JPH03198232A - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JPH03198232A JPH03198232A JP1335085A JP33508589A JPH03198232A JP H03198232 A JPH03198232 A JP H03198232A JP 1335085 A JP1335085 A JP 1335085A JP 33508589 A JP33508589 A JP 33508589A JP H03198232 A JPH03198232 A JP H03198232A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thin film
- recording medium
- optical recording
- disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims description 38
- 239000000758 substrate Substances 0.000 claims abstract description 62
- 239000010409 thin film Substances 0.000 claims abstract description 40
- 239000011521 glass Substances 0.000 claims abstract description 18
- 239000010408 film Substances 0.000 claims abstract description 13
- 239000000126 substance Substances 0.000 claims abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 239000004033 plastic Substances 0.000 claims description 8
- 229920003023 plastic Polymers 0.000 claims description 8
- -1 aromatic azide compound Chemical class 0.000 claims description 5
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 239000011737 fluorine Substances 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 239000000428 dust Substances 0.000 abstract description 25
- 125000006850 spacer group Chemical group 0.000 abstract description 6
- 239000002904 solvent Substances 0.000 abstract description 3
- 238000004528 spin coating Methods 0.000 abstract description 2
- 230000007423 decrease Effects 0.000 description 9
- 239000004744 fabric Substances 0.000 description 5
- 239000004417 polycarbonate Substances 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- 229920001410 Microfiber Polymers 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000000779 smoke Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000005345 chemically strengthened glass Substances 0.000 description 1
- 235000019504 cigarettes Nutrition 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、光ディスク等の光記録媒体に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to optical recording media such as optical discs.
光記録媒体１例えば光ディスクは光学的に透明なガラス
やプラスチック等を基板としている場合が多い。光ディ
スクを光ディスク関動装置に設置し、装置を長期間運転
すると空気中の塵埃が光ディスクの表面に付着し装置の
性能を劣化させる。The optical recording medium 1, for example, an optical disk, is often made of optically transparent glass, plastic, or the like as a substrate. When an optical disk is installed in an optical disk-related device and the device is operated for a long period of time, dust in the air adheres to the surface of the optical disk, deteriorating the performance of the device.
すなわち付着塵埃により光透過率が低下し、記録、再生
用光スポットの実質的光量が下がる。また、塵埃の大き
さによってはエラーが発生することになる。空気中の塵
埃は無機物、有機物から成り。That is, the light transmittance decreases due to the attached dust, and the substantial light intensity of the recording and reproducing light spot decreases. Additionally, errors may occur depending on the size of the dust. Dust in the air consists of inorganic and organic substances.
その寸法は数百μｍから０．０１μｍまで分布している
。光ディスク訃動装置に取り入れる空気中の塵埃をフィ
ルターで除去することも可能であるが、空気流抵抗との
兼ね合いもあり、１μｍ以下の塵埃の除去は困難である
。光ディスクの汚れをａ察すると１μｍ以下の塵埃が多
い。現在は必要時に光ディスクを清掃している。使用さ
れる環境に応じて汚れの程度は異なり、清掃頻度が高く
なる場合もある。塵埃のなかにはヤニや油状の物質があ
り、有機溶剤による洗浄も行なわれているが、簡単な方
法で十分に清掃することは困難である。Its dimensions range from several hundred μm to 0.01 μm. Although it is possible to use a filter to remove dust from the air taken into the optical disk drive device, it is difficult to remove dust of 1 μm or less due to air flow resistance. If you look at the dirt on an optical disk, there is a lot of dust that is less than 1 μm in size. Currently, optical discs are cleaned when necessary. The degree of contamination varies depending on the environment in which it is used, and the frequency of cleaning may be increased. The dust contains resin and oily substances, and although cleaning with organic solvents has been carried out, it is difficult to sufficiently clean the dust with simple methods.
なお、この種の技術に関するものとして、表面第１７巻
、第１１号（１９７９）第７２７頁〜第７３７頁がある
。Regarding this type of technology, there is Surface Vol. 17, No. 11 (1979), pages 727 to 737.
