JPH0365540B2 - - Google Patents
Info
- Publication number
- JPH0365540B2 JPH0365540B2 JP57126328A JP12632882A JPH0365540B2 JP H0365540 B2 JPH0365540 B2 JP H0365540B2 JP 57126328 A JP57126328 A JP 57126328A JP 12632882 A JP12632882 A JP 12632882A JP H0365540 B2 JPH0365540 B2 JP H0365540B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- image
- ethylenically unsaturated
- carboxylic acid
- unsaturated carboxylic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- -1 diene compound Chemical class 0.000 claims description 25
- 239000000178 monomer Substances 0.000 claims description 23
- 239000000203 mixture Substances 0.000 claims description 18
- 229920006337 unsaturated polyester resin Polymers 0.000 claims description 15
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 12
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 10
- 150000007519 polyprotic acids Polymers 0.000 claims description 10
- 150000005846 sugar alcohols Polymers 0.000 claims description 10
- 239000003999 initiator Substances 0.000 claims description 6
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 6
- BEFDCLMNVWHSGT-UHFFFAOYSA-N ethenylcyclopentane Chemical compound C=CC1CCCC1 BEFDCLMNVWHSGT-UHFFFAOYSA-N 0.000 claims description 5
- 239000004334 sorbic acid Substances 0.000 claims description 5
- 229940075582 sorbic acid Drugs 0.000 claims description 5
- 235000010199 sorbic acid Nutrition 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical compound C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 claims description 2
- 238000007259 addition reaction Methods 0.000 claims 1
- 239000000470 constituent Substances 0.000 claims 1
- 150000001925 cycloalkenes Chemical class 0.000 claims 1
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 claims 1
- 150000003627 tricarboxylic acid derivatives Chemical class 0.000 claims 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 10
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 9
- 150000002148 esters Chemical class 0.000 description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 7
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 238000007605 air drying Methods 0.000 description 5
- 239000003513 alkali Substances 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- 235000011007 phosphoric acid Nutrition 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 238000005698 Diels-Alder reaction Methods 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 235000011187 glycerol Nutrition 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000012752 auxiliary agent Substances 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 2
- 229940018557 citraconic acid Drugs 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 125000000392 cycloalkenyl group Chemical group 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- FEIQOMCWGDNMHM-KBXRYBNXSA-N (2e,4e)-5-phenylpenta-2,4-dienoic acid Chemical compound OC(=O)\C=C\C=C\C1=CC=CC=C1 FEIQOMCWGDNMHM-KBXRYBNXSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- XVOUMQNXTGKGMA-OWOJBTEDSA-N (E)-glutaconic acid Chemical compound OC(=O)C\C=C\C(O)=O XVOUMQNXTGKGMA-OWOJBTEDSA-N 0.000 description 1
- YQRRSORFUCNQAC-UHFFFAOYSA-N 1,2-dihydroacenaphthylen-5-yl(phenyl)methanone Chemical compound C=1C=C(C=23)CCC3=CC=CC=2C=1C(=O)C1=CC=CC=C1 YQRRSORFUCNQAC-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- 229940058015 1,3-butylene glycol Drugs 0.000 description 1
- XVMVHWDCRFNPQR-UHFFFAOYSA-N 1,5-dinitroanthracene-9,10-dione Chemical compound O=C1C=2C([N+](=O)[O-])=CC=CC=2C(=O)C2=C1C=CC=C2[N+]([O-])=O XVMVHWDCRFNPQR-UHFFFAOYSA-N 0.000 description 1
- RWXMAAYKJDQVTF-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethyl prop-2-enoate Chemical compound OCCOCCOC(=O)C=C RWXMAAYKJDQVTF-UHFFFAOYSA-N 0.000 description 1
- YATYDCQGPUOZGZ-UHFFFAOYSA-N 2-(2-hydroxypropoxy)propan-1-ol;prop-2-enoic acid Chemical compound OC(=O)C=C.CC(O)COC(C)CO YATYDCQGPUOZGZ-UHFFFAOYSA-N 0.000 description 1
