JPH03167141A - Production of perfluoro compound - Google Patents
Production of perfluoro compoundInfo
- Publication number
- JPH03167141A JPH03167141A JP30724489A JP30724489A JPH03167141A JP H03167141 A JPH03167141 A JP H03167141A JP 30724489 A JP30724489 A JP 30724489A JP 30724489 A JP30724489 A JP 30724489A JP H03167141 A JPH03167141 A JP H03167141A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- gas
- cof3
- fluorine
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 perfluoro compound Chemical class 0.000 title claims abstract description 6
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 14
- 229910021583 Cobalt(III) fluoride Inorganic materials 0.000 claims abstract description 8
- WZJQNLGQTOCWDS-UHFFFAOYSA-K cobalt(iii) fluoride Chemical compound F[Co](F)F WZJQNLGQTOCWDS-UHFFFAOYSA-K 0.000 claims abstract description 8
- KWVVTSALYXIJSS-UHFFFAOYSA-L silver(ii) fluoride Chemical compound [F-].[F-].[Ag+2] KWVVTSALYXIJSS-UHFFFAOYSA-L 0.000 claims abstract description 8
- 229910021571 Manganese(III) fluoride Inorganic materials 0.000 claims abstract description 5
- SRVINXWCFNHIQZ-UHFFFAOYSA-K manganese(iii) fluoride Chemical compound [F-].[F-].[F-].[Mn+3] SRVINXWCFNHIQZ-UHFFFAOYSA-K 0.000 claims abstract description 5
- 150000003839 salts Chemical class 0.000 claims abstract description 5
- 239000000203 mixture Substances 0.000 claims description 8
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 claims description 6
- 239000011698 potassium fluoride Substances 0.000 claims description 3
- 235000003270 potassium fluoride Nutrition 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims 1
- 239000007789 gas Substances 0.000 abstract description 24
- 239000011737 fluorine Substances 0.000 abstract description 15
- 229910052731 fluorine Inorganic materials 0.000 abstract description 15
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 abstract description 9
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 abstract description 9
- 239000007788 liquid Substances 0.000 abstract description 6
- 238000001816 cooling Methods 0.000 abstract description 3
- 239000001257 hydrogen Substances 0.000 abstract description 3
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 238000004140 cleaning Methods 0.000 abstract description 2
- 238000005530 etching Methods 0.000 abstract description 2
- 239000012212 insulator Substances 0.000 abstract description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000012808 vapor phase Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 15
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 7
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 6
- 239000005977 Ethylene Substances 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 238000003682 fluorination reaction Methods 0.000 description 4
- 238000003776 cleavage reaction Methods 0.000 description 3
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000007017 scission Effects 0.000 description 3
- XNMQEEKYCVKGBD-UHFFFAOYSA-N 2-butyne Chemical compound CC#CC XNMQEEKYCVKGBD-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000013256 coordination polymer Substances 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 2
- NKTDTMONXHODTI-UHFFFAOYSA-N 2-pentyne Chemical group CCC#CC NKTDTMONXHODTI-UHFFFAOYSA-N 0.000 description 1
- SLMFWJQZLPEDDU-UHFFFAOYSA-N 4-methylpent-2-yne Chemical compound CC#CC(C)C SLMFWJQZLPEDDU-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- MWWATHDPGQKSAR-UHFFFAOYSA-N propyne Chemical group CC#C MWWATHDPGQKSAR-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/013—Preparation of halogenated hydrocarbons by addition of halogens
- C07C17/06—Preparation of halogenated hydrocarbons by addition of halogens combined with replacement of hydrogen atoms by halogens
Abstract
Description
【発明の詳細な説明】 産業上夏剋■分立 本発明はパーフルオロ化合物の製造法に関する。[Detailed description of the invention] Industrial Summer ■Separation The present invention relates to a method for producing perfluorinated compounds.
