JPH0336024A - Manufacture of roll type stamper - Google Patents

Abstract

PURPOSE:To make the direct formation of fine projected and recessed patterns such as track grooves, information pits and the like on the peripheral wall of a cylindrical base material possible by a method wherein exposure is performed by irradiating it with light emitted from a light source with a certain beam width over the surface-polished peripheral wall, onto which resist is applied and a paper-like exposure mask is fixed, of the cylindrical base material under the state that the cylindrical base material is being rotated at constant speed. CONSTITUTION:A cylindrical base material 4, the outer diameter of which is 300mm, which is made of cylindrical tool steel SKD 61 and the surface of which is plated electrolessly with nickel by the thickness of 100mum and, after that, polished, is employed. Photo-resist is applied onto the surface of the resultant cylindrical material by the thickness of 5,000Angstrom . Next, in exposure process, exposure is performed through a cutting head 1 with laser beam 5 having the output power of 5W emitted from a laser oscillator 6 or concretely from the argon gas laser oscillator. The spot diameter of the laser beam 5 is about 0.5 - 1mum. The laser head 1 repeats scanning as indicated with the arrows at the speed of 50 - 200mm/sec under the state that the cylindrical base material 4, onto which the photo-resist is applied, is being rotated. The fixing of a paper-like exposure mask 2 is performed by chucking through vacuum port with a vacuum pump.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for manufacturing a roll stamper used in a roller group molding method and a 2P roller group molding method for producing a substrate for an information recording medium.

[Prior Art] Conventionally, Patent Publication No. 1987-87203. Showa 56-84
As described in 921, 1982-82204,
A group including tracking grooves, +I11 information bits, etc. is formed on the information recording surface of the information recording medium substrate.

Information on videotiffs, compact discs, etc.: In order to obtain an information recording medium in which groups of tracking grooves and information bits are formed on the self-recording surface, for example, fine patterns designed with the information recording system in mind are used. ■When using i4J plastic resin as the material for the information recording medium 2L plate, using the engraved stamper, the injection method, combination 1-1 removal method, roller group formation JI method, ■photocurable resin composition When using, the so-called 2P (photopolymer) method, which cures the stamper and transfers a replica of the stamper for information recording media onto a transparent MI Jlfi board, the 2P roller group forming method, and the 1000-71 resin method. Alternatively, when using a prepolymer containing a solvent, a substrate for an information recording medium is manufactured by a cast molding method or the like.

]1 Roller group forming method (described) and ■2
In all methods of manufacturing roll-type stampers used in the P-roller group forming method, a vapor-shaped exposure mask is fixed to the peripheral wall of a cylindrical base material, contact exposure is performed, and a circular WU base material is formed using photolithography technology. Tokusho 63-264691'1) We wanted to form fine patterns of unevenness such as tracking grooves and information bits directly on the peripheral wall.

The contact exposure can be carried out using the illumination optical system of a contact exposure device (Canon 211.^-521F^), for example, as shown in factor 4. The illumination optical system for applying this will be briefly explained.

The exposure light emitted from the light tjQ 11 (500W Xe-Hg lamp) is a combination of an elliptical mirror 12 and a fly's eye lens 17 (fly's eye lens), creating an illumination system with high luminous flux utilization efficiency and less uneven illuminance. A so-called cold mirror 16 is used in the optical path, which reflects only the light of the wavelength necessary for exposure and transmits unnecessary light.

Next, the exposure light transmitted through the fly's eye lens is reflected by the AI mirror 18, passes through the condenser lens 19, and reaches the mask surface 20.

The condenser lens is used to uniformly expose the mask surface, and by adjusting the curve of the condenser lens, it is possible to uniformly expose the peripheral wall of the cylindrical base (2). Theoretically and technically, it has 61 abilities.

"Problem A to be Solved by the Invention" However, in the conventional example L, a specific exposure IT method is not disclosed.

Also, the radius of curvature of the condenser lens of the contact exposure device is set to 2.
Although it is possible to uniformly expose the peripheral wall of a cylindrical base material, it has the following disadvantages.

