JPH0355232A - Lowshrinkable polyimide film - Google Patents
Lowshrinkable polyimide filmInfo
- Publication number
- JPH0355232A JPH0355232A JP19053689A JP19053689A JPH0355232A JP H0355232 A JPH0355232 A JP H0355232A JP 19053689 A JP19053689 A JP 19053689A JP 19053689 A JP19053689 A JP 19053689A JP H0355232 A JPH0355232 A JP H0355232A
- Authority
- JP
- Japan
- Prior art keywords
- film
- acid
- tension
- heat
- polyimide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001721 polyimide Polymers 0.000 title claims abstract description 20
- 238000010438 heat treatment Methods 0.000 claims abstract description 17
- 230000001678 irradiating effect Effects 0.000 claims abstract description 8
- 238000001816 cooling Methods 0.000 claims abstract description 4
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 abstract description 21
- 239000004642 Polyimide Substances 0.000 abstract description 5
- 239000002904 solvent Substances 0.000 abstract description 5
- 150000004985 diamines Chemical class 0.000 abstract description 4
- 238000006068 polycondensation reaction Methods 0.000 abstract description 4
- 125000006158 tetracarboxylic acid group Chemical group 0.000 abstract description 4
- 239000003054 catalyst Substances 0.000 abstract description 3
- 239000012024 dehydrating agents Substances 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- -1 sulfone dianhydride Chemical class 0.000 description 10
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 9
- 150000008064 anhydrides Chemical class 0.000 description 9
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 235000014113 dietary fatty acids Nutrition 0.000 description 4
- 229930195729 fatty acid Natural products 0.000 description 4
- 239000000194 fatty acid Substances 0.000 description 4
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000004984 aromatic diamines Chemical class 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- JYYNAJVZFGKDEQ-UHFFFAOYSA-N 2,4-Dimethylpyridine Chemical compound CC1=CC=NC(C)=C1 JYYNAJVZFGKDEQ-UHFFFAOYSA-N 0.000 description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 2
- NURQLCJSMXZBPC-UHFFFAOYSA-N 3,4-dimethylpyridine Chemical compound CC1=CC=NC=C1C NURQLCJSMXZBPC-UHFFFAOYSA-N 0.000 description 2
- HWWYDZCSSYKIAD-UHFFFAOYSA-N 3,5-dimethylpyridine Chemical compound CC1=CN=CC(C)=C1 HWWYDZCSSYKIAD-UHFFFAOYSA-N 0.000 description 2
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 2
- ZEYHEAKUIGZSGI-UHFFFAOYSA-N 4-methoxybenzoic acid Chemical compound COC1=CC=C(C(O)=O)C=C1 ZEYHEAKUIGZSGI-UHFFFAOYSA-N 0.000 description 2
- FKNQCJSGGFJEIZ-UHFFFAOYSA-N 4-methylpyridine Chemical compound CC1=CC=NC=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-N 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- 229930188620 butyrolactone Natural products 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 2
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- GPSDUZXPYCFOSQ-UHFFFAOYSA-N m-toluic acid Chemical compound CC1=CC=CC(C(O)=O)=C1 GPSDUZXPYCFOSQ-UHFFFAOYSA-N 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- LPNBBFKOUUSUDB-UHFFFAOYSA-N p-toluic acid Chemical compound CC1=CC=C(C(O)=O)C=C1 LPNBBFKOUUSUDB-UHFFFAOYSA-N 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- QAEDZJGFFMLHHQ-UHFFFAOYSA-N trifluoroacetic anhydride Chemical compound FC(F)(F)C(=O)OC(=O)C(F)(F)F QAEDZJGFFMLHHQ-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- PNVPNXKRAUBJGW-UHFFFAOYSA-N (2-chloroacetyl) 2-chloroacetate Chemical compound ClCC(=O)OC(=O)CCl PNVPNXKRAUBJGW-UHFFFAOYSA-N 0.000 description 1
- RVNSAAIWCWTCTJ-ZPQYLTHOSA-N (2s,3s,4r)-2-(1,2-dihydroxyethyl)pyrrolidine-3,4-diol Chemical compound OCC(O)[C@@H]1NC[C@@H](O)[C@H]1O RVNSAAIWCWTCTJ-ZPQYLTHOSA-N 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- LNETULKMXZVUST-UHFFFAOYSA-N 1-naphthoic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1 LNETULKMXZVUST-UHFFFAOYSA-N 0.000 description 1
- NOGFHTGYPKWWRX-UHFFFAOYSA-N 2,2,6,6-tetramethyloxan-4-one Chemical compound CC1(C)CC(=O)CC(C)(C)O1 NOGFHTGYPKWWRX-UHFFFAOYSA-N 0.000 description 1
- ALLSOOQIDPLIER-UHFFFAOYSA-N 2,3,4-trichlorobenzoic acid Chemical compound OC(=O)C1=CC=C(Cl)C(Cl)=C1Cl ALLSOOQIDPLIER-UHFFFAOYSA-N 0.000 description 1
- HZNQSWJZTWOTKM-UHFFFAOYSA-N 2,3,4-trimethoxybenzoic acid Chemical compound COC1=CC=C(C(O)=O)C(OC)=C1OC HZNQSWJZTWOTKM-UHFFFAOYSA-N 0.000 description 1
- QAOJBHRZQQDFHA-UHFFFAOYSA-N 2,3-dichlorobenzoic acid Chemical class OC(=O)C1=CC=CC(Cl)=C1Cl QAOJBHRZQQDFHA-UHFFFAOYSA-N 0.000 description 1
- VEUMBMHMMCOFAG-UHFFFAOYSA-N 2,3-dihydrooxadiazole Chemical compound N1NC=CO1 VEUMBMHMMCOFAG-UHFFFAOYSA-N 0.000 description 1