パーフルオロ化合物は常温で気体の化合物の場合は半導
体工業におけるエツチングガス、クリーニングガス、気
相絶縁体、リークテスト剤等、幅広い用途を有し、また
常温で液体の化合物の場合は、半導体工業における各種
テスト用液体、冷却用液体等の用途を有し、いずれも工
業的に重要な化合物である。Perfluorinated compounds have a wide range of uses in the semiconductor industry, such as etching gases, cleaning gases, gas-phase insulators, and leak test agents, when they are gaseous at room temperature, and when they are liquid at room temperature, they are used in the semiconductor industry. It has uses such as various test liquids and cooling liquids, and both are industrially important compounds.
の ′ その。の ′ That.
パーフルオロ化合物の製造を六フッ化エタンの製造を例
にして以下に説明する。The production of a perfluoro compound will be explained below using the production of hexafluoroethane as an example.
六フッ化エタンの製造方法としては、(1)フッ素ガス
を用いてエタンと反応させる直接フツ素化法、(2)エ
タン及び/又はエチレンを原料とする電解フツ素化法、
(3)四フッ化エチレン等を熱分解する熱分解法、(4
)エタン及び/又はエチレンを金属フッ化物を用いてフ
ッ素化する方法等がある。しかしながら、上記(1)の
方法は極めて反応性に富むフッ素ガスを用いるため、爆
発及び腐食等の危険があり、特殊な構造の反応装置を用
いなければならず、さらに発熱によるC−C結合の切断
、重合などの副反応を抑制するために多量の不活性ガス
の共存使用を必要とする。(2)の方法は副反応が多く
、生成物の分離、精製に問題があり、(3)の方法は反
応に高温を要し、しかも収率が低い。Methods for producing hexafluoroethane include (1) a direct fluorination method in which fluorine gas is used to react with ethane, (2) an electrolytic fluorination method using ethane and/or ethylene as raw materials,
(3) Pyrolysis method of thermally decomposing tetrafluoroethylene, etc., (4
) There is a method of fluorinating ethane and/or ethylene using a metal fluoride. However, since the method (1) above uses highly reactive fluorine gas, there is a risk of explosion and corrosion, and a reactor with a special structure must be used. In order to suppress side reactions such as cutting and polymerization, it is necessary to coexist with a large amount of inert gas. Method (2) involves many side reactions and has problems in separation and purification of the product, while method (3) requires high temperatures for the reaction and has a low yield.
また(4)の方法は反応式で示すと、エタンを原料とす
る場合は、
C!)16 + 12CoFff→CzF* + 6H
P + 12CoFzであり、副生ずるCoatはフッ
素ガスでフッ素化しCoF 、に転化させ再使用する。In addition, method (4) is shown in the reaction formula: When ethane is used as a raw material, C! )16 + 12CoFff→CzF* + 6H
P + 12CoFz, and the by-product Coat is fluorinated with fluorine gas, converted to CoF, and reused.
即ち、12CoPz +6Fz −’ 12COF3
また、エチレンを原料とする場合は、
CzHa + 10COF3 − C2F4 + 4
8F + 10CoFz10CoFz+5F2−+
10CoF3である0以上の反応式より明らかな通り、
エタンを原料とする場合はエタン1モルにつき6モルの
フッ素が、エチレンを原料とする場合はエチレン1モル
につき5モルのフッ素が必要である0反応熱はフッ素の
モル数に比例し、フッ素置が多い程反応熱が大きくなる
。そのため炭素−炭素結合の切断や爆発が起りやすく、
収率の低下をもたらし、そして工業的操業上の問題とな
る。また、フッ素は通常酸性フッ化カリ (KP・21
1F)の溶融塩電解により製造されており、電力及び蒸
気コスト等がかさむため高価である。従って、フッ素の
使用量はできる限り少ないことが望ましい。That is, 12CoPz +6Fz −' 12COF3
In addition, when using ethylene as a raw material, CzHa + 10COF3 - C2F4 + 4
8F + 10CoFz10CoFz+5F2-+
As is clear from the reaction formula of 0 or more which is 10CoF3,
When using ethane as a raw material, 6 moles of fluorine are required per mole of ethane, and when using ethylene as a raw material, 5 moles of fluorine are required per mole of ethylene.0The heat of reaction is proportional to the number of moles of fluorine; The greater the amount, the greater the reaction heat. As a result, carbon-carbon bonds are easily broken and explosions occur.
