JPH03183177A - Gas laser oscillator - Google Patents
Gas laser oscillatorInfo
- Publication number
- JPH03183177A JPH03183177A JP32064189A JP32064189A JPH03183177A JP H03183177 A JPH03183177 A JP H03183177A JP 32064189 A JP32064189 A JP 32064189A JP 32064189 A JP32064189 A JP 32064189A JP H03183177 A JPH03183177 A JP H03183177A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- discharge
- tube
- gas laser
- main discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000010355 oscillation Effects 0.000 claims abstract description 9
- 230000003287 optical effect Effects 0.000 claims description 3
- 238000001914 filtration Methods 0.000 abstract description 4
- 239000000047 product Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000368 destabilizing effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】 ［発明の目的］ （産業上の利用分野） 本発明はガスレーザ発振装置に関する。[Detailed description of the invention] [Purpose of the invention] (Industrial application field) The present invention relates to a gas laser oscillation device.
（従来技術）
レーザ光に対して主放電方向が直交するＴＥＡＣ０２レ
ーザやエキシマレーザなどのパルスレーザについて、第
３図を参照して説明する。すなわち、レーザ管（１〉を
有し、内部に陰極（２）および陽極（３）からなる一対
の主放電電極が所定の主放電空間（４）を形成して設け
られている。上記主放電空間（４）の近傍に予備電離用
のピン電極（５〉が紙面垂直方向になるレーザ光軸に沿
って複数対設けられている。これらピン電極（５）はそ
れぞれピーキングコンデンサ（６）を介し主電源（７）
に接続されている。レーザ管０〉の内部には上記主放電
電極の他に封入されているガスレーザ媒質を冷却して循
環させる熱交換器（８）、送風機（９）が設けられてい
る。(Prior Art) A pulsed laser such as a TEAC02 laser or an excimer laser whose main discharge direction is perpendicular to the laser beam will be described with reference to FIG. That is, it has a laser tube (1), inside which a pair of main discharge electrodes consisting of a cathode (2) and an anode (3) are provided to form a predetermined main discharge space (4). A plurality of pairs of pin electrodes (5) for pre-ionization are provided near the space (4) along the laser optical axis in the direction perpendicular to the plane of the paper. Main power supply (7)
It is connected to the. Inside the laser tube 0>, in addition to the main discharge electrode, a heat exchanger (8) for cooling and circulating the enclosed gas laser medium and a blower (9) are provided.
（発明が解決しようとする課８）
上記の構成になるガスレーザ発振装置では、放電時に陰
極（２）および陽極（３〉に多量の電気エネルギが注入
され、放電過程で発生するイオンや電子が例えばＣ（１
％Ｎ ｉＦ ２などの放電生成物４
が発生する。生成物のうち固体のものはガスレーザ媒質
中にダストとして混入し、主放電を不安定にするほか、
励起されたレーザ光を吸収し、レーザ出力が不安定にな
ったり、出力低下を招いていた。(Issue 8 to be solved by the invention) In the gas laser oscillator having the above configuration, a large amount of electrical energy is injected into the cathode (2) and the anode (3) during discharge, and ions and electrons generated during the discharge process are e.g. C(1
Discharge products 4 such as %N iF 2 are generated. Solid products may mix into the gas laser medium as dust, destabilizing the main discharge, and causing other problems.
The excited laser light was absorbed, causing the laser output to become unstable or decrease in output.
本発明はこのような事情に鑑みてなされたもので、放電
で発生した生成物を除去して長時間安定してレーザ発振
が運転可能なガスレーザ発振を提供する。The present invention has been made in view of the above circumstances, and provides a gas laser oscillation that can operate stably for a long time by removing products generated by discharge.
