JPH03229855A - Black plated steel sheet and its production - Google Patents
Black plated steel sheet and its productionInfo
- Publication number
- JPH03229855A JPH03229855A JP2227790A JP2227790A JPH03229855A JP H03229855 A JPH03229855 A JP H03229855A JP 2227790 A JP2227790 A JP 2227790A JP 2227790 A JP2227790 A JP 2227790A JP H03229855 A JPH03229855 A JP H03229855A
- Authority
- JP
- Japan
- Prior art keywords
- steel sheet
- layer
- thickness
- plated steel
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910000831 Steel Inorganic materials 0.000 title claims abstract description 22
- 239000010959 steel Substances 0.000 title claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 150000001875 compounds Chemical class 0.000 claims abstract description 17
- 239000010949 copper Substances 0.000 claims abstract description 16
- 238000007733 ion plating Methods 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims abstract description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052802 copper Inorganic materials 0.000 claims abstract description 7
- 229910000881 Cu alloy Inorganic materials 0.000 claims abstract description 5
- 239000000203 mixture Substances 0.000 claims abstract description 5
- 238000007747 plating Methods 0.000 claims abstract description 5
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 7
- 238000001771 vacuum deposition Methods 0.000 claims description 4
- 238000007738 vacuum evaporation Methods 0.000 claims description 4
- 229910017082 Fe-Si Inorganic materials 0.000 claims 1
- 229910017133 Fe—Si Inorganic materials 0.000 claims 1
- 229910018557 Si O Inorganic materials 0.000 claims 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 abstract description 5
- 229910001882 dioxygen Inorganic materials 0.000 abstract description 5
- 229910017144 Fe—Si—O Inorganic materials 0.000 abstract description 3
- 239000007789 gas Substances 0.000 abstract description 3
- 238000007740 vapor deposition Methods 0.000 abstract 3
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000002994 raw material Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Chemical class 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000007547 Knoop hardness test Methods 0.000 description 1
- 229910001327 Rimmed steel Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野コ
本発明は硬く、美しい黒色を有する黒色めっき鋼板およ
びその製造方法に関するもので、得られた黒色めっき鋼
板は、建材、家電、時計ケース、メガネフレーム、太陽
熱集熱板等の用途に利用される。[Detailed Description of the Invention] [Industrial Application Fields] The present invention relates to a black plated steel sheet that is hard and has a beautiful black color, and a method for manufacturing the same. Used for frames, solar heat collecting plates, etc.
［従来の技術］
従来、黒色めっき鋼板は、Ｔｉの酸化物、窒化物、炭化
物およびこれら複合化合物皮膜をＰＶＤにより形成して
得られている。例えば特開昭６２−２１８５５０号は、
３Ｘ１０−５〜ｌＸｌ０−２Ｔｏｒｒの酸素ガス導入下
で反応性イオンプレーティングを行って、黒色Ｔ ｉ
ＯＴ ｉ ０２皮膜を得る方法を開示している。特開昭
６２−１４６２５５号はＴｉの炭化物−窒化物複合皮膜
を、特開昭６３−１６１５５号はＴｉとＮの組成を変化
させて黒紫色のＴｉＮ皮膜を得る方法を開示している。[Prior Art] Conventionally, black-plated steel sheets have been obtained by forming films of Ti oxides, nitrides, carbides, and composite compounds thereof by PVD. For example, JP-A No. 62-218550,
Reactive ion plating was performed under oxygen gas introduction of 3X10-5 to 1X10-2 Torr, and black Ti
A method of obtaining an OT i 02 coating is disclosed. JP-A No. 62-146255 discloses a Ti carbide-nitride composite film, and JP-A No. 63-16155 discloses a method of obtaining a black-purple TiN film by changing the composition of Ti and N.
さらに特開昭６２−２１８５４９号は、Ｔｉ等のＩＶａ
、Ｖａ族元素の炭化物層、窒化物層を積層化させて黒色
高耐摩耗性の皮膜を得る方法を開示している。Furthermore, JP-A No. 62-218549 discloses that IVa of Ti etc.
discloses a method for obtaining a black highly wear-resistant coating by laminating carbide layers and nitride layers of Va group elements.