This results in a decrease in yield and poses a problem in industrial operations. In addition, fluorine is usually acidic potassium fluoride (KP・21
1F) is produced by molten salt electrolysis, and is expensive due to high electricity and steam costs. Therefore, it is desirable that the amount of fluorine used be as small as possible.
全凱夏且敢
本発明の目的は、フッ素の消費量を少なく、安全に効率
良くパーフルオロ化合物を製造することにある。An object of the present invention is to reduce the amount of fluorine consumed and to produce perfluorinated compounds safely and efficiently.
血皿坐古容
本発明は分子内に三重結合を有する化合物を三フッ化コ
バルト(CoFs) 、ニフッ化銀(^gh)、三フッ
化マンガン(MnF3)、及びフッ化カリウムと三フッ
化コバルトの複合塩(にCoF4)の内の1種又は2種
以上の混合物によりフッ素化することを特徴とするパー
フルオロ化合物の製造法である。The present invention uses compounds with triple bonds in their molecules such as cobalt trifluoride (CoFs), silver difluoride (^gh), manganese trifluoride (MnF3), and potassium fluoride and cobalt trifluoride. This is a method for producing a perfluoro compound, characterized by fluorination with one or a mixture of two or more of complex salts (CoF4).
分子内に三重結合を有する化合物としてはアセチレン、
メチルアセチレン、2−ブチン、メチルエチルアセチレ
ン、4−メチル−2−ペンチンの様な炭化水素の他、水
素の1部又は全部がフッ素で置換された化合物、例えば
CHECP、ChCEC)l、CFsCミCCF、、C
PsC=CCH2、CtFsC=CH:(CH3) s
CCミCP、 H(CFg)sCミC(CFt)sHの
様な化合物を指す0本発明においては特にアセチレン又
はその分子内水素がフッ素で置換されている化合物を原
料とした場合に好ましい結果が得られる。Compounds with triple bonds in the molecule include acetylene,
In addition to hydrocarbons such as methylacetylene, 2-butyne, methylethylacetylene, and 4-methyl-2-pentyne, compounds in which part or all of hydrogen is replaced with fluorine, such as CHECP, ChCEC)l, CFsCmiCCF ,,C
PsC=CCH2, CtFsC=CH:(CH3)s
CCmiCP, refers to compounds such as H(CFg)sCmiC(CFt)sH In the present invention, particularly favorable results are obtained when acetylene or a compound in which hydrogen in its molecule is replaced with fluorine is used as a raw material. can get.
本発明により、六フッ化エタンを製造する場合を反応式
で示せず以下の通りである。The reaction formula for producing hexafluoroethane according to the present invention is as follows.
C*Hg+8CoFs →’ CzPh+2HF+8C
oFx8CoFz+ 4Fz −8CoF。C*Hg+8CoFs →' CzPh+2HF+8C
oFx8CoFz+ 4Fz -8CoF.
すなわち、アセチレン1モルに対して4モルのフッ素ガ
スを使用するだけで済み、反応熱の制御が容易で、工業
的利用価値が大きい、従来この方法が実施或いは示唆さ
れていない理由は、おそらくアセチレンの危険性及び三
重結合が切れやすいとの認識が強かったためと思われる
が、本発明の方法によれば、安全に収率良く目的生成物
パーフルオロ化合物を得ることができる。In other words, it is only necessary to use 4 moles of fluorine gas per 1 mole of acetylene, the reaction heat can be easily controlled, and it has great industrial utility value.The reason why this method has not been implemented or suggested in the past is probably that Although this is probably due to the strong awareness of the dangers of oxidation and the tendency for triple bonds to break, the method of the present invention makes it possible to safely obtain the desired perfluorinated compound in a high yield.
本発明における好ましい反応温度は150〜400℃で
あるが、特に好ましくは250〜350°Cである。The preferred reaction temperature in the present invention is 150 to 400°C, particularly preferably 250 to 350°C.
1益班
以下に実施例を示し、本発明の内容をより具体的に説明
する。EXAMPLE 1 The contents of the present invention will be explained in more detail by showing examples below.
