JPH03227320A - Aromatic polyether ketone, production thereof and molded article thereof - Google Patents
Aromatic polyether ketone, production thereof and molded article thereofInfo
- Publication number
- JPH03227320A JPH03227320A JP2102390A JP2102390A JPH03227320A JP H03227320 A JPH03227320 A JP H03227320A JP 2102390 A JP2102390 A JP 2102390A JP 2102390 A JP2102390 A JP 2102390A JP H03227320 A JPH03227320 A JP H03227320A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- aromatic
- acid
- formula
- phosphorus compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 125000003118 aryl group Chemical group 0.000 title claims abstract description 39
- 229920001643 poly(ether ketone) Polymers 0.000 title claims description 37
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 26
- 239000011574 phosphorus Substances 0.000 claims abstract description 26
- -1 phosphorus compound Chemical class 0.000 claims abstract description 26
- 239000000126 substance Substances 0.000 claims abstract description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- 150000003839 salts Chemical class 0.000 claims description 7
- 230000004580 weight loss Effects 0.000 claims description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 230000002378 acidificating effect Effects 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 3
- 125000005647 linker group Chemical group 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 229920000642 polymer Polymers 0.000 abstract description 37
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 abstract description 12
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 abstract description 11
- 150000008378 aryl ethers Chemical class 0.000 abstract description 6
- 239000002841 Lewis acid Substances 0.000 abstract description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 abstract description 4
- 239000012298 atmosphere Substances 0.000 abstract description 4
- 150000007517 lewis acids Chemical class 0.000 abstract description 4
- 230000000379 polymerizing effect Effects 0.000 abstract description 4
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000835 fiber Substances 0.000 abstract description 3
- 239000011261 inert gas Substances 0.000 abstract description 3
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 abstract description 2
- 239000013585 weight reducing agent Substances 0.000 abstract description 2
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 239000011968 lewis acid catalyst Substances 0.000 abstract 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 24
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 10
- 239000000047 product Substances 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 150000003018 phosphorus compounds Chemical class 0.000 description 6
- 238000010992 reflux Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 238000001879 gelation Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000003381 stabilizer Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- BCDIWLCKOCHCIH-UHFFFAOYSA-N methylphosphinic acid Chemical compound CP(O)=O BCDIWLCKOCHCIH-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- UHJWZORSTYATLW-UHFFFAOYSA-N o-biphenylyl phenyl ether Natural products C=1C=CC=C(C=2C=CC=CC=2)C=1OC1=CC=CC=C1 UHJWZORSTYATLW-UHFFFAOYSA-N 0.000 description 2
- MLCHBQKMVKNBOV-UHFFFAOYSA-N phenylphosphinic acid Chemical compound OP(=O)C1=CC=CC=C1 MLCHBQKMVKNBOV-UHFFFAOYSA-N 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 239000004416 thermosoftening plastic Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- BWQOPMJTQPWHOZ-UHFFFAOYSA-N (2,3-difluorophenyl)-phenylmethanone Chemical compound FC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1F BWQOPMJTQPWHOZ-UHFFFAOYSA-N 0.000 description 1
- JGFKYAIDECOOEN-UHFFFAOYSA-N (2-ethylphenyl) dihydrogen phosphate Chemical compound CCC1=CC=CC=C1OP(O)(O)=O JGFKYAIDECOOEN-UHFFFAOYSA-N 0.000 description 1
- YXTSJMYYIRPSDF-UHFFFAOYSA-N (2-methylphenyl)phosphonic acid Chemical compound CC1=CC=CC=C1P(O)(O)=O YXTSJMYYIRPSDF-UHFFFAOYSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- UMTPEHAIGCMTKV-UHFFFAOYSA-N 1,4-bis(2-chlorophenoxy)benzene Chemical compound ClC1=CC=CC=C1OC(C=C1)=CC=C1OC1=CC=CC=C1Cl UMTPEHAIGCMTKV-UHFFFAOYSA-N 0.000 description 1
- CYWQTTRVWKESKY-UHFFFAOYSA-N 1,4-bis(3-methoxyphenoxy)benzene Chemical compound COC1=CC=CC(OC=2C=CC(OC=3C=C(OC)C=CC=3)=CC=2)=C1 CYWQTTRVWKESKY-UHFFFAOYSA-N 0.000 description 1
- UVGPELGZPWDPFP-UHFFFAOYSA-N 1,4-diphenoxybenzene Chemical compound C=1C=C(OC=2C=CC=CC=2)C=CC=1OC1=CC=CC=C1 UVGPELGZPWDPFP-UHFFFAOYSA-N 0.000 description 1
- GQGTXJRZSBTHOB-UHFFFAOYSA-N 1-phenoxy-4-(4-phenoxyphenoxy)benzene Chemical compound C=1C=C(OC=2C=CC(OC=3C=CC=CC=3)=CC=2)C=CC=1OC1=CC=CC=C1 GQGTXJRZSBTHOB-UHFFFAOYSA-N 0.000 description 1
- LSQARZALBDFYQZ-UHFFFAOYSA-N 4,4'-difluorobenzophenone Chemical compound C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 LSQARZALBDFYQZ-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- PZGXTRSDKJEUHR-UHFFFAOYSA-N 4-[4-(4-carbonochloridoylphenyl)phenyl]benzoyl chloride Chemical compound C1=CC(C(=O)Cl)=CC=C1C1=CC=C(C=2C=CC(=CC=2)C(Cl)=O)C=C1 PZGXTRSDKJEUHR-UHFFFAOYSA-N 0.000 description 1
- TYFJTEPDESMEHE-UHFFFAOYSA-N 6,8-dihydroxy-3-[2-(4-methoxyphenyl)ethyl]-3,4-dihydroisochromen-1-one Chemical compound C1=CC(OC)=CC=C1CCC1OC(=O)C2=C(O)C=C(O)C=C2C1 TYFJTEPDESMEHE-UHFFFAOYSA-N 0.000 description 1
- KZMGYPLQYOPHEL-UHFFFAOYSA-N Boron trifluoride etherate Chemical compound FB(F)F.CCOCC KZMGYPLQYOPHEL-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- HZCDANOFLILNSA-UHFFFAOYSA-N Dimethyl hydrogen phosphite Chemical compound COP(=O)OC HZCDANOFLILNSA-UHFFFAOYSA-N 0.000 description 1
- KKUKTXOBAWVSHC-UHFFFAOYSA-N Dimethylphosphate Chemical compound COP(O)(=O)OC KKUKTXOBAWVSHC-UHFFFAOYSA-N 0.000 description 1
- ASMQGLCHMVWBQR-UHFFFAOYSA-N Diphenyl phosphate Chemical compound C=1C=CC=CC=1OP(=O)(O)OC1=CC=CC=C1 ASMQGLCHMVWBQR-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- UEZVMMHDMIWARA-UHFFFAOYSA-N Metaphosphoric acid Chemical compound OP(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- QLZHNIAADXEJJP-UHFFFAOYSA-N Phenylphosphonic acid Chemical compound OP(O)(=O)C1=CC=CC=C1 QLZHNIAADXEJJP-UHFFFAOYSA-N 0.000 description 1