- RKYJPYDJNQXILT-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxycarbonyl)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OCCOC(=O)C=C RKYJPYDJNQXILT-UHFFFAOYSA-N 0.000 description 1
- KQEKPFRJQVRENQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxycarbonyl)cyclohex-3-ene-1-carboxylic acid Chemical compound OC(=O)C1CCC=CC1C(=O)OCCOC(=O)C=C KQEKPFRJQVRENQ-UHFFFAOYSA-N 0.000 description 1
- YQZZHMXSIYMFDK-UHFFFAOYSA-N 2-[bis(2-prop-2-enoyloxyethoxy)phosphoryloxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOP(=O)(OCCOC(=O)C=C)OCCOC(=O)C=C YQZZHMXSIYMFDK-UHFFFAOYSA-N 0.000 description 1
- VVPLLZZDAKVSSO-UHFFFAOYSA-N 2-[bis[2-(2-methylprop-2-enoyloxy)ethoxy]phosphoryloxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOP(=O)(OCCOC(=O)C(C)=C)OCCOC(=O)C(C)=C VVPLLZZDAKVSSO-UHFFFAOYSA-N 0.000 description 1
- WAJJFPMYKWCDNI-UHFFFAOYSA-N 2-[hydroxy(2-prop-2-enoyloxyethoxy)phosphoryl]oxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOP(=O)(O)OCCOC(=O)C=C WAJJFPMYKWCDNI-UHFFFAOYSA-N 0.000 description 1
- KXTAOXNYQGASTA-UHFFFAOYSA-N 2-benzylidenepropanedioic acid Chemical compound OC(=O)C(C(O)=O)=CC1=CC=CC=C1 KXTAOXNYQGASTA-UHFFFAOYSA-N 0.000 description 1
- VTSDGYDTWADUJQ-UHFFFAOYSA-N 2-bromoanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Br)=CC=C3C(=O)C2=C1 VTSDGYDTWADUJQ-UHFFFAOYSA-N 0.000 description 1
- FPKCTSIVDAWGFA-UHFFFAOYSA-N 2-chloroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 FPKCTSIVDAWGFA-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical group OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- XFOHWECQTFIEIX-UHFFFAOYSA-N 2-nitrofluorene Chemical compound C1=CC=C2C3=CC=C([N+](=O)[O-])C=C3CC2=C1 XFOHWECQTFIEIX-UHFFFAOYSA-N 0.000 description 1
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 1
- SLJFKNONPLNAPF-UHFFFAOYSA-N 3-Vinyl-7-oxabicyclo[4.1.0]heptane Chemical compound C1C(C=C)CCC2OC21 SLJFKNONPLNAPF-UHFFFAOYSA-N 0.000 description 1
- UBDMWXQCPFTWGN-UHFFFAOYSA-N 4,4-dichloro-1-phenylbutan-1-one Chemical compound ClC(Cl)CCC(=O)C1=CC=CC=C1 UBDMWXQCPFTWGN-UHFFFAOYSA-N 0.000 description 1
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 1
- FYGVLURPKLFVAB-UHFFFAOYSA-N 4-methylcyclohexane-1,2,3-tricarboxylic acid Chemical compound CC1CCC(C(O)=O)C(C(O)=O)C1C(O)=O FYGVLURPKLFVAB-UHFFFAOYSA-N 0.000 description 1
- TYMLOMAKGOJONV-UHFFFAOYSA-N 4-nitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1 TYMLOMAKGOJONV-UHFFFAOYSA-N 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- CUARLQDWYSRQDF-UHFFFAOYSA-N 5-Nitroacenaphthene Chemical compound C1CC2=CC=CC3=C2C1=CC=C3[N+](=O)[O-] CUARLQDWYSRQDF-UHFFFAOYSA-N 0.000 description 1
- GPYZZWFCOCCLQZ-UHFFFAOYSA-N 6-methylcyclohex-3-ene-1,2-dicarboxylic acid Chemical compound CC1CC=CC(C(O)=O)C1C(O)=O GPYZZWFCOCCLQZ-UHFFFAOYSA-N 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- HTIRHQRTDBPHNZ-UHFFFAOYSA-N Dibutyl sulfide Chemical compound CCCCSCCCC HTIRHQRTDBPHNZ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- LUFPJJNWMYZRQE-UHFFFAOYSA-N benzylsulfanylmethylbenzene Chemical compound C=1C=CC=CC=1CSCC1=CC=CC=C1 LUFPJJNWMYZRQE-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 235000019437 butane-1,3-diol Nutrition 0.000 description 1
- MPRJFHVZWIKCOO-UHFFFAOYSA-N butyl prop-2-eneperoxoate Chemical compound CCCCOOC(=O)C=C MPRJFHVZWIKCOO-UHFFFAOYSA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- MRLVVHRZMZDLGR-UHFFFAOYSA-N carboxy 3-phenylprop-2-enoate Chemical compound OC(=O)OC(=O)C=CC1=CC=CC=C1 MRLVVHRZMZDLGR-UHFFFAOYSA-N 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 235000019438 castor oil Nutrition 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- FEIQOMCWGDNMHM-UHFFFAOYSA-N cinnamylideneacetic acid Natural products OC(=O)C=CC=CC1=CC=CC=C1 FEIQOMCWGDNMHM-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- IHLIVAHFDOAPFC-UHFFFAOYSA-N cyclohex-2-ene-1,4-dicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)C=C1 IHLIVAHFDOAPFC-UHFFFAOYSA-N 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- PKAZBZIEOSJIDC-UHFFFAOYSA-N decylsulfanylbenzene Chemical compound CCCCCCCCCCSC1=CC=CC=C1 PKAZBZIEOSJIDC-UHFFFAOYSA-N 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 150000001990 dicarboxylic acid derivatives Chemical class 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 229940105990 diglycerin Drugs 0.000 description 1
