JPH03250649A - Multi-layer organic film circuit board - Google Patents

Multi-layer organic film circuit board

Info

Publication number
JPH03250649A
JPH03250649A JP2045537A JP4553790A JPH03250649A JP H03250649 A JPH03250649 A JP H03250649A JP 2045537 A JP2045537 A JP 2045537A JP 4553790 A JP4553790 A JP 4553790A JP H03250649 A JPH03250649 A JP H03250649A
Authority
JP
Japan
Prior art keywords
organic film
dielectric constant
circuit board
conductive paste
film circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2045537A
Other languages
Japanese (ja)
Inventor
Koji Matsui
孝二 松井
Hideo Takamizawa
秀男 高見沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP2045537A priority Critical patent/JPH03250649A/en
Publication of JPH03250649A publication Critical patent/JPH03250649A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item

Abstract

PURPOSE:To package LSI directly, maintaining the degree of integration, enable the layout of miniaturized multi-layer interconnections as well, and reduce delay time of propagation of electric signals, such as in computers by using an organic film having a specific thermal deformation temperature and dielectric constant between conductors. CONSTITUTION:An organic film 1 is prepared, which is provided with a low dielectric constant of 3.3 and below and a thermal resistance at a thermal deformation temperature of 150 deg.C or higher. A via hole 2 is bored in the film 1. A wiring pattern is further printed with conductive paste. The films are formed into structure laminated with a several layers. Polytetrafluoretylene, polyimide, and polysulfone are applicable as an organic film with a low dielectric constant. The thickness of the films ranges from 10 to 300mum. Preferably, the thickness ranging from 30 to 100mum is proper. It is also possible to use Pt, Au-Pt, Au-Pd-Pt, Ag-Pd, Au-Pd, Pd, Au, Ag-Au, Ag, Cu, Ni, and Cr which constitute the main components as the conductive paste.

Description

【発明の詳細な説明】 [産業上の利用分野1 本発明は、集積度の高いLSI実装用基板に関し、特に
、直接LSIを実装でき、微細多層配線か可能な多層有
機フィルム回路基板に関するものである。
[Detailed Description of the Invention] [Industrial Application Field 1] The present invention relates to a highly integrated LSI mounting board, and particularly to a multilayer organic film circuit board on which an LSI can be directly mounted and capable of fine multilayer wiring. be.

[従来の技術およびその課題] 従来、集積度の高いLSIの実装用基板としては、直接
LSIを実装でき、かつ微細多層配線が可能な多層セラ
ミック基板が用いられていた。
[Prior Art and its Problems] Conventionally, multilayer ceramic substrates have been used as mounting substrates for highly integrated LSIs, on which LSIs can be directly mounted and fine multilayer wiring is possible.

しかしながら、上述した従来の多層セラミック基板は、
誘電率(AST)l 0150の測定方法において、1
06H2の周波数での値〉か7〜8程度なので、LSI
を実装し、コンピュータ等に組み込んだ場合、高速演緯
時の遅延時間か長くなるという欠点かある。即ち、多層
回路基板を含めた導体内の電気信号伝播速度(V)は次
式で示される。
However, the above-mentioned conventional multilayer ceramic substrate
In the method for measuring dielectric constant (AST) l 0150, 1
The value at the frequency of 06H2> is about 7 to 8, so the LSI
When implemented and incorporated into a computer, etc., there is a drawback that the delay time during high-speed latitude operation becomes long. That is, the electric signal propagation velocity (V) within a conductor including a multilayer circuit board is expressed by the following equation.

(ただし、C:光速、ε:誘電率、に:定数)すなわち
誘電率(ε)が小さいほど、電気信号伝播速度(V)が
速くなり、高速演算が実現できる。また、多層セラミッ
ク基板は、厚みが厚く、重量も重いので、扱い難く、か
つ耐衝撃性に弱く、破損しやすいという欠点がある。
(where C: speed of light, ε: dielectric constant, and N: constant) That is, the smaller the dielectric constant (ε), the faster the electric signal propagation speed (V) becomes, and high-speed calculation can be realized. Furthermore, multilayer ceramic substrates are thick and heavy, making them difficult to handle, and having low impact resistance and being easily damaged.

本発明は、以上述べたような従来の事情に対処してなさ
れたもので、電気信号伝播の遅延時間が短く、かつ軽重
量で取り扱いの容易な多層回路基板を提供することを目
的とする。
The present invention has been made in response to the conventional circumstances as described above, and an object of the present invention is to provide a multilayer circuit board that has a short delay time in electrical signal propagation, is light in weight, and is easy to handle.