上記従来技術は、光記録媒体の汚れについての配慮がな
されておらず、光記録媒体に塵埃が付着し易く、また付
着塵埃を除去することが困難であるという問題があった
。The above-mentioned conventional technology does not take into account contamination of the optical recording medium, and has the problem that dust easily adheres to the optical recording medium and that it is difficult to remove the adhered dust.
本発明の目的は、塵埃が付着したとしても容易に除去で
きる光記録媒体を提供することにある。An object of the present invention is to provide an optical recording medium that can be easily removed even if dust is attached.
上記目的は、（１）光学的に透明な基板を有する光記録
媒体において、上記基板の所望の面に、該面より表面エ
ネルギーが低い表面を有する薄膜を設けたことを特徴と
する光記録媒体、（２）上記基板はガラスよりなり、上
記薄膜は、該基板とフルオロアルキルシランとの反応に
よって生じた薄膜であることを特徴とする上記１に記載
の光記録媒体、（３）上記基板はプラスチックよりなり
、上記薄膜は、該基板とフッ素を有する芳香族アジド化
合物との反応によって生じた薄膜であることを特徴とす
る上記１に記載の光記録媒体、（４）上記薄膜は、水に
対する接触角が７０度以上の表面を有することを特徴と
する上記１，２又は３に記載の光記録媒体、（５）上記
薄膜は、水に対する接触角が８０度以上の表面を有する
ことを特徴とする上記１．２又は３に記載の光記録媒体
、（６）上記薄膜は、上記基板と化学結合により結合し
ていることを特徴とする上記１から５までのいずれかに
記載の光記録媒体、（７）光学的に透明な基板と、該基
板上に少なくとも記録膜を有する光記録媒体において、
上記基板の記録膜を有する面と逆の面に、該面より表面
エネルギーが低い表面を有する薄膜を設けたことを特徴
とする光記録媒体、（８）上記薄膜は、水に対する接触
角が７０度以上の表面を有することを特徴とする上記７
に記載の光記録媒体、（９）上記薄膜は、上記基板と化
学結合により結合していることを特徴とする上記７又は
８に記載の光記録媒体により達成される。The above objects are (1) an optical recording medium having an optically transparent substrate, characterized in that a thin film having a surface having a lower surface energy than the surface is provided on a desired surface of the substrate; , (2) the optical recording medium according to 1 above, wherein the substrate is made of glass, and the thin film is a thin film produced by a reaction between the substrate and fluoroalkylsilane; (3) the substrate is The optical recording medium according to item 1 above, wherein the thin film is made of plastic and is a thin film produced by a reaction between the substrate and an aromatic azide compound containing fluorine. The optical recording medium according to item 1, 2 or 3 above, characterized in that it has a surface with a contact angle of 70 degrees or more, (5) the thin film has a surface with a contact angle of 80 degrees or more with respect to water. (6) The optical recording medium according to any one of 1 to 5 above, wherein the thin film is bonded to the substrate through a chemical bond. Medium, (7) an optical recording medium having an optically transparent substrate and at least a recording film on the substrate,
An optical recording medium characterized in that a thin film having a surface having a lower surface energy than the surface is provided on a surface opposite to the surface having the recording film of the substrate, (8) the thin film has a contact angle with water of 70. 7 above, characterized by having a surface of
(9) The optical recording medium described in (7) or (8) above, wherein the thin film is bonded to the substrate through a chemical bond.
円板の基板として使用されているＰＭＭＡ （ポリメチ
ルメタクリレート）、ＰＣ（ポリカーボネート）、エポ
キシ樹脂等のプラスチック及びガラスの表面エネルギー
は大きく塵埃が付着し易い。The surface energy of plastics such as PMMA (polymethyl methacrylate), PC (polycarbonate), and epoxy resin, and glass used as the substrate of the disk is large, and dust tends to adhere thereto.
