JPH0316636A - Method for changing molecular structure of water and controlling reaction rate without changing component contained in aqueous solution and water in gas - Google Patents
Method for changing molecular structure of water and controlling reaction rate without changing component contained in aqueous solution and water in gasInfo
- Publication number
- JPH0316636A JPH0316636A JP11365989A JP11365989A JPH0316636A JP H0316636 A JPH0316636 A JP H0316636A JP 11365989 A JP11365989 A JP 11365989A JP 11365989 A JP11365989 A JP 11365989A JP H0316636 A JPH0316636 A JP H0316636A
- Authority
- JP
- Japan
- Prior art keywords
- water
- gas
- treated
- changing
- rays
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 708
- 238000006243 chemical reaction Methods 0.000 title claims abstract description 98
- 238000000034 method Methods 0.000 title claims description 74
- 239000007864 aqueous solution Substances 0.000 title claims description 67
- 238000011282 treatment Methods 0.000 claims abstract description 91
- 239000002198 insoluble material Substances 0.000 claims abstract description 5
- 239000007789 gas Substances 0.000 claims description 222
- 239000000126 substance Substances 0.000 claims description 94
- 229910052709 silver Inorganic materials 0.000 claims description 38
- 239000004332 silver Substances 0.000 claims description 38
- 238000010438 heat treatment Methods 0.000 claims description 36
- 238000001816 cooling Methods 0.000 claims description 35
- 229910052751 metal Inorganic materials 0.000 claims description 24
- 239000002184 metal Substances 0.000 claims description 24
- 238000002347 injection Methods 0.000 claims description 19
- 239000007924 injection Substances 0.000 claims description 19
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 14
- 229910000765 intermetallic Inorganic materials 0.000 claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 10
- 238000012545 processing Methods 0.000 claims description 10
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 9
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 8
- 239000000919 ceramic Substances 0.000 claims description 8
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 8
- 235000012239 silicon dioxide Nutrition 0.000 claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 150000002739 metals Chemical class 0.000 claims description 6
- 150000004767 nitrides Chemical class 0.000 claims description 6
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 6
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 6
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 6
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 6
- 230000008859 change Effects 0.000 claims description 5
- 229910052976 metal sulfide Inorganic materials 0.000 claims description 5
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 5
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 5
- 230000008569 process Effects 0.000 claims description 5
- 230000005855 radiation Effects 0.000 claims description 5
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 4
- 229910000428 cobalt oxide Inorganic materials 0.000 claims description 3
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 claims description 3
- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 150000004706 metal oxides Chemical class 0.000 claims description 3
- 239000000243 solution Substances 0.000 claims description 2
- 229910021538 borax Inorganic materials 0.000 claims 1
- 125000005624 silicic acid group Chemical group 0.000 claims 1
- 239000004328 sodium tetraborate Substances 0.000 claims 1
- 235000010339 sodium tetraborate Nutrition 0.000 claims 1
- 238000003860 storage Methods 0.000 abstract description 21
- 239000012535 impurity Substances 0.000 abstract description 20
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 22
- 238000004458 analytical method Methods 0.000 description 9
- 239000007788 liquid Substances 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 230000000007 visual effect Effects 0.000 description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 238000003908 quality control method Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 238000011284 combination treatment Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- -1 densified aldinium Chemical compound 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 235000013399 edible fruits Nutrition 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 241000411851 herbal medicine Species 0.000 description 2
- 239000003456 ion exchange resin Substances 0.000 description 2
- 229920003303 ion-exchange polymer Polymers 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000005272 metallurgy Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000000329 molecular dynamics simulation Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000001223 reverse osmosis Methods 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 235000008708 Morus alba Nutrition 0.000 description 1
- 240000000249 Morus alba Species 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 241001482564 Nyctereutes procyonoides Species 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 241001674048 Phthiraptera Species 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- CAVCGVPGBKGDTG-UHFFFAOYSA-N alumanylidynemethyl(alumanylidynemethylalumanylidenemethylidene)alumane Chemical compound [Al]#C[Al]=C=[Al]C#[Al] CAVCGVPGBKGDTG-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- VXAUWWUXCIMFIM-UHFFFAOYSA-M aluminum;oxygen(2-);hydroxide Chemical compound [OH-].[O-2].[Al+3] VXAUWWUXCIMFIM-UHFFFAOYSA-M 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 230000002421 anti-septic effect Effects 0.000 description 1
- 230000000840 anti-viral effect Effects 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 230000032823 cell division Effects 0.000 description 1
- 210000000170 cell membrane Anatomy 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010612 desalination reaction Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000013505 freshwater Substances 0.000 description 1
- 150000002344 gold compounds Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002483 hydrogen compounds Chemical class 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000001900 immune effect Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000008239 natural water Substances 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000002195 soluble material Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 235000019465 surimi Nutrition 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Abstract
Description
【産朶１゛．の技術分９１１
本発明は、特定の分゛ｒ配列構造をイｆする水並びに１
，｝定の分子配列構造をイｆする水を含む水溶液，含水
物質（本発明においては構造水という）及び気体中水の
含有成分を変えることなく，水の分子構造を変え，反応
速度をコントロールする袈７？？及び方法に関する．
【従宋の技術］
天然水は液中にｒｆ．／Ｅする物質の組成に従って液中
の陰イオンにもとづき（１）塩化物質 （２》炭化水素
質《３》硫酸塩質の三つに分けられる．さらにそれぞれ
の三神類は陽イオンの神類に従って（１）ナトリウム質
｛２）マグネシウム？ｔ （３）カリウム賀（４｝ カ
ルシウム質の４種類に分けられるので全部でｌｌｔｆｌ
の水があるとイえられている．さらに，生体水，水道水
，人造水雰厳密な分析によれば丁・χノＪ゛別である．
この千差万別の水及び含水物質の水の性質を判別するこ
とは現在に於ては不ｉ’ｌ能と云われている．
Ｔ．価三ｔＩＩ鉄塩含イ７２ ｘ １ ０−” モＡｔ
／ Ｉ ｆ）処理水はイオン反沁抑制作川があり，金属
腐蝕抑制作用、塩障書除去作用，土鳩障害除去作用．防
腐作用，抗ウイルス作用，抗廟作川，免疫作用専の神〜
の生卵作用があるということは特公開昭５９−１９０２
２６号によって、公知の１１実であり、又，天然にイｔ
在する表飯石，太陽石、中［Ｉ１４の漢方桑石より反応
して得られた水又はイオン水，非イオン水の人］ニ水も
市鳩に多く提供されており，これらの水の何効作川が谷
神研究機関団体においても認められている．
・ｈ現７Ｉ６，水の構造について、周期表中で酸素のま
わりの元素（室素、硫黄．弗素専）の水素化合物にくら
べ水は特に沸点，融点が１１′５い．またルートン走敗
，表而張ノハω人密度，温度、その他の点においても水
は異常な状態を示すことが知られている．このことは水
素帖合による水分子・の配列のため擬鮎品摺逍（氷の結
品構造が部分的に桟っている》の型を構成していると占
えられている．又Ｘ線１■１析によると細胞膜の第−・
）Ｍ ［１は完全なＩ！ｌＩ造水である．さらに水は温
度，光． ＩＦ力，及び水に含有されている物質専によ
り綱造化が変化することも知られている．
このように水は丁・；’ｎ Ｊｊ別の状態で０／Ｅして
おり，化′ｉ反尾速度にも丁・差万別にかかわっている
ことがわかっている．その化学反応速度を経験的に制御
し正常な化学反応を行なわしめる努力をしているが的確
に化学反応な；Ｐ３ １１するｈ法及び装置はないのが
実状である．
また，水は物質に接触すると水のｔｌｌｌＴｉ化が変わ
り，水の持っている反応速度が変化することが知られて
いる．また，水に物理作用を与えると，水のｔＭ造化も
変わり反応速度が変化することも知られている。そこで
物質に水を接触させることと物Ｆ１＋作用を同時に行わ
せたり゛．Ｉｎ次それぞれ行うと，効串よく水の構逍化
、すなわち水の反応速度を制御することが可能となる．
従来は水の中に可泗性物質を泪かして水溶液等の化学反
応を速くしたり遅くしたりしていた．また、物狸処理の
みで水の化？反応速度をコントロールしていたが，水溶
液に物質を溶かす方法は水の成分を変えて水そのものの
構造を変える欠点がある．また，物理処理のみでは化学
反応速度のコントロールが効串よく行われない欠点があ
った．
【発明が解決しようとする問題点】
従来技術で解明されているごとく構造化された水は化学
反応速度は遅く構造化が不完全な水は化学反応速度は速
い．即ち水の関わっている化学反応系に於ては化学反応
条件《化学物質のｍ，＋１１１．ｆＩＩ化還元宙拉，温
度，リし力、重気重専専）を・定にした場合，水のｔＭ
逍化が化学反応速度を決定している．そこで化？反応速
度が判れば水の構逍化が必然的に決定できる．
・力水に電磁波（例えばａ線、ｘ線、紫外線．■■視光
線．遠赤外線．赤外線．超遠赤外。（牡波，光等）を照
射すると耗験的にも科′ｔ分析的にも化？反応速度が変
わることが判っている．それ専のことにより電磁波の照
射］−１をｌｉ｛Ｊ ｍすれ１ｆ化学反応速度即ち水の
構造化を：ＩＩ１１御することができる．本発明は、特
定の分子Ａ！列構造をイｆした水ｑｐびに特定の分子配
列構逍をイ１゜する水を含む水溶液及び含水物質の製造
装１ｎ，並びに，水が棲触すると水を変化させる物質と
物Ｐ１＋作用とを糾合わせることにより効串良く水の化
′？反応速度をコントロールすることができる方法、ま
た，原水または気体中の化′？成分を変えることなく水
溶液の化学反応速度を制御できる方法，また．接触法で
水に水溶性物質を使って半永久的に作用させることがで
きる方法を捉ａｃすることを１１的とするものである．
[Produce 1゛. TECHNICAL PART 911 The present invention provides water with a specific fractional arrangement structure and
, }Change the molecular structure of water to control the reaction rate without changing the components of water in an aqueous solution containing water, a water-containing substance (referred to as structured water in the present invention), and water in a gas that has a certain molecular arrangement structure. 7? ? and methods. [Technology of the Congregation Song Dynasty] Natural water has RF. /E substances are divided into three types based on the anions in the liquid: (1) chloride substances, (2) hydrocarbon substances, and (3) sulfate substances.Furthermore, each of the three gods is a cation god. According to (1) Sodium {2) Magnesium? (3) Potassium (4) Divided into four types of calcium, total lltfl
It is said that there is water in the area. Furthermore, according to rigorous analysis of living water, tap water, and artificial water, there is a distinction between ``D'' and ``J''.