［発明の構成］
（課題を解決するための手段と作用）
ガスレーザ媒質を封入したレーザ管と、このレーザ管内
に対向して設けられた少なくとも一対の主放電電極と、
主放電空間を予備電離するために上記主放電電極の近傍
に設けられたピン電極と、上記主放電空間で発生したレ
ーザ光を共振する光共振器とを備えたガスレーザ発振装
置において、上記ガスレーザ管に接続された導入管およ
び排出管と、これら導入管および排出管とに接続したガ
ス処理タンクと、上記導入管側へ設けられ主放電による
圧力上昇時に開く第１の弁と、上記排出側に設けられ上
記ガス処理タンク内にガスレーザ媒質の導入に同期して
開く第２の弁とを備えた構成にしたもので、主放電で励
起されたガスレーザ媒質はこの主放電にほぼ同期してガ
ス処理タンクに入り、またこのタンク内で処理されたガ
スがレーザ管内に戻される。[Structure of the Invention] (Means and Effects for Solving the Problems) A laser tube enclosing a gas laser medium, at least a pair of main discharge electrodes provided oppositely within the laser tube,
In the gas laser oscillation device, the gas laser oscillation device includes a pin electrode provided near the main discharge electrode for pre-ionizing the main discharge space, and an optical resonator that resonates laser light generated in the main discharge space. an inlet pipe and a discharge pipe connected to the inlet pipe, a gas processing tank connected to the inlet pipe and the discharge pipe, a first valve provided on the inlet pipe side and opened when pressure increases due to main discharge, and a first valve provided on the above discharge side. A second valve is provided in the gas treatment tank and opens in synchronization with the introduction of the gas laser medium, and the gas laser medium excited by the main discharge is gas treated almost in synchronization with the main discharge. The gas that enters and is processed in the tank is returned to the laser tube.
（実施例） 以下、実施例を示す図面に基づいて本発明を説明する。(Example) EMBODIMENT OF THE INVENTION Hereinafter, the present invention will be described based on drawings showing examples.
第１図は本発明の一実施例で第２図と共通する部分には
同一符号を付している。すなわち、レーザ管（１）の外
部にガス処理タンク（２ａ）が設けられ、これら両者は
導入管（２１）および排出管（２２〉によって接続され
ている。導入管（２１〉はその導入口（２３）を」二記
主放電空間（４）のガスレーザ媒質が下流側出口に対向
して接続されている。一方、ガス処理タンク（２０）内
にはダスト状の放電生成物を濾過するフィルタ（２４〉
が設けられている。ガス処理タンク（２０）と、導入管
（２１）および排出管（２２）との各接続部には第１の
弁（２Ｂ）と、この第１の弁（２６〉と同一構造になる
第２の弁（２７〉が設けられている。第１の弁（２６）
は主放電時、ガスレーザ媒質の膨脂で開き、また、第２
の弁（２７）はガス処理タンク（２０）内にガスレーザ
媒質の導入に同期して開き、それ以外は閉じる弁となっ
ている。これら弁の両者の構造は同一なので、一方の第
１の弁（２６）の構造について第２図で説明する。すな
わち、ガス処理タンク（２０）における導入管（２１）
の出口部周囲のガス処理タンク（２０〉の内壁部にＯリ
ング（２８）が埋設されている。第１の弁（２Ｂ）はＩ
ｌ＆（２９）を支点にして回動自在になっている。第１
の弁（２Ｂ）の軸（２９）に軸支されている端部部分は
バネ（３０）に付勢され、このバネ（３０〉によって第
１の弁（２Ｂ〉は０１Ｊング（２８）に常時当接されて
いる。なお、導入管（２１）および排出管（２２）の管
路の中途部にはバルブ（３１ａ）、（３１ｂ）が接続さ
れている。FIG. 1 shows an embodiment of the present invention, and parts common to those in FIG. 2 are given the same reference numerals. That is, a gas processing tank (2a) is provided outside the laser tube (1), and these two are connected by an inlet pipe (21) and an outlet pipe (22>.The inlet pipe (21>) is connected to its inlet ( 23) The gas laser medium of the main discharge space (4) is connected facing the downstream outlet.On the other hand, in the gas treatment tank (20) there is a filter (20) for filtering dust-like discharge products. 24〉
is provided. A first valve (2B) and a second valve (26) having the same structure as the first valve (26) are provided at each connection between the gas treatment tank (20), the inlet pipe (21), and the discharge pipe (22). A first valve (26) is provided.
