JPH03221180A - Apparatus for washing core pipe - Google Patents
Apparatus for washing core pipeInfo
- Publication number
- JPH03221180A JPH03221180A JP2016853A JP1685390A JPH03221180A JP H03221180 A JPH03221180 A JP H03221180A JP 2016853 A JP2016853 A JP 2016853A JP 1685390 A JP1685390 A JP 1685390A JP H03221180 A JPH03221180 A JP H03221180A
- Authority
- JP
- Japan
- Prior art keywords
- core tube
- furnace core
- cleaning
- core pipe
- fluoric acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005406 washing Methods 0.000 title abstract 4
- 239000000126 substance Substances 0.000 claims abstract description 6
- 238000004140 cleaning Methods 0.000 claims description 29
- 239000007788 liquid Substances 0.000 claims description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract description 28
- 229960002050 hydrofluoric acid Drugs 0.000 abstract 4
- 238000000034 method Methods 0.000 abstract 1
- 239000012530 fluid Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 210000004209 hair Anatomy 0.000 description 2
- 238000001947 vapour-phase growth Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Cleaning In General (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、気相成長装置に使用する円筒形の炉芯管を洗
浄する炉芯管洗浄装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a furnace core tube cleaning device for cleaning a cylindrical furnace core tube used in a vapor phase growth apparatus.
従来、気相成長装置は、半導体基板に種々の成膜を形成
する装置として使用されてきた。しかしながら、その成
膜条件により種々のガスを使用するので、炉芯管はその
都度汚染を受ける状態になっていた。従って、成膜の種
類によりガスが変るので、その都度炉芯管を洗浄する必
要があった。Conventionally, vapor phase growth apparatuses have been used as apparatuses for forming various films on semiconductor substrates. However, since various gases are used depending on the film forming conditions, the furnace core tube is subject to contamination each time. Therefore, since the gas changes depending on the type of film formation, it is necessary to clean the furnace core tube each time.
第4図は従来の炉芯管洗浄装置の一例を説明するための
断面図である。この種の炉芯管洗浄装置としては、例え
ば、第4図に示すように、円筒形の炉芯管1を回転させ
る回転ローラ5と、炉芯管1内に弗酸を流す弗酸配管3
と、図面には示していないが、流れ出す弗酸を貯蔵し、
回収する槽とで構成されている。この炉芯管1を洗浄す
るには、炉芯管1を回転ローラ5により回転しながら、
弗酸を管内にそそぎ、汚染物を取除いていた。FIG. 4 is a sectional view for explaining an example of a conventional furnace core tube cleaning device. As shown in FIG. 4, this type of furnace core tube cleaning device includes, for example, a rotating roller 5 that rotates a cylindrical furnace core tube 1, and a hydrofluoric acid pipe 3 that flows hydrofluoric acid into the furnace core tube 1.
Although it is not shown in the drawing, the hydrofluoric acid that flows out is stored,
It consists of a collection tank. To clean the furnace core tube 1, while rotating the furnace core tube 1 with the rotating roller 5,
Hydrofluoric acid was poured into the pipe to remove contaminants.
上述した従来の炉芯管洗浄装置は、円筒形炉芯管を回転
させ、炉内に薬液を流すだけとなっているので、多量な
薬液を使用し、多大な時間と資材を費いやさなければな
らないという欠点がある。The conventional furnace core tube cleaning device described above simply rotates the cylindrical furnace core tube and flows the chemical solution into the furnace, so it does not require the use of a large amount of chemical solution and a large amount of time and materials. The disadvantage is that it does not.
本発明の目的は、かかる欠点を解消し、より短時間で、
より消費源の炉芯管洗浄装置を提供することにある。The object of the present invention is to eliminate such drawbacks and to
It is an object of the present invention to provide a furnace core tube cleaning device that consumes less energy.