At present, it is said to be impossible to distinguish the water properties of these various water and water-containing substances. T. Contains 3tII iron salts 72 x 1 0-”
/ I f) The treated water has an ion reaction suppressing effect, which has the effect of suppressing metal corrosion, removing salt damage, and removing soil damage. A god specializing in antiseptic, antiviral, anti-myozo, and immune effects.
The fact that it has a raw egg effect is revealed in a special publication published in 1982-1902.
No. 26, it is a known 11 fruit, and it is also naturally produced.
Ichihato is also provided with a lot of Omotehanseki, Taiyoiseki, and Naka [water obtained by reaction from the Chinese herbal mulberry stone in I14, or ionized water, and non-ionized water]. The Eisakugawa River is also recognized by the Tanigami Research Institute Association.・h Current 7I6, Regarding the structure of water, compared to the hydrogen compounds of the elements surrounding oxygen (chlorine, sulfur, and fluorine) in the periodic table, water has a particularly high boiling point and melting point of 11'5. It is also known that water exhibits abnormal conditions in terms of Luton's run and defeat, population density, temperature, and other points. This is believed to be due to the arrangement of water molecules due to hydrogen integration, forming a pseudo-ayu product (partially flanked by ice crystal structure).Also, X-ray According to 1.1 analysis, the number of cell membranes is
) M [1 is a complete I! This is lI fresh water. Furthermore, water has temperature and light. It is also known that the structure changes depending on the IF force and the substances contained in water. In this way, water is 0/E in different states, and it is known that the reverse velocity is also involved in different states. Efforts have been made to empirically control the rate of chemical reactions and carry out normal chemical reactions, but the reality is that there is no method or device that can accurately carry out chemical reactions. It is also known that when water comes into contact with a substance, the tlllTi conversion of water changes, and the reaction rate of water changes. It is also known that when a physical action is applied to water, the tM formation of water changes and the reaction rate changes. Therefore, by bringing water into contact with the substance and causing the substance F1+ action to occur at the same time. By performing each of the following steps, it becomes possible to effectively control the structure of water, that is, the reaction rate of water.
Traditionally, a malleable substance was soaked in water to speed up or slow down chemical reactions in aqueous solutions. Also, is it possible to turn water into water just by treating it with a raccoon dog? Although the reaction rate was controlled, the method of dissolving a substance in an aqueous solution has the drawback of changing the composition of the water and changing the structure of the water itself. In addition, physical treatment alone has the disadvantage that chemical reaction rates cannot be controlled effectively. [Problems to be solved by the invention] As has been elucidated in the prior art, structured water has a slow chemical reaction rate, while incompletely structured water has a fast chemical reaction rate. In other words, in a chemical reaction system involving water, the chemical reaction conditions 《m of chemical substance, +111. When fII conversion, reduction, temperature, pressure, heavy air heavy duty) are set to ・, the tM of water is
Phosphorization determines the rate of chemical reactions. Is it there? If the reaction rate is known, the composition of water can be determined naturally.・When power water is irradiated with electromagnetic waves (e.g. A-rays, It is known that the reaction rate changes. By applying electromagnetic waves, it is possible to control the chemical reaction rate, that is, the structuring of water by applying electromagnetic waves. The invention relates to an aqueous solution containing water having a specific molecule A! array structure and a production apparatus for a water-containing substance, and a method for changing water when it comes into contact with water. A method that can effectively control the reaction rate of water by combining the substance that causes the reaction and the substance P1+ action, and also improves the chemical reaction rate of an aqueous solution without changing the chemical reaction components in raw water or gas. The 11th objective is to find a method that can control ac, and a method that can semipermanently act on water using a contact method using a water-soluble substance.
（１）原水または気体中の水の含有成分を，非水溶件物
質にて処理！ Ｌ，た後、電磁波（例えばａ線、ｘ線、
紫外線．可視光線．遠赤外線．赤外線．超遠赤外，ｔｔ
ｔｇｔ）！ＫｌｇＬ磁気！ρＩ射．音波照射《音波照射
（音波専）、加熱冷却，ＪＩＥノハ振動、噴射専の物狸
的処理を行い，処理水または処理された気体中の水の含
有成分を得ることを特徴とする水溶液及び気体中の水の
含有成分を変えることなく水の分子構造を変え，反応速
度をコントロールする方法。（２｝原水または銀体中の
水の含有成分を、電磁波（例えばａ線、ｘ線、紫外線．
可視光線．遠赤外線．赤外線、超遠赤外電波）照射．磁
気照射．音波ＩＫ（引（音波．超音波等），加熱冷却．
Ｊ〕ｈノハ振動、噴射等の物ｒ１！的処ｉｌｌを行っ