ガラスの表面張力は約２７０ ｄｙｎｅ／ ａｌ、また
これらのプラスチックでは４０〜５０ ｄｙｎｅ／ ｃ
ｘａである。The surface tension of glass is about 270 dyne/al, and for these plastics it is 40-50 dyne/c.
It is xa.
空気中の塵埃はＳｉｎ、、Ｆｅ、Ｏ，、Ａｆｉ、Ｏ，。Dust in the air is Sin,,Fe,O,,Afi,O,.
ＭｇＯ等の無機物とタバコの煙や油煙等の有機物から成
っている。これらの塵埃のうち装置に組み込んであるフ
ィルターを通過する際に数１０μｍのものは補集される
が、それより小さい塵埃は通り抜け１円板表面に衝突す
ることになる。この場合表面エネルギーが大きい表面に
は、塵埃は湿気やファンデルワールス力、水素結合、静
電気等により付着する確率が高い。このような力で付着
した汚染を拭き取るには大きなエネルギーが必要となる
。It consists of inorganic substances such as MgO and organic substances such as cigarette smoke and oil smoke. Among these dust particles, those of several tens of micrometers are collected when they pass through a filter built into the device, but the smaller dust particles pass through and collide with the surface of the disk. In this case, there is a high probability that dust will adhere to a surface with high surface energy due to moisture, van der Waals force, hydrogen bonding, static electricity, etc. A large amount of energy is required to wipe away contamination that has adhered with such force.
これらの円板表面に表面エネルギーが低い表面を有する
薄膜を設ければ塵埃が付着しても容易に除去することが
できる。If a thin film having a surface with low surface energy is provided on the surface of these discs, even if dust adheres thereto, it can be easily removed.
表面エネルギーが低い表面を有する薄膜は、例えば次の
ようにして作製することができる。基板がガラス基板で
あるとき、フルオロアルキルシランでガラス基板表面を
処理して上記薄膜を形成する。フルオロアルキルシラン
としては、分子式（１）に示す化合物等が挙げられる。A thin film having a surface with low surface energy can be produced, for example, as follows. When the substrate is a glass substrate, the above thin film is formed by treating the surface of the glass substrate with fluoroalkylsilane. Examples of the fluoroalkylsilane include compounds shown in molecular formula (1).
ＣＦ−−（ＣＦ−）ｎ −（ＣＨ−）ｍ −５ｌ（ＯＲ
）ｓ （１）この分子は、ガラス基板表面の５ｉＯＨと
カップリング反応を起こし、第２図に示したようにＣＦ
、 −（ＣＦ２）ｎ−で覆われた状態となる。これらの
分子化学結合しているので基板表面から離れることはな
い。カップリング反応は室温でも起こり得るが、通常は
１００℃程度の熱処理を行なう。CF--(CF-)n-(CH-)m-5l(OR
)s (1) This molecule causes a coupling reaction with 5iOH on the surface of the glass substrate, and as shown in Figure 2, CF
, -(CF2)n-. Since these molecules are chemically bonded, they do not separate from the substrate surface. Although the coupling reaction can occur at room temperature, heat treatment is usually performed at about 100°C.
フルオロアルキルシランのコーテング方法としては、浸
漬、回転塗布が望ましいが、はけ塗り、スプレー塗りの
方法も可能である。As a method for coating with fluoroalkylsilane, dipping and spin coating are preferred, but brushing and spray coating are also possible.
薄膜表面の表面エネルギーは水の接触角を用いて評価で
きる。表面エネルギーの低い表面径この接触角が大きく
なる。ガラスの接触角はＯ度〜数度であるが、上記分子
式（１）のフルオロアルキルシランの例えばｎ＝７．ｍ
＝２の化合物を用いて薄膜を形成した場合、その表面の
接触角は１１０度程程度なる。The surface energy of a thin film surface can be evaluated using the contact angle of water. The surface diameter with lower surface energy increases this contact angle. The contact angle of glass is from 0 degrees to several degrees. m
When a thin film is formed using a compound of =2, the contact angle on the surface is about 110 degrees.