本発明の炉芯管洗浄装置は、炉芯管を乗せるとともに回
転させる回転ローラと、前記炉芯管に挿入されるととも
に洗浄用薬液を注ぐ一面側に洗浄液流出口か多数明けら
れた洗浄液供給管と、この洗浄液供給管の前記一面側に
埋め込まれたブラシとを有している。The furnace core tube cleaning device of the present invention includes a rotary roller on which the furnace core tube is placed and rotated, and a cleaning liquid supply pipe that is inserted into the furnace core tube and has a large number of cleaning liquid outlet ports on one side into which a cleaning chemical solution is poured. and a brush embedded in the one surface side of the cleaning liquid supply pipe.
次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第1図は本発明の炉芯管洗浄装置の一実施例を説明する
ための断面図、第2図は第1図のAA断面図、第3図は
第1図のBB断面図である。この炉芯管洗浄装置は、同
図に示すように、洗浄液である弗酸を注ぐ弗酸配管3a
の弗酸流出口4の周囲に多数の毛2を埋め込んだことで
ある。それ以外は従来例と同じである。この多数の毛で
なるブラシは、例えば、耐酸性のある弗化ビニール等て
製作する。また、図面には示していないが、弗酸配管3
aを矢印の方向に移動させる送り機構が設けられている
。このことにより、常に弗酸を流しながら、炉芯管1の
回転に伴い、ブラシで内面を拭くことになる。FIG. 1 is a cross-sectional view for explaining one embodiment of the furnace core tube cleaning device of the present invention, FIG. 2 is a cross-sectional view along line AA in FIG. 1, and FIG. 3 is a cross-sectional view along line BB in FIG. As shown in the figure, this furnace core tube cleaning device has a hydrofluoric acid pipe 3a into which hydrofluoric acid, which is a cleaning liquid, is poured.
A large number of hairs 2 are embedded around the hydrofluoric acid outlet 4. Other than that, it is the same as the conventional example. This multi-bristle brush is made of acid-resistant vinyl fluoride, for example. Also, although not shown in the drawing, the hydrofluoric acid piping 3
A feeding mechanism is provided to move a in the direction of the arrow. As a result, the inner surface is wiped with a brush as the furnace core tube 1 rotates while constantly flowing hydrofluoric acid.
このような炉芯管洗浄装置を用いて、例えば8インチウ
ェーハが挿入される炉芯管を洗浄したところ、従来、弗
酸が40!!以上必要としていたのかIQA’以下で済
み、従来、洗浄時間が3時間以上必要としていたところ
を、僅かに5分以内で済むという結果が得られた。When using such a furnace core tube cleaning device to clean a furnace core tube into which an 8-inch wafer is inserted, conventionally, hydrofluoric acid was 40! ! The result was that the cleaning time required was less than IQA', and the cleaning time, which conventionally required more than 3 hours, was only 5 minutes or less.
以上説明したように本発明は、洗浄液である薬液を流し
ながら、円筒形の炉芯管内壁を拭くブラシを設けること
によって、洗浄液の消費量をより少く、かつより洗浄時
間の短い炉芯管洗浄装置が得られるという効果がある。As explained above, the present invention provides a brush for wiping the inner wall of the cylindrical furnace core tube while flowing a chemical solution, which is the cleaning fluid, thereby reducing the amount of cleaning fluid consumed and cleaning the furnace core tube in a shorter cleaning time. This has the effect of providing a device.
第1図は本発明の炉芯管洗浄装置の一実施例を説明する
ための断面図、第2図は第1図のAA断面図、第3図は
第1図のBB断面図、第4図は従来の炉芯管洗浄装置の
一例を説明するための断面図である。
1・・炉芯管、2・・・毛、3,3a・・・弗酸配管、
4・・・弗酸流出口、5・・・回転ローラ。FIG. 1 is a sectional view for explaining one embodiment of the furnace core tube cleaning device of the present invention, FIG. 2 is a sectional view taken along line AA in FIG. 1, FIG. The figure is a sectional view for explaining an example of a conventional furnace core tube cleaning device. 1... Furnace core tube, 2... Hair, 3, 3a... Hydrofluoric acid piping,
4...Hydrofluoric acid outlet, 5...Rotating roller.
