JPH0358664B2 - - Google Patents

Info

Publication number
JPH0358664B2
JPH0358664B2 JP60120143A JP12014385A JPH0358664B2 JP H0358664 B2 JPH0358664 B2 JP H0358664B2 JP 60120143 A JP60120143 A JP 60120143A JP 12014385 A JP12014385 A JP 12014385A JP H0358664 B2 JPH0358664 B2 JP H0358664B2
Authority
JP
Japan
Prior art keywords
support
plate
buffer solution
tank
electrophoresis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60120143A
Other languages
Japanese (ja)
Other versions
JPS61278337A (en
Inventor
Shigeru Tezuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP60120143A priority Critical patent/JPS61278337A/en
Publication of JPS61278337A publication Critical patent/JPS61278337A/en
Publication of JPH0358664B2 publication Critical patent/JPH0358664B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 (発明の分野) 本発明は、蛋白質、核酸等のように溶液中で電
離基を持つ物質をその粒子の荷電および分子量の
相違に基づいて分離分析を行なうため等に用いら
れる電気泳動装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of the Invention) The present invention is useful for separating and analyzing substances that have ionizing groups in solution, such as proteins and nucleic acids, based on the differences in charge and molecular weight of their particles. The present invention relates to the electrophoresis device used.

(発明の背景) 緩衝液を浸み込ませたゲル膜、濾紙などのシー
ト状支持媒体中において蛋白質、蛋白質分解物、
核酸、核酸分解物などの荷電分子または粒子が電
場の影響下で移動する現象を利用して、それらの
物質の分離を行なうことを骨子とする電気泳動操
作は以前から知られており、特に上記のような生
体高分子物質の分離と固定に利用されている。
(Background of the Invention) Proteins, protein decomposition products,
Electrophoresis operations have been known for some time, and their main purpose is to separate charged molecules or particles, such as nucleic acids and nucleic acid decomposition products, by utilizing the phenomenon in which they move under the influence of an electric field. It is used for the separation and fixation of biopolymer substances such as.

特に最近注目されている遺伝子工学の分野にお
いては、オートラジオグラフイーを利用した
DNAなどの核酸の塩基配列の決定のために電気
泳動操作の実施が必須とされている。この目的に
おける電気泳動操作は一般に、放射性標識が付さ
れたDNAあるいはDNA断片の塩基特異的反応物
混合物を電気泳動用支持媒体の電界方向に沿つて
複数種並行して泳動させる操作が含まれる。そし
て、その泳動により得られた複数列の泳動パター
ン(電気泳動により支持媒体上に形成されるゾー
ンの集合体)をオートラジオグラフとして得たの
ち、各列のゾーンを相互に対照比較することによ
り塩基配列の決定が行なわれる。すなわち、同一
の分子量を有する塩基特異的反応物は電気泳動の
開始点が同一であれば、同一の位置に移動すると
の電気泳動の原理を利用して、それらの対照比較
をおこなつている。
Particularly in the field of genetic engineering, which has recently attracted attention, autoradiography has been used to
Electrophoresis is essential for determining the base sequence of nucleic acids such as DNA. Electrophoresis operations for this purpose generally include operations in which a plurality of base-specific reactant mixtures of radioactively labeled DNA or DNA fragments are run in parallel along the direction of an electric field in an electrophoresis support medium. Then, after obtaining the multiple rows of migration patterns (collection of zones formed on the support medium by electrophoresis) as an autoradiograph, the zones in each row are compared with each other. The base sequence is determined. In other words, the comparison is made using the principle of electrophoresis that base-specific reactants having the same molecular weight migrate to the same position if the starting point of electrophoresis is the same.

一般に電気泳動用支持媒体としては紙、メン
ブランフイルタ、澱粉ゲル膜、ポリアクリルアミ
ドゲル膜などが用いられており、厚さの均一なシ
ート状のものである。これらの支持媒体のうち、
澱粉ゲル膜、ポリアクリルアミドゲル膜などのゲ
ル膜は、電気非伝導性のガラス板、有機ポリマー
フイルムなどからなる平坦な支持体(支持具)の
周囲に支持枠(スペーサ)を設置して形成したモ
ールド上にゲル調製液を導入し、必要に応じてさ
らに別の支持体で上面を密閉したのちゲル化させ
ることにより形成される。以下、2枚の支持体の
間にゲル膜が挾持されたもの全体を単に電気泳動
用支持媒体ということがある。
Paper, membrane filters, starch gel membranes, polyacrylamide gel membranes, etc. are generally used as support media for electrophoresis, and they are in the form of sheets with uniform thickness. Of these supporting media,
Gel films such as starch gel films and polyacrylamide gel films are formed by setting a support frame (spacer) around a flat support (support) made of an electrically non-conductive glass plate, organic polymer film, etc. It is formed by introducing a gel preparation solution onto a mold, sealing the top surface with another support if necessary, and then gelling it. Hereinafter, the entire structure in which a gel membrane is sandwiched between two supports may be simply referred to as an electrophoresis support medium.