- 239000005819 Potassium phosphonate Substances 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- LLJNTLUXOZPFQB-UHFFFAOYSA-N [4-(4-fluorobenzoyl)phenyl]-(4-fluorophenyl)methanone Chemical compound C1=CC(F)=CC=C1C(=O)C1=CC=C(C(=O)C=2C=CC(F)=CC=2)C=C1 LLJNTLUXOZPFQB-UHFFFAOYSA-N 0.000 description 1
- CHZYPMDQTIFXNV-UHFFFAOYSA-M [K+].COP([O-])=O Chemical compound [K+].COP([O-])=O CHZYPMDQTIFXNV-UHFFFAOYSA-M 0.000 description 1
- SAGGARBLZUMARU-UHFFFAOYSA-N [K].C1(=CC=CC=C1)P(O)=O Chemical compound [K].C1(=CC=CC=C1)P(O)=O SAGGARBLZUMARU-UHFFFAOYSA-N 0.000 description 1
- NXOIWSPUTXWQSM-UHFFFAOYSA-N [Na].C1(=CC=CC=C1)P(O)=O Chemical compound [Na].C1(=CC=CC=C1)P(O)=O NXOIWSPUTXWQSM-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- PQLAYKMGZDUDLQ-UHFFFAOYSA-K aluminium bromide Chemical compound Br[Al](Br)Br PQLAYKMGZDUDLQ-UHFFFAOYSA-K 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- VMPVEPPRYRXYNP-UHFFFAOYSA-I antimony(5+);pentachloride Chemical compound Cl[Sb](Cl)(Cl)(Cl)Cl VMPVEPPRYRXYNP-UHFFFAOYSA-I 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- UCQFCFPECQILOL-UHFFFAOYSA-N diethyl hydrogen phosphate Chemical compound CCOP(O)(=O)OCC UCQFCFPECQILOL-UHFFFAOYSA-N 0.000 description 1
- MJUJXFBTEFXVKU-UHFFFAOYSA-N diethyl phosphonate Chemical compound CCOP(=O)OCC MJUJXFBTEFXVKU-UHFFFAOYSA-N 0.000 description 1
- KTLIMPGQZDZPSB-UHFFFAOYSA-N diethylphosphinic acid Chemical compound CCP(O)(=O)CC KTLIMPGQZDZPSB-UHFFFAOYSA-N 0.000 description 1
- GOJNABIZVJCYFL-UHFFFAOYSA-N dimethylphosphinic acid Chemical compound CP(C)(O)=O GOJNABIZVJCYFL-UHFFFAOYSA-N 0.000 description 1
- GWZCCUDJHOGOSO-UHFFFAOYSA-N diphenic acid Chemical compound OC(=O)C1=CC=CC=C1C1=CC=CC=C1C(O)=O GWZCCUDJHOGOSO-UHFFFAOYSA-N 0.000 description 1
- BEQVQKJCLJBTKZ-UHFFFAOYSA-N diphenylphosphinic acid Chemical compound C=1C=CC=CC=1P(=O)(O)C1=CC=CC=C1 BEQVQKJCLJBTKZ-UHFFFAOYSA-N 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- YXXXKCDYKKSZHL-UHFFFAOYSA-M dipotassium;dioxido(oxo)phosphanium Chemical compound [K+].[K+].[O-][P+]([O-])=O YXXXKCDYKKSZHL-UHFFFAOYSA-M 0.000 description 1
- CVFJNXQOIZKPMG-UHFFFAOYSA-L dipotassium;dioxido-oxo-phenyl-$l^{5}-phosphane Chemical compound [K+].[K+].[O-]P([O-])(=O)C1=CC=CC=C1 CVFJNXQOIZKPMG-UHFFFAOYSA-L 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- JOQAMSDLZYQHMX-UHFFFAOYSA-L disodium;dioxido-oxo-phenyl-$l^{5}-phosphane Chemical compound [Na+].[Na+].[O-]P([O-])(=O)C1=CC=CC=C1 JOQAMSDLZYQHMX-UHFFFAOYSA-L 0.000 description 1
- HBPTWDLRHFZEER-UHFFFAOYSA-L disodium;methyl-dioxido-oxo-$l^{5}-phosphane Chemical compound [Na+].[Na+].CP([O-])([O-])=O HBPTWDLRHFZEER-UHFFFAOYSA-L 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- MWQBWSPPTQGZII-UHFFFAOYSA-N ethoxy(phenyl)phosphinic acid Chemical compound CCOP(O)(=O)C1=CC=CC=C1 MWQBWSPPTQGZII-UHFFFAOYSA-N 0.000 description 1
- ZJXZSIYSNXKHEA-UHFFFAOYSA-N ethyl dihydrogen phosphate Chemical compound CCOP(O)(O)=O ZJXZSIYSNXKHEA-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- WPYVFMKRHQSQSU-UHFFFAOYSA-N ethyl(phenyl)phosphinic acid Chemical compound CCP(O)(=O)C1=CC=CC=C1 WPYVFMKRHQSQSU-UHFFFAOYSA-N 0.000 description 1
- GATNOFPXSDHULC-UHFFFAOYSA-N ethylphosphonic acid Chemical compound CCP(O)(O)=O GATNOFPXSDHULC-UHFFFAOYSA-N 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000012065 filter cake Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- UPWPDUACHOATKO-UHFFFAOYSA-K gallium trichloride Chemical compound Cl[Ga](Cl)Cl UPWPDUACHOATKO-UHFFFAOYSA-K 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical class [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- OHZZTXYKLXZFSZ-UHFFFAOYSA-I manganese(3+) 5,10,15-tris(1-methylpyridin-1-ium-4-yl)-20-(1-methylpyridin-4-ylidene)porphyrin-22-ide pentachloride Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Mn+3].C1=CN(C)C=CC1=C1C(C=C2)=NC2=C(C=2C=C[N+](C)=CC=2)C([N-]2)=CC=C2C(C=2C=C[N+](C)=CC=2)=C(C=C2)N=C2C(C=2C=C[N+](C)=CC=2)=C2N=C1C=C2 OHZZTXYKLXZFSZ-UHFFFAOYSA-I 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- CAAULPUQFIIOTL-UHFFFAOYSA-L methyl phosphate(2-) Chemical compound COP([O-])([O-])=O CAAULPUQFIIOTL-UHFFFAOYSA-L 0.000 description 1
- YACKEPLHDIMKIO-UHFFFAOYSA-N methylphosphonic acid Chemical compound CP(O)(O)=O YACKEPLHDIMKIO-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 1
- 235000019796 monopotassium phosphate Nutrition 0.000 description 1
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 1
- 235000019799 monosodium phosphate Nutrition 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- CDXVUROVRIFQMV-UHFFFAOYSA-N oxo(diphenoxy)phosphanium Chemical compound C=1C=CC=CC=1O[P+](=O)OC1=CC=CC=C1 CDXVUROVRIFQMV-UHFFFAOYSA-N 0.000 description 1
- YHBDIEWMOMLKOO-UHFFFAOYSA-I pentachloroniobium Chemical compound Cl[Nb](Cl)(Cl)(Cl)Cl YHBDIEWMOMLKOO-UHFFFAOYSA-I 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- CMPQUABWPXYYSH-UHFFFAOYSA-N phenyl phosphate Chemical compound OP(O)(=O)OC1=CC=CC=C1 CMPQUABWPXYYSH-UHFFFAOYSA-N 0.000 description 1
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 description 1
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- NCPXQVVMIXIKTN-UHFFFAOYSA-N trisodium;phosphite Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])[O-] NCPXQVVMIXIKTN-UHFFFAOYSA-N 0.000 description 1
- KPGXUAIFQMJJFB-UHFFFAOYSA-H tungsten hexachloride Chemical compound Cl[W](Cl)(Cl)(Cl)(Cl)Cl KPGXUAIFQMJJFB-UHFFFAOYSA-H 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は高ガラス転移点を有し、耐熱性及び耐薬品性に
特に優れた結晶熱可塑性芳香族ポリエーテルケトン、そ
れを使用してなる成形品、上記芳香族ポリエーテルケト
ンの製造法に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention provides a crystalline thermoplastic aromatic polyetherketone having a high glass transition point and particularly excellent heat resistance and chemical resistance, and a product made using the crystalline thermoplastic aromatic polyetherketone. The present invention relates to a molded article and a method for producing the aromatic polyetherketone.