- GPLRAVKSCUXZTP-UHFFFAOYSA-N diglycerol Chemical compound OCC(O)COCC(O)CO GPLRAVKSCUXZTP-UHFFFAOYSA-N 0.000 description 1
- YWEUIGNSBFLMFL-UHFFFAOYSA-N diphosphonate Chemical compound O=P(=O)OP(=O)=O YWEUIGNSBFLMFL-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229940093476 ethylene glycol Drugs 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- 229960005150 glycerol Drugs 0.000 description 1
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 239000000944 linseed oil Substances 0.000 description 1
- 235000021388 linseed oil Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 235000019198 oils Nutrition 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- JRWNODXPDGNUPO-UHFFFAOYSA-N oxolane;prop-2-enoic acid Chemical compound C1CCOC1.OC(=O)C=C JRWNODXPDGNUPO-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- DLYUQMMRRRQYAE-UHFFFAOYSA-N phosphorus pentoxide Inorganic materials O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 229960004063 propylene glycol Drugs 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical class C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000003549 soybean oil Substances 0.000 description 1
- 235000012424 soybean oil Nutrition 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000005591 trimellitate group Chemical group 0.000 description 1
- 239000002383 tung oil Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Polyesters Or Polycarbonates (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Description
本発明はプリント配線、平版印刷、凸版印刷あ
るいはオフセツト印刷等の目的に有用な光硬化性
の画像形成用組成物に関するものである。
従来、かかる用途には幾多の組成物が知られて
おり、その代表的な組成は高分子化合物と光重合
性単量体との組合せである。
しかしいずれの場合においても共通する課題は
光重合性単量体の重合が空気、特に酸素の存在に
よつて阻害され重合速度が低下したり硬化膜の硬
度が充分でない等の問題がおこり易いことであ
る。かかる硬化阻害は例えばフオトレジスト版の
製造時において基材のエツチング時にレジスト像
が腐蝕用薬剤に侵され精密な画像の形成を困難に
したり、又フオトレリーフ版の製造時においては
像部が消耗され易く鮮明な印刷を行なうことを不
可能にする等の障害をもたらすことになるので、
実用化に当つては是非解決しなければならないも
のである。
更にもう一つの問題は、光硬化した画像部を洗
浄、除去する際に、長時間を要すのでこれを短縮
化して製版効率の向上を改善しなければならない
点である。
しかるに本発明者等は鋭意研究を重ねた結果、
(A)(イ)エチレン性不飽和カルボン酸と一般式〔X
(−CH=CH)−2Y(但しX,Yはカルボキシル基、
アルキル基、アリール基を示し、XとYが同じ場
合を含まない。)〕で表される鎖状ジエン系化合物
との付加物、(ロ)多塩基酸及び(ハ)多価アルコールを
構成成分とする不飽和ポリエステル樹脂、(B)光重
合可能な不飽和単量体、(C)光重合開始剤とからな
る画像形成用組成物は良好な空乾性を有し酸素の
存在下でも容易に光硬化が進行し充分な硬度の画
像を与えること、更に、一旦光硬化した画像部を
洗浄、除去する必要がある場合には該部をアルカ
リ水溶液によつて洗浄すれば極めて短時間で容易
に溶出させることが出来、製版効率を著しく向上
させ得ること等の新規な事実を見出し本発明を完
成するに到つた。
本発明においては前記の如くエチレン性不飽和
カルボン酸と前記鎖状ジエン系化合物との付加物
を含有する不飽和ポリエステル樹脂を用いる点に
特徴があり、特にエチレン性不飽和ジカルボン酸
とカルボキシル基含有ジエン系化合物との付加物
を使用する場合、その効果が顕著に発揮される。
上記の付加物を用いる場合、不飽和ポリエステル
樹脂中には遊離のカルボキシル基とデイールスア
ルダー反応によつて形成されるシクロアルケン環
とが存在するために空乾性及びアルカリ溶解性が
大巾に向上されるのである。単に、例えば多塩基
酸を大量に導入して遊離カルボキシル基の導入量
を多くしてもアルカリ溶解性は付与されても空乾
性は低下し、充分な硬度の画像は得られない。又
シクロアルケン環のみの導入では空乾性は発揮さ
れてもアルカリ溶解性が充分でない。
本発明の不飽和ポリエステル樹脂の成分である
多塩基酸としては無水マレイン酸、フマール酸、
イタコン酸、テトラヒドロ無水フタル酸、無水フ
タル酸、イソフタル酸、テルフタル酸、アジピン
酸、セバチン酸、トリメリツト酸などがあげられ
る。また多価アルコールとしてはエチレングリコ
ール、プロピレングリコール、グリセリン、ジグ
リセリン、1,3−ブチレングリコール、ジエチ
レングリコール、トリエチレングリコール、ネオ
ペンチルグリコール、ポリエチレングリコール、
ポリプロピレングリコール、トリメチロールエタ
ン、トリメチロールプロパン、ペンタエリスリト
ールなどがある。
更に、エチレン性不飽和カルボン酸と鎖状ジエ
ン系化合物との付加物におけるカルボン酸類とし
ては無水マレイン酸、マレイン酸、フマル酸、O
−カルボキシケイ皮酸、イタコン酸、グルタコン
酸、シトラコン酸、テトラヒドロ(無水)フタル
酸、3−メチルテトラヒドロ(無水)フタル酸、
テトラヒドロテレフタル酸、ベンザル乳酸、ベン
ザルマロン酸、(無水)シトラコン酸等のジカル
ボン酸、更にはクロトン酸、等のモノカルボン酸
が例示される。一方鎖状ジエン系化合物としては
分子内にカルボキシル基を含有するジエンが有用
である。ソルビン酸、シンナミリデン酢酸等が代
表例として挙げられる。
前記の中でもエチレン性不飽和ジカルボン酸と
カルボキシル基含有ジエン系化合物との付加物が
好適に使用され、特に無水マレイン酸とソルビン
酸とのデイールスアルダー反応付加物、即ち6−
メチルシクロヘキサン−1,2,3トリカルボン
酸が最も有用である。
上記の付加物は不飽和ポリエステル樹脂中に
2.5〜50モル%の割合で存在するのが好ましい。
該付加物は分子の末端、あるいは分子鎖中のいず