他に用いることのできるシランとして、例えば次の分子
式（ＩＩ）、 （ｍ）に示すアルキルシランがある。Other silanes that can be used include, for example, alkylsilanes represented by the following molecular formulas (II) and (m).
ＣＨ，−（ＣＨ，）ｎ’ −８ｉＣＱ、
（ＩＩ）ＣＨ−−（ＣＨ，）ｍ ’ −Ｓ ｌ（ＯＲ
）ａ （ＩＩ ）この場合もガラス表面とのカ
ップリング反応により基板表面に結合される。これらの
薄膜表面の水に対する接触角はｎ′やｍ′の値にもよる
が、９０度程度である。CH,-(CH,)n'-8iCQ,
(II) CH--(CH,)m'-Sl(OR
)a (II) Also in this case, it is bonded to the substrate surface by a coupling reaction with the glass surface. The contact angle of the surface of these thin films with water is about 90 degrees, although it depends on the values of n' and m'.
一方、プラスチック基板を用いるとき、上記のカップリ
ング反応により薄膜と基板とを化学結合させることが困
難であるので、次の分子式（ＴＶ）に示したフッ素を有
する芳香族アジド化合物等が用いられる。On the other hand, when a plastic substrate is used, it is difficult to chemically bond the thin film and the substrate by the above-described coupling reaction, so an aromatic azide compound containing fluorine as shown in the following molecular formula (TV) is used.
これはアジド基がプラスチック表面の炭素と反応して第
３図のように−Ｃ−Ｎ−Ｃ−の結合が生じ固定される。This is because the azide group reacts with carbon on the surface of the plastic to form a -C-N-C- bond as shown in Figure 3 and is fixed.
この場合も表面はフルオロカーボンの薄膜で覆われた状
態となり低表面エネルギーとなる。In this case as well, the surface is covered with a thin film of fluorocarbon, resulting in low surface energy.
本発明の薄膜は、基板表面にモルレーヤーから５分子層
程度の厚さで存在することが好ましい。The thin film of the present invention is preferably present on the substrate surface with a thickness of about 5 molar layers to about 5 molecular layers.
どのような化合物を用いるかにもよるが、通常は２０〜
１００人程度の厚みである。また、全面が均一な厚みで
ある必要はなく１例えばモルレーヤーの部分と２分子層
の部分とが存在していてもよい。It depends on what kind of compound is used, but usually 20~
It is about 100 people deep. Further, it is not necessary that the entire surface has a uniform thickness, and for example, a molar layer portion and a bimolecular layer portion may be present.
フルオロアルキルシランはガラス基板に、フッ素を有す
る芳香族アジド化合物はプラスチック基板にそれぞれ化
学結合し得る。従って形成された薄膜と基板とが化学結
合により強固に結合する。The fluoroalkylsilane can be chemically bonded to the glass substrate, and the fluorine-containing aromatic azide compound can be chemically bonded to the plastic substrate. Therefore, the formed thin film and the substrate are firmly bonded by chemical bonding.
また、これらの形成された薄膜の表面エネルギーが低い
ため、円板表面に塵埃が付着しても容易に拭き取ること
ができる。Furthermore, since the surface energy of these formed thin films is low, even if dust adheres to the disk surface, it can be easily wiped off.
以下、本発明の一実施例を図面を用いて説明する。 An embodiment of the present invention will be described below with reference to the drawings.
