JPH03291282A - Diamine compound - Google Patents
Diamine compoundInfo
- Publication number
- JPH03291282A JPH03291282A JP2090157A JP9015790A JPH03291282A JP H03291282 A JPH03291282 A JP H03291282A JP 2090157 A JP2090157 A JP 2090157A JP 9015790 A JP9015790 A JP 9015790A JP H03291282 A JPH03291282 A JP H03291282A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- reaction
- resins
- mol
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Diamine compound Chemical class 0.000 title claims description 12
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 3
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 abstract description 12
- 150000001875 compounds Chemical class 0.000 abstract description 9
- 229920001721 polyimide Polymers 0.000 abstract description 8
- 239000004642 Polyimide Substances 0.000 abstract description 6
- 239000011347 resin Substances 0.000 abstract description 6
- 229920005989 resin Polymers 0.000 abstract description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract description 5
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 abstract description 5
- CZGCEKJOLUNIFY-UHFFFAOYSA-N 4-Chloronitrobenzene Chemical compound [O-][N+](=O)C1=CC=C(Cl)C=C1 CZGCEKJOLUNIFY-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract description 4
- 239000002994 raw material Substances 0.000 abstract description 4
- 239000004952 Polyamide Substances 0.000 abstract description 3
- 150000003934 aromatic aldehydes Chemical class 0.000 abstract description 3
- 239000003795 chemical substances by application Substances 0.000 abstract description 3
- 229920002647 polyamide Polymers 0.000 abstract description 3
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 abstract description 2
- 239000003822 epoxy resin Substances 0.000 abstract description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract description 2
- 229920000647 polyepoxide Polymers 0.000 abstract description 2
- 238000009833 condensation Methods 0.000 abstract 1
- 230000005494 condensation Effects 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 229930185605 Bisphenol Natural products 0.000 description 8
- 150000004985 diamines Chemical class 0.000 description 8
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 5
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 238000006482 condensation reaction Methods 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000000862 absorption spectrum Methods 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 238000006722 reduction reaction Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- ZNZYKNKBJPZETN-WELNAUFTSA-N Dialdehyde 11678 Chemical compound N1C2=CC=CC=C2C2=C1[C@H](C[C@H](/C(=C/O)C(=O)OC)[C@@H](C=C)C=O)NCC2 ZNZYKNKBJPZETN-WELNAUFTSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- 150000004679 hydroxides Chemical class 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 2
- RSJKGSCJYJTIGS-UHFFFAOYSA-N undecane Chemical compound CCCCCCCCCCC RSJKGSCJYJTIGS-UHFFFAOYSA-N 0.000 description 2
- MWOOGOJBHIARFG-UHFFFAOYSA-N vanillin Chemical compound COC1=CC(C=O)=CC=C1O MWOOGOJBHIARFG-UHFFFAOYSA-N 0.000 description 2
- 235000012141 vanillin Nutrition 0.000 description 2
- FGQOOHJZONJGDT-UHFFFAOYSA-N vanillin Natural products COC1=CC(O)=CC(C=O)=C1 FGQOOHJZONJGDT-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- VGSOCYWCRMXQAB-UHFFFAOYSA-N 3-chloro-4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1Cl VGSOCYWCRMXQAB-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Chemical class 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000007868 Raney catalyst Substances 0.000 description 1
- 241000220317 Rosa Species 0.000 description 1
- WAIPAZQMEIHHTJ-UHFFFAOYSA-N [Cr].[Co] Chemical compound [Cr].[Co] WAIPAZQMEIHHTJ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000008378 aryl ethers Chemical class 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-M phenolate Chemical compound [O-]C1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-M 0.000 description 1
- 229940031826 phenolate Drugs 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- KCDXJAYRVLXPFO-UHFFFAOYSA-N syringaldehyde Chemical compound COC1=CC(C=O)=CC(OC)=C1O KCDXJAYRVLXPFO-UHFFFAOYSA-N 0.000 description 1
- COBXDAOIDYGHGK-UHFFFAOYSA-N syringaldehyde Natural products COC1=CC=C(C=O)C(OC)=C1O COBXDAOIDYGHGK-UHFFFAOYSA-N 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Polyamides (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Epoxy Resins (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、新規なジアミン化合物に関するものである。[Detailed description of the invention] [Industrial application field] The present invention relates to a novel diamine compound.