- RIZUCYSQUWMQLX-UHFFFAOYSA-N 2,3-dimethylbenzoic acid Chemical class CC1=CC=CC(C(O)=O)=C1C RIZUCYSQUWMQLX-UHFFFAOYSA-N 0.000 description 1
- NRGGMCIBEHEAIL-UHFFFAOYSA-N 2-ethylpyridine Chemical compound CCC1=CC=CC=N1 NRGGMCIBEHEAIL-UHFFFAOYSA-N 0.000 description 1
- XWKFPIODWVPXLX-UHFFFAOYSA-N 2-methyl-5-methylpyridine Natural products CC1=CC=C(C)N=C1 XWKFPIODWVPXLX-UHFFFAOYSA-N 0.000 description 1
- VDOKWPVSGXHSNP-UHFFFAOYSA-N 2-methylprop-1-en-1-one Chemical compound CC(C)=C=O VDOKWPVSGXHSNP-UHFFFAOYSA-N 0.000 description 1
- ICNCZFQYZKPYMS-UHFFFAOYSA-N 2-methylpropanoyl bromide Chemical compound CC(C)C(Br)=O ICNCZFQYZKPYMS-UHFFFAOYSA-N 0.000 description 1
- DGMOBVGABMBZSB-UHFFFAOYSA-N 2-methylpropanoyl chloride Chemical compound CC(C)C(Cl)=O DGMOBVGABMBZSB-UHFFFAOYSA-N 0.000 description 1
- UOBYKYZJUGYBDK-UHFFFAOYSA-N 2-naphthoic acid Chemical compound C1=CC=CC2=CC(C(=O)O)=CC=C21 UOBYKYZJUGYBDK-UHFFFAOYSA-N 0.000 description 1
- ILYSAKHOYBPSPC-UHFFFAOYSA-N 2-phenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C1=CC=CC=C1 ILYSAKHOYBPSPC-UHFFFAOYSA-N 0.000 description 1
- HUWXDEQWWKGHRV-UHFFFAOYSA-N 3,3'-Dichlorobenzidine Chemical compound C1=C(Cl)C(N)=CC=C1C1=CC=C(N)C(Cl)=C1 HUWXDEQWWKGHRV-UHFFFAOYSA-N 0.000 description 1
- UMVOQQDNEYOJOK-UHFFFAOYSA-N 3,5-dimethylbenzoic acid Chemical compound CC1=CC(C)=CC(C(O)=O)=C1 UMVOQQDNEYOJOK-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- YEEIWUUBRYZFEH-UHFFFAOYSA-N 3-methoxyhexane-1,6-diamine Chemical compound NCCC(OC)CCCN YEEIWUUBRYZFEH-UHFFFAOYSA-N 0.000 description 1
- AFPHTEQTJZKQAQ-UHFFFAOYSA-N 3-nitrobenzoic acid Chemical compound OC(=O)C1=CC=CC([N+]([O-])=O)=C1 AFPHTEQTJZKQAQ-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- AVCOFPOLGHKJQB-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)sulfonylphthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 AVCOFPOLGHKJQB-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- ZQVKTHRQIXSMGY-UHFFFAOYSA-N 4-Ethylbenzoic acid Chemical compound CCC1=CC=C(C(O)=O)C=C1 ZQVKTHRQIXSMGY-UHFFFAOYSA-N 0.000 description 1
- OSGFBINRYVUILV-UHFFFAOYSA-N 4-[(4-aminophenyl)-diethylsilyl]aniline Chemical compound C=1C=C(N)C=CC=1[Si](CC)(CC)C1=CC=C(N)C=C1 OSGFBINRYVUILV-UHFFFAOYSA-N 0.000 description 1
- BLMSGSGJGUHKFW-UHFFFAOYSA-N 4-[(4-aminophenyl)-diphenylsilyl]aniline Chemical compound C1=CC(N)=CC=C1[Si](C=1C=CC(N)=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 BLMSGSGJGUHKFW-UHFFFAOYSA-N 0.000 description 1
- KTZLSMUPEJXXBO-UHFFFAOYSA-N 4-[(4-aminophenyl)-phenylphosphoryl]aniline Chemical compound C1=CC(N)=CC=C1P(=O)(C=1C=CC(N)=CC=1)C1=CC=CC=C1 KTZLSMUPEJXXBO-UHFFFAOYSA-N 0.000 description 1
- DBOLXXRVIFGDTI-UHFFFAOYSA-N 4-benzylpyridine Chemical compound C=1C=NC=CC=1CC1=CC=CC=C1 DBOLXXRVIFGDTI-UHFFFAOYSA-N 0.000 description 1
- HVCNXQOWACZAFN-UHFFFAOYSA-N 4-ethylmorpholine Chemical compound CCN1CCOCC1 HVCNXQOWACZAFN-UHFFFAOYSA-N 0.000 description 1
- OTLNPYWUJOZPPA-UHFFFAOYSA-N 4-nitrobenzoic acid Chemical compound OC(=O)C1=CC=C([N+]([O-])=O)C=C1 OTLNPYWUJOZPPA-UHFFFAOYSA-N 0.000 description 1
- ATZHGRNFEFVDDJ-UHFFFAOYSA-N 4-propylbenzoic acid Chemical compound CCCC1=CC=C(C(O)=O)C=C1 ATZHGRNFEFVDDJ-UHFFFAOYSA-N 0.000 description 1
- FJKTYFIQYGESSG-UHFFFAOYSA-N 5-[2-(4-amino-2-methylpentyl)phenyl]-4-methylpentan-2-amine Chemical compound CC(N)CC(C)CC1=CC=CC=C1CC(C)CC(C)N FJKTYFIQYGESSG-UHFFFAOYSA-N 0.000 description 1
- MBRGOFWKNLPACT-UHFFFAOYSA-N 5-methylnonane-1,9-diamine Chemical compound NCCCCC(C)CCCCN MBRGOFWKNLPACT-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- HNQHUWHQMJTWRA-UHFFFAOYSA-N NC1=CC=C(C=C1)C(C[PH2]=O)C1=CC=C(C=C1)N Chemical compound NC1=CC=C(C=C1)C(C[PH2]=O)C1=CC=C(C=C1)N HNQHUWHQMJTWRA-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 241000489523 Veratrum Species 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- FXXACINHVKSMDR-UHFFFAOYSA-N acetyl bromide Chemical compound CC(Br)=O FXXACINHVKSMDR-UHFFFAOYSA-N 0.000 description 1
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 1
- 239000012346 acetyl chloride Substances 0.000 description 1
- LEKJTGQWLAUGQA-UHFFFAOYSA-N acetyl iodide Chemical compound CC(I)=O LEKJTGQWLAUGQA-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- FOLJMFFBEKONJP-UHFFFAOYSA-N adamantane-1,3-diamine Chemical compound C1C(C2)CC3CC1(N)CC2(N)C3 FOLJMFFBEKONJP-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- GCAIEATUVJFSMC-UHFFFAOYSA-N benzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1C(O)=O GCAIEATUVJFSMC-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- YHASWHZGWUONAO-UHFFFAOYSA-N butanoyl butanoate Chemical compound CCCC(=O)OC(=O)CCC YHASWHZGWUONAO-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- ICRGCTYTLVGZOU-UHFFFAOYSA-N ctk4c2791 Chemical compound FS(Cl)=O ICRGCTYTLVGZOU-UHFFFAOYSA-N 0.000 description 1
