JPH0321901A - Production of lens array - Google Patents
Production of lens arrayInfo
- Publication number
- JPH0321901A JPH0321901A JP15643789A JP15643789A JPH0321901A JP H0321901 A JPH0321901 A JP H0321901A JP 15643789 A JP15643789 A JP 15643789A JP 15643789 A JP15643789 A JP 15643789A JP H0321901 A JPH0321901 A JP H0321901A
- Authority
- JP
- Japan
- Prior art keywords
- deformable resin
- patterns
- heat deformable
- heat
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 239000011347 resin Substances 0.000 claims abstract description 27
- 229920005989 resin Polymers 0.000 claims abstract description 27
- 238000000034 method Methods 0.000 claims abstract description 18
- 238000005530 etching Methods 0.000 claims abstract description 4
- 238000010438 heat treatment Methods 0.000 claims abstract description 4
- 238000000059 patterning Methods 0.000 claims abstract description 4
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 238000003491 array Methods 0.000 abstract description 5
- 206010034972 Photosensitivity reaction Diseases 0.000 abstract description 2
- 230000036211 photosensitivity Effects 0.000 abstract description 2
- 239000012780 transparent material Substances 0.000 abstract description 2
- 230000000873 masking effect Effects 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000010408 film Substances 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、微小なレンズ体が規則的に配列して成るレン
ズアレイ体の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a lens array body in which minute lens bodies are regularly arranged.
１０〜数１００μｍ程度のレンズ径を有するマイクロレ
ンズ、あるいはそれらのマイクロレンズを規則的に配列
して構成したレンズアレイは、ファクシミリや電子複写
機等の結像光学系に、あるいは光ファイバコネクタの光
学系などに応用されている。前記レンズ径を有するマイ
クロレンズ（マイクロレンズアレイ）のうち、実用化に
到っているものは大別して２種あり、一つは分布屈折率
型平板マイクロレンズであり、一つは凸もしくは凹形状
レンズである。上記マイクロレンズに関する参考文献と
しては、
■電気学会誌１０３ ［２］ ｐｌ２７ （１９８３）
、■Ａｐｐｌｉｅｄ Ｏｐｔｉｃｓ（アブライドオプ
ティクス）誌 ２７ ［７］ ｐ１２８１（１９８８）
等がある。このうち形状レンズは製造方法が簡便であり
、したがって製造コストが安く、また、レンズの製造段
階で他の部品と一体化させることが出来るという利点を
有している。形状レンズの作製法としてはいくつかのも
のが提案されているが、中でも前記参考文献■、特開昭
６０−６０７５６等にみられる、熱変形性樹脂の加熱変
形を利用する方法（以下、熱変形法とする）は、通常の
フォトリソグラフィーの手法を利用した極めて量産性に
優れた方法である。Microlenses with a lens diameter of about 10 to several 100 μm, or lens arrays made by regularly arranging these microlenses, are used in imaging optical systems such as facsimile machines and electronic copying machines, or optical fiber connectors. It is applied to systems etc. Among the microlenses (microlens arrays) having the above lens diameter, there are two types that have reached practical use: one is a distributed index flat microlens, and the other is a convex or concave microlens. It's a lens. References regarding the above microlens include: ■ Journal of the Institute of Electrical Engineers of Japan 103 [2] pl27 (1983)
, ■Applied Optics magazine 27 [7] p1281 (1988)
etc. Among these, shaped lenses have the advantage of being simple to manufacture, therefore having low manufacturing costs, and being able to be integrated with other parts at the lens manufacturing stage. Several methods have been proposed for producing shaped lenses, among them a method that utilizes heat deformation of a thermodeformable resin (hereinafter referred to as "heat deformation"), as found in the above-mentioned reference document ①, Japanese Patent Laid-Open No. 60-60756, etc. The modified method) is a method that utilizes ordinary photolithography techniques and is extremely suitable for mass production.
しかしこの方法は、熱変形性樹脂が感光性樹脂であるた
めに、樹脂の透過率番二制約がある、厚膜化するとバタ
ーニング精度が落ちるという課題を有していた。そこで
本発明は以上のような課題を解決するもので、その目的
とするところは感光性樹脂を用いない熱変形法を提供す
ることにある．〔課題を解決するための手段〕
上記課題を解決するために本発明のレンズアレイの製造
方法は、あらかじめ作製された熱変形性樹脂パターンを
加熱し、前記熱変形性樹脂パターンを変形することによ
り個々のマイクロレンズを作製するレンズアレイの製造
方法に於て、前記熱変形性樹脂パターンを、熱変形性樹
脂をマスクを介してエッチングすることにより得ること
を特徴とする。また、前記マスクを、金属薄膜のバター
ニングにより得ることを特徴とする。However, this method has problems in that since the heat-deformable resin is a photosensitive resin, there is a limit to the transmittance of the resin, and that patterning accuracy deteriorates as the film becomes thicker. Therefore, the present invention is intended to solve the above-mentioned problems, and its purpose is to provide a thermal deformation method that does not use photosensitive resin. [Means for Solving the Problems] In order to solve the above problems, the method for manufacturing a lens array of the present invention includes heating a heat-deformable resin pattern prepared in advance and deforming the heat-deformable resin pattern. The method for manufacturing a lens array in which individual microlenses are manufactured is characterized in that the heat-deformable resin pattern is obtained by etching the heat-deformable resin through a mask. Further, the mask is obtained by patterning a metal thin film.