さらに詳しくは、本発明は、高分子材料のモノマー、例
えばポリアミドおよびポリイミド等の樹脂用原料、ある
いはエポキシ樹脂およびマレイミド樹脂の硬化剤として
有用である、新規なジアミン化合物に関するものである
。More specifically, the present invention relates to novel diamine compounds useful as monomers for polymeric materials, such as raw materials for resins such as polyamides and polyimides, or as curing agents for epoxy resins and maleimide resins.
従来、ポリイミド樹脂は、高度の耐熱性、耐薬品性、電
気的特性1機械的特性等に優れた緒特性を有しており、
例えば、4.4′−ジアミノジフェニルエーテルとピロ
メリット酸二無水物より得られるポリイミドは広く使用
されている。Conventionally, polyimide resins have excellent properties such as high heat resistance, chemical resistance, electrical properties and mechanical properties.
For example, polyimides obtained from 4,4'-diaminodiphenyl ether and pyromellitic dianhydride are widely used.
しかしながら近年、低吸水性および伸度等の機械的特性
に優れたポリイミド樹脂に対する要求が高まってきてお
り、種々の検討が行われている(特開昭61−1508
25号公報、同61−264028号公報)。However, in recent years, there has been an increasing demand for polyimide resins with low water absorption and excellent mechanical properties such as elongation, and various studies have been conducted (Japanese Patent Laid-Open No. 61-1508
No. 25, No. 61-264028).
しかし、何れの場合もポリイミドの優れた耐熱性を維持
し、なおかつ伸度等の機械的特性を満足するようなもの
はまだ得られていない。However, in any case, a material that maintains the excellent heat resistance of polyimide and also satisfies mechanical properties such as elongation has not yet been obtained.
したがって、本発明の目的は、従来のポリイミドの伸度
等のF!!1械的特性的特性するための好ましい樹脂用
Mflである、新規なジアミンを提供することである。Therefore, the object of the present invention is to improve the elongation of conventional polyimide. ! 1. It is an object of the present invention to provide a novel diamine that is a preferable Mfl for resins due to its mechanical properties.
すなわち、本発明は下記−形式(1)で示されるジアミ
ン化合物を提供するものである。That is, the present invention provides a diamine compound represented by the following format (1).
〔式中、R3およびR2は水素原子、ハロゲン原子また
は炭素数1〜4のアルキル基もしくはアルコキシ基であ
る〕
本発明の一般式(1)で表されるジアミンは、例えば次
のようにして得られる。すなわち、ペンタエリスリトー
ルと下記−形式(I[)
υn
〔式中、R1およびR2は前記に同じ〕で示される水酸
基含有芳香族アルデヒドを脱水縮合させることにより下
記−形式(III)で示されるビスフェノール化合物を
得る。このビスフェノール化合物とパラクロルニトロベ
ンゼンを縮合反応させた後、還元することにより、本発
明のジアミンが得られる。[In the formula, R3 and R2 are a hydrogen atom, a halogen atom, or an alkyl group or an alkoxy group having 1 to 4 carbon atoms.] The diamine represented by the general formula (1) of the present invention can be obtained, for example, as follows. It will be done. That is, by dehydrating and condensing pentaerythritol with a hydroxyl group-containing aromatic aldehyde represented by the following form (I[) υn [wherein R1 and R2 are the same as above], a bisphenol compound represented by the following form (III) is obtained. get. The diamine of the present invention can be obtained by subjecting this bisphenol compound and parachloronitrobenzene to a condensation reaction and then reducing the condensation reaction.
以下、これをさらに詳細に説明する。This will be explained in more detail below.
