JPH0331034Y2 - - Google Patents

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Publication number
JPH0331034Y2
JPH0331034Y2 JP1985060689U JP6068985U JPH0331034Y2 JP H0331034 Y2 JPH0331034 Y2 JP H0331034Y2 JP 1985060689 U JP1985060689 U JP 1985060689U JP 6068985 U JP6068985 U JP 6068985U JP H0331034 Y2 JPH0331034 Y2 JP H0331034Y2
Authority
JP
Japan
Prior art keywords
oven
waveguide
magnetron
power supply
supply port
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1985060689U
Other languages
Japanese (ja)
Other versions
JPS61177391U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985060689U priority Critical patent/JPH0331034Y2/ja
Publication of JPS61177391U publication Critical patent/JPS61177391U/ja
Application granted granted Critical
Publication of JPH0331034Y2 publication Critical patent/JPH0331034Y2/ja
Expired legal-status Critical Current

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  • Constitution Of High-Frequency Heating (AREA)

Description

【考案の詳細な説明】 <技術分野> 本考案は電子レンジ等の高周波加熱装置に関
し、特に、オーブンインピーダンスを変化させて
高周波加熱における加熱均一性を改善するサブキ
ヤビテイの配設に関するものである。
[Detailed Description of the Invention] <Technical Field> The present invention relates to a high-frequency heating device such as a microwave oven, and particularly relates to the arrangement of a sub-cavity that improves heating uniformity in high-frequency heating by changing oven impedance.

<従来技術> 第3図は従来の高周波加熱装置の斜視図で第4
図は第3図の要部断面図である。
<Prior art> Figure 3 is a perspective view of a conventional high frequency heating device.
The figure is a sectional view of the main part of FIG. 3.

従来において、高周波加熱における加熱均一性
を改善するやり方としては、オーブン1の天面に
設けられた給電口2の位置及び又は大きさを変え
るとか、第4図に示すように導波管3の給電口2
側を金属製の仕切り板4で仕切り、導波部Aとサ
ブキヤビテイ部Bに分け、サブキヤビテイの大き
さを変えてオーブンインピーダンスを変化させて
行なうものがあつた。尚、図中の5はマグネトロ
ン、6は高圧トランスである。
Conventionally, methods for improving heating uniformity in high-frequency heating include changing the position and/or size of the power feed port 2 provided on the top surface of the oven 1, or changing the position and/or size of the power feed port 2 provided on the top surface of the oven 1, or changing the size of the waveguide 3 as shown in FIG. Power supply port 2
There was one in which the sides were partitioned with a metal partition plate 4, divided into a waveguide part A and a subcavity part B, and the size of the subcavity was changed to change the oven impedance. In addition, 5 in the figure is a magnetron, and 6 is a high voltage transformer.

ところが、最近省スペースタイプの電子レンジ
として第5図に示すようなオーブン1上部にマグ
ネトロン5、高圧トランス6、高圧コンデンサ7
等の高周波発生用電装部品と、それら部品の冷却
装置8とを設けたものが開発され、販売されつつ
ある。
However, recently as a space-saving type microwave oven, a magnetron 5, a high-voltage transformer 6, and a high-voltage condenser 7 are installed on the top of the oven 1 as shown in Figure 5.
Products equipped with electrical components for high frequency generation such as the above and a cooling device 8 for these components have been developed and are being sold.

その電子レンジの導波管3は配設スペースの関
係で第6図に示す如く、長さ方向を縦にしてオー
ブン天井壁9上に立設し、下端を開放して給電口
2としている。その構成において、加熱均一性を
改善するために給電口2の位置を変えることは導
波管3及びマグネトロン5の位置を変えることに
なり、又、給電口2の大きさを変えることは導波
管3の大きさを変えることになり、コンパクト化
されたオーブン1上部空間で電装部品の配置を考
えると位置及び又は大きさの変更は容易に行なえ
ず、十分な加熱均一性の改善が計れなかつた。
Due to space limitations, the waveguide 3 of the microwave oven is erected on the oven ceiling wall 9 with its length being vertical, as shown in FIG. In that configuration, changing the position of the feed port 2 to improve heating uniformity means changing the positions of the waveguide 3 and magnetron 5, and changing the size of the feed port 2 means changing the position of the waveguide 3 and the magnetron 5 to improve heating uniformity. The size of the tube 3 has to be changed, and considering the arrangement of electrical components in the space above the compact oven 1, it is not easy to change the position and/or size, and it is difficult to improve the heating uniformity sufficiently. Ta.