(1) Since the cylindrical base material to which 74 light is applied has a certain radius of curvature, it is impossible to uniformly expose the circumferential wall of the cylindrical material in the blanket exposure.

(2) In blanket exposure, since there is obliquely incident light from the light source, uniform exposure is impossible, and fine patterning cannot be uniformly performed. Specifically, there is a drawback that the line width of the patterned resist cannot be adjusted to a constant value.

(3) Although it is possible to adjust the radius of curvature of the condenser lens of the contact exposure device to match the radius of curvature of the cylindrical base material, exposure cannot be performed on a cylindrical base material with a different radius of curvature. In other words, exposure can only be performed on circular 8 substrates with a certain radius of curvature, which is not practical.

The present invention has been made in view of the above-mentioned state of the prior art, and provides a method for manufacturing a roll-type stamper that stamps groups formed by novel patterning that does not involve conventional contact exposure.

[Means for Solving the Problems] In the present invention, after coating a resist on the peripheral wall of a cylindrical base material whose surface has been polished, a vapor-shaped exposure mask is fixed, and while irradiating a light source with a constant line width, Manufacture of a roll-type stamper characterized by forming a fine pattern of unevenness such as tracking grooves and information bits directly on the peripheral wall of a cylindrical base material by rotating the cylindrical base material at a constant speed and exposing it to light. According to this method, it is possible to uniformly expose the peripheral wall of the cylindrical base material, so it is possible to form groups stably, and as a result, it is possible to easily manufacture a roll stamper. can.

Furthermore, according to the exposure method according to the present invention, the radius of curvature of the cylindrical substrate is not limited, and it is possible to uniformly expose circular M substrates having various radii.

That is, the patterning according to the present invention is basically performed using a cylindrical base material coated with a resist, a vapor-like exposure mask, and a light source. A desired pattern is formed on the peripheral wall of a cylindrical base material by rotating the cylinder at a constant speed while irradiating the cylinder with a light source with a constant line width in the axial direction of the cylinder, without applying it all at once to the peripheral wall. Therefore, the peripheral wall is always irradiated with only light at a certain angle of incidence, making it possible to uniformly expose the entire surface of the peripheral wall.

In the present invention, a light source with a constant line width is a linear light source extending in the axial direction of the cylinder, and includes light emitted linearly at -degrees and spot light moving linearly. The line width is approximately 0.5 μm to 10 μm, and if it is too large, the deviation of the incident angle will become thicker, which is not preferable.

Spot light that moves linearly with a light source with a constant line width includes laser beams such as argon gas lasers and helium-cadmium lasers, condensed light by condensing lenses, etc.
As the light that is linearly irradiated at once, UV light or the like that is irradiated through an exposure plate having a slit of a certain width, an optical fiber, or the like can be used.

In the present invention, rotating the cylindrical base material at a constant speed means rotating the cylinder at a constant rotation speed in order to form a desired pattern on the wall of the cylinder by linear exposure. It is set appropriately depending on the radius of curvature, the type of light source used, the type of resist, etc., but is usually 0. ]
3x 10-'~0.2x10-' (r-p-m)
A certain number of rotations is sufficient.

Furthermore, in the present invention, rotating the cylindrical base material at a constant speed while irradiating the cylindrical base material with a light source of a constant line width means that irradiation and rotation are linked and performed at the same time. It is also possible to drive the same rotation for exposure and control the irradiation accordingly.

Hereinafter, the present invention will be explained in detail with reference to the drawings.

FIG. 1 shows one example of a mode for carrying out the method of the present invention, and is a schematic diagram of a method for exposing a roll stamper using a laser beam. In this figure, the constant linewidth light source is a linearly operating laser beam, and an optical cutting device is provided.

The optical cutting device includes a laser oscillator 6 such as an argon gas laser oscillator or a helium-cadmium laser oscillator, a laser beam 6 oscillated from the laser oscillator, a signal source 7, and information P given from the signal source.
It is possible to use one consisting of a signal generator 8 for CM encoding and an optical modulator 9 driven by the signal generator.