皇益■上
ニッケル製反応器にCoP 555kgを仕込み、窒素
気流中300°Cに昇温し、次いでアセチレンガスを8
00d/分の流速で送入した0反応生成ガスは10%水
酸化カリウム水溶液を循環したアルカリ洗浄塔に通し、
フ2化水素を除去し、次いでガスクロマトグラフィーに
より組成分析を行った。555 kg of CoP was charged into a reactor made of nickel and heated to 300°C in a nitrogen stream, and then acetylene gas was heated to 8°C.
The reaction product gas fed at a flow rate of 00 d/min was passed through an alkali washing tower in which a 10% aqueous potassium hydroxide solution was circulated.
After removing hydrogen fluoride, the composition was analyzed by gas chromatography.
2時間反応を続け、20分間隔で分析を行ったところ、
平均ガス組成は次の通りであった。The reaction continued for 2 hours and analysis was performed at 20 minute intervals.
The average gas composition was as follows.
CF、 1.8%(面積パーセント、以下同じ)
clp、 98.1%
その他 0.1%
CF4はC−C結合の切断により住成したものと考えら
れるが、C−C結合の切断は0.9%と推定される。CF, 1.8% (area percentage, same below)
clp, 98.1% Others 0.1% CF4 is thought to be formed by cleavage of C-C bonds, but the cleavage of C-C bonds is estimated to be 0.9%.
次に、反応器に窒素を通じ200℃迄冷却した後、フッ
素ガスを5Fz分の流速で送入し、Cod、をCoF
sに転化させ、転化終了後、300℃に昇温しながら反
応器内のフッ素ガスを窒素で置換し、再びアセチレンガ
スを800d/分の流速で送入した。Next, after passing nitrogen into the reactor and cooling it to 200°C, fluorine gas was introduced at a flow rate of 5 Fz to convert Cod into CoF.
After the conversion was completed, the fluorine gas in the reactor was replaced with nitrogen while the temperature was raised to 300°C, and acetylene gas was again fed at a flow rate of 800 d/min.
反応ガスを前記と同様に分析し、はぼ同一の値を得た。The reaction gas was analyzed as before and almost identical values were obtained.
1隻11
実施例1で用いた反応器を220°Cに温度設定し、ア
セチレンガスを300InlZ分の流速で送入した。1 ship 11 The temperature of the reactor used in Example 1 was set at 220°C, and acetylene gas was fed at a flow rate of 300 InlZ.
実施例1と同様にして分析した結果、平均ガス組成は次
の通りであった。As a result of analysis in the same manner as in Example 1, the average gas composition was as follows.
CP、 0.2%C2F、
97.4%CHF、CP、及びCHFz
CHPz 1.3%その他 1.1
%
実差朋ユ
実施例−1で用いた反応器にMnF+を50kg仕込み
、実施例1と同様の条件で反応を行ったところ、平均ガ
ス組成は次の通りであった。CP, 0.2% C2F,
97.4% CHF, CP, and CHFz
CHPz 1.3% Others 1.1
% Actual difference When 50 kg of MnF+ was charged into the reactor used in Example 1 and a reaction was carried out under the same conditions as in Example 1, the average gas composition was as follows.
CF4 1.9%
CzF6 97.0%
その他 1.1%
尖施孤土
ニッケル製反応器(直径5.3cm長さ100cm)に
AgF、を1 kg仕込み、250’Cでアセチレンガ
スを50m1Z分の流速で送入し、フッ素化を行った。CF4 1.9% CzF6 97.0% Others 1.1% 1 kg of AgF was placed in a nickel reactor (diameter 5.3 cm and length 100 cm), and acetylene gas was heated to 50 m 1Z at 250'C. Fluorination was carried out by feeding at a flow rate.
実施例1と同様の方法で分析したところ平均ガス組成は
次の通りであった。When analyzed in the same manner as in Example 1, the average gas composition was as follows.
CF4 0.2%
C2F、 96.3%
その他 3.5%
夫巌例工
実施例4で使用した反応器にAgF、に代えてにCaF
2を1kg仕込み、以下実施例4と同様の方法により反
応及び分析を行ったところ、平均ガス組成は以下の通り
であった。CF4 0.2% C2F, 96.3% Others 3.5% AgF was used in the reactor used in Fuwao Example 4, and CaF was used instead of AgF.
