JPH0370497B2 - - Google Patents

Description

[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to an ophthalmological phototherapy device used to locally coagulate or incise the fundus, vitreous body, or erythema, and more specifically to an ophthalmological phototherapy device equipped with a slit lamp microscope. Regarding phototherapy equipment.

[Prior art]

As an example of a conventional ophthalmic treatment device equipped with a slit lamp microscope, the one shown in FIG. 1 that uses an argon laser as the irradiation light source is known. That is, as shown in FIG.
a binocular stereoscopic microscope system 10 pivoted around O';
It consists of an irradiation optical system 20 that irradiates a light beam for phototherapy, and a slit illumination optical system 30 that slit-illuminates the eye to be examined.

The binocular stereomicroscope system 10 includes an objective lens 12 and an eyepiece lens 14, and is used to observe a point P. The irradiation optical system 20 converts the laser beam emitted from the output end 22 of an optical fiber provided to guide the argon laser beam to the optical system, and converts the optical axis of the laser beam into a binocular object using a projection lens 24 and a mirror 26. The point P is irradiated coaxially with the optical axis of the microscope system 10. The slit illumination optical system 30 allows the light beam emitted from the light source lamp 32 to pass through a mirror 34 and a condenser lens 35, then through a variable slit diaphragm 36, and then to an objective lens 37, a semicircular auxiliary objective lens 38, and mirrors 40, 42. The image of the slit 36 is thus focused on the point P.

Here, the semicircular auxiliary objective lens 38 has a luminous flux of 4
By compensating for the difference in optical path length between 44 and 46, both light beams 44 and 46
However, since the projection magnifications of the two light beams 44 and 46 are different, the slit image is observed as a double image, making it unsuitable as a slit lamp. . In addition, in order to solve this problem, mirrors 40, 42
It is conceivable to eliminate either one of them and project the slit image using only one of the light beams 44 and 46, but this creates a new problem of insufficient light quantity for the slit image. Furthermore, in order to solve this problem of insufficient light quantity, the entire slit projection light beam, that is, the combination of both light beams corresponding to the light beams 44 and 46 may be reflected by either mirror 40 or 42 and projected. In this case, a problem arises in that the slit image is tilted with respect to the image plane of point P. This problem did not pose a major problem when this device was conventionally used only for the treatment of ocular fundus diseases, but recently, ophthalmic phototherapy devices have been used to treat ocular diseases before iridectomy. As a result, it is strongly desired that the slit image plane coincide with a plane perpendicular to the optical axis of the binocular stereomicroscope at point P.

As another example of a conventional ophthalmic phototherapy device equipped with a slit lamp microscope, a device using a pulsed laser as a therapeutic light source has been proposed. As shown in the side view of FIG. 2 and the plan view of FIG. 3, this device includes a binocular stereoscopic microscope system 110, an irradiation optical system 130, and a slit illumination optical system 150, similar to the conventional phototherapy device described above. It consists of.

The binocular stereomicroscope system 110 includes an objective lens 112
and eyepiece lenses 114, and the viewing angle α of the binoculars is 13° to 15°. The binocular stereomicroscope system 110 has a front position shown by a solid line in FIG. 3, an imaginary line 116,
The binocular stereomicroscope system, which is movable to the left and right positions indicated by 118 and located at the front position 110, the left position 116, and the right position 118, includes a dichroic mirror 120 and optical path length correction plates 122 and 124, respectively, which will be described later. . Optical path length correction plate 1
22, 124 have the same optical path length as the dichroic mirror 120, and are located at left and right positions 116, 118.
The optical path length of the binocular stereoscopic microscope system at the front position 11
The optical path length is made to match the optical path length at 0.

The irradiation optical system 130 uses a YAG laser (YAG Laser) of invisible light with high energy as a light source 131.
Because it is used as
It is necessary to make the above-mentioned angle of view approximately equal to 13° to 15° at zero. The therapeutic light beam emitted from the light source 131 is focused on a point P coaxially with the optical axis of the binocular stereoscopic microscope system 110 via a group of condensing lenses 132 and 133 and a dimeroic mirror 120. The dichroic mirror 120 is a binocular stereomicroscope 110
visible light is transmitted therethrough, and invisible laser light from the irradiation optical system 130 is irradiated.

