JPH03287626A - Production of polyimide composition - Google Patents
Production of polyimide compositionInfo
- Publication number
- JPH03287626A JPH03287626A JP9057590A JP9057590A JPH03287626A JP H03287626 A JPH03287626 A JP H03287626A JP 9057590 A JP9057590 A JP 9057590A JP 9057590 A JP9057590 A JP 9057590A JP H03287626 A JPH03287626 A JP H03287626A
- Authority
- JP
- Japan
- Prior art keywords
- polyamic acid
- polyimide composition
- alkoxysilane
- organic polar
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 17
- 239000004642 Polyimide Substances 0.000 title claims abstract description 15
- 229920001721 polyimide Polymers 0.000 title claims abstract description 15
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 229920005575 poly(amic acid) Polymers 0.000 claims abstract description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000002798 polar solvent Substances 0.000 claims abstract description 8
- 230000018044 dehydration Effects 0.000 claims abstract description 4
- 238000006297 dehydration reaction Methods 0.000 claims abstract description 4
- 238000006798 ring closing metathesis reaction Methods 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 13
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 abstract description 7
- 239000000377 silicon dioxide Substances 0.000 abstract description 6
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 abstract description 4
- 150000001875 compounds Chemical class 0.000 abstract description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 abstract description 3
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 abstract description 2
- 230000003301 hydrolyzing effect Effects 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000002904 solvent Substances 0.000 description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 125000005462 imide group Chemical group 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- 239000012024 dehydrating agents Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- -1 0-tolidine Chemical compound 0.000 description 2
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- FKNQCJSGGFJEIZ-UHFFFAOYSA-N 4-methylpyridine Chemical compound CC1=CC=NC=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- 125000006159 dianhydride group Chemical group 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-Lutidine Substances CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- GADSJKKDLMALGL-UHFFFAOYSA-N 2-propylbenzoic acid Chemical compound CCCC1=CC=CC=C1C(O)=O GADSJKKDLMALGL-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical compound C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910007156 Si(OH)4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 229930188620 butyrolactone Natural products 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- STZIXLPVKZUAMV-UHFFFAOYSA-N cyclopentane-1,1,2,2-tetracarboxylic acid Chemical compound OC(=O)C1(C(O)=O)CCCC1(C(O)=O)C(O)=O STZIXLPVKZUAMV-UHFFFAOYSA-N 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- GBASTSRAHRGUAB-UHFFFAOYSA-N ethylenetetracarboxylic dianhydride Chemical compound O=C1OC(=O)C2=C1C(=O)OC2=O GBASTSRAHRGUAB-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- ADLSSRLDGACTEX-UHFFFAOYSA-N tetraphenyl silicate Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 ADLSSRLDGACTEX-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- IAHONTJQHCFPGF-UHFFFAOYSA-N tributoxymethylsilane Chemical compound CCCCOC([SiH3])(OCCCC)OCCCC IAHONTJQHCFPGF-UHFFFAOYSA-N 0.000 description 1
- TUQLLQQWSNWKCF-UHFFFAOYSA-N trimethoxymethylsilane Chemical compound COC([SiH3])(OC)OC TUQLLQQWSNWKCF-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【発明の詳細な説明】
“〔産業上の利用分野]
本発明は塗料原料樹脂、成形材料等として有用なポリイ
ミド組成物及びその製造方法に関し、さらに詳しくは極
めて微細に分散したシリカ粒子を含有するポリイミド&
[l放物及びその製造方法に関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a polyimide composition useful as a raw material resin for paint, a molding material, etc., and a method for producing the same, and more specifically, a polyimide composition containing extremely finely dispersed silica particles. Polyimide &
[Regarding a paraboloid and its manufacturing method.]
ゾル−ゲル法は金属アルコキシドの加水分解、縮合反応
を利用し、最終的にガラス、セラミックス等に導く方法
である。この方法の特徴としては初期の反応が温和な条
件で進行し、また最終的な無機材料の形成に要求される
温度が比較的低温であることがあげられる。例えばテト
ラアルコキシシランは水の存在下で下記反応式のように
し一ζシリカ(SiO□)を生成することが知られてい
る。The sol-gel method is a method that utilizes hydrolysis and condensation reactions of metal alkoxides to ultimately produce glass, ceramics, etc. Characteristics of this method include that the initial reaction proceeds under mild conditions and that the temperature required to form the final inorganic material is relatively low. For example, it is known that tetraalkoxysilane generates monozeta silica (SiO□) as shown in the following reaction formula in the presence of water.
