JPH0326045U - - Google Patents
Info
- Publication number
- JPH0326045U JPH0326045U JP8506489U JP8506489U JPH0326045U JP H0326045 U JPH0326045 U JP H0326045U JP 8506489 U JP8506489 U JP 8506489U JP 8506489 U JP8506489 U JP 8506489U JP H0326045 U JPH0326045 U JP H0326045U
- Authority
- JP
- Japan
- Prior art keywords
- metal foil
- section
- electron beam
- thin plate
- reinforcing thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011888 foil Substances 0.000 claims 4
- 239000002184 metal Substances 0.000 claims 4
- 238000010894 electron beam technology Methods 0.000 claims 2
- 230000003014 reinforcing effect Effects 0.000 claims 2
- 238000005088 metallography Methods 0.000 claims 1
Description
第1図は本案の一実施例の外観図、第2図は
−断面図である。
1……薄板、2……固定穴、3……溝、4……
微細穴、5……溝底部。
FIG. 1 is an external view of an embodiment of the present invention, and FIG. 2 is a cross-sectional view. 1...Thin plate, 2...Fixing hole, 3...Groove, 4...
Microhole, 5... Groove bottom.
Claims (1)
わみを防止するための補強用薄板部あるいは金属
箔を挿入固定可能な外皮枠より成る電子線絞り板
において、金属箔部と補強薄板部とが構造上ある
いは金相学上からも境界のない一体構造であるこ
とを特徴とする電子線絞り板。 In an electron beam aperture plate consisting of a metal foil section with several micro holes and a reinforcing thin plate section for preventing the metal foil from deflecting, or an outer skin frame into which the metal foil can be inserted and fixed, the metal foil section and the reinforcing thin plate section are used. An electron beam diaphragm plate characterized in that it has an integral structure with no boundaries in terms of structure or metallography.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8506489U JPH0326045U (en) | 1989-07-21 | 1989-07-21 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8506489U JPH0326045U (en) | 1989-07-21 | 1989-07-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0326045U true JPH0326045U (en) | 1991-03-18 |
Family
ID=31633965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8506489U Pending JPH0326045U (en) | 1989-07-21 | 1989-07-21 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0326045U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011243540A (en) * | 2010-05-21 | 2011-12-01 | Hitachi High-Technologies Corp | Selected area aperture plate of transmission electron microscope, manufacturing method of selected area aperture plate, and observing method of selected area electron diffraction image |
JP2012252967A (en) * | 2011-06-07 | 2012-12-20 | Nippon Steel & Sumitomo Metal | Drawing plate for electron microscope and manufacturing method thereof |
-
1989
- 1989-07-21 JP JP8506489U patent/JPH0326045U/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011243540A (en) * | 2010-05-21 | 2011-12-01 | Hitachi High-Technologies Corp | Selected area aperture plate of transmission electron microscope, manufacturing method of selected area aperture plate, and observing method of selected area electron diffraction image |
JP2012252967A (en) * | 2011-06-07 | 2012-12-20 | Nippon Steel & Sumitomo Metal | Drawing plate for electron microscope and manufacturing method thereof |