JPH03202116A - Silica glass filter - Google Patents
Silica glass filterInfo
- Publication number
- JPH03202116A JPH03202116A JP34370989A JP34370989A JPH03202116A JP H03202116 A JPH03202116 A JP H03202116A JP 34370989 A JP34370989 A JP 34370989A JP 34370989 A JP34370989 A JP 34370989A JP H03202116 A JPH03202116 A JP H03202116A
- Authority
- JP
- Japan
- Prior art keywords
- particle size
- intermediate layer
- silica powder
- silica glass
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 57
- 239000002245 particle Substances 0.000 claims abstract description 40
- 239000000843 powder Substances 0.000 claims abstract description 24
- 239000003513 alkali Substances 0.000 claims abstract description 4
- 238000010030 laminating Methods 0.000 claims abstract description 4
- 102100025342 Voltage-dependent N-type calcium channel subunit alpha-1B Human genes 0.000 claims abstract description 3
- 101710088658 Voltage-dependent N-type calcium channel subunit alpha-1B Proteins 0.000 claims abstract description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 3
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 3
- 229910001385 heavy metal Inorganic materials 0.000 claims abstract description 3
- 238000001914 filtration Methods 0.000 claims description 25
- 239000000470 constituent Substances 0.000 claims description 7
- 239000002002 slurry Substances 0.000 abstract description 8
- 239000000126 substance Substances 0.000 abstract description 7
- 230000035699 permeability Effects 0.000 abstract description 4
- 229910002026 crystalline silica Inorganic materials 0.000 abstract 5
- 235000012239 silicon dioxide Nutrition 0.000 abstract 5
- 238000000465 moulding Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 18
- 239000000377 silicon dioxide Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 239000011148 porous material Substances 0.000 description 6
- 239000012535 impurity Substances 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 239000006063 cullet Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 238000007569 slipcasting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、半導体製造プロセス等で使用される反応ガス
等のガスの濾過に使用するシリカガラスガスフィルター
に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a silica glass gas filter used for filtering gases such as reaction gases used in semiconductor manufacturing processes and the like.
Ｅ従来の技術〕
従来、この種のガスフィルターとしては、アルミナ、炭
化けい素、ムライト等のセラミックスからなるセラミッ
クフィルター、又はバイコール方式によるガラスフィル
ターが知られている。E. Prior Art Conventionally, as this type of gas filter, ceramic filters made of ceramics such as alumina, silicon carbide, and mullite, and glass filters based on the Vycor system are known.
［発明が解決しようとする課題」
しかしながら、上記従来のセラミックフィルターにおい
ては、その構成粒子が結晶質で多面体で絡み合った構造
となるため、濾過ガスの流れが複雑となって圧力損失が
大きくなると共に、透過率が低下する。又、焼結した粒
子間の境界に明瞭な粒界を生じ、この粒界には、粒界偏
析により粒子内の不純物等が集まって粒子間物が形成さ
れやすく、この粒子間物が腐食性ガスによって侵される
ことによって不純物を溶出すると共に、強度が低下する
問題がある。[Problem to be solved by the invention] However, in the conventional ceramic filter described above, the constituent particles are crystalline and have a polyhedral entangled structure, which complicates the flow of filtered gas and increases pressure loss. , the transmittance decreases. In addition, clear grain boundaries are formed at the boundaries between sintered particles, and at these grain boundaries, impurities within the grains gather due to grain boundary segregation and intergranular substances are likely to be formed, and these intergranular substances are corrosive. There is a problem that impurities are eluted by being attacked by gas and the strength is reduced.
又、バイコール方式のガラスフィルターにおいては、そ
の中に含まれるふっ素、アルカリイオン等の溶出により
、不純物の混入が起こる問題がある。Further, in the Vycor type glass filter, there is a problem that impurities are mixed in due to the elution of fluorine, alkali ions, etc. contained therein.
そこで、本発明は、高純度で、耐薬品性に優れ、かつ高
透過率で、有効濾過面積を向上し得るシリカガラスガス
フィルターの提供を目的とする。Therefore, an object of the present invention is to provide a silica glass gas filter that has high purity, excellent chemical resistance, high transmittance, and can improve the effective filtration area.
