JPH0373434U - - Google Patents
Info
- Publication number
- JPH0373434U JPH0373434U JP13577489U JP13577489U JPH0373434U JP H0373434 U JPH0373434 U JP H0373434U JP 13577489 U JP13577489 U JP 13577489U JP 13577489 U JP13577489 U JP 13577489U JP H0373434 U JPH0373434 U JP H0373434U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- etching
- lower electrode
- processing chamber
- loaded
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 claims 2
- 238000001020 plasma etching Methods 0.000 claims 1
- 230000005684 electric field Effects 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13577489U JPH0373434U (en, 2012) | 1989-11-21 | 1989-11-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13577489U JPH0373434U (en, 2012) | 1989-11-21 | 1989-11-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0373434U true JPH0373434U (en, 2012) | 1991-07-24 |
Family
ID=31683019
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13577489U Pending JPH0373434U (en, 2012) | 1989-11-21 | 1989-11-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0373434U (en, 2012) |
-
1989
- 1989-11-21 JP JP13577489U patent/JPH0373434U/ja active Pending