れに存在しても差支えない。
本発明の不飽和ポリエステル樹脂中には更に多
価アルコールアリルエーテル成分を導入すること
によつてより高度の空乾性が発揮されるのでその
使用が有利である。多価アルコールのアリルエー
テル類としては例えばグリセリン、トリメチロー
ルプロパン、トリメチロールエタンなどのモノま
たはジアリルエーテルあるいはペンタエリスリト
ールのモノ、ジまたはトリアリルエーテル、アリ
ルグリシジルエーテル、アリロキシジシクロペン
タジエン、フエノール−ホルムアルデヒド初期縮
合物の部分アリルエーテル化物の他尿素あるいは
メラミンとホルムアルデヒドとの初期縮合物の部
分アリルエーテル化物が挙げられる。なお不飽和
ポリエステル樹脂を調製する際の変性剤として上
記以外に桐油、亜麻仁油、脱水ヒマシ油、大豆油
などの油あるいはこれらの脂肪酸、あるいは多価
アルコール脂肪酸エステルが適宜使用される。
不飽和ポリエステル樹脂は任意の方法で調製さ
れる。
例えば、多塩基酸、多価アルコール及びエチレ
ン性不飽和カルボン酸、必要に応じて変性剤を常
法に従つて縮合させ、得られたプレポリマー中の
エチレン性不飽和カルボン酸の二重結合に鎖状ジ
エン系化合物をデイールスアルダー反応させる方
法、予めエチレン性不飽和カルボン酸と鎖状ジエ
ン系化合物とを反応させて不加物を調製し、これ
と多塩基酸、多価アルコール、必要に応じ変性剤
とを縮合させる方法等が実施される。
得られる不飽和ポリエステル樹脂は粘稠な液又
は固体である。該樹脂の分子量は特に制限はない
が通常平均分子量が300〜5000、又酸価(KOH、
mg/g)が50〜400好ましくは100〜300のものが
好適に利用される。酸価が50以下では充分なアル
カリ洗浄性が得難く、一方、400以上ではエツジ
ング液用の薬品におかされ易く鮮明な画像が得ら
れなかつたり、又画像部のベタツキが顕著にな
る。
次に、本発明で使用する光重合可能な不飽和単
量体は特に制限はなくラジカル重合が可能な任意
の化合物が用いられる。好適な単量体はエチレン
性不飽和単量体、(ビニル系単量体)でしかも水
酸基又はカルボキシル基等の官能基を含有する化
合物である。官能基としては上記以外にエポキシ
基等も挙げられる。又官能基を含有しないエチレ
ン性不飽和単量体も勿論使用可能であり、これら
は光重合性そのものの性質を利用するよりも、画
像形成膜に弾性をもたせたり、硬度を調整したり
するために助剤的に官能基含有エチレン性不飽和
単量体と併用される。
以下具体的に化合物を説明するが、本発明では
これらに限定されるものではない。
水酸基を含有する単量体としては、2−ヒドロ
キシエチルアクリレート、2−ヒドロキシエチル
メタクリレート、1,4−ブチレングリコールモ
ノアクリレート、ペンタエリスリトールのモノ又
はジ又はトリアクリレート、エチレングリコール
モノアルリレート、ジエチレングリコールモノア
クリレート、プロピレングリコールモノアクリレ
ート、ジプロピレングリコールモノアクリレー
ト、グリセリンのモノ又はジアクリレート、N−
メチロールアクリルアミド、N−メチロールメタ
クリルアミドが挙げられる。
又、カルボキシル基を含有する単量体としては
一般式
で示される(メタ)アクリロイル基含有多塩基酸
エステル(ここでR,a,A,は前記と同様、b
は1〜3の整数、b+c=2〜4の整数、R′は
アルキレン基、フエニレン基、カルボキシル基置
換フエニレン基等を示す。)が挙げられる。該エ
ステルはヒドロキシ(メタ)アクリレートと多塩
基酸との部分エステル化反応で得られるものであ
る。該化合物にはフタル酸モノ(2−アクリロキ
シエチル)エステル
コハク酸モノ(2−アクリロキシエチル)エス
テル
マレイン酸モノ(2−アクリロキシエチル)エ
ステル、
ヘキサヒドロフタル酸モノ(3−アクロリロキ
シエチルエステル)
テトラヒドロフタル酸モノ(2−アクリロキシ
エチル)エステル
トリメリト酸モノ(2−アクリロキシエチル)
エステル
メチルテトラヒドロトリメリト酸モノ(2−ア
クリロキシエチル)エステル
ピロメリト酸モノ(2−アクリロキシエチル)
エステル
及び上記のアクリロイル基をメタアクリロイル
基に置換した各種エステルが挙げられる。
その他使用可能な単量体としてはグリシジルメ
タクリレート、グリシジルアクリレート、アリル
グリシジルエーテル、1−ビニル−3,4−エポ
キシシクロヘキサン、トリメチロールプロパント
リアクリレート、ジエチレングリコールジアクリ
レート、トリエチレングリコールジアクリレー
ト、1,4−ブチレングリコールジアクリレー
ト、1,6−ヘキセングリコールジアクリレー
ト、N−ビニルピロリドン、スチレン、メチルメ
タクリレート、テトラヒドロフランアクリレー
ト、ブトキシアクリレート、シクロヘキシルアク
リレート、フエノキシエチルアクリレート、イソ
ボンネルアクリレート等が例示される。
本発明においては前記した如き各種単量体、特
に(メタ)アクリロキシ基含有多塩基酸部分エス
テルと以下に述べる如きリン酸系単量体を併用す
ると有利である。即ち、本発明の組成物をプリン
ト配線用のレジストインキとして使用する時かか
る単量体の組合せでは銅板等の基材にインクが良
好な接着性を示す上、画像形成後のアルカリ洗浄
が一段と短時間に効果的に行われるからである。
リン酸系単量体と前記重合性単量体の混合比率は
5/100〜50/100が好ましい。
リン酸系単量体を具体的に挙げる。
まず一般式
で示される(メタ)アクリロキシ基含有リン酸エ
ステル(ここでR;水素又はメチル基、A;アル
キレン基又はヒドロキシル置換アルキレン基、
a;1〜3の整数、b;1〜3の整数)が挙げら
れる。該エステルはヒドロキシアルキル(メタ)
アクリレートと塩化ホスホリル又は五酸化リン又
はオルトリン酸等との反応で得られるものであ
る。該化合物にはリン酸モノ(2−アクリロキシ
エチル)エステル
リン酸ジ(2−アクリロキシエチル)エステル
リン酸モノ(2−メタクリロキシエチル)エス
テル
等が挙げられる。
その他、リン酸トリ(2−アクリロキシエチ
ル)エステル、リン酸トリ(2−メタクリロキシ
エチル)エステルも例示される。
光重合開始剤としてはベンゾインメチルエーテ
ル、ベンゾインエチルエーテル、ベンゾインイソ
プロピルエーテル等のベンゾインアルキルエーテ
ル、ジブチルスルフイド、ベンジルスルフイド、
デシルフエニルスルフイドなどの有機イオウ化合
物、ジアゾニウム塩、テトラゾニウム塩或いはこ
れらと塩化亜鉛との複合塩又はその縮合物、アゾ
ビスイソブチロニトリル、メチレンブルーなどの
染料又はこれとp−トルエンスルホネートイオン
などとの組合せ、有機過酸化物、過酸化水素、ピ
リリウム塩又はチアピリリウム塩、アセトフエノ
ン、ベンゾフエノン、ベンジル、フエナントレ
ン、チオキサントン、ジクロルプロピルフエニル
ケトン、アントラキノン、2−クロロアントラキ
ノン、2−ブロムアントラキノン、アントラキノ
ンβ−スルホン酸ソーダ、1,5−ジニトロアン
トラキノン、1,2−ペンザントラキノン、フエ
ナントレンキノン、5−ベンゾイルアセナフテ
ン、5−ニトロアセナフテン、1,4−ナフトキ
ノン、18−フタロイルナフタリン、2−ニトロフ
ルオレン、p−ニトロアニリン、ビクラミドなど
があげられ、これらは1種又は2種以上を組合せ
て用いられる。又上に列挙したものに限られず、
光重合を促進するものはいずれも使用可能であ
る。これらの中ではベンゾインアルキルエーテル
が価格の点、感度の点で特に良い結果を与える。
本発明の組成物において光重合可能な不飽和単
量体は不飽和ポリエステル樹脂に対して20〜500
重量%の割合で用いられる。
又、光重合開始剤は該樹脂に対して1〜10重量
%の範囲で混合使用される。
該組成物は光重合可能な不飽和単量体が溶剤を
兼ねているのでそのまま基材に適用出来るが、必
要であれば揮発性の飽和脂肪酸エステル、ケト
ン、芳香族炭化水素等の有機溶媒、例えば酢酸エ
チル、メチルエチルケトン、トルエンあるいはキ
シレン等で希釈して用いることも出来る。
又、必要に応じて染料、顔料、熱重合禁止剤等
の助剤も併用出来る。
該組成物を用いて画像を形成するに際しては、
亜鉛板、アルミニウム板、銅板、鋼板等の基材に
組成物を塗布し陰画を通して紫外線を照射すると
感光部のみが硬化するので、未感光部をアルカリ
で洗浄除去して像を形成させるか、スクリーン印
刷法にて基板上に画像を形成させたのち、該画像
に紫外線を照射して硬化させれは良い。前者はレ
ジスト版やレリーフ版の製造に適し、後者はプリ
ント配線等の目的に適する。なおスルーホール型
プリント配線版の穴埋め用としても適用される。
レジスト版やプリント配線等では上記の如くし
て得られた基材をエツチングして露出した金属部
分を腐蝕し、更に残存する感光部分をアルカリ洗
浄、除去すれば良く、又レリーフ版やオフセツト
版ではそのまま用いられる。アルカリ洗浄に際し
ては通常、水酸化ナトリウム、水酸化カリウム、