アル−ヒト
本発明で使用される一般式(II)で示される水酸基含
有芳香族アルデヒドは、例えば、サリチルアルデヒド、
曽−ヒドロキシベンズアルデヒド、p−ヒドロキシベン
ズアルデヒド、バニリン、シリンガアルデヒド、3−ク
ロロ−4−ヒドロキシベンズアルデヒド等が挙げられる
。The hydroxyl group-containing aromatic aldehyde represented by the general formula (II) used in the present invention is, for example, salicylaldehyde,
Examples include so-hydroxybenzaldehyde, p-hydroxybenzaldehyde, vanillin, syringaldehyde, 3-chloro-4-hydroxybenzaldehyde, and the like.
駆厳棗査返1
ペンタエリスリトールと水酸基含有芳香族ジアルデヒド
との縮合反応は、ペンタエリスリトール1モルに対して
、水酸基含有芳香族ジアルデヒド1.8〜2.6モルの
範囲、温度80〜200℃の範囲、時間1〜20時間の
範囲で、適当な有機溶媒中、酸性触媒の存在下で行う。The condensation reaction between pentaerythritol and hydroxyl group-containing aromatic dialdehyde is carried out using a range of 1.8 to 2.6 moles of hydroxyl group-containing aromatic dialdehyde per 1 mole of pentaerythritol, and a temperature of 80 to 200 ml. The reaction is carried out in a suitable organic solvent in the presence of an acidic catalyst at a temperature in the range of 1 to 20 hours.
有機溶媒としては、ベンゼン、トルエン、キシレン等の
芳香族炭化水素、1,2−ジクロルエタン、クロルベン
ゼン等ハロゲン化炭化水素が好ましい。Preferred organic solvents include aromatic hydrocarbons such as benzene, toluene and xylene, and halogenated hydrocarbons such as 1,2-dichloroethane and chlorobenzene.
酸性触媒としては、塩酸、硫酸等の鉱酸類、シ二つ酸、
パラトルエンスルホン酸等の有機酸類が使用される。Examples of acidic catalysts include mineral acids such as hydrochloric acid and sulfuric acid, silicic acid,
Organic acids such as para-toluenesulfonic acid are used.
虹査且l
ビスフェノールとパラクロルニトロベンゼンとの縮合反
応は、ビスフェノール化合物1モルに対して、パラクロ
ルニトロベンゼン2〜4モル、好ましくは2〜2.5モ
ルの範囲、温度50〜150℃の範囲、時間1〜10時
間の範囲で、適当な有機溶媒中、塩基の存在下で行う。In the condensation reaction between bisphenol and parachloronitrobenzene, the amount of parachlornitrobenzene is 2 to 4 mol, preferably 2 to 2.5 mol, per 1 mol of the bisphenol compound, and the temperature is 50 to 150°C. The reaction is carried out in a suitable organic solvent in the presence of a base for a time ranging from 1 to 10 hours.
有機溶媒としては、ベンゼン、トルエン、キシレン等の
芳香族炭化水素、アセトン、MEK等のケトン類、1,
2−ジクロルエタン、クロルベンゼン等のハロゲン化炭
化水素、N、N−ジメチルホルムアミド、N、N−ジメ
チルアセトアミド、ジメチルスルオキシド、N−メチル
−2−ピロリドン等の非プロトン性極性溶媒を使用でき
る。これらの溶媒は通常、反応原料に対して1〜10重
量倍で使用される。Examples of organic solvents include aromatic hydrocarbons such as benzene, toluene, and xylene; ketones such as acetone and MEK;
Halogenated hydrocarbons such as 2-dichloroethane and chlorobenzene, aprotic polar solvents such as N,N-dimethylformamide, N,N-dimethylacetamide, dimethyl sulfoxide, and N-methyl-2-pyrrolidone can be used. These solvents are usually used in an amount of 1 to 10 times the weight of the reaction raw materials.