- YQLZOAVZWJBZSY-UHFFFAOYSA-N decane-1,10-diamine Chemical compound NCCCCCCCCCCN YQLZOAVZWJBZSY-UHFFFAOYSA-N 0.000 description 1
- IBDMRHDXAQZJAP-UHFFFAOYSA-N dichlorophosphorylbenzene Chemical compound ClP(Cl)(=O)C1=CC=CC=C1 IBDMRHDXAQZJAP-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 1
- AOMUALOCHQKUCD-UHFFFAOYSA-N dodecyl 4-chloro-3-[[3-(4-methoxyphenyl)-3-oxopropanoyl]amino]benzoate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC=C(Cl)C(NC(=O)CC(=O)C=2C=CC(OC)=CC=2)=C1 AOMUALOCHQKUCD-UHFFFAOYSA-N 0.000 description 1
- CCGKOQOJPYTBIH-UHFFFAOYSA-N ethenone Chemical compound C=C=O CCGKOQOJPYTBIH-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- VGGRCVDNFAQIKO-UHFFFAOYSA-N formic anhydride Chemical class O=COC=O VGGRCVDNFAQIKO-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- ZHDTXTDHBRADLM-UHFFFAOYSA-N hydron;2,3,4,5-tetrahydropyridin-6-amine;chloride Chemical compound Cl.NC1=NCCCC1 ZHDTXTDHBRADLM-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 150000002561 ketenes Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 1
- CIXSDMKDSYXUMJ-UHFFFAOYSA-N n,n-diethylcyclohexanamine Chemical compound CCN(CC)C1CCCCC1 CIXSDMKDSYXUMJ-UHFFFAOYSA-N 0.000 description 1
- OLAPPGSPBNVTRF-UHFFFAOYSA-N naphthalene-1,4,5,8-tetracarboxylic acid Chemical compound C1=CC(C(O)=O)=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1C(O)=O OLAPPGSPBNVTRF-UHFFFAOYSA-N 0.000 description 1
- SXJVFQLYZSNZBT-UHFFFAOYSA-N nonane-1,9-diamine Chemical compound NCCCCCCCCCN SXJVFQLYZSNZBT-UHFFFAOYSA-N 0.000 description 1
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 1
- VQXBKCWOCJSIRT-UHFFFAOYSA-N octadecane-1,12-diamine Chemical compound CCCCCCC(N)CCCCCCCCCCCN VQXBKCWOCJSIRT-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- XGISHOFUAFNYQF-UHFFFAOYSA-N pentanoyl chloride Chemical compound CCCCC(Cl)=O XGISHOFUAFNYQF-UHFFFAOYSA-N 0.000 description 1
- DUCKXCGALKOSJF-UHFFFAOYSA-N pentanoyl pentanoate Chemical compound CCCCC(=O)OC(=O)CCCC DUCKXCGALKOSJF-UHFFFAOYSA-N 0.000 description 1
- JGGWKXMPICYBKC-UHFFFAOYSA-N phenanthrene-1,8,9,10-tetracarboxylic acid Chemical compound C1=CC=C(C(O)=O)C2=C(C(O)=O)C(C(O)=O)=C3C(C(=O)O)=CC=CC3=C21 JGGWKXMPICYBKC-UHFFFAOYSA-N 0.000 description 1
- SKFLCXNDKRUHTA-UHFFFAOYSA-N phenyl(pyridin-4-yl)methanone Chemical compound C=1C=NC=CC=1C(=O)C1=CC=CC=C1 SKFLCXNDKRUHTA-UHFFFAOYSA-N 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- RIBFXMJCUYXJDZ-UHFFFAOYSA-N propanoyl bromide Chemical compound CCC(Br)=O RIBFXMJCUYXJDZ-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- WYVAMUWZEOHJOQ-UHFFFAOYSA-N propionic anhydride Chemical compound CCC(=O)OC(=O)CC WYVAMUWZEOHJOQ-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010902 straw Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- HFRXJVQOXRXOPP-UHFFFAOYSA-N thionyl bromide Chemical compound BrS(Br)=O HFRXJVQOXRXOPP-UHFFFAOYSA-N 0.000 description 1
- LSJNBGSOIVSBBR-UHFFFAOYSA-N thionyl fluoride Chemical compound FS(F)=O LSJNBGSOIVSBBR-UHFFFAOYSA-N 0.000 description 1
- PVFOMCVHYWHZJE-UHFFFAOYSA-N trichloroacetyl chloride Chemical compound ClC(=O)C(Cl)(Cl)Cl PVFOMCVHYWHZJE-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229940057613 veratrum Drugs 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は熱に対する収縮性が改善された低収縮性ポリイ
ミドフィルムに関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a low-shrinkage polyimide film with improved heat-shrinkability.
〔従来の技術]
芳香族テトラカルボン酸二無水物と芳香族ジアミンを重
縮合して得られるポリイくドは極めて耐熱性に優れたボ
リマーとして知られている.このポリイ泉ドは溶媒に不
溶であるが、その前駆体であるボリアミド酸は特定の有
機溶媒に可溶であるため、このボリアミド酸有機溶媒溶
液を流延し、イミド化と同時に乾燥することにより耐熱
性のフィルムが得られる。[Prior Art] Polyylide obtained by polycondensation of aromatic tetracarboxylic dianhydride and aromatic diamine is known as a polymer with extremely excellent heat resistance. This polyester is insoluble in solvents, but its precursor, polyamic acid, is soluble in specific organic solvents. A heat-resistant film is obtained.
このボリイξドフィルムは耐熱性、絶縁性及び機械特性
に優れているため、フレキシブルプリント基板のベース
フィルムとして従来から利用されている。Since this solid ξ film has excellent heat resistance, insulation properties, and mechanical properties, it has been conventionally used as a base film for flexible printed circuit boards.
〔発明が解決しようとする課題]
ポリイミドフィルムをベースフィルムとしてフレキシブ
ルプリント基板を作るためには銅等の金属箔を積層する
かあるいは真空蒸着,スパッタリング等により金属を付
着させる必要があるが、この工程でかなりの熱がかかる
ため、熱に対する寸法安定性が要求される。[Problem to be solved by the invention] In order to make a flexible printed circuit board using a polyimide film as a base film, it is necessary to laminate metal foil such as copper or to attach metal by vacuum evaporation, sputtering, etc. Since a considerable amount of heat is applied to the material, dimensional stability against heat is required.