［発明が解決しようとする課題］
しかしながら、従来のＴｉ系の黒色めっき皮膜は、原料
となるＴｉが高価である。[Problems to be Solved by the Invention] However, in the conventional Ti-based black plating film, Ti, which is a raw material, is expensive.
また、Ｔｉ化合物皮膜の製造方法も制御が難しいという
問題がある。Furthermore, there is also the problem that the method for producing the Ti compound film is difficult to control.
本発明の目的とするところは、安価な原料を用いて製造
コストを低くすることができる゛とともに、制御も容易
な黒色めっき鋼板及びその製造方法を提供することにあ
る。An object of the present invention is to provide a black-plated steel sheet and a method for manufacturing the same, which can reduce manufacturing costs by using inexpensive raw materials and can be easily controlled.
［課題を解決する手段］
この目的を達成するために、本発明の黒色めっき鋼板は
、鋼板と、この鋼板の少なくとも片面に形成された厚さ
０．１〜５μｍの銅また５は銅合金層と、この層上に形
成された厚さ０．５μｍ以上のアモルファス状、マイク
ロクリスタル状またはこれらの混合状態のＦｅ−３ｉ−
０層化合物皮膜とを具備している。[Means for Solving the Problems] In order to achieve this object, the black plated steel sheet of the present invention comprises a steel sheet and a copper or copper alloy layer with a thickness of 0.1 to 5 μm formed on at least one side of the steel sheet. and amorphous, microcrystalline, or mixed Fe-3i- with a thickness of 0.5 μm or more formed on this layer.
It is equipped with a 0-layer compound film.
また本発明の黒色めっき鋼板の製造方法は、鋼板の少な
くとも片面に厚さ０．１〜５μｍの銅または銅合金層を
真空蒸着法、イオンプレーティング法、及び湿式めっき
法から選択された方法で形成する工程と、この層上に厚
さ０．５μｍ以上のアモルファス状、マイクロクリスタ
ル状、またはこれらの混合状態のＦｅ−Ｓｉ−０層化合
物皮膜を、５ Ｘ １０−’ 〜２ Ｘ １０−２Ｔｏ
ｒｒの雰囲気ガス中で、反応性真空蒸着法または反応性
イオンプレーティング法により形成する工程とを具備し
ている。Further, the method for producing a black-plated steel sheet of the present invention includes forming a copper or copper alloy layer with a thickness of 0.1 to 5 μm on at least one side of the steel sheet by a method selected from vacuum evaporation, ion plating, and wet plating. A step of forming an Fe-Si-0 layer compound film having a thickness of 0.5 μm or more in an amorphous state, a microcrystalline state, or a mixture thereof on this layer in a thickness of 5 X 10-' to 2 X 10-2To
rr atmosphere gas by a reactive vacuum evaporation method or a reactive ion plating method.
［作 用コ
本発明の黒色皮膜は、Ｃｕ層とＦｅ−Ｓｉ−０化合物皮
膜との組合わせで構成されている。その理由は、鋼板上
に設けたＣｕ層の色調と、アモルファス状もしくはマイ
クロクリスタル状のＦｅＳｉ−０化合物皮膜中に存在す
る欠陥の光吸収によって黒色が得られるためである。[Function] The black film of the present invention is composed of a combination of a Cu layer and a Fe-Si-0 compound film. The reason for this is that the black color is obtained by the color tone of the Cu layer provided on the steel plate and the light absorption of defects present in the amorphous or microcrystalline FeSi-0 compound film.
Ｃｕ層を０．１μｍ以上とした理由は、鋼板にＣｕの色
調を得るためであり、５μｍ以下としたのは、それ以上
厚くする必要はないためである。The reason why the Cu layer is set to be 0.1 μm or more is to obtain a Cu color tone to the steel plate, and the reason why the Cu layer is set to 5 μm or less is because there is no need to make it thicker than that.
Ｃｕ層の形成方法は、湿式めっき法、真空蒸着法、イオ
ンプレーティング法のいずれで成膜しても差しつかえな
い。The Cu layer may be formed by any of wet plating, vacuum evaporation, and ion plating.
