])(=O)=S FGRVOLIFQGXPCT-UHFFFAOYSA-L 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- GRWZHXKQBITJKP-UHFFFAOYSA-L dithionite(2-) Chemical compound [O-]S(=O)S([O-])=O GRWZHXKQBITJKP-UHFFFAOYSA-L 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000008394 flocculating agent Substances 0.000 description 1
- DYDNPESBYVVLBO-UHFFFAOYSA-N formanilide Chemical compound O=CNC1=CC=CC=C1 DYDNPESBYVVLBO-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- YAMHXTCMCPHKLN-UHFFFAOYSA-N imidazolidin-2-one Chemical compound O=C1NCCN1 YAMHXTCMCPHKLN-UHFFFAOYSA-N 0.000 description 1
- KDSNLYIMUZNERS-UHFFFAOYSA-N isobutyl amine Natural products CC(C)CN KDSNLYIMUZNERS-UHFFFAOYSA-N 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- HDZGCSFEDULWCS-UHFFFAOYSA-N monomethylhydrazine Chemical compound CNN HDZGCSFEDULWCS-UHFFFAOYSA-N 0.000 description 1
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 1
- KERBAAIBDHEFDD-UHFFFAOYSA-N n-ethylformamide Chemical compound CCNC=O KERBAAIBDHEFDD-UHFFFAOYSA-N 0.000 description 1
- RIWRFSMVIUAEBX-UHFFFAOYSA-N n-methyl-1-phenylmethanamine Chemical compound CNCC1=CC=CC=C1 RIWRFSMVIUAEBX-UHFFFAOYSA-N 0.000 description 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 1
- RAFRTSDUWORDLA-UHFFFAOYSA-N phenyl 3-chloropropanoate Chemical compound ClCCC(=O)OC1=CC=CC=C1 RAFRTSDUWORDLA-UHFFFAOYSA-N 0.000 description 1
- HKOOXMFOFWEVGF-UHFFFAOYSA-N phenylhydrazine Chemical compound NNC1=CC=CC=C1 HKOOXMFOFWEVGF-UHFFFAOYSA-N 0.000 description 1
- 229940067157 phenylhydrazine Drugs 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- DJEHXEMURTVAOE-UHFFFAOYSA-M potassium bisulfite Chemical compound [K+].OS([O-])=O DJEHXEMURTVAOE-UHFFFAOYSA-M 0.000 description 1
- 235000010259 potassium hydrogen sulphite Nutrition 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- QLNJFJADRCOGBJ-UHFFFAOYSA-N propionamide Chemical compound CCC(N)=O QLNJFJADRCOGBJ-UHFFFAOYSA-N 0.000 description 1
- 229940080818 propionamide Drugs 0.000 description 1
- 239000012264 purified product Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- DUIOPKIIICUYRZ-UHFFFAOYSA-N semicarbazide Chemical compound NNC(N)=O DUIOPKIIICUYRZ-UHFFFAOYSA-N 0.000 description 1
- 238000001577 simple distillation Methods 0.000 description 1
- 229940079827 sodium hydrogen sulfite Drugs 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、2−アクリルアミド−2−メチルプロパンス
ルホン酸を高純度且つ高収率で得るための精製方法に関
する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a purification method for obtaining 2-acrylamido-2-methylpropanesulfonic acid with high purity and high yield.
従来技術とその問題点
従来、2−アクリルアミド−2−メチルプロパンスルホ
ン酸(以下、AMSと略称する)の製造には多くの方法
が提案されている。BACKGROUND ART Conventionally, many methods have been proposed for producing 2-acrylamido-2-methylpropanesulfonic acid (hereinafter abbreviated as AMS).
その代表的なものと17で、過剰のアクリロニトリルを
反応溶媒と反応原料とを兼ねて用い、その中で発煙硫酸
とイソブチンとを反応させ、得られた混合物に少量の水
を加えて析出17たAMSの沈殿物を濾取する方法(特
公昭50−30059号公報など)等が挙げられる。A representative example of this is No. 17, in which excess acrylonitrile was used both as a reaction solvent and a reaction raw material, and in which fuming sulfuric acid and isobutyne were reacted, and a small amount of water was added to the resulting mixture to precipitate No. 17. Examples include a method of collecting AMS precipitates by filtration (Japanese Patent Publication No. 30059/1983, etc.).