The slit illumination system 150 converts the light beam emitted from the light source 152 into a condenser lens 154, as in the conventional example described above.
Binocular stereomicroscope system 110 via variable slit diaphragm 156, projection lens 158 and mirror 160
A slit image is formed by reaching point P coaxially with the point P. Note that the mirror 160 is arranged so as to be located between the binocular light beams of the binocular stereoscopic microscope system 110 located at the front position.

In the ophthalmological phototherapy device having the above configuration, since the binocular stereoscopic microscope system 110 passes through the obliquely disposed dichroic mirror 120 in a converging state, there is a tendency that a good observation image cannot be obtained by the binocular stereoscopic microscope system 110. Furthermore, since the binocular stereoscopic microscope system 110 requires optical path length correction regarding the dichroic mirror 120, the front position 110 and the left and right positions 116 and 11 where the optical path length correction plates 122 and 124 are located
8, and cannot be observed at intermediate positions other than these, and the optical path length correction plate 1
22 and 124, there is a problem that the operator's work space is limited. On the other hand, since the slit illumination optical system 150 also passes through the dichroic mirror 120, there are problems in that it is difficult to obtain a good slit image and the amount of light is insufficient. Furthermore, the light beams from the irradiation optical system 130 and the binocular stereoscopic microscope system 110 are transferred to a dichroic mirror 120.
Since it is a coaxial system, there is a problem that visible light cannot be used in the irradiation optical system.

[Purpose of the invention]

The present invention was made in view of the above-mentioned problems of the conventional ophthalmic phototherapy device equipped with a slit lamp microscope, and its first purpose is to ensure that the image plane of the slit of the slit irradiation optical system coincides with the optical axis of the binocular stereomicroscope. It is an object of the present invention to provide an ophthalmological phototherapeutic device that can project a sharp slit image that coincides with an observation image plane forming a right angle.A second object of the present invention is to provide a working space and an observation optical system that are almost the same as those of a general slit lamp. An object of the present invention is to provide an ophthalmologic phototherapy device that can guarantee a degree of freedom in observation angle for observing a treated area.

[Structure of the invention]

The present invention has the following structural features in order to achieve the above object. That is, the present invention provides a binocular stereoscopic microscope optical system, a slit illumination system having a light source for slit illumination, a slit aperture, a first objective lens for projecting the slit aperture, a light source for phototherapy, and a light source for phototherapy. an irradiation optical system having a second objective optical system for projecting a light beam for phototherapy emitted from the binocular stereoscopic microscope optical system; the first objective lens of the slit illumination system and the second objective lens of the irradiation optical system;
At least one of the objective lenses is arranged such that its optical axis is decentered with respect to the optical axis of the auxiliary optical member, and is configured to direct the slit diaphragm or the light therapy light source toward the auxiliary optical member and map it to infinity. be done.

Therefore, the slit image or therapeutic light source image formed by the light beam passing through the decentered optical system is formed on a plane perpendicular to the optical axis of the binocular stereomicroscope, and the image quality can be extremely good.

In addition, there is no need to complicate the optical configuration on the exit side of the illumination or irradiation optical system as in the past.
The allowable range of the working space and the rotating observation position of the microscope section for observing the treated area can be increased to the same level as that of a general slit lamp.

〔Example〕

Embodiments of the present invention will be described below based on the drawings.

First Embodiment As shown in FIG. 4, the first embodiment includes a binocular stereoscopic microscope system 310 and an auxiliary optical system disposed above a mirror 314 disposed on the optical axis 312 of the binocular stereoscopic microscope system 310. It consists of a certain convex lens 318, a slit illumination optical system 320 and an irradiation optical system 322, which are arranged eccentrically with respect to the convex lens 318.

The binocular stereoscopic microscope system 310 is arranged so as to be rotatable around a point P, which is the treated area, and as shown in FIG. 5, the left and right microscope systems 324 and 326 have a common objective lens 328. A mirror 314 is arranged between the optical axes 330 and 332 of the left and right microscope systems 324 and 326, which emit a point P and enter an objective lens 328.

The convex lens 318 is arranged so that its focal point is at a point P, and its optical axis 316 is connected to the binocular stereoscopic microscope system 3.
It is arranged so as to coincide with the optical axis 312 of No. 10.

