JPH03206056A - Production of dichloro-(2,2)-paracyclophane - Google Patents
Production of dichloro-(2,2)-paracyclophaneInfo
- Publication number
- JPH03206056A JPH03206056A JP34223089A JP34223089A JPH03206056A JP H03206056 A JPH03206056 A JP H03206056A JP 34223089 A JP34223089 A JP 34223089A JP 34223089 A JP34223089 A JP 34223089A JP H03206056 A JPH03206056 A JP H03206056A
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- quaternary ammonium
- dichloro
- methylbenzyl
- paracyclophane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- KAWOYOQFRXSZQI-UHFFFAOYSA-N 10366-05-9 Chemical compound C1CC(=CC=2)C(Cl)=CC=2CCC2=CC=C1C(Cl)=C2 KAWOYOQFRXSZQI-UHFFFAOYSA-N 0.000 title claims abstract 3
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000000126 substance Substances 0.000 claims abstract description 5
- 239000000908 ammonium hydroxide Substances 0.000 claims abstract description 4
- 125000001453 quaternary ammonium group Chemical group 0.000 claims abstract description 4
- 238000005985 Hofmann elimination reaction Methods 0.000 claims description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 5
- OOLUVSIJOMLOCB-UHFFFAOYSA-N 1633-22-3 Chemical compound C1CC(C=C2)=CC=C2CCC2=CC=C1C=C2 OOLUVSIJOMLOCB-UHFFFAOYSA-N 0.000 claims description 3
- 239000012320 chlorinating reagent Substances 0.000 claims 1
- 230000002194 synthesizing effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 11
- 150000003242 quaternary ammonium salts Chemical class 0.000 abstract description 6
- 150000001875 compounds Chemical class 0.000 abstract description 5
- 239000011347 resin Substances 0.000 abstract description 4
- 229920005989 resin Polymers 0.000 abstract description 4
- 238000003379 elimination reaction Methods 0.000 abstract description 3
- PMDRJZUQYMFWSP-UHFFFAOYSA-M trimethyl-[(4-methylphenyl)methyl]azanium;chloride Chemical compound [Cl-].CC1=CC=C(C[N+](C)(C)C)C=C1 PMDRJZUQYMFWSP-UHFFFAOYSA-M 0.000 abstract description 3
- 150000001555 benzenes Chemical class 0.000 abstract description 2
- HTSZBLOGCUSZOZ-UHFFFAOYSA-M chloromethyl-dimethyl-[(4-methylphenyl)methyl]azanium;chloride Chemical compound [Cl-].CC1=CC=C(C[N+](C)(C)CCl)C=C1 HTSZBLOGCUSZOZ-UHFFFAOYSA-M 0.000 abstract 1
- 230000008030 elimination Effects 0.000 abstract 1
- 239000002994 raw material Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 18
- 239000000243 solution Substances 0.000 description 11
- 239000000047 product Substances 0.000 description 10
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical group [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000005660 chlorination reaction Methods 0.000 description 6
- 238000007664 blowing Methods 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 238000004817 gas chromatography Methods 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 4
- -1 polymonochloroparaxylylene Polymers 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 239000012279 sodium borohydride Substances 0.000 description 4
- 229910000033 sodium borohydride Inorganic materials 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- DMHZDOTYAVHSEH-UHFFFAOYSA-N 1-(chloromethyl)-4-methylbenzene Chemical compound CC1=CC=C(CCl)C=C1 DMHZDOTYAVHSEH-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000012043 crude product Substances 0.000 description 3
- 125000003963 dichloro group Chemical group Cl* 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- KZNRNQGTVRTDPN-UHFFFAOYSA-N 2-chloro-1,4-dimethylbenzene Chemical group CC1=CC=C(C)C(Cl)=C1 KZNRNQGTVRTDPN-UHFFFAOYSA-N 0.000 description 2
- 125000001309 chloro group Chemical class Cl* 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- RGDYIHSZBVIIND-UHFFFAOYSA-N 1-(dichloromethyl)-4-methylbenzene Chemical compound CC1=CC=C(C(Cl)Cl)C=C1 RGDYIHSZBVIIND-UHFFFAOYSA-N 0.000 description 1
- GTLWADFFABIGAE-UHFFFAOYSA-N 1-chloroethylbenzene Chemical compound CC(Cl)C1=CC=CC=C1 GTLWADFFABIGAE-UHFFFAOYSA-N 0.000 description 1
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は下記構造式
CI!