AMS及びそ・の同族体は、アクリル系モノマーと共重
合させてアクリル繊維等の染色性の改善のために用いら
れている。また、AMS及びその同族体の単独重合体も
しくは共重合体は、高分子電解質として極めて優れてお
り、凝集剤、分散剤、増粘剤、停電防止剤等として用い
られている(米国特許第2983712号公報及び同第
3332904号公報)aこの他、AMS及びその同族
体は、吸水性ポリマー等にも用いられている。AMS and its analogues are copolymerized with acrylic monomers and used to improve the dyeability of acrylic fibers and the like. In addition, homopolymers or copolymers of AMS and its homologs are extremely excellent as polymer electrolytes, and are used as flocculants, dispersants, thickeners, power outage prevention agents, etc. (U.S. Pat. No. 2,983,712) In addition, AMS and its analogues are also used in water-absorbing polymers and the like.
これら用途の中には、上記方法により製造されたAMS
の粗結晶をそのまま使用できるが、繊維等の高品質を要
求される用途では、該粗結晶を使用すると高分子量の単
独重合体も1、くは共重合体を得ることが出来ない為に
、高度に精製したAMSを使用する必要がある。Among these uses, AMS produced by the above method
The crude crystals can be used as they are, but in applications that require high quality such as fibers, it is not possible to obtain high molecular weight homopolymers or copolymers when using the crude crystals. It is necessary to use highly purified AMS.
AMSの精製方法としては、A M Sの粗結晶をアク
リロニトリル等の溶媒で洗浄するだけでは不十分である
。そこで、メタノールもしくは含水酢酸を用いて再結晶
する精製方法(英国特許第1090779号、特公昭5
0−30059号、特開昭53−13897号、特開昭
54−163524号、米国特許第3506707号等
)が、提案されている。As a method for purifying AMS, it is not sufficient to simply wash the crude crystals of AMS with a solvent such as acrylonitrile. Therefore, a purification method of recrystallizing using methanol or aqueous acetic acid (British Patent No. 1090779, Japanese Patent Publication No.
0-30059, JP-A-53-13897, JP-A-54-163524, US Pat. No. 3,506,707, etc.).
しかし、AMSの溶液もしくはスラリーは、熱に対して
不安定であり、上記再結晶の際の加熱によりAMSの9
〜〕、6%企が重合しもしくは分解して損失するという
大きな欠点がある。However, the AMS solution or slurry is unstable to heat, and due to the heating during the recrystallization, the AMS
], there is a major drawback in that 6% of the polymer is lost through polymerization or decomposition.
また、再結晶を行う際、溶媒にAMSの約50%程度が
溶解損失する為に、濾液を繰返して再結晶を行う必要が
あるが、この場合には、AMSの純度が低下するという
欠点がある。しかも得られる精製物の純度は不充分で純
度95%以上のAMSを得ることは極めて困難である。In addition, when recrystallizing, about 50% of AMS is lost in the solvent, so it is necessary to repeat the recrystallization with the filtrate, but in this case, there is a disadvantage that the purity of AMS decreases. be. Moreover, the purity of the purified product obtained is insufficient, and it is extremely difficult to obtain AMS with a purity of 95% or higher.
問題点を解決するための手段
本発明は、上記の如き従来技術の問題点を解消しAMS
を高純度で且っ高収率で精製するA M Sの精製方法
を提供しようとするものである。Means for Solving the Problems The present invention solves the problems of the prior art as described above and improves the AMS.
The object of the present invention is to provide a method for purifying AMS with high purity and high yield.
すなわち、本発明は、2−アクリルアミド−2−メチル
プロパンスルホン酸を精製するに当り、a)式工
R1−NH−R2I
E式中R1及びR2は、同一又は異なって、水素、アミ
ノ基、アルキル基、置換基としてアミノ基を有するアル
キル基、アリール基、もしくはフェニル低級アルキル基
を示す。]で表される化合物又はその酸付加塩、b)式
■E式中、R1及びR7は上記と同じ意味を有するaR
lとR2とが互いに結合して基−CH2CH2N H−
を形成してもよい。That is, in purifying 2-acrylamido-2-methylpropanesulfonic acid, the present invention provides a) formula R1-NH-R2I where R1 and R2 are the same or different and hydrogen, amino group, alkyl represents an alkyl group, an aryl group, or a phenyl lower alkyl group having an amino group as a substituent. ] or an acid addition salt thereof, b) Formula ■E where R1 and R7 have the same meanings as above aR
l and R2 are bonded to each other to form a group -CH2CH2N H-
may be formed.