［課題を解決するための手段］
前記課題を解決するため、本発明のシリカガラスガスフ
ィルターは、純度が９９．９％以上で、アルカリ、アル
カリ金属、重金属類及びＢＩＩＩ属の元素の総量が１５
０ｐｐｍ以゛下の非晶質シリカ粉末の焼結体からなる多
孔質の支持体、中間層及び濾過層を順次積層して構成さ
れ、支持体の構成粒子の平均粒径の５〜１００μｍ、中
間層の構成粒子の平均粒径を１〜２５μｍ、及び濾過層
の構成粒子の平均粒径を０．１〜１μｍとしたものであ
る。[Means for Solving the Problems] In order to solve the above problems, the silica glass gas filter of the present invention has a purity of 99.9% or more and a total amount of alkali, alkali metals, heavy metals, and elements of group BIII of 15%.
It is constructed by sequentially laminating a porous support made of a sintered body of amorphous silica powder of 0 ppm or less, an intermediate layer, and a filtration layer, and the average particle diameter of the constituent particles of the support is 5 to 100 μm. The average particle size of the particles constituting the layer is 1 to 25 μm, and the average particle size of the particles constituting the filtration layer is 0.1 to 1 μm.
上記手段においては、支持体、中間層及び濾過層により
、いわゆる非対称膜の構造となると共に、構成粒子が非
晶質であるため、結晶質のもののように粒界に粒子同相
が形成されるようなことはなく、均一な連続構造を有し
、かつ固着粒子が球状に近くなり、その表面が平滑とな
る。又、負の静電チャージが非常に大きくなる。In the above method, the support, the intermediate layer, and the filtration layer form a so-called asymmetric membrane structure, and since the constituent particles are amorphous, the same phase of particles is formed at the grain boundaries as in crystalline particles. Instead, it has a uniform continuous structure, and the fixed particles have a nearly spherical shape and have a smooth surface. Also, the negative electrostatic charge becomes very large.
中間層は、支持体と濾過層との結合を強化する一方−１
有効濾過面積を増大する。While the intermediate layer strengthens the bond between the support and the filtration layer-1
Increases effective filtration area.
支持体の構成粒子の平均粒径が、５μｍ未満であるとガ
スの透過が悪くなり、１００μｍを超えると気孔径が大
きくなって中間層及び濾過層が欠落しやすくなる。If the average particle size of the constituent particles of the support is less than 5 μm, gas permeation will be poor, and if it exceeds 100 μm, the pore size will become large and the intermediate layer and filtration layer will be likely to be missing.
中間層の構成粒子の平均粒径が、１μｍ未満であると支
持体の気孔中に入り込んで目詰まりを起こし、ガスの透
過性が悪くなり、２５μｍを超えると支持体及び濾過層
との結合力が弱まって濾過層の強度が低下し、かつ有効
濾過面積の向上に付与しない。If the average particle size of the constituent particles of the intermediate layer is less than 1 μm, they will enter the pores of the support and cause clogging, resulting in poor gas permeability, and if it exceeds 25 μm, the bonding strength between the support and the filtration layer will be reduced. This weakens the strength of the filtration layer, and does not improve the effective filtration area.
又、濾過層の構成粒子の平均粒径が、０．１ｔＬｍ未満
であると中間層の気孔中に入り込んでガスの透過率が低
下すると共に、腐食性気体に対する耐性が低下し、１μ
ｍを超えるとフィルターの平均気孔径が大きくなって半
導体製造プロセスで問題となる微小ダスト等を捕集する
ことが難しい。In addition, if the average particle size of the particles constituting the filtration layer is less than 0.1 tLm, they will enter the pores of the intermediate layer, reducing gas permeability and reducing resistance to corrosive gases.
If it exceeds m, the average pore diameter of the filter becomes large, making it difficult to collect microscopic dust and the like that cause problems in semiconductor manufacturing processes.
［実施例〕 以下、本発明の実施例を詳細に説明する。[Example〕 Examples of the present invention will be described in detail below.
実施例１
火炎法（四塩化けい素（ＳｉＣ１−１を酸素−水素炎中
で熱分解してシリカ（ＳｉＯ□）を得る方法、以下同じ
）で合成した合成シリカガラスカレットをシリカガラス
製ボールミル中で乾式粉砕し、平均粒径４０μｍのシリ
カ粉末を得た。Example 1 A synthetic silica glass cullet synthesized by a flame method (method of thermally decomposing silicon tetrachloride (SiC1-1 in an oxygen-hydrogen flame to obtain silica (SiO□), the same applies hereinafter) was placed in a silica glass ball mill. The powder was dry-pulverized to obtain silica powder with an average particle size of 40 μm.
