JPH03237462A - Jet washing device - Google Patents
Jet washing deviceInfo
- Publication number
- JPH03237462A JPH03237462A JP2033565A JP3356590A JPH03237462A JP H03237462 A JPH03237462 A JP H03237462A JP 2033565 A JP2033565 A JP 2033565A JP 3356590 A JP3356590 A JP 3356590A JP H03237462 A JPH03237462 A JP H03237462A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- washed
- jet
- washing solution
- cleaned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005406 washing Methods 0.000 title abstract description 10
- 239000007788 liquid Substances 0.000 claims abstract description 20
- 238000004140 cleaning Methods 0.000 claims description 57
- 238000002347 injection Methods 0.000 claims description 14
- 239000007924 injection Substances 0.000 claims description 14
- 239000002904 solvent Substances 0.000 abstract description 12
- 239000000428 dust Substances 0.000 abstract description 9
- 239000000758 substrate Substances 0.000 description 16
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 108091008695 photoreceptors Proteins 0.000 description 10
- 230000007547 defect Effects 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 5
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 4
- 238000004506 ultrasonic cleaning Methods 0.000 description 4
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000013020 steam cleaning Methods 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 230000001154 acute effect Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 241000519995 Stachys sylvatica Species 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000011538 cleaning material Substances 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 150000007857 hydrazones Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- BUYMVQAILCEWRR-UHFFFAOYSA-N naled Chemical compound COP(=O)(OC)OC(Br)C(Cl)(Cl)Br BUYMVQAILCEWRR-UHFFFAOYSA-N 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
Landscapes
- Photoreceptors In Electrophotography (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Nozzles (AREA)
Abstract
Description
【発明の詳細な説明】
（ａｌ産業上の利用分野
この発明は、噴射口より洗浄液を噴射して洗浄物を洗浄
するジェット洗浄装置に関する。DETAILED DESCRIPTION OF THE INVENTION (Al Industrial Field of Application) The present invention relates to a jet cleaning device that sprays a cleaning liquid from an injection port to clean an object to be cleaned.
（ｂ）従来の技術
例えば、毒子写真感光体は、円筒状のアルミを鏡面加工
する等して作製された円筒状基体の表面に感光液を塗布
して感光膜を形成する。この場合、加工中に円筒状基体
の表面に油分、ダスト等が付着するので、次の塗工に送
る前に洗浄を行う。(b) Prior Art For example, in the case of a photoreceptor, a photosensitive film is formed by coating a photosensitive liquid on the surface of a cylindrical substrate prepared by mirror-finishing cylindrical aluminum. In this case, since oil, dust, etc. adhere to the surface of the cylindrical substrate during processing, cleaning is performed before sending it to the next coating.
洗浄方法には超音波洗浄、蒸気洗浄、浸漬洗浄、ジェン
ト洗浄等があり、感光体の基体では、超音波洗浄をした
のち冷却し、蒸気洗浄を行い乾燥する等、いくつかの洗
浄方法を組合わせて行っていた。Cleaning methods include ultrasonic cleaning, steam cleaning, immersion cleaning, and gent cleaning.For photoconductor substrates, several cleaning methods are used, such as ultrasonic cleaning, cooling, steam cleaning, and drying. We went together.
（Ｃ）発明が解決しようとする課題
しかしながら、以上のような洗浄方法では、油分やダス
トが強固に付着した場合に完全に除去することができな
いという問題があった。(C) Problems to be Solved by the Invention However, with the above-described cleaning method, there is a problem in that oil and dust cannot be completely removed when they are firmly attached.
一般に、加工による汚れは、加工後すぐ洗浄する場合は
容易に除去できるのだが、加工後長期間放置した場合は
油分やダストがこびり付いてしまい取り除き難くなって
しまうのである。Generally, stains from processing can be easily removed if washed immediately after processing, but if left for a long time after processing, oil and dust become stuck and become difficult to remove.
感光体の円筒状基体の表面に付着した油分、ダスト等の
洗浄が不十分であると、塗布の際にハジキが発生し塗布
欠陥を生じる。このような感光体上の欠陥は、塗布欠陥
に止まらず、コピー画像上に黒ポチ、白ポチとなって画
像品質に悪影響を及ぼし、感光体として実用に通さない
。If cleaning of oil, dust, etc. adhering to the surface of the cylindrical substrate of the photoreceptor is insufficient, repelling occurs during coating, resulting in coating defects. Such defects on the photoreceptor are not limited to coating defects, but also cause black spots and white spots on the copied image, adversely affecting image quality and making the photoreceptor impractical.