[課題を解決するための手段] 本発明は、誘電率3.5以下、熱変形温度150 ’C
以上の物質からなる有機フィルム層を介して複数の導体
層を積層したことを特徴とする多層有機フィルム回路基
板である。
[Means for Solving the Problems] The present invention has a dielectric constant of 3.5 or less and a heat distortion temperature of 150'C.
This is a multilayer organic film circuit board characterized in that a plurality of conductor layers are laminated via organic film layers made of the above substances.

[作用] 高集積度LSIの基板への実装では、LSIヘアチップ
を基板上に直接搭載するCOB (Chapon Bo
ard)技術か採用されている。ベアチップと基板との
接続には、ワイヤボンディング法等が必要となってくる
。ワイヤボンディング法では、チップと基板を金等のワ
イヤーを介して、熱と荷重で圧着接続される。従って、
これらの接続時には、熱が伴うため、部材には耐熱性が
要求される。通常の熱および超音波併用ホンディングの
条件下では、熱変形温度が150℃以上のフィルムであ
れば使用上支障はきたさない。
[Function] When mounting a highly integrated LSI on a board, COB (Chapon Bo), in which the LSI hair chip is directly mounted on the board, is used.
ard) technology has been adopted. A wire bonding method or the like is required to connect the bare chip and the substrate. In the wire bonding method, a chip and a substrate are crimped and connected via a wire made of gold or the like using heat and load. Therefore,
Since heat is generated when these connections are made, the members are required to have heat resistance. Under normal thermal and ultrasonic honding conditions, any film with a heat deformation temperature of 150° C. or higher will not pose any problem in use.

なあ、この熱変形温度は、ASTM D648の測定方
法において、18.6 Kgf/cm2の荷重での値を
用いるものとする。
For this heat distortion temperature, the value at a load of 18.6 Kgf/cm2 is used in the measurement method of ASTM D648.

また、多層回路基板の誘電率か3.5以下であれば、電
気信号伝播の遅延時間を実用上支障かない程度に短くす
ることができる。
Further, if the dielectric constant of the multilayer circuit board is 3.5 or less, the delay time of electrical signal propagation can be shortened to a level that does not cause any practical problems.

本発明においては、上記のような熱変形温度と誘電率を
有する有機フィルムを導体層間に用いているので、上述
した機能を有する以外に、厚みを薄くすることができ、
しかも軽重量で取り扱いか容易になる。
In the present invention, since an organic film having the above-mentioned heat distortion temperature and dielectric constant is used between the conductor layers, in addition to having the above-mentioned functions, the thickness can be reduced.
Moreover, it is light in weight and easy to handle.

このような誘電率3.5以下、かつ熱変形温度150℃
以上の条件を満足する低誘電率有機フィルムとしては、
例えば、ポリテトラフルオロエチレン、ポリイミド系、
ポリスルホン、ポリエーテルスルホン、ビスマレイミド
トリアジン等が挙げられる。
Such a dielectric constant of 3.5 or less and a heat distortion temperature of 150℃
As a low dielectric constant organic film that satisfies the above conditions,
For example, polytetrafluoroethylene, polyimide,
Examples include polysulfone, polyethersulfone, bismaleimidotriazine, and the like.

[実施例] 次に、本発明の実施例について図面を参照して説明する
[Example] Next, an example of the present invention will be described with reference to the drawings.

第1図は、本発明の一実施例の構成図である。FIG. 1 is a configuration diagram of an embodiment of the present invention.

第2図は、これらの構成部材を積層した多層有機フィル
ム回路基板実装の一例を示す。両図に示すように、本発
明の多層回路基板は、3.5以下の低誘電率で、かつ熱
変形温度か150 ’C以上の耐熱性を有する有機フィ
ルム1を作成し、このフィルム1上にバイアホール2を
おけ、さらに導電性ベスト3にて配線パターンを印すリ
し、それらを複数層積層した構成となっている。低誘電
率有機フィルムとしては、ポリテトラフルオロエチレン
、ポリイミド系、ポリスルホン、ポリエーテルスルホン
、ビスマレイミドトリアジン等を用いることかできる。
FIG. 2 shows an example of mounting a multilayer organic film circuit board in which these constituent members are laminated. As shown in both figures, in the multilayer circuit board of the present invention, an organic film 1 having a low dielectric constant of 3.5 or less and a heat resistance of 150' C or more at a heat distortion temperature is prepared, and the organic film 1 is coated on this film 1. A via hole 2 is placed in the top, a wiring pattern is further marked with a conductive vest 3, and a plurality of layers are laminated. As the low dielectric constant organic film, polytetrafluoroethylene, polyimide, polysulfone, polyethersulfone, bismaleimide triazine, etc. can be used.