この粉末に水を添加し、スリップ・キャスティングによ
り直径１５ｍｍ５厚さ２ｍｍの円板に成形した。Water was added to this powder and it was molded into a disc with a diameter of 15 mm and a thickness of 2 mm by slip casting.
成形体を１５００℃の温度で焼成し、非晶質シリカ粉末
の焼結体からなる多孔質の支持体を作製した。The molded body was fired at a temperature of 1500° C. to produce a porous support made of a sintered body of amorphous silica powder.
一方、火炎法で合成した合成シリカガラスカレットをシ
リカガラス製ボールミル中で湿式粉砕し、平均粒径５μ
ｍのシリカ粉末を含むスラリーを得た。このスラリーを
上記支持体の上面に流し、シリカ粒子を付着させた後、
１３００℃の温度で焼成し、支持体上に非晶質シリカ粉
末の焼結体からなる多孔質の中間層を積層した。On the other hand, synthetic silica glass cullet synthesized by the flame method was wet-pulverized in a silica glass ball mill, and the average particle size was 5μ.
A slurry containing m silica powder was obtained. After pouring this slurry onto the top surface of the support and attaching silica particles,
It was fired at a temperature of 1300° C., and a porous intermediate layer made of a sintered body of amorphous silica powder was laminated on the support.
次いで、火炎法で合成した合成シリカガラスカレットを
シリカガラス製ボールミル中で湿式粉砕し、平均粒径１
μｍのシリカ粉末を含むスラリーを得た。このスラリー
を上記中間層の上面に流し、シリカ粒子を付着させた後
、１２００℃の温度で焼成し、中間層上に非晶質シリカ
粉末の焼結体からなる微細な多孔質の濾過層を積層し、
支持体、中間層及び濾過層により、いわゆる非対称膜の
構造を有するシリカガラスフィルターを得た。Next, the synthetic silica glass cullet synthesized by the flame method was wet-pulverized in a silica glass ball mill to give an average particle size of 1.
A slurry containing micrometer silica powder was obtained. This slurry is poured onto the upper surface of the intermediate layer to adhere silica particles, and then fired at a temperature of 1200°C to form a fine porous filtration layer made of a sintered body of amorphous silica powder on the intermediate layer. Laminated,
A silica glass filter having a so-called asymmetric membrane structure was obtained by the support, the intermediate layer, and the filtration layer.
このシリカガラスフィルターの平均気孔径は、０．５μ
ｍであった。The average pore diameter of this silica glass filter is 0.5μ
It was m.
実施例２
実施例１と同様な方法によって得た平均粒径２０μｍの
シリカ粉末を火炎中で球状化した。Example 2 Silica powder having an average particle size of 20 μm obtained by the same method as in Example 1 was spheroidized in a flame.
この球状粉末をプレス成形により直径１５ｍｍ、厚さ２
ｍｍの円板に成形した。成形体を１５００℃の温度で焼
成し、非晶質シリカ粉末の焼結体からなる多孔質の支持
体を作成した。This spherical powder is press-molded into a diameter of 15 mm and a thickness of 2.
It was molded into a disk of mm. The molded body was fired at a temperature of 1500° C. to produce a porous support made of a sintered body of amorphous silica powder.
一方、Ｓｔ″ｆｉｂｅｒ法により、すなわち撹拌機付き
のシリカガラス製反応容器に、エタノール１５００ｍｌ
。On the other hand, by the St" fiber method, 1500 ml of ethanol was added to a silica glass reaction vessel equipped with a stirrer.
.
２９％アンモニア水３００ｍ１を加えて混合して反応溶
液とする一方、エタノールｌｏ００ｍｌとテトラエトキ
ジシラン２２０ｍ１を混合して原料溶液とし、これを１
０℃の温度に調整して反応溶液中に滴下し、８時間撹拌
した後乾燥して平均粒径１．５μｍの球状単分散シリカ
粉末を得た。この粉末に水を添加して得たスラリーを上
記支持体の上面に流し、シリカ粒子を付着させた後、１
３００℃の温度で焼成して支持体上に非晶質シリカ粉末
の焼結体からなる多孔質の中間層を積層した。Add and mix 300 ml of 29% ammonia water to obtain a reaction solution, and mix 00 ml of ethanol and 220 ml of tetraethoxydisilane to obtain a raw material solution.
The mixture was added dropwise to the reaction solution at a temperature of 0° C., stirred for 8 hours, and then dried to obtain spherical monodisperse silica powder with an average particle size of 1.5 μm. A slurry obtained by adding water to this powder was poured onto the upper surface of the support, and silica particles were attached thereto.