しかしながら、このようにして形成される厚さ
の均一な長方形のシート状支持媒体を用いて上記
のような電気泳動操作を行なつた場合に、同一の
分子量を有する物質であつてもそれらの泳動方向
に垂直な方向での泳動位置の相違に基づいて泳動
距離が不均一になる現象が発生しやすい。すなわ
ち、荷電物質の移動速度(すなわちゾーンの移動
距離)は一般に中央部よりも両側部の方が小さく
なる傾向があり、このため一定時間経過後の泳動
パターンは、第6図に例示したように、両側部に
おけるゾーンの移動距離が、中央部におけるゾー
ンの移動距離よりも短くなつたパターンになりや
すい。なお第6図は、支持板(支持具)60の上
に形成された支持媒体61上にて上端開始点62
から電気泳動させて得られたゾーン63,63′
の泳動パターンを模式的に示すものである。この
現象はスマイリング効果と呼ばれ、DNAなどの
塩基配列の決定操作のように複数の泳動列を対照
比較する工程を含む操作においては、塩基配列な
どの得られる情報の精度の低下を引き起こす大き
な原因となつている。上記のスマイリング効果の
発生の主な原因としては、支持媒体中を電流が通
ることにより発生した熱(ジユール熱)が側面縁
部から放熱されるために中央部と側面部とで温度
差が生ずることが挙げられる。すなわち、発生し
たジユール熱は支持媒体の中央部では表および裏
面からのみ放熱されるが、側面部では更に側面縁
部からの放熱が加わる。なお、これらの放熱を補
うためのジユール熱の幅方向に沿つた移動も発生
するが、この熱の移動についても、支持媒体の中
央部は両側からの熱の流入により放熱が補償され
やすいが、両側面部では一方の側から熱の流入が
あるのみとなり放熱の補償が不十分となる。これ
らの理由により、側面部の温度は中央部の温度に
比較して低くなる傾向があり、その結果、温度の
低い側面部では荷電物質の移動速度が中央部より
小さくなり、泳動パターン上にはスマイリング効
果が発生する。
However, when performing electrophoresis as described above using a rectangular sheet-like support medium of uniform thickness formed in this way, even if substances have the same molecular weight, their electrophoresis will be different. A phenomenon in which migration distance becomes non-uniform is likely to occur due to differences in migration positions in a direction perpendicular to the direction. In other words, the moving speed of charged substances (i.e., the moving distance of the zone) generally tends to be smaller on both sides than in the center, and therefore the migration pattern after a certain period of time is as illustrated in Figure 6. , the pattern tends to be such that the moving distance of the zone on both sides is shorter than the moving distance of the zone in the center. In addition, FIG. 6 shows an upper end starting point 62 on a support medium 61 formed on a support plate (support tool) 60.
Zones 63 and 63' obtained by electrophoresis from
This figure schematically shows the migration pattern of . This phenomenon is called the smiling effect, and is a major cause of a decrease in the accuracy of the information obtained, such as the base sequence, in operations that involve comparing and contrasting multiple electrophoresis columns, such as determining the base sequence of DNA. It is becoming. The main reason for the above-mentioned smiling effect is that the heat generated by the current passing through the support medium (Jule heat) is dissipated from the side edges, resulting in a temperature difference between the center and side surfaces. This can be mentioned. In other words, the generated Joule heat is radiated only from the front and back surfaces in the central portion of the support medium, but in the side portions, heat is further radiated from the side edges. Note that movement of Joule heat along the width direction occurs to compensate for these heat radiations, but even with regard to this heat movement, the heat radiation is likely to be compensated for in the central part of the support medium by the inflow of heat from both sides. In both side portions, heat only flows in from one side, resulting in insufficient compensation for heat radiation. For these reasons, the temperature of the side parts tends to be lower than the temperature of the central part, and as a result, the moving speed of charged substances is lower in the lower temperature side parts than in the central part, and the migration pattern is A smiling effect occurs.

このため、従来からスマイリング効果の発生を
防止するため、支持板の電気泳動用媒体に接しな
い側の表面に熱伝導率の良い金属板などからなる
放熱板を付設して温度差の発生を抑制するという
工夫がなされている。このようにすればある程度
の効果は得られるが、金属板の平面度を高めるの
が難しいため金属板と支持体を全面にわたつて密
着させるのが難しく、放熱板の放熱にむらが生じ
易いなどの問題があり、充分なスマイリング効果
の防止を図るのは困難であり、放熱板を付設する
作業も煩雑である。
For this reason, in order to prevent the smiling effect from occurring, a heat dissipation plate made of a metal plate with good thermal conductivity is attached to the surface of the support plate on the side that does not come into contact with the electrophoresis medium to suppress the generation of temperature differences. Efforts have been made to do so. Although a certain degree of effect can be obtained by doing this, it is difficult to increase the flatness of the metal plate, making it difficult to make the metal plate and support stick closely together over the entire surface, which tends to cause uneven heat radiation from the heat sink. Due to this problem, it is difficult to sufficiently prevent the smiling effect, and the work of attaching a heat sink is also complicated.