Ｃｕ層の上に形成する皮膜をＦｅ−Ｓｉ−０化合物皮膜
にした理由は、Ｆｅ、ＳＬ・が原料として安価であるこ
とと、Ｓｉを原料とすることによって、皮膜のアモルフ
ァス化、マイクロクリスタル化が起りやすいためである
。Ｆｅ−Ｓｉ−０化合物皮膜の厚さを０．５μｍ以上と
した理由は、この厚さより薄いと膜中の欠陥による光吸
収が充分でないため、黒色が得られないためである。Ｆ
ｅ−Ｓｉ−０化合物皮膜の形成方法は、酸素ガス、空気
などの５ Ｘ １０−’ 〜２ Ｘ １０−２Ｔｏｒｒ
の雰囲気圧力下での反応性真空蒸着法または反応性イオ
ンプレーティング法によりおこなう。雰囲気圧力を限定
した理由は、５ Ｘ １０−’Ｔｏｒｒよりも高い真空
度では充分な黒色が得られない。また２Ｘ１０−２Ｔｏ
ｒｒよりも悪い真空では皮膜の密着性が悪くなるためで
ある。The reason why the film formed on the Cu layer is an Fe-Si-0 compound film is that Fe and SL are inexpensive as raw materials, and by using Si as a raw material, the film can become amorphous and microcrystalline. This is because it is easy to occur. The reason why the thickness of the Fe-Si-0 compound film is set to 0.5 μm or more is that if the film is thinner than this, light absorption due to defects in the film is insufficient, and a black color cannot be obtained. F
The e-Si-0 compound film is formed using oxygen gas, air, etc. at 5 x 10-' to 2 x 10-2 Torr.
This is carried out by reactive vacuum evaporation or reactive ion plating under atmospheric pressure. The reason for limiting the atmospheric pressure is that a sufficient black color cannot be obtained at a vacuum higher than 5 x 10-' Torr. Also 2X10-2To
This is because the adhesion of the film deteriorates at a vacuum worse than rr.
［実施例コ 以下、本発明の実施例を示す。[Example code] Examples of the present invention will be shown below.
溶剤脱脂したリムド鋼板をイオンプレーティング装置の
基板ホルダーに取り付け、真空室内をＩＸ １０−５Ｔ
ｏｒｒに排気し、・基板を２００℃に加熱した。その４
後、Ａｒガ各、をＩ Ｘ １０−’Ｔｏｒｒ導入し、基
板に一１０００Ｖ、、の電圧を印加して１０分間Ａ「イ
オンボンバードによる放電洗浄を行った。Attach the solvent-degreased rimmed steel plate to the substrate holder of the ion plating equipment, and place the IX 10-5T inside the vacuum chamber.
The substrate was heated to 200°C. Part 4
After that, Ar gas was introduced at I.times.10 Torr, and a voltage of -1000 V was applied to the substrate to perform discharge cleaning by ion bombardment for 10 minutes.
再びＩ Ｘ １０−’Ｔｏｒｒに排気した後、基板にＣ
ｕを０．５μｍ真空蒸着した。つぎに、酸素ガスをＩＸ
１０−’Ｔｏｒｒ導入し、ついでＦｅ−５０ｖｔ％Ｓ
ｉ合金を蒸発させて、反応性真空蒸着法によって、Ｃｕ
層上にマイクロクリスタル状のＦｅ−Ｓｉ−Ｏ化合物皮
膜を５μｍ形成した。得られた皮膜は美しい色調の黒色
を呈していた。皮膜の組成はＦｅ３５ｗｔ％、Ｓｉ５０
ｖｔ％、０Ｌ５ｖｔ％であった。ヌープ硬さ試験では１
５００ ｋｇｆ／ｍｍ ２の硬さを示した。これは反応
性イオンプレーティング法で一般的に得られるＴｉＮ膜
に匹敵する値であった。After evacuation to I x 10-'Torr again, apply C to the board.
U was vacuum-deposited to a thickness of 0.5 μm. Next, add oxygen gas to IX
10-'Torr was introduced, then Fe-50vt%S
The i-alloy is evaporated and Cu is deposited by reactive vacuum deposition.