実施例１
直径３００醜■、厚さ１．２ｍｍの化学強化したガラス
基板をイソプロピルアルコール、フレオンを用いて洗浄
した。一方、フルオロアルキルシランとして前記分子式
（１）におけるｎ＝７．ｍ＝２のシランをフッ素系溶媒
に溶解させた。その濃度は３重量％とじた。この溶液を
ガラス基板上に回転塗布した。次にガラス基板を１００
℃、１０分間熱処理し、基板表面に低表面エネルギー薄
膜を形成した。処理した表面の水に対する接触角は１１
０度であった。基板の処理面と反対側に紫外線硬化樹脂
を用いてトラッキング用の溝を形成した。その上に穴形
成型の記録膜としてＰｂＴｅＳｅよりなる薄膜を蒸着法
により形成した。このようにして得た基板２枚を、第１
図に示すように、記録膜５を内側に向き合わせ、外周ス
ペーサ３、内周スペーサ４を用いてエアサンドインチ構
造の円板を組み立てた。基板１の低表面エネルギー膜２
を有する面は円板の外側に置かれている。Example 1 A chemically strengthened glass substrate with a diameter of 300 mm and a thickness of 1.2 mm was cleaned using isopropyl alcohol and Freon. On the other hand, as a fluoroalkylsilane, n=7 in the molecular formula (1). Silane with m=2 was dissolved in a fluorine-based solvent. Its concentration was 3% by weight. This solution was spin-coated onto a glass substrate. Next, attach the glass substrate to 100
C. for 10 minutes to form a low surface energy thin film on the substrate surface. The contact angle of the treated surface with water is 11
It was 0 degrees. Tracking grooves were formed using ultraviolet curing resin on the opposite side of the substrate to the treated surface. A thin film of PbTeSe was formed thereon as a hole-forming recording film by vapor deposition. The two substrates obtained in this way were
As shown in the figure, a disk having an air sandwich structure was assembled using an outer circumferential spacer 3 and an inner circumferential spacer 4, with the recording film 5 facing inward. Low surface energy film 2 on substrate 1
The surface with is placed on the outside of the disk.
この円板を光デイスク駆動装置にかけ動作させた。装置
の環境は通常の事務室内である。動作時間の経過に従っ
て円板の記録膜からの反射率が低下する様子を調べた。This disk was operated by applying it to an optical disk drive. The environment of the device is a normal office room. We investigated how the reflectance from the disk's recording film decreased as the operating time progressed.
反射率低下はガラス表面に塵埃が付着し、ガラス基板の
透過率が低下したために起こる現象である。つまり、記
録膜への入射光量とその反射光量が減少したために起こ
る。３ケ月の運転後の反射率の初期の値に対する低下は
約１２％であった。しかし、超極細繊維布により付着塵
埃を拭き取ると１反射率の低下はＯになった。すなわち
、元の反射率に戻った。The decrease in reflectance is a phenomenon that occurs because dust adheres to the glass surface and the transmittance of the glass substrate decreases. In other words, this occurs because the amount of light incident on the recording film and the amount of reflected light thereof are reduced. After three months of operation, the decrease in reflectance relative to the initial value was approximately 12%. However, when the adhering dust was wiped off with an ultrafine fiber cloth, the decrease in reflectance of 1 became 0. In other words, the reflectance returned to its original value.
一方、比較のため、表面処理しないガラス基板を用いて
同様に組み立てた従来の円板では、３ケ月運転後の反射
率の初期の値に対する低下は約１２％であり、上記とほ
とんど同じであるが、−上記と同様な超極細繊維布によ
る拭き取りによっても反射率の低下は７％までしか回復
しない。なお、有機溶媒による湿式洗浄により反射率は
元の値に戻る。On the other hand, for comparison, with a conventional disk similarly assembled using a glass substrate without surface treatment, the decrease in reflectance from the initial value after 3 months of operation was approximately 12%, which is almost the same as above. However, even by wiping with an ultrafine fiber cloth similar to that described above, the decrease in reflectance can only be recovered to 7%. Note that the reflectance returns to its original value by wet cleaning with an organic solvent.
なお、円板は密着貼り合わせ構造でも同様の効果を発揮
する。また１表面処理は、エアサンドインチ構造の円板
又は密着貼り合わせ構造の円板に組み立てた後行なって
もよい。It should be noted that the same effect can be achieved even when the disk is in a closely bonded structure. Further, the first surface treatment may be performed after the disk is assembled into a disk having an air sandwich structure or a disk having a close bonding structure.