The slit illumination optical system 320 includes a light source 340, a focusing lens 342, a variable slit aperture 344, and an objective lens 346 arranged on a slit illumination optical axis 348, and the focusing lens 342 focuses the light beam emitted from the light source 340. Variable slit aperture 3
44, the variable slit diaphragm 344 is located at the focal point of the objective lens 346, and is therefore imaged to infinity by the objective lens 346. The slit illumination system 320 is formed as a decentered optical system whose optical axis 348 is parallel to and offset from the optical axis 316 of the convex lens 318 . Therefore, in the above configuration, the light beam passing through the variable slit diaphragm 344 is directed to the objective lens 34.
6. The convex lens 318 and the mirror 314 reach the point P and form an image, but the mirror 3 is on the image plane.
The optical axis 316 of the convex lens 318 reflected by the lens 14 intersects at right angles.

Note that, as described above, since this optical axis 316 is coaxial with the optical axis 312 of the microscope 310, in the end,
The slit image plane can be orthogonal to the optical axis 312.

The irradiation optical system 322 includes a visible light irradiation light source 360
For example, the output end of an optical fiber that guides the argon laser beam and the objective lens 362 are arranged on the irradiation optical axis 364, and the irradiation light source 36
0 is placed at the focal point of the objective lens 362, and the light source is mapped to infinity. The irradiation optical system 360 has an optical axis 364 that is the slit illumination optical axis 3.
48, a decentered optical system is formed which is arranged parallel to and offset from the optical axis 316 of the convex lens 318. Therefore, with the above configuration, the light beam emitted from the irradiation light source 360 reaches the point P and is imaged by the objective lens 362, the convex lens 318, and the mirror 314, and the image plane is bent by the mirror 314. The optical axis 31 of the convex lens 318
Intersects 6 at a right angle. As a result, similarly to the slit illumination system, the image plane is set to the optical axis 3 of the microscope system 310.
It is also perpendicular to 12.

In the first embodiment, both the slit illumination optical system and the irradiation optical system form decentered optical systems.
As a modification thereof, only either the slit illumination optical system or the irradiation optical system may be formed as an eccentric optical system.

Second Embodiment In the first embodiment, as shown in FIG. 5, regarding the slit irradiation optical system 320 and the irradiation optical system 322, the width of the luminous flux at the position reflected by the mirror 314 was approximately equal; In this embodiment, in the case shown in FIGS. 6 and 7 where the luminous flux of the irradiation optical system 322 is extremely large compared to the slit illumination optical system 320 at the same location, that is, in order to protect the affected eye from the irradiation luminous flux, the irradiation optical system is This is the case when the solid angle is increased.

In FIGS. 6 and 7, a light beam 400 from the slit illumination optical system is converted into an infinitely mapped light beam by an objective lens 402, and is transferred to a dichroic mirror 404.
After passing through, the light reaches point P via a convex lens 406 and mirror 408, and forms a slit image (the slit light forming means is not shown because it is the same as in the first embodiment). On the other hand, an invisible light beam 410 from, for example, a YAG laser light source (not shown) in the irradiation optical system is turned into an infinitely mapped light beam by an objective lens 412, reflected by a dichroic mirror 404, and then transferred to a convex lens 406 and a mirror 408. The light is focused on point P via . Furthermore, as shown in FIG. 6, the observation light beam 420 of the binocular stereoscopic microscope system passes through the mirror 408 on both sides of the light beam 400 of the slit illumination optical system, and the microscope system 324, 3
26 through an objective lens 328. As shown in FIG. 6, the mirror 408 has an inverted battledore shape, and reflects the light beam 400 from the slit illumination optical system at its narrow upper part, and reflects the invisible light beam from the illumination optical system at its wide lower part. Reflect 410. Therefore, in this embodiment, as shown in FIG. 8A, although an extremely wide illumination light beam is used compared to the conventional one, the light beam 420 of the binocular stereoscopic microscope system is transmitted through the slit illumination optical system. It passes through both sides of the beam 400 of the system. In this embodiment, the optical axis of the slit illumination optical system is coaxial with the optical axis of the convex lens 406, which is an auxiliary optical member, and only the optical axis of the irradiation optical system is decentered from the optical axis of the convex lens 406. As a result, the large-area reflecting portion of the mirror 408 that reflects the irradiation light beam having a large beam width can be transferred to the microscope 32.
It can be made to project downward from the plane D including the 4,326 optical axes 330, 332, and can be configured so that only the small area portion that reflects the slit illumination light beam having a narrow beam width intersects the plane D. As a result, as shown in FIG. 8B, even if the binocular stereoscopic microscope system 310 is turned left and right to the same degree as a general slit lamp, one of the observation light beams 420 will be reflected by the small area portion of the mirror 408 that reflects the slit illumination light. Oblique observation is possible by moving the microscope 310 until interference occurs.