[従来技術]
式(r)
(式中、RI、R10はそれぞれ水素原子、ハロゲン原
子、炭化水素基、又はアルコキシ基を示し、Xは直接結
合、又は酸素原子を示し、lは0〜2の整数を示し、m
はθ〜3の整数を示し、nば0又は1である)の繰り返
し単位を有する芳香族ポリエーテルケトンに於て、下記
式(If)及び式(I[I)
の構造を有する芳香族ポリエーテルケトンは既に市販さ
れていて、耐熱性、耐薬品性に優れることが喧伝されて
いる。又、式(IV)
の構造を有する芳香族ポリエーテルケトンが提案され、
やはり優れた耐熱性が謳われている。[Prior art] Formula (r) (wherein RI and R10 each represent a hydrogen atom, a halogen atom, a hydrocarbon group, or an alkoxy group, X represents a direct bond or an oxygen atom, and l represents 0 to 2 Indicates an integer, m
represents an integer of θ to 3, and n is 0 or 1). Etherketone is already commercially available and is touted to have excellent heat resistance and chemical resistance. Furthermore, aromatic polyetherketones having the structure of formula (IV) have been proposed,
It is also said to have excellent heat resistance.
ところが、これら芳香族ポリエーテルケトンは、原料化
合物を重合した後、精製しただけでは、これを溶融・加
熱処理するとガス発生及びゲル化による不融化が著しく
、熱的に不安定であるという問題点を有している。However, these aromatic polyether ketones have the problem that if they are simply purified after polymerizing the raw material compounds, when they are melted and heat treated, they become infusible due to gas generation and gelation, and are thermally unstable. have.
従来、ポリマーの熱安定性を改良するためには各種の熱
酸化防止剤などの安定化剤が使用されてきた。ところが
、これら安定化剤はそれ自体の安定性や揮発性の関係で
、−船釣には300℃以下の条件下で使用される。かか
る安定化剤をポリエーテルケトンの安定化を目的として
使用しようとした場合、ポリエーテルケトンの成形・加
工時の温度が400℃前後の高温であることを考えると
、安定化剤自体の熱安定性や揮発性の問題により、実質
上使用不可能であることが予想される。つまり、式(1
)の繰り返し単位を有する芳香族ポリエーテルケトンの
成形・加工温度域でポリマーの安定化を図ろうとするこ
とは非常に困難なことと言わざるを得ない。Conventionally, stabilizers such as various thermal antioxidants have been used to improve the thermal stability of polymers. However, due to the stability and volatility of these stabilizers themselves, they are used under conditions of 300° C. or lower for boat fishing. When trying to use such a stabilizer for the purpose of stabilizing polyetherketone, considering that the temperature during molding and processing of polyetherketone is around 400°C, the thermal stability of the stabilizer itself may be affected. It is expected that it will be practically unusable due to the problems of stability and volatility. In other words, the formula (1
) It must be said that it is extremely difficult to stabilize the polymer in the molding/processing temperature range of aromatic polyetherketones having repeating units.
かかる状況の下に、特に式(IV)の構造を有するポリ
エーテルケトンに於て加熱溶融時のゲル化防止を目的と
して、リン化合物を添加することが提案されている(特
開昭63−159430号公報、特開昭63−1594
31号公報)。Under such circumstances, it has been proposed to add a phosphorus compound to polyetherketone having the structure of formula (IV) for the purpose of preventing gelation during heating and melting (Japanese Unexamined Patent Publication No. 159430/1989). Publication No. 63-1594
Publication No. 31).
これによって加熱溶融時にゲル化するという問題点は一
部改善されるが、ガスが発生するという問題点は未解決
のままである。Although this partially solves the problem of gelation during heating and melting, the problem of gas generation remains unsolved.
従って、熱的に十分に安定化された式(J)の繰り返し
単位を有する(以下、単にr式(1)の」と略す)芳香
族ポリエーテルケトン、その製造方法及び当該芳香族ポ
リエーテルケトンよりなり耐熱性、耐薬品性の優れた成
形品は、未だ提供されていないのが実情である。Therefore, an aromatic polyetherketone having a thermally sufficiently stabilized repeating unit of formula (J) (hereinafter simply referred to as "r formula (1)"), a method for producing the same, and the aromatic polyetherketone The reality is that molded products with excellent heat resistance and chemical resistance have not yet been provided.
本発明の目的は、従来既知の式(1)の芳香族ポリエー
テルケトンに比較して、熱安定性が著しく改善された式
(1)の芳香族ポリエーテルケトンを提供することであ
る。The object of the present invention is to provide an aromatic polyetherketone of formula (1) which has significantly improved thermal stability compared to the hitherto known aromatic polyetherketones of formula (1).
本発明の他の目的は、熱安定性が著しく改善された式(
1)の芳香族ポリエーテルケトンの製造方法を提供する
ことである。Another object of the invention is that the formula (
The object of the present invention is to provide a method for producing an aromatic polyetherketone (1).
本発明のさらに他の目的は、熱安定性が著しく改善され
た式(1)の芳香族ポリエーテルケトンよりなり、耐熱
性、さらには耐薬品性の優れた成形品を提供することで
ある。Still another object of the present invention is to provide a molded article made of the aromatic polyetherketone of formula (1) with significantly improved thermal stability and excellent in heat resistance and chemical resistance.