Claims (1)
炉芯管に挿入されるとともに洗浄用薬液を注ぐ一面側に
洗浄液流出口が多数明けられた洗浄液供給管と、この洗
浄液供給管の前記一面側に埋め込まれたブラシとを有す
ることを特徴とする炉芯管洗浄装置。A rotating roller on which a furnace core tube is placed and rotated; a cleaning liquid supply pipe that is inserted into the furnace core tube and has a number of cleaning liquid outlet ports on one side into which a cleaning chemical solution is poured; and one side of the cleaning liquid supply pipe. A furnace core tube cleaning device characterized by having a brush embedded in the furnace core tube cleaning device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016853A JPH03221180A (en) | 1990-01-25 | 1990-01-25 | Apparatus for washing core pipe |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016853A JPH03221180A (en) | 1990-01-25 | 1990-01-25 | Apparatus for washing core pipe |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03221180A true JPH03221180A (en) | 1991-09-30 |
Family
ID=11927776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016853A Pending JPH03221180A (en) | 1990-01-25 | 1990-01-25 | Apparatus for washing core pipe |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03221180A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104674264A (en) * | 2015-02-05 | 2015-06-03 | 邯郸新兴特种管材有限公司 | Method for washing inside surface of bi-metallic compound seamless steel pipe with acid by utilizing supporting wheel device |
JP2018178230A (en) * | 2017-04-20 | 2018-11-15 | 山田 榮子 | Coil rolling device for scarfing skin of steel wire material |
-
1990
- 1990-01-25 JP JP2016853A patent/JPH03221180A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104674264A (en) * | 2015-02-05 | 2015-06-03 | 邯郸新兴特种管材有限公司 | Method for washing inside surface of bi-metallic compound seamless steel pipe with acid by utilizing supporting wheel device |
JP2018178230A (en) * | 2017-04-20 | 2018-11-15 | 山田 榮子 | Coil rolling device for scarfing skin of steel wire material |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN102971085B (en) | roll coater | |
US5896875A (en) | Equipment for cleaning, etching and drying semiconductor wafer and its using method | |
US6776691B2 (en) | Polishing/cleaning method as well as method of making a wiring section using a polishing apparatus | |
CN102273329B (en) | Immersive oxidation and etching process for cleaning silicon electrodes | |
JPH0644986B2 (en) | Process gas supply piping device | |
CN101652837A (en) | Methodology for cleaning of surface metal contamination from electrode assemblies | |
TW531677B (en) | Method for making a liquid crystal display panel and a rinsing device therefor | |
TW434655B (en) | Processing apparatus and processing method | |
TW434668B (en) | Wafer rinse apparatus and rinse method of the same | |
CN105983546A (en) | Wafer cleaning method | |
TW200821045A (en) | Discharge nozzle washing apparatus | |
KR20060132987A (en) | Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and proximity substrate preparation sequence, and methods, apparatus, and systems for implementing the same | |
JPH03221180A (en) | Apparatus for washing core pipe | |
TW410178B (en) | Method and apparatus for HF-HF cleaning | |
JPH088222A (en) | Spin processor | |
JP3703281B2 (en) | Substrate processing equipment | |
AU2015200509B2 (en) | Method of forming a film | |
CN204034953U (en) | A kind of liquid roll-on device with Rapid Cleaning system | |
KR100219414B1 (en) | A cleaning apparatus for semiconductor process | |
JPH10209103A (en) | Substrate cleaning equipment | |
TW200305699A (en) | Wet processing bath and fluid supplying system for liquid crystal display manufacturing equipment | |
JPS6365978A (en) | Method and apparatus for surface film treatment of pipe terminal screw | |
JP2002282808A (en) | Quarts tube cleaning device | |
JP3068404B2 (en) | Semiconductor substrate cleaning equipment | |
KR930000402Y1 (en) | Cleaning apparatus of tube |