JPH03270883A - Polishing material of cerium oxide - Google Patents
Polishing material of cerium oxideInfo
- Publication number
- JPH03270883A JPH03270883A JP7247990A JP7247990A JPH03270883A JP H03270883 A JPH03270883 A JP H03270883A JP 7247990 A JP7247990 A JP 7247990A JP 7247990 A JP7247990 A JP 7247990A JP H03270883 A JPH03270883 A JP H03270883A
- Authority
- JP
- Japan
- Prior art keywords
- cerium oxide
- polishing
- resin
- urethane resin
- grinding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910000420 cerium oxide Inorganic materials 0.000 title claims abstract description 38
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 title claims abstract description 38
- 238000005498 polishing Methods 0.000 title claims abstract description 36
- 239000000463 material Substances 0.000 title abstract description 10
- 239000004744 fabric Substances 0.000 claims abstract description 23
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims abstract description 18
- 239000000835 fiber Substances 0.000 claims abstract description 14
- 239000003082 abrasive agent Substances 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 12
- 229920005989 resin Polymers 0.000 abstract description 9
- 239000011347 resin Substances 0.000 abstract description 9
- 238000000227 grinding Methods 0.000 abstract description 5
- 239000003599 detergent Substances 0.000 abstract description 3
- 239000002674 ointment Substances 0.000 abstract 1
- 239000002245 particle Substances 0.000 description 7
- 239000012190 activator Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 229920002994 synthetic fiber Polymers 0.000 description 3
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 229920000297 Rayon Polymers 0.000 description 2
- 230000001413 cellular effect Effects 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002964 rayon Substances 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- -1 polypropylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、酸化セリウムが繊維でフレームワークした多
孔ウレタン樹脂に固定された研磨布に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an abrasive cloth in which cerium oxide is fixed to a porous urethane resin having a framework of fibers.
通常、窓ガラス、食器、タイル、板ガラスの研磨材とし
て、代表的には酸化珪素、ダイアモンド等が使用されて
いる。これら研磨材は例えば酸化珪素ではペースト状と
して使用されている。Generally, silicon oxide, diamond, etc. are typically used as polishing materials for window glass, tableware, tiles, and plate glass. These abrasive materials are used in the form of a paste for silicon oxide, for example.
一方、前述のような用途、あるいは平面デイスプレィ用
ガラス、光磁気ディスク、ＣＣＤカバーガラス等精密極
薄板ガラス等の最終仕上げ磨き用研磨材として、酸化セ
リウムが知られている。この酸化セリウム研磨材はモー
ス硬度６であり、ダイヤモンド、炭化珪素等の研磨材と
比較して軟質である特徴を有する。酸化セリウム研磨材
の粒径は、使用前はサブミクロン中心で水にうまく懸濁
してこの水等が研削助材として作用し、また、酸化セリ
ウムは研磨中に自ら機械的破壊を起し、微粉となること
で被削物を傷つけることなくその表面を研磨しながら光
沢鏡面を形成する。On the other hand, cerium oxide is known for use as described above or as an abrasive for final polishing of precision ultra-thin glass such as flat display glass, magneto-optical disks, and CCD cover glasses. This cerium oxide abrasive has a Mohs hardness of 6 and is characterized by being softer than abrasives such as diamond and silicon carbide. Before use, the particle size of the cerium oxide abrasive is mainly submicron, and it is well suspended in water, and this water acts as a grinding aid. Also, cerium oxide causes mechanical destruction by itself during polishing, and becomes fine powder. This creates a glossy mirror surface while polishing the surface of the workpiece without damaging it.
このように酸化セリウム研磨材は他に見られない多くの
特徴を有するものであるが、難点は高価であるというこ
とである。従って、酸化珪素研磨材のようにペースト状
で使用する場合、例えばこのペーストを布等に振りかけ
て使用すると、研磨後はペーストを洗い流すことから、
ペーストが無駄になり、不経済となるものであった。As described above, cerium oxide abrasives have many features not found elsewhere, but the drawback is that they are expensive. Therefore, when using a paste like silicon oxide abrasive, for example, if you sprinkle this paste on cloth etc., the paste will be washed away after polishing.