上記の手段によれば、熱変形性樹脂は感光性を持ってい
る必要が無いため、光学的に透明な材料を選ぶことがで
きる。又、光反応を利用してパターンを作製するのでは
ないので、厚膜化しても精度のよいパターンを作製する
ことができる。According to the above means, since the thermodeformable resin does not need to have photosensitivity, an optically transparent material can be selected. Furthermore, since the pattern is not created using a photoreaction, a highly accurate pattern can be created even if the film is thickened.
以下、実施例に基付き本発明を詳細に説明する。 Hereinafter, the present invention will be explained in detail based on Examples.
但し、本発明は以下の実施例に限定されるものではない
。However, the present invention is not limited to the following examples.
［実施例］
第１図に基づき実施例を説明する。まず、 （ａ）に示
すように、パイレヅクス基板１０１上にＰＭＭＡ薄膜１
０２を腹厚１６．９μｍになるように成膜した。次に（
ｂ）、 （Ｃ）に示すようにアルミニウム１０３を０３
４μｍ，ポジフオトレジスト１０４を１．２μｍ成膜
した。次に、 （ｄ）に示すように、所望のパターンを
有するフォトマスク１０５を用いて、ＵＶ光１０６で、
フォトレジスト１０４を露光し、 （ｅ）に示すように
、現像を行なった。次に、 （ｆ）に示すように、フォ
トレジスト１０４をマスクとしてアルミニウム１０３を
酸を用いてエッチングし、更に（ｇ）に示すように、ア
ルミニウム１０３をマスクとしてアセトンを用いて Ｐ
ＭＭＡ１０２をエッチングした。最後にＰＭＭＡ１０２
の上に残るアルミニウム１０３を酸を用いて剥離し、
（ｈ）に示すようなＰＭＭＡのパターン幅３０μｍ、高
さ１６．９μｍの断面が矩形であるパターンを得た。[Example] An example will be described based on FIG. First, as shown in (a), a PMMA thin film 1 is deposited on a Pyrex substrate 101.
02 was formed into a film having a thickness of 16.9 μm. next(
b), As shown in (C), aluminum 103 is 03
A positive photoresist 104 was formed to a thickness of 1.2 μm. Next, as shown in (d), using a photomask 105 having a desired pattern, UV light 106 is used to
The photoresist 104 was exposed and developed as shown in (e). Next, as shown in (f), the aluminum 103 is etched using acid using the photoresist 104 as a mask, and as shown in (g), P is etched using acetone using the aluminum 103 as a mask.
MMA102 was etched. Finally PMMA102
Peel off the aluminum 103 remaining on top using acid,
A PMMA pattern as shown in (h) with a width of 30 μm and a height of 16.9 μm and a rectangular cross section was obtained.
このパターンをｉｓｏ’ｃで熱処理することにより、Ｐ
ＭＭＡは熱流動を起こし、表面張力で（ｉ）に示すよう
な幅６５μｍのレンズパターンを得ることができた。By heat-treating this pattern with iso'c, P
MMA caused thermal flow, and due to surface tension, a lens pattern with a width of 65 μm as shown in (i) could be obtained.
このレンズアレイの個々のレンズの焦点距離は１００μ
ｍであった。又、可視光領域（３９ｏｎｍ〜７６０ｎｍ
）での光透過率は全領域にわたって９０％以上有りほぼ
均一であった。一方、このような手法を用いずに、ボジ
レジストＴＦ−２０ （Ｓｈｉｐｌｅｙ社製）を用イテ
、直接パターニングをして全く同様の焦点距離を持つレ
ンズを作製したが、５５０ｎｍ以下での透過率が悪く、
赤く着色していた。また、このような厚膜になると、精
度のよいパターニングは不可能であり、作製するレンズ
アレイの個々のレンズの焦点距離に大きなばらつきを生
じてしまった。The focal length of each lens in this lens array is 100μ
It was m. In addition, visible light region (39onm to 760nm
) The light transmittance was 90% or more over the entire area and was almost uniform. On the other hand, instead of using this method, we used BosiResist TF-20 (manufactured by Shipley) and directly patterned it to create a lens with exactly the same focal length, but the transmittance below 550 nm was poor. ,
It was colored red. In addition, such a thick film makes it impossible to pattern with high precision, resulting in large variations in the focal lengths of the individual lenses in the fabricated lens array.
