JPH0354140Y2 - - Google Patents

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Publication number
JPH0354140Y2
JPH0354140Y2 JP10002487U JP10002487U JPH0354140Y2 JP H0354140 Y2 JPH0354140 Y2 JP H0354140Y2 JP 10002487 U JP10002487 U JP 10002487U JP 10002487 U JP10002487 U JP 10002487U JP H0354140 Y2 JPH0354140 Y2 JP H0354140Y2
Authority
JP
Japan
Prior art keywords
tank
etching
copper sulfate
circulation
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10002487U
Other languages
Japanese (ja)
Other versions
JPS647266U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Application filed filed Critical
Priority to JP10002487U priority Critical patent/JPH0354140Y2/ja
Publication of JPS647266U publication Critical patent/JPS647266U/ja
Application granted granted Critical
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Expired legal-status Critical Current

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  • Manufacturing Of Printed Circuit Boards (AREA)

Description

【考案の詳細な説明】 〔産業上の利用分野〕 本考案は、プリント配線基板などの電気回路基
板のエツチング処理において、エツチング液中に
溶け込んだ銅を冷却晶析法によつて硫酸銅結晶と
して回収した後、このエツチング液を再使用する
ためのエツチング液移送循環装置に関するもので
ある。
[Detailed description of the invention] [Field of industrial application] The present invention is used in the etching process of electric circuit boards such as printed wiring boards, in which copper dissolved in the etching solution is converted into copper sulfate crystals by cooling crystallization. The present invention relates to an etching solution transfer and circulation device for reusing the etching solution after recovery.

〔従来の技術〕[Conventional technology]

プリント配線基板などの電気回路基板の製造に
おいては、特定量の銅又は銅合金を除くため、過
酸化水素や硫酸を主成分とするエツチング液を使
用し、その液温を少なくとも30℃程度に保つてエ
ツチング処理が行われている。このエツチング液
中には使用中に銅が溶け込んで蓄積されることか
ら、その余剰分を残留過酸化水素を分解すること
なく回収した後、この液をエツチング液として再
使用することが行われていた。
When manufacturing electrical circuit boards such as printed wiring boards, an etching solution containing hydrogen peroxide or sulfuric acid as a main component is used to remove a specific amount of copper or copper alloy, and the temperature of the solution is maintained at at least 30°C. An etching process is performed. Since copper dissolves and accumulates in this etching solution during use, the surplus is recovered without decomposing the residual hydrogen peroxide, and then this solution is reused as an etching solution. Ta.

エツチング液中の銅を残留過酸化水素を分解す
ることなく回収するには、このエツチング液を約
20℃以下に冷却する冷却晶析法によつて硫酸銅結
晶として回収することが好ましく、またその後の
液を銅濃度の低いエツチング液として再使用し易
くするためには、例えば実公昭62−15239号公報
に示されるような、エツチング槽と硫酸銅回収装
置とを循環経路で連結し、エツチング液を移送循
環する装置が利用されていた。
To recover the copper in the etching solution without decomposing the residual hydrogen peroxide, the etching solution should be
It is preferable to recover copper sulfate crystals by a cooling crystallization method in which the solution is cooled to 20°C or lower.In order to make it easier to reuse the subsequent solution as an etching solution with a low copper concentration, for example, As shown in the above publication, an apparatus was used in which an etching bath and a copper sulfate recovery apparatus were connected through a circulation path to transfer and circulate the etching solution.

〔考案が解決しようとする問題点〕[Problem that the invention attempts to solve]

しかしながら、硫酸銅回収装置で銅が回収され
たエツチング液を使用すべくエツチング槽へ返送
する場合、あるいは冬季などの外気温の低下によ
り返送経路中でさらに液中に結晶が生成し、経路
が閉塞し、またポンプによる液の強制移送が不可
能になることがあつた。
However, when the etching solution from which copper has been recovered in the copper sulfate recovery equipment is returned to the etching tank for use, or due to a drop in outside temperature such as in winter, crystals may form in the solution in the return route, causing the route to become clogged. However, it sometimes became impossible to forcibly transfer the liquid using the pump.

本考案は、余剰分の銅が回収されエツチング槽
へ返送されるエツチング液の返送途中の結晶生成
を防止し、返送経路の閉塞を生じることなく、ポ
ンプによる液の強制移送を円滑たらしめるエツチ
ング液移送循環装置を提供することを目的とする
ものである。
The present invention is an etching solution that prevents the formation of crystals during the return of the etching solution from which excess copper is collected and is returned to the etching tank, and allows for smooth forced transfer of the solution using a pump without clogging the return path. The object is to provide a transfer circulation device.