塩基としては、例えば、アルカリ金属の酸化物、水酸化
物、炭酸塩、炭酸水素塩、水酸化物およびアルコキシド
類が使用される。塩基の使用量にはとくに厳密な限定は
ないが、一般には、ビスフェノール化合物1モルに対し
て2〜4モル、好ましくは2〜2.5モルである。これ
らの塩基は、反応系においてはビスフェノールと反応し
てフェノラートを生成し、溶解した状態にある。As the base, for example, alkali metal oxides, hydroxides, carbonates, hydrogen carbonates, hydroxides and alkoxides are used. Although there is no particular strict limitation on the amount of the base used, it is generally 2 to 4 mol, preferably 2 to 2.5 mol, per 1 mol of the bisphenol compound. These bases react with bisphenol to produce phenolate in the reaction system, and are in a dissolved state.
反応終了後、副生ずる塩類を水洗することにより粗製品
が得られる。この粗製品は再結晶などにより精製するこ
とができるが、通常そのまま還元反応を行う。After the reaction is completed, a crude product is obtained by washing the by-product salts with water. Although this crude product can be purified by recrystallization or the like, it is usually directly subjected to a reduction reaction.
櫨天反X
還元反応には特に制限はなく、ニトロ基をアミノ基に還
元する通常の方法を適用できるが、工業的には接触還元
が好ましい、接触還元においては、例えば、ニッケル、
パラジウム、白金等の金属触媒や担持触媒またはニッケ
ルや銅などのラネー触媒等の還元触媒を用い、反応に不
活性な溶媒中、温度20〜200℃、圧力常圧〜50k
g/c1程度で反応を行う。Haji Tentan
A reduction catalyst such as a metal catalyst such as palladium or platinum, a supported catalyst, or a Raney catalyst such as nickel or copper is used in a solvent inert to the reaction at a temperature of 20 to 200℃ and a pressure of normal pressure to 50K.
The reaction is carried out at about g/c1.
反応溶媒としてはメタノール、エタノール、イツブロバ
ノール、メチルセロソルブ、エチルセロソルブ等が使用
される。As the reaction solvent, methanol, ethanol, ituburobanol, methyl cellosolve, ethyl cellosolve, etc. are used.
反応終了後、触媒を濾過し除去した後、溶媒を溜置し精
製することにより目的のジアミンが得られる。After the reaction is completed, the catalyst is filtered and removed, and the solvent is distilled and purified to obtain the desired diamine.
この発明の化合物は、その赤外線吸収スペクトルが34
50cm−’付近において、アミノ基に由来する特性吸
収を示すので、これによって同定することができる。The compound of this invention has an infrared absorption spectrum of 34
It exhibits a characteristic absorption derived from the amino group around 50 cm-', so it can be identified based on this.
以下、実施例により本発明をさらに詳細に説明する。Hereinafter, the present invention will be explained in more detail with reference to Examples.
罠羞111
撹拌機、温度計、還流冷却器およびディーンスターク管
を備えた114ツロフラスコに、バラヒドロキシベンズ
アルデヒド122g(1モル)、ペンタエリスリトール
68y(0,5モル)、トルエン500cc、ジメチル
アセトアミド25ccおよびパラトルエンスルホンM3
yを仕込み、112℃に加熱還流させた。6時間で所定
量の水が生成したことを確認し、反応混合物を冷却した
。析出固体を枦別し、熱トルエン洗浄後乾燥し、3.9
−ビス(4−ヒドロキシフェニル)−2,4,8,10
−テトラオキサスピロ[5,5]ウンデカンを得た。収
量は103g(0,3モル)で、収率は60%であった
。Trap 111 Into a 114 Tulo flask equipped with a stirrer, thermometer, reflux condenser and Dean-Stark tube, 122 g (1 mol) of rose hydroxybenzaldehyde, 68y (0.5 mol) of pentaerythritol, 500 cc of toluene, 25 cc of dimethylacetamide and para Toluenesulfone M3
y was charged and heated to reflux at 112°C. After confirming that a predetermined amount of water had been produced in 6 hours, the reaction mixture was cooled. Separate the precipitated solid, wash with hot toluene and dry.