CI
で表されるジクロロー(2.2)一ノぞラシク口ファン
の製造方法に関するものである。本化合物はポリジクロ
ロ・・゛ラキシリレン樹脂製造の際の中間化合物として
既知の物質で、この樹脂は真空蒸着によう材料表面に膜
として形成され、電気特性、高温特性等に優れた性能を
有し、半導体等電子部品や宇宙機器用部品等の被覆に広
く用いられる。DETAILED DESCRIPTION OF THE INVENTION Industrial Field of Application The present invention relates to the following structural formula CI! This invention relates to a method for manufacturing a dichloro(2.2) one-nozo Lasik mouth fan represented by CI. This compound is a substance known as an intermediate compound in the production of polydichloro...raxylylene resin. This resin is formed as a film on the surface of the material by vacuum evaporation, and has excellent electrical properties and high-temperature properties. It is widely used for coating electronic components such as semiconductors and parts for space equipment.
このノクロロー(212) − 18ラシクロファンは
(2.2)ノぞラシク口ファンの直接塩素化によう造ら
れるか、又は、2(5)一クロローp−メチルベンノル
クロライドよD、(2.2)一パラシクロファンと同様
、第四級アンモニウム塩、第四級アンモニウムヒドロキ
シドを経てホフマン脱離反応によシ造られる(特開昭6
3−93740号公報、特開昭64−45322号公報
等)。そして、この後者の製造方法の出発物質である2
(5)一クロローp−メチルベンジルクロライドはp−
メチルベンジルクロライドあるいは2−クロローp−キ
シレンを塩素化して造られる。This chloro(212)-18 laciclophane can be produced by direct chlorination of (2.2) cyclophane or by 2(5) monochlorop-methylbennorchloride D, (2 .2) Like mono-paracyclophane, it is produced by Hofmann elimination reaction via quaternary ammonium salt and quaternary ammonium hydroxide (Japanese Patent Application Laid-open No. 6
3-93740, JP-A-64-45322, etc.). The starting material for this latter production method is 2
(5) Monochloro p-methylbenzyl chloride is p-
It is produced by chlorinating methylbenzyl chloride or 2-chlorop-xylene.
発明が解決しようとする問題点
(2.2)バラシクロファンの直接塩素化法は収率はよ
いが、その重合生戒物であるポリモノクロロパラキシリ
レン樹脂の性能を劣化させるアルファ塩素置換体の副生
金なくすることも、又、その除去も困難である。Problems to be Solved by the Invention (2.2) The direct chlorination method of valacyclophane has a good yield, but the alpha chlorine substituted product deteriorates the performance of polymonochloroparaxylylene resin, which is the polymerization product. It is difficult to eliminate or eliminate by-products.
ホフマン脱離反応を経由する後者の方法の問題点+7)
− ツハ、2 (5)一クロローp−メチルベンノル
クロライドの製造である。この製造方法としては、前述
のように
(4)、ω)二つのルートがあるがいずれの方法も製造
は煩雑で、しかも、反応で選択的にベンゼン核の一塩素
置換体のみを得ることはできず、出発物質や多塩素置換
体の混合物からの分離が必要となるが、これらの分離精
製はかなう困難であり、結果として、安価な、純度のよ
いジクロロー(2.2) −・ぞラシク口ファンが市場
に存在しない原因の一つとなっている。Problems with the latter method via Hoffmann elimination reaction +7)
- Tsuha, 2 (5) Production of monochloro p-methylbenol chloride. As mentioned above, there are two routes for this production (4) and ω), but the production is complicated in either method, and it is difficult to selectively obtain only monochlorinated benzene nuclei through the reaction. However, these separations and purifications are difficult to achieve, and as a result, inexpensive and highly pure dichloro(2.2) This is one of the reasons why mouth fans do not exist on the market.
他の問題点としてはホフマン脱離反応にネ・ける収率の
問題があシ、この問題点の解決のために種々の提案がな
されている(前記公開特許公報)。Another problem is the yield problem associated with the Hofmann elimination reaction, and various proposals have been made to solve this problem (see the above-mentioned published patent application).
本発明の目的は第1の問題点の解決にある。即ち、よシ
容易に、かつ、選択的に一塩素置換体を得る方法を提供
し、結果として、安価で純度のよいノクロロー(2.2
)一パラシクロファンの製造を可能ならしめようとする
ものである。An object of the present invention is to solve the first problem. That is, we provide a method for easily and selectively obtaining a monochlorine substituted product, and as a result, we have provided a method for obtaining a monochlorine substituted product easily and selectively, and as a result, we have provided a method for obtaining a monochlorine substituted product at low cost and with good purity.
) The aim is to make it possible to manufacture paracyclophane.