Si (OR) a +4 HzO→ Si(OH)4
+4ROH→ 5iOz + 2H20
[発明が解決しようとする課題]
本発明者らはこのようなゾル−ゲル法の特徴に着目し、
ポリマー中にシリカ成分を分散させることによる材料の
高機能化を目的としてポリイミドにシリカ成分を微分散
させることを鋭意研究し本発明に到達した。Si (OR) a +4 HzO→ Si(OH)4
+4ROH→5iOz +2H20 [Problem to be solved by the invention] The present inventors focused on the characteristics of such a sol-gel method,
With the aim of improving the functionality of materials by dispersing silica components in polymers, we have conducted extensive research into finely dispersing silica components in polyimide, and have arrived at the present invention.
本発明は有機極性溶剤中でポリアミド酸とアルコキシシ
ラン及び/またはその部分加水分解縮合物と必要に応じ
少量の水とを混合した後、脱水、閉環して得られるポリ
イミド組成物の製造方法である。The present invention is a method for producing a polyimide composition obtained by mixing a polyamic acid, an alkoxysilane and/or a partially hydrolyzed condensate thereof, and a small amount of water as necessary in an organic polar solvent, followed by dehydration and ring closure. .
本発明のポリイミド組成物の製造に使用される 報等
に記載されている方法によって製造される。The polyimide composition of the present invention is manufactured by a method described in the following publications.
ポリアミド酸は、次の如き一般式
即ち、構造式を有する繰り返し単位(但し、式中Rは少
くとも2価の炭素原子を含有する4価の基であって、該
4価の基に結合しているカルボニル基は該4価の基の任
意の炭素原子1個に対し、2個以上結合していないもの
とする。R′は少くとも2価の炭素原子を含有する2価
の基であって、該2価の基に結合している2価のアミノ
基は夫々前記の2価の基の離れた炭素原子と結合してい
るものとする。)を多数有するポリマーである。Polyamic acid has the following general formula:
That is, a repeating unit having a structural formula (wherein R is a tetravalent group containing at least a divalent carbon atom, and the carbonyl group bonded to the tetravalent group is a repeating unit having the structural formula R' is a divalent group containing at least a divalent carbon atom, and R' is a divalent group containing at least a divalent carbon atom, and no bond is made to the divalent group. It is assumed that each divalent amino group is bonded to a distant carbon atom of the above-mentioned divalent group.)
前記ポリアミド酸は公知の方法、例えば特公昭36−1
0999号公報、同3B−8250号公H,N−R’
−NH。The polyamic acid can be prepared by a known method, for example, Japanese Patent Publication No. 36-1.
No. 0999, No. 3B-8250 H, N-R'
-NH.
(式中、R′は前記と同じ)
を有する有機ジアミンの少くとも1種と、構造式
%式%
(式中、Rは前記と同じ)
を有するテトラカルボン酸二無水物の少なくとも1種を
、実質的に無水の条件下で有機極性溶剤中で反応中の温
度を60’C以下、なるべくは50″C以下に維持しな
がら反応させることにより製造される。(wherein R' is the same as above) and at least one tetracarboxylic dianhydride having the structural formula % (wherein R is the same as above). , by conducting the reaction in an organic polar solvent under substantially anhydrous conditions while maintaining the temperature during the reaction below 60'C, preferably below 50'C.
得られたポリアミド酸溶液は後述の如きポリ441組成
物の製造に供せられる。ボリア逅ド酸からポリイミドへ
の転化は熱的又は化学的方法により実施される。化学的
にイミド化する場合は脱水剤とイミド化触媒を併用して
イミド化する。ポリイミドは下記構造式を有する繰り返
し単位によって特徴づけられるものである。The obtained polyamic acid solution is used for producing a poly441 composition as described below. The conversion of boria-acid to polyimide is carried out by thermal or chemical methods. In the case of chemical imidization, a dehydrating agent and an imidization catalyst are used in combination. Polyimide is characterized by repeating units having the following structural formula.