フィルムの厚みとしては、10〜300柳、好ましくは
30〜100珈が適切な厚みである。バイアホールは、
パンチ、ドリル等にて容易にあけることができる。
The appropriate thickness of the film is 10 to 300 mm, preferably 30 to 100 mm. The via hole is
It can be easily opened with a punch, drill, etc.

導電性ペーストとしては、Pt、 Au−1)t。As the conductive paste, Pt, Au-1)t.

Au−Pd−Pt、Ag−Pd、Au−Pd。Au-Pd-Pt, Ag-Pd, Au-Pd.

Pd、AU、Ag−Au、Act、Cu、N 1゜Cr
等を主成分としたものを用いることができる。
Pd, AU, Ag-Au, Act, Cu, N 1゜Cr
It is possible to use a material containing etc. as the main component.

この多層有機フィルム回路基板上に、第2図に示すよう
に、LSIヘアチップ4を搭載し、ワイヤ5を介して基
板と接続させる。
As shown in FIG. 2, an LSI hair chip 4 is mounted on this multilayer organic film circuit board and connected to the board via wires 5.

本実施例においては、基板へのワイヤホンディングを何
ら支障なく行うことができ、かつ高速演算時の遅延速度
が短くなると共に、有機フィルムを用いているので軽重
量でコンパクトな回路基板か得られる。
In this example, wire bonding to the board can be performed without any problems, the delay speed during high-speed calculation is shortened, and since an organic film is used, a light weight and compact circuit board can be obtained. .

[発明の効果] 以上説明したように、本発明の多層回路基板は、集積度
を保持したまま直接LSIの実装かでき、微細多層配線
も可能となると同時に、コンピュタ等の電気信号伝播の
遅延時間を短くてきる効果がある。
[Effects of the Invention] As explained above, the multilayer circuit board of the present invention allows LSI to be directly mounted while maintaining the degree of integration, enables fine multilayer wiring, and at the same time reduces the delay time of electrical signal propagation in computers, etc. This has the effect of making it shorter.

また、有機薄型フィルムを積層しているので、厚みも薄
く、重量も軽くなり、回路基板をコンパクトにてきると
いう効果もある。
Additionally, since organic thin films are laminated, it is thinner and lighter in weight, which also has the effect of making the circuit board more compact.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例の構成図、第2図は第1図実
施例の多層有機フィルム回路基板実装の。 −例でおる。 1・・・有機フィルム 2・・・バイアホール 3・・・導電性ペ スト 4・・・ヘアチップ 5・・・ワイヤ
FIG. 1 is a block diagram of an embodiment of the present invention, and FIG. 2 is a diagram showing the mounting of the multilayer organic film circuit board of the embodiment of FIG. -I'll give you an example. 1... Organic film 2... Via hole 3... Conductive paste 4... Hair chip 5... Wire

Claims (1)

【特許請求の範囲】[Claims] (1)誘電率3.5以下,熱変形温度150℃以上の物
質からなる有機フィルム層を介して複数の導体層を積層
したことを特徴とする多層有機フィルム回路基板。
(1) A multilayer organic film circuit board characterized in that a plurality of conductor layers are laminated via an organic film layer made of a substance having a dielectric constant of 3.5 or less and a heat distortion temperature of 150° C. or more.
JP2045537A 1990-02-28 1990-02-28 Multi-layer organic film circuit board Pending JPH03250649A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2045537A JPH03250649A (en) 1990-02-28 1990-02-28 Multi-layer organic film circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2045537A JPH03250649A (en) 1990-02-28 1990-02-28 Multi-layer organic film circuit board

Publications (1)

Publication Number Publication Date
JPH03250649A true JPH03250649A (en) 1991-11-08

Family

ID=12722131

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2045537A Pending JPH03250649A (en) 1990-02-28 1990-02-28 Multi-layer organic film circuit board

Country Status (1)

Country Link
JP (1) JPH03250649A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5969426A (en) * 1994-12-14 1999-10-19 Mitsubishi Denki Kabushiki Kaisha Substrateless resin encapsulated semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5969426A (en) * 1994-12-14 1999-10-19 Mitsubishi Denki Kabushiki Kaisha Substrateless resin encapsulated semiconductor device
US6071755A (en) * 1994-12-14 2000-06-06 Mitsubushi Denki Kabushiki Kaisha Method of manufacturing semiconductor device

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