特に、最近ではフレキシブルプリント基板のファインパ
ターン化により、熱による収縮が小さいポリイミドフィ
ルムが望まれている。In particular, with the recent trend toward fine patterning of flexible printed circuit boards, polyimide films that shrink less due to heat are desired.
このような要求に応える手段として、特開昭62−41
024号公報にはボリイξドフィルムを実質的に無張力
下、加熱オーブン中で加熱処理した後、冷却する方法が
提案されている。As a means to meet such demands,
Japanese Patent No. 024 proposes a method in which a boiled ξ-d film is heat-treated in a heating oven under substantially no tension, and then cooled.
無張力下で熱処理する方法は潜在収縮応力を緩和し、そ
の後の加熱に対して収縮が小さくなるため、有効な方法
であるが、次のような欠点がある。The method of heat treatment under no tension is an effective method because it relieves latent shrinkage stress and shrinkage becomes smaller with respect to subsequent heating, but it has the following drawbacks.
即ち、無張力下で熱処理するためにはフィルムを巻いた
ロールを加熱オーブン中に放置する方法(特開昭62−
41024号公報実施例)あるいは巻出し、巻取り機を
備えた連続型加熱炉中でフィルムを連続的に処理する方
法があるが、いずれにしても無張力下で長時間処理する
ことになるのでフィルムが波を打つ状態になり、熱収縮
率がばらつく問題が生じる。特に連続処理の場合にはフ
ィルムが蛇行して完全な製品のロールが得られないとい
う不都合が生じる。That is, in order to perform heat treatment under no tension, a method is disclosed in which a roll of film is left in a heating oven (Japanese Unexamined Patent Publication No. 1986-62-1).
41024 (example)) or there is a method of continuously processing the film in a continuous heating furnace equipped with an unwinding and winding machine, but in either case, the film must be processed for a long time under no tension. The problem arises that the film becomes wavy and the heat shrinkage rate varies. Particularly in the case of continuous processing, the disadvantage arises that the film meanderes, making it impossible to obtain a complete roll of product.
また、乾燥機の中に放置するバッチ式であってもフィル
ム表面にしわが発生することは防ぐことができず、精密
なプリント基板のベースフィルムとしては適用できなく
なる欠点がある。Furthermore, even if the film is left in a dryer in batch mode, wrinkles cannot be prevented from forming on the surface of the film, which has the drawback that it cannot be used as a base film for precision printed circuit boards.
本発明は上記従来技術の欠点を解消し、低収縮性で、か
つ製品の製造効率の良いボリイ2ドフィルムの提供を課
題とするものである.〔課題を解決するための手段〕
上記課題を解決するため、本発明は次の手段をとる。It is an object of the present invention to overcome the drawbacks of the above-mentioned prior art and to provide a polyimide film that has low shrinkage and is highly efficient in product production. [Means for Solving the Problems] In order to solve the above problems, the present invention takes the following measures.
即ち本発明の低収縮性ポリイ藁ドフィルムは、フィルム
の長さ方向の張力をlOkg/m以下に保ち、遠赤外線
を照射して短時間で加熱処理を施した後、冷却処理を施
してなることを特徴とするものである。That is, the low-shrinkage polyamide straw film of the present invention is obtained by maintaining the tension in the longitudinal direction of the film at 10 kg/m or less, heating it for a short time by irradiating it with far infrared rays, and then cooling it. It is characterized by this.
本発明におけるポリイミドは次の(1)式の構造を主と
して有するものである。The polyimide in the present invention mainly has the structure of the following formula (1).
OO
11]1
この(1)弐の構造は下記(II)弐の前駆体が閉環し
たものである。OO 11]1 The structure of (1) 2 is a ring-closed precursor of (II) 2 below.
(本頁以下余白)
00
l1)1
?ここでRは4価の芳香族基、R′は2価の芳香■族基
である。)
(I)弐の構造を有するポリイミドは、芳香族テトラカ
ルボン酸二無水物と芳香族ジアミンを、有機溶媒中で、
触媒および脱水剤の存在下に縮重合することにより得ら
れる。(Margins below this page) 00 l1) 1? Here, R is a tetravalent aromatic group, and R' is a divalent aromatic group. ) (I) The polyimide having the structure 2 is obtained by mixing an aromatic tetracarboxylic dianhydride and an aromatic diamine in an organic solvent.
Obtained by polycondensation in the presence of a catalyst and a dehydrating agent.
本発明で用いられる芳香族テトラカルボン酸二無水物と
しては、たとえばピロメリット酸二無水物、2.3.6
. 7−ナフタレンテトラヵルボン酸二無水物、3 .
3’, 4 .4’−ジフェニルテトラヵルボン酸二無
水物、1,2.5. 6−ナフタレンテトラカルボン酸
二無水物, 2 .2’, 3 .3’−ジフェニルテ
トラカルボン酸二無水物、2,2−ビス(3,4−ジカ
ルボキシフエニル)ブロバンニ無水物、ビス(3,4−
ジカルボキシフェニル)スルホンニ無水物、3.4,9
.10−ベリレンテトラカルボン酸二無水物、ビス(3
.4−ジカルボキシフエニル)エーテルニ無水物、ナフ
タレン−1.2.4. 5−テトラカルボン酸二無水物
、ナフタレン−1,4,5.8−テトラカルボン酸二無
水物、デカヒドロナフタレン−1.4,5. 8−テト
ラカルボン酸二無水物、4.8−ジメチル−1.2,3
.5,6. 7−へキサヒド口ナフタレン−1.2.5
. 6−テトラカルボン酸二無水物、2.6−ジクロ口
ナフタレン−1.45.8−テトラカルボン酸二無水物
、2.7−ジクロロナフタレン−1.4,5. 8−テ
トラカルボン酸二無水物、2.3,6. 7−テトラク
口口ナフタレン−1.4,5. 8−テトラカルボン酸
二無水物、フエナントレンー1.8,9.10−テトラ
カルボン酸二無水物、2.2−ビス(2,3−ジカルボ
キシフエニル)フロハン二=水s、t.i−ビス(2.
3−ジカルボキシフエニル)エタンニ無水物、1.1−
ビス(3,4−ジカルボキシフエニル〉エタンニ無水物
、ビス(2.3−ジカルボキシフエニル)メタンニ無水
物、ビス(3.4−ジカルボキシフエニル)メタンニ無
水物、ビス(3.4−ジカルボキシフエニル)スルホン
ニ無水物、ベンゼン−1.2, 3 .4−テトラカル
ボン酸二無水物、3,4.3’, 4 ’一ベンゾフエ
ノンテトラカルボン酸二無水物など、またはこれらの2
種以上の混合物が挙げられるが、なかでもビロメリット
酸二無水物の使用が好ましい。Examples of the aromatic tetracarboxylic dianhydride used in the present invention include pyromellitic dianhydride, 2.3.6
.. 7-naphthalenetetracarboxylic dianhydride, 3.