超音波洗浄では、強固な汚れを取り除くために、長時間
洗浄を行うと、超音波によりキャビチーシランが発生し
て基体表面を破壊する。これにより基体表面には不均一
な凹凸ができ、キャビチーシランの弱い部分は洗浄が不
十分となり、−本の円筒状基体の上に洗浄ムラが発生す
る。洗浄ムラは、上述同様に画像欠陥の原因となり問題
となっていた。In ultrasonic cleaning, if cleaning is performed for a long time in order to remove stubborn dirt, cavity silane is generated by the ultrasonic waves and destroys the substrate surface. As a result, non-uniform unevenness is formed on the surface of the substrate, and areas where the cavity silane is weak are insufficiently cleaned, resulting in uneven cleaning on the cylindrical substrate. As mentioned above, uneven cleaning causes image defects and has become a problem.
そこでこの発明の目的は、洗浄物に強固に付着した油分
、ダストなどを完全に除去することのできるシェド洗浄
装置を提供することにある。SUMMARY OF THE INVENTION Therefore, it is an object of the present invention to provide a shed cleaning device that can completely remove oil, dust, etc. that are firmly attached to items to be cleaned.
（ｄ）課題を解決するための手段
この発明では、噴射口を洗浄物に対向させて配置し、前
記噴射口から前記洗浄物へ噴射させる洗浄液により前記
洗浄物を洗浄するジェット洗浄装置において、前記噴射
口を連続する溝形状としたことを特徴とする。(d) Means for Solving the Problems The present invention provides a jet cleaning device in which a jetting port is disposed to face an object to be washed, and the object to be washed is cleaned with a cleaning liquid sprayed from the jetting port toward the object to be washed. It is characterized in that the injection port has a continuous groove shape.
（ｅ）作用
この発明に係るジェット洗浄装置では、洗浄液の噴射口
を連続した溝としたので、高圧で噴射する洗浄液が洗浄
物の表面に連続線状に噴射され、直接噴射されない箇所
がない。従って、洗浄物と噴射口を相対的に移動させる
さとにより、洗浄物のどの点へも洗浄液が高圧で噴射さ
れて、洗浄液の洗浄力（例えば溶剤なら溶解力）と噴射
の圧力により、強固にこびりついた油分、ダスト等の汚
れを短時間で完全に除去することができる。(e) Function In the jet cleaning device according to the present invention, since the cleaning liquid injection port is a continuous groove, the cleaning liquid jetted at high pressure is sprayed in a continuous line onto the surface of the object to be cleaned, and there is no place where it is not directly sprayed. Therefore, by relatively moving the object to be cleaned and the injection port, the cleaning liquid is sprayed at high pressure to any point on the object to be cleaned, and the cleaning power of the cleaning liquid (for example, the dissolving power in the case of a solvent) and the pressure of the injection make it firmly Stains such as oil and dust can be completely removed in a short time.
（「）実施例
第２図は、本発明の実施例であるジェット洗浄装置を適
用したジェット洗浄槽ユニットの概略構成図である。('') Embodiment FIG. 2 is a schematic diagram of a jet cleaning tank unit to which a jet cleaning device according to an embodiment of the present invention is applied.
本実施例のジェット洗浄装置の噴射溝は、洗浄物である
感光体の円筒状基体に合わせて、連続した噴射溝を内側
向きの環状にしたものを用いた。The jet cleaning device of this example had a continuous jet groove formed into an inwardly annular shape to match the cylindrical base of the photoreceptor to be cleaned.
洗浄槽４０の内部にジェット洗浄装置１０が固定されて
いる。感光体の円筒状基体２０は、その下方より図示せ
ぬ押上装置によりジェット洗浄装置１０の環状のノズル
本体１２の中央を上下する、洗浄槽４０の底面は中央に
向けて傾斜しており、はぼ中央にはドレン用バルブ４１
が設けられ、中央部と壁の間に液回収パイプ４７が配管
され、液回収ポンプ４５とフィルタ４６が設けられてい
る。ジェット洗浄装置１０はノズル本体１２にスリット
状ノズル】１ （本実施例に溝形状の噴射口）が形成さ
れており、スリット状ノズルには溶剤（本実施例の洗浄
液）を補給する液供給バイブＩ３が２箇所に連結されて
いる。液供給バイブＩ３は、溶剤３５を収容する液供給
タンク３０に繋がっていて、その途中にフィルタ３１、
高圧ポンプ３２、圧力計３３が設けられている。A jet cleaning device 10 is fixed inside the cleaning tank 40. The cylindrical base 20 of the photoreceptor is moved up and down the center of the annular nozzle body 12 of the jet cleaning device 10 from below by a push-up device (not shown).The bottom surface of the cleaning tank 40 is inclined toward the center. In the center is the drain valve 41
A liquid recovery pipe 47 is installed between the center portion and the wall, and a liquid recovery pump 45 and a filter 46 are provided. The jet cleaning device 10 has a nozzle body 12 formed with a slit-shaped nozzle 1 (a groove-shaped injection port in this embodiment), and a liquid supply vibrator for replenishing the solvent (cleaning liquid in this embodiment) to the slit-shaped nozzle. I3 is connected in two places. The liquid supply vibrator I3 is connected to a liquid supply tank 30 containing a solvent 35, and a filter 31,
A high pressure pump 32 and a pressure gauge 33 are provided.