A microcrystalline Fe-Si-O compound film with a thickness of 5 μm was formed on the layer. The resulting film had a beautiful black color. The composition of the film is Fe35wt%, Si50
vt%, 0L5vt%. 1 in Knoop hardness test
It showed a hardness of 500 kgf/mm2. This value was comparable to that of a TiN film generally obtained by reactive ion plating.
［発明の効果コ
以上の様に本発明によれば、鋼板の少なくとも片面にＣ
ｕ層をコーティングした後、５Ｘ１０４≦シ
〜２ Ｘ １０−２Ｔｏｒｒの酸素ガスまたは空気雰囲
気圧力下で反応性真空蒸着または反応性イオンプレーテ
ィングによって、アモルファス状もしくはマイクロクリ
スタル状のＦｅ−３ｉ−０層化合物皮膜を形成したので
、従来のＴｌ系化合物皮膜とは異った成分元素の皮膜か
ら成る黒色めっき鋼板を安価に得ることができる。しか
もＣｕ層やＦｅ−Ｓｉ−０層化合物皮膜の形成方法は、
制御性がよいなと顕著な効果を発揮する。[Effects of the Invention] As described above, according to the present invention, at least one side of the steel plate is coated with carbon.
After coating the U layer, an amorphous or microcrystalline Fe-3i-0 layer is deposited by reactive vacuum deposition or reactive ion plating under an oxygen gas or air atmosphere pressure of 5X104≦Si~2X10-2Torr. Since the compound film is formed, it is possible to obtain a black plated steel sheet consisting of a film of a different element from the conventional Tl-based compound film at a low cost. Moreover, the method for forming the Cu layer and Fe-Si-0 layer compound film is as follows:
It exhibits remarkable effects with good controllability.
Claims (2)
厚さ０．１〜５μｍの銅または銅合金層と、この層上に
形成された厚さ０．５μｍ以上のアモルファス状、マイ
クロクリスタル状またはこれらの混合状態のＦｅ−Ｓｉ
−Ｏ系化合物皮膜とを具備してなる黒色めっき鋼板。(1) A steel plate, a copper or copper alloy layer with a thickness of 0.1 to 5 μm formed on at least one side of the steel plate, and an amorphous or microcrystalline layer with a thickness of 0.5 μm or more formed on this layer. or a mixture of these Fe-Si
- A black plated steel sheet comprising an O-based compound film.
または銅合金層を真空蒸着法、イオンプレーティング法
、又は湿式めっき法から選択された方法で形成する工程
と、この層上に厚さ０．５μｍ以上のアモルファス状、
マイクロクリスタル状、またはこれらの混合状態のＦｅ
−Ｓｉ−Ｏ系化合物皮膜を、５×１０＾−＾４〜２×１
０＾−＾２Ｔｏｒｒの雰囲気ガス中で、反応性真空蒸着
法または反応性イオンプレーティング法により形成する
工程とを具備してなる黒色めっき鋼板の製造方法。(2) forming a copper or copper alloy layer with a thickness of 0.1 to 5 μm on at least one side of the steel plate by a method selected from vacuum evaporation, ion plating, or wet plating; Amorphous with a thickness of 0.5 μm or more,
Fe in microcrystalline or mixed state
-Si-O compound film, 5 x 10^-^4 to 2 x 1
A method for producing a black plated steel sheet, comprising a step of forming by reactive vacuum deposition or reactive ion plating in an atmospheric gas of 0^-^2 Torr.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2227790A JPH03229855A (en) | 1990-02-02 | 1990-02-02 | Black plated steel sheet and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2227790A JPH03229855A (en) | 1990-02-02 | 1990-02-02 | Black plated steel sheet and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03229855A true JPH03229855A (en) | 1991-10-11 |
Family
ID=12078267
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2227790A Pending JPH03229855A (en) | 1990-02-02 | 1990-02-02 | Black plated steel sheet and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03229855A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012204154A (en) * | 2011-03-25 | 2012-10-22 | Seiko Instruments Inc | Button type alkaline battery anode can and button type alkaline battery |
-
1990
- 1990-02-02 JP JP2227790A patent/JPH03229855A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012204154A (en) * | 2011-03-25 | 2012-10-22 | Seiko Instruments Inc | Button type alkaline battery anode can and button type alkaline battery |
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