3', 4. 4'-diphenyltetracarboxylic dianhydride, 1,2.5. 6-naphthalenetetracarboxylic dianhydride, 2. 2', 3. 3'-diphenyltetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl)brovani anhydride, bis(3,4-
dicarboxyphenyl) sulfone dianhydride, 3.4,9
.. 10-Berylenetetracarboxylic dianhydride, bis(3
.. 4-dicarboxyphenyl)ether dianhydride, naphthalene-1.2.4. 5-tetracarboxylic dianhydride, naphthalene-1,4,5.8-tetracarboxylic dianhydride, decahydronaphthalene-1.4,5. 8-tetracarboxylic dianhydride, 4,8-dimethyl-1.2,3
.. 5,6. 7-Hexahydride naphthalene-1.2.5
.. 6-tetracarboxylic dianhydride, 2.6-dichloronaphthalene-1.45.8-tetracarboxylic dianhydride, 2.7-dichloronaphthalene-1.4,5. 8-tetracarboxylic dianhydride, 2.3,6. 7-tetrac-naphthalene-1.4,5. 8-tetracarboxylic dianhydride, phenanthrene-1.8,9.10-tetracarboxylic dianhydride, 2.2-bis(2,3-dicarboxyphenyl)fluorane di=water s, t. i-bis (2.
3-dicarboxyphenyl)ethane dianhydride, 1.1-
Bis(3,4-dicarboxyphenyl)ethanihydride, bis(2,3-dicarboxyphenyl)methanihydride, bis(3,4-dicarboxyphenyl)methanihydride, bis(3.4-dicarboxyphenyl)methanihydride -dicarboxyphenyl) sulfone dianhydride, benzene-1.2, 3.4-tetracarboxylic dianhydride, 3,4.3', 4'-benzophenonetetracarboxylic dianhydride, or these 2
Although mixtures of more than one species may be mentioned, use of biromellitic dianhydride is particularly preferred.
また、芳香族ジアミンとしては、たとえばメタフエニレ
ンジアミン、パラーフエニレンジアミン、4.4’−ジ
アミノージフエニルプロパン、4,4′−ジアミノージ
フエニルメタン、ベンチジン、4.4’−ジアミノージ
フエニルサルファイド、4,4′−ジアミノージフエニ
ルスルホン、3.3’ジアミノージフエニルスルホン、
4.4’−ジアミノージフエニルエーテル、2,6−ジ
アξノービリジン、ビス−(4−アミノーフエニル)ジ
エチルシラン、ビスー(4−アミノーフエニル)ジフエ
ニルシラン、3,3′−ジクロローベンチジン、ビス−
(4−アミノーフエニル)エチルホスフインオキサイド
、ビス−(4−アミノーフエニル)フエニルホスフィン
オキサイド、ビス−(4=アミノーフエニル)−N−フ
エニルアミン、ビスー(4−ア逅ノーフエニル)〜N−
メチルーアミン、l15−ジアミノーナフタレン、3.
3−ジメチル−4,4′−ジア≧ノービフエニル、3.
4′−ジメチル−3′,4−ジアミノービフエニル、3
.3’−ジメトキシベンチジン、2,4−ビス(ベータ
ーアミノーt−ブチル)トルエン、ビス(バラーベータ
ーアξノーt−プチルーフエニル)エーテル、バラービ
ス−(2−メチル−4−アミノーペンチル)ベンゼン、
バラービス−(1.1−ジメチル−5−アミノーペンチ
ル)ベンゼン、m−キシリレンジアミン、p−キシリレ
ンジアミン、1.3−ジアミノアダマンタン、3,3′
−ジアミノ−1,1−ジアダマンタン、3.3′一ジア
ミノメチル−1.1′−ジアダマンクン、ビス (パラ
ーアミノーシク口ヘキシル)メタン、ヘキサメチレンジ
アミン、ベプタメチレンジアミン、オクタメチレンジア
ミン、ノナメチレンジア2ン、デカメチレンジアミン、
3−メチルヘブタメチレンジア逅ン、4.4−ジメチル
へブタメチレンジアミン、2,l1−ジアミノードデカ
ン、12−ビス−(3−アξノーブロボキシ)エタン、
2,2−ジメチルプロピレンジアミン、3−メトキシー
へキサメチレンジアミン、2.5一ジメチルへキサメチ
レンジアミン、 2.5一ジメチルへブタメチレンジア
ミン、5−メチルノナメチレンジアξン、1,4−ジア
ξノーシクロヘキサン、1.12−ジアミノーオクタデ
カン、2,5−ジアミノ−1.3. 4−オキサジアゾ
ール、2.2−ビス(4−アミノフエニル)へキサフル
オ口プロパン、N− (3−アミノフエニル〉−4−ア
ミノベンズアミド、4−アミノフエニル−3−アξノベ
ンゾエートまたはこれらの2種以上の混合物が挙げられ
、なかでも4,4′−ジアミノジフエニルエーテルが好
ましく使用される。Examples of aromatic diamines include metaphenylene diamine, paraphenylene diamine, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenylmethane, benzidine, and 4,4'-diaminodiphenylpropane. diphenyl sulfide, 4,4'-diaminodiphenylsulfone, 3,3'diaminodiphenylsulfone,
4.4'-Diaminodiphenyl ether, 2,6-diaξnobilidine, bis-(4-aminophenyl)diethylsilane, bis-(4-aminophenyl)diphenylsilane, 3,3'-dichlorobenzidine, bis-
(4-aminophenyl)ethylphosphine oxide, bis-(4-aminophenyl)phenylphosphine oxide, bis-(4=aminophenyl)-N-phenylamine, bis-(4-aminophenyl)~N-
Methyl-amine, l15-diaminonaphthalene, 3.
3-dimethyl-4,4'-dia≧nobiphenyl, 3.
