JPH0363738B2 - - Google Patents

Info

Publication number
JPH0363738B2
JPH0363738B2 JP57222716A JP22271682A JPH0363738B2 JP H0363738 B2 JPH0363738 B2 JP H0363738B2 JP 57222716 A JP57222716 A JP 57222716A JP 22271682 A JP22271682 A JP 22271682A JP H0363738 B2 JPH0363738 B2 JP H0363738B2
Authority
JP
Japan
Prior art keywords
prepolymer
weight
meth
ethylenically unsaturated
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57222716A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59113430A (ja
Inventor
Yoshimichi Sakurai
Yoshiharu Ootsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Tire Corp
Original Assignee
Toyo Tire and Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Tire and Rubber Co Ltd filed Critical Toyo Tire and Rubber Co Ltd
Priority to JP57222716A priority Critical patent/JPS59113430A/ja
Publication of JPS59113430A publication Critical patent/JPS59113430A/ja
Publication of JPH0363738B2 publication Critical patent/JPH0363738B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyurethanes Or Polyureas (AREA)
JP57222716A 1982-12-18 1982-12-18 水溶性感光性組成物 Granted JPS59113430A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57222716A JPS59113430A (ja) 1982-12-18 1982-12-18 水溶性感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57222716A JPS59113430A (ja) 1982-12-18 1982-12-18 水溶性感光性組成物

Publications (2)

Publication Number Publication Date
JPS59113430A JPS59113430A (ja) 1984-06-30
JPH0363738B2 true JPH0363738B2 (no) 1991-10-02

Family

ID=16786783

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57222716A Granted JPS59113430A (ja) 1982-12-18 1982-12-18 水溶性感光性組成物

Country Status (1)

Country Link
JP (1) JPS59113430A (no)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5328805A (en) * 1992-08-28 1994-07-12 W. R. Grace & Co.-Conn. Aqueous developable photosensitive polyurethane-(meth)acrylate
JP2008156611A (ja) * 2006-11-29 2008-07-10 Sanyo Chem Ind Ltd 弾性樹脂粒子の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53117099A (en) * 1977-03-21 1978-10-13 Witco Chemical Corp Stable unsaturated urethane oligomer
JPS57124345A (en) * 1980-12-13 1982-08-03 Basf Ag Recording material enabling photopolymerization and manufacture of relief plate by use thereof

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53117099A (en) * 1977-03-21 1978-10-13 Witco Chemical Corp Stable unsaturated urethane oligomer
JPS57124345A (en) * 1980-12-13 1982-08-03 Basf Ag Recording material enabling photopolymerization and manufacture of relief plate by use thereof

Also Published As

Publication number Publication date
JPS59113430A (ja) 1984-06-30

Similar Documents

Publication Publication Date Title
US4264705A (en) Multilayered elastomeric printing plate
US4590144A (en) Photopolymerizable recording material and the production of relief plates using this recording material
US4606994A (en) Process for producing photo-cured printing plates possessing a defined hardness
JPH0210165B2 (no)
US7374862B2 (en) Photosensitive resin composition and curing product thereof
JPH0495960A (ja) 感光性フレキソ印刷版組成物
US4011084A (en) Fluid photo-crosslinkable compositions for the manufacture of relief printing plates
JP5108577B2 (ja) フレキソ印刷版用感光性樹脂組成物及びフレキソ印刷版の製造方法
JPH0363738B2 (no)
JPS6335170B2 (no)
EP0054150B1 (de) Photopolymerisierbares Aufzeichnungsmaterial und Verfahren zur Herstellung von Reliefformen mittels dieses Aufzeichnungsmaterials
JPH049294B2 (no)
JPH0212490B2 (no)
JP3851862B2 (ja) 感光性樹脂組成物及びフレキソ印刷用樹脂版
JPH08169925A (ja) フレキソ印刷プレートに有用な液体ポリウレタン(メト)アクリレート感光性ポリマー
JPS6048020B2 (ja) 印刷版用感光性樹脂組成物
JPH0211611B2 (no)
JPH0211634B2 (no)
JP2000321764A (ja) 光硬化性樹脂組成物及びパターンの製造法
JPS5921541B2 (ja) 印刷版用感光性樹脂組成物
JPS6365931B2 (no)
JP3372215B2 (ja) 感光性樹脂組成物及びフレキソ印刷用樹脂版
JPH05125136A (ja) 放射線硬化型樹脂組成物及び放射線硬化型ストリツパブルマスキング材用スクリ−ン印刷インキ組成物
JP2001019729A (ja) 樹脂組成物及びその硬化物
JPS6143367B2 (no)