Third Embodiment When the mirror 314 of the first embodiment and the mirror 408 of the second embodiment become larger and require a larger space in the optical axis direction of the binocular stereomicroscope, the distance from point P to the operator increases. This reduces the operator's work efficiency. To prevent this, the mirror 314 or 40
In the third embodiment, a mirror corresponding to 8 is divided into two to make it smaller.

In FIG. 9, a mirror 506 of a slit illumination optical system 504 and an illumination optical system 5 are arranged on both sides of the optical axis 502 of a binocular stereoscopic microscope system 500 in the vertical direction.
08 mirrors 510 are arranged. The slit illumination optical system 504 includes a convex lens 5 which is an auxiliary optical member.
It includes 12. The objective lens 520 of the slit illumination optical system acts to form an infinity mapping light beam of a variable slit diaphragm (not shown), and forms a decentered optical system arranged with its optical axis 521 decentered with respect to the convex lens 512. ing. Since the optical axis 513 of the convex lens 512 coincides with the reflective optical axis 502 of the mirror 506 and the optical axis 502' of the binocular stereoscopic microscope system, the slit image is formed perpendicular to the optical axis 502. On the other hand, the irradiation optical system 508 does not need to include a decentered optical system because the light is focused on a spot with a minute area at the imaging point P, and so-called tilting of the image does not pose a problem. Further, a support arm 5 supports the binocular stereoscopic microscope system 500, the slit illumination optical system 504, and the irradiation optical system 508, respectively.
By configuring the components 01, 505, and 509 to be able to rotate independently about the vertical axis that includes point P, the microscope system 500, slit illumination optical system 504, and irradiation optical system 508 can be rotated independently of each other around point P. This increases the degree of freedom in the series of diagnostic and therapeutic tasks.

In the first to third embodiments described above, the convex lens 512, which is an auxiliary optical member, and the objective lens 328 of the binocular stereoscopic microscope optical system are used together, and the objective lens of the slit illumination optical system or the irradiation optical system is placed inside the microscope optical system. A configuration may be adopted in which the optical axis of the objective lens 328 is eccentrically incorporated.

Fourth Embodiment The fourth embodiment is an embodiment for clearly projecting the slit onto the treated area without using the convex lens 512, which is the auxiliary optical member of the third embodiment. That is, in FIG. 10, the slit illumination optical system 6
00 is a variable slit diaphragm 602 and an objective lens 6
04, and the optical axis 60 of the binocular stereoscopic microscope system 606
8 includes a mirror 610 located on one side of the 8. Variable slit aperture 602 and point P are conjugate with respect to objective lens 604, and
4 is inclined with respect to a plane perpendicular to the optical axis 612 of the slit illumination optical system 600 by an angle θ ₂ to be explained below. That is, the optical axis 620 of the slit illumination optical system 600 reflected by the mirror 610 is inclined by θ ₁ with respect to the optical axis 608 of the binocular stereoscopic microscope system 606, and the variable slit aperture in the virtual image P' by the mirror 610 at point P is Image plane 62 of virtual image 602
2 and the plane 624 of the variable slit diaphragm 602 so that the main plane 626 of the objective lens 604 passes through _it . This is an arrangement based on the shear-proof principle. With this configuration, the variable slit aperture image at point P is perpendicular to the optical axis 608 of the binocular stereoscopic microscope system 606. Thereby, the slit can be clearly projected onto the treated area.

Note that in this embodiment, the irradiation light source has the same configuration as the third embodiment described above, so illustration and description thereof are omitted.