-bis(4-hydroxyphenyl)-2,4,8,10
-Tetraoxaspiro[5,5]undecane was obtained. The yield was 103 g (0.3 mol), 60%.
このようにして得られた39−ビス(4−ヒドロキシフ
ェニル)−2,4,8,10−テトラオキサスピロ[5
,5]ウンデカン68.8g(0,2モル)を、撹拌機
、温度計を備えた500cc4ツロフラスコに仕込んだ
、さらに4−ニトロクロルベンゼン94.5゜(0,6
モル)、85%KOH39,5g(0,6−1ニル)お
よびジメチルスルホキシド300ccを加え、90℃で
4時間加熱撹拌した。反応混合物を冷却後、水21に加
え析出した固体をF別後、トルエンで洗浄し乾燥した。The thus obtained 39-bis(4-hydroxyphenyl)-2,4,8,10-tetraoxaspiro[5
, 5] undecane (68.8 g (0.2 mol)) was charged into a 500 cc 4-turoh flask equipped with a stirrer and a thermometer, and 4-nitrochlorobenzene (94.5° (0.6
mol), 39.5 g (0,6-1 nil) of 85% KOH, and 300 cc of dimethyl sulfoxide were added, and the mixture was heated and stirred at 90° C. for 4 hours. After cooling the reaction mixture, it was added to water 21, and the precipitated solid was separated from F, washed with toluene, and dried.
得られた3、9−ビス〔4−(4′−ニトロフェノキシ
)フェニル)−2,4,8,10テトラオキサスピロ[
5,5]ウンデカンの収量は85g(0,145モル)
で、その収率は73%であった。The obtained 3,9-bis[4-(4'-nitrophenoxy)phenyl)-2,4,8,10tetraoxaspiro[
The yield of 5,5]undecane is 85 g (0,145 mol)
The yield was 73%.
次に、上記のようにして得られた3、9−ビスC4−<
4−ニトロフェノキシ)フェニル〕−2,4,8,10
−チトラオキサスビロC5,5]ウンデ力ン30g(0
,05モル)、5%Pd/C3y、トルエン120cc
およびエチルアルコール30eeを、300ccハステ
ロイC製オートクレーブに仕込んだ、水素ガスを導入し
、反応圧力3〜5kg/am”、反応温度50〜60℃
で吸収が認められなくなるまで加熱撹拌したところ、5
時間で反応が終了した。冷却後反応混合物を濾過し、5
%Pd/Cを除いた後、r液を減圧濃縮したところ、う
すい褐色固体の3.9−ビスC4−(4−アミノフェノ
キシ)フェニル〕−2,4,8,10−テトラオキサス
ピロ[5,5]ウンデ力ン23g(0,043モル)を
得た。収率は86%であった。この化合物の融点は21
3.5〜215゜5℃であった。この化合物の赤外線吸
収スペクトルを第1図に、核磁気共鳴スペクトルを第2
図に示す。Next, 3,9-bisC4-<
4-nitrophenoxy)phenyl]-2,4,8,10
- Citraoxasbiro C5,5] Unde Rinun 30g (0
, 05 mol), 5% Pd/C3y, toluene 120cc
and 30ee of ethyl alcohol were charged into a 300cc Hastelloy C autoclave, hydrogen gas was introduced, the reaction pressure was 3~5kg/am'', and the reaction temperature was 50~60℃.
When heated and stirred until no absorption was observed, 5
The reaction was completed in time. After cooling, the reaction mixture was filtered and
After removing %Pd/C, the r liquid was concentrated under reduced pressure to obtain a pale brown solid of 3.9-bisC4-(4-aminophenoxy)phenyl]-2,4,8,10-tetraoxaspiro[5 , 5] was obtained. The yield was 86%. The melting point of this compound is 21
The temperature was 3.5-215.5°C. The infrared absorption spectrum of this compound is shown in Figure 1, and the nuclear magnetic resonance spectrum is shown in Figure 2.
As shown in the figure.