又、加熱均一性の良い位置に導波管3を配設す
ると、導波管3に取付けられるマグネトロン5の
位置も決つてしまい、冷却装置8及び冷却用送風
路の配設に大きな制限となつて効率の良い冷却が
行ない得なかつた。
Moreover, if the waveguide 3 is arranged at a position where heating uniformity is good, the position of the magnetron 5 attached to the waveguide 3 is also determined, which poses a big restriction on the arrangement of the cooling device 8 and the cooling air passage. Therefore, efficient cooling could not be achieved.

<目的> 本考案は上記の点に鑑みなされたもので、高周
波加熱装置のコンパクト化を維持しながら、オー
ブンの加熱均一性を向上させることを目的とす
る。
<Purpose> The present invention was developed in view of the above points, and aims to improve the heating uniformity of the oven while maintaining the compactness of the high-frequency heating device.

<実施例> 以下、本考案の一実施例を図面に基き説明す
る。
<Example> An example of the present invention will be described below with reference to the drawings.

第1図は本考案の要部断面図であり、従来例と
同一もしくは相当箇所には同一符号を付してい
る。10が本考案のサブキヤビテイであり、オー
ブン1の天井壁9とマグネトロン5との間に配設
して省スペース化を計ると共に、導波管3をサブ
キヤビテイ10の一側壁として流用しコストダウ
ンを計つている。
FIG. 1 is a sectional view of the main parts of the present invention, and the same or equivalent parts as in the conventional example are given the same reference numerals. 10 is the sub-cavity of the present invention, which is arranged between the ceiling wall 9 of the oven 1 and the magnetron 5 to save space, and the waveguide 3 is used as one side wall of the sub-cavity 10 to reduce costs. It's on.

第2図は第1図におけるサブキヤビテイ10の
a寸法を変化させることにより、実線で表わすオ
ーブン1中央での水平面加熱均一性及び破線で表
わすオーブン1中央での垂直面加熱均一性が変化
することを示す図である。尚、その曲線はオーブ
ンの形状及び容積等によつて異なるものである。
FIG. 2 shows that by changing the a dimension of the sub-cavity 10 in FIG. 1, the horizontal plane heating uniformity at the center of the oven 1, shown by the solid line, and the vertical plane heating uniformity, at the center of the oven 1, shown by the broken line, change. FIG. Note that the curve differs depending on the shape and volume of the oven.

又、上記実施例では導波管3とサブキヤビテイ
10を連設して設けているが、別々に離間して設
けてもよく、導波管3の配設位置についてもオー
ブン1の天井壁9に限定されるものではなく、オ
ーブン1の周側壁あるいは底壁であつても同様の
構成とすることができること勿論である。
Further, in the above embodiment, the waveguide 3 and the sub-cavity 10 are provided in a row, but they may be provided separately. Of course, the present invention is not limited to this, and the same structure may be applied to the peripheral side wall or the bottom wall of the oven 1.