4'-dimethyl-3',4-diaminobiphenyl, 3
.. 3'-dimethoxybenzidine, 2,4-bis(beta-amino-t-butyl)toluene, bis(valavator axinot-t-butyruphenyl)ether, valar bis-(2-methyl-4-aminopentyl) benzene,
Barrabis-(1,1-dimethyl-5-aminopentyl)benzene, m-xylylenediamine, p-xylylenediamine, 1,3-diaminoadamantane, 3,3'
-Diamino-1,1-diadamantane, 3.3'-diaminomethyl-1.1'-diadamantane, bis(para-aminohexyl)methane, hexamethylene diamine, beptamethylene diamine, octamethylene diamine, nonamethylene diamine 2, decamethylene diamine,
3-methylhebutamethylene diamine, 4,4-dimethylhebutamethylene diamine, 2,l1-diaminodecane, 12-bis-(3-anobroboxy)ethane,
2,2-dimethylpropylenediamine, 3-methoxyhexamethylenediamine, 2.5-dimethylhexamethylenediamine, 2.5-dimethylhexamethylenediamine, 5-methylnonamethylenediamine, 1,4-dia ξNocyclohexane, 1,12-diamino-octadecane, 2,5-diamino-1.3. 4-oxadiazole, 2.2-bis(4-aminophenyl)hexafluoropropane, N-(3-aminophenyl>-4-aminobenzamide, 4-aminophenyl-3-aξnobenzoate, or two or more of these) Among them, 4,4'-diaminodiphenyl ether is preferably used.
次に、本発明でポリイミドの縮重合に用いられる有機溶
媒としては、N,N−ジメチルホルムアミド、N,N−
ジメチルアセトアミド、N,N−ジエチルホルムアミド
、N.N−ジエチルアセトアξド、N−ジメチルメトキ
シアセトアミド、N−メチルーカブロラクタム、ジメチ
ルスルホキシド、N−メチル−2−ピロリドン、テトラ
メチル尿素、ビリジン、ジメチルスルホン、ヘキサメチ
ルホスホルア呉ド、テトラメチレンスルホン、ホルムア
ミド、N−メチルホルムアミド及びプチロラクトンであ
る。これらの有機溶媒は単独または溶媒の組合せで、或
いはベンゼン、ペンゾニトリル、ジオキサン、プチロラ
クトン、キシレン、トルエン及びシクロヘキサンの如き
溶媒性の劣る溶媒との組合せにおいて用いることが出来
る。Next, the organic solvents used in the polycondensation of polyimide in the present invention include N,N-dimethylformamide, N,N-
Dimethylacetamide, N,N-diethylformamide, N. N-diethylacetamide, N-dimethylmethoxyacetamide, N-methylcabrolactam, dimethylsulfoxide, N-methyl-2-pyrrolidone, tetramethylurea, pyridine, dimethylsulfone, hexamethylphosphoramide, tetramethylene Sulfone, formamide, N-methylformamide and butyrolactone. These organic solvents can be used alone or in combination, or in combination with less solvent solvents such as benzene, penzonitrile, dioxane, butyrolactone, xylene, toluene, and cyclohexane.
触媒としては、第三級アミン類の使用が望ましく、これ
らアミン類の具体例としては、トリメチルアξン、トリ
エチルア果ン、トリエチレンジアミン、ビリジン、イソ
キノリン、2−エチルピリジン、2−メチルビリジン、
1・リエチルアミン、N一エチルモルフオリン、N−メ
チルモルフオリン、ジエチルシク口ヘキシルアミン、N
−ジメチルシク口へキシルアξン、4一ベンゾイルビリ
ジン、2.4−ルチジン、2,6ルチジン、2,4.
6−コリジン、3.4−ルチジン、3,5−ルチジン、
4−メチルビリジン、3−メチルビリジン、4−イソプ
ロビルビリジン、Nージメチルベンジルアミン、4−ベ
ンジルビリジン、及びN−ジメチルドデシルアミンなど
が挙げられる。As a catalyst, it is preferable to use tertiary amines, and specific examples of these amines include trimethylamine, triethylamine, triethylenediamine, pyridine, isoquinoline, 2-ethylpyridine, 2-methylpyridine,
1. ethylamine, N-ethylmorpholine, N-methylmorpholine, diethylcyclohexylamine, N
-dimethylcyclohexyluane, 4-benzoylpyridine, 2,4-lutidine, 2,6-lutidine, 2,4.
6-collidine, 3,4-lutidine, 3,5-lutidine,
Examples include 4-methylpyridine, 3-methylpyridine, 4-isopropylbyridine, N-dimethylbenzylamine, 4-benzylpyridine, and N-dimethyldodecylamine.
さらに、脱水剤としては有機カルボン酸無水物、N,
N’−ジアルキル力ルポジイミド類、低級脂肪酸ハロゲ
ン化物、ハロゲン化低級脂肪酸ハロゲン化物、ハロゲン
化低級脂肪酸無水物、アリールホスホン酸ジハロゲン化
物及びチオニルハロゲン化物が挙げられる。Furthermore, as a dehydrating agent, organic carboxylic acid anhydride, N,
Examples include N'-dialkyl luposiimides, lower fatty acid halides, halogenated lower fatty acid halides, halogenated lower fatty acid anhydrides, arylphosphonic acid dihalides, and thionyl halides.
ここで、有機カルボン酸無水物としては無水酢酸、プロ
ピオン酸無水物、酪酸無水物、吉草酸無水物、これらが
互いに混合された無水物及び芳香族モノカルボン酸例え
ば安息香酸、ナフトエ酸等の無水物との混合物、及び炭
酸及びギ酸並びに脂肪族ケテン類(ケテン及びジメチル
ケテン)の無水物との混合物などが挙げられるが、なか
でも無水酢酸およびケテン類の使用が好ましい。Here, examples of organic carboxylic anhydrides include acetic anhydride, propionic anhydride, butyric anhydride, valeric anhydride, anhydrides in which these are mixed with each other, and anhydrides of aromatic monocarboxylic acids such as benzoic acid and naphthoic acid. Examples include mixtures with carbonic acid and formic acid and anhydrides of aliphatic ketenes (ketene and dimethylketene), among which acetic anhydride and ketenes are preferably used.