A porous intermediate layer made of a sintered body of amorphous silica powder was laminated on the support by firing at a temperature of 300°C.
次いで、撹拌機付きのシリカガラス製反応容器に、エタ
ノール１５００ｍｌ、２９％アンモニア水２００ｍ１を
加えて混合して反応溶液とする一方、エタノール１０１
００Ｏとテトラエトキシシラン２００ｍ１を混合して原
料溶液とし、これを１０℃の温度に調整した反応溶液中
に滴下し、８時間撹拌した後乾燥して平均粒径が０５μ
ｍの球状単分散シリカ粉末を得た。この粉末に水を添加
して得たスラリーを上記中間層の上面に流し、シリカ粒
子を付着させた後、１２００℃の温度で焼成して中間層
上に非晶質シリカ粉末の焼結体からなる微細な多孔質の
濾過層を積層し、支持体、中間層及び濾過層により、い
わゆる非対称膜の構造を有するシリカガラスフィルター
を得た。Next, 1500 ml of ethanol and 200 ml of 29% aqueous ammonia were added to a silica glass reaction container equipped with a stirrer and mixed to prepare a reaction solution.
A raw material solution was prepared by mixing 00O and 200ml of tetraethoxysilane, which was dropped into a reaction solution adjusted to a temperature of 10°C, stirred for 8 hours, and then dried to obtain an average particle size of 05μ.
A spherical monodisperse silica powder of m was obtained. A slurry obtained by adding water to this powder is poured onto the upper surface of the intermediate layer to adhere silica particles, and then fired at a temperature of 1200°C to form a sintered body of amorphous silica powder on the intermediate layer. A silica glass filter having a so-called asymmetric membrane structure was obtained by laminating fine porous filtration layers such as the following: a support, an intermediate layer, and a filtration layer.
このシリカガラスフィルターの平均気孔径は、０．２μ
ｍであった。The average pore diameter of this silica glass filter is 0.2μ
It was m.
上述した各シリカガラスフィルターは、その中に含まれ
る不純物の濃度が第１表に示すように小さく、かつシリ
カの純度が９９．９％以上と非常に高いものであった。Each of the above-mentioned silica glass filters contained a small concentration of impurities as shown in Table 1, and had a very high silica purity of 99.9% or more.
第 １ 表
又、上記各シリカガラスフィルターによって窒素ガスを
濾過した際のガス透過量、気孔率は、アルミナ質セラミ
ックフィルター及びバイコール方式のガラスフィルター
のそれらを併記する第２第 ３ 表
従って、各シリカガラスフィルターのガス透過量及び気
孔率は、アルミナ質セラミックフィルター等のそれらよ
りよいことがわかる。Table 1 also shows the amount of gas permeation and porosity when nitrogen gas is filtered through each of the silica glass filters mentioned above. It can be seen that the gas permeation amount and porosity of the glass filter are better than those of the alumina ceramic filter and the like.
更に、各シリカガラスフィルターを用いて各種のガスを
濾過し、耐薬品性を調べたところ、アルミナ質セラミッ
クフィルターのそれを併記する第４表に示すようになっ
た。Furthermore, when various gases were filtered using each silica glass filter and the chemical resistance was examined, the results were shown in Table 4, which also includes that of the alumina ceramic filter.
表中○は良、△は可、×は不可を意味する。In the table, ○ means good, △ means good, and × means bad.
従って、各シリカガラスフィルターは、アルミナ質セラ
ミックフィルターより耐薬品性に優れていることがわか
る。Therefore, it can be seen that each silica glass filter has better chemical resistance than an alumina ceramic filter.
〔発明の効果］
以上のように本発明によれば、支持体、中間層及び濾過
層により、いわゆる非対称膜の構造となるので、濾過面
積を極めて大きくすることができる。[Effects of the Invention] As described above, according to the present invention, the support, the intermediate layer, and the filtration layer form a so-called asymmetric membrane structure, so that the filtration area can be extremely large.
又、構成粒子が非晶質であるため、セラミックフィルタ
ーのように粒界に偏析不純物を含む粒子同相が形成され
るようなことはなく、均一な連続構造を有するので、耐
薬品性及び強度を向上することができる。In addition, since the constituent particles are amorphous, unlike ceramic filters, particles with the same phase containing segregated impurities are not formed at the grain boundaries, and have a uniform continuous structure, which improves chemical resistance and strength. can be improved.