「問題点を解決するための手段」 本考案は、エツチング液に溶解した銅を冷却晶
析法により硫酸銅結晶として回収した後このエツ
チング液を再使用するためにエツチング槽と硫酸
銅回収装置とを循環経路にて連結した装置におい
て、前記循環経路中の前記硫酸銅回収装置から前
記エツチング槽への返送経路中に前記硫酸銅回収
装置の近傍に設置され加熱手段及び攪拌手段を備
えた中間槽を介在せしめ、この中間槽から前記エ
ツチング槽に至る部分の返送経路に保温手段を付
設したことを特徴とするエツチング液移送循環装
置である。
``Means for Solving the Problems'' The present invention consists of an etching bath and a copper sulfate recovery device for reusing the etching solution after recovering the copper dissolved in the etching solution as copper sulfate crystals by a cooling crystallization method. an intermediate tank installed near the copper sulfate recovery device in the return path from the copper sulfate recovery device to the etching tank in the circulation path and equipped with heating means and stirring means; This is an etching liquid transfer/circulation device characterized in that a heating means is attached to a return path from the intermediate tank to the etching tank.

〔作用〕[Effect]

本考案では、硫酸銅回収装置で余剰分の銅が回
収され、エツチング槽へ返送されるエツチング液
は、硫酸銅回収装置から流出して直ぐに中間槽に
流入して均一に加熱され、この中間槽からエツチ
ング槽に至る返送経路中では外気温の低下にも関
係なく液温が保持され、液中に結晶の生成をみる
ことなくエツチング槽へ返送することができ、返
送経路の閉塞は生じることなく、ポンプによる強
制移送も円滑に行われ、さらに加熱の程度によつ
ては再加熱することなくそのままエツチング槽で
再使用することができる。
In the present invention, the excess copper is recovered in the copper sulfate recovery device, and the etching solution sent back to the etching tank flows out of the copper sulfate recovery device and immediately flows into the intermediate tank where it is uniformly heated. The liquid temperature is maintained in the return route from the etching tank to the etching tank, regardless of the drop in outside temperature, and the solution can be returned to the etching tank without crystals forming in the solution, without clogging the return route. The forced transfer by a pump is also carried out smoothly, and furthermore, depending on the degree of heating, the material can be reused in the etching tank without being reheated.

〔実施例〕〔Example〕

本考案の一実施例を図面を参照しながら説明す
れば、1は硫酸銅回収装置のタンクで、タンク1
の内部に同心的に設けられた内筒2内にはモータ
3によつて回転する攪拌インペラ4が設けられ、
タンク1の外周には冷却機5から送給される冷却
水などの冷却媒体が導入される冷却ジヤケツト6
が設けられている。タンク1の底部には硫酸銅出
口7が開口され、この硫酸銅出口7には駆動装置
8で駆動されるスクリユーコンベア9が配備さ
れ、その端部付近に排出口10が設けられてい
る。
One embodiment of the present invention will be described with reference to the drawings. 1 is a tank of a copper sulfate recovery device;
A stirring impeller 4 rotated by a motor 3 is provided in an inner cylinder 2 provided concentrically inside the
A cooling jacket 6 is provided around the outer periphery of the tank 1 into which a cooling medium such as cooling water supplied from the cooler 5 is introduced.
is provided. A copper sulfate outlet 7 is opened at the bottom of the tank 1. A screw conveyor 9 driven by a drive device 8 is provided at the copper sulfate outlet 7, and a discharge port 10 is provided near the end of the screw conveyor 9.

11はエツチング槽で、このエツチング槽11
とタンク1間は、エツチング槽11からポンプ1
2によつてタンク1の内筒2内に至るエツチング
液が流れる移送配管13と、タンク1からエツチ
ング槽11に至る返送経路とで循環経路が形成さ
れており、この返送経路はタンク1の上部の液の
溢流口14とタンク1の近傍に設置された中間槽
15とを連結する溢流管16と、中間槽15と、
中間槽15とエツチング槽11とを連結するポン
プ17を持つた返送配管18とで構成されてい
る。
11 is an etching tank;
and tank 1, from etching tank 11 to pump 1.
A circulation path is formed by a transfer pipe 13 through which the etching liquid flows to the inner cylinder 2 of the tank 1 via the etching tank 2, and a return path from the tank 1 to the etching tank 11. an overflow pipe 16 that connects the liquid overflow port 14 and an intermediate tank 15 installed near the tank 1, and an intermediate tank 15;
It is comprised of a return pipe 18 having a pump 17 that connects the intermediate tank 15 and the etching tank 11.

中間槽15には、電気ヒータ19などの加熱
器、温度センサ20、攪拌機21、液面制御用の
液面計22等が配備され、またポンプ23を持つ
た循環配管24と、返送配管18を利用した循環
配管25とが連結されている。
The intermediate tank 15 is equipped with a heater such as an electric heater 19, a temperature sensor 20, an agitator 21, a liquid level gauge 22 for controlling the liquid level, and a circulation pipe 24 with a pump 23 and a return pipe 18. It is connected to the circulation pipe 25 that was used.