R1は水素、低級アルキル基、水酸基もしくは基−N−
=C(CH3)2を示す。Yは酸素原子又は硫黄原子を
示す。]
で表される化合物又はその酸付加塩、及びC)無機酸又
は有機酸のカルシウム塩又はバリウム塩から選ばれた少
なくとも11種の安定化剤の存在下に濃酢酸を抽出溶媒
として熱時抽出を行うことを特徴とする2−アクリルア
ミド−2−メチルプロパンスルホン酸の精製方法に係る
。R1 is hydrogen, lower alkyl group, hydroxyl group or group -N-
=C(CH3)2. Y represents an oxygen atom or a sulfur atom. ] or an acid addition salt thereof; and C) hot extraction using concentrated acetic acid as an extraction solvent in the presence of at least 11 kinds of stabilizers selected from calcium salts or barium salts of inorganic acids or organic acids. The present invention relates to a method for purifying 2-acrylamido-2-methylpropanesulfonic acid, which comprises performing the following steps.
本発明者の研究によれば、j二足a) 、b)及びC)
から選ばれた特定の安定化化合物の存在下にAMSを濃
酢酸、J−り好ま(7くは氷酢酸を抽出溶媒として抽出
を行う時は、熱時抽出を行ってもAMSの熱変質を抑制
できるど共に、常温でのAMSの溶解度が低い濃酢酸を
用いる為にAMSの溶解による損失を伴わず高純度のA
MSを高収率で効率よく収得できることが見出された。According to the inventor's research, j bipeds a), b) and C)
When extracting AMS using concentrated acetic acid, glacial acetic acid (7) or glacial acetic acid as an extraction solvent in the presence of a specific stabilizing compound selected from In addition, since concentrated acetic acid, which has low solubility of AMS at room temperature, is used, high purity A can be obtained without loss due to dissolution of AMS.
It has been found that MS can be efficiently obtained with high yield.
本発明はこの新しい知見に基づき完成されたものである
。The present invention was completed based on this new knowledge.
本発明における濃酢酸としては、常温でのAMSに対す
る溶解度の低い高濃度のものが好ましく濃度95%以上
、より好ましくは濃度97%以上のものを用いるのが良
く、殊に氷酢酸を用いるのが最も好ましい。斯かる濃酢
酸を用いることにより溶解によるAMSの損失を実質的
に防止できる。The concentrated acetic acid used in the present invention is preferably one with a high concentration that has low solubility in AMS at room temperature, preferably 95% or more, more preferably 97% or more, and it is particularly preferable to use glacial acetic acid. Most preferred. By using such concentrated acetic acid, loss of AMS due to dissolution can be substantially prevented.
本発明の方法における酢酸の使用量は、粗AMSに対し
て同量乃至過剰量で良く、より好ましくは粗AMS中の
AMSの100重量部に対して300〜800重量部程
度である。The amount of acetic acid used in the method of the present invention may be the same amount to an excess amount relative to the crude AMS, and more preferably about 300 to 800 parts by weight relative to 100 parts by weight of AMS in the crude AMS.
本発明において安定化剤として用いる化合物としては、
a)式Iで表される化合物又はその酸付加塩、b)式■
で表される化合物又はその酸付加塩、及びC)無機酸も
しくは有機酸のカルシウム塩もしくはバリウム塩が包含
される。Compounds used as stabilizers in the present invention include:
a) Compound represented by formula I or its acid addition salt, b) Formula ■
The compounds represented by or acid addition salts thereof, and C) calcium salts or barium salts of inorganic or organic acids are included.