第1図においては、3.450 cm−’ : −NH
4I 、235cz−’ :芳香族エーテル、1.07
0cm−:脂肪族エーテルをそれぞれ示す、また第2図
においては、3 、3 ppm ニーCL−15,4P
ppm : =C訃、6.5〜7.4ppm:ベンゼン
環をそれぞれ示す。In Figure 1, 3.450 cm-': -NH
4I, 235cz-': aromatic ether, 1.07
0 cm-: indicates aliphatic ether, and in FIG. 2, 3,3 ppm Ni CL-15,4P
ppm: = C, 6.5 to 7.4 ppm: each represents a benzene ring.
L艶糺ユ
パラヒドロキシベンズアルデヒド122gをバニリン1
52g(1モル)に変える以外は実施例1と同様にして
、ビスフェノールを得た後、これをジニトロ化合物とし
、さらに還元することにより、褐色の3,9−ビス[4
−(4−アミノフェノキシ)−3メトキシフエニル)−
2,4,8,10−テトラオキサスピロ[5,5]ウン
デカンを得た。この化合物の融点は132〜136°C
であった。122g of L-gold Yupara hydroxybenzaldehyde and 1 part of vanillin
After obtaining bisphenol in the same manner as in Example 1 except that the amount was changed to 52 g (1 mol), this was converted into a dinitro compound, and by further reduction, a brown 3,9-bis[4
-(4-aminophenoxy)-3methoxyphenyl)-
2,4,8,10-tetraoxaspiro[5,5]undecane was obtained. The melting point of this compound is 132-136°C
Met.
また、各段階での収率は以下のとおりであった。Moreover, the yield at each stage was as follows.
ビスフェノール 86%
ジニトロ化合物 71%
ジアミン 83%
〔発明の効果〕
本発明は上記のように構成したので、新規なジアミンを
高収率で得ることができる。またこの新規なジアミンは
、高分子材料のモノマー、例えばポリアミド、ポリイミ
ド、およびポリアミドイミド樹脂の原料、或いはウレタ
ン化合物、エボキシ化合物等の硬化剤として有用な化合
物である。Bisphenol 86% Dinitro compound 71% Diamine 83% [Effects of the Invention] Since the present invention is configured as described above, a novel diamine can be obtained in high yield. Furthermore, this novel diamine is a compound useful as a monomer for polymeric materials, such as a raw material for polyamide, polyimide, and polyamideimide resin, or as a curing agent for urethane compounds, epoxy compounds, and the like.
第1図は実施例1において合成されたジアミンの赤外吸
収スペクトルであり、第2図は核磁気共鳴スペクトルで
ある。FIG. 1 is an infrared absorption spectrum of the diamine synthesized in Example 1, and FIG. 2 is a nuclear magnetic resonance spectrum.
Claims (1)
または炭素数1〜4のアルキル基もしくはアルコキシ基
である〕 で示されるジアミン化合物。[Claims] A diamine compound represented by ▲ Numerical formulas, chemical formulas, tables, etc. ▼ [In the formula, R_1 and R_2 are a hydrogen atom, a halogen atom, or an alkyl group or an alkoxy group having 1 to 4 carbon atoms].
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2090157A JPH03291282A (en) | 1990-04-06 | 1990-04-06 | Diamine compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2090157A JPH03291282A (en) | 1990-04-06 | 1990-04-06 | Diamine compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03291282A true JPH03291282A (en) | 1991-12-20 |
Family
ID=13990660
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2090157A Pending JPH03291282A (en) | 1990-04-06 | 1990-04-06 | Diamine compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03291282A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113698417A (en) * | 2020-05-20 | 2021-11-26 | 上海凯毕淬化学科技有限公司 | Spiro compound and preparation method and application thereof |
-
1990
- 1990-04-06 JP JP2090157A patent/JPH03291282A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113698417A (en) * | 2020-05-20 | 2021-11-26 | 上海凯毕淬化学科技有限公司 | Spiro compound and preparation method and application thereof |
CN113698417B (en) * | 2020-05-20 | 2022-07-01 | 上海凯毕淬化学科技有限公司 | Spiro compound and preparation method and application thereof |
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