本発明者等は、上記の目的を達成すべく鋭意研究を重ね
た結果、原料化合物を反応させて、式(1)の芳香族ポ
リエーテルケトンを生成させた後の工程に於て、リンに
結合する結合基の少なくとも1個が酸性基であるリン化
合物またはその塩で処理することにより、加熱溶融時の
ガスの発生及びゲル化が著しく抑制され、熱安定性が著
しく改善された芳香族ポリエーテルケトンが得られるこ
とを見出し本発明を完成するに至った。As a result of intensive research to achieve the above object, the present inventors have discovered that phosphorus can be By treating with a phosphorus compound or its salt in which at least one of the bonding groups is an acidic group, gas generation and gelation during heating and melting are significantly suppressed, and the aromatic polyester has significantly improved thermal stability. The present inventors discovered that ether ketones can be obtained and completed the present invention.
すなわち、本発明の要旨は、次に挙げるものである。That is, the gist of the present invention is as follows.
(1)式(1)
(式中、R1〜Rzoはそれぞれ水素原子、ハロゲン原
子、炭化水素基、又はアルコキシ基を示し、Xは直接結
合、又は酸素原子を示し、lは0〜2の整数を示し、m
はO〜3の整数を示し、nは0又は1である)の繰り返
し単位を有する芳香族ポリエーテルケトンであって、空
気中400℃で1時間加熱処理した時の重量減少率が2
%以下である芳香族ポリエーテルケトン[以下、耐熱性
芳香族ポリエーテルケトン(I)ともいう]。(1) Formula (1) (In the formula, R1 to Rzo each represent a hydrogen atom, a halogen atom, a hydrocarbon group, or an alkoxy group, X represents a direct bond or an oxygen atom, and l is an integer of 0 to 2. and m
represents an integer of 0 to 3, and n is 0 or 1), which has a weight loss rate of 2 when heated in air at 400°C for 1 hour.
% or less [hereinafter also referred to as heat-resistant aromatic polyetherketone (I)].
(2)耐熱性芳香族ポリエーテルケトンN)からなる成
形品。(2) Molded product made of heat-resistant aromatic polyetherketone N).
(3)芳香族ポリエーテルケトンを生成させた後の任意
の工程に於て、リンに結合する結合基の少なくとも1個
が酸性基であるリン化合物またはその塩にて、当該芳香
族ポリエーテルケトンを処理することを特徴とする、耐
熱性芳香族ポリエーテルケトン(1)の製造方法。(3) In any step after producing the aromatic polyether ketone, the aromatic polyether ketone is A method for producing a heat-resistant aromatic polyetherketone (1), comprising the steps of:
本明細書において、ハロゲン原子としては、クロル、ブ
ロムが好適なものとして例示される。炭化水素基として
は、アルキル(例えば、メチル、エチル、n−プロピル
、イソプロピル、n−ブチル等の炭素数1〜4の低級ア
ルキル)、シクロアルキル(例えば、シクロプロピル、
シクロブチル、シクロヘキシル等の炭素数3〜6のシク
ロアルキル)、アリール(フェニル、ナフチル等)、ア
ラルキル(ベンジル等)が例示される。アルコキシ基と
しては、メトキシ、エトキシ、n−プロポキシ、イソプ
ロポキシ、n−ブトキシ等の炭素数1〜4の低級アルコ
キシが例示される。In this specification, chloro and bromine are exemplified as suitable halogen atoms. Examples of the hydrocarbon group include alkyl (for example, lower alkyl having 1 to 4 carbon atoms such as methyl, ethyl, n-propyl, isopropyl, n-butyl), cycloalkyl (for example, cyclopropyl,
Examples include cycloalkyl having 3 to 6 carbon atoms such as cyclobutyl and cyclohexyl), aryl (phenyl, naphthyl, etc.), and aralkyl (benzyl, etc.). Examples of the alkoxy group include lower alkoxy having 1 to 4 carbon atoms such as methoxy, ethoxy, n-propoxy, isopropoxy, and n-butoxy.
本発明の耐熱性芳香族ポリエーテルケトン(1)は、空
気中400℃で1時間加熱処理した時の重量減少率が1
%以下であるが、その重量減少率は好ましくは1.5%
以下、さらに好ましくは0.8%以下である。The heat-resistant aromatic polyether ketone (1) of the present invention has a weight loss rate of 1 when heat-treated in air at 400°C for 1 hour.
% or less, but the weight loss rate is preferably 1.5%
The content is preferably 0.8% or less.
さらに、本発明の耐熱性芳香族ポリエーテルケトン(+
)は、窒素中400℃で30分間加熱処理した時の粘度
上昇率が5%以下であることが特に好適であり、その粘
度上昇率は、好ましくは3%以下、さらに好ましくは2
%以下である。Furthermore, the heat-resistant aromatic polyether ketone (+
) has a viscosity increase rate of 5% or less when heat-treated at 400°C for 30 minutes in nitrogen, preferably 3% or less, and more preferably 2% or less.
% or less.
本明細書において、重量減少率とは、熱重量分析装置(
島津製作所製DT−30)を用いて、空気雰囲気下40
0 ’Cで1時間加熱処理した時に生じる重量減少量を
加熱処理前に対する割合で示したものである。In this specification, weight loss rate refers to a thermogravimetric analyzer (
Using Shimadzu DT-30), under air atmosphere for 40 minutes.
The amount of weight loss that occurs when heat treated at 0'C for 1 hour is shown as a percentage of the weight before heat treatment.
本明細書において、粘度上昇率とは、ポリマー約1gを
窒素雰囲気下400℃で30分間加熱処理した後のポリ
マー粘度を加熱処理前のポリマー粘度に対する割合で示
したものである。尚、ポリマー粘度は98%濃硫酸10
0−に対してポリマーIO,5gの濃度で30゛Cで測
定した対数粘度で表示した。In this specification, the viscosity increase rate is the ratio of the polymer viscosity after heat-treating about 1 g of polymer at 400° C. for 30 minutes in a nitrogen atmosphere to the polymer viscosity before the heat treatment. In addition, the polymer viscosity is 98% concentrated sulfuric acid 10
It is expressed as the logarithmic viscosity measured at 30°C at a concentration of 5 g of polymer IO relative to 0-.
式(1)の芳香族ポリエーテルケトンは、例えば次のよ
うな方法で製造される。The aromatic polyetherketone of formula (1) is produced, for example, by the following method.
1法土
弐(V)
(式中、R1〜RI2、X及びlは前記と同意義)7裏
わさhる芳香族エーテル七、揉(VI)(式中、R1f
f−R20,X及びmは前記と同意義であり、Yはハロ
ゲン原子を示す)で表わされる芳香族ジカルボン酸シバ
ライドとを、例えば非プロトン性育機溶媒(例えば1.