式Iで表される化合物又はその酸付加塩(a)の具体例
としては、例えば、アンモニア、メチルアミン、ジメチ
ルアミン、エチルアミン、ジエチルアミン、n−プロピ
ルアミン、ジ−n−プロピルアミン、i−プロピルアミ
ン、ジ−ミープロピルアミン、n−ブチルアミン、i、
−ブチルアミン、5ee−ブチルアミン、i−ブチルア
ミン、ジ−n−ブチルアミン、ジ−ミーブチルアミン、
n −アミルアミン、ペンタメチレンジアミン、n−ヘ
キシルアミン、ヘキサメチレンジアミン、n−オクチル
アミン、1.8−ジアミノオクタン、n−デシルアミン
、1,10−ジアミノデカン等のアルキルアミン、シク
ロヘキシルアミン、アニリン、N−メチルアニリン、ベ
ンジルアミン、N−メチルベンジルアミン、フェネチル
アミン、ジフェニルアミン等のアリールアミン、ヒドラ
ジン、メチルヒドラジン、N、N−ジメチルヒドラジン
、フェニルヒドラジン等のヒドラジン化合物、上記化合
物の塩酸塩又は硫酸塩等が挙げられる。Specific examples of the compound represented by formula I or its acid addition salt (a) include ammonia, methylamine, dimethylamine, ethylamine, diethylamine, n-propylamine, di-n-propylamine, i-propyl amine, di-propylamine, n-butylamine, i,
-butylamine, 5ee-butylamine, i-butylamine, di-n-butylamine, di-me-butylamine,
Alkylamines such as n-amylamine, pentamethylenediamine, n-hexylamine, hexamethylenediamine, n-octylamine, 1,8-diaminooctane, n-decylamine, 1,10-diaminodecane, cyclohexylamine, aniline, N -Arylamines such as methylaniline, benzylamine, N-methylbenzylamine, phenethylamine, diphenylamine, hydrazine compounds such as hydrazine, methylhydrazine, N,N-dimethylhydrazine, phenylhydrazine, hydrochlorides or sulfates of the above compounds, etc. Can be mentioned.
式■で表される化合物又はその酸付加塩(b)の具体例
としては、例えば、尿素、チオ尿素、N−メチル尿素、
1,1−ジメチル尿素、1,3−ジメチル尿素、N−エ
チル尿素、1.16−ジエチル尿素、1.3−ジエチル
尿素、エチレン尿素、N−フェニル尿素、1,3−ジフ
ェニル尿素、ホルムアミド、N−メチルホルムアミド、
N、N−ジメチルホルムアミド、N−エチルホルムアミ
ド、N、N−ジエチルホルムアミド、ホルムアニリド、
アセトアミド、N−メチルアセトアミド、N、N−ジメ
チルアセトアミド、N−エチルアセトアミド、N、N−
ジエチルアセトアミド、ベンズアミド、フェニルアセト
アミド、アセトアニリド、プロピオンアミド、セミカル
バジド又はその塩酸塩もしくは硫酸塩、アセトンセミカ
ルバゾン、ヒドロキシ尿素、テトラメチル尿素等のカル
バモイル系化合物が挙げられる。Specific examples of the compound represented by formula (2) or its acid addition salt (b) include urea, thiourea, N-methylurea,
1,1-dimethylurea, 1,3-dimethylurea, N-ethylurea, 1.16-diethylurea, 1.3-diethylurea, ethyleneurea, N-phenylurea, 1,3-diphenylurea, formamide, N-methylformamide,
N,N-dimethylformamide, N-ethylformamide, N,N-diethylformamide, formanilide,
Acetamide, N-methylacetamide, N,N-dimethylacetamide, N-ethylacetamide, N,N-
Examples include carbamoyl compounds such as diethylacetamide, benzamide, phenylacetamide, acetanilide, propionamide, semicarbazide or its hydrochloride or sulfate, acetone semicarbazone, hydroxyurea, and tetramethylurea.
また、無機酸又は有機酸のカルシウム塩又はバリウム塩
(C)としては、例えば塩化カルシウム、酢酸カルシウ
ム、硝酸カルシウム、亜硝酸カルシウム、臭化カルシウ
ム、ギ酸カルシウム、塩化バリウム、酢酸バリウム、硝
酸バリウム、亜硝酸バリウム、臭化バリウム、ギ酸バリ
ウム等が挙げられる。In addition, examples of the calcium salt or barium salt (C) of an inorganic or organic acid include calcium chloride, calcium acetate, calcium nitrate, calcium nitrite, calcium bromide, calcium formate, barium chloride, barium acetate, barium nitrate, Examples include barium nitrate, barium bromide, barium formate, and the like.