このようなことから、第7図に示すように、緩
衝液を入れた上部緩衝液槽71を、支持媒体74
を挾持する支持板73の裏面にまで伸ばして、上
部緩衝液槽71内の緩衝液が支持板73の裏面全
体に接触するようにしたものも使用されている。
この装置で、上部電極72と下部電極76との間
に印加された電圧は、上部緩衝液槽71および下
部緩衝液槽75内の緩衝液を介して支持媒体74
に印加されて電気泳動が行なわれるが、この時支
持板73の裏面全体に接触する上部緩衝液槽71
内の緩衝液によつて支持板73および支持媒体7
4の温度勾配が小さくなり、スマイリング効果の
発生を押えることができる。
For this reason, as shown in FIG.
A structure in which the buffer solution in the upper buffer solution tank 71 comes into contact with the entire back surface of the support plate 73 is also used.
In this device, the voltage applied between the upper electrode 72 and the lower electrode 76 is applied to the support medium 74 through the buffer solution in the upper buffer solution tank 71 and the lower buffer solution tank 75.
is applied to perform electrophoresis, but at this time, the upper buffer tank 71 that contacts the entire back surface of the support plate 73
The support plate 73 and the support medium 7 are
The temperature gradient in step 4 is reduced, and the occurrence of the smiling effect can be suppressed.

しかしながら、この場合には緩衝液に温度差が
生じないようにするためには比較的高価な緩衝液
を大量に必要とするため、電気泳動を行なわせる
ための経費が高くなるという問題がある。さら
に、電気泳動のため上部および下部電極間に付加
される電圧は通常1500〜3000Vと高電圧であり、
且つ緩衝液は導電性が良いため、上部緩衝液槽を
下方へ伸ばして下部緩衝液槽に近づけると、両者
の間での電気絶縁性不良の問題も生じやすい。
However, in this case, a large amount of relatively expensive buffer solution is required in order to prevent a temperature difference from occurring in the buffer solution, so there is a problem in that the expense for performing electrophoresis becomes high. Furthermore, the voltage applied between the upper and lower electrodes for electrophoresis is usually as high as 1500 to 3000V.
In addition, since the buffer solution has good conductivity, if the upper buffer solution tank is extended downward and brought closer to the lower buffer solution tank, the problem of poor electrical insulation between the two tends to occur.

このようなことから、本出願人は、シート状の
支持媒体を平板状支持板で両側から挾持し、上部
電極を内部に有し緩衝液を内部に収容保持しうる
上部緩衝液槽を支持体の上端開口と連通させ、下
部電極を内部に有し緩衝を液内部に収容保持しう
る下部緩衝液槽を支持板の下端開口と連通させ、
両電極間に印加される電圧を両緩衝液を介して支
持媒体に伝えて電気泳動を行なわせるようになす
とともに、前記支持板の少なくとも一方の外表面
を壁面とする保温水槽を設け、この保温水槽内の
水によつて支持媒体に温度勾配が生じるのを防止
するようにした電気泳動装置を提案している。
For this reason, the present applicant has developed a structure in which a sheet-like support medium is sandwiched between flat support plates from both sides, and an upper buffer solution tank having an upper electrode inside and capable of containing and holding a buffer solution is attached to the support. A lower buffer solution tank having a lower electrode therein and capable of containing and holding a buffer inside the liquid is communicated with the lower end opening of the support plate;
Electrophoresis is carried out by transmitting the voltage applied between both electrodes to the support medium via both buffer solutions, and a heat-retaining water tank having a wall surface on at least one outer surface of the support plate is provided. An electrophoresis device is proposed in which temperature gradients in the support medium caused by water in the tank are prevented.

上記の装置を用いれば、上述のごとき経費の問
題や電気絶縁性不良の問題を生ずることなく、ス
マイリング効果の発生を防止できる。
By using the above-mentioned device, the occurrence of the smiling effect can be prevented without causing the above-mentioned problems of cost and poor electrical insulation.

一方このように構成する場合には緩衝液槽を2
個と水槽を1個用いるため、各槽の脱着性が問題
となる。電気泳動終了後に、支持板を取り外すた
めには、まず水槽内の水および各緩衝液槽内の緩
衝液を排出する必要がある。この時、装置全体を
逆さにして、水および緩衝液を捨てることも考え
られるが、電気泳動パターンを可視表示させるた
め放射性物質を被泳動物質に加えることが多く、
この場合は下部緩衝液槽内の緩衝液は放射性物質
で汚染されるため、そのまま捨てる訳にはいかな
いという問題があり、各層は別個に取り外すこと
ができるのが好ましい。
On the other hand, in this configuration, there are two buffer tanks.
Since one tank and one tank are used, the ease of attaching and removing each tank becomes a problem. In order to remove the support plate after electrophoresis is completed, it is first necessary to drain the water in the water tank and the buffer solution in each buffer tank. At this time, it is possible to turn the entire device upside down and discard the water and buffer solution, but in many cases a radioactive substance is added to the electrophoresed material in order to visually display the electrophoresis pattern.
In this case, there is a problem that the buffer solution in the lower buffer solution tank is contaminated with radioactive substances and cannot be thrown away as is, so it is preferable that each layer can be removed separately.