更に、固着粒子が球状に近くなり、その表面が平滑にな
るので、濾過流体の流れが滑らかとなり、圧力損失を小
さくし得、かつ透過率を高めることができる。Furthermore, since the fixed particles become nearly spherical and their surfaces become smooth, the flow of the filtration fluid becomes smooth, pressure loss can be reduced, and the permeability can be increased.
更に又、ガスの濾過に際し、フィルターの負のの静電チ
ャージが非常に大きくなるので、小さな粒子、特に正に
帯電した粒子を捕獲することができる。Furthermore, during gas filtration, the negative electrostatic charge of the filter is so large that small particles, especially positively charged particles, can be captured.
又、中間層が支持体と濾過層との結合を強化するので、
フィルターの強度を向上することができる。In addition, since the intermediate layer strengthens the bond between the support and the filtration layer,
The strength of the filter can be improved.
特に、支持体、中間層及び濾過層の構成粒子の平均粒径
をそれぞれ所要の範囲とすることにより、ガスの濾過に
最適なガスフィルターを得ることができる。In particular, by adjusting the average particle diameters of the particles constituting the support, intermediate layer, and filtration layer within required ranges, a gas filter optimal for gas filtration can be obtained.
Claims (1)
属、重金属類及びＢIII属の元素の総量が１５０ｐｐｍ
以下の非晶質シリカ粉末の焼結体からなる多孔質の支持
体、中間層及び濾過層を順次積層して構成され、支持体
の構成粒子の平均粒径を５〜１００μｍ、中間層の構成
粒子の平均粒径が１〜２５μｍ、及び濾過層の構成粒子
の平均粒径を０．１〜１μｍとしたことを特徴とするシ
リカガラスガスフィルター。(1) The purity is 99.9% or more, and the total amount of alkali, alkali metals, heavy metals, and BIII group elements is 150 ppm.
It is constructed by sequentially laminating a porous support made of a sintered body of amorphous silica powder, an intermediate layer, and a filtration layer as shown below, and the average particle size of the constituent particles of the support is 5 to 100 μm. A silica glass gas filter characterized in that the particles have an average particle size of 1 to 25 μm, and the particles constituting the filtration layer have an average particle size of 0.1 to 1 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1343709A JP2934866B2 (en) | 1989-12-28 | 1989-12-28 | Silica glass gas filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1343709A JP2934866B2 (en) | 1989-12-28 | 1989-12-28 | Silica glass gas filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03202116A true JPH03202116A (en) | 1991-09-03 |
| JP2934866B2 JP2934866B2 (en) | 1999-08-16 |
Family
ID=18363645
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1343709A Expired - Fee Related JP2934866B2 (en) | 1989-12-28 | 1989-12-28 | Silica glass gas filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2934866B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010195612A (en) * | 2009-02-23 | 2010-09-09 | Toshinori Kokubu | High purity silicic acid porous glass, method for producing the same, silicon raw material, high purity silica raw material, gas separation membrane, fuel cell material and method for concentrating solution |
| EP3173386A1 (en) * | 2015-11-25 | 2017-05-31 | Heraeus Quarzglas GmbH & Co. KG | Method for producing a composite body from a material with a high silica content |
| US10308541B2 (en) | 2014-11-13 | 2019-06-04 | Gerresheimer Glas Gmbh | Glass forming machine particle filter, a plunger unit, a blow head, a blow head support and a glass forming machine adapted to or comprising said filter |
-
1989
- 1989-12-28 JP JP1343709A patent/JP2934866B2/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010195612A (en) * | 2009-02-23 | 2010-09-09 | Toshinori Kokubu | High purity silicic acid porous glass, method for producing the same, silicon raw material, high purity silica raw material, gas separation membrane, fuel cell material and method for concentrating solution |
| US10308541B2 (en) | 2014-11-13 | 2019-06-04 | Gerresheimer Glas Gmbh | Glass forming machine particle filter, a plunger unit, a blow head, a blow head support and a glass forming machine adapted to or comprising said filter |
| EP3173386A1 (en) * | 2015-11-25 | 2017-05-31 | Heraeus Quarzglas GmbH & Co. KG | Method for producing a composite body from a material with a high silica content |
| US10106453B2 (en) | 2015-11-25 | 2018-10-23 | Heraeus Quarzglas Gmbh & Co. Kg | Method for producing a composite body of a material with a high silicic acid content |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2934866B2 (en) | 1999-08-16 |
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| LAPS | Cancellation because of no payment of annual fees |