上記安定化剤は、単独でも或いは2種以上を併用しても
良い。また、安定化剤は、粗AMSに対して少量を添加
すれば良く、より好ましくは粗AMS中のAMSの10
0重量部に対して0.2〜5重量部程度使用するのがよ
い。The above stabilizers may be used alone or in combination of two or more. Further, the stabilizer may be added in a small amount to the crude AMS, more preferably 10% of the AMS in the crude AMS.
It is preferable to use about 0.2 to 5 parts by weight relative to 0 parts by weight.
本発明の方法は、例えば、過剰のアクリロニトリルと濃
硫酸又は発煙硫酸とを混合12、この混合液にガス状の
イソブチンを攪拌下吹き込み、必要ならば少量の水を加
えて製造される粗AMS等の公知方法により製造される
粗AMSの全てに適用できる。本発明の実施に特に好適
な粗AMSは、上記公知のAMSの製造方法において反
応系に成る種の添加剤及び必要に応じ相溶剤を存在せし
めて反応を進行さして得られるAMSである。斯かる添
加剤及び必要に応じ相溶剤を用いる方法は、本発明者に
より開発された方法であり、従来法に比1.て純度の高
いAMSが得られ、これを本発明に従い精製することに
よって著しく高純度のAMSを得ることが可能となる。The method of the present invention includes, for example, crude AMS produced by mixing excess acrylonitrile and concentrated sulfuric acid or fuming sulfuric acid 12, blowing gaseous isobutyne into this mixture under stirring, and adding a small amount of water if necessary. It can be applied to all crude AMS produced by the known method. Particularly suitable crude AMS for carrying out the present invention is AMS obtained by proceeding the reaction in the above-mentioned known AMS production method in the presence of additives and, if necessary, a compatibilizer, which form the reaction system. The method using such additives and, if necessary, a compatibilizer is a method developed by the present inventor, and is 1.0% lower than the conventional method. AMS of high purity is obtained, and by purifying this according to the present invention, it becomes possible to obtain AMS of extremely high purity.
上記方法において添加剤と1.では、本発明の精製方法
に用いられる前記式1で表される化合物又はその酸付加
塩(a)及び式■で表される化合物又はその酸付加塩(
b)が用いられる。またこれらに代えて還元性無機化合
物を用いることができる。これらの添加剤は、1種又は
2種以上混合して用いることができる。a)及びb)の
化合物と1〜では、前記例示と同一のものが挙げられ、
上記還元性無機化合物と17では、例えば亜硫酸ナトリ
ウム、亜硫酸水素ナトリウム、チオ硫酸ナトリウム、ハ
イドロサルファイ!・すトリウム、亜硫酸カリウム、亜
硫酸水素カリウム、チオ硫酸カリウム、ハイドロザルフ
ァイトカリウム等が挙げられる。In the above method, the additive and 1. Now, the compound represented by formula 1 or its acid addition salt (a) used in the purification method of the present invention and the compound represented by formula 2 or its acid addition salt (a)
b) is used. Moreover, reducing inorganic compounds can be used instead of these. These additives can be used alone or in combination of two or more. Compounds a) and b) and 1- are the same as those exemplified above,
The above reducing inorganic compounds and 17 include, for example, sodium sulfite, sodium hydrogen sulfite, sodium thiosulfate, hydrosulfite! - Examples include storium, potassium sulfite, potassium hydrogen sulfite, potassium thiosulfate, potassium hydrozulfite, etc.