(発明の目的) 本発明は上記の事情に鑑み、下部緩衝液槽に対
して上部緩衝液槽などを簡単に脱着できるように
した電気泳動装置を提供することを目的とする。
(Object of the Invention) In view of the above-mentioned circumstances, an object of the present invention is to provide an electrophoresis apparatus in which an upper buffer tank and the like can be easily attached and detached from a lower buffer tank.

(発明の構成) 本発明の電気泳動装置は、電気泳動用支持媒体
を挾持する実質的に電気非伝導性かつ非可撓性の
2枚の平板状支持板を、前記媒体と該支持板の間
が水密に保たれるように固定しうる支え台、前記
支持板の上端開口と連通し、内部に緩衝液を収容
保持しうる上部緩衝液槽、前記支持板の下端開口
と連通し、内部に緩衝液を収容し得る下部緩衝液
槽、前記上部および下部緩衝液槽の各々に配され
た上部および下部電極を有し、 該上部および下部電極間に所定電圧を印加する
ことにより前記上部および下部緩衝液槽内に収容
保持された緩衝液を介して前記媒体の上下方向に
電位勾配を与えて電気泳動を行ない得るようにし
た電気泳動装置であつて、 前記下部緩衝液槽を固定する支え台の上に上方
に延びて設けられた1対の垂直プレートと、該垂
直プレートに平行に上方に延び、前記上部緩衝液
槽を保持する1対の側面プレートと、両プレート
の相対的上下動により両プレートの係合・離脱を
行ない得る係合手段とを設け、 垂直プレートに対し側面プレートを下動もしく
は上動させるだけで両プレートの係合もしくは離
脱を行なわせることができるようにしたことを特
徴とするものである。
(Structure of the Invention) The electrophoresis device of the present invention includes two substantially electrically non-conductive and non-flexible flat support plates that sandwich a support medium for electrophoresis, with a gap between the medium and the support plates. a support stand that can be fixed in a water-tight manner; an upper buffer tank that communicates with the upper end opening of the support plate and is capable of containing and holding a buffer; an upper buffer tank that communicates with the lower end opening of the support plate and has a buffer inside; A lower buffer tank capable of containing a liquid; upper and lower electrodes disposed in each of the upper and lower buffer tanks; An electrophoresis device capable of performing electrophoresis by applying a potential gradient in the vertical direction of the medium through a buffer solution contained and held in a solution tank, the support base for fixing the lower buffer solution tank. A pair of vertical plates extending upwardly provided on the top, a pair of side plates extending upward parallel to the vertical plates and holding the upper buffer tank; The present invention is characterized in that it is provided with an engaging means that can engage and disengage the plates, and that both plates can be engaged or disengaged simply by moving the side plate downward or upward relative to the vertical plate. That is.

(実施態様) 以下、図面により本発明の好ましい実施態様に
ついて説明する。
(Embodiments) Preferred embodiments of the present invention will be described below with reference to the drawings.

第1図は本発明に係る電気泳動装置の好ましい
実施態様の1例を示す斜視図で、第2図はこの装
置を前方から見た正面図、第3図はこの装置の矢
印A−Aに沿つた断面図であり、以下第1図から
第3図を併用して本装置について説明する。
FIG. 1 is a perspective view showing one example of a preferred embodiment of the electrophoresis device according to the present invention, FIG. 2 is a front view of this device as seen from the front, and FIG. FIG. 3 is a sectional view taken along the same line, and the present device will be described below using FIGS. 1 to 3 together.

本装置は支え台1上に上部緩衝液槽2、保温水
槽5および下部緩衝液槽7を取り付けたことを基
本構成とする。上部緩衝液槽2および下部緩衝液
槽7内には夫々幅方向に延びた1本の白金線から
なる上部電極3および下部電極8が配され、各緩
衝液槽2,7内に緩衝液が入れられた時には、各
電極3,8は緩衝液中に位置するようになつてい
る。これら両電極3,8は夫々、各緩衝液槽2,
7の側壁外部に突出して取り付けられた外部端子
3a,8aと繋がる。
The basic configuration of this device is that an upper buffer solution tank 2, a heat-retaining water tank 5, and a lower buffer solution tank 7 are mounted on a support stand 1. In the upper buffer solution tank 2 and the lower buffer solution tank 7, an upper electrode 3 and a lower electrode 8 each made of a single platinum wire extending in the width direction are arranged, and a buffer solution is placed in each buffer solution tank 2, 7. When inserted, each electrode 3, 8 is adapted to be located in a buffer solution. These two electrodes 3 and 8 are connected to each buffer tank 2,
The external terminals 3a and 8a are connected to external terminals 3a and 8a which are attached to protrude from the side wall of 7.