なお、循環配管24は、その途中からタンク1
の溢流口14との連結部近くで溢流管16に連結
する分岐管26を分岐させることが好ましい。
Note that the circulation pipe 24 is connected to the tank 1 from the middle.
It is preferable to branch the branch pipe 26 connected to the overflow pipe 16 near the connection with the overflow port 14 of the pipe.

さらに、中間槽15とエツチング槽11との間
の返送配管18は、保温ジヤケツトなど外気温の
影響を受けないように保温されているが、この保
温ジヤケツト内に加熱媒体を導入して返送配管1
8内の液を昇温することができるようにすること
も好ましい。
Further, the return piping 18 between the intermediate tank 15 and the etching tank 11 is kept warm so as not to be affected by the outside temperature by using a heat insulating jacket, and a heating medium is introduced into this heat insulating jacket so that the return pipe 1
It is also preferable to be able to raise the temperature of the liquid in 8.

しかして、エツチング槽11で使用され、余剰
分の銅が溶け込んだ使用済みのエツチング液は、
ポンプ12により移送配管13を経てタンク1に
移送され、冷却機5からから冷却ジヤケツト6に
送給される冷却媒体によつて冷却されると、液中
に溶解している銅は硫酸銅結晶として晶折しタン
ク1の底部に沈降する。沈降した硫酸銅結晶は、
硫酸銅出口7からスクリユーコンベア9により運
ばれて排出口10から系外へ排出される。
Therefore, the used etching solution used in the etching tank 11 and in which the excess copper has dissolved is
When the liquid is transferred to the tank 1 via the transfer pipe 13 by the pump 12 and cooled by the cooling medium fed from the cooler 5 to the cooling jacket 6, the copper dissolved in the liquid is converted into copper sulfate crystals. It crystallizes and settles to the bottom of tank 1. The precipitated copper sulfate crystals are
The copper sulfate is transported from the copper sulfate outlet 7 by the screw conveyor 9 and discharged from the discharge port 10 to the outside of the system.

一方、余剰分の銅が硫酸銅として回収された後
の液は、過酸化水素、硫酸等が補給されて溢流口
14から溢流し、溢流管16を経て直ちに中間槽
15へ導かれる。
On the other hand, the liquid after excess copper has been recovered as copper sulfate is replenished with hydrogen peroxide, sulfuric acid, etc., overflows from the overflow port 14, and is immediately led to the intermediate tank 15 via the overflow pipe 16.

タンク1から中間槽15に導かれた液は、ここ
で攪拌機21で攪拌され、また循環配管24,2
5等で槽内液が循環されながら、電気ヒータ1
9、温度センサ20等で所定温度にまで均一に加
熱された後、ポンプ17で返送配管18を経てエ
ツチング槽11へエツチング液として返送されて
再使用される。このエツチング液の返送において
は、返送配管18は保温されているから、外気温
の低下に関係なく中間槽15で加熱された液温が
ほぼ保持され、液中に結晶の生成をみることな
く、円滑にエツチング槽11へ返送することがで
きる。なお、場合によつては返送配管中でもエツ
チング処理に適した温度まで再加熱するようにす
れば便利である。
The liquid led from the tank 1 to the intermediate tank 15 is stirred by an agitator 21 here, and is also passed through circulation pipes 24, 2.
Electric heater 1 is heated while the liquid in the tank is circulated by
9. After being uniformly heated to a predetermined temperature by the temperature sensor 20, etc., the etching liquid is returned as an etching liquid to the etching tank 11 via the return piping 18 by the pump 17, and is reused. When returning the etching solution, since the return pipe 18 is kept warm, the temperature of the solution heated in the intermediate tank 15 is maintained at almost the same temperature regardless of the drop in the outside temperature, and no crystal formation is observed in the solution. It can be smoothly returned to the etching tank 11. In some cases, it may be convenient to reheat the return pipe to a temperature suitable for etching.

また、中間槽15の循環配管24に分岐管26
を分岐させ、中間槽15内で加熱された液を溢流
管16のタンク1との連結部付近にも循環させれ
ば、タンク1の溢流口14付近に生じ易い結晶の
付着を防止することができる。
In addition, a branch pipe 26 is connected to the circulation pipe 24 of the intermediate tank 15.
If the liquid heated in the intermediate tank 15 is circulated near the connection part of the overflow pipe 16 with the tank 1, it is possible to prevent crystals from adhering to the vicinity of the overflow port 14 of the tank 1. be able to.