以上説明したように、本発明によれば、あらかじめ作製
された熱変形性樹脂パターンを加熱し、前記熱変形性樹
脂パターンを変形することにより個々のマイクロレンズ
を作製するレンズアレイの製造方法に於て、前記熱変形
性樹脂パターンを、熱変形性樹脂をマスクを用いてエッ
チングすることにより作製するという手段を用いること
により、熱変形性樹脂の選択の自由度が高くなり、様々
なスペックのレンズアレイに対応することができる。As explained above, according to the present invention, there is provided a method for manufacturing a lens array in which individual microlenses are manufactured by heating a heat-deformable resin pattern prepared in advance and deforming the heat-deformable resin pattern. By using the method of producing the heat-deformable resin pattern by etching the heat-deformable resin using a mask, the degree of freedom in selecting the heat-deformable resin is increased, and lenses with various specifications can be produced. Arrays can be supported.
したがって、本発明は、多様なレンズアレイの要求スペ
ックに答え得るレンズアレイの製造方法であると言える
。Therefore, it can be said that the present invention is a method for manufacturing a lens array that can meet various required specifications of lens arrays.
第１図は本発明の実施例の説明図である。 １ ０ １ １０２ １ ０３ １ ０４ １ ０５ １ ０ ６ バイレックス基板 ＰＭＭＡ薄族 アルミニウム薄膜 ボジレジスト フォトマスク ＵＶ光 ｃｔＪ＞ FIG. 1 is an explanatory diagram of an embodiment of the present invention. 1 0 1 102 1 03 1 04 1 05 1 0 6 virex board PMMA thin tribe aluminum thin film body resist photo mask UV light ctJ＞
Claims (2)
熱し、前記熱変形性樹脂パターンを変形することにより
個々のマイクロレンズを作製するレンズアレイの製造方
法に於て、前記熱変形性樹脂パターンを、熱変形性樹脂
をマスクを介してエッチングすることにより得ることを
特徴とする、レンズアレイの製造方法。(1) In a method for manufacturing a lens array in which individual microlenses are manufactured by heating a heat-deformable resin pattern prepared in advance and deforming the heat-deformable resin pattern, the heat-deformable resin pattern is A method for manufacturing a lens array, characterized in that the lens array is obtained by etching a thermodeformable resin through a mask.
ることを特徴とするレンズアレイの製造方法。(2) A method for manufacturing a lens array, characterized in that the mask is obtained by patterning a thin metal film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15643789A JPH0321901A (en) | 1989-06-19 | 1989-06-19 | Production of lens array |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15643789A JPH0321901A (en) | 1989-06-19 | 1989-06-19 | Production of lens array |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0321901A true JPH0321901A (en) | 1991-01-30 |
Family
ID=15627735
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15643789A Pending JPH0321901A (en) | 1989-06-19 | 1989-06-19 | Production of lens array |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0321901A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4234740A1 (en) * | 1992-10-15 | 1994-04-21 | Joachim Hentze | Method and device for producing optical lenses or the like |
| US5605783A (en) * | 1995-01-06 | 1997-02-25 | Eastman Kodak Company | Pattern transfer techniques for fabrication of lenslet arrays for solid state imagers |
| US5723264A (en) * | 1996-03-14 | 1998-03-03 | Eastman Kodak Company | Pattern transfer techniques for fabrication of lenslet arrays using specialized polyesters |
| US6043001A (en) * | 1998-02-20 | 2000-03-28 | Eastman Kodak Company | Dual mask pattern transfer techniques for fabrication of lenslet arrays |
| US7575845B2 (en) | 1997-08-08 | 2009-08-18 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
-
1989
- 1989-06-19 JP JP15643789A patent/JPH0321901A/en active Pending
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4234740A1 (en) * | 1992-10-15 | 1994-04-21 | Joachim Hentze | Method and device for producing optical lenses or the like |
| DE4234740C2 (en) * | 1992-10-15 | 1997-12-11 | Joachim Hentze | Process for the production of optical elements |
| US5605783A (en) * | 1995-01-06 | 1997-02-25 | Eastman Kodak Company | Pattern transfer techniques for fabrication of lenslet arrays for solid state imagers |
| US5691116A (en) * | 1995-01-06 | 1997-11-25 | Eastman Kodak Company | Pattern transfer techniques for fabrication of lenslet arrays for solid state imagers |
| US5723264A (en) * | 1996-03-14 | 1998-03-03 | Eastman Kodak Company | Pattern transfer techniques for fabrication of lenslet arrays using specialized polyesters |
| US7575845B2 (en) | 1997-08-08 | 2009-08-18 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
| US7943275B2 (en) | 1997-08-08 | 2011-05-17 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
| US7965446B2 (en) | 1997-08-08 | 2011-06-21 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
| US7998662B2 (en) | 1997-08-08 | 2011-08-16 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
| US8268546B2 (en) | 1997-08-08 | 2012-09-18 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
| US8785108B2 (en) | 1997-08-08 | 2014-07-22 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
| US8815130B2 (en) | 1997-08-08 | 2014-08-26 | Dai Nippon Printing Co., Ltd. | Method for producing a lens |
| US6043001A (en) * | 1998-02-20 | 2000-03-28 | Eastman Kodak Company | Dual mask pattern transfer techniques for fabrication of lenslet arrays |
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