上部緩衝液槽2は、側面プレート12,13、
後下面プレート14および前面プレート11によ
り囲まれた上面が開口する函体で、前面プレート
11には切り欠き11bが形成されている。保温
水槽5は上部緩衝液槽2の後ろ側から下側へまわ
りこみ、そのまま下部緩衝液槽7の近傍まで下方
に延びる函体で、側面プレート12,13、背面
プレート15および前面プレート11から形成さ
れる。ここで、上部緩衝液槽2と保温水槽5の側
面プレート12,13および前面プレート11は
共通であることから分るように上部緩衝液槽2と
保温水槽5は一体に構成されている。なお、保温
水槽5の前面には前面開口11aが形成されてい
る。
The upper buffer tank 2 includes side plates 12, 13,
The box is surrounded by the rear lower surface plate 14 and the front plate 11 and has an open upper surface, and the front plate 11 has a notch 11b formed therein. The heat-retaining water tank 5 is a box that wraps around from the back side of the upper buffer solution tank 2 to the bottom side and extends downward to the vicinity of the lower buffer solution tank 7, and is formed of side plates 12, 13, a back plate 15, and a front plate 11. Ru. Here, as can be seen from the fact that the side plates 12, 13 and front plate 11 of the upper buffer solution tank 2 and the heat-retaining water tank 5 are common, the upper buffer solution tank 2 and the heat-retaining water tank 5 are integrally constructed. Note that a front opening 11a is formed at the front of the heat-retaining water tank 5.

このように一体に構成された上部緩衝液槽2と
保温水槽5は、各側面プレート12,13が、支
え台1の上面に固設された一対の垂直プレート1
6,17を外側から挟むようにして該垂直プレー
ト16,17と係合し、支え台1に保持される。
側面プレート12,13と垂直プレート16,1
7の係合は、具体的には次のようにして行なう。
各側面プレート12,13の下端には下方に開口
した第1係合溝12a,13aが形成され、各垂
直プレート16,17の上端には上方に開口した
第2係合溝16a,17aが形成されるととも
に、各側面プレート12,13の内側面には図示
の如く第2係合溝16a,17aと係合する第2
係合ピン12b,13bが内方に突出して取り付
けられ、各垂直プレート16,17の外側面には
図示の如く第1係合溝12a,13aと係合する
第1係合ピン16b,17bが取り付けられてい
る。このため、側面プレート12,13が垂直プ
レート16,176を挟むようにして、一体にな
つた上部緩衝液槽2と保温水槽5とを上方から降
ろすだけで、第1係合溝12a,13aと第1係
合ピン16b,17bが係合し、且つ、第2係合
溝12b,13bと第2係合ピン16a,17a
が係合して、一体になつた上部緩衝液槽2と保温
水槽5とを支え台1に取り付けることができる。
また、上部緩衝液槽2と保温水槽5とを支え台1
から取り外す時には、これを上方に持ち上げるだ
けでよく、取り付け、取り外しが容易に行なえる
ようになつている。
The upper buffer tank 2 and the heat-retaining water tank 5 that are integrally configured in this way have side plates 12 and 13 that are connected to a pair of vertical plates 1 fixed to the top surface of the support base 1.
6 and 17 are engaged with the vertical plates 16 and 17 so as to sandwich them from the outside, and are held on the support base 1.
Side plates 12, 13 and vertical plates 16, 1
Specifically, the engagement in step 7 is performed as follows.
First engaging grooves 12a, 13a opening downward are formed at the lower ends of each side plates 12, 13, and second engaging grooves 16a, 17a opening upward are formed at the upper ends of each vertical plate 16, 17. At the same time, the inner surface of each side plate 12, 13 has a second groove that engages with the second engagement groove 16a, 17a as shown in the figure.
Engagement pins 12b, 13b are attached so as to protrude inward, and first engagement pins 16b, 17b that engage with first engagement grooves 12a, 13a are provided on the outer surface of each vertical plate 16, 17 as shown in the figure. installed. Therefore, by simply lowering the integrated upper buffer tank 2 and thermal water tank 5 from above with the side plates 12 and 13 sandwiching the vertical plates 16 and 176, the first engagement grooves 12a and 13a and the first The engagement pins 16b, 17b engage, and the second engagement grooves 12b, 13b and the second engagement pins 16a, 17a.
The upper buffer tank 2 and the heat-retaining water tank 5 can be attached to the support base 1 by engaging with each other.
In addition, the upper buffer tank 2 and the heat-retaining water tank 5 are supported by a stand 1.
When removing it, all you have to do is lift it upward, making it easy to attach and remove.