(式中、R,R’は前記と同し)
本発明で使用するに適した二無水物としてはピロメリッ
ト酸二無水物、3.3’ 、4.4’−ジフェニルテト
ラカルボン酸二無水物、3.3′4.4′−ヘンシフエ
ノンテトラカルボン酸二無水物、2,3,6.7−ナフ
タリンテトラカルボン酸二無水物、2.2′−ビス(3
,4−ジカルボキシフェニル)プロパンニ無水物、ビス
(3゜4−ジカルボキシフェニル)エーテルニ無水物、
エチレンテトラカルボン酸二無水物、シクロペンタンテ
トラカルボン酸二無水物等である。(In the formula, R and R' are the same as above.) Suitable dianhydrides for use in the present invention include pyromellitic dianhydride, 3.3', 4.4'-diphenyltetracarboxylic dianhydride, 3.3'4.4'-Hensephenonetetracarboxylic dianhydride, 2,3,6.7-naphthalenetetracarboxylic dianhydride, 2.2'-bis(3
, 4-dicarboxyphenyl)propanihydride, bis(3゜4-dicarboxyphenyl)ether dianhydride,
These include ethylenetetracarboxylic dianhydride, cyclopentanetetracarboxylic dianhydride, and the like.
本発明で使用するに通したジアミン類として、m−フェ
ニレンジアミン、P−フェニレンジアミン、4.4′−
ジアミノジフェニルプロパン、44′−ジアミノジフェ
ニルメタン、4,4′−ジアミノジフェニルエーテル、
0−トリジン、Oジアニシジン、l、5−ジアミノナフ
タリン、4゜4′−シア旦ノジフェニルスルフィド、4
.4′−ジアミノジフェニルスルホン等が挙げられる。Diamines suitable for use in the present invention include m-phenylenediamine, P-phenylenediamine, 4.4'-
Diaminodiphenylpropane, 44'-diaminodiphenylmethane, 4,4'-diaminodiphenyl ether,
0-tolidine, O dianisidine, l,5-diaminonaphthalene, 4゜4'-cyanodiphenyl sulfide, 4
.. Examples include 4'-diaminodiphenylsulfone.
本発明で用いるポリアミド酸を合成するに有用な溶剤は
その官能基がジアミン又は二無水物と反応じない有機極
性溶剤である。有機極性溶剤は反応系に対し不活性であ
り、且つ生成物に対する溶剤であると共に、少くとも反
応剤の1種に対して、好適には反応の両者に対しても溶
剤でなければならない。好ましい溶剤としては、N、N
−ジメチルホルムアミド、N、N−ジメチルアセトアミ
ド、N−メチル−2−ピロリドン、テトラメチレンスル
ホン、ジメチルスルホン、ピリジン、ジエチレングリコ
ールジメチルエーテル等が挙げられる。Solvents useful in synthesizing the polyamic acids used in the present invention are organic polar solvents whose functional groups do not react with diamines or dianhydrides. The organic polar solvent must be inert to the reaction system and be a solvent for the product as well as for at least one of the reactants and preferably for both reactions. Preferred solvents include N, N
-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, tetramethylene sulfone, dimethyl sulfone, pyridine, diethylene glycol dimethyl ether and the like.
溶剤は単独であるいは混合して、又はベンゼン、トルエ
ン、キシレン、ジオキサン、ブチロラクトン、シクロヘ
キサンの如き非溶剤と混合して使用することが出来る。Solvents can be used alone or in combination, or with non-solvents such as benzene, toluene, xylene, dioxane, butyrolactone, cyclohexane.
本発明で使用される脱水剤及びイミド化触媒は特に限定
されないが通常下記の化合物が用いられる。The dehydrating agent and imidization catalyst used in the present invention are not particularly limited, but the following compounds are usually used.
脱水剤としては酢酸、プロピオン酸、イソ酪酸、安息香
酸、プロピル安息香酸、トルイル酸等の脂肪族及び芳香
族カルボン酸無水物が挙げられる。Examples of dehydrating agents include aliphatic and aromatic carboxylic acid anhydrides such as acetic acid, propionic acid, isobutyric acid, benzoic acid, propylbenzoic acid, and toluic acid.