炭酸ナトリウム、炭酸カリウム等のアルカリを
0.1〜5%程度の水溶液として用いる。洗浄操作
はスプレー法、浸漬法等任意の方法が可能であ
る。アルカリの接触時間は5秒〜20秒、接触時の
温度は25〜50℃程度が実用的である。
なお、基材として前記の如き金属板に限らずた
とえば木綿、レーヨン、羊毛、ポリエステル系、
ポリアミド系、ポリビニルアルコール系、ポリア
クリロニトリル系等の合成繊維からなる織布、不
織布の表面にスクリーンを通して画像を形成せし
め、ついで紫外線を照射して硬化させ、適宜染色
等を行つて生地に模様を付すことも可能である。
そのほか基材に紙、合成樹脂シート等を用いるこ
ともある。
光源としては低圧水銀灯、高圧水銀灯、超高圧
水銀灯、カーボンアーク灯、クセノン灯等が用い
られる。
以下、実例を挙げて本発明の組成物を更に詳し
く説明する。
実例 1
無水フタル酸97.9部、イソフタル酸109.8部、
無水マレイン酸172.9部、エチレングリコール
99.6部、プロピレングリコール122.1部を窒素雰
囲気下で220℃、4時間の条件下に縮合させ酸価
48〔KOHmg/g〕のプレポリマーを得た。次いで
このプレポリマーを100℃まで冷却し、ソルビン
酸を197.7部加え150℃で1.5時間反応を行ない酸
価166〔KOHmg/g〕の液状不飽和ポリエステル
樹脂を調製した。
この樹脂100部に、2−ヒドロキシプロピルア
クリレート30部、リン酸ジ(2−アクリロキシエ
チル)エステル15部、硫酸バリウム40部、アエロ
ジル3部、フタロシアニンブルー0.5部、及びイ
ルガキユア651(チバガイギー社製、アセトフエノ
ン系光重合開始剤)2部を混合し、三本ロールで
充分混和して粘度15500CP(B型粘度計、60rpm、
20℃で測定)の画像形成用組成物を得た。
次にこの組成物を用いてプリント基板の銅箔上
にスクリーン印刷法で画像を形成させ、直ちに
80W/cmの出力のUVランプで1秒間照射を行つ
た。
画像塗膜の硬度は鉛筆硬度2Hであり基盤目テ
ストによる密着性は100/100で良好な接着力を示
した。
次にこの試料を塩化第二鉄水溶液で40℃、30分
の条件下にエツチング処理した。画像は充分な耐
薬品性を示した。更に40℃の3%水酸化ナトリウ
ム水溶液をスプレーしたところ8秒後には画像部
が溶解しすぐれたアルカリ洗浄性を示し精密なプ
リント配線回路の像が得られた。
対照例 1
ソルビン酸の使用を省略した不飽和ポリエステ
ルを用いた以外は実例1と同一の実験を行つた。
画像塗膜の硬度はFであつた。
又耐薬品性にもやや難点が認められた。
対照例 2
無水マレイン酸の使用を省略した不飽和ポリエ
ステル樹脂を用いた以外は実例1と同一の実験を
行つた。アルカリ洗浄に40秒もの長時間が必要で
あつた。
実例 2〜7
第1表に示す如き組成物(不飽和ポリエステル
樹脂、重合性単量体のみを変更)を用いて実例1
に準じて画像を形成した。その結果を第1表に示
す。
The present invention relates to a photocurable image forming composition useful for purposes such as printed wiring, planographic printing, letterpress printing or offset printing. Conventionally, many compositions have been known for such uses, and a typical composition is a combination of a polymer compound and a photopolymerizable monomer. However, a common problem in both cases is that the polymerization of the photopolymerizable monomer is inhibited by the presence of air, especially oxygen, which tends to cause problems such as a decrease in the polymerization rate and insufficient hardness of the cured film. It is. Such curing inhibition may occur, for example, during the production of photoresist plates, when the resist image is attacked by corrosive agents during etching of the base material, making it difficult to form precise images, and during the production of photorelief plates, the image area may be worn away. This may cause problems such as making it impossible to print easily and clearly.
This is something that must be solved for practical use. Yet another problem is that it takes a long time to clean and remove the photocured image area, so it is necessary to shorten this time in order to improve the plate-making efficiency. However, as a result of extensive research, the present inventors found that (A) (a) ethylenically unsaturated carboxylic acid and the general formula [X
(-CH=CH)- 2 Y (X, Y are carboxyl groups,
Indicates an alkyl group or an aryl group, and does not include cases where X and Y are the same. )], (b) an unsaturated polyester resin containing a polybasic acid and (c) a polyhydric alcohol, and (B) a photopolymerizable unsaturated monomer. The image-forming composition comprising (C) a photopolymerization initiator has good air-drying properties, and is easily photocured even in the presence of oxygen, giving an image of sufficient hardness. If it is necessary to wash or remove the cured image area, it can be easily eluted in an extremely short time by washing the area with an alkaline aqueous solution, which is a novel technology that can significantly improve plate-making efficiency. After discovering this fact, we have completed the present invention. As mentioned above, the present invention is characterized in that an unsaturated polyester resin containing an adduct of an ethylenically unsaturated carboxylic acid and the chain diene compound is used, and in particular, an ethylenically unsaturated dicarboxylic acid and a carboxyl group-containing When an adduct with a diene compound is used, its effect is significantly exhibited.