2−ジクロロエタン、塩化メチレン、ニトロベンゼン、
クロロボルム、オルトジクロロベンゼン等)等の存在下
でルイス酸を触媒として重合させる方法。1 Method 2 (V) (In the formula, R1 to RI2, X and l have the same meanings as above)
f-R20, X and m have the same meanings as above, and Y represents a halogen atom.
2-dichloroethane, methylene chloride, nitrobenzene,
A method of polymerizing using a Lewis acid as a catalyst in the presence of chloroborum, orthodichlorobenzene, etc.).
当該重合反応の条件は次の通りである。即ち、重合は、
窒素等の不活性ガス雰囲気下、−20’C以上100℃
以下、好ましくは一5〜30’cの反応温度で実施され
る。The conditions for the polymerization reaction are as follows. That is, the polymerization is
Under an inert gas atmosphere such as nitrogen, -20'C or higher 100°C
Hereinafter, the reaction is preferably carried out at a reaction temperature of -5 to 30'C.
前記式(V)の芳香族エーテルとしては、ジフェニルエ
ーテル、1.4−ジフェノキシベンゼン、ビフェニル、
ビス(4−フェノキシフェニル)エーテル、4,4゛−
ビス(4−フェノキシフェニル)ジフェニルエーテル、
3,3゛−ジメチルフェニルエンゼン、3,3”−ジメ
トキシ フェニルエーテル、1.4−ビス(3−メトキ
シフェノキシ)ベンゼン、1.4−ビス(2−クロロフ
ェノキシ)ベンゼン、ターフェニル、4−フェノキシビ
フェニル、4,4゜−ジフェノキシビフェニル等が挙げ
られ、これらの芳香族エーテルは単独もしくは混合して
用いてもよい。Examples of the aromatic ether of formula (V) include diphenyl ether, 1,4-diphenoxybenzene, biphenyl,
Bis(4-phenoxyphenyl)ether, 4,4゛-
bis(4-phenoxyphenyl)diphenyl ether,
3,3''-dimethylphenylenzene, 3,3''-dimethoxy phenyl ether, 1,4-bis(3-methoxyphenoxy)benzene, 1,4-bis(2-chlorophenoxy)benzene, terphenyl, 4- Examples include phenoxybiphenyl, 4,4°-diphenoxybiphenyl, and these aromatic ethers may be used alone or in combination.
又、前記式(IV)の芳香族ジカルボン酸ジ/’%ライ
ドとしては、テレフタル酸ジクロライド、イソフタル酸
ジクロライド、ジフェニルエーテル−4゜4°−ジカル
ボン酸ジクロライド、1.4−ビス(4−クロロホルミ
ルフェニル)ベンゼン、2.5−ジメチルテシフタル酸
ジクロライドミ4.4゛〜ジフエン酸ジクロライド、2
.6−ナフタレンジカルボン酸ジクロライド等が挙げら
れ、これらの芳香族ジカルボン酸シバライドは単独もし
くは混合して用いてもよい。Further, as the aromatic dicarboxylic acid di/'%ride of formula (IV), terephthalic acid dichloride, isophthalic acid dichloride, diphenyl ether-4°4°-dicarboxylic acid dichloride, 1,4-bis(4-chloroformylphenyl ) Benzene, 2.5-dimethyltecyphthalic acid dichloride 4.4゛~diphenic acid dichloride, 2
.. Examples include 6-naphthalene dicarboxylic acid dichloride, and these aromatic dicarboxylic acid cybarides may be used alone or in combination.
ルイス酸としては、無水三塩化アルミニウム、無水三臭
化アルミニウム、無水三塩化ガリウム、三沸化硼素エチ
ルエーテルコンプレ・ンクス、塩化第二スズ、塩化第一
スズ、塩化第二鉄、四塩化チタン、三塩化硼素、五塩化
アンチモン、三塩化リン、五塩化リン、五塩化テルル、
五塩化ニオブ、六塩化タングステンなどが挙げられ、特
に周期律表第■族ハロゲン化物、就中塩化アルミニウム
が好ましい。ルイス酸の使用量は芳香族エーテルに対し
て、モル比で0.01〜100、好ましくは0.1〜1
0.0である。Lewis acids include anhydrous aluminum trichloride, anhydrous aluminum tribromide, anhydrous gallium trichloride, boron trifluoride ethyl ether complex, stannic chloride, stannous chloride, ferric chloride, titanium tetrachloride, Boron trichloride, antimony pentachloride, phosphorus trichloride, phosphorus pentachloride, tellurium pentachloride,
Examples include niobium pentachloride and tungsten hexachloride, and particularly preferred are halides of Group I of the periodic table, especially aluminum chloride. The amount of Lewis acid used is 0.01 to 100, preferably 0.1 to 1 in molar ratio to aromatic ether.
It is 0.0.
1汰I
式(■)
(式中、R5,、R1は前記と同意義)で表わされる化
合物またはその塩と、
°(式中、
1
〜R4
9
〜Rho、
1
m及びn
は前記と同意義)で表わされる化合物とを、例えば有機
溶媒(例えばジフェニルスルホン、スルホラン、ジメチ
ルスルホキシド、N−メチルピロリドン等)等の存在下
で重合させる方法。1. I A compound represented by the formula (■) (wherein R5, and R1 are the same as above) or a salt thereof; A method of polymerizing a compound represented by the following formula in the presence of an organic solvent (for example, diphenylsulfone, sulfolane, dimethylsulfoxide, N-methylpyrrolidone, etc.).
当該重合反応の条件は次の通りである。即ち、重合反応
は窒素等の不活性ガス雰囲気下、150〜400℃、好
ましくは280〜350℃の高温で実施される。The conditions for the polymerization reaction are as follows. That is, the polymerization reaction is carried out at a high temperature of 150 to 400°C, preferably 280 to 350°C, in an atmosphere of an inert gas such as nitrogen.
式(■)の化合物の塩としては、ナトリウム塩、カリウ
ム塩等のアルカリ金属塩等が例示される。Examples of the salt of the compound of formula (■) include alkali metal salts such as sodium salt and potassium salt.
式(■)の化合物およびその塩としては、例えばハイド
ロキノン、4.4’ −ジヒドロキシジフェニルエーテ
ル、4.4°−ジヒドロキシベンゾフェノン、4.4“
−ジヒドロキシビフェニル、1.4−ビス−(4−仁ド
ロキシベンゾイル)ベンゼン等が挙げられ、これらの化
合物は単独もしくは混合して用いてもよい。Examples of the compound of formula (■) and its salt include hydroquinone, 4.4'-dihydroxydiphenyl ether, 4.4°-dihydroxybenzophenone, and 4.4'-dihydroxybenzophenone.
-dihydroxybiphenyl, 1,4-bis-(4-nidroxybenzoyl)benzene, etc., and these compounds may be used alone or in combination.