〔考案の効果〕[Effect of idea]

以上述べたように本考案によれば、溶け込んだ
余剰分の銅を硫酸銅結晶として回収して循環再使
用するに際し、返送経路で生じ勝ちの外気温によ
る液温低下等による結晶の生成を防止し、ポンプ
による液の強制移送を円滑たらしめ、エツチング
処理を効率的、経済的たらしめ、生産性を向上さ
せることができるものである。
As described above, according to the present invention, when the surplus dissolved copper is recovered as copper sulfate crystals and recycled for reuse, the formation of crystals due to the drop in liquid temperature caused by the outside temperature, which is likely to occur during the return route, is prevented. However, the forced transfer of liquid by the pump can be made smooth, the etching process can be made efficient and economical, and productivity can be improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例を示す系統説明図で
ある。 1……タンク、2……内筒、3……モータ、4
……攪拌インペラ、5……冷却機、6……冷却ジ
ヤケツト、7……硫酸銅出口、8……駆動装置、
9……スクリユーコンベア、10……排出口、1
1……エツチング槽、12,17,23……ポン
プ、13……移送配管、14……溢流口、15…
…中間槽、16……溢流管、18……返送配管、
19……電気ヒータ、20……温度センサ、21
……攪拌機、22……液面計、24,25……循
環配管、26……分岐管。
FIG. 1 is a system explanatory diagram showing an embodiment of the present invention. 1...tank, 2...inner cylinder, 3...motor, 4
... Stirring impeller, 5 ... Cooler, 6 ... Cooling jacket, 7 ... Copper sulfate outlet, 8 ... Drive device,
9...screw conveyor, 10...discharge port, 1
1... Etching tank, 12, 17, 23... Pump, 13... Transfer piping, 14... Overflow port, 15...
...Intermediate tank, 16...Overflow pipe, 18...Return pipe,
19...Electric heater, 20...Temperature sensor, 21
... Stirrer, 22 ... Liquid level gauge, 24, 25 ... Circulation piping, 26 ... Branch pipe.

Claims (1)

【実用新案登録請求の範囲】 1 エツチング液に溶解した銅を冷却晶析法によ
り硫酸銅結晶として回収した後このエツチング
液を再使用するためにエツチング槽と硫酸銅回
収装置とを循環経路にて連結した装置におい
て、前記循環経路中の前記硫酸銅回収装置から
前記エツチング槽への返送経路中に前記硫酸銅
回収装置の近傍に設置され加熱手段及び攪拌手
段を備えた中間槽を介在せしめ、この中間槽か
ら前記エツチング槽に至る部分の返送経路に保
温手段を付設したことを特徴とするエツチング
液移送循環装置。 2 前記保温手段が加熱手段を含むものである実
用新案登録請求の範囲第1項記載のエツチング
液移送循環装置。 3 前記中間槽に備えられた攪拌手段が槽内液の
循環手段を含むものである実用新案登録請求の
範囲第1項又は第2項記載のエツチング液移送
循環装置。 4 前記循環手段が前記中間槽と前記返送経路の
前記硫酸銅回収装置との連結部付近とを連結し
た経路を含むものである実用新案登録請求の範
囲第3項記載のエツチング液移送循環装置。
[Scope of Claim for Utility Model Registration] 1. After recovering copper dissolved in an etching solution as copper sulfate crystals by a cooling crystallization method, an etching tank and a copper sulfate recovery device are connected in a circulation path in order to reuse this etching solution. In the connected devices, an intermediate tank installed near the copper sulfate recovery device and equipped with heating means and stirring means is interposed in the return path from the copper sulfate recovery device to the etching tank in the circulation path, and this An etching liquid transfer and circulation device characterized in that a heat retaining means is attached to a return path from an intermediate tank to the etching tank. 2. The etching liquid transfer and circulation device according to claim 1, wherein the heat retaining means includes a heating means. 3. The etching liquid transfer and circulation apparatus according to claim 1 or 2, wherein the stirring means provided in the intermediate tank includes means for circulating the liquid in the tank. 4. The etching solution transfer and circulation device according to claim 3, wherein the circulation means includes a path connecting the intermediate tank and the vicinity of the connecting portion of the return path with the copper sulfate recovery device.
JP10002487U 1987-07-01 1987-07-01 Expired JPH0354140Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10002487U JPH0354140Y2 (en) 1987-07-01 1987-07-01

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10002487U JPH0354140Y2 (en) 1987-07-01 1987-07-01

Publications (2)

Publication Number Publication Date
JPS647266U JPS647266U (en) 1989-01-17
JPH0354140Y2 true JPH0354140Y2 (en) 1991-11-28

Family

ID=31327722

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10002487U Expired JPH0354140Y2 (en) 1987-07-01 1987-07-01

Country Status (1)

Country Link
JP (1) JPH0354140Y2 (en)

Also Published As

Publication number Publication date
JPS647266U (en) 1989-01-17

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