た後，非水溶性物質にて処ｐ＋＋ Ｌて，処理水または
処理された気体中の水の含有成分を得ることを特徴とす
る水溶液及び気体中の水の含−１’ｆ成分を変えること
なく水の分子綱造を変え，反応速度をコントロールする
方法．法．
｛３）原水または気体中の水の含有成分を，非水溶４ｆ
？ｉｆｍ物にて処理！シた後、電磁波（例えばａ線、ｘ
線、紫外線， ’＋ｉｌ視光線．遠赤外線．赤外線．超
遠赤外電波）照射．磁ｚ（ Ｈ＋＜１射．音波ｐａｔ射
（音波、超音波等），加熱冷却． ｒａｔノハ振動，噴
射等の物Ｆ１！的処理ｔを行い、処理水または処理され
た気体中の水の含有成分を得ることを特徴とする水溶液
及び気体中の水の含有成分を変えることなく水の分子構
造を変え，反心速度をコントロールする方法．法．
（４）原水または気体中の水の含有成分を、電磁波《例
えばａ線、ｘ線、紫外線， ｉｉｌ視光線．遠赤外線．
赤外線、超遠赤外電波）！ｌｒＪＱＬ磁気照射．音波照
射（音波照射（音波専），加熱冷却． ｎ−．力，振動
． ＋１６１｝１’３の物理的処３１１１を行った後，
非水洞性｛Ｔ機物にて処理シて処理水または処理された
気体中の水の含有成分を得ることを特徴とする水溶液及
び気体中の水の含有成分を変えることなく，水の分子構
造を変え、反応速度をコントロールする方法．法．
（５）原水または気体中の水の含有成分を，非水溶性無
機物にて処理した後、電磁波（例えばａ線、ｘ線、・紫
外線．可視光線．遠赤外線．赤外線、超遠赤外電波）照
射．磁只照射．音波照射（音波照射（音波等），加熱冷
却、１１；ノハ振動，噴射等の物即的処理を行い、処理
水または処理された気体中の水の含イ！成分を得ること
を特徴とする水溶液及び気体中の水の含有成分を変える
ことなく，水の分７−構造を変え，反沁進度をコントロ
ールする方法．
《６》原水または気体中の水の含有成分を．ｉｌｉ！ａ
波（例えばａ線、ｘ線、紫外線．可視光線．遠赤外線．
赤外線、超遠赤外電波）照Ｑ−１．磁気照射．音波照射
（ｒ′ｉ波照射（音波、超音波等），加熱冷却． ｒ＋
三力，振動，噴Ｑ４刃の物理的処ｉｌｌを行い． ３『
水溶件無機物にて処卯木または処理！された気体中の水
の含有成分を得ることを特徴とする水ｆｆ’ｌ液及び気
体中の水の含有成分を変えることなく、水の分子摺逍を
変え，反応速度をコントロールする方法．（７）原水ま
たは虱体中の水の含有成分を、非水溶ヤＩ有機物及び非
水溶性無機物にて処理した後，電磁波（例えばａ綿、ｘ
線、紫外線．可視光線，遠赤外縮．赤外線、超遠赤外電
波）照射、磁気照射ｒ↑波照Ｑ４ （バ波、超音波？Ｐ
）．加熱冷却，ＦＥ力，振動、噴Ｑ４ ５の物１１ｌｊ
的処理を行い，処理水または処理された気体中の水の含
有成分を得ることを特徴とする水溶液及び気体中の水の
含有成分を変えることなく、水の分Ｊｌ＋Ｍ逍を変え，
反応速度をコントロールする方法．
（８》原水または気体中の含有゜成分を，非水Ｍｆｆｆ
ｆ機物にて処理シた後、電磁波（例えばａ線、ｘ線、紫
外線．ｉＩＩ視光線．遠赤外線．赤外線．超遠赤外Ｓｉ
ｔ波）照射．磁気照射＊ Ｉ’ｊ波照射《音波、超？１
波７′Ｆ），加熱冷却． １’Ｅ力、振動，噴９｛専の
物Ｆ！！的処理を行い、次に非水溶性！！１一機物にて
処理シて処理！水または処理された気体中の水の含有成
分をｆｌることを特徴とする水溶液及び気体中の水の含
有成分を変えることなく，水の分子構造を変え，反応速
度をコントロールする方法．
（９）原水または気体中の水の含４−Ｔ成分を，電磁波
（例えばａ線、ｘ線、紫外線．可視光線．遠赤外線．赤
外線．超遠赤外１Ｏ波）照射．磁気照射．音波照Ｑ４
（音波照射（音波′７７），加熱冷却，圧力，振動．ｎ
ｎ（Ｈ？ｙの物理的処ｐｌを行い、次に非水溶性有機物
にて処ＪＴＩ！ Ｌた後，非水泗性無機物にて処理して
，処理水または処理ｊされた気体中の水の含有成分を得
ることを特徴とする水溶液及び気体中の水の含有成分を
変えることなく水の分子ｈｌｌｎを変え，反応速度をコ
ントロールする方法′．
（１０）原水または気体中の水の含有成分を，非水溶性
無機物にて処理シた後，非水溶性イｉ機物にて処ＩＩＩ
！ Ｌ， ．次に電磁波（例えばａ線、ｘ線、紫外線．
■１視九紛．遠赤外線．赤外線、超遠赤外電波） Ｉｔ
（ＩＩｔ ．磁気照射．音波照射 （音波照射（音波雰
），加熱冷却，ハミカ、振動，噴Ｑ４ ？Ｊの物理的処
理を行い、処理！水または処裡された気体中の水の含有
成分を得ることを特徴とする水溶液及び気体中の水の含
有成分を変えることなく水の分子摺逍を変え，反応速度
をコントロールする方法．
（！１）原水または気体中の水の含有成分を，非水溶性
熊機物にて処理した後． 電磁波（例えばａ線、ｘ線、
紫外線、可視光線．遠赤外線．赤外線．超ｉ赤外’＋Ｉ
１ｉｊｌ ） ！”ｌ｛ ． 磁ｘ（照Ｑ１． ｎ 波
？！。（６４ （ 音波照射（音波専），加熱冷却、圧
力、振動，哨Ｑ４ ５の物ｐｌｌ的処理を行い，次に非
水溶ｆｆｊｉ機物にて処ＰＩ！ Ｌ，て処ＩＩ１！水ま
たは処Ｊｌｐされた気体中の水の含有成分をｊｉＩるこ
とを特徴とする水溶液及び気体中の水の含有成分を変え
ることなく水の分子構造を変え，反応速度をコントロー
ルする方法．
（１２）原水または気体中の水の含｛Ｔ成分を、電磁波
《例えばａ線、ｘ線、紫外線．可視光線．遠赤外線．赤
外線、超遠赤外電波）照ｇ１．磁気照射、音波照射、
（含波照射（音波笠），加熱冷却、圧力，振動、噴射等
の物Ｆｌ的処理を行った後，，Ｉ１“水溶性無機物にて
処理を行い，次に非水溶性有機物にて処理シて処裡水ま
たは処理された１ｔ体中の水の含有成分をｔｌることを
特徴とする水溶液及び気体中の水の含ｆｉ成分を変える
ことなく水の分子構造を変え，反応速度をコントロール
する方法．
｛Ｉ３》原水または気体中の水の含有成分を、叶磁波（
例えばａ線、ｘ線、紫外線．可視光線．遠赤外線．赤外
線、超遠赤外電波）照射．磁気照射．８波照射（音波照
射（音波専），加熱冷却、圧力、振動、噴射等の物理的
処ｊｌｌｌを行った後，非水溶性ｎ機物にて処理ｔを行
い，次に非水溶性金属間化合物にて処理！ シ．次に非
水溶性金属にて処理シて、処理水または処ｉｌ１された
気体中の水の含有成分を得ることを特徴とする水溶液及
び気体中の水の含有成分を変えることなく，水の分子構
造を変え，反応速度をコントロールする方法．
｛１０原水または気体中の水の含有成分を，１・■磁波
《例えばａ線、ｘ線、紫外線， ｎｆ視光線．遠赤外線
．赤外線、超遠赤外電波｝照射．磁只化ＩＱ｛．音波照
０−ｔ（Ｉ１波、超音波刃），加熱揄却，ｌ〔ノハ振動
、噴射等の物理的処Ｐｌを行った後，非水溶性物質にて
処ｐ１！を行い、次に非水溶性金属間化合物にて処理し
て、処理水または処理された気体中の水の含有成分を得
ることを特徴とする水溶液及び気体中の水の含イ丁成分
を変えることなく，水の分子ｖｔＴｉを変え，反応速度
をコントロールする方法。（ｌ５）原水または気体中の
水の含有成分を，電磁波（゛例えばａ線、ｘ線、紫外線
。（１ｆ視光線．遠赤外線．赤外線．超遠赤外ｓｔｔ波
） ｉｊ／（射．磁訊照射．音波照射（音波．超音波専
），加熱冷却． ｎ：．ノハ振動．’ｎＱ４”９ｆ）物
Ｐ１！的処理！を行ナイ．ノＩ’ 水ｆｆｉ 性物ｆｆ
ｉにて処理し、出に非水溶件金属にて処理して、処理水
または処理された？（体中の水の含有成分を得ることを
特徴とする水溶液及び気体中の水の含有成分を変えるこ
となく．水の分子構遣を変え，反応速度をコントロール
する方法．
（Ｉ６》原水または気体中の水の含有成分を、ｓｔｔ磁
波（例えばａ ｌｌ 、ｘ線、紫外線， ｉｉｌ視光線
．遠赤外線．赤外線．超遠赤外市波）照射．磁気熊射．
音波照Ｑ４（ｉ’？波照射（音波専）、加熱冷却． ７
１ミカ，振動．７１Ｑ｛等の物理的処理を行ない，非水
溶件金属間化合物にて処理して．次に非水溶性金属にて
処ｎ！シて処理水または処理！された気体中の水の含イ
ｒ成分を得ることを特徴とする水泗液及び気体中の水の
含ｉｆ成分を変えることなく，水の分子？ｌｌｔＢを変
え，反応速度をコントロールする方法．（１７）原水ま
たは気体中の水の含有成分を．？ｌｔ磁波（例えばａ
Ｉｉ！、ｘ線、紫外線．可視光線．遠赤外線．赤外綿．
超遠赤外市波）照射．磁気照射、音波照射（音波照射（
箭波？？），加熱冷却，ｎミノハ振動、噴射専の物ｐｌ
ｌ的処Ｆ１を行ない，非水溶性金属間化合物にて処理し
て，処ｉｌｌ水または処理された銀体中の水の含有成分
を得ることを特徴とする水溶液及び気体中の水の含有成
分を変えることなく，水の分ｊ’ｔＭＴｉを変え，反応
速度をコントロールする方法．
｛ｌ８》原水または気体中の水の含有成分を、電磁波（
例えばａ ｌｌ 、ｘ線、紫外線．可視光線．遠赤外線
．赤外縮．超遠赤外１′Ｉ１波）照射．磁気照射．音波
ＩＶ。（射（音波照射（音波専），加熱冷却，圧力、振
動，噴ｔＲ専の物理的処理を行ない、非水溶性金穎にて
処理！ Ｌ，て、処理水または処理された気体中の水の
含Ｙｉ成分を得ることを特徴とする水溶液及び気体中の
水の含Ｉｆ成分を変えることなく，水の分Ｙ・構造を変
え、反応速度をコントロールする方法．
｛１９｝原水またはｔ（体中の水の含Ｎ成分を．６Ｉｖ
（醸化６シ素），酸化アルミニウム（アルミナ）炭化社
素を組合せ処理し，次＄二鉗にて処理した後、電磁波Ｊ
ｌ４（射（例えばａ Ｉｆｄ 、ｘ線、紫外線．可視光
線、遠赤外線、赤外線．超遠亦外電波専）にて処３１１
１して，処理ｅ水または処ｊｌｌｊされたＳａｔ体中の
水の含有成分を得ることを特徴とする水溶液及び気体中
の水の含有成分を変えることなく，水の分子構造を変え
．反応速度をコントロールする方法
（２０３７１１水または％Ｌ体中の水の含有成分を．６
１酸（＃化６Ｆ′素），酸化アルミニウム，酸化鉄．酸
化ニッケル，ｉｖ化コバルト及び酸化チタンを組合せ処
理！ Ｌ ．次に鉗にて処理した後電磁波照射（例えば
ａ線、ｘ線、紫外線， ｉ＋ｊ視光線、遠赤外線、赤外
線．超遠赤外電波専）にて処理して処裡水または処７１
１１された気体中の水の含（ｒ成分を得ることを特徴と
する水溶液及び気体中の水の含有成分を変えることなく
．水の分子摺逍を食え、反応速麿をコントロールするノ
Ｊ法．
（２１）原水または気体中の水の含有成分を、砂酸（Ｎ
ＸＩ化６ｔ素）、酸化アルミニウム（アルミナ）、炭化
６［素を組合せて処理シて、更に非水溶性何機物にて処
理した後銀にて処理し，次に％ｔｔ磁波照射（例えばａ
線、ｘ線、紫外線．可視光線．遠赤外線．赤外線、超遠
赤外電波専）にて処理シて，処理ｉ水または処理された
気体中の水の含有成分を得ることを特徴とする水溶液及
び気体中の水の含有成分を変えることなく，水の分子構
造を変え．反応速度をコントロール１゛る方法．
｛２２｝原水または気体中の水の含有成分を，窒化アル
ミ、窒化硅素，窄化ホーソその他のセラミックを組合せ
にて処裡し，次に非水溶性｛ｆｌｌ物及び銀にて処理し
て徂磁波！！＜｛Ｑ４（例えばａ線、ｘ線、紫外線，
＋４視光線．遠赤外線．赤外線、超遠赤外電波、超音波
等）を施して、処理水または処裡された気体中の水の含
有成分を得ることを特徴とする水溶液及び気体中の水の
含イ．Ｔ成分を変えることなく，水の分子＋ＭＤを変え
，反応速１文をコントロールする方法．
（２３）原水または気体中の水の含有成分を，金Ｗ４酸
化物，金ｋＡＶｔ化物，その他の非水溶性金雇を組合せ
゛処ＩＩＩ！ Ｌ ．次に非水溶件有機物及び銀にて処
理しテＳ［磁汲照９｛（例えばａ ａ 、ｘ線、紫外線
．可視光線．遠赤外線．赤外線．超遠赤外電波等》を行
って、処理水または処理された気体中の水の含有成分を