安息香酸無水物のほか、他の使用し得る芳香族無水物に
は、0−、m一及びp−トルイル酸、m一及びp一エチ
ル安息香酸、p−プロビル安息香酸、p−イソブロビル
安息香酸、アニス酸、〇一、m一及びρ−ニトロ安息香
酸、0−、m一及びp−ハロ安息香酸、種々のジブロモ
及びジクロロ安息香酸、トリブロモ及びトリクロロ安息
香酸、ジメチル安息香酸の異性体例えばヘメリチル酸、
3,4−キシリル酸、イソキシリル酸及びメシチレン酸
、ベラトルム酸、トリメトキシ安患香酸、アルファ一及
びベーターナフトエ酸、及びビフェニルカルボン酸など
の酸の無水物、及び上記無水物相互の混合無水物及び脂
肪酸モノカルボン酸例えば酢酸、ブロピオン酸等の無水
物との混合物無水物、及び炭酸及びギ酸各無水物との混
合無水物が挙げられる。Besides benzoic anhydride, other aromatic anhydrides that may be used include o-, m- and p-toluic acid, m- and p-ethylbenzoic acid, p-propylbenzoic acid, p-isobrobyl benzoic acid. , anisic acid, 0-, m- and p-nitrobenzoic acid, 0-, m- and p-halobenzoic acid, various dibromo- and dichlorobenzoic acids, tribromo- and trichlorobenzoic acid, isomers of dimethylbenzoic acid such as hemerityl. acid,
Anhydrides of acids such as 3,4-xylylic acid, isoxylylic acid and mesitylenic acid, veratrum acid, trimethoxybenzoic acid, alpha-1 and beta-naphthoic acid, and biphenylcarboxylic acid, and mixed anhydrides of the above-mentioned anhydrides and Examples include mixed anhydrides of fatty acid monocarboxylic acids, such as acetic acid and propionic acid, and mixed anhydrides with carbonic acid and formic acid anhydrides.
N.N’−ジアルキル力ルポジイミド類は式: R−
N=C−N−R
(式中Rは異なったアルキル基であり得るが、一般に同
一である)
により表わされ、好ましくは、R基は1乃至8個の炭素
原子の低級アルキル基である。N. N'-dialkyl luposiimides have the formula: R-
N=C-N-R (wherein R can be different alkyl groups but are generally the same), preferably the R group is a lower alkyl group of 1 to 8 carbon atoms .
ハロゲンを含む脱水剤には、塩化アセチル、臭化アセチ
ル、沃化アセチル及び弗化アセチル、塩化プロビオニル
、臭化プロピオニル、沃化プロビオニル及び弗化ブロビ
オニル、塩化イソブチリル、臭化イソブチリル、塩化n
−ブチリル、臭化n−ブチリル、塩化バレリル、塩化モ
ノ塩化ジー及び塩化トリークロロアセチル、臭化プロモ
アセチル、クロロ酢酸無水物、フエニルホスホン酸ジク
ロライド、塩化チオニル、臭化チオニル、弗化チオニル
及びチオニルクロ口フルオライド、およびトリフルオロ
酢酸無水物が挙げられる。Dehydrating agents containing halogens include acetyl chloride, acetyl bromide, acetyl iodide and acetyl fluoride, probionyl chloride, propionyl bromide, probionyl iodide and brobionyl fluoride, isobutyryl chloride, isobutyryl bromide, n chloride.
-butyryl, n-butyryl bromide, valeryl chloride, mono-di- and trichloroacetyl chloride, promoacetyl bromide, chloroacetic anhydride, phenylphosphonic dichloride, thionyl chloride, thionyl bromide, thionyl fluoride and thionyl chloride fluoride , and trifluoroacetic anhydride.
得られるボリア果ド酸溶液は流延またはフィルム状に押
出され、乾燥、熱処理を行なうことにより、イミド化が
進み前記(1)式構造を有するポリイ亀ドフィルムが得
られる。The resulting boria acid solution is cast or extruded into a film, dried and heat treated to advance imidization and yield a polyimide film having the structure of formula (1).
本発明においてはフィルム厚みが5〜150μm、好ま
しくは7〜125 μ増になるように調整することが必
要である。In the present invention, it is necessary to adjust the film thickness so that it increases by 5 to 150 μm, preferably by 7 to 125 μm.
得られたポリイミドフィルムを本発明においてはフィル
ムの長さ方向の張力を10kg/m以下に保ち、遠赤外
線を照射して短時間で加熱処理する.
張力は小さい程、低収縮性のフィルムが得られるが、無
張力下では特に連続巻取りを行なうとき、フィルムが蛇
行する傾向にあるので、lkg/m以上が好ましい、ま
た、10kg/rnを越えると本発明の目的である加熱
低収縮性のフィルムが得られなくなる。In the present invention, the obtained polyimide film is heat-treated for a short time by irradiating it with far infrared rays while maintaining the longitudinal tension of the film at 10 kg/m or less. The lower the tension, the lower the shrinkage of the film.However, under no tension, the film tends to meander, especially when continuous winding is performed, so it is preferably 1 kg/m or more, and more than 10 kg/rn. In this case, it becomes impossible to obtain a film with low heat shrinkage, which is the object of the present invention.
加熱の手段は遠赤外線を照射する。ポリイミドフィルム
は遠赤外線領域に吸収ピークがあり、この吸収波長を含
む遠赤外線を照射することにより、極めて短時間で加熱
が行なわれる。The means of heating is irradiation with far infrared rays. A polyimide film has an absorption peak in the far infrared region, and by irradiating it with far infrared rays that include this absorption wavelength, it can be heated in an extremely short time.
遠赤外線のヒーターとしては特に限定されないが、セラ
ミックヒーターが好ましい。また、遠赤外線照射に加え
て、熱風を併用することもできる。The far-infrared heater is not particularly limited, but a ceramic heater is preferred. In addition to far-infrared irradiation, hot air can also be used in combination.
本発明においては遠赤外線を用いることにより、加熱時
間は極めて短かくてよく、好ましくは1〜60秒、更に
好ましくは2〜30秒である。In the present invention, by using far infrared rays, the heating time may be extremely short, preferably 1 to 60 seconds, and more preferably 2 to 30 seconds.
加熱処理温度は特に限定されないが、180〜470゜
C、好ましくは200〜450’Cが好ましい。The heat treatment temperature is not particularly limited, but is preferably 180 to 470°C, preferably 200 to 450'C.
〔実施例]
以下、実施例を挙げて本発明の効果を具体的に説明する
。[Example] Hereinafter, the effects of the present invention will be specifically explained with reference to Examples.
なお、実施例中の熱収縮率とはフィルム試料を350゜
Cで30分処理した後のフィルム長さ方向(MO)およ
び幅方向(TD)の収縮率(%)を示したものであり、
この値が0. 1%以下になると極めて実用性が高くな
る.測定方法はJPCA−BMOIl988に準じた。In addition, the heat shrinkage rate in the examples indicates the shrinkage rate (%) in the length direction (MO) and width direction (TD) of the film after processing the film sample at 350 ° C for 30 minutes.
This value is 0. When it is less than 1%, it becomes extremely practical. The measurement method was based on JPCA-BMOIl988.
実施例1
ビロメリット酸二無水物と4.4−ジアミノジフエニル
エーテルを等モルずつN,N−ジメチルアセトアξド中
に入れ攪拌しながら反応を進めることにより、ボリアξ
ド酸溶液を得た。Example 1 Biromellitic dianhydride and 4,4-diaminodiphenyl ether were placed in equal moles in N,N-dimethylacetate and the reaction proceeded with stirring to produce boria ξ.
