JPH0330426U - - Google Patents
Info
- Publication number
- JPH0330426U JPH0330426U JP8995089U JP8995089U JPH0330426U JP H0330426 U JPH0330426 U JP H0330426U JP 8995089 U JP8995089 U JP 8995089U JP 8995089 U JP8995089 U JP 8995089U JP H0330426 U JPH0330426 U JP H0330426U
- Authority
- JP
- Japan
- Prior art keywords
- treatment apparatus
- heat treatment
- refrigerant
- combustion section
- vertical heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims description 7
- 238000002485 combustion reaction Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 3
- 238000002791 soaking Methods 0.000 claims description 3
- 238000005192 partition Methods 0.000 claims description 2
- 239000012495 reaction gas Substances 0.000 claims description 2
- 239000003507 refrigerant Substances 0.000 claims 3
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Spray-Type Burners (AREA)
Description
第１図は本考案に係る縦型熱処理装置の要部を
断面で示した略図、第２図は熱処理装置における
温度分布を示す説明図である。
１……プロセスチユーブ、２……反応ガス供給
パイプ、３……燃焼ノズル、４……均熱管、５…
…ヒータ、６……炉壁、７……燃焼部、８……仕
切部、９……温度調整領域、１０……冷却装置、
１１……熱交換器、１２……ブロア、１３……循
環パイプ、１３ａ……送気口、１３ｂ……吸気口
。
FIG. 1 is a schematic cross-sectional view of the main parts of a vertical heat treatment apparatus according to the present invention, and FIG. 2 is an explanatory diagram showing the temperature distribution in the heat treatment apparatus. 1... Process tube, 2... Reaction gas supply pipe, 3... Combustion nozzle, 4... Soaking tube, 5...
... Heater, 6 ... Furnace wall, 7 ... Combustion section, 8 ... Partition section, 9 ... Temperature adjustment area, 10 ... Cooling device,
11...Heat exchanger, 12...Blower, 13...Circulation pipe, 13a...Air supply port, 13b...Intake port.
Claims (1)
チユーブと、該プロセスチユーブの外周面に少な
くともヒータ及び炉壁を備えた熱処理装置であつ
て、前記燃焼部近傍に冷媒を循環させる冷却装置
を設けたことを特徴とする縦型熱処理装置。 (2) 燃焼部近傍に仕切部を設けて温度調整領域
を形成し、該温度調整領域に冷媒を循環させる請
求項(1)記載の縦型熱処理装置。 (3) プロセスチユーブとヒータとの間に均熱管
を配設し、該均熱管と炉壁とによつて形成される
領域の燃焼部近傍に冷媒を循環させる請求項(1)
，(2)記載の縦型熱処理装置。 (4) 冷却装置が熱交換器と、ブロアと循環パイ
プとで構成される請求項(1)，(2)，(3)記載の縦
型熱処理装置。[Claims for Utility Model Registration] (1) A heat treatment apparatus comprising a process tube having a reaction gas combustion section inside, and at least a heater and a furnace wall on the outer peripheral surface of the process tube, wherein A vertical heat treatment apparatus characterized by being equipped with a cooling device that circulates a refrigerant. (2) The vertical heat treatment apparatus according to claim (1), wherein a partition is provided near the combustion section to form a temperature adjustment area, and a refrigerant is circulated through the temperature adjustment area. (3) Claim (1) wherein a heat soaking tube is disposed between the process tube and the heater, and a refrigerant is circulated near the combustion section in the area formed by the heat soaking tube and the furnace wall.
, the vertical heat treatment apparatus described in (2). (4) The vertical heat treatment apparatus according to claims (1), (2), and (3), wherein the cooling device comprises a heat exchanger, a blower, and a circulation pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8995089U JPH0330426U (en) | 1989-07-31 | 1989-07-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8995089U JPH0330426U (en) | 1989-07-31 | 1989-07-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0330426U true JPH0330426U (en) | 1991-03-26 |
Family
ID=31639499
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8995089U Pending JPH0330426U (en) | 1989-07-31 | 1989-07-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0330426U (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6191933A (en) * | 1984-10-12 | 1986-05-10 | Nec Corp | Manufacturing apparatus of semiconductor device |
| JPS63166218A (en) * | 1986-12-27 | 1988-07-09 | Deisuko Haitetsuku:Kk | Wafer cooling method for semiconductor thermal processing equipment |
-
1989
- 1989-07-31 JP JP8995089U patent/JPH0330426U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6191933A (en) * | 1984-10-12 | 1986-05-10 | Nec Corp | Manufacturing apparatus of semiconductor device |
| JPS63166218A (en) * | 1986-12-27 | 1988-07-09 | Deisuko Haitetsuku:Kk | Wafer cooling method for semiconductor thermal processing equipment |