JPH0325558U - - Google Patents
Info
- Publication number
- JPH0325558U JPH0325558U JP8701389U JP8701389U JPH0325558U JP H0325558 U JPH0325558 U JP H0325558U JP 8701389 U JP8701389 U JP 8701389U JP 8701389 U JP8701389 U JP 8701389U JP H0325558 U JPH0325558 U JP H0325558U
- Authority
- JP
- Japan
- Prior art keywords
- main body
- accommodation holes
- multiple accommodation
- thin film
- flat plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000004308 accommodation Effects 0.000 claims description 3
- 239000008188 pellet Substances 0.000 claims description 2
- 238000004544 sputter deposition Methods 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8701389U JPH0325558U (me) | 1989-07-25 | 1989-07-25 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8701389U JPH0325558U (me) | 1989-07-25 | 1989-07-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0325558U true JPH0325558U (me) | 1991-03-15 |
Family
ID=31636667
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8701389U Pending JPH0325558U (me) | 1989-07-25 | 1989-07-25 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0325558U (me) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6442576A (en) * | 1987-08-10 | 1989-02-14 | Fujitsu Ltd | Composite sputtering target |
-
1989
- 1989-07-25 JP JP8701389U patent/JPH0325558U/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6442576A (en) * | 1987-08-10 | 1989-02-14 | Fujitsu Ltd | Composite sputtering target |
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