<効果> 以上本考案によれば、上記給電口2に隣接した
上記マグネトロン5とオーブン1との間に、開口
寸法aがオーブンインピーダンスを変化させてオ
ーブンの最大加熱均一性を示す大きさに形成され
たサブキヤビテイー10を設けたので、このサブ
キヤビテイーはデツドスペースとしてのマグネト
ロン5とオーブン1との間に設けられることにな
る。したがつて、オーブン1の天井壁に給電口2
を形成してこの給電口2に導波管3を立設し、こ
の導波管3の先端側の側面にマグネトロン5を設
けることによりオーブンのコンパクト化を図りな
がら、加熱均一性を向上させるための上記サブキ
ヤビテイー10を上記デツドスペースに設けるこ
とにより、装置全体のコンパクト化を維持しなが
らオーブンの加熱均一性を向上させることができ
る。
<Effects> According to the present invention, the opening size a is formed between the magnetron 5 adjacent to the power supply port 2 and the oven 1 to a size that changes the oven impedance and shows maximum heating uniformity of the oven. Since the sub-cavity 10 is provided, this sub-cavity is provided between the magnetron 5 and the oven 1 as a dead space. Therefore, the power supply port 2 is installed on the ceiling wall of the oven 1.
In order to make the oven more compact and improve heating uniformity by forming a waveguide 3 upright in this power supply port 2 and providing a magnetron 5 on the side surface of the tip of this waveguide 3. By providing the above-mentioned subcavity 10 in the above-mentioned dead space, it is possible to improve the heating uniformity of the oven while maintaining the compactness of the entire apparatus.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の要部断面図で、第2図はサブ
キヤビテイの変化に対する加熱均一性の変化を示
す関係図、第3図は従来の高周波加熱装置の要部
斜視図、第4図は従来の要部断面図、第5図は従
来の他の高周波加熱装置の要部斜視図、第6図は
第5図の要部断面図である。 符号、1:オーブン、3:導波管、5:マグネ
トロン、10:サブキヤビテイ。
Fig. 1 is a sectional view of the main part of the present invention, Fig. 2 is a relationship diagram showing changes in heating uniformity with changes in the subcavity, Fig. 3 is a perspective view of the main part of a conventional high-frequency heating device, and Fig. 4 is FIG. 5 is a perspective view of a main part of another conventional high-frequency heating device, and FIG. 6 is a sectional view of a main part of FIG. 5. Code, 1: Oven, 3: Waveguide, 5: Magnetron, 10: Subcavity.

Claims (1)

【実用新案登録請求の範囲】 オーブン1の天井壁に給電口2を形成してこの
給電口2に導波管3を立設し、この導波管3の先
端側の側面にマグネトロン5を設け、 上記給電口2に隣接した上記マグネトロン5と
オーブン1との間に、開口寸法aがオーブンイン
ピーダンスを変化させてオーブンの最大加熱均一
性を示す大きさに形成されたサブキヤビテイー1
0を設けたことを特徴とする高周波加熱装置。
[Claim for Utility Model Registration] A power supply port 2 is formed on the ceiling wall of the oven 1, a waveguide 3 is provided upright in the power supply port 2, and a magnetron 5 is provided on the side surface of the tip of the waveguide 3. , a sub-cavity 1 formed between the magnetron 5 adjacent to the power supply port 2 and the oven 1, the opening dimension a of which changes the oven impedance and exhibits maximum heating uniformity of the oven;
A high frequency heating device characterized by providing a zero.
JP1985060689U 1985-04-22 1985-04-22 Expired JPH0331034Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985060689U JPH0331034Y2 (en) 1985-04-22 1985-04-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985060689U JPH0331034Y2 (en) 1985-04-22 1985-04-22

Publications (2)

Publication Number Publication Date
JPS61177391U JPS61177391U (en) 1986-11-05
JPH0331034Y2 true JPH0331034Y2 (en) 1991-07-01

Family

ID=30588270

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985060689U Expired JPH0331034Y2 (en) 1985-04-22 1985-04-22

Country Status (1)

Country Link
JP (1) JPH0331034Y2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000003564A1 (en) * 1998-07-08 2000-01-20 Matsushita Electric Industrial Co., Ltd. Variable-impedance unit, microwave device using the unit, and microwave heater

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6070686A (en) * 1983-09-28 1985-04-22 株式会社日立製作所 Electronic range

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6070686A (en) * 1983-09-28 1985-04-22 株式会社日立製作所 Electronic range

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000003564A1 (en) * 1998-07-08 2000-01-20 Matsushita Electric Industrial Co., Ltd. Variable-impedance unit, microwave device using the unit, and microwave heater

Also Published As

Publication number Publication date
JPS61177391U (en) 1986-11-05

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