〔Effect of the invention〕

As described in detail above, the present invention allows the slit light flux from the slit illumination system and the light therapy light flux from the irradiation optical system to be transmitted through the optical member disposed on the affected eye side of the binocular stereomicroscope optical system. Light is guided to the focal position of the binocular stereomicroscope optical system, and at least one of the objective lenses of the slit illumination optical system and the irradiation optical system is an infinite mapping optical system, and the optical axis thereof is coaxial with the optical axis of the binocular stereomicroscope. For the auxiliary optical member having an axis, the slit image or the therapeutic light source image is formed on a plane perpendicular to the optical axis of the binocular stereomicroscope, and the image quality is extremely good.

In addition, since there is no need to complicate the optical configuration on the exit side of the illumination or irradiation optical system as in the past, the allowable range of the working space and the rotation observation position of the microscope section for observing the treated area is the same as that of a general slit lamp. It can be increased to a certain extent.

[Brief explanation of drawings]

Figure 1 is an optical side view of a conventional ophthalmic phototherapy device.
FIG. 2 is an optical side view of another conventional ophthalmic phototherapy device, FIG. 3 is an optical plan view of the ophthalmologic phototherapy device of FIG. 2, and FIG. 4 is an optical side view of the first embodiment of the present invention. figure,
5 is an optical plan view of the first embodiment shown in FIG. 4, FIG. 6 is an optical plan view of the second embodiment of the present invention,
FIG. 7 is an optical side view of the second embodiment shown in FIG. 6, FIG. 8 is an explanatory diagram showing the relationship between each luminous flux of the second embodiment, and FIG. 9 is an optical side view of the second embodiment of the present invention. The side view, FIG. 10, is an explanatory diagram of the optical principle of the fourth embodiment of the present invention. 310... Binocular stereo microscope, 314... Mirror, 318... Convex lens, 320... Slit illumination optical system, 322... Illumination optical system, 324... Left microscope, 326... Right microscope, 344... Variable slit aperture , 360...irradiation light source.

Claims (1)

[Scope of Claims] 1. A binocular stereomicroscope optical system; A slit illumination system having a light source for slit illumination, a slit aperture, and a first objective lens for projecting the slit aperture; A light source for phototherapy, and the phototherapy an irradiation optical system having a second objective optical system for projecting a light beam for phototherapy emitted from a light source; an auxiliary optical member having at least a part of its optical axis aligned with the optical axis of the binocular stereomicroscope optical system; at least the first objective lens of the slit illumination system and the second objective lens of the irradiation optical system; One is arranged so that its optical axis is decentered with respect to the optical axis of the auxiliary optical member, and is configured to direct the slit diaphragm or the light therapy light source toward the auxiliary optical member and map it to infinity. A light therapy device for ophthalmology. 2. The optical axis of the second objective lens of the irradiation optical system is not included in a plane including both optical axes of the binocular stereomicroscope optical system, and intersects with the plane at the object side focal position of the binocular stereomicroscope. An ophthalmic phototherapy device according to claim 1. 3. The ophthalmological device according to claim 1 or 2, wherein a part of the optical axis of the auxiliary optical member and the optical axis of the binocular stereoscopic microscope optical system are made to coincide with each other via a reflective optical member. Light therapy device. 4. The solid angle of the irradiation light beam of the irradiation optical system is approximately equal to or greater than the viewing angle of the binocular stereomicroscope optical system, and the irradiation light beam is at a position other than the object side focal point of the binocular stereomicroscope optical system. The ophthalmologic phototherapy device according to any one of claims 1 to 3, characterized in that it is configured so as not to include the optical axis. 5. The ophthalmologic phototherapy device according to claim 3 or 4, wherein the irradiation optical system and the slit illumination optical system are disposed facing each other with a reflective optical member in between. 6. Claims 1 to 5, characterized in that the irradiation optical system and the slit illumination optical system are configured to be able to rotate with respect to each other about an axis that passes through the object-side focal position of the binocular stereoscopic microscope optical system. The ophthalmological phototherapy device according to any one of the items. 7. A binocular stereomicroscope optical system; A slit illumination system having a light source for slit illumination, a slit diaphragm, and an objective lens for projecting the slit diaphragm; An irradiation optical system for phototherapy, comprising:
The ophthalmic phototherapy device, wherein the objective lens is arranged such that its principal plane intersects with a line of intersection between a plane surrounding the slit diaphragm and an image plane of the slit diaphragm formed by the objective lens.