実施例２，３
下記衣１記載のシランを用いて実施例１と同様にしてガ
ラス基板を表面処理し、円板を組み立てた。この円板を
３ケ月運転し、実施例１と同様に超極細繊維布による拭
き取りを行なった後の反射率の低下は表１の通りである
。なお、本実施例に用いた表面処理された基板の水に対
する接触角を表１に併せ記載する。Examples 2 and 3 A glass substrate was surface-treated in the same manner as in Example 1 using the silane described in Cloth 1 below, and a disk was assembled. Table 1 shows the decrease in reflectance after this disk was operated for three months and wiped with an ultrafine fiber cloth in the same manner as in Example 1. The contact angle of the surface-treated substrate used in this example with respect to water is also listed in Table 1.
表 １
実施例４
射出成型法で得られた直径１３０＋ｍのＰＣ（ポリカー
ボネート）基板を準備した。この基板の片面は案内溝等
が形成されている。一方前記分子式（ＴＶ）におけるｎ
＝１５のアジド化合物をフッ素系溶媒に溶解させ、濃度
３重量％の溶液とした。Table 1 Example 4 A PC (polycarbonate) substrate with a diameter of 130+m obtained by injection molding was prepared. A guide groove and the like are formed on one side of this substrate. On the other hand, n in the molecular formula (TV)
An azide compound of =15 was dissolved in a fluorinated solvent to form a solution with a concentration of 3% by weight.
ＰＣ基板の案内溝の付いていない方の面にこの溶液を回
転塗布した。つぎに高圧水銀灯（８ｋＷ／ａｎ）により
１分間紫外線を照射した。これによりアジド基はｐｃ基
板の表面に結合し、低表面エネルギー薄膜が形成された
。この表面の水に対する接触角は１１０度であった。ｐ
ｃ基板の案内溝を有する面上に実施例１と同様に記録膜
を形成し、エアサンドインチ構造の円板とした。光デイ
スク駆動装置内でこの装置を３ケ月運転したところ、実
施例１の場合と同様に塵埃が付着していた。超極細繊維
布による拭き取りにより、反射率は初期の状態となった
。This solution was spin coated on the side of the PC board where the guide grooves were not provided. Next, ultraviolet rays were irradiated for 1 minute using a high-pressure mercury lamp (8 kW/an). As a result, the azide groups bonded to the surface of the PC substrate, forming a low surface energy thin film. The contact angle of this surface with water was 110 degrees. p
A recording film was formed on the surface of the c-substrate having the guide groove in the same manner as in Example 1 to obtain a disk having an air sandwich structure. When this device was operated in an optical disk drive device for three months, dust was found to be attached as in Example 1. By wiping with an ultrafine fiber cloth, the reflectance returned to its initial state.
本発明によれば、光記録媒体の表面エネルギーを低下さ
せることができるので、付着した塵埃を簡単に拭き取る
ことが可能となり、光記録媒体の信頼性を高める効果が
ある。According to the present invention, since the surface energy of the optical recording medium can be lowered, attached dust can be easily wiped off, which has the effect of increasing the reliability of the optical recording medium.