下部緩衝液槽7は、支え台1に取り付け、取り
外しが容易に行なえるように保持されており、第
3図で2点鎖線で示すように、前面板11の前面
に、2枚のガラス板からなる支持板により厚さが
ほぼ均一なシート状の支持媒体を挾持した支持具
アセンブリ20を取り付けた後、上記のようにし
て上部緩衝液槽7と保温水槽5を支え台1に取り
付ける。このようにすると支持具アセンブリ20
が、上部緩衝液槽2の前面の切り欠き11bおよ
び保温水槽5の前面開口11aを塞ぐが、この時
の支持具アセンブリ20と前面プレート11の接
触面の間から緩衝液もしくは水が漏れないように
緩衝液槽パツキン4および水槽パツキン6が前面
プレート11上に設けられている。アセンブリ2
0は実質的に電気非伝導性かつ実質的に非可撓性
であり、例えば、ガラス、セラミツクス、有機ポ
リマー(例:ポリメチルメタクリレート;ビスフ
エノールAのポリカルボネート;セルロースアセ
テートプロピオネート等)からなり、透明または
白色であることが好ましい。
The lower buffer tank 7 is attached to the support stand 1 and held so that it can be easily removed.As shown by the two-dot chain line in FIG. After attaching the support assembly 20 in which a sheet-like support medium of substantially uniform thickness is held between support plates, the upper buffer solution tank 7 and the heat-retaining water tank 5 are attached to the support base 1 as described above. In this way, the support assembly 20
The notch 11b on the front surface of the upper buffer solution tank 2 and the front opening 11a of the thermal water tank 5 are closed, but at this time, the buffer solution or water is not leaked from between the contact surface of the support assembly 20 and the front plate 11. A buffer tank gasket 4 and a water tank gasket 6 are provided on the front plate 11. Assembly 2
0 is substantially electrically nonconductive and substantially inflexible, such as glass, ceramics, organic polymers (e.g., polymethyl methacrylate; polycarbonate of bisphenol A; cellulose acetate propionate, etc.) It is preferably transparent or white.

なお、支持具アセンブリ20は第4A図および
第4B図(第4A図の矢印B−Bに沿つた断面
図)に示すように、支持板としての2枚のガラス
板21a,21bの左右に所定厚さのスペーサ2
3a,23bを挟み、このスペーサ23a,23
bに囲まれた2枚のガラス板21a,21bの間
にゲル調整液を注入してこれをゲル化させ、厚さ
の均一なシート状ゲル膜からなる支持媒体22を
形成させたものを用いる。また、これに代えて、
第5図に示すように2枚の電気非伝導性有機ポリ
マーフイルムからなる支持体24a,24bの左
右に所定厚さのスペーサ23a,23bを挟み、
このスペーサ23a,23bに囲まれた2枚のプ
ラスチツクフイルム24a,24bの間に厚さ均
一なゲル膜(支持体)22を挾持したものを、2
枚のガラス板21a,21bで挾持したものを用
いてもよい。
As shown in FIGS. 4A and 4B (a sectional view taken along the arrow B-B in FIG. 4A), the support assembly 20 is mounted on the left and right sides of two glass plates 21a and 21b serving as support plates. thickness spacer 2
These spacers 23a, 23 sandwich 3a, 23b.
A gel conditioning solution is injected between two glass plates 21a and 21b surrounded by b to gel it, thereby forming a support medium 22 made of a sheet-like gel film with a uniform thickness. . Also, instead of this,
As shown in FIG. 5, spacers 23a and 23b of a predetermined thickness are sandwiched on the left and right sides of supports 24a and 24b made of two electrically non-conductive organic polymer films,
A gel film (support) 22 having a uniform thickness is sandwiched between two plastic films 24a and 24b surrounded by spacers 23a and 23b.
It may be held between two glass plates 21a and 21b.

以上のようにして、電気泳動装置の前面に第3
図の鎖線で示すように支持具アセンブリ20を取
り付けた後、上部および下部緩衝液槽2,7に緩
衝液を入れ、保温水槽5内に水を入れる。この
後、外部端子3a,8a間に所定電圧を印加し、
電気泳動を行なう。なお、支持具アセンブリ20
を構成するガラス板21a,21bのうち前面プ
レート11と対向するガラス板21の上端は前面
プレート11の上端の切り欠きと同様の切り欠き
が形成されており、上部緩衝液槽2内の緩衝液は
この切り欠きを介してゲル膜(支持媒体)22の
上端と接触するようになつており、且つ、支持具
アセンブリ20の下端は下部緩衝液槽7内に突出
してゲル膜22の下端が下部緩衝液槽7内の緩衝
液と接触するようになつている。このため、外部
端子3a,8aに印加された電圧は緩衝液を介し
てゲル膜22に作用し、ゲル膜22の上端から注
入された蛋白質、核酸等の被電気泳動物質の電気
泳動がなされる。
As described above, the third
After the support assembly 20 is attached as shown by the chain line in the figure, a buffer solution is put into the upper and lower buffer solution tanks 2 and 7, and water is put into the heat-retaining water tank 5. After that, a predetermined voltage is applied between the external terminals 3a and 8a,
Perform electrophoresis. Note that the support assembly 20
The upper end of the glass plate 21 facing the front plate 11 is formed with a notch similar to the upper end of the front plate 11 among the glass plates 21a and 21b constituting the buffer solution tank 2. is in contact with the upper end of the gel membrane (support medium) 22 through this notch, and the lower end of the support assembly 20 protrudes into the lower buffer tank 7 so that the lower end of the gel membrane 22 is in contact with the upper end of the gel membrane (supporting medium) 22. It is designed to come into contact with the buffer solution in the buffer solution tank 7. Therefore, the voltage applied to the external terminals 3a and 8a acts on the gel membrane 22 through the buffer solution, and electrophoresis of the electrophoresed substances such as proteins and nucleic acids injected from the upper end of the gel membrane 22 is performed. .

