JPH0360055U - - Google Patents
Info
- Publication number
- JPH0360055U JPH0360055U JP12184789U JP12184789U JPH0360055U JP H0360055 U JPH0360055 U JP H0360055U JP 12184789 U JP12184789 U JP 12184789U JP 12184789 U JP12184789 U JP 12184789U JP H0360055 U JPH0360055 U JP H0360055U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- microscope
- camera
- infrared
- photomultiplier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims description 2
- 238000005211 surface analysis Methods 0.000 claims description 2
- 239000000700 radioactive tracer Substances 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Microscoopes, Condenser (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12184789U JPH0360055U (ko) | 1989-10-17 | 1989-10-17 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12184789U JPH0360055U (ko) | 1989-10-17 | 1989-10-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0360055U true JPH0360055U (ko) | 1991-06-13 |
Family
ID=31669869
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12184789U Pending JPH0360055U (ko) | 1989-10-17 | 1989-10-17 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0360055U (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008502929A (ja) * | 2004-06-16 | 2008-01-31 | ビズテック セミコンダクター システムズ ゲーエムベーハー | 反射または透過赤外光による微細構造の検査装置または検査方法 |
-
1989
- 1989-10-17 JP JP12184789U patent/JPH0360055U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008502929A (ja) * | 2004-06-16 | 2008-01-31 | ビズテック セミコンダクター システムズ ゲーエムベーハー | 反射または透過赤外光による微細構造の検査装置または検査方法 |