The paste was wasted and was uneconomical.
本発明は上記した現状に鑑み、高価な酸化セリウム研磨
材を有効に利用でき、しかも研磨に際して効率の良い研
磨部材を提供することを目的とするものである。In view of the above-mentioned current situation, it is an object of the present invention to provide a polishing member that can effectively utilize an expensive cerium oxide polishing material and is highly efficient in polishing.
本発明は、酸化セリウム研磨材を繊維で強化された多孔
ウレタン樹脂に固定した研磨布により、前記課題を遠戚
したものである。The present invention is a distant relative of the above problem by providing an abrasive cloth in which a cerium oxide abrasive material is fixed to a porous urethane resin reinforced with fibers.
本発明では酸化セリウム研磨材を多孔ウレタン樹脂に固
定したため、酸化セリウム研磨材が樹脂に堅持され、内
部の酸化セリウムも研磨に関与し、さらに使用前に水に
漬けることにより水分を十分に樹脂気孔内に取り入れる
ことができ、研磨時にこの水が研磨助材（滑材）として
作用し、また酸化セリウムが固定された多孔樹脂が繊維
で強化されているため、繊維の柔軟さを保持しつつ強度
が向上し、研磨布に付着した被削物（ゴミ）は洗剤で容
易に洗い流せ、何回でも繰返して使用できる。In the present invention, since the cerium oxide abrasive material is fixed to the porous urethane resin, the cerium oxide abrasive material is firmly supported by the resin, and the cerium oxide inside also participates in polishing. Furthermore, by soaking in water before use, moisture is sufficiently removed from the resin pores. This water acts as a polishing aid (slip material) during polishing, and since the porous resin to which cerium oxide is fixed is reinforced with fibers, it maintains the flexibility of the fibers while increasing its strength. The polishing cloth has improved polishing properties, and the workpiece (dust) attached to the polishing cloth can be easily washed away with detergent, allowing it to be used over and over again.
以下に本発明の実施例を図面を参照して説明する。Embodiments of the present invention will be described below with reference to the drawings.
第１図は本発明に係る研磨布の断面を示す。FIG. 1 shows a cross section of a polishing cloth according to the present invention.
この第１図において、工は酸化セリウム研磨材であり、
平均粒度１μ以下で最大粒径５μ以下のものを、ウレタ
ン樹脂に対して５〜７５重量％含有させる。２は多孔ウ
レタン樹脂であり、この多孔ウレタン樹脂２には前記酸
化セリウム研磨材上が固定されている。そして、多孔ウ
レタン樹脂２は酸化セリウム研磨材上を固定する際、発
泡条件を研磨材粒子径と気泡径とを最適な関係にコント
ロールし、かつその気泡に研磨加工時の助材となる水を
毛細管現象で保留できるもの、具体的には発泡の過程で
その気泡径を１００μ以下にコントロールし、かつ開放
された連続気泡とする。３は酸化セリウム研磨材１が固
定された多孔ウレタン樹脂２を強化する繊維であり、不
織布またはその他の基布で研磨に適する繊維、具体的に
はポリエステル、ナイロン、レーヨン、アクリル、ポリ
プロピレン、コツトン等が適する。In this Figure 1, the material is cerium oxide abrasive,
The urethane resin contains 5 to 75% by weight of particles having an average particle size of 1 μm or less and a maximum particle size of 5 μm or less. 2 is a porous urethane resin, and the above-mentioned cerium oxide abrasive material is fixed to this porous urethane resin 2. When the porous urethane resin 2 is fixed on the cerium oxide abrasive material, the foaming conditions are controlled to the optimum relationship between the abrasive particle diameter and the bubble diameter, and the bubbles are filled with water, which is an auxiliary material during the polishing process. Those that can be retained by capillary action, specifically, the bubble diameter is controlled to 100 μm or less during the foaming process, and the bubbles are opened and open. 3 is a fiber reinforcing the porous urethane resin 2 to which the cerium oxide abrasive material 1 is fixed, and is a nonwoven fabric or other base fabric suitable for polishing, specifically polyester, nylon, rayon, acrylic, polypropylene, cotton, etc. is suitable.