The laser beam is irradiated by a cutting head 1 using a polygon mirror, and a vapor-shaped exposure mask 2 fixed to a cylindrical base material is scanned by the laser beam.
This can be done from the top.

Further, in this figure, 4 is a cylindrical base material made of glass or metal such as nickel alloy, 2 is a vapor-shaped exposure mask for exposing the peripheral wall of the cylindrical base material, and 14 is a vapor-shaped exposure mask that is attached to the cylindrical base material. 3 is a rotating support for supporting the cylindrical base material.

Here, the vacuum hole 14 is for fixing the paper-like exposure mask 2 on the cylindrical base plate by suction pressure from the hole, thereby making it very easy to fix the mask.

The mechanism for generating suction pressure in the vacuum hole includes a vacuum pump 15, as shown in a schematic cross-sectional view (partially omitted) of the rotating support 3 and the cylindrical base material 4 in FIG.
This can be done by passing the support 3 through the base material 4 and providing a passage for vacuum up to the vacuum hole 14.

That is, in Figure 3, 4 is a cylindrical base material, 14 is a vacuum hole for identifying a vapor-shaped exposure mask, 3 is a rotating support for supporting the cylindrical base material, and 15 is a rotary support 11 for passing vapor from the vacuum hole. This is a vacuum pump for fixing a shaped exposure mask. Here, if a bearing or an air bearing is used for the rotating support 3, the rotational precision of the cylindrical base material can be improved without leaking pressure between the support JE3 and the cylindrical base plate 4.

However, to define the mask without using vacuum holes,
For example, this can be carried out by blowing N, Ar gas, etc. from the upper surface of a vapor-shaped exposure mask.

In addition, a means for rotating the cylindrical base material at a constant speed, or
A laser rotary encoder or the like can be used as a moving means.

According to the configuration shown in Figure 1, since an argon laser or the like is used as the exposure light, it is easy to reduce the laser spot diameter to 1 μ or less, and it is possible to create a sub-micron level fine pattern on the exposed substrate. It is very effective when applied.

Next, FIG. 2 shows another embodiment for carrying out the present invention.

This figure is a schematic diagram showing a method of exposing a roll stamper using an ultraviolet lamp and an exposure plate. That is, in this figure, the light source with a constant line width is a light source that irradiates linearly at - degrees, and uses an exposure plate having a slit with a constant width.

In FIG. 2, 11 is a light source for exposure, 12 is an elliptical mirror for effectively irradiating light from an ultraviolet lamp as a light source, 10 is an exposure plate to prevent leakage during exposure, and 13 is a An exposure slit for exposing a fine gate 1+13 pattern, 2 a vapor-shaped exposure mask, and 3 a rotating support for supporting a cylindrical base material. The intensity of the light source 11, the distance between the light source and the cylindrical base material, etc. may be appropriately set to ensure sufficient exposure.

The vapor-shaped exposure mask 2 can be fixed onto the cylindrical substrate by steps similar to those shown in FIG.

According to the configuration shown in FIG. 2, since ultraviolet light or the like transmitted through the slit is used as the exposure light, there is no need to worry about 'Sllt exposure or non-exposure caused by scanning the cudding head.

Further, in the present invention, in addition to the embodiments described in L.

A similar effect can be obtained by using an ultraviolet lamp as a means for irradiating the fixed ring light source and scanning the jA focusing lens or optical fiber holder with a focusing lens or optical fiber.

Note that in the present invention, known techniques can be used for other configurations.

[Example] The present invention will be described in more detail below based on Examples.

Example 1 In the configuration shown in FIG. 1, an argon gas laser oscillator was used as the laser oscillator. A laser beam 5 emitted from an argon gas laser oscillator is reflected by a mirror and enters an optical modulator 9. The laser beam 5 emitted from the optical modulator 9 passes through a cutting head 1 and is applied to a vapor-shaped exposure mask 2. The peripheral wall of the cylindrical base material 4 can be exposed to light.

By rotating the cylindrical base material 4 while the cutting head 1 repeatedly scans as shown by the arrow, the mask pattern of the vapor-shaped exposure mask 2 can be transferred to the peripheral wall of the cylindrical base material 4.