液供給タンク３０の溶剤３５はフィルタ３１を通り、高
圧ポンプ３２により高圧をかけられてスリット状ノズル
ＩＩより噴出する。スリット状ノズル１１は洗浄される
円筒状基体の表面に対し直角ではなくやや下向きになっ
ているので、こびりついている汚れを物理的に剥がすよ
うに当たる。The solvent 35 in the liquid supply tank 30 passes through the filter 31, is subjected to high pressure by the high-pressure pump 32, and is ejected from the slit-shaped nozzle II. Since the slit-shaped nozzle 11 is not perpendicular to the surface of the cylindrical substrate to be cleaned but is oriented slightly downward, it hits the surface of the cylindrical substrate to physically peel off the stuck dirt.
円筒状基体２０は押上装置により噴出する溶剤３５の中
を数回上下移動し、最終的に円筒状基体２０の最下端で
洗浄を終了する。The cylindrical base 20 moves up and down several times in the solvent 35 spouted by the push-up device, and finally the cleaning ends at the lowest end of the cylindrical base 20.
第１図は、同ジェット洗浄装置のスリット状ノズルの図
であり、同図（Ａ）は拡大断面図であり、同図（Ｂ）は
外観斜視図である。FIG. 1 is a diagram of a slit-shaped nozzle of the jet cleaning apparatus, FIG. 1(A) is an enlarged sectional view, and FIG. 1(B) is an external perspective view.
同図（Ａ）、（Ｂ）のように、ノズル本体１２は環状と
なっており、その内径側に、全周に渡って溝状の噴射口
であるスリット状ノズル１１が形成されでいる。このス
リット状ノズル１１に溶剤を供給するためにノズル本体
１２に液供給バイブ１３が連結されている。スリンＨｆ
ノズル１１は噴射する溶剤が洗浄物に対し鋭角に噴射す
るように、水平より下向き４５°に構成されている。As shown in Figures (A) and (B), the nozzle body 12 is annular, and a slit-shaped nozzle 11, which is a groove-shaped injection port, is formed on the inner diameter side of the nozzle body 12 over the entire circumference. A liquid supply vibrator 13 is connected to the nozzle body 12 in order to supply the solvent to the slit-shaped nozzle 11. Surin Hf
The nozzle 11 is configured to be angled downward at 45 degrees from the horizontal so that the solvent is sprayed at an acute angle to the object to be cleaned.
第３図は、同ジェット洗浄装置を使用した場合の感光体
の円筒状基体の洗浄工程を示したものである。FIG. 3 shows the process of cleaning the cylindrical substrate of the photoreceptor using the same jet cleaning device.
第１の工程では同ジェット洗浄装置を用いて、溶剤１．
１．１ １−リクロルエタンを４０ｋｇ／ｃｄの高圧で
で３０秒間洗浄し、その間円筒状基体を上下４回移動す
る。次に第２の工程では６０″Ｃの溶剤１．１．１ １
−リクロルエタンの中へ３０秒間の温浴、第３の工程で
は２０’Ｃの 溶剤１．１．１ トリクロルエタンの
中で３０秒間の冷浴を行い、第４の工程では溶剤１．１
．１ ）ジクロルエタンの蒸気の中で３０秒間蒸気洗
浄を行い、その後筒５の工程で自然冷却をして洗浄工程
を終了する。In the first step, using the same jet cleaning device, solvent 1.
1.1 Wash 1-lichloroethane at a high pressure of 40 kg/cd for 30 seconds, during which time the cylindrical substrate is moved up and down four times. Next, in the second step, 60″C solvent 1.1.1 1
- 30 s hot bath in trichloroethane, third step at 20'C Solvent 1.1.1 30 s cold bath in trichloroethane, fourth step Solvent 1.1
．． 1) Steam cleaning is performed for 30 seconds in dichloroethane vapor, and then natural cooling is performed in the process of cylinder 5 to complete the cleaning process.