又、イミド化触媒としてはピリジン、イソキノリン、3
.5−ルチジン、4−メチルビリジン、3メチルビリジ
ン等の第3級ア果ンが挙げられる。In addition, as an imidization catalyst, pyridine, isoquinoline, 3
.. Examples include tertiary fruits such as 5-lutidine, 4-methylpyridine, and 3-methylpyridine.
本発明で使用されるアルコキシシラン及び/またはその
部分加水分解縮合物は一般式(T]または[II)で代
表して示されるものである。The alkoxysilane and/or its partially hydrolyzed condensate used in the present invention is typically represented by general formula (T) or [II).
(R# O)、、SiR# 4□ ・・・ 〔I〕
(式中、R#は炭素数1〜5のアルキル基、アリール基
、アリル基で同一であっても異ってもよい。(R# O),, SiR# 4□ ... [I]
(In the formula, R# is an alkyl group, an aryl group, or an allyl group having 1 to 5 carbon atoms and may be the same or different.
nは3または4である)
OR’
(R″O”)s S i On S i O+r−R“
・・・〔■〕R
(式中、R#は上記と同じかまたは水素原子を表わす。n is 3 or 4) OR' (R″O”)s S i On S i O+r−R”
...[■]R (wherein R# is the same as above or represents a hydrogen atom.
nは0又は1から10の整数である)これらの具体的な
例としては、テトラメトキシシラン、テトラエトキシシ
ラン、テトラプロポキシシラン、テトライソプロポキシ
シラン、テトラブトキシシラン、トリメトキシメチルシ
ラン、トリエトキシメチルシラン、トリブトキシメチル
シラン、テトラフェノキシシラン等やこれらの部分加水
分解重縮合物等があげられる。これらは単独で使用する
ことも出来るし、また2種以上を併用することもできる
。(n is 0 or an integer from 1 to 10) Specific examples of these include tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetraisopropoxysilane, tetrabutoxysilane, trimethoxymethylsilane, triethoxymethyl Examples include silane, tributoxymethylsilane, tetraphenoxysilane, and partially hydrolyzed polycondensates thereof. These can be used alone or in combination of two or more.
ポリアミド酸溶液に前記アルコキシシラン及び/または
その部分加水分解縮合物またはその有機溶液並びに必要
に応じて少量の水を添加し、十分に混合した後に溶媒を
除去し、必要に応じて加熱乾燥する。The alkoxysilane and/or its partially hydrolyzed condensate or its organic solution and, if necessary, a small amount of water are added to the polyamic acid solution, and after thorough mixing, the solvent is removed, and if necessary, the mixture is heated and dried.
少量の水は、アルコキシシラン又はその部分加水分解縮
合物からシリカが生成する反応を促進するために添加す
るが、後続のイミド閉環で生成する水や大気中の湿気に
より十分反応が進むときは添加しなくてもよい。A small amount of water is added to promote the reaction that produces silica from alkoxysilane or its partially hydrolyzed condensate, but it is not added if the reaction progresses sufficiently due to the water produced in the subsequent imide ring closure or the moisture in the atmosphere. You don't have to.
アルコキシシラン及び/またはその部分加水分解縮合物
の有機溶液の溶媒としては特に限定されないが前記のボ
リア旦ド酸に使用される有機極性溶剤、即ちN、N−ジ
メチルホルムアミド、N。The solvent for the organic solution of the alkoxysilane and/or its partially hydrolyzed condensate is not particularly limited, but may include organic polar solvents used for the above-mentioned boriadandic acid, such as N,N-dimethylformamide and N.
N−ジメチルアセトアミド、N−メチル−2−ピロリド
ン、テトラメチレンスルホン、ジメチルスルホン、ピリ
ジン、ジエチレングリコールジメチルエーテル等が好適
に用いられる。N-dimethylacetamide, N-methyl-2-pyrrolidone, tetramethylene sulfone, dimethyl sulfone, pyridine, diethylene glycol dimethyl ether, and the like are preferably used.