Also, the signal #27 and the information given from the signal source are sent to the PC.
By using the M-encoding signal generator and optical modulator 9, in addition to the fine uneven pattern (stripe, spiral, or concentric circle) of the vapor-shaped exposure mask 2, lot numbers, production dates, names, etc. can be encoded on a cylindrical basis. It can be transferred onto the peripheral wall of the material 4.

A cylindrical base material 4 with an outer diameter of 300G+11 is coated with electroless nickel plating on the surface of D61 tool steel to a thickness of 100 μ-, and the surface is polished, and a photoresist (
2-1300 manufactured by Hoechst Japan Co., Ltd.) was applied to 5,000 people. The photoresist was applied by methods such as dipping, spraying, and roll coater spinner.

Next, in an exposure step, an argon gas laser oscillator was used as the laser oscillator 6, and a laser beam 5 with an output power of 5 W was passed through the cutting head 1 for exposure.

As shown in Figure 1, the laser spot diameter is 0.5 μm to 1
Using the laser beam 5 of the order of μ, the laser head 1
The cylindrical base material 4 coated with the photoresist was rotated while repeating scanning in the direction of the arrow at a speed of 50 to 200 mm/s. 1 rotation 7,850m1n
~: II, rotated for a time of 400 m1n.

Naturally, the feed speed of the laser head 1 and the rotation speed of the cylindrical base material 4 were synchronized.

The method of fixing the paper exposure mask 2 is shown in FIG.
As shown in FIG. 3, chucking was performed using a vacuum hole using a vacuum pump.

Next, a developer (Az-312MI manufactured by Hoechst Japan)
Development was performed using F), and post-baking was performed at 120° C. and 30 m1n.

By going through the above steps, the photoresist of the cylindrical base material 4 is patterned. The cylindrical base material 4 patterned with the photoresist was etched with a reactive gas of 2F using a dry etching device that allowed the cylindrical base material to rotate and was equipped with an ion gun for etching.

After etching, 02 plasma ashing was performed using 02 to remove the remaining resist, thereby forming a fine pattern of unevenness such as tracking grooves and information bits on the peripheral wall of the cylindrical base material 4.

Example 2 In the configuration shown in FIG. 2, an ultraviolet lamp (500W-Xe-t1g lamp manufactured by Ushio Electric Co., Ltd.) was used as the light source 11, and an elliptical mirror 12 was used to increase the utilization efficiency of the luminous flux.
The exposure plate 10 was irradiated with ultraviolet light.

In advance, the exposure plate 10 has a thickness of 0.5 μω to 1 μm.
A slit of about 100 mL was provided, and the ultraviolet rays that passed through the slit were used as exposure light. Exposure light is irradiated onto the cylindrical base material 4 from above the paper-like exposure mask 2. The exposure speed is determined by the rotation speed of the cylindrical base material 4.

In this experiment, one rotation was 5,000 m1n to 8,000 m1n.
It was done in an amount of time. A cylindrical quartz glass with an outer diameter of 300 m+ was used as the cylindrical base material 4, and photoresist (Hoechst) was used.
A film of 5,000 Å thick was coated with ﾆ-14100 (manufactured by Japan Co., Ltd.). The photoresist was applied using methods such as dipping, spray roll coater, and spinner. Next, exposure was carried out by the method described above, development was carried out using a developer (Az-312MIF manufactured by Hoechst Japan), and post-beta was carried out under the conditions of 120° C. and 30 ml.

By going through the above steps, photoresist patterning is applied to the peripheral wall of the cylindrical base material 4. A predetermined resist pattern was provided using photoresist. Cylindrical base material 4
While rotating, hydrofluoric acid and ammonia fluoride NH4F
Etching was performed using a solution of (1:7 wt ratio) for about 1 win.

After etching, 02 plasma ashing is performed using 02 to remove the remaining resist, and the peripheral wall of the cylindrical base material 4 is coated for tracking purposes. +! , a fine pattern of unevenness such as information pits was formed.