問題点を解決するための手段
本発明者は、この問題解決のため研究を続けた結果、い
ま1での反応ルートとは異なう下記反応式
に示すように第四級アンモニウム塩を塩素化することに
よシ選択的にベンゼン核の一塩素置換体が生成すること
を見出した。この第四級アンモニウム塩の塩素化ではp
−メチルベンノルクロライドあるいは2−クロローpキ
シレンの塩素化とは異なり、その水溶液に塩素ガスを吹
込むだけで選択的にそのベンゼン核の一塩素置換体だけ
が生或することは驚くべき発見であった。Means for Solving the Problem As a result of continuing research to solve this problem, the present inventor chlorinated a quaternary ammonium salt as shown in the following reaction formula, which is different from the reaction route in 1. It was found that a monochlorine-substituted benzene nucleus was produced in a particularly selective manner. In this chlorination of quaternary ammonium salt, p
-Unlike the chlorination of methylbenol chloride or 2-chloro-p-xylene, it was a surprising discovery that only the monochlorine-substituted benzene nucleus was selectively produced by simply blowing chlorine gas into the aqueous solution. there were.
この第四級アンモニウム塩、即ち、p−メチルベンジル
トリメチルアンモニウムクロライドは、p−メチルベン
ジルクロライドのエーテル等の溶液中にトリメチルアミ
ンを吹込み反応させて造ることが一般的であるが、トリ
メチルアミン水溶液を使用して造る方法が操作上簡単で
ある。両者は混合して攪拌するだけで反応し、反応が終
わると均一な液体となる。発熱があるから状況に応じで
冷却する。反応は室温でも進行する。次に、この反応溶
液に、攪拌しながら塩素ガスを導入する。This quaternary ammonium salt, i.e., p-methylbenzyltrimethylammonium chloride, is generally produced by blowing trimethylamine into a solution of p-methylbenzyl chloride such as ether, and causing a reaction; however, an aqueous solution of trimethylamine is used. The method of making it is easy to operate. The two react simply by mixing and stirring, and when the reaction is complete, a homogeneous liquid forms. It generates heat, so cool it down depending on the situation. The reaction proceeds even at room temperature. Next, chlorine gas is introduced into this reaction solution while stirring.
反応熱によシ内温か上昇するから適宜冷却する。The internal temperature rises due to the heat of reaction, so cool it appropriately.
反応温度は特に限定しないが高すぎると以下に述べる分
解反応等が起き収率が低下し、低すぎ゛ると沈澱が生成
するため攪拌に支障が生じるため60〜0℃の範囲が望
1しい。The reaction temperature is not particularly limited, but if it is too high, the decomposition reaction described below will occur and the yield will decrease, and if it is too low, a precipitate will form, which will hinder stirring, so a range of 60 to 0°C is preferable. .
反応の進行状態はガスクロマトグラフィー(以下、GC
)分析等で追跡できる。この第四級アンモニウム塩は
温度が高いと下式
のように分解するから、これを利用し反応進行状況を知
ることができる。GC分析上のp−メチルーベンジルク
ロライドが検出されなくなったら塩素の吹込みを中止す
る。過剰の塩素は窒素等の不活性ガスを吹込み、できる
だけ追出しておく。The progress of the reaction can be monitored by gas chromatography (hereinafter referred to as GC).
) can be tracked through analysis, etc. This quaternary ammonium salt decomposes as shown in the formula below when the temperature is high, so this can be used to determine the progress of the reaction. When p-methyl-benzyl chloride is no longer detected by GC analysis, stop blowing chlorine. Excess chlorine should be removed as much as possible by blowing inert gas such as nitrogen.
次に、この溶液にジオキサンと苛性アルカリを加え、加
熱しホフマン脱離反応を行う。このホフマン脱離反応前
に水素化ほう素ナトリウムC以下SBH )等の還元剤
を加えると生成物の着色を減ずることができる。Next, dioxane and caustic alkali are added to this solution and heated to perform a Hofmann elimination reaction. If a reducing agent such as sodium borohydride (SBH) is added before this Hofmann elimination reaction, the coloration of the product can be reduced.
実施例
以下に本発明の実施例を示すがこれは単に本発明の具体
例を示すためのものであってこれによって本発明が限定
されるものではないことは当然である。EXAMPLES Examples of the present invention will be shown below, but these are merely to illustrate specific examples of the present invention, and it goes without saying that the present invention is not limited thereto.