When using the above adduct, air drying properties and alkali solubility are greatly improved due to the presence of free carboxyl groups and cycloalkene rings formed by Diels-Alder reaction in the unsaturated polyester resin. It will be done. Even if the amount of free carboxyl groups introduced is increased by, for example, introducing a large amount of polybasic acid, the air-drying properties will be lowered, and an image with sufficient hardness will not be obtained, although alkaline solubility will be imparted. Further, when only a cycloalkene ring is introduced, although air drying properties are exhibited, alkali solubility is not sufficient. Examples of polybasic acids which are components of the unsaturated polyester resin of the present invention include maleic anhydride, fumaric acid,
Examples include itaconic acid, tetrahydrophthalic anhydride, phthalic anhydride, isophthalic acid, terphthalic acid, adipic acid, sebacic acid, and trimellitic acid. Polyhydric alcohols include ethylene glycol, propylene glycol, glycerin, diglycerin, 1,3-butylene glycol, diethylene glycol, triethylene glycol, neopentyl glycol, polyethylene glycol,
Examples include polypropylene glycol, trimethylolethane, trimethylolpropane, and pentaerythritol. Furthermore, carboxylic acids in the adduct of ethylenically unsaturated carboxylic acid and chain diene compound include maleic anhydride, maleic acid, fumaric acid, O
-carboxycinnamic acid, itaconic acid, glutaconic acid, citraconic acid, tetrahydrophthalic acid, 3-methyltetrahydrophthalic acid,
Examples include dicarboxylic acids such as tetrahydroterephthalic acid, benzalactic acid, benzalmalonic acid, and citraconic acid (anhydride), and monocarboxylic acids such as crotonic acid. On the other hand, as the chain diene compound, a diene containing a carboxyl group in the molecule is useful. Representative examples include sorbic acid and cinnamylidene acetic acid. Among the above, adducts of ethylenically unsaturated dicarboxylic acids and carboxyl group-containing diene compounds are preferably used, particularly Diels-Alder reaction adducts of maleic anhydride and sorbic acid, i.e., 6-
Methylcyclohexane-1,2,3 tricarboxylic acid is most useful. The above adducts are added to the unsaturated polyester resin.
Preferably, it is present in a proportion of 2.5 to 50 mol%.
The adduct may be present either at the end of the molecule or within the molecular chain. By further introducing a polyhydric alcohol allyl ether component into the unsaturated polyester resin of the present invention, a higher degree of air-drying property can be exhibited, so its use is advantageous. Examples of allyl ethers of polyhydric alcohols include mono- or diallyl ethers such as glycerin, trimethylolpropane, and trimethylolethane, mono-, di- or triallyl ethers of pentaerythritol, allyl glycidyl ether, allyloxydicyclopentadiene, and phenol-formaldehyde. In addition to partially allyl etherified products of the initial condensate, there may also be mentioned partially allyl etherified products of the initial condensate of urea or melamine and formaldehyde. In addition to the above-mentioned modifiers in preparing the unsaturated polyester resin, oils such as tung oil, linseed oil, dehydrated castor oil, soybean oil, fatty acids thereof, or polyhydric alcohol fatty acid esters may be appropriately used. Unsaturated polyester resins are prepared by any method. For example, by condensing a polybasic acid, a polyhydric alcohol, an ethylenically unsaturated carboxylic acid, and, if necessary, a modifier, according to a conventional method, the double bonds of the ethylenically unsaturated carboxylic acid in the obtained prepolymer are A method of subjecting a chain diene compound to a Diels-Alder reaction, in which an ethylenically unsaturated carboxylic acid and a chain diene compound are reacted in advance to prepare an additive, and this is reacted with a polybasic acid, a polyhydric alcohol, and as necessary. A method of condensing with a modifying agent or the like is carried out depending on the method. The resulting unsaturated polyester resin is a viscous liquid or solid. The molecular weight of the resin is not particularly limited, but it usually has an average molecular weight of 300 to 5000, and an acid value (KOH,
mg/g) of 50 to 400, preferably 100 to 300. If the acid value is less than 50, it is difficult to obtain sufficient alkaline cleaning properties, while if it is more than 400, it is easily affected by the chemicals used in the etching solution, making it impossible to obtain a clear image or causing noticeable stickiness in the image area. Next, the photopolymerizable unsaturated monomer used in the present invention is not particularly limited, and any compound capable of radical polymerization can be used. Suitable monomers are ethylenically unsaturated monomers (vinyl monomers) and compounds containing functional groups such as hydroxyl groups or carboxyl groups. Examples of functional groups include epoxy groups in addition to those mentioned above. Of course, ethylenically unsaturated monomers that do not contain functional groups can also be used, and these are used to impart elasticity to the image forming film or adjust hardness, rather than utilizing their photopolymerizable properties. It is used as an auxiliary agent in combination with ethylenically unsaturated monomers containing functional groups. The compounds will be specifically explained below, but the present invention is not limited thereto. Monomers containing hydroxyl groups include 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 1,4-butylene glycol monoacrylate, pentaerythritol mono-, di-, or triacrylate, ethylene glycol monoalrylate, diethylene glycol monoacrylate. , propylene glycol monoacrylate, dipropylene glycol monoacrylate, mono- or diacrylate of glycerin, N-
Examples include methylol acrylamide and N-methylol methacrylamide. In addition, as a monomer containing a carboxyl group, the general formula (meth)acryloyl group-containing polybasic acid ester represented by (here, R, a, A, are the same as above, b
is an integer of 1 to 3, b+c is an integer of 2 to 4, and R' represents an alkylene group, a phenylene group, a carboxyl group-substituted phenylene group, or the like. ). The ester is obtained by a partial esterification reaction between hydroxy (meth)acrylate and a polybasic acid. The compound includes phthalic acid mono(2-acryloxyethyl) ester. Succinic acid mono(2-acryloxyethyl) ester maleic acid mono(2-acryloxyethyl) ester, Hexahydrophthalic acid mono(3-acryloxyethyl ester) Tetrahydrophthalic acid mono(2-acryloxyethyl) ester Mono(2-acryloxyethyl) trimellitate
ester Methyltetrahydrotrimellitic acid mono(2-acryloxyethyl) ester Mono(2-acryloxyethyl) pyromellitic acid
ester and various esters in which the above acryloyl group is substituted with a methacryloyl group. Other usable monomers include glycidyl methacrylate, glycidyl acrylate, allyl glycidyl ether, 1-vinyl-3,4-epoxycyclohexane, trimethylolpropane triacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, 1,4- Examples include butylene glycol diacrylate, 1,6-hexene glycol diacrylate, N-vinylpyrrolidone, styrene, methyl methacrylate, tetrahydrofuran acrylate, butoxy acrylate, cyclohexyl acrylate, phenoxyethyl acrylate, isobonnell acrylate, and the like. In the present invention, it is advantageous to use the various monomers described above, particularly the (meth)acryloxy group-containing polybasic acid partial ester, in combination with the phosphoric acid monomers described below. That is, when the composition of the present invention is used as a resist ink for printed wiring, the combination of monomers allows the ink to exhibit good adhesion to substrates such as copper plates, and the alkaline cleaning after image formation is much shorter. This is because it is done effectively and on time.