第１図は、本発明の一実施例の低表面エネルギー薄膜を
有する基板を用い、エアサンドインチ構造とした光記録
媒体の断面図、第２図及び第３図は、本発明を説明する
ための化合物と基板との結合状態を示す模式図である。
１・・・基板
２・・・低表面エネルギー薄膜
３・・・外周スペーサ
４・・・内周スペーサ
５・・・記録膜FIG. 1 is a sectional view of an optical recording medium having an air sandwich structure using a substrate having a low surface energy thin film according to an embodiment of the present invention, and FIGS. 2 and 3 are for explaining the present invention. FIG. 3 is a schematic diagram showing the bonding state between the compound and the substrate. 1...Substrate 2...Low surface energy thin film 3...Outer spacer 4...Inner spacer 5...Recording film
Claims (1)
上記基板の所望の面に、該面より表面エネルギーが低い
表面を有する薄膜を設けたことを特徴とする光記録媒体
。 ２、上記基板はガラスよりなり、上記薄膜は、該基板と
フルオロアルキルシランとの反応によって生じた薄膜で
あることを特徴とする請求項１に記載の光記録媒体。 ３、上記基板はプラスチックよりなり、上記薄膜は、該
基板とフッ素を有する芳香族アジド化合物との反応によ
って生じた薄膜であることを特徴とする請求項１に記載
の光記録媒体。 ４、上記薄膜は、水に対する接触角が７０度以上の表面
を有することを特徴とする請求項１、２又は３に記載の
光記録媒体。 ５、上記薄膜は、水に対する接触角が８０度以上の表面
を有することを特徴とする請求項１、２又は３に記載の
光記録媒体。 ６、上記薄膜は、上記基板と化学結合により結合してい
ることを特徴とする請求項１から５までのいずれかに記
載の光記録媒体。 ７、光学的に透明な基板と、該基板上に少なくとも記録
膜を有する光記録媒体において、上記基板の記録膜を有
する面と逆の面に、該面より表面エネルギーが低い表面
を有する薄膜を設けたことを特徴とする光記録媒体。 ８、上記薄膜は、水に対する接触角が７０度以上の表面
を有することを特徴とする請求項７に記載の光記録媒体
。 ９、上記薄膜は、上記基板と化学結合により結合してい
ることを特徴とする請求項７又は８に記載の光記録媒体
。[Claims] 1. In an optical recording medium having an optically transparent substrate,
An optical recording medium characterized in that a thin film having a surface having a lower surface energy than the desired surface of the substrate is provided on a desired surface of the substrate. 2. The optical recording medium according to claim 1, wherein the substrate is made of glass, and the thin film is a thin film produced by a reaction between the substrate and fluoroalkylsilane. 3. The optical recording medium according to claim 1, wherein the substrate is made of plastic, and the thin film is a thin film produced by a reaction between the substrate and an aromatic azide compound containing fluorine. 4. The optical recording medium according to claim 1, 2 or 3, wherein the thin film has a surface having a contact angle with water of 70 degrees or more. 5. The optical recording medium according to claim 1, 2 or 3, wherein the thin film has a surface having a contact angle with water of 80 degrees or more. 6. The optical recording medium according to claim 1, wherein the thin film is bonded to the substrate through a chemical bond. 7. In an optical recording medium having an optically transparent substrate and at least a recording film on the substrate, a thin film having a surface whose surface energy is lower than that of the surface on the opposite surface of the substrate to the surface having the recording film. An optical recording medium characterized by: 8. The optical recording medium according to claim 7, wherein the thin film has a surface having a contact angle with water of 70 degrees or more. 9. The optical recording medium according to claim 7 or 8, wherein the thin film is bonded to the substrate through a chemical bond.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1335085A JPH03198232A (en) | 1989-12-26 | 1989-12-26 | Optical recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1335085A JPH03198232A (en) | 1989-12-26 | 1989-12-26 | Optical recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03198232A true JPH03198232A (en) | 1991-08-29 |
Family
ID=18284603
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1335085A Pending JPH03198232A (en) | 1989-12-26 | 1989-12-26 | Optical recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03198232A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04339333A (en) * | 1991-03-13 | 1992-11-26 | Matsushita Electric Ind Co Ltd | Optical information recording medium |
| JPH05180765A (en) * | 1991-12-26 | 1993-07-23 | Kyoseki Seihin Gijutsu Kenkyusho:Kk | Lubricant deterioration detector |
-
1989
- 1989-12-26 JP JP1335085A patent/JPH03198232A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04339333A (en) * | 1991-03-13 | 1992-11-26 | Matsushita Electric Ind Co Ltd | Optical information recording medium |
| JPH05180765A (en) * | 1991-12-26 | 1993-07-23 | Kyoseki Seihin Gijutsu Kenkyusho:Kk | Lubricant deterioration detector |
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