この場合において、支持具アセンブリ20が、
保温水槽5の前面開口11aを水密に塞いでいる
ので、この部分においては保温水槽5内の水が支
持具アセンブリ20と接触しており、これにより
支持具アセンブリ20の温度が均一化される。こ
のため、支持媒体22の冷却(もしくは保温)効
果が前面にわたつてほぼ均一になり、スマイリン
グ効果の発生を防止できる。
In this case, the support assembly 20 is
Since the front opening 11a of the heat-retaining water tank 5 is watertightly closed, the water in the heat-retaining water tank 5 comes into contact with the support assembly 20 in this portion, thereby making the temperature of the support assembly 20 uniform. Therefore, the cooling (or heat-retaining) effect of the support medium 22 becomes almost uniform over the front surface, and it is possible to prevent the smiling effect from occurring.

なお、保温水槽5内の水温は常に実質的に一定
に保つのが望ましく、第1図から第3図の装置に
示すように水槽5の下部に水温調整用ヒーター9
を配設するのが好ましい。
Note that it is desirable to keep the water temperature in the heat-retaining water tank 5 substantially constant at all times, and as shown in the apparatus shown in FIGS.
It is preferable to provide

以上のようにして、電気泳動を行なつた後、支
持具アセンブリ20を取り外すには、まず、一体
になつた上部緩衝液槽2と保温水槽5の前面に支
持具アセンブリ20を取り付けたままこれを支え
台1に対して上方へ動かし、第1係合溝12a,
13aと第1係合ピン16b,17bの係合およ
び第2係合溝16a,17aと第2係合ピン12
b,13bの係合を外し、支え台1に固定された
下部緩衝液槽7を支え台1上に残したまま、上部
緩衝液槽2,保温水槽5および支持具アセンブリ
20を一体にして取り外す。上部緩衝液槽2内の
緩衝液と保温水槽5内の水とは、汚染されていな
いのでそのまま捨てることができ、一方支持媒体
中の被泳動物質に加えられた放射性物質で汚染さ
れた下部緩衝液槽7内の緩衝液は、別途処理でき
る。
In order to remove the support assembly 20 after performing electrophoresis as described above, first, remove the support assembly 20 with the support assembly 20 attached to the front of the integrated upper buffer tank 2 and thermal water tank 5. is moved upward relative to the support base 1, and the first engagement grooves 12a,
13a and the first engagement pins 16b, 17b and the second engagement grooves 16a, 17a and the second engagement pin 12
b, 13b, and remove the upper buffer tank 2, thermal water tank 5, and support assembly 20 as one unit while leaving the lower buffer tank 7 fixed to the support stand 1 on the support stand 1. . The buffer solution in the upper buffer solution tank 2 and the water in the thermal water tank 5 are uncontaminated and can be thrown away as is, while the lower buffer solution is contaminated with radioactive substances added to the analyte material in the support medium. The buffer solution in the liquid tank 7 can be treated separately.

(発明の効果) 以上説明したように、本発明によれば、下部緩
衝液槽を保持する支え台に対して、上部緩衝液
槽、保温水槽等を一体にして上下動させるだけで
両者を係合・離脱させることができるように構成
しているので、放射性物質により汚染された下部
緩衝液槽内の緩衝液と、汚染されていない上部緩
衝液槽内の緩衝液および保温水槽内の水とを、
別々に処理することができ、装置の取り扱いが便
利である。
(Effects of the Invention) As explained above, according to the present invention, the upper buffer solution tank, the heat-retaining water tank, etc. can be connected to each other by simply moving the upper buffer solution tank, heat-retaining water tank, etc. up and down with respect to the support base that holds the lower buffer solution tank. Since the structure is configured so that they can be combined and separated, the buffer solution in the lower buffer tank contaminated with radioactive materials and the uncontaminated buffer solution in the upper buffer tank and the water in the thermal water tank can be separated. of,
It can be processed separately and the handling of the equipment is convenient.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る電気泳動装置の1例を示
す斜視図、第2図は上記装置を前方から見た正面
図、第3図は第2図の矢印A−Aに沿つた断面
図、第4A図および第4B図は上記装置に取り付
けて電気泳動を行なわせる支持具アセンブリを示
す断面図、第5図は支持具アセンブリの異なる例
を示す断面図、第6図は従来の支持具による支持
媒体上に展開された泳動パターンのスマイリング
効果の状態を示す模式図、第7図は従来の電気泳
動装置の1例を示す断面図である。 1……支え台、2……上部緩衝液槽、3……上
部電極、5……保温水槽、7……下部緩衝液槽、
8……下部電極、9……水温調整用ヒーター、1
2,13……側面プレート、16,17……垂直
プレート、20……支持具アセンブリ、22……
ゲル膜。
FIG. 1 is a perspective view showing one example of an electrophoresis device according to the present invention, FIG. 2 is a front view of the device seen from the front, and FIG. 3 is a sectional view taken along arrow A-A in FIG. 2. , FIGS. 4A and 4B are sectional views showing a support assembly that is attached to the above-mentioned apparatus to perform electrophoresis, FIG. 5 is a sectional view showing different examples of the support assembly, and FIG. 6 is a conventional support assembly. FIG. 7 is a cross-sectional view showing an example of a conventional electrophoresis device. 1... Support stand, 2... Upper buffer tank, 3... Upper electrode, 5... Warm water tank, 7... Lower buffer tank,
8...Lower electrode, 9...Heater for water temperature adjustment, 1
2, 13... Side plate, 16, 17... Vertical plate, 20... Support assembly, 22...
gel membrane.