本実施例では、感光体の円筒状基体を加工後の放置時間
１日、１週間、１か月のものを、それぞれ上述のような
ジエン）洗浄を含む洗浄工程により洗浄した。In this example, the cylindrical photoreceptor substrates were left for 1 day, 1 week, and 1 month after processing and were cleaned by the cleaning process including diene cleaning as described above.
洗浄を終了した円筒状基体には、ジブロムアンスアンス
ロン２重量部、ブチラール樹脂（セキスイ化学製、エス
レンクＢＭ−２）２重量部、シクロへキサフッ２３０重
量部を調合しボールミルで８時間分散して調整された感
光液の中で、乾燥膜厚０．５μｍとなるように浸漬塗布
を施し、８゜°Ｃで３０分間乾燥して電荷発生層を形成
した。After washing, 2 parts by weight of dibrom anthurone, 2 parts by weight of butyral resin (Sekisui Chemical Co., Ltd., Eslenc BM-2), and 230 parts by weight of cyclohexafluorocarbon were mixed into the cylindrical substrate after washing, and dispersed in a ball mill for 8 hours. Dip coating was performed in the prepared photosensitive solution so that the dry film thickness was 0.5 μm, and dried at 8° C. for 30 minutes to form a charge generation layer.
次に、ヒドラゾン系電荷輸送材（亜南香料製、１’ＡＦ
３ ＰＩ（、） １重星部、ポリカーボネイト樹脂（
奇人化成製、パンライ）−１２５０）１重量部をジクロ
ルエタン８重量部に溶解して調整した感光液を、上述の
電荷発生層の上に、乾燥膜厚Ｉ５μｍとなるように塗布
を施し７０″Ｃで１時間乾燥し電荷輸送層を形成したの
ち、さらに加工し完成品とした。Next, a hydrazone-based charge transport material (manufactured by Anan Co., Ltd., 1'AF
3 PI (,) single star part, polycarbonate resin (
A photosensitive liquid prepared by dissolving 1 part by weight of Panrai)-1250) (manufactured by Kijin Kasei Co., Ltd.) in 8 parts by weight of dichloroethane was applied onto the above-mentioned charge generation layer to give a dry film thickness of I5 μm, and was heated at 70″C. After drying for 1 hour to form a charge transport layer, it was further processed into a finished product.
以上のように製造された感光体について、塗工ハジキお
よび画像欠陥についての評価を次に示す。なお比較した
従来例でも、円筒状基体を加工後の放置時間１日、１週
間、１か月のものを用い、洗浄方法としては６０°Ｃの
１．１．１ トリクロルエタンの温浴の中で３０秒間
超音波洗浄を行い、３０秒間の２０°Ｃの１．１．Ｉ
トリクロルエタンの冷浴、３０秒間の１．１．１
）ジクロルエタンの葎気洗浄の後自然冷却により行った
。次に本実施例の場合と同様の感光液により同様の方法
で感光膜を形成した。Evaluations regarding coating repellency and image defects regarding the photoreceptor manufactured as described above are shown below. In the conventional examples compared, cylindrical substrates were left for 1 day, 1 week, and 1 month after processing, and the cleaning method was in a warm bath of 1.1.1 trichloroethane at 60°C. 1.1. Ultrasonic cleaning for 30 seconds and 20°C for 30 seconds. I
Cold bath of trichloroethane, 1.1.1 for 30 seconds
) It was carried out by natural cooling after washing with dichloroethane. Next, a photoresist film was formed using the same photoresist solution and in the same manner as in this example.
上記の評価結果により明らかなように、円筒状基体の加
工後の放置期間が少ない場合は、塗工ハジキ、画像欠陥
ともに発生しない。また、放置期間が長い場合も発生し
ているものの、その率の減少が顕著であり、本実施例の
ジェット洗浄装置を用いての洗浄によれば、強固にこび
りついた汚れを除去することができることが判明した。As is clear from the above evaluation results, when the cylindrical substrate is left for a short period of time after processing, neither coating repellency nor image defects occur. Additionally, although some cases occur when left unused for a long time, the reduction in this rate is remarkable, indicating that cleaning using the jet cleaning device of this example makes it possible to remove stubborn stains. There was found.