上記混合物は加熱乾燥と同時にイミド閉環するか又は乾
燥後に加熱してイミド閉環するか若しくは化学閉環して
本発明の組成物を得る。なお、化学閉環する場合には、
前記の脱水剤及びイミド化触媒を更に加えて室温ないし
は加熱してイミド化する。The above-mentioned mixture is subjected to imide ring closure at the same time as heating and drying, or after drying, heating and imide ring closure, or chemical ring closure to obtain the composition of the present invention. In addition, in the case of chemical ring closure,
The above dehydrating agent and imidization catalyst are further added and imidization is carried out at room temperature or by heating.
また、ポリアミド酸の製造時、即ち重合時に単量体と一
緒にまたは重合中にアルコキシシラン及び/またはその
部分加水分解縮合物またはその有機溶液を仕込んで重合
し、アルコキシシラン及び/またはその加水分解線音物
を含有するボリア旦ド酸溶液を得た後、溶媒を除去し、
必要に応じて加燥した後にイミド閉環させて本発明の組
成物を得てもよい。In addition, during the production of polyamic acid, that is, during polymerization, alkoxysilane and/or its partially hydrolyzed condensate or its organic solution is added together with the monomer or during polymerization, and alkoxysilane and/or its hydrolyzed After obtaining a boria-dando acid solution containing linear compounds, the solvent is removed,
If necessary, the composition of the present invention may be obtained by performing imide ring closure after addition.
アルコキシシラン及び/またはその部分加水分解縮合物
の好ましい添加量はシリカ成分(SiO2)に換算して
、ポリアミド酸100重量部に対して1〜70重量部、
より好ましくは2〜60重量部である。1重量部より少
ないと引張弾性率の改良効果が少なく、また、70重量
部を超えると、引張弾性率は改良されるもののもろくな
り、商品価値の著しく劣ったものしか得られなくなる。The preferable addition amount of the alkoxysilane and/or its partially hydrolyzed condensate is 1 to 70 parts by weight per 100 parts by weight of polyamic acid, in terms of silica component (SiO2).
More preferably, it is 2 to 60 parts by weight. If it is less than 1 part by weight, the effect of improving the tensile modulus is small, and if it exceeds 70 parts by weight, although the tensile modulus is improved, it becomes brittle and only products with significantly inferior commercial value can be obtained.
また、必要に応じて添加される水の量は通常ポリアミド
酸100重量部に対して0〜200重量部である。Further, the amount of water added as necessary is usually 0 to 200 parts by weight per 100 parts by weight of polyamic acid.
多過ぎるとポリアミド酸が加水分解し、ポリイξド組成
物の物性が劣化するので好ましくない。If the amount is too large, the polyamic acid will be hydrolyzed and the physical properties of the polyimide composition will deteriorate, which is not preferable.
本発明の組成物は周知の配合剤、例えば酸化防止剤、熱
安定剤、紫外線吸収剤、着色剤等を配合して用いること
もできる。The composition of the present invention can also be used by adding well-known additives such as antioxidants, heat stabilizers, ultraviolet absorbers, colorants, etc.
以下、本発明を実施例を挙げて更に詳細に説明するが、
本発明はその要旨を超えない限り、実施例に限定される
ものではない。Hereinafter, the present invention will be explained in more detail with reference to examples.
The present invention is not limited to the examples unless it exceeds the gist thereof.
実施例1〜6、比較例1〜2
ビス(4−アミノフェニル)エーテル、4.0g(20
mmof)をジメチルアセトアミド(以下DMAcと略
記する)80mj2に溶かし、無水ピロメリット酸4.
36 g (20mmof)を加えて一晩撹拌し、ポリ
アミド酸を合成した。このポリアミド酸のDMAc溶液
10gに水1mfと第1表に示す量のテトラエトキシシ
ランを加え、溶液が均一になるまで撹拌し、ガラス板上
にキャストした。Examples 1-6, Comparative Examples 1-2 Bis(4-aminophenyl) ether, 4.0 g (20
mmof) in 80mj2 of dimethylacetamide (hereinafter abbreviated as DMAc), and pyromellitic anhydride 4.