The mixing ratio of the phosphoric acid monomer and the polymerizable monomer is preferably 5/100 to 50/100. Specific examples include phosphoric acid monomers. First, the general formula (meth)acryloxy group-containing phosphate ester represented by (where R: hydrogen or methyl group, A: alkylene group or hydroxyl-substituted alkylene group,
a; an integer of 1 to 3; b; an integer of 1 to 3). The ester is hydroxyalkyl (meth)
It is obtained by the reaction of acrylate with phosphoryl chloride, phosphorus pentoxide, orthophosphoric acid, etc. The compound includes phosphoric acid mono(2-acryloxyethyl) ester Phosphoric acid di(2-acryloxyethyl) ester Phosphoric acid mono(2-methacryloxyethyl) ester etc. Other examples include tri(2-acryloxyethyl) phosphate and tri(2-methacryloxyethyl) phosphate. Examples of photopolymerization initiators include benzoin alkyl ethers such as benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether, dibutyl sulfide, benzyl sulfide,
Organic sulfur compounds such as decyl phenyl sulfide, diazonium salts, tetrazonium salts, complex salts of these with zinc chloride, or condensates thereof, dyes such as azobisisobutyronitrile and methylene blue, or their combination with p-toluenesulfonate ions, etc. combination with, organic peroxide, hydrogen peroxide, pyrylium salt or thiapyrylium salt, acetophenone, benzophenone, benzyl, phenanthrene, thioxanthone, dichloropropylphenyl ketone, anthraquinone, 2-chloroanthraquinone, 2-bromoanthraquinone, anthraquinone β - Sodium sulfonate, 1,5-dinitroanthraquinone, 1,2-penzanthraquinone, phenanthrenequinone, 5-benzoylacenaphthene, 5-nitroacenaphthene, 1,4-naphthoquinone, 18-phthaloylnaphthalene, Examples include 2-nitrofluorene, p-nitroaniline, and biclamide, which may be used alone or in combination of two or more. Not limited to those listed above,
Anything that promotes photopolymerization can be used. Among these, benzoin alkyl ether gives particularly good results in terms of price and sensitivity. In the composition of the present invention, the photopolymerizable unsaturated monomer is 20 to 500% relative to the unsaturated polyester resin.
It is used in proportions of % by weight. Further, the photopolymerization initiator is mixed and used in a range of 1 to 10% by weight based on the resin. Since the photopolymerizable unsaturated monomer also serves as a solvent, the composition can be applied to the substrate as it is, but if necessary, organic solvents such as volatile saturated fatty acid esters, ketones, aromatic hydrocarbons, etc. For example, it can be used after being diluted with ethyl acetate, methyl ethyl ketone, toluene, or xylene. Further, auxiliary agents such as dyes, pigments, and thermal polymerization inhibitors can be used in combination as required. When forming an image using the composition,
When the composition is applied to a base material such as a zinc plate, aluminum plate, copper plate, steel plate, etc. and irradiated with ultraviolet rays through a negative image, only the exposed areas will be cured. It is preferable to form an image on the substrate by a printing method and then irradiate the image with ultraviolet rays to cure it. The former is suitable for producing resist plates and relief plates, and the latter is suitable for purposes such as printed wiring. It can also be used to fill holes in through-hole type printed wiring boards. For resist plates and printed wiring, etc., the base material obtained as described above is etched, the exposed metal parts are corroded, and the remaining photosensitive areas are removed by alkaline cleaning. Used as is. For alkaline cleaning, sodium hydroxide, potassium hydroxide,
Alkali such as sodium carbonate and potassium carbonate
It is used as an aqueous solution of about 0.1 to 5%. Any method such as a spray method or a dipping method can be used for the cleaning operation. Practically speaking, the alkali contact time is 5 seconds to 20 seconds, and the contact temperature is approximately 25 to 50°C. Note that the base material is not limited to the metal plate mentioned above, but also cotton, rayon, wool, polyester, etc.
An image is formed on the surface of a woven or nonwoven fabric made of synthetic fibers such as polyamide, polyvinyl alcohol, or polyacrylonitrile through a screen, then cured by irradiation with ultraviolet rays, and dyed as appropriate to create a pattern on the fabric. It is also possible.
In addition, paper, synthetic resin sheets, etc. may be used as the base material. As a light source, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a carbon arc lamp, a xenon lamp, etc. are used. Hereinafter, the composition of the present invention will be explained in more detail by giving examples. Example 1 97.9 parts of phthalic anhydride, 109.8 parts of isophthalic acid,
172.9 parts of maleic anhydride, ethylene glycol
99.6 parts of propylene glycol and 122.1 parts of propylene glycol were condensed in a nitrogen atmosphere at 220℃ for 4 hours to determine the acid value.