本実施例では、ジェット洗浄槽において、ジェット洗浄
装置を固定し洗浄物を移動したが、逆にして洗浄物を固
定しジェット洗浄装置を移動してもよい、噴射圧力は、
４０ｋｇ／ｃ１！としたが、３０〜１２０ ｋｇ／ｄの
間であれば、同様の効果を奏することができる。噴射角
度ば、本実施例の場合は４５°であるが、洗浄物に対し
鋭角に噴射されるようにすれば汚れを物理的に剥がす力
もかかる。In this example, in the jet cleaning tank, the jet cleaning device was fixed and the object to be cleaned was moved.However, it is also possible to fix the object to be washed and move the jet cleaning device.The injection pressure is as follows.
40kg/c1! However, a similar effect can be achieved if the velocity is between 30 and 120 kg/d. The spray angle is 45° in this embodiment, but if the spray is made at an acute angle to the object to be cleaned, a force will be applied to physically remove the dirt.
また、洗浄工程は本実施例の工程順に限られるものでは
ない。さらに、本実施例では噴射口は連続する溝が環状
になって、その中心を洗浄物が通過するのであるが、連
続する噴射溝は環状である必要はなく、例えば、シート
状の感光体に対しては連続した線状の噴射溝にすればよ
い。Furthermore, the cleaning steps are not limited to the order of steps in this embodiment. Furthermore, in this embodiment, the jetting nozzle has continuous grooves forming an annular shape, through which the cleaning material passes through the center, but the continuous jetting grooves do not have to be annular. In contrast, continuous linear injection grooves may be used.
（Ｏ発明の効果
以上のように、この発明によれば、ジェット洗浄装置の
洗浄液の噴射口を連続した溝としたので、高圧で噴射す
る洗浄液が洗浄物に連続状に噴射され、洗浄液の洗浄力
と噴射の圧力により、強固にこびりついた油分、ダスト
等の汚れを短時間で完全に除去する。したがって、この
ジェット洗浄装置により洗浄した基体に塗布を施すこと
により塗工欠陥の発生を大幅に減少することができ、感
光体の場合は、塗工欠陥による黒ポチ、自ボチなどの画
像欠陥の発生を防止することができた。(O Effects of the Invention As described above, according to this invention, the jet cleaning device has a cleaning liquid injection port that is a continuous groove, so that the cleaning liquid sprayed at high pressure is continuously sprayed onto the object to be cleaned. The force and jet pressure completely removes stubborn dirt such as oil and dust in a short time.Therefore, by applying the coating to the substrate cleaned by this jet cleaning device, the occurrence of coating defects can be greatly reduced. In the case of photoreceptors, it was possible to prevent image defects such as black spots and dead spots due to coating defects from occurring.
第１図は、この発明の実施例であるジェット洗浄装置の
スリット状ノズルの図であり、同図（Ａ）は拡大断面図
であり、同図（Ｂ）は外観斜視図である。第２図は、同
ジェント洗浄装置を通用したジェット洗浄槽ユニットの
概略構成図である。
第３図は、本実施例で用いた洗浄の工程図である１０−
ジェット洗浄装置、
１１−スリット状ノズル（本実施例の噴射溝）１２−ノ
ズル本体、
３５− ン容７ＦＩＩ。
出ｌ顛人FIG. 1 is a diagram of a slit-shaped nozzle of a jet cleaning device according to an embodiment of the present invention, FIG. 1(A) is an enlarged sectional view, and FIG. 1(B) is an external perspective view. FIG. 2 is a schematic diagram of a jet cleaning tank unit using the same jet cleaning device. FIG. 3 is a diagram of the cleaning process used in this example.
Jet cleaning device, 11- slit-shaped nozzle (injection groove of this embodiment) 12- nozzle body, 35- capacity 7FII. Departure person
Claims (1)
から前記洗浄物へ噴射させる洗浄液により前記洗浄物を
洗浄するジェット洗浄装置において、前記噴射口を連続
する溝形状としたことを特徴とするジェット洗浄装置。(1) In a jet cleaning device in which an injection port is arranged to face the object to be cleaned and the object to be cleaned is cleaned with a cleaning liquid sprayed from the injection port to the object to be cleaned, the injection port is formed into a continuous groove shape. Characteristic jet cleaning equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2033565A JPH03237462A (en) | 1990-02-14 | 1990-02-14 | Jet washing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2033565A JPH03237462A (en) | 1990-02-14 | 1990-02-14 | Jet washing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03237462A true JPH03237462A (en) | 1991-10-23 |
Family
ID=12390070
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2033565A Pending JPH03237462A (en) | 1990-02-14 | 1990-02-14 | Jet washing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03237462A (en) |
-
1990
- 1990-02-14 JP JP2033565A patent/JPH03237462A/en active Pending
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