36 g (20 mmof) was added and stirred overnight to synthesize polyamic acid. To 10 g of this DMAc solution of polyamic acid, 1 mf of water and tetraethoxysilane in the amount shown in Table 1 were added, stirred until the solution became uniform, and cast on a glass plate.
これを60°Cのオーブンで一晩乾燥した後、ガラス板
から剥離した。次いで固定枠にセットした後、窒素気流
下270°Cで3時間熱処理することにより5i02戒
分を含むポリイミド組成物(約25μm厚のフィルム)
を作成した。After drying this in an oven at 60°C overnight, it was peeled off from the glass plate. Next, after setting it in a fixed frame, it was heat-treated at 270 ° C. for 3 hours under a nitrogen stream to prepare a polyimide composition (approximately 25 μm thick film) containing 5i02 compounds.
It was created.
フィルムの特性値を第1表に示す。The characteristic values of the film are shown in Table 1.
実施例7
ビス(4−アミノフェニル)エーテル12.0 g(6
0mmol)、3.3’ 、4.4’−ビフェニルテト
ラカルボン酸二無水物17、7 g (60mmoj2
)及びDMAc 290mj!を用いた以外は実施例
1と同様にしてポリアミド酸溶液を得た。このポリアミ
ド溶液10gにテトラメトキシシランの部分加水分解縮
合物3mj2を加え、実施例1と同様にしてポリイミド
組成物(約25μm厚のフィルム)を作成した。結果を
第1表に示す。Example 7 Bis(4-aminophenyl)ether 12.0 g (6
0 mmol), 3.3', 4.4'-biphenyltetracarboxylic dianhydride 17.7 g (60 mmol)
) and DMAc 290mj! A polyamic acid solution was obtained in the same manner as in Example 1 except that . 3 mj2 of a partially hydrolyzed condensate of tetramethoxysilane was added to 10 g of this polyamide solution, and a polyimide composition (film about 25 μm thick) was prepared in the same manner as in Example 1. The results are shown in Table 1.
〔発明の効果]
本発明のポリイミド組成物は各種物性、特に9張弾性率
の改良されたポリアミドMi底物であり、塗料原料樹脂
、成形材料等として大変有用である。[Effects of the Invention] The polyimide composition of the present invention is a polyamide Mi base material with improved various physical properties, especially 9 tension modulus, and is very useful as a raw material resin for paints, a molding material, etc.
Claims (1)
ン及び/またはその部分加水分解縮合物と必要に応じ少
量の水とを混合した後に脱水、閉環することを特徴とす
るポリイミド組成物の製造方法。(1) A method for producing a polyimide composition, which comprises mixing a polyamic acid, an alkoxysilane and/or a partially hydrolyzed condensate thereof, and optionally a small amount of water in an organic polar solvent, followed by dehydration and ring closure.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9057590A JP2853253B2 (en) | 1990-04-05 | 1990-04-05 | Method for producing polyimide composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9057590A JP2853253B2 (en) | 1990-04-05 | 1990-04-05 | Method for producing polyimide composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03287626A true JPH03287626A (en) | 1991-12-18 |
JP2853253B2 JP2853253B2 (en) | 1999-02-03 |
Family
ID=14002229
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9057590A Expired - Lifetime JP2853253B2 (en) | 1990-04-05 | 1990-04-05 | Method for producing polyimide composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2853253B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010040320A (en) * | 2008-08-05 | 2010-02-18 | Hitachi Cable Ltd | Insulation coating for electric wire, and electric insulated wire using the same |
JP2014173071A (en) * | 2013-03-13 | 2014-09-22 | Sumitomo Bakelite Co Ltd | Polyimide film |
-
1990
- 1990-04-05 JP JP9057590A patent/JP2853253B2/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010040320A (en) * | 2008-08-05 | 2010-02-18 | Hitachi Cable Ltd | Insulation coating for electric wire, and electric insulated wire using the same |
JP2014173071A (en) * | 2013-03-13 | 2014-09-22 | Sumitomo Bakelite Co Ltd | Polyimide film |
Also Published As
Publication number | Publication date |
---|---|
JP2853253B2 (en) | 1999-02-03 |
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