得ることを特徴と゜４る水瀉液及び気体中の水の含有゛
成分を変えることなく，水の分子＋Ｍｎを変え，反応速
度をコントロールする方法．
（２４）原水または気体中の水の含有成分を６Ｐ．ｆａ
ＣＭ化社素）．＃化鉄．＃化ニッケルを組合せ処理して
，次に非水溶性有機物にて処理！ Ｌ，た後，銀にて処
川！して，次に重磁汲照射（例えばα線、ｘ線、紫外線
．可視光線．遠赤外線，赤外線．超遠赤外ｓｔｔ波、超
音波等｝を行って処１１ｌｉ水または処１１１ｊされた
気体中の水の含有成分をｆ！ｌることを特徴とする水溶
液及び気体中の水の含有成分を変えることなく，水の分
子一構造を変え、反応速度をコントロールする方法．
（２５）原水または気体中の水の含有成分を，セラくッ
ク処理を行った後、銀にて処理して、処理水または処理
された気体中の水の含有成分を得ることを特徴とする水
溶液及び気体中の水の含有成分を変えることなく，水の
分子ｈｉｌｌを変え，反応速度をコントロールする方法
．
（２６）原水または気体中の水の含有成分を，非水溶性
物質で処理ｌを行った後，銀にて処理シて，処理水また
は処理された気体中の水の含有成分を得ることを特徴と
する水溶液及び気体中の水の含有成分を変えることなく
，水の分子構造を変え，反応速度をコントロールする方
法．
（２７》原水または気体中の水の含有成分を，非水溶性
有機物で処理を行った後，釦にて処理シて、処理！水ま
たは処裡された気体中の水の含有成分を得ることを特徴
とする水溶液及び気体中の水の含有成分を変えることな
く，水の分子構造を変え，反応速度をコントロールする
方法．
（２Ｂ）＊ｔ水または気体中の水の含有成分を，非水溶
性無機物で処理をを行った後，銀にて処理して，処理水
または処理された気体中の水の含有成分を得ることを特
徴とする水滴液及び気体中の水の含有成分を変えること
なく．水の分子構造を変え，反応速度をコントロールす
る方法。
（２’ｌ）Ｊ≦｛水または気体中の水の含有成分を，非
水溶ｆｆ｛ｊ磯物で処理し，更に，ノ１：水溶性無機物
で処理を行った後，銅にて処理シて、処理水または処理
された気体中の水の含ｆ］成分を１ｉｌることを特徴と
する水溶液及び気体中の水の含（ｆ成分を変えることな
く，水の分子摺逍を変え，反応速度をコントロールする
ノｊ法．
（３０）原水または気体中の水の含有成分を，非水消作
物質で処ＦＩＩＬ更に，非水溶性有機物質にて処理し，
次に非水溶性熊機物で処理シた後、銀にて処理して、処
理水または処理された２（体中の水の含有成分を得るこ
とを特徴とする水溶液及び気体中の水の含有成分を変え
ることなく、水の分子桶造を変え，反込速度をコントロ
ールする方法。（３１）原水または気体中の水の含｛−
ｆ成分を、能酸（ＩＩ１１２化社素）．ＡｔＦ化アルミ
ニウム（アルミナ），炭化硅素、酸化鉄，Ｎｔ化ニッケ
ル，ｉＩ！Ｉ化コバルト，酸化チタン，窒化硅素、窒化
アルミ、窒化６ｔ素、窒化硅素、窒化ホウソ，その他の
セラミヴク，金ｒｉｆ４酸化物，金属硫化物，その他の
非水溶性金属を組合せて処理を行った後，銀にて処理し
て，処理水または処理された気体中の水の含有成分を得
ることを特徴とする水溶液及び気体中の水の含有成分を
変えることなく，水の分Ｙ−ＩｌｌＩ造を変え，反応速
度をコントロールする方法．
（３２）原水または気体中の水の含有成分を非水溶性金
城間化合物にて処理シた後，銀にて処理！シて、処理ｊ
．水または処理された気体中の水の含有成分を得ること
を特徴とする水溶液及び気体中の水の含有成分を変える
ことなく、水の分子１１ｎを変え，反応速度をコントロ
ールする方法．
（３３）Ｊ≦Ｌ水または気体中の水の含有成分を非水溶
性金属にて処理した後．鉗にて処理して，処理水または
処１１１ｊされた気体中の水の含有成分を得ることを特
徴とする水溶液及び気体中の水の含有成分を変えること
なく，水の分子−Ｉｉ構造を変え，反応速度をコントロ
ールする方法．
（３４》原水または気体中の水の含有成分を非水溶性金
Ｋ間化合物にて処理シた後，非水清件金属にて処理し，
さらに鉋にて処理ｊ ｌ，て，処理水または処１１１１
された気体中の水の含有成分を得ることを特徴とする水
溶液及び気体中の水の含有成分を変えることなく，水の
分子構逍を変え，反応速度をコントロールする方法．
［作 Ｊ１１１
本発明は、受水タンクの力；(1) Treat water components in raw water or gas with water-insoluble substances! L, then electromagnetic waves (e.g. a-rays, x-rays,
Ultraviolet light. Visible light. Far infrared rays. Infrared. ultra far infrared, tt
tgt)! KlgL magnetism! ρI ray. Sonic irradiation《Aqueous solutions and gases that are characterized by performing sonic irradiation (sonic wave special), heating and cooling, JIE Noha vibration, and injection-only monotanuki treatment to obtain the water content in treated water or treated gas. A method of controlling the reaction rate by changing the molecular structure of water without changing the water content. (2) The water components in the raw water or silver body are exposed to electromagnetic waves (e.g. A-rays, X-rays, ultraviolet rays, etc.).
Visible light. Far infrared rays. Infrared, ultra-far infrared radio waves) irradiation. Magnetic irradiation. Sonic IK (induction (sonic waves, ultrasonic waves, etc.), heating and cooling.
J] h Noha vibration, injection, etc. r1! The water content in an aqueous solution and gas is obtained by treating with a water-insoluble substance after target ill treatment to obtain a water-containing component in the treated water or the treated gas. A method to control the reaction rate by changing the molecular structure of water without changing the f component. Law. {3) Convert water components in raw water or gas into non-aqueous 4f
? Processed with ifm products! After that, electromagnetic waves (e.g. A-rays,
rays, ultraviolet rays, '+il visual rays. Far infrared rays. Infrared. Ultra-far infrared radio wave) irradiation. Magnetic (H + < 1 irradiation, sonic radiation (sonic waves, ultrasonic waves, etc.), heating/cooling, rat vibration, injection, etc.) is performed to reduce the content of water in the treated water or treated gas. A method for controlling anti-core velocity by changing the molecular structure of water without changing the water content in an aqueous solution or gas. (4) Water content in raw water or gas , electromagnetic waves (e.g. A-rays, X-rays, ultraviolet rays, Iil visual rays, far infrared rays,
Infrared, ultra-far infrared radio waves)! lrJQL magnetic irradiation. After performing the physical treatment 3111 of sonic irradiation (sonic irradiation (sonic specialized), heating and cooling. n-. force, vibration. +161}1'3,
Non-aqueous {T-processing equipment to obtain water molecules in treated water or treated gas without changing the water content in aqueous solutions and gases. A method of changing the structure and controlling the reaction rate. Law. (5) After treating the water components in raw water or gas with a water-insoluble inorganic substance, electromagnetic waves (e.g. A-rays, irradiation. Magnetic irradiation. It is characterized by performing immediate treatment such as sonic irradiation (sonic irradiation (sonic waves, etc.), heating and cooling, 11; Noha vibration, injection, etc.) to obtain the components contained in water in treated water or treated gas. A method of changing the water content 7-structure and controlling the rate of reaction without changing the water content in the aqueous solution or gas.