2 was charged, and the reaction and analysis were carried out in the same manner as in Example 4, and the average gas composition was as follows.
CF、 0.2%
CzFa 95.9%
その他 3.9%
且」旧舛
実施例1で使用した反応器を300°Cに温度設定し、
次いでエタンガス(CH3CH3)を800d/分の流
速で送入した0反応発熱量が大きく反応開始20分後4
60°Cに上昇した0反応ガスを分析したところ次の通
りであった。CF, 0.2% CzFa 95.9% Others 3.9% The temperature of the reactor used in Example 1 was set at 300°C,
Next, ethane gas (CH3CH3) was introduced at a flow rate of 800 d/min.The calorific value of the reaction was large and 20 minutes after the start of the reaction, 4
The analysis of the zero reaction gas that had risen to 60°C revealed the following.
CFa 31.2%
Cff1F、 53.6%
その他 15.2%
次にエチレンガス(CH3CH3)を同様の条件でフッ
素化したところ、反応開始30分後、温度は425°C
に上昇した0反応ガスは次の通りであった。CFa 31.2% Cff1F, 53.6% Others 15.2% Next, when ethylene gas (CH3CH3) was fluorinated under the same conditions, the temperature was 425°C 30 minutes after the start of the reaction.
The zero reactant gases that rose to 0 were as follows:
CF4 17.9%
C2F4 64.6%
その他 17,5%
これらの場合、CF4の生成量が多く、C−C結合の切
断がアセチレンの場合に比べて大きいことがわかる。CF4 17.9% C2F4 64.6% Others 17.5% It can be seen that in these cases, the amount of CF4 produced is large and the cleavage of the C--C bond is greater than in the case of acetylene.
Claims (1)
ルト(CoF_3)、二フッ化銀(AgF_2)、三フ
ッ化マンガン(MnF_3)、及びフッ化カリウムと三
フッ化コバルトの複合塩(KCoF_4)の内の1種又
は2種以上の混合物によりフッ素化することを特徴とす
るパーフルオロ化合物の製造法。1. Compounds with triple bonds in the molecule include cobalt trifluoride (CoF_3), silver difluoride (AgF_2), manganese trifluoride (MnF_3), and a composite salt of potassium fluoride and cobalt trifluoride (KCoF_4). 1. A method for producing a perfluoro compound, which comprises fluorinating with one or a mixture of two or more of the following.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1307244A JP2739763B2 (en) | 1989-11-27 | 1989-11-27 | Method for producing perfluoro compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1307244A JP2739763B2 (en) | 1989-11-27 | 1989-11-27 | Method for producing perfluoro compound |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03167141A true JPH03167141A (en) | 1991-07-19 |
JP2739763B2 JP2739763B2 (en) | 1998-04-15 |
Family
ID=17966773
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1307244A Expired - Lifetime JP2739763B2 (en) | 1989-11-27 | 1989-11-27 | Method for producing perfluoro compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2739763B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007106726A (en) * | 2005-10-17 | 2007-04-26 | National Institute Of Advanced Industrial & Technology | Method for producing 1,1,2,2,3-pentafluorocyclobutane |
CN114573417A (en) * | 2021-12-23 | 2022-06-03 | 西安近代化学研究所 | Preparation method of tetrafluoromethane and tetrafluoromethane mixed gas |
-
1989
- 1989-11-27 JP JP1307244A patent/JP2739763B2/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007106726A (en) * | 2005-10-17 | 2007-04-26 | National Institute Of Advanced Industrial & Technology | Method for producing 1,1,2,2,3-pentafluorocyclobutane |
CN114573417A (en) * | 2021-12-23 | 2022-06-03 | 西安近代化学研究所 | Preparation method of tetrafluoromethane and tetrafluoromethane mixed gas |
CN114573417B (en) * | 2021-12-23 | 2023-12-12 | 西安近代化学研究所 | Preparation method of tetrafluoromethane and tetrafluoromethane mixed gas |
Also Published As
Publication number | Publication date |
---|---|
JP2739763B2 (en) | 1998-04-15 |
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