is opened by the expansion of the gas laser medium during the main discharge, and the second
The valve (27) is a valve that opens in synchronization with the introduction of the gas laser medium into the gas treatment tank (20) and is closed otherwise. Since both of these valves have the same structure, the structure of one of the first valves (26) will be explained with reference to FIG. That is, the inlet pipe (21) in the gas treatment tank (20)
An O-ring (28) is embedded in the inner wall of the gas treatment tank (20) around the outlet of the I.
It is rotatable using l&(29) as a fulcrum. 1st
The end portion of the first valve (2B) which is pivotally supported on the shaft (29) is biased by a spring (30), and the first valve (2B) is always connected to the 01J ring (28) by this spring (30). In addition, valves (31a) and (31b) are connected to the midway portions of the introduction pipe (21) and the discharge pipe (22).
上記の構成で、送風機（８）が駆動され、レーザ管（１
）内に封入されたガスレーザ媒質はおよそ１０ｍ／ｍｉ
ｎの速度で循環される。一方、複数のピン電極（５〉が
−斉に放電し主放電空間（４）が予備電離された直後、
主放電が点弧する。この点弧で主放電空間（４）のガス
レーザ媒質は主放電時の電気エネルギに加熱され、局部
的に圧力が２〜３倍となる。このガス圧上昇に押され、
第１の弁（２６）が開き、ガスレーザ媒質の一部が導入
管（２１〉よりガス処理タンク（２０〉内に流入する。With the above configuration, the blower (8) is driven and the laser tube (1
) The gas laser medium enclosed in
It is cycled at a speed of n. On the other hand, immediately after the plurality of pin electrodes (5) discharge simultaneously and the main discharge space (4) is pre-ionized,
The main discharge ignites. By this ignition, the gas laser medium in the main discharge space (4) is heated by the electrical energy during the main discharge, and the pressure locally increases two to three times. Pushed by this increase in gas pressure,
The first valve (26) opens and a portion of the gas laser medium flows into the gas treatment tank (20>) through the introduction pipe (21>).
この流入によって第２の弁（２７〉が開き、流入した流
量分が排出管（２２〉を経てレーザ管＜１）に戻される
。この戻されたガスレーザ媒質はフィルタ（２４）によ
って清浄にされている。なお、この清浄作用が繰り返さ
れ一定時間経過後、バルブ（（ｌａ）、 （３１ｂ）を
閉じ、フィルタ（２４〉のみ、またはガス処理タンク（
２０）全体を新しいものと交換する。This inflow causes the second valve (27> to open, and the inflowing flow rate is returned to the laser tube <1) via the discharge pipe (22>).The returned gas laser medium is cleaned by the filter (24). This cleaning action is repeated and after a certain period of time, the valves ((la), (31b) are closed and the filter (24) alone or the gas processing tank (
20) Replace the whole thing with a new one.
なお、上記実施例ではガスレーザ媒質を濾過するために
フィルタを用いたが、触媒を用いて濾過してもよい。In addition, in the above embodiment, a filter was used to filter the gas laser medium, but a catalyst may be used for filtering.