Waves (e.g. A-rays, X-rays, ultraviolet rays, visible light, far infrared rays, etc.)
Infrared, ultra-far infrared radio waves) light Q-1. Magnetic irradiation. Sonic irradiation (r'i wave irradiation (sonic waves, ultrasonic waves, etc.), heating and cooling. r+
Three forces, vibration, jet Q4 blade physical treatment ill. 3'
Treatment with water-soluble inorganic substances! A method for controlling the reaction rate by changing the molecular dynamics of water without changing the water content in the water ff'l liquid or gas, characterized by obtaining the water content in the gas. (7) After treating the water components in raw water or lice bodies with non-water-soluble organic substances and water-insoluble inorganic substances, electromagnetic waves (e.g. a cotton, x
Rays, ultraviolet rays. Visible light, far infrared contraction. Infrared rays, ultra-far infrared radio waves) irradiation, magnetic irradiation r↑Hateru Q4 (Ba waves, ultrasonic waves?P
). Heating/cooling, FE power, vibration, jet Q4 5 things 11lj
The water content Jl+M is changed without changing the water content in the aqueous solution or gas, characterized by performing a water treatment and obtaining the water content in the treated water or the treated gas,
How to control reaction rate. (8) Convert the components contained in raw water or gas into non-aqueous Mffff
After processing with f equipment, electromagnetic waves (e.g. A-rays,
T-wave) irradiation. Magnetic irradiation* I'j wave irradiation《sound wave, ultra? 1
wave 7'F), heating and cooling. 1'E force, vibration, jet 9 {Exclusive F! ! treatment, and then water-insoluble! ! Processing with one machine! A method for controlling the reaction rate by changing the molecular structure of water without changing the water content in an aqueous solution or gas, characterized by flinging the water content in water or a treated gas. (9) Irradiating the 4-T-containing component of water in raw water or gas with electromagnetic waves (e.g., A-rays, Magnetic irradiation. Sonic light Q4
(Sound wave irradiation (sound wave '77), heating and cooling, pressure, vibration.n
After physical treatment of n(H?y), treatment with a water-insoluble organic substance, and treatment with a non-water-soluble inorganic substance, the treated water or the water in the treated gas is treated. A method of controlling the reaction rate by changing the water molecule hlln without changing the water content in an aqueous solution or gas, which is characterized by obtaining the water content in raw water or gas. (10) Water content in raw water or gas is treated with a water-insoluble inorganic substance, and then treated with a water-insoluble inorganic substance III.
! L, . Next, electromagnetic waves (e.g. A-rays, X-rays, ultraviolet rays, etc.)
■1st glance nine mistakes. Far infrared rays. Infrared, ultra-far infrared radio waves) It
(IIt. Magnetic irradiation. Sonic irradiation (sonic irradiation (sonic wave atmosphere), heating and cooling, harmonica, vibration, jet Q4?J). A method of controlling the reaction rate by changing the molecular dynamics of water without changing the water content in an aqueous solution or gas, characterized by obtaining After treatment with a water-soluble material. Electromagnetic waves (e.g. A-rays, X-rays, etc.)
Ultraviolet light, visible light. Far infrared rays. Infrared. Super i infrared'+I
1ijl)! "l{.Magnetic At the treatment PI! (12) The T component of water in raw water or gas can be controlled by electromagnetic waves (e.g. A-rays, Termination g1. Magnetic irradiation, sonic irradiation,
(After performing physical treatments such as wave-containing irradiation (sonic shade), heating and cooling, pressure, vibration, and jetting, treatment with water-soluble inorganic substances, and then treatment with water-insoluble organic substances. Controlling the reaction rate by changing the molecular structure of water without changing the fi-containing components of water in aqueous solutions and gases, which is characterized by reducing the water content in treated water or treated 1t bodies. Method. {I3} The components of water in raw water or gas are
For example, A-rays, X-rays, and ultraviolet rays. Visible light. Far infrared rays. Infrared, ultra-far infrared radio waves) irradiation. Magnetic irradiation. After performing 8-wave irradiation (sonic irradiation (sonic wave specialized), heating and cooling, pressure, vibration, injection, etc.), treatment is performed using a water-insoluble device, and then water-insoluble metal-to-metal treatment is performed. Treated with a compound! C. Next, treated with a water-insoluble metal to obtain a water-containing component in the treated water or treated gas. A method of controlling the reaction rate by changing the molecular structure of water without changing it. Infrared. Infrared, ultra-far infrared radio waves} Irradiation. Magnetization IQ {. Sonic irradiation 0-t (I1 wave, ultrasonic blade), heating ablation, l [Noha vibration, injection, etc. physical treatment Pl is performed an aqueous solution characterized by performing treatment p1! with a water-insoluble substance and then treating with a water-insoluble intermetallic compound to obtain components contained in water in treated water or treated gas. and a method of controlling the reaction rate by changing the water molecule vtTi without changing the content of water in the gas. (l5) The content of water in raw water or gas is controlled by electromagnetic waves (e.g. A-ray, X-rays, ultraviolet rays. (1f visual rays. Far infrared rays. Infrared rays. Ultra-far infrared STT waves) ij/(Radiation. Magnetic irradiation. Sonic irradiation (sonic waves. Ultrasonic specialized), heating and cooling. n:. Noha vibration. 'nQ4''9f) Object P1! Processing! No I' Water ffi Sex object ff
I was treated with a water-insoluble metal, and the treated water was treated with a water-insoluble metal. (A method of obtaining the water content in the body without changing the water content in an aqueous solution or gas. A method of controlling the reaction rate by changing the molecular structure of water. (I6) Raw water or gas The water contained in the water is irradiated with STT magnetic waves (for example, all, X-rays, ultraviolet rays, IIL visual rays, far-infrared rays, infrared rays, and ultra-far infrared commercial waves).Magnetic radiation.
Sonic irradiation Q4 (i'? wave irradiation (Sonic Specialty), heating and cooling. 7
1 Mika, vibration. 71Q{ etc., and then treated with a water-insoluble intermetallic compound. Next, treat it with a water-insoluble metal! Treated water or treatment! water molecules without changing the water suspension and the water content in the gas? How to control the reaction rate by changing lltB. (17) Contents of water in raw water or gas. ? lt magnetic waves (e.g. a
Ii! , x-rays, ultraviolet rays. Visible light. Far infrared rays. Infrared cotton.
Ultra-far infrared (city wave) irradiation. Magnetic irradiation, sonic irradiation (sound irradiation)