実施例l
p−メチルベン・ゾルクロライド14&と30%トリメ
チ゛ルアミン水溶液241t−水冷しつつ攪拌した。溶
液が均一透明になったら、この溶液に塩素ガスを吹込み
反応を行った。発熱によシ内温が上昇するが20℃以上
にならないようにした。Example 1 p-Methylben sol chloride 14 and 30% trimethylamine aqueous solution 241 were stirred while cooling with water. When the solution became uniform and transparent, chlorine gas was blown into the solution to perform a reaction. The internal temperature rose due to heat generation, but was prevented from rising above 20°C.
GC分析でp−メチルベ/ジルクロライドのピークが検
出されなくなった時点を反応の終点とした。The end point of the reaction was defined as the point at which the peak of p-methylbe/zyl chloride was no longer detected by GC analysis.
後、窒素を吹込み過剰の塩素を追出し、これに160m
/のジオキサンを加えた。これに85%水酸化カリウム
38g/水34mt溶液を内温40℃以下に保つように
して攪拌しつつ滴下、更にSBH(水素化ほう素ナトリ
ウム12%、水酸化ナトリウム40%水溶液、以下同じ
”)2ml加えた。以後、約2時間30分をかけ80℃
まで昇温し、その温度で40時間反応をつづけた。反応
物を水にあけ、沈澱物を済取、洗浄、乾燥した。沈澱物
はトルエン70ml!に加温溶解、不溶物を除去、トル
エンを留去しジクロロー(2.2)−ノぐラシクロノア
ンを得た。After that, nitrogen was blown in to drive out excess chlorine, and 160 m
/ of dioxane was added. A solution of 38 g of 85% potassium hydroxide/34 mt of water was added dropwise to this while stirring while keeping the internal temperature below 40°C, and then SBH (12% sodium borohydride, 40% sodium hydroxide aqueous solution, same hereinafter) 2 ml was added. After that, it was heated at 80℃ for about 2 hours and 30 minutes.
The reaction was continued at that temperature for 40 hours. The reaction product was poured into water, and the precipitate was collected, washed, and dried. The precipitate is 70ml of toluene! The mixture was dissolved by heating, insoluble matter was removed, and toluene was distilled off to obtain dichloro(2.2)-noguracyclonoane.
な>、(2,2)一ノぞラシクロファン及び三塩素置換
体以上のものはGC分析で検出されないか、又は、無視
できる程度であった (以下の実施例にむいても同じ)
。(2,2) monozoraciclophane and trichlorine substituted products or higher were not detected by GC analysis or were negligible (the same applies to the following examples).
.
粗製品収量 12.3.9
収率 89.1%
不溶物 1.7.9
製品収量 10.2!i
収率 73,9%
実施例2
p−メチルベンジルクロライド14Jと15%トリメチ
ルアミン水溶液48gを攪拌混合した。Crude product yield 12.3.9 Yield 89.1% Insoluble matter 1.7.9 Product yield 10.2! i Yield 73.9% Example 2 14 J of p-methylbenzyl chloride and 48 g of a 15% aqueous trimethylamine solution were mixed with stirring.
溶液が均一透明になったとき、この溶液に内温5℃以下
に保つように冷却しながら塩素ガスを吹込み反応を行っ
た。途中、沈澱が析出し攪拌状態が悪くなったので更に
10mlの水を加えた。GC分析で反応の終了を確認し
た後、窒素を吹込み過剰の塩素を追出した。この溶液に
ジオキサン160ml f加え、攪拌冷却し、内温20
℃以下に保つように粒状85多水酸化カリウム及びSB
H 2mA’を加えた。以後約3時間をかけ80℃1
で昇温し、その温度で40時間反応を続けた。反応終了
後の処理は実施例1と同じ。When the solution became homogeneous and transparent, chlorine gas was blown into the solution while cooling the solution to keep the internal temperature below 5° C. to carry out a reaction. During the process, a precipitate formed and the stirring condition worsened, so another 10 ml of water was added. After confirming the completion of the reaction by GC analysis, excess chlorine was removed by blowing in nitrogen. Add 160 ml of dioxane to this solution, stir and cool, and the internal temperature is 20 ml.
Granular 85% potassium polyhydroxide and SB to keep below ℃
2 mA' of H was added. After that, it was heated at 80℃1 for about 3 hours.
The temperature was raised at 100° C., and the reaction was continued at that temperature for 40 hours. The treatment after the completion of the reaction was the same as in Example 1.
粗製品収量 1 1. 9 !!