An acid solution was obtained.
このポリアミド酸溶液に無水酢酸、イソキノリンを加え
攪拌した後、加熱支持体上に溶液を押出し、ポリイミド
に転化させて自己支持性のフィルムとした後、支持体か
ら剥離し、さらにイ稟ドへの転化反応を完結すると共に
溶媒を乾燥し、厚み25μmのポリイミドフィルムとし
てロール状に巻取った。After adding acetic anhydride and isoquinoline to this polyamic acid solution and stirring, the solution was extruded onto a heating support to convert it into polyimide and form a self-supporting film, which was then peeled off from the support and further applied to the imido. Upon completion of the conversion reaction, the solvent was dried, and a polyimide film having a thickness of 25 μm was wound up into a roll.
このポリイミドフィルムを、表1に示した温度のトンネ
ル型赤外線照射炉に連続的に送り込み、夫々表1に示し
た条件で熱処理した後、炉外で巻取りながら室温まで冷
却した。熱処理中のフィルム張力は送りローラと巻取ロ
ーラの回転速度差で調節し、熱処理時間は各ローラの相
対回転速度で11節した。This polyimide film was continuously fed into a tunnel-type infrared irradiation furnace at the temperatures shown in Table 1, heat-treated under the conditions shown in Table 1, and then cooled to room temperature while being rolled up outside the furnace. The film tension during heat treatment was adjusted by the difference in rotational speed between the feed roller and take-up roller, and the heat treatment time was set at 11 intervals depending on the relative rotational speed of each roller.
得られたフィルムの熱水収縮率評価結果を表1に示す。Table 1 shows the evaluation results of the hot water shrinkage rate of the obtained film.
(本頁以下余白)
表
1
なお、比較として張力を0.5kg/m,温度を260
゜Cとして同様の実験を行なったが、フィルムが波を打
って、連続的に巻取ることが困難であった。(Margins below this page) Table 1 For comparison, the tension was 0.5 kg/m and the temperature was 260 kg/m.
A similar experiment was conducted at °C, but the film was wavy and difficult to wind up continuously.
実施例2
実施例1と同様にして、厚み125μmのポリイミドフ
ィルムを得た。これを250″Cのトンネル型赤外線照
射炉に送り込み、表2に示した処理張力で30秒間熱処
理した後、室温まで冷却した。Example 2 A polyimide film having a thickness of 125 μm was obtained in the same manner as in Example 1. This was sent into a tunnel-type infrared irradiation furnace at 250''C, heat-treated for 30 seconds at the treatment tension shown in Table 2, and then cooled to room temperature.
得られたフィルムの熱収縮率評価結果を表2に示す。Table 2 shows the results of evaluating the heat shrinkage rate of the obtained film.
表2
〔発明の効果]
本発明はポリイミドフィルムの長さ方向の張力を10k
g/m以下に保ち、赤外線を照射して熱処理するもので
あるので、極めて加熱効率が良く、短時間で低収縮率の
ボリイξドフィルムが得られる.また得られたボリイξ
ドフィルムは、350゜C,30分処理後の収縮率が0
.1%以下を示し、フレキシブルプリント基板等に有用
な材料を得ることができる。Table 2 [Effects of the invention] The present invention can reduce the tension in the longitudinal direction of the polyimide film to 10k.
g/m or less and heat-treated by irradiating with infrared rays, the heating efficiency is extremely high and a low-shrinkage rate polyamide film can be obtained in a short period of time. Also obtained Bolii ξ
The shrinkage rate of the film is 0 after processing at 350°C for 30 minutes.
.. 1% or less, and a material useful for flexible printed circuit boards etc. can be obtained.
Claims (1)
遠赤外線を照射して短時間で加熱処理した後、冷却処理
を施してなる低収縮性ポリイミドフィルム。Keep the tension in the length direction of the film below 10 kg/m,
A low-shrinkage polyimide film that is made by heating it for a short time by irradiating it with far infrared rays, and then cooling it.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1190536A JP3020176B2 (en) | 1989-07-25 | 1989-07-25 | Low shrinkage polyimide film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1190536A JP3020176B2 (en) | 1989-07-25 | 1989-07-25 | Low shrinkage polyimide film |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11258716A Division JP3136489B2 (en) | 1999-09-13 | 1999-09-13 | Method for producing low shrinkage polyimide film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0355232A true JPH0355232A (en) | 1991-03-11 |
JP3020176B2 JP3020176B2 (en) | 2000-03-15 |
Family
ID=16259721
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1190536A Expired - Lifetime JP3020176B2 (en) | 1989-07-25 | 1989-07-25 | Low shrinkage polyimide film |
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Country | Link |
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JP (1) | JP3020176B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001164006A (en) * | 1999-12-09 | 2001-06-19 | Du Pont Toray Co Ltd | Polyimide film |
US7258423B2 (en) | 2001-04-26 | 2007-08-21 | Brother Kogyo Kabushiki Kaisha | Recording head unit, method of manufacturing the same, and recording apparatus using the unit |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61264027A (en) * | 1985-05-17 | 1986-11-21 | Ube Ind Ltd | Production of polyimide film having high dimensional stability |
JPS6241024A (en) * | 1985-08-19 | 1987-02-23 | Kanegafuchi Chem Ind Co Ltd | Polyimide film having improved heat shrinking characteristics |
JPH01198638A (en) * | 1987-08-21 | 1989-08-10 | Ube Ind Ltd | Aromatic polyimide film and production thereof |
-
1989
- 1989-07-25 JP JP1190536A patent/JP3020176B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61264027A (en) * | 1985-05-17 | 1986-11-21 | Ube Ind Ltd | Production of polyimide film having high dimensional stability |
JPS6241024A (en) * | 1985-08-19 | 1987-02-23 | Kanegafuchi Chem Ind Co Ltd | Polyimide film having improved heat shrinking characteristics |
JPH01198638A (en) * | 1987-08-21 | 1989-08-10 | Ube Ind Ltd | Aromatic polyimide film and production thereof |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001164006A (en) * | 1999-12-09 | 2001-06-19 | Du Pont Toray Co Ltd | Polyimide film |
US7258423B2 (en) | 2001-04-26 | 2007-08-21 | Brother Kogyo Kabushiki Kaisha | Recording head unit, method of manufacturing the same, and recording apparatus using the unit |
Also Published As
Publication number | Publication date |
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JP3020176B2 (en) | 2000-03-15 |
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