Shonami? ? ), Heating/cooling, N Minoha vibration, Injection only item pl
A water-containing component in an aqueous solution and a gas, characterized in that the water-containing component in the treated illumination water or the treated silver body is obtained by carrying out a special treatment F1 and treating with a water-insoluble intermetallic compound. A method to control the reaction rate by changing the water content j'tMTi without changing . {l8} Water components in raw water or gas are treated with electromagnetic waves (
For example, all, x-rays, ultraviolet rays. Visible light. Far infrared rays. Infrared shrinkage. Ultra far infrared 1'I1 wave) irradiation. Magnetic irradiation. Sonic IV. (Sonic irradiation (sonic wave specialized), heating/cooling, pressure, vibration, jet tR-specific physical treatment, and treatment with water-insoluble metallurgy! L, te, water in treated water or treated gas A method of controlling the reaction rate by changing the content and structure of water without changing the If component of water in an aqueous solution and gas, characterized by obtaining a Yi-containing component of The N-containing component of the water in the water is .6Iv
(6-silicon oxide), aluminum oxide (alumina) and carbonized oxide are combined, and then treated with a $2 hammer, electromagnetic wave J
Treatment with l4 (for example, a Ifd,
1, the molecular structure of water is changed without changing the water content in the aqueous solution and gas, characterized by obtaining the water content in the treated water or the treated Sat body. Method for controlling reaction rate (203711 Water or %L content of water in .6
1 acid (#6F' element), aluminum oxide, iron oxide. Combination treatment of nickel oxide, cobalt iv, and titanium oxide! L. Next, it is treated with forceps and then treated with electromagnetic wave irradiation (e.g. A-rays,
11 Aqueous solution characterized by obtaining the r component of water in the gas and without changing the water content in the gas.NoJ method that absorbs water molecular displacement and controls the reaction rate (21) Water components in raw water or gas are mixed with sand acid (N
After treatment with a combination of aluminum oxide (alumina), aluminum carbide (6t element
Rays, x-rays, ultraviolet rays. Visible light. Far infrared rays. Infrared rays, ultra-far infrared radio waves) to obtain the water content in the treated water or the treated gas without changing the water content in the aqueous solution or gas, Change the molecular structure of water. How to control the reaction rate. {22} The components of water in raw water or gas are treated with a combination of aluminum nitride, silicon nitride, nitride and other ceramics, and then treated with water-insoluble materials and silver. Magnetic waves! ! <{Q4 (e.g. a-rays, x-rays, ultraviolet rays,
+4 visual rays. Far infrared rays. Infrared rays, ultra-far infrared radio waves, ultrasonic waves, etc.) are applied to obtain water-containing components in treated water or treated gas. A method to control the reaction rate by changing water molecules + MD without changing the T component. (23) Combining water components in raw water or gas with gold W4 oxide, gold kAVt compound, and other water-insoluble metals III! L. Next, it is treated with a water-insoluble organic substance and silver, and subjected to magnetic irradiation (e.g., aa, A method of controlling the reaction rate by changing water molecules + Mn without changing the water content in the water or gas, which is characterized by obtaining the water content in water or the treated gas. (24) The water content in raw water or gas is 6P.fa
CM version). #Kateru. Combined treatment with #nickel chloride and then treatment with water-insoluble organic substances! L, after that, Tokogawa at Gin! Then, the treated water or treated gas is subjected to heavy magnetic irradiation (e.g., α-rays, A method of controlling the reaction rate by changing the molecular structure of water without changing the water content in an aqueous solution or gas, characterized by reducing the water content in the solution. (25) Raw water or An aqueous solution and a gas in which the water contained in the gas is subjected to Ceracic treatment and then treated with silver to obtain the water contained in the treated water or the treated gas. A method of controlling the reaction rate by changing the water molecule hill without changing the water content of water. (26) After treating the water content in raw water or gas with a water-insoluble substance, By treating with silver, the water content in the treated water or the treated gas is obtained.The molecular structure of the water is changed without changing the water content in the aqueous solution or gas, and the reaction rate is changed. (27) After treating the water components in raw water or gas with a water-insoluble organic substance, press the button to release the water or water in the treated gas. A method of controlling the reaction rate by changing the molecular structure of water without changing the water content in an aqueous solution or gas, characterized by obtaining the contained components. (2B) *tInclusion of water in water or gas Water droplet liquid and water in gas, characterized in that the component is treated with a water-insoluble inorganic substance and then treated with silver to obtain a component containing water in treated water or treated gas. A method of controlling the reaction rate by changing the molecular structure of water without changing the contained components. , Furthermore, No. 1: An aqueous solution and a gas in which the treated water or the treated gas is treated with copper and then treated with copper to reduce the water content in the treated water or the treated gas to 1 il. (30) The water content in raw water or gas is treated with a non-water consuming substance. FIIL is further treated with a water-insoluble organic substance,
Next, it is treated with a water-insoluble material and then treated with silver to obtain the treated water or the treated water (aqueous solution and gaseous water in the body). A method of changing the molecular structure of water and controlling the retraction rate without changing the contained components. (31) Water content in raw water or gas {-
The f component was converted to Nolic acid (II112 Kasha element). AtF aluminum (alumina), silicon carbide, iron oxide, nickel Nt oxide, iI! After treatment with a combination of cobalt I ride, titanium oxide, silicon nitride, aluminum nitride, 6T nitride, silicon nitride, borium nitride, other ceramics, gold rif4 oxide, metal sulfide, and other water-insoluble metals. , processing with silver to obtain the water content in the treated water or the treated gas, without changing the water content in the aqueous solution and gas. How to change and control the reaction rate. (32) After treating the water content in raw water or gas with a water-insoluble Kinjo compound, it is then treated with silver! Please process