The exposure plate is made using photolithography technology.
It may be manufactured using an exposure mask method in which a slit of approximately 0.5 μm to 1 μm is created by etching a portion of rg, or a method in which a slit is created by etching a metal material.

[Effects of the Invention] As is clear from the above description, according to the method for manufacturing a roll-type stamper of the present invention, a paper-like exposure mask is fixed, a cylindrical base material is rotated at a certain speed, and a paper-like exposure mask is produced. By performing exposure from the upper surface using a light source with a constant line width, the following remarkable effects can be achieved.

(1) Tracking grooves, information bits, etc. 1”1 [
A fine pattern of ',,',,,] can be uniformly exposed on the peripheral wall of the cylindrical base material.

(2) In the exposure method according to the present invention, the radius of the curved rod of the cylindrical substrate is not limited, and cylindrical substrates having various curved diameters of 〒2 diameter can be exposed uniformly.

(3) When using a laser beam, depending on the level of the fine pattern on the vapor exposure mask (micron order or submicron order), the laser beam
It is possible to change the spot diameter and the slit width of the exposure plate, and an inexpensive roll-type stamper can be manufactured.

(4) By the contact exposure method using a vapor-shaped exposure mask, it is possible to easily form a fine uneven pattern such as tracking grooves for information recording media and information bits on the peripheral wall of a cylindrical base material, and it is inexpensive. It is now possible to produce stampers,
This will lead to a distant reduction in the cost of information recording media.

(5) By forming recesses for tracking grooves, information bits, etc. of an information recording medium directly on the peripheral wall of the cylindrical base material, a roll-type stamper with good transferability can be provided.

[Brief explanation of drawings]

FIG. 1 is a schematic diagram illustrating a method of exposing a roll stamper using a laser beam, which is one embodiment of the present invention, and FIG. 2 is another embodiment of the present invention. , a schematic diagram illustrating the exposure method of a roll-type stamper using an ultraviolet lamp and an exposure plate; FIG. 3 is a schematic diagram of a rotary column and a cylindrical base material that can be used in the configuration shown in FIGS. 1 and 2. Cross-sectional view (partially omitted)
, Figure 4 shows the arrangement of the illumination optical system of a conventionally used contact exposure device (Canon PL, ^-521F^).
It is a diagram. 1... Cutting head 2... Vapor-shaped exposure mask 3... Rotating support 4... Cylindrical base material 5... Laser beam 6... Laser oscillation pattern 7... Signal #
8... Signal generator 9... Optical modulator
10... Exposure plate 11... Source 1
2... Elliptical mirror 13... Exposure slit 14...
・Vacuum hole 15...Vacuum pump 16...Cold mirror 17...Fly's eye lens 18...^l mirror 19...Condenser lens 20...Mask

Claims (7)

[Claims] (1) After applying a resist to the peripheral wall of a cylindrical base material whose surface has been polished, a paper-like exposure mask is fixed, and the cylindrical base material is rotated at a constant speed while irradiating a light source with a constant line width. A method for producing a roll-type stamper, which comprises forming a fine pattern of unevenness such as tracking grooves and information pits directly on the peripheral wall of a cylindrical base material by exposure and etching. (2) The manufacturing method according to claim (1), wherein the paper-like exposure mask is fixed using a vacuum pump by providing a vacuum hole in the peripheral wall of the cylindrical base material and a rotating support that supports rotation of the cylindrical base material. Method. (3) The manufacturing method according to claim (1), wherein the paper-like exposure mask is fixed by blowing N_2 gas from the upper surface of the exposure mask and applying blow pressure. (4) The manufacturing method according to claim (2), wherein a bearing or an air bearing is used as a rotating support supporting the rotation of the cylindrical base material. (5) The manufacturing method according to claim (1), wherein the irradiation with the light source having a constant line width is performed using an ultraviolet lamp and an exposure slit. (6) Claim (1) wherein the irradiation with the light source having a constant line width is performed using an ultraviolet lamp and a condensing lens or an optical fiber.
). (7) The manufacturing method according to claim (1), wherein the irradiation with the light source having a constant line width is performed while scanning a laser beam.