次に、本発明の研磨布を製造する一例を説明する。Next, an example of manufacturing the polishing cloth of the present invention will be described.
■ ナイロン、ポリエステル、レーヨン、等の原料繊維
（Ａ）を準備する。■ Prepare raw material fiber (A) such as nylon, polyester, rayon, etc.
■ 熱可塑性のポリウレタン樹脂に、有機溶剤と活性剤
を混合し、気泡性合成材樹脂溶液（Ｂ）を作る。■ Mix thermoplastic polyurethane resin with an organic solvent and an activator to create a cellular synthetic resin solution (B).
（Ｂ）
ウレタン樹脂 ２０〜４０％
活性剤
＊ジメチルフォルムアミド
■ 酸化セリウム（Ｃ）は粒度を５〜０．１μ（平均粒
度１〜２μ）に調粒する。(B) Urethane resin 20-40% Activator *Dimethylformamide ■ The particle size of cerium oxide (C) is adjusted to 5-0.1μ (average particle size 1-2μ).
■ 上記気泡性合成材樹脂溶液（Ｂ）と酸化セリウム（
Ｃ）とを混合槽で混合撹拌し、（Ｃ）を均一に分散させ
た混合液（Ｄ）を作る。■ The above cellular synthetic material resin solution (B) and cerium oxide (
Mix and stir C) in a mixing tank to create a mixed solution (D) in which (C) is uniformly dispersed.
（Ｄ）
（Ｂ）溶液 １００に対し
酸化セリウム ５〜７０重量％
■ 原料繊維（Ａ）の上に樹脂溶液（Ｂ）を塗布し、ド
クターブレードで厚さ０．５〜３ａ＋ｎ＋に調整した塗
布布（Ｅ）を作る。(D) (B) Solution 5 to 70% by weight of cerium oxide based on 100 ■ Coated cloth with resin solution (B) applied onto raw fiber (A) and adjusted to a thickness of 0.5 to 3a+n+ with a doctor blade. Make (E).
■ 塗布布（Ｅ）を水または温水の浴槽に通し、ウレタ
ン塗膜（Ｆ）を凝固させる。■ Pass the coated cloth (E) through water or a hot water bath to solidify the urethane coating (F).
■ ウレタン塗膜（Ｆ）を水洗槽に通し、塗膜中の活性
剤および溶剤を抜き、酸化セリウムの入った多孔通気性
合成材（Ｇ）を作る。■ The urethane coating film (F) is passed through a washing tank to remove the activator and solvent from the coating film, producing a porous, breathable synthetic material containing cerium oxide (G).
■ 多孔通気性合成材（Ｇ）を乾燥炉に入れて乾燥させ
、表面に適当な硬度をもつ研磨布にする。■ Place the porous breathable synthetic material (G) in a drying oven and dry it to form an abrasive cloth with an appropriate hardness on the surface.
■ さらに、必要に応じて表面を研磨砥石でバフィンダ
加工し、スェード調に加工した研磨布を作る。■ Furthermore, if necessary, the surface is buffinda-processed using an abrasive whetstone to create a suede-like polishing cloth.
研磨布
本 ウレタン樹脂に対する酸化セリウム混合比率
１０〜７０％
本製造条件 凝固溶温度 ２５〜６０”Ｃ水洗槽温
度 ４０〜７０℃以下
以下に実施例を示す。Polishing cloth book: Mixing ratio of cerium oxide to urethane resin
10 to 70% Main production conditions Solidification solution temperature 25 to 60"C Washing tank temperature 40 to 70"C Below Examples are shown below.
実施例１
ウレタン樹脂 １５％
溶媒十活性剤 ８５％ １００に対し酸化セリ
ウム ２０
の割合として酸化セリウム研磨布を製造した。Example 1 A cerium oxide polishing cloth was prepared using a ratio of 20 parts cerium oxide to 100 parts urethane resin, 15% solvent, and 85% activator.
実施例２
ウレタン樹脂 ２０％
溶媒十活性剤 ８０％ ｉｏｏに対し酸化セリウ
ム ５
の割合として酸化セリウム研磨布を製造した。Example 2 A cerium oxide polishing cloth was prepared using a ratio of cerium oxide 5 to urethane resin 20% solvent 80% activator ioo.