．． A method for controlling the reaction rate by changing the water molecule 11n without changing the water content in an aqueous solution or gas, characterized by obtaining the water content in water or a treated gas. (33) J≦L After treating the water-containing components in water or gas with a water-insoluble metal. Changing the molecule-I structure of water without changing the water content in the aqueous solution and gas by processing with a forceps to obtain the water content in the treated water or the treated gas. , a method to control the reaction rate. (34) After treating the water content in raw water or gas with a water-insoluble intermetallic compound, the water is treated with a water-insoluble metal,
Furthermore, process the treated water with a plane 1111
A method for controlling the reaction rate by changing the molecular structure of water without changing the water content in an aqueous solution or gas. [Creation J111 The present invention is based on the power of the water tank;
【水または気体の中の水を
第・及び第二の水質調禦装置にて使川１１的に合った構
造水となる条件にマッチさせ，右機不純物餘去袈ｉＦ（
及び無機不純物除夫装１ｎにより原水に含まれるイｉ機
，無機の不純物を除太し，第一・及び第二の白動水質分
析装１ｎにより原水と純水との水ｎを白動的に分析し，
その粘果により定ｎｔボンブより調幣液を供給して水の
調整を行い，これに物Ｊｌｌｌ処理手段として電磁波発
生装置専により発生した電磁波を電磁波コントロール袈
置にて制御して水に照射して所定の摺遣水を得るように
したものである．
［実 施 例］
第１図は、本発明方法に使用する構造木製造装１ｎの配
ｉｎ図であって，１は未処理水の受水タンク、２はｎ機
不純物除Ｊ＜ ”Ａ ｉｒ／、３は無機不純物除去装置
，４は純水１ｉ’槽、５は電磁波照射袈置、６はｔＭ造
水１ｔｉ’槽，７は受水タンク１の第・水質調整装置，
８は純水１佇槽４の第二水質調整装Ｆｊ、９は電磁波発
ｉＵ装ｉｉ．ｌｏは徂磁波コントロール装Ｆｊ、１ｌは
受水タンク１の第一の〔１動水質分析袈ｉＦｉｌ２は純
水貯慴４の第二自動水質分析袈１ｎ、１１》１は受水タ
ンク冒の第−調整液定晴ボンブ、’Ｉ’ Ｉ） ２は純
水貯槽４の第二調整液定晴ボンブ，目ミは谷ボンブ及び
電磁波！（（ｔ射装置の重源．■），は受水タンクｌへ
の送水ボンブ，１》ヨはイｆ機不純物除去装置への送水
ボンブ．Ｐ．は第一水質調整装１ｎ７への送水ボンブｓ
ｌ”４は第二水質調整装置８への送水ボンブ、Ｐ．は１
ｕ磁波照ｑ｛装ｉ＋Ｙ ５への送水ボンブ，］）．は構
造水供給ボンブ、Ｖ．，Ｖ．．■．は受水タンクｌの配
管路のバルブ，ｖ４．Ｖ．，Ｖｓはイｆ機不純物除夫装
置．，２，無機不純物除表装ｉ７ｆ ３、純水！ｉ’槽
４の配管路のバルブ、Ｖ，Ｖ，％は純水ｆｆｉ’槽４と
水質調整袈Ｈｒ（ ｓとの配冑路のバルブ，■．は純水
ｌｒｉ槽４と電磁波照射装１ｎ５の配冑路の水：１量コ
ントロールバルブ，■，。は重ｆｆｌ波照射袈；ｎ５と
構造水貯槽６の配青路のバルブ，■．は摺遣水１ｒ？
Ｍ ６の叶水配管路に設けたバルブ、■．は受水タンク
１の給水配管路に設けたバルブ．ｖ１５は第・水質分析
袈；ｎ１！と受水タンクｌの配管路に設けたバルブ、ｖ
ｌｍは第二水質分析装Ｆｊ ＋ ２と純水ｆｆｉ’ Ｗ
ｉ ４の配青路に設けたバルブである．Ｉａは受水夕冫
クｌの給水配青路の先端部に設けた不純物濾過器である
．
イｆ機不純物除夫装置２には濾過機，逆浸透膜，イオン
交換樹脂専が組込まれており，水中のイｉ機本純物を除
去する機能を行う．
無機不純物除去’Ａ Ｆｌ． ３には濾過機，逆浸透膜
、イオン交換樹脂専が組込まれており無機不純物を除上
する機能を行う．
１ｕ磁波照射’Ａ ｉｆｆ ５には純水貯槽４から送ら
れる純水を導通するコイル状のｉ。（ｔ磁波吸収管５ａ
が設けられ、電磁波照射装置５の内側聖に設けられた電
磁波発生装置５ｂより発生した電磁波を水質コントロー
ルバルブＶ，にて制８１５れた調整水に照Ｑ４ Ｌて構
造水に変換する．第一・水質調整装１ｒ１７及び第二水
質調繁装ｉｒｊ ８は、使用目的に合ったＩｌｌｌ造水
になる条件を化学反応試験により決定し、その敗植に合
致１゛るように１１１１．ＮＩ化還元重イ−１，電気伝
導度及びイ■機物濃度を調整する．
受水タンク１の第・１”）動水質分析装ｉｒｌ ｌ Ｉ
は水ｒｒｔＪ＃整’Ａ Ｆｊ ７にて水質を調整された
受水タンクの水《原水）を白動的に分析し，純水貯槽４
の自動水質分析製置Ｉ２は，第二水質調整装ｉＦ（ ８
にて水質を調整された純水１ｊ？槽の純水を自動的に分
析する．
１’ ｆ） ｌ及びＴＰ２は受水タンク１の純水及び純
水貯槽４の純水の水質を自動的に分析し，その結果によ
り調整液を受水タンク富及び純水貯槽４に供給する第一
及び第二調整液定燻ボンブである．■｝は電磁波允生装
１ｒ１９の電源で・ある．原水または気体中の水の成分
を変えずに水の摺逍を変え反応速度な：】シトロールす
る方法としてｊ；１記第１図の装１？Ｉを用いて．次の
ｙＪ造ｈ法により操作する．
（＋）＃Ｉ水または気体中の水を非水溶性物質にて処Ｉ
ＩＩ！ Ｌ／ ．次に物理処理（１゛ｕ磁波照射．磁気
照射．音波ＪＩＧ Ｑ｛ ．加熱冷却． ７−ＩＥノハ
振動１１７１射専）を行い摺逍水となし．構造水１『？
槽６に貯溜する。
（２）１κ１水または気体中の水を物理処理（前記（１
）と同じ処理！．以ド同じ）を行い，次に非水溶性物質
にて処理シた摺遣水を構造水貯摺６に１『？湘する．る
．
｛３）原水ま・たは気体中の水を非水溶性有機物にて処
理した後，物理処理を行い構造水を得，これをＭ逍水貯
摺６に１『Ｐ溜する．
（４｝原水または気体中の水を物理処理した後，非水溶
性有機物にて処理し、得た構造水を構造水ｆｆｉ摺６に
ｆｆ？溜する．
（Ｓ） ＩＱ水または気体中の水を非水溶性熊機物にて
処理した後，物理処ｉｌｌを行い、得た構造水を構造水
貯摺６に貯溜する．
（６）原水または気体中の水を物理処理した後、非水溶
性無機物にて処ｊ’ｌ！ Ｌ， ．得たＩ１ｌＩ造水な
構造水１佇槽６にｆｆ？溜する．
（７）原水または気体中の水を非水溶性ｆ１機物にて処
理シた後．非水溶性無機物にて処裡し，次に物Ｆ１１処
理ｌを行って，得た摺逍水を構造水貯ＪｆＩ６に１佇溜
する。
（Ｆ３）原水または気体中の水を非水溶性４ｆ機物にて
処理！ ｔ，た後、物理処理を行い、次に非水溶性無機
物にて処理シ、得た摺遣水を構造水ｆｆｉ’摺６に貯溜
する．
（９）原水または気体中の水を物理処理した後，非水溶
性有機物にて処理し、次に非水溶性熊機物にて処理し，
得た構造水をｈ’ｉｌ造水ｌ庁槽６に貯溜する．
（１０）原水または気体中の水を非水溶性無機物にて処
卯し，次に非水溶性有機物にて処理した後，物狸処理な
脊い，得られたｔｉｌｌ遣水を構造水１庁槽６に胛溜す
る．
（ＩＩ）原水または気体中の水を非水溶性無機物にて処
理！ Ｌた後．物Ｊｌｌｌ処Ｊｌｐを行い、次に非水溶
性有機物にて処理して、得られた慴造水をｈ’ｌｌ逍水
Ｉｔ？槽６にＩｎ溜する．
（１２）原水または気体中の水を物理処理シた後、非水
溶性無機物にて処理！ Ｌ ．次に非水溶ヂ１；有機物
にて処理！ Ｌ， ．得られた構逍水を構造水ｆｆｉ’
槽６にＩｔｉ’溜する．する．
（１３）原水または気体中の水を物理処理した後，非水
溶性有機物にて処理を行い、非水溶性金属間化合物にて
処理シ、次に非水溶性金属にて処理し，得られた構造水
を構造水１ｒｉ″槽６にＩｒｉ’溜する。（！４》原水
または２体中の水を物理処理した後、Ｊト水溶作物質に
て処理して非水泗性金Ｋ間化合物にて処理し，得られた
構造水な摺逍水１ｒ７ ４ｆｔ Ｂにｔｒｉ’ Ｆｆｒ
ｆする．
（ｌ５１原水または気体中の水を物理処理した後、非水
溶性物質にて処理してノ１：水溶性金雇にて処理非水溶
性（ｆ機物にて処理！シ、得られたｖＩ逍水を摺逍水１
庁摺６に貯溜する．
（１６）原水または気体中の水を物理処理した後，次に
非水溶性金属間化合物にて処理し，次に非水溶性金属に
て処理し，得られた摺逍水を構造水貯槽６にＩｔｉ’溜
する．
（ｌ７）原水または気体中の水を物理処理した後．次に
非水溶性金風間化合物にて処理し，得られた構造水を構
造水貯Ｍ６にＩｔ？溜する．
（１８｝原水または気体中の水を物理処理した後，次に
非水溶性金属にて処理！ Ｌ ．得られた摺遣水を構造
水１ｒ？拾〇にＩｎ’溜する．
（＋ｑ）Ｉ＋；ｔ水マタハ気体中ノ水ヲ６ｌｆ’＊（′
Ｎｔ化硅素），酸化アルミニウム（アルミナ），及び炭
化硅素を組合せ処理シた後，銀にて処理して、次に１ｉ
ｔ磁波照射を行い，得られた摺逍水を構造水貯槽６にＩ
ｒ？溜する．
｛２０｝原水または気体中の水を能＃（酸化硅素）、酸
化アルミニウム（アルミナ），酸化鉄、酸化ニッケル，
酸化コバルト及び酸化チタンを組合せ処理シた後，銀に
て処理シて，次に電磁波照射を行い，得られたＩｌｌＩ
造水を構造水１ｒｉ”槽６に貯溜する。（２１）原水ま
たは気体中の水の含有成分を、硅酸ｌ化６Ｆ．素）、酸
化アルくニウム（アルミナ）及●●
び炭化６ｔ素を組合せ処理シた後，非水溶性イ■機物に
て処Ｐ＋Ｈ Ｌ． ．次に銀にて処理！ ｔ．， ．次
に電磁波照射を行い、得られた摺遣水を構造水貯槽６に
貯溜する．る．
（２２）Ｊ≦１水またはｌｔ体中の水の含有成分を，硅
酸（酸化硅素）、窄化アルジニウム，窒化硅素、窒化硅
素，窄化ホー１ハその他のセラミックを組合せ処理した
後，非水？Ｓ件有機物にて処理！Ｌ，［ｌにて処理し，
得られた構造水を構造水１ｊ？槽６にＩｔ？溜する。（
ｚ３）原水または気体中の水を金ＪｉＡ酸化物，金属硫
化物，その他の不水溶付金城を組合せ処理した後，Ｊ１
水溶性ｊｆ機にて処理！ Ｌ ．次に銀にて処Ｆ＋；
Ｌ，た後，１牡磁波照射を行い，得られた摺逍水を構造
水ＩｒｉＩ槽６に貯溜する．
（２４）原水または気体中の水の含有成分を硅Ｎ！（酸
化硅素）、酸化鉄，ｌｖ化ニッケルを組合せ処理して，
次に非水涜性Ｉｆａ物にて処理シた後．銀にて処理して
，次に電磁波照射《例えばａ線，χ線，紫外線，ｉｑ視
光線，遠赤外線，赤外線照射（遠赤外叶波専）を行って
処理水または処理された気体中の水の含有成分を得，得
られた構造水を構造水貯槽６に＋ｒ；’溜する．
（２５）原水または気体中の水の含有成分をセラミック
処Ｐｌを行った後、釦にて処理して、処理水または処理
ｌされた気体中の水の含有成分を得．得られた桶逍水を
構造水１ｒｉ’ ４ｆｌ６ ニＩｒｉ’ ｆｆｆｆ ｔ
６ −（２６）原水または気体中の水の含有成分を非
水溶性物質で処理を行った後、銀にて処理して，処裡水
または処理された気体中の水の含有成分を得，得られた
構逍水を構道水！ｒ？ Ｍｌ ｆｓに叶溜する。（２７
）原水または気体中の水の含有成分を非水溶性有機物で
処理！を行った後、銀にて処理！Ｌ．て，得られた構造
水を構造水１ｒ；“摺０にＩｔｉ’ ｆｆｆｆする．Ｃ
２８）原水または気体中の水の含４−Ｔ成分を非水溶性
無機物で処理を行った後、銀にて処理して，得られた構
造水を構造水＋ｒｔ’槽６に貯溜する。（２９》原水ま
たは気体中の水の含有成分を非水溶性４ｉ機物で処理シ
更に，非水溶性無機物で処理を行った後、銀にて処理し
て，得られた綱遣水をＩＩ構造水ｔｒｉ“Ｗ９６に貯溜
する．水ｔｒｉ“Ｗ９６に貯溜する．
（３０）原水または％Ｌ体中の水の含有成分を非水溶竹
物質で処ＩＩＩ！ Ｌ更に，ノ『水溶性Ｋｉ機物質にて
処Ｊ’１し，次に非水溶性無機物で処理した後，銀にて
処理シて，得られた摺遣水を構造水１ｊ？槽６にｌｒｉ
’溜する．
＋３＋）１６（水または気体中の水の含伯゜成分を６ｔ
ＮＩ（酸化６１）．ｌ’ｌ２化アルミニウム（アルミナ
），炭化硅素，＃化ニッケル．Ｖ化コバルト．ｌ’ｌｌ
化チタン，窄化アルミ，＊化６Ｌ素、窒化硅素、窒化ホ
ーソ，その他のセラミック、金雇酸化物、金属硫化物、
その他の非水溶外金城を組合せて処理を行った後，鋼に
て処理して，得られた綱造水を構逍水１ｒｉ’槽６に財
溜する．
１３２》原水または２（体中の水の含４ｉ成分を非水溶
住金嵐間化合物にて処理シた後，銀にて処ＩＩｌ！シて
，処理水または処理された気体中の水の含有成分を得，
得られた構造水を桶逍水財．Ｗ９６に貯溜する。（３３
）原水または気体中の水の含有成分を非水溶性金城にて
処理した後、銀にて処理して，処理水または処理された
気体中の水の含有成分を得、得られた＃Ｒ逍水を構逍水
貯槽６に貯溜する．
｛３０原水または気体中の水の含有成分を非水溶性金！
ｌバＩ化合物にて処理シた後，非水溶性金属にて処理し
，さらに鉗にて処理シて．処理水または処理された’ｘ
Ｌ体中の水の含有成分を１！ｉ．ｆ！ｌられた構造水を
摺逍水ｆｆ？槽６に１『？溜する．
拭験成ｈ１は，次のとおりである．
′Ａ励洞（１９１及び（２０）による成ｈ１表（但し１
ｕ磁波処理をしなかった処Ｐ『水）を小１゜・
進二Ｌ１
検
杏
本吉
東
・Ｖ．成１年１３１２（ｉｌｌ依頼の検体につき，以ド
の通りｔｌＪ：’；シまず．′ｌ４成ｌ年菖ハ２ｆｉｌ
−１依頼の検体につき，以ドの通り報告します．Ｉ｛・
： １・・ １ １ ゜； な１勺戊１ ＜ｌ ｌ
｝Ｊ ２ ６１１〜ＩＩＩ３０１１実塊例（３ｌ）によ
る成植表を示す．
第一旦一表
甲成１年ＩＪＩＩＩＩＮ依頼の検体につき，以ドの通り
報告します．ｌｈ『−・・ １ ； Ｆ
検 ゼ壬 糸／ｉ 東 ↑嘗５゜Ｆ
計ｒｉｔ証明＝ｌ業登録第１３号淳生大臣指定第２２チ
冫ｔＦｔｔ駄Ｌ伊那郡桑刑師会
長野鳴田１那市大？イ』リＪＩＳ部９ ＴＥＬ （０２
６５） ７２−５８５１１”ＶｈＱ ｌ年ＩＪ’ｌ２６
１１依頼の検体につき，以ドの通り報告します．横 合
［１ 平成１年１ｊｌ２Ｂｒｌ〜２ＪＪＩｌｌ実施
例《２０》によるｌｉｔ晴表を爪す．火施例《３１》に
て処理した後電磁波を照射した煽合の処理水の横合によ
る成鳥１表を示す．
■効 ！Ｉ！］
本発明は＊ Ｉｆｆ ｊＬ！ Ｌ／た如１１１１Ｆ戊し
たことにより，未処理水（原水）受水タンク重において
水質調察袈ｉＦｊ ７及び１゛１動水質分析袈置１１に
より原水を使川１１的に合った構造水になる条件に合致
させることができると八に． ４ｆ機不純物及び無機不
純物はｔｓ機不純物除夫装７１ ２と無機不純物除夫袈
１ｄ３とにより除太されて純水となし，純水貯摺４に１
庁藏することができる．しかも純水Ｊ佇４ｆｔ４に貯蔵
された水に１１！磁波照射袈１ｎ５にて電磁波を照財し
て所期の１１的の構造水を得ることができ．これを連続
１′１動的に行うことができることにより，本発明によ
り９１１２逍された特走の分子配列した水並びに特定の
分子妃列憫造をイ］すろ水を含む水溶液及び介水物質は
，促進− Ｐ＞ ＋Ｌ． ．抑制が１゜１山に食換でき
るために応用範囲が非常に広い．例えば細胞分裂を促進