収率 86.2%
不溶物 1.9g
製品収量 9.8g
収率 71.0多
実施例3
塩素化温度が50℃以下、ホフマン脱離反応時間が40
時間である以外は実施例1と同じで、次の結果を得た。Crude product yield 1 1. 9! ! Yield: 86.2% Insoluble matter: 1.9g Product yield: 9.8g Yield: 71.0Multiple Example 3 Chlorination temperature is 50°C or less, Hofmann elimination reaction time is 40
The procedure was the same as in Example 1 except for the time, and the following results were obtained.
粗製品収量 11.6J9
収率 84.1多
不溶物 0.9#
製品収量 10・3g
収率 74.6多
発明の効果
本発明によれば塩素化工程が著しく簡素化され経済的で
あるばかシでなく、容易に純度の高いジクロロー(2.
2)一パラシクロファンを得ることができる。Crude product yield 11.6J9 Yield 84.1 Multi-insoluble matter 0.9# Product yield 10.3g Yield 74.6 Effects of the invention According to the present invention, the chlorination process is significantly simplified and economical. Dichloromethane (2.
2) One paracyclophane can be obtained.
手
続
補
正
書
(自発)
1,事件の表示
平成1年特許願第3
4
2
2
30号
2.発明の名称
ジクロロ−(2tz) − ieラシクロファンの製造
方法3.補正をする者
事件との関係Procedural amendment (voluntary) 1. Indication of the case 1999 Patent Application No. 3 4 2 2 30 2. Name of the invention Method for producing dichloro-(2tz)-ie laciclophane 3. Relationship with the case of the person making the amendment
Claims (2)
造方法において、p−メチルベンジルトリメチルアンモ
ニウムクロライドを塩素化して2及び/又は5(似下2
(5)で表示)−クロロ−p−メチルベンジルトリメチ
ルアンモニウムクロライドを合成し、後、第四級アンモ
ニウムヒドロキシド、ホフマン脱離反応経由で製造する
ことを特徴とするジクロロ−(2,2)−パラシクロフ
ァンの製造方法。(1) In the method for producing dichloro-(2,2)-paracyclophane having the following structural formula ▲ Numerical formula, chemical formula, table, etc. ▼ 2 and/or 5 (Image 2
Dichloro-(2,2)- characterized by synthesizing -chloro-p-methylbenzyltrimethylammonium chloride (represented by (5)) and then producing it via quaternary ammonium hydroxide and Hofmann elimination reaction. Method for producing paracyclophane.
記載の製造方法。(2) The manufacturing method according to claim 1, wherein the chlorinating agent is chlorine gas.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34223089A JPH0747553B2 (en) | 1989-12-29 | 1989-12-29 | Process for producing dichloro- (2,2) -paracyclophane |
CA002032714A CA2032714C (en) | 1989-12-29 | 1990-12-19 | Process for the preparation of dichloro-(2,2)-paracyclophane |
EP90125764A EP0436957B1 (en) | 1989-12-29 | 1990-12-28 | Process for the preparation of dichloro-(2,2)-paracyclophane |
EP93106300A EP0558096B1 (en) | 1989-12-29 | 1990-12-28 | Process for the preparation of dichloro-(2,2)-paracyclophane |
DE69026119T DE69026119T2 (en) | 1989-12-29 | 1990-12-28 | Process for the preparation of dichloro (2,2) -paracyclophanes |
DE90125764T DE69005092T2 (en) | 1989-12-29 | 1990-12-28 | Process for the preparation of dichloro (2,2) paracyclophane. |
US07/913,742 US5679874A (en) | 1989-12-29 | 1992-07-14 | Process for the preparation of dichloro-(2,2)-paracyclophane |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34223089A JPH0747553B2 (en) | 1989-12-29 | 1989-12-29 | Process for producing dichloro- (2,2) -paracyclophane |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03206056A true JPH03206056A (en) | 1991-09-09 |
JPH0747553B2 JPH0747553B2 (en) | 1995-05-24 |
Family
ID=18352123
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP34223089A Expired - Lifetime JPH0747553B2 (en) | 1989-12-29 | 1989-12-29 | Process for producing dichloro- (2,2) -paracyclophane |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0747553B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002340916A (en) * | 2001-05-16 | 2002-11-27 | Kishimoto Sangyo Co Ltd | Bonding agent for dna chip, dna chip and method for manufacturing dna chip |
-
1989
- 1989-12-29 JP JP34223089A patent/JPH0747553B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002340916A (en) * | 2001-05-16 | 2002-11-27 | Kishimoto Sangyo Co Ltd | Bonding agent for dna chip, dna chip and method for manufacturing dna chip |
Also Published As
Publication number | Publication date |
---|---|
JPH0747553B2 (en) | 1995-05-24 |
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