A prepolymer containing 48 [KOHmg/g] was obtained. Next, this prepolymer was cooled to 100°C, 197.7 parts of sorbic acid was added, and the reaction was carried out at 150°C for 1.5 hours to prepare a liquid unsaturated polyester resin having an acid value of 166 [KOHmg/g]. To 100 parts of this resin, 30 parts of 2-hydroxypropyl acrylate, 15 parts of di(2-acryloxyethyl) phosphate, 40 parts of barium sulfate, 3 parts of Aerosil, 0.5 parts of phthalocyanine blue, and Irgakiure 651 (manufactured by Ciba Geigy, Mix 2 parts of acetophenone photopolymerization initiator) and thoroughly mix with a three-roll roll to obtain a viscosity of 15500CP (B-type viscometer, 60 rpm,
An image forming composition (measured at 20°C) was obtained. Next, use this composition to form an image on the copper foil of a printed circuit board using a screen printing method, and immediately
Irradiation was performed for 1 second using a UV lamp with an output of 80 W/cm. The hardness of the image coating film was 2H on a pencil hardness, and the adhesion to the substrate was 100/100, indicating good adhesion. Next, this sample was etched with an aqueous ferric chloride solution at 40°C for 30 minutes. The image showed sufficient chemical resistance. Furthermore, when a 3% aqueous sodium hydroxide solution at 40°C was sprayed, the image area was dissolved after 8 seconds, showing excellent alkali cleaning properties and a precise image of a printed wiring circuit was obtained. Control Example 1 The same experiment as in Example 1 was conducted except that unsaturated polyester was used, omitting the use of sorbic acid. The hardness of the image coating was F. Also, some difficulties were observed in chemical resistance. Control Example 2 The same experiment as in Example 1 was conducted except that an unsaturated polyester resin was used, omitting the use of maleic anhydride. Alkaline cleaning required a long time of 40 seconds. Examples 2 to 7 Example 1 was carried out using the composition shown in Table 1 (only the unsaturated polyester resin and polymerizable monomer were changed).
An image was formed according to . The results are shown in Table 1.
【表】
る。
[Table]
Claims (1)
〔X(−CH=CH)−2Y(但しX,Yはカルボキシ
ル基、アルキル基、アリール基を示し、XとY
が同じ場合を含まない。)〕で表される鎖状ジエ
ン系化合物との付加物、(ロ)多塩基酸及び(ハ)多価
アルコールを構成成分とする不飽和ポリエステ
ル樹脂、 (B) 光重合可能な不飽和単量体、 (C) 光重合開始剤 とからなる画像形成用組成物。 2 エチレン性不飽和カルボン酸とジエン系化合
物との付加物が分子内に少なくとも2個のカルボ
キシル基を含有するシクロアルケン類である特許
請求の範囲第1項記載の画像形成用組成物。 3 エチレン性不飽和カルボン酸とジエン系化合
物との付加物が無水マレイン酸とソルビン酸との
付加反応で得られる6−メチルシクロヘキサン−
1,2,3トリカルボン酸である特許請求の範囲
第2項記載の画像形成用組成物。 4 (A) (イ)エチレン性不飽和カルボン酸と一般式
〔X(−CH=CH)−2Y(但しX,Yはカルボキシ
ル基、アルキル基、アリール基を示し、XとY
が同じ場合を含まない。)〕で表される鎖状ジエ
ン系化合物との付加物、(ロ)多塩基酸及び(ハ)多価
アルコール、更に(ハ)多価アルコールアリルエー
テルを構成成分とする不飽和ポリエステル樹
脂、 (B) 光重合可能な不飽和単量体、 (C) 光重合開始剤とからなる画像形成用組成物。[Claims] 1 (A) (a) Ethylenically unsaturated carboxylic acid and the general formula [X(-CH=CH) -2Y (where X and Y represent a carboxyl group, an alkyl group, or an aryl group, X and Y
does not include cases where are the same. )], (b) unsaturated polyester resin containing polybasic acid and (c) polyhydric alcohol, (B) photopolymerizable unsaturated monomer (C) a photopolymerization initiator. 2. The image-forming composition according to claim 1, wherein the adduct of the ethylenically unsaturated carboxylic acid and the diene compound is a cycloalkene containing at least two carboxyl groups in the molecule. 3. 6-Methylcyclohexane, an adduct of an ethylenically unsaturated carboxylic acid and a diene compound obtained by the addition reaction of maleic anhydride and sorbic acid.
The image forming composition according to claim 2, which is a 1,2,3 tricarboxylic acid. 4 (A) (A) Ethylenically unsaturated carboxylic acid and the general formula [X(-CH=CH) -2Y (where X and Y represent a carboxyl group, an alkyl group, or an aryl group, and X and Y
does not include cases where are the same. )], (b) a polybasic acid, (c) a polyhydric alcohol, and (c) an unsaturated polyester resin whose constituent components are polyhydric alcohol allyl ether; ( An image-forming composition comprising B) a photopolymerizable unsaturated monomer and (C) a photopolymerization initiator.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12632882A JPS5917548A (en) | 1982-07-20 | 1982-07-20 | Image forming composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12632882A JPS5917548A (en) | 1982-07-20 | 1982-07-20 | Image forming composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5917548A JPS5917548A (en) | 1984-01-28 |
JPH0365540B2 true JPH0365540B2 (en) | 1991-10-14 |
Family
ID=14932461
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12632882A Granted JPS5917548A (en) | 1982-07-20 | 1982-07-20 | Image forming composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5917548A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9273178B2 (en) * | 2012-12-18 | 2016-03-01 | Xerox Corporation | Bio-based polyester resins |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5021804A (en) * | 1973-06-29 | 1975-03-08 | ||
JPS5022895A (en) * | 1973-06-29 | 1975-03-11 | ||
JPS5299102A (en) * | 1976-02-16 | 1977-08-19 | Fuji Photo Film Co Ltd | Metalic image forming material |
JPS52117392A (en) * | 1976-03-26 | 1977-10-01 | Sumitomo Chem Co Ltd | Photosensitive resin compositions |
JPS5453187A (en) * | 1977-10-06 | 1979-04-26 | Teijin Ltd | Photo-setting resin composition |
-
1982
- 1982-07-20 JP JP12632882A patent/JPS5917548A/en active Granted
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5021804A (en) * | 1973-06-29 | 1975-03-08 | ||
JPS5022895A (en) * | 1973-06-29 | 1975-03-11 | ||
JPS5299102A (en) * | 1976-02-16 | 1977-08-19 | Fuji Photo Film Co Ltd | Metalic image forming material |
JPS52117392A (en) * | 1976-03-26 | 1977-10-01 | Sumitomo Chem Co Ltd | Photosensitive resin compositions |
JPS5453187A (en) * | 1977-10-06 | 1979-04-26 | Teijin Ltd | Photo-setting resin composition |
Also Published As
Publication number | Publication date |
---|---|
JPS5917548A (en) | 1984-01-28 |
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