添加剤の配合比は、反応系内のアクリロニトリル量に対
(7てO,]−重重篤以上、好ま1.<は0.1〜3゜
0重量%程度どするのが良い。また相溶剤と17では、
それ自体反応系に可溶で17かも添加剤を溶解する非水
系極性溶媒が有効であり、具体的にはテトラヒドロフラ
ン、1,4−ジオキサン、N、N−・ジメチルホルムア
ミド、ジメチルスルホキシド、酢酸、無水酢酸、炭素数
1〜5の脂肪族カルボン酸又はその無水物等を使用する
ことができるが、用いる添加剤の種類により適宜選択さ
れ、その配合比も同様に適宜選択されるが、通常反応系
内のアクリロニトリル量に対I7て0.3〜10.0重
量%程度とするのが良い。AMS製造反応条件は公知条
件をそのまま採用すればよ(、即ち、アクリロニトリル
及び濃硫酸又は発煙硫酸の一方又は双方に予め添加剤及
び必要に応じ相溶剤を加えて溶解させた後、両者を混合
し、これにイソブチンを供給して20〜50℃程度の温
度で反応させれば良い。アクリロニトリルと濃硫酸又は
発煙硫酸の混合は、従来法でCj、−コ、0℃以下に冷
却I7て行う必要があったが、添加剤を用いることによ
り約1.5℃以下、殊に0〜10℃という従来法に比し
て有利な温度で混合することができる。The blending ratio of the additive is preferably 0.1 to 3.0% by weight, preferably 0.1 to 3.0% by weight, based on the amount of acrylonitrile in the reaction system. and 17,
Non-aqueous polar solvents that are soluble in the reaction system themselves and can dissolve additives are effective; specifically, tetrahydrofuran, 1,4-dioxane, N,N-dimethylformamide, dimethyl sulfoxide, acetic acid, anhydrous Acetic acid, aliphatic carboxylic acids having 1 to 5 carbon atoms, or their anhydrides, etc. can be used, but they are selected as appropriate depending on the type of additive used, and the blending ratio thereof is also selected as appropriate, but usually the reaction system The amount of I7 is preferably about 0.3 to 10.0% by weight based on the amount of acrylonitrile in the composition. Known conditions can be used as they are for the AMS production reaction conditions (i.e., additives and, if necessary, a compatibilizer are added to and dissolved in acrylonitrile and one or both of concentrated sulfuric acid and fuming sulfuric acid, and then the two are mixed. It is sufficient to supply isobutyne to this and react at a temperature of about 20 to 50°C.The mixing of acrylonitrile and concentrated sulfuric acid or fuming sulfuric acid must be carried out by the conventional method by cooling to below 0°C. However, by using additives, it is possible to mix at a temperature of about 1.5°C or lower, particularly 0 to 10°C, which is more advantageous than the conventional method.
本発明の精製方法では、公知方法又は本発明者が見出だ
した上記方法で製造された粗AMSを前記a)〜C)の
安定化剤の存在下濃酢酸で熱時抽出して、その後、室温
程度まで冷却して結晶を濾取し、必要があれば酢酸で洗
浄後、乾燥して、AMSの精製物を得る。In the purification method of the present invention, crude AMS produced by a known method or the above method discovered by the present inventor is hot extracted with concentrated acetic acid in the presence of the stabilizers a) to C) above, and then, Cool to room temperature and collect crystals by filtration, wash with acetic acid if necessary and dry to obtain purified AMS.
本発明の方法における抽出温度は、約80℃以」二とす
るのが良く、より好ましくは90〜100℃の範囲であ
る。The extraction temperature in the method of the present invention is preferably about 80°C or higher, more preferably in the range of 90 to 100°C.
また、抽出時間は、酢酸の濃度、安定剤の種類、それら
の配合比等の抽出条件の違いにより適宜選択されるが、
通常は、約80分程度で良い。In addition, the extraction time is appropriately selected depending on the extraction conditions such as the concentration of acetic acid, the type of stabilizer, and their blending ratio.
Normally, about 80 minutes is sufficient.
本方法において、結晶を濾取した後の濾液中に含まれる
酢酸は、単蒸留により回収1.て再利用することができ
、経済的である。In this method, acetic acid contained in the filtrate after filtering the crystals is recovered by simple distillation.1. It can be reused and is economical.
発明の効果
本発明の方法において、AMSは、従来の方法に比1.
て極めて高純度且つ高収率で得られ、各種用途に好適に
用いられ、またその用途の拡大を図り得る。Effects of the Invention In the method of the present invention, AMS has an improvement of 1. compared to the conventional method.
It can be obtained with extremely high purity and high yield, and can be suitably used in various applications, and can be used to expand its applications.
実施例 以下実施例により本発明を更に詳細に説明する。Example The present invention will be explained in more detail with reference to Examples below.
尚、各的中、安定化剤の添加率とは、その添加重量を投
入AMS粗結晶中のAMSの重量に対して百分率で表し
たものを、またAMSの変質損失率とは、投入AMS粗
結晶中のAMSの重量と抽出後の全検出AMS重量との
差を投入AMS粗結晶中のAMS17)重合に対して百
分率で表したちのを意味する。In addition, for each hit, the addition rate of the stabilizer is the addition weight expressed as a percentage of the weight of AMS in the input AMS crude crystals, and the alteration loss rate of AMS is the addition rate of the stabilizer added as a percentage of the weight of AMS in the input AMS crude crystals. It means the difference between the weight of AMS in the crystals and the weight of the total detected AMS after extraction, expressed as a percentage of AMS17) polymerization in the input AMS crude crystals.