［発明の効果］
以上のように、放電による圧力上昇でガスレーザ媒質を
取り込んで濾過したので、レーザ発振の繰り返し動作に
ほぼ比例してガスレーザ媒質が濾過され、繰り返し動作
に関係なくレーザ管内が常に清浄に保たれる。したがっ
て、放電生成物によるレーザ光の吸収が無くなり、ガス
レーザ媒質のガス寿命が従来に比べて１．２〜１．５倍
程度のびた。[Effects of the Invention] As described above, since the gas laser medium is taken in and filtered by the pressure increase due to discharge, the gas laser medium is filtered in approximately proportion to the repeated operation of laser oscillation, and the inside of the laser tube is always kept clean regardless of the repeated operation. is maintained. Therefore, absorption of laser light by discharge products is eliminated, and the gas life of the gas laser medium is extended by about 1.2 to 1.5 times compared to the conventional one.
第１図は本発明の一実施例を示す断面図、第２図は第１
図のＡ部における拡大図、第３図は従来例を示す断面図
である。
（１） ・・・レーザ管
（２） ・・陰極
（３） ・・陽極
（５）・・・ピン電極
（２０）・・・ガス処理タンク
（２６〉・・・第１の弁
（２７）・ ・第２の弁FIG. 1 is a sectional view showing one embodiment of the present invention, and FIG.
FIG. 3 is an enlarged view of part A in the figure and a sectional view showing a conventional example. (1) ... Laser tube (2) ... Cathode (3) ... Anode (5) ... Pin electrode (20) ... Gas treatment tank (26) ... First valve (27)・ ・Second valve
Claims (1)
に対向して設けられた少なくとも一対の主放電電極と、
主放電空間を予備電離するために上記主放電電極の近傍
に設けられたピン電極と、上記主放電空間で発生したレ
ーザ光を共振する光共振器とを備えたガスレーザ発振装
置において、上記ガスレーザ管に接続された導入管およ
び排出管と、これら導入管および排出管とに接続したガ
ス処理タンクと、上記導入管側へ設けられ主放電による
圧力上昇時に開く第１の弁と、上記排出管側に設けられ
上記ガス処理タンク内にガスレーザ媒質の導入に同期し
て開く第２の弁とを備えたことを特徴とするガスレーザ
発振装置。a laser tube enclosing a gas laser medium; at least a pair of main discharge electrodes provided oppositely within the laser tube;
In the gas laser oscillation device, the gas laser oscillation device includes a pin electrode provided near the main discharge electrode for pre-ionizing the main discharge space, and an optical resonator that resonates laser light generated in the main discharge space. an inlet pipe and a discharge pipe connected to the inlet pipe, a gas processing tank connected to the inlet pipe and the discharge pipe, a first valve provided on the inlet pipe side and opened when pressure rises due to main discharge, and a first valve provided on the inlet pipe side and opened when pressure increases due to main discharge; A gas laser oscillation device comprising: a second valve that is provided in the gas processing tank and opens in synchronization with the introduction of the gas laser medium into the gas processing tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32064189A JP2685940B2 (en) | 1989-12-12 | 1989-12-12 | Gas laser oscillation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32064189A JP2685940B2 (en) | 1989-12-12 | 1989-12-12 | Gas laser oscillation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03183177A true JPH03183177A (en) | 1991-08-09 |
| JP2685940B2 JP2685940B2 (en) | 1997-12-08 |
Family
ID=18123678
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32064189A Expired - Fee Related JP2685940B2 (en) | 1989-12-12 | 1989-12-12 | Gas laser oscillation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2685940B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06188485A (en) * | 1992-12-21 | 1994-07-08 | Jgc Corp | Gas regenerating apparatus for carbon dioxide gas laser |
| JPH06237029A (en) * | 1993-02-09 | 1994-08-23 | Nec Corp | Discharge excited excimer laser device |
-
1989
- 1989-12-12 JP JP32064189A patent/JP2685940B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06188485A (en) * | 1992-12-21 | 1994-07-08 | Jgc Corp | Gas regenerating apparatus for carbon dioxide gas laser |
| JPH06237029A (en) * | 1993-02-09 | 1994-08-23 | Nec Corp | Discharge excited excimer laser device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2685940B2 (en) | 1997-12-08 |
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