JPH0340750U - - Google Patents
Info
- Publication number
- JPH0340750U JPH0340750U JP10190089U JP10190089U JPH0340750U JP H0340750 U JPH0340750 U JP H0340750U JP 10190089 U JP10190089 U JP 10190089U JP 10190089 U JP10190089 U JP 10190089U JP H0340750 U JPH0340750 U JP H0340750U
- Authority
- JP
- Japan
- Prior art keywords
- rotary disk
- pedestal
- ion implantation
- implanted
- implantation apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 7
- 239000003507 refrigerant Substances 0.000 claims description 3
- 238000001179 sorption measurement Methods 0.000 claims description 2
- 238000005468 ion implantation Methods 0.000 claims 4
- 239000002826 coolant Substances 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Description
第１図はこの考案の一実施例のイオン注入装置
の回転デイスクの基本的な構成を示す平面図、第
２図は第１図の切断面線−から見た断面図、
第３図は第１図に示された回転デイスクの周縁部
近傍の構成を拡大して示す分解斜視図、第４図１
は台座１０の平面図、第４図２はその側面図、第
４図３は第４図１の切断面線−から見た断面
図、第５図は従来技術の基本的な構成を示す断面
図である。
１０……台座、１１……取付凹所、１２……回
転デイスク本体、１５……静電吸着用電極、１６
，１７……冷媒路。
FIG. 1 is a plan view showing the basic structure of a rotating disk of an ion implanter according to an embodiment of this invention, and FIG. 2 is a sectional view taken along the cutting plane line - of FIG. 1.
FIG. 3 is an exploded perspective view showing an enlarged structure near the peripheral edge of the rotary disk shown in FIG. 1, and FIG.
4 is a plan view of the pedestal 10, FIG. 4 2 is a side view thereof, FIG. 4 3 is a sectional view taken from the cutting plane line - of FIG. 4 1, and FIG. 5 is a sectional view showing the basic configuration of the prior art. It is a diagram. 10... Pedestal, 11... Mounting recess, 12... Rotating disk body, 15... Electrostatic adsorption electrode, 16
, 17... Refrigerant path.
Claims (1)
き注入対象物を支持する回転デイスクであつて、 表面が球面状に加工され、前記注入対象物がそ
の表面に密着される台座と、 表面に前記台座が取り付けられる取付凹所を形
成した回転デイスク本体とを備えたことを特徴と
するイオン注入装置の回転デイスク。 (2) 前記台座の表面近傍に静電吸着用電極を埋
設したことを特徴とする請求項(1)記載のイオン
注入装置の回転デイスク。 (3) 前記台座および回転デイスク本体に冷却媒
体が流される冷媒路をそれぞれ形成し、各冷媒路
が前記台座を前記回転デイスクの前記取付凹所に
取り付けた状態で相互に連通するようにしたこと
を特徴とする請求項(1)または(2)記載のイオン注
入装置の回転デイスク。[Claims for Utility Model Registration] (1) A rotary disk that supports an object to be implanted into which ions are to be implanted in an ion implantation device, the surface of which is processed into a spherical shape, and the object to be implanted is in close contact with the surface. 1. A rotary disk for an ion implantation apparatus, comprising: a pedestal; and a rotary disk main body having a mounting recess formed on its surface to which the pedestal is attached. (2) The rotary disk for an ion implantation apparatus according to claim (1), characterized in that an electrostatic adsorption electrode is embedded near the surface of the pedestal. (3) A refrigerant path through which a cooling medium flows is formed in the pedestal and the rotary disk body, respectively, and the refrigerant paths communicate with each other when the pedestal is attached to the mounting recess of the rotary disk. The rotating disk of an ion implantation apparatus according to claim 1 or 2, characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10190089U JPH0340750U (en) | 1989-08-30 | 1989-08-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10190089U JPH0340750U (en) | 1989-08-30 | 1989-08-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0340750U true JPH0340750U (en) | 1991-04-18 |
Family
ID=31650822
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10190089U Pending JPH0340750U (en) | 1989-08-30 | 1989-08-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0340750U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7400137B1 (en) | 2007-01-31 | 2008-07-15 | Hitachi Metals, Ltd. | Magnetic encoder having a stable output property with unsaturated magnetic sensor |
-
1989
- 1989-08-30 JP JP10190089U patent/JPH0340750U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7400137B1 (en) | 2007-01-31 | 2008-07-15 | Hitachi Metals, Ltd. | Magnetic encoder having a stable output property with unsaturated magnetic sensor |
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