参考例(AMS粗結晶の製造)
攪拌機、滴下ロート、温度計及びガス吹き込み管を備え
た反応器に乾燥したアクリロニトリル360g、尿素3
.6g及び無水酢酸10gを仕込み室温にて30分間攪
拌した・
攪拌下内温を0°Cまで冷却(7、〕、0%発煙硫酸(
硫酸90%、三酸化イオウ1.0%)97゜2gを滴下
口・−1・より30分を要して、内温0=10℃に維持
I−ながら滴下混合した。Reference Example (Production of AMS Crude Crystals) 360 g of dried acrylonitrile and 3 mL of urea were placed in a reactor equipped with a stirrer, a dropping funnel, a thermometer, and a gas blowing tube.
.. 6g of acetic anhydride and 10g of acetic anhydride were charged and stirred at room temperature for 30 minutes.While stirring, the internal temperature was cooled to 0°C (7), and 0% fuming sulfuric acid (
97.2 g of sulfuric acid (90% sulfuric acid, 1.0% sulfur trioxide) was added dropwise and mixed from the dropping port -1 over 30 minutes while maintaining the internal temperature at 0 = 10°C.
この混合液中にイソブチンガス62.5gを内温30〜
40℃にて1時間を要して吹き込み、その後この温度に
て]1時間攪拌放置した。Add 62.5g of isobutine gas to this mixture at an internal temperature of 30~
Bubbling was carried out at 40° C. for 1 hour, and the mixture was left stirring at this temperature for 1 hour.
反応終了液に水2、Ogを加え、内温20℃まで冷却(
また後に、生成結晶を濾取(2、アクリロニトリルで洗
浄し、乾燥して白色のAMS粗結晶18]、、、3gを
得た。Add 2 Og of water to the reaction completed solution and cool to an internal temperature of 20°C (
Later, the produced crystals were collected by filtration (2. Washed with acrylonitrile and dried to obtain 3 g of white AMS crude crystals 18).
得られるAMSの収率は発煙硫酸に対して86.7%、
純度は95.2%であった。The yield of AMS obtained was 86.7% based on fuming sulfuric acid,
Purity was 95.2%.
実施例〕。Example〕.
攪拌機、冷却還流器及び温度計を備えた〕、Qのガラス
製反応器に、上記参考例で得られたA M S粗結晶1
50.0g及び98%氷酢酸750gを仕込み、更に尿
素を添加率3%で加えた。A M S crude crystal 1 obtained in the above reference example was placed in a glass reactor Q (equipped with a stirrer, a cooling reflux device, and a thermometer).
50.0 g and 750 g of 98% glacial acetic acid were charged, and urea was further added at an addition rate of 3%.
このスラリーを撹拌1.なから100℃まで加熱し、こ
の温度で1時間抽出した後、室温まで冷却I7た。結晶
を濾取し、氷酢酸50m1で洗浄後、乾燥した。Stir this slurry 1. After heating to 100° C. and extracting at this temperature for 1 hour, the mixture was cooled to room temperature. The crystals were collected by filtration, washed with 50 ml of glacial acetic acid, and then dried.
得られたAMSの結晶は白色で、その収量は143.7
g (収得率95.8%)であった。このA M Sの
純度は98.2%で、その変質損失は0.6%であった
。The AMS crystals obtained were white, and the yield was 143.7
g (yield rate 95.8%). The purity of this AMS was 98.2% and its degradation loss was 0.6%.
実施例2〜11及び比較例]
実施例1において、安定剤及び抽出温度・時間を第1表
に示lまた条件に代え、その信置様に抽出し、処理を行
なった。その結果を第1表に示す。Examples 2 to 11 and Comparative Examples] In Example 1, the stabilizer and extraction temperature and time were changed to those shown in Table 1, and the extraction and treatment were carried out according to the conditions. The results are shown in Table 1.