Claims (1)

【特許請求の範囲】 1 電気泳動用支持媒体を挾持する実質的に電気
非伝導性かつ非可撓性の2枚の平板状支持板を、
前記媒体と該支持板の間が水密に保たれるように
固定しうる支え台、前記支持板の上端開口と連通
し、内部に緩衝液を収容保持しうる上部緩衝液
槽、前記支持板の下端開口と連通し、内部に緩衝
液を収容し得る下部緩衝液槽、前記上部および下
部緩衝液槽の各々に配された上部および下部電極
を有し、 該上部および下部電極間に所定電圧を印加する
ことにより前記上部および下部緩衝液槽内に収容
保持された緩衝液を介して前記媒体の上下方向に
電位勾配を与えて電気泳動を行ない得るようにし
た電気泳動装置であつて、 前記下部緩衝液槽を固定する支え台の上に上方
に延びて設けられた1対の垂直プレートと、該垂
直プレートに平行に上方に延び、前記上部緩衝液
槽を保持する1対の側面プレートと、両プレート
の相対的上下動により両プレートの係合・離脱を
行ない得る係合手段とを設け、 前記垂直プレートに対し前記側面プレートを下
動もしくは上動させるだけで両プレートの係合も
しくは離脱を行なわせることができるようにした
ことを特徴とする電気泳動装置。 2 係合手段により係合された前記側面プレート
と垂直プレートが前記支持板を支え台に固定する
手段を構成することを特徴とする特許請求の範囲
第1項記載の電気泳動装置。 3 前記支持板がガラス板であることを特徴とす
る特許請求の範囲第1項記載の電気泳動装置。
[Scope of Claims] 1. Two substantially electrically non-conductive and non-flexible flat support plates that sandwich an electrophoresis support medium,
a support base that can be fixed to maintain watertightness between the medium and the support plate; an upper buffer tank communicating with the upper end opening of the support plate and capable of containing and holding a buffer solution therein; and a lower end opening of the support plate. a lower buffer tank capable of containing a buffer solution therein; and upper and lower electrodes disposed in each of the upper and lower buffer tanks, and a predetermined voltage is applied between the upper and lower electrodes. An electrophoresis apparatus capable of performing electrophoresis by applying a potential gradient in the vertical direction of the medium through buffer solutions contained and held in the upper and lower buffer solution tanks, wherein the lower buffer solution a pair of vertical plates extending upwardly on a support base for fixing the tank; a pair of side plates extending upward parallel to the vertical plates and holding the upper buffer tank; and both plates. and an engagement means capable of engaging and disengaging both plates by relative vertical movement of the plate, and engaging or disengaging the plates simply by moving the side plate downward or upward relative to the vertical plate. An electrophoresis device characterized by being able to perform 2. The electrophoresis device according to claim 1, wherein the side plate and the vertical plate engaged by the engagement means constitute means for fixing the support plate to a support base. 3. The electrophoresis device according to claim 1, wherein the support plate is a glass plate.
JP60120143A 1985-06-03 1985-06-03 Electrophoresis device Granted JPS61278337A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60120143A JPS61278337A (en) 1985-06-03 1985-06-03 Electrophoresis device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60120143A JPS61278337A (en) 1985-06-03 1985-06-03 Electrophoresis device

Publications (2)

Publication Number Publication Date
JPS61278337A JPS61278337A (en) 1986-12-09
JPH0358664B2 true JPH0358664B2 (en) 1991-09-06

Family

ID=14779027

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60120143A Granted JPS61278337A (en) 1985-06-03 1985-06-03 Electrophoresis device

Country Status (1)

Country Link
JP (1) JPS61278337A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5432556U (en) * 1977-08-08 1979-03-03

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5432556U (en) * 1977-08-08 1979-03-03

Also Published As

Publication number Publication date
JPS61278337A (en) 1986-12-09

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