実施例３
ウレタン樹脂 ３０％
溶媒＋活性剤 ７０％ １００に対し酸化セリウ
ム ７５
の割合として酸化セリウム研磨布を製造した。Example 3 Urethane resin 30% Solvent + Activator 70% A cerium oxide polishing cloth was prepared at a ratio of 75 parts cerium oxide to 100 parts.
以上のような本発明によれば、次のような効果を有する
。According to the present invention as described above, the following effects are achieved.
■繊維の軟らかさを保持した研磨布が得られる。■A polishing cloth that retains the softness of the fibers can be obtained.
■繊維で強化された多孔ウレタン樹脂が固形樹脂部分に
酸化セリウムの微粉末を堅持し、さらに研磨前に布を水
に付けることで水が研磨助剤（滑材）として作用し、酸
化セリウムの研磨特性を十分に引き出すことができる。■Porous urethane resin reinforced with fibers firmly holds fine powder of cerium oxide in the solid resin part, and by soaking a cloth in water before polishing, the water acts as a polishing aid (lubricant), and the cerium oxide The polishing properties can be fully brought out.
■研磨布に付着した被削物（ゴミ）は洗剤で容易に落ち
、何回も繰り返して使用でき、高価な酸化セリウム研磨
材を有効に無駄なく利用できる。■Workpieces (dirt) attached to the polishing cloth can be easily removed with detergent, and can be used over and over again, allowing expensive cerium oxide polishing materials to be used effectively and without waste.
第１図は、本発明の研磨布の断面説明図である。 ■・・・酸化セリウム研磨材 FIG. 1 is an explanatory cross-sectional view of the polishing cloth of the present invention. ■・・・Cerium oxide abrasive material
Claims (1)
ン樹脂に固定してなる酸化セリウム研磨布。1. A cerium oxide polishing cloth made by fixing a cerium oxide abrasive material to a porous urethane resin reinforced with fibers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7247990A JPH03270883A (en) | 1990-03-22 | 1990-03-22 | Polishing material of cerium oxide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7247990A JPH03270883A (en) | 1990-03-22 | 1990-03-22 | Polishing material of cerium oxide |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03270883A true JPH03270883A (en) | 1991-12-03 |
Family
ID=13490497
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7247990A Pending JPH03270883A (en) | 1990-03-22 | 1990-03-22 | Polishing material of cerium oxide |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03270883A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11503077A (en) * | 1995-06-01 | 1999-03-23 | ノートン カンパニー | Curl resistant abrasive paper |
| EP1157975A1 (en) * | 2000-04-28 | 2001-11-28 | Mitsui Mining and Smelting Co., Ltd | Method for preparing glass substrate for magnetic recording medium |
| JP2002326168A (en) * | 2001-05-02 | 2002-11-12 | Fuji Photo Film Co Ltd | Polishing tape |
| JP2003311604A (en) * | 2002-04-26 | 2003-11-05 | Chiyoda Kk | Polishing pad |
| WO2018052133A1 (en) * | 2016-09-16 | 2018-03-22 | ニッタ・ハース株式会社 | Polishing pad |
-
1990
- 1990-03-22 JP JP7247990A patent/JPH03270883A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11503077A (en) * | 1995-06-01 | 1999-03-23 | ノートン カンパニー | Curl resistant abrasive paper |
| EP1157975A1 (en) * | 2000-04-28 | 2001-11-28 | Mitsui Mining and Smelting Co., Ltd | Method for preparing glass substrate for magnetic recording medium |
| JP2002326168A (en) * | 2001-05-02 | 2002-11-12 | Fuji Photo Film Co Ltd | Polishing tape |
| JP2003311604A (en) * | 2002-04-26 | 2003-11-05 | Chiyoda Kk | Polishing pad |
| WO2018052133A1 (en) * | 2016-09-16 | 2018-03-22 | ニッタ・ハース株式会社 | Polishing pad |
| JPWO2018052133A1 (en) * | 2016-09-16 | 2019-07-04 | ニッタ・ハース株式会社 | Polishing pad |
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