Claims (1)
ン酸を精製するに当り、a)式 IR_1−NH−R_2 [式中R_1及びR_2は、同一又は異なって、水素、
アミノ基、アルキル基、置換基としてアミノ基を有する
アルキル基、アリール基、もしくはフェニル低級アルキ
ル基を示す。]で表される化合物又はその酸付加塩、b
)式II▲数式、化学式、表等があります▼ [式中、R_1及びR_2は上記と同じ意味を有する。 R_1とR_2とが互いに結合して基−CH_2CH_
2−NH−を形成してもよい。 R_3は水素、低級アルキル基、水酸基もしくは基−N
=C(CH_3)_2を示す。Yは酸素原子又は硫黄原
子を示す。] で表される化合物又はその酸付加塩、及びc)無機酸又
は有機酸のカルシウム塩又はバリウム塩から選ばれた少
なくとも1種の安定化剤の存在下に濃酢酸を抽出溶媒と
して熱時抽出を行うことを特徴とする2−アクリルアミ
ド−2−メチルプロパンスルホン酸の精製方法。[Claims] [1] In purifying 2-acrylamido-2-methylpropanesulfonic acid, a) formula IR_1-NH-R_2 [wherein R_1 and R_2 are the same or different, hydrogen,
An amino group, an alkyl group, an alkyl group having an amino group as a substituent, an aryl group, or a phenyl lower alkyl group. ] or its acid addition salt, b
) Formula II ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [In the formula, R_1 and R_2 have the same meanings as above. R_1 and R_2 bond to each other to form a group -CH_2CH_
2-NH- may also be formed. R_3 is hydrogen, lower alkyl group, hydroxyl group, or group -N
=C(CH_3)_2 is shown. Y represents an oxygen atom or a sulfur atom. ] or an acid addition salt thereof, and c) hot extraction using concentrated acetic acid as an extraction solvent in the presence of at least one stabilizer selected from calcium salts or barium salts of inorganic acids or organic acids. A method for purifying 2-acrylamido-2-methylpropanesulfonic acid, the method comprising:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21545189A JPH0377860A (en) | 1989-08-21 | 1989-08-21 | Purification of 2-acylamido-2-methylpropanesulfonic acid |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21545189A JPH0377860A (en) | 1989-08-21 | 1989-08-21 | Purification of 2-acylamido-2-methylpropanesulfonic acid |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0377860A true JPH0377860A (en) | 1991-04-03 |
Family
ID=16672585
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21545189A Pending JPH0377860A (en) | 1989-08-21 | 1989-08-21 | Purification of 2-acylamido-2-methylpropanesulfonic acid |
Country Status (1)
Country | Link |
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JP (1) | JPH0377860A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008190655A (en) * | 2007-02-06 | 2008-08-21 | Jtekt Corp | Sealing device |
WO2013079507A3 (en) * | 2011-11-29 | 2013-08-22 | Basf Se | Method for producing and purifying salts of acrylamido-2-methylpropane sulfonic acid |
US9073826B2 (en) | 2011-11-29 | 2015-07-07 | Basf Se | Process for preparing and purifying salts of acrylamido-2-methylpropanesulfonic acid |
US20180244609A1 (en) * | 2015-09-18 | 2018-08-30 | S.P.C.M. Sa | Method for producing the 2-acrylamido-2-methylpropane sulfonic acid monomer and polymer comprising said monomer |
-
1989
- 1989-08-21 JP JP21545189A patent/JPH0377860A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008190655A (en) * | 2007-02-06 | 2008-08-21 | Jtekt Corp | Sealing device |
WO2013079507A3 (en) * | 2011-11-29 | 2013-08-22 | Basf Se | Method for producing and purifying salts of acrylamido-2-methylpropane sulfonic acid |
US9073826B2 (en) | 2011-11-29 | 2015-07-07 | Basf Se | Process for preparing and purifying salts of acrylamido-2-methylpropanesulfonic acid |
US20180244609A1 (en) * | 2015-09-18 | 2018-08-30 | S.P.C.M. Sa | Method for producing the 2-acrylamido-2-methylpropane sulfonic acid monomer and polymer comprising said monomer |
US10662149B2 (en) * | 2015-09-18 | 2020-05-26 | S.P.C.M. Sa | Method for producing the 2-acrylamido-2-methylpropane sulfonic acid monomer and polymer comprising said monomer |
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