式(■)の化合物としては、例えば4.4゜ジフルオロ
ベンゾフェノン、1.4−ビス−(4−フルオロベンゾ
イル)ベンゼン、4,4°−ビス−(4−フルオロベン
ゾイル)ビフェニル、414°−ビス−(4°−フルオ
ロベンゾイル)ジフェニルエーテル等が挙げられ、これ
らの芳香族エーテルは単独もしくは混合して用いてもよ
い。Examples of the compound of formula (■) include 4.4° difluorobenzophenone, 1,4-bis-(4-fluorobenzoyl)benzene, 4,4°-bis-(4-fluorobenzoyl)biphenyl, 414°-bis -(4°-fluorobenzoyl)diphenyl ether and the like, and these aromatic ethers may be used alone or in combination.
このようにして得られた式(I)の芳香族ポリエーテル
ケトンは、後処理として、前記リン化合物との処理に付
すことによって耐熱性芳香族ポリエーテルケトン(1)
とされる。The aromatic polyetherketone of the formula (I) thus obtained is treated with the phosphorus compound as a post-treatment to form a heat-resistant aromatic polyetherketone (1).
It is said that
リン化合物による処理は、反応終了後のいずれの時期で
もよく、例えば生成ポリマーの洗浄時、濾過時(濾滓に
添加してもよい)、乾燥時、乾燥終了後成形・加工時な
どであり、特に乾燥時及び成形・加工時の時期が好まし
い。The treatment with a phosphorus compound may be carried out at any time after the completion of the reaction, for example, during washing of the produced polymer, during filtration (it may be added to the filtrate), during drying, during molding/processing after completion of drying, etc. Particularly preferred is the time of drying and the time of molding/processing.
当該リン化合物による処理は、通常式(I)の芳香族ポ
リエーテルケトンにリン化合物を添加することにより行
われる。The treatment with the phosphorus compound is usually carried out by adding the phosphorus compound to the aromatic polyetherketone of formula (I).
リン化合物の添加は、リンの原子量で式(1)の芳香族
ポリエーテルケトンに対して、通常0.OO1%〜1.
0%、好ましくは0.003%〜0.05%である。The addition of the phosphorus compound is usually 0.0% based on the atomic weight of phosphorus relative to the aromatic polyetherketone of formula (1). OO1%~1.
0%, preferably 0.003% to 0.05%.
当該リン化合物は、通常アセトン、ベンゼン、トルエン
、ヘキサン、テトラヒドロフラン、メチルエチルケトン
等の溶媒にて希釈して使用される。The phosphorus compound is usually used after being diluted with a solvent such as acetone, benzene, toluene, hexane, tetrahydrofuran, or methyl ethyl ketone.
使用するリン化合物は、リンに結合する結合基の少なく
とも1個が酸性基であるリン化合物またはその塩であり
、換言すればリンに結合する結合基の少なくとも1つは
有機基、金属、アミノ基等と直接結合しない酸性基を有
するリン化合物である。リン化合物の塩としては、アル
カリ金属塩(ナトリウム塩、カリウム塩など)などが例
示される。The phosphorus compound used is a phosphorus compound or a salt thereof in which at least one of the binding groups that binds to phosphorus is an acidic group, in other words, at least one of the binding groups that binds to phosphorus is an organic group, a metal, or an amino group. It is a phosphorus compound that has an acidic group that does not directly bond with other substances. Examples of salts of phosphorus compounds include alkali metal salts (sodium salts, potassium salts, etc.).
リン化合物としては、3価のリン化合物、5価のリン化
合物のいずれも使用可能である。As the phosphorus compound, either a trivalent phosphorus compound or a pentavalent phosphorus compound can be used.
3価のリン化合物の具体的な例としては、亜リン酸、メ
チルホスフィン酸、エチルホスフィン酸、フェニルホス
フィン酸、エチルフェニルホスフィン酸、亜リン酸−ナ
トリウム、亜リン酸−カリウム、メチルホスフィン酸−
ナトリウム、フェニルホスフィン酸−ナトリウム、フェ
ニルホスフィン酸−カリウム、ジメチルホスフィン酸、
ジエチルホスフィン酸、ジフェニルホスフィン酸等が挙
げられるが、これらに特に限定されるものではない。Specific examples of trivalent phosphorous compounds include phosphorous acid, methylphosphinic acid, ethylphosphinic acid, phenylphosphinic acid, ethyl phenylphosphinic acid, sodium phosphite, potassium phosphite, and methylphosphinic acid.
Sodium, sodium phenylphosphinic acid, potassium phenylphosphinic acid, dimethylphosphinic acid,
Examples include diethylphosphinic acid and diphenylphosphinic acid, but are not particularly limited to these.
また、5価のリン化合物の具体的な例としては、リン酸
、メタリン酸、ポリリン酸、リン酸二水素ナトリウム、
リン酸二水素カリウム、リン酸水素ニナトリウム、リン
酸水素二カリウム、メチルホスホン酸、エチルホスホン
酸、フェニルホスホン酸、ジメチルホスホン酸、ジエチ
ルホスホン酸、ジフェニルホスホン酸、メチルフェニル
ホスホン酸、エチルフェニルホスホン酸、メチルリン酸
、エチルリン酸、フェニルリン酸、ジメチルリン酸、ジ
エチルリン酸、ジフェニルリン酸、エチルフェニルリン
酸、メチルホスホン酸−ナトリウム、メチルホスホン酸
−カリウム、フェニルホスホン酸ナトリウム、フェニル
ホスホン酸−カリウム等が挙げられるが、これらに特に
限定されるものではない。Further, specific examples of pentavalent phosphorus compounds include phosphoric acid, metaphosphoric acid, polyphosphoric acid, sodium dihydrogen phosphate,
Potassium dihydrogen phosphate, disodium hydrogen phosphate, dipotassium hydrogen phosphate, methylphosphonic acid, ethylphosphonic acid, phenylphosphonic acid, dimethylphosphonic acid, diethylphosphonic acid, diphenylphosphonic acid, methylphenylphosphonic acid, ethylphenylphosphonic acid , methyl phosphoric acid, ethyl phosphoric acid, phenyl phosphoric acid, dimethyl phosphoric acid, diethyl phosphoric acid, diphenyl phosphoric acid, ethyl phenyl phosphoric acid, sodium methyl phosphonate, potassium methyl phosphonate, sodium phenyl phosphonate, potassium phenyl phosphonate, etc. These include, but are not particularly limited to.
本発明の耐熱性芳香族ポリエーテルケトン(I)は、そ
れ自体でまたは他の成分を配合して、自体既知の手段に
て成形品とすることができる。ががる成形品の例として
は、繊維、フィルム、成型品等が挙げられるが、これら
に限定されるものではない。The heat-resistant aromatic polyetherketone (I) of the present invention can be made into a molded article by itself or by blending with other components by means known per se. Examples of loose molded products include fibers, films, molded products, etc., but are not limited thereto.
上記の成形品の製造方法は、それ自体既知の方法によれ
ばよい。The method for manufacturing the above-mentioned molded article may be a method known per se.
本発明で得られた耐熱性芳香族ポリエーテルケトン(1
)は熱安定性が著しく改善されている。Heat-resistant aromatic polyetherketone (1
) has significantly improved thermal stability.
また、熱安定性に優れているため成形・加工性にも優れ
、この耐熱性芳香族ポリエーテルケトン(1)により、
良好な耐熱性、耐薬品性を有する繊維、フィルム、成型
品等の成形品が得られると期待される。In addition, it has excellent moldability and processability due to its excellent thermal stability, and this heat-resistant aromatic polyether ketone (1)
It is expected that molded products such as fibers, films, and molded products with good heat resistance and chemical resistance will be obtained.
本発明の内容を実施例をもって詳述するが、本発明はこ
れらによって制限されることはない。The content of the present invention will be explained in detail with reference to Examples, but the present invention is not limited thereto.
実施例1〜5
窒素導入管、温度計、撹拌装置を備えた124つ口反応
フラスコにジフェニルエーテル56.68g(0,33
30モル)、テレフタル酸ジクロリド43.94g (
0,2165モル)、イソフタル酸ジクロリド23.6
6g (0,1166モル)を投入し、1.2−ジクロ
ルエタンINに溶解した0反応系を氷冷し、10″C以
下に保ちながら撹拌下に無水塩化アルミニウム111.
1 g (0,8325−r−ル)を50分間で徐々に
投入した。投入終了後反応系を約15℃に保持し、5時
間撹拌、反応を続けた。Examples 1 to 5 56.68 g of diphenyl ether (0,33
30 moles), 43.94 g of terephthalic acid dichloride (
0,2165 mol), isophthalic acid dichloride 23.6
6 g (0,1166 mol) of aluminum chloride dissolved in 1,2-dichloroethane IN was ice-cooled, and anhydrous aluminum chloride 111.
1 g (0,8325-rr) was slowly added over 50 minutes. After the addition was completed, the reaction system was maintained at about 15° C., and the reaction was continued with stirring for 5 hours.
メタノール600mを投入することにより反応を停止し
、析出したポリマーを濾取した。得られたポリマーはメ
タノール12中室温下、引き続きメタノール11で還流
上洗浄を行った。続いて酢酸ll中、更にメタノール中
で還流上洗浄を行った後ポリマーを濾取し、130″C
で終夜減圧乾燥した。乾燥後のポリマーに蟻酸100m
及び酢酸900d中で還流上精製を行った後、メタノー
ル12中で還流上洗浄を行い、ポリマーを濾取した。The reaction was stopped by adding 600 m of methanol, and the precipitated polymer was collected by filtration. The obtained polymer was washed in methanol 12 at room temperature and subsequently in methanol 11 under reflux. Subsequently, the polymer was washed under reflux in 1 liter of acetic acid and then in methanol, and then the polymer was collected by filtration and heated at 130"C.
It was dried under reduced pressure overnight. Add 100m of formic acid to the dried polymer.
After purification under reflux in 900 d of acetic acid, washing under reflux was performed in 12 methanol, and the polymer was collected by filtration.
濾取したポリマーはI 30 ’Cで終夜減圧乾燥した
。The filtered polymer was dried under reduced pressure at I 30 'C overnight.
得られたポリマーの対数粘度はo、95、収率はほぼ1
00%であった。The logarithmic viscosity of the obtained polymer was o, 95, and the yield was approximately 1
It was 00%.
かようにして得られたポリマー5gに、表1に示したリ
ン化合物をアセトン、ベンゼン等の溶媒に希釈してブレ
ンドした後、80’Cで終夜減圧乾燥した。リン化合物
を添加したポリマーについて、重量減少率及び粘度上昇
率を評価した。その結果は表1に示した通りであり、い
ずれも極めて良好であった。The phosphorus compounds shown in Table 1 were diluted with a solvent such as acetone and benzene and blended with 5 g of the polymer thus obtained, and then dried under reduced pressure at 80'C overnight. The weight reduction rate and viscosity increase rate of the polymer to which the phosphorus compound was added were evaluated. The results are shown in Table 1, and all were extremely good.
比較例1〜4
対照としたポリマーにリン化合物を添加しない場合、及
び表1の比較例の項で示したリン化合物について、実施
例1〜5と全く同様に熱安定性を評価した。その結果は
、表1に示した通りであり、ガスの発生量も多く、又処
理後のポリマーは均一融解していなかった。Comparative Examples 1 to 4 Thermal stability was evaluated in exactly the same manner as in Examples 1 to 5 for the case where no phosphorus compound was added to the control polymer and for the phosphorus compounds shown in the Comparative Examples section of Table 1. The results are shown in Table 1, and a large amount of gas was generated, and the polymer after treatment was not uniformly melted.
実施例6〜9
窒素導入管、温度計、撹拌装置を備えた50〇−の4つ
口反応フラスコにハイドロキノン12.50g(0,1
134モル)、4.4’−ジフルオロベンゾフェノン2
5.0g (0,1146モル)、ジフェニルスルホン
150gを投入し、減圧窒素置換を3回繰り返した。反
応系を200℃に昇温し、撹拌下に炭酸カリウム16.
40g (0,1191モル)を加え同温度を1時間保
持した。引き続き反応系の温度を250℃に昇温し同温
度で1時間保持した後、反応温度を330℃として3時
間反応を続けた0反応混合物を放冷した後、メタノール
20〇−を加え還流下に洗浄した。洗浄物を濾別し、濾
滓にメタノール500Jdを加え還流上洗浄を行った後
ポリマーを濾取した。Examples 6 to 9 12.50 g of hydroquinone (0,1
134 mol), 4,4'-difluorobenzophenone 2
5.0 g (0,1146 mol) and 150 g of diphenylsulfone were added, and vacuum nitrogen replacement was repeated three times. The reaction system was heated to 200°C, and 16% of potassium carbonate was added while stirring.
40 g (0,1191 mol) was added and the same temperature was maintained for 1 hour. Subsequently, the temperature of the reaction system was raised to 250°C and held at the same temperature for 1 hour, and then the reaction temperature was raised to 330°C and the reaction was continued for 3 hours.After cooling the reaction mixture, 200ml of methanol was added and the mixture was heated under reflux. Washed. The washed product was filtered, and 500 Jd of methanol was added to the filter cake to wash it under reflux, and then the polymer was collected by filtration.
引き続き蒸留水500mで2回連流下洗浄を行ない、更
にメタノール500dで2回連流下洗浄を行った後、ポ
リマーを濾取し、130 ”Cで終夜減圧乾燥した。得
られたポリマーは、対数粘度が0.8で収率はほぼ10
0%であった。Subsequently, the polymer was washed twice with 500 m of distilled water under continuous flow, and then washed twice with 500 m of methanol under continuous flow, and then the polymer was collected by filtration and dried under reduced pressure at 130 ''C overnight.The obtained polymer had a logarithmic viscosity. is 0.8 and the yield is approximately 10
It was 0%.
かようにして得たポリマー10gに、表2に示したリン
化合物をアセトン、ベンゼン等の溶媒に希釈してブレン
ドした後、80’Cで終夜減圧乾燥した。ブレンド処理
をしたポリマーは、窒素雰囲気下400 ”Cで30分
間熔融混練した後ポリマーを掻き出し、粉砕した。ポリ
マーの熱安定性の評価を実施例1〜5に準じて行った。The phosphorus compounds shown in Table 2 were diluted with a solvent such as acetone and benzene and blended with 10 g of the polymer thus obtained, and then dried under reduced pressure at 80'C overnight. The blended polymers were melt-kneaded for 30 minutes at 400''C under a nitrogen atmosphere, and then the polymers were scraped out and pulverized. The thermal stability of the polymers was evaluated according to Examples 1 to 5.
その結果は表1に示した通りであり、いずれも極めて良
好であった。The results are shown in Table 1, and all were extremely good.
比較例5〜7
対照としてのリン化合物を添加しなかった場合と表2の
比較例で示したリン化合物を使用した以外は、全て実施
例6〜9に準じて熱安定性を評価した。その結果は、表
1に示した通りであり、ガスの発生量も多く、又処理後
のポリマーは均一融解していなかった。Comparative Examples 5 to 7 Thermal stability was evaluated in accordance with Examples 6 to 9, except that no phosphorus compound was added as a control and the phosphorus compounds shown in the comparative examples in Table 2 were used. The results are shown in Table 1, and a large amount of gas was generated, and the polymer after treatment was not uniformly melted.
実施例10〜12
テレフタル酸ジクロリド43.94 gとイソフタル酸
ジクロリド23.66 g及びジフェニルエーテル56
.68gよ#)、l、2−ジクロロエタン溶媒中無水塩
化アルミラムの存在下常法により、対数粘度0.95の
ポリマーを得た。このポリマーにフェニルホスフィン酸
0.046%を添加した後、溶融押し出しして厚さ13
4μmの未延伸フィルムを得た。更に、未延伸フィルム
は170℃で同時2軸延伸を行って、厚さ22μmの延
伸フィルムにした。ポリマーの溶融押し出しによるフィ
ルム作製は何らトラブルなくスムースに行えた。表3に
得られたフィルムの物性値を示した。Examples 10-12 43.94 g of terephthalic acid dichloride, 23.66 g of isophthalic acid dichloride and 56 g of diphenyl ether
.. A polymer having a logarithmic viscosity of 0.95 was obtained by a conventional method in the presence of anhydrous aluminum chloride in a solvent of 1,2-dichloroethane. After adding 0.046% phenylphosphinic acid to this polymer, it was melt extruded to a thickness of 13
An unstretched film of 4 μm was obtained. Furthermore, the unstretched film was subjected to simultaneous biaxial stretching at 170° C. to obtain a stretched film with a thickness of 22 μm. Film production by melt extrusion of the polymer was carried out smoothly without any trouble. Table 3 shows the physical property values of the obtained film.
比較例日
実施例10に準じて重合したポリマーにリン化合物を添
加することなく溶融押し出ししてフィルム作製した。得
られたフィルムはガス発生によって生じた気泡を無数に
含み、また、ゲル化によって生じたと考えられる異物が
多数見られた。Comparative Example Day A film was prepared by melt extruding a polymer polymerized according to Example 10 without adding a phosphorus compound. The obtained film contained numerous bubbles caused by gas generation, and many foreign substances thought to be caused by gelation were observed.
Claims (4)
ゲン原子、炭化水素基、又はアルコキシ基を示し、Xは
直接結合、又は酸素原子を示し、lは0〜2の整数を示
し、mは0〜3の整数を示し、nは0又は1である)の
繰り返し単位を有する芳香族ポリエーテルケトンであっ
て、空気中400℃で1時間加熱処理した時の重量減少
率が2%以下である芳香族ポリエーテルケトン。(1) Formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) (In the formula, R^1 to R^2^0 each represent a hydrogen atom, a halogen atom, a hydrocarbon group, or an alkoxy group. , X represents a direct bond or an oxygen atom, l represents an integer of 0 to 2, m represents an integer of 0 to 3, and n is 0 or 1). An aromatic polyether ketone having a weight loss rate of 2% or less when heat treated in air at 400°C for 1 hour.
上昇率が5%以下である請求項(1)記載の芳香族ポリ
エーテルケトン。(2) The aromatic polyetherketone according to claim (1), which has a viscosity increase rate of 5% or less when heated in nitrogen at 400° C. for 30 minutes.
ルケトンからなる成形品。(3) A molded article made of the aromatic polyetherketone according to claim (1) or (2).
の工程に於て、リンに結合する結合基の少なくとも1個
が酸性基であるリン化合物またはその塩にて芳香族ポリ
エーテルケトンを処理することを特徴とする、請求項(
1)記載の芳香族ポリエーテルケトンの製造方法。(4) In any step after producing the aromatic polyetherketone, the aromatic polyetherketone is treated with a phosphorus compound or a salt thereof in which at least one of the bonding groups bonded to phosphorus is an acidic group. The claim (
1) The method for producing an aromatic polyetherketone as described above.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2102390A JPH03227320A (en) | 1990-01-30 | 1990-01-30 | Aromatic polyether ketone, production thereof and molded article thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2102390A JPH03227320A (en) | 1990-01-30 | 1990-01-30 | Aromatic polyether ketone, production thereof and molded article thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03227320A true JPH03227320A (en) | 1991-10-08 |
Family
ID=12043434
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2102390A Pending JPH03227320A (en) | 1990-01-30 | 1990-01-30 | Aromatic polyether ketone, production thereof and molded article thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03227320A (en) |
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WO2023008365A1 (en) * | 2021-07-30 | 2023-02-02 | ポリプラスチックス株式会社 | Wholly aromatic ether ketone resin composition, method for producing same, molded article, and method for improving residence stability of melt viscosity of said resin composition |
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1990
- 1990-01-30 JP JP2102390A patent/JPH03227320A/en active Pending
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WO2004033860A1 (en) * | 2002-10-08 | 2004-04-22 | Daimlerchrysler Ag | Locking device for a camshaft adjuster |
KR20180031734A (en) * | 2015-07-22 | 2018-03-28 | 아르끄마 프랑스 | Composition made from poly(arylene-ether-ketone) (paek) stable in a molten state |
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JP2021036055A (en) * | 2015-07-22 | 2021-03-04 | アルケマ フランス | Method for stabilizing composition made from poly(arylene-ether-ketone) (paek) |
US10988596B2 (en) | 2015-07-22 | 2021-04-27 | Arkema France | Method for stabilising a composition made from poly(arylene-ether-ketone) (PAEK) |
WO2023008365A1 (en) * | 2021-07-30 | 2023-02-02 | ポリプラスチックス株式会社 | Wholly aromatic ether ketone resin composition, method for producing same, molded article, and method for improving residence stability of melt viscosity of said resin composition |
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