し． ＋ＩＥ常細胞の増加、すなわちーＬ物成艮を促進
するので飼料．２ａ３ｔｈ串をｌｒＩｌ ｌできるし，
バイオデクノロジーに於ける培養，促進を計ることがで
き、漢方生桑、医薬品の効果の促進と一般化学反応の促
進へ応用することができ，さらに化学反応平衡への利川
、化学反応抑制への利川等、その利川範囲は大きい．[Water in water or gas is matched with the conditions to make water with a structure suitable for Shikawa 11 using the first and second water quality control devices, and impurities are removed from the right machine (
Inorganic and inorganic impurities contained in the raw water are removed using the inorganic impurity removal device 1n, and the raw water and pure water are separated using the first and second white water quality analysis devices 1n. analyzed,
The viscous liquid is supplied from a constant-ton bomb to adjust the water, and as a material treatment means, electromagnetic waves generated by an electromagnetic wave generator are controlled by an electromagnetic wave control station and irradiated onto the water. It is designed to obtain a specified amount of water. [Example] Fig. 1 is a layout diagram of the structural wood manufacturing equipment 1n used in the method of the present invention, where 1 is a receiving tank for untreated water, and 2 is a water receiving tank for untreated water. /, 3 is an inorganic impurity removal device, 4 is a pure water 1i' tank, 5 is an electromagnetic wave irradiation rack, 6 is a tM water production 1ti' tank, 7 is a water quality adjustment device of the water receiving tank 1,
8 is a second water quality adjustment device Fj of the pure water tank 4; 9 is an electromagnetic wave emitting iU device ii. lo is the magnetic wave control device Fj, 1l is the first automatic water quality analysis port of the water receiving tank 1 [1 dynamic water quality analysis port iFil2 is the second automatic water quality analysis port 1n, 11] of the pure water storage 4 - Adjustment liquid constant clearing bomb, 'I' I) 2 is the second adjusting liquid constant clearing bomb in the pure water storage tank 4, the eye is the valley bomb and electromagnetic waves! ((Heavy source of the t-irradiation device.■) is the water bomb to the water receiving tank 1, 1》Y is the water bomb to the impurity removal device of the IF machine.P is the water bomb to the 1st water quality adjustment device 1n7 s
l"4 is a water bomb for the second water quality adjustment device 8, P. is 1
u Magnetic wave radiation {equipment i + water bomb to Y 5, ]). is a structural water supply bomb, V. ,V. ．． ■． is the valve of the piping line of the water receiving tank l, v4. V. , Vs is an impurity removal device. , 2, Inorganic impurity removal surface i7f 3, Pure water! The valves in the piping route of i' tank 4, V, V, and % are the valves in the distribution route between pure water ffi' tank 4 and water quality adjustment shaft Hr (s, Water distribution route: 1 quantity control valve, ■,. Is heavy ffl wave irradiation; Valve for distribution route of N5 and structural water storage tank 6, ■. Is 1r water supply?
A valve installed in the M6 Kanosui pipeline, ■. is a valve installed in the water supply pipe line of water receiving tank 1. v15 is the first water quality analysis test; n1! and the valve installed in the piping line of the water receiving tank l, v
lm is the second water quality analyzer Fj + 2 and pure water ffi' W
This is a valve installed on the blue road of i4. Ia is an impurity filter installed at the tip of the water distribution channel of the water receiving station Ia. The equipment for removing impurities from water 2 is equipped with a filter, a reverse osmosis membrane, and an ion exchange resin, and has the function of removing impurities from water. Inorganic impurity removal 'A Fl. Part 3 is equipped with a filter, reverse osmosis membrane, and ion exchange resin, which functions to remove inorganic impurities. The 1u magnetic wave irradiation 'A iff 5 is a coil-shaped i that conducts pure water sent from the pure water storage tank 4. (t Magnetic wave absorption tube 5a
is provided, and the electromagnetic waves generated by the electromagnetic wave generator 5b provided inside the electromagnetic wave irradiation device 5 are controlled by the water quality control valve V and converted into structured water. The first water quality control device 1r17 and the second water quality control device IRJ 8 are designed to meet the needs of the plant by determining the conditions for producing water that meet the purpose of use through chemical reaction tests. Adjust the NI reduction weight I-1, electrical conductivity, and concentration of organic substances. Water receiving tank 1's 1st) water dynamic quality analyzer irl l I
Water rrtJ#Adjustment'A Fj 7 dynamically analyzes the water (raw water) in the water receiving tank whose water quality has been adjusted, and prepares the pure water storage tank 4.
The automatic water quality analysis equipment I2 is equipped with a second water quality adjustment equipment iF (8
Pure water 1j? Automatically analyzes pure water in the tank. 1' f) l and TP2 automatically analyze the water quality of the pure water in the water receiving tank 1 and the pure water in the pure water storage tank 4, and supply the adjustment liquid to the water receiving tank and the pure water storage tank 4 based on the results. The first and second adjusted liquid constant smoke bombs. ■} is the power source for electromagnetic wave generator 1r19. The reaction rate is changed by changing the water sliding behavior without changing the water components in the raw water or gas. Using I. Operate using the following yJ construction h method. (+) #I Treating water or water in gas with a water-insoluble substance I
II! L/. Next, physical treatment (1゛magnetic wave irradiation, magnetic irradiation, sonic wave JIG Q{ .heating and cooling. Structured water 1 ``?
It is stored in tank 6. (2) Physical treatment of 1κ1 water or water in gas ((1)
) same process! ．． The same applies hereafter), and then the water treated with a water-insoluble substance is poured into the structural water storage tank 6. To rest. Ru. {3) After treating water in raw water or gas with a water-insoluble organic substance, physical treatment is performed to obtain structured water, which is stored in the M water reservoir 6 for 1'P. (4) After physically treating the raw water or water in gas, treat it with a water-insoluble organic substance, and store the obtained structured water in structured water ffi 6. (S) IQ water or water in gas (6) After physically treating the raw water or water in the gas with a water-insoluble material, physical treatment is performed and the obtained structured water is stored in the structured water storage 6. (7) Treat the raw water or water in the gas with a water-insoluble inorganic substance. After that, it is treated with a water-insoluble inorganic substance, and then subjected to the treatment F11, and the obtained surizo water is stored in a structured water storage JfI6. (F3) The water in the raw water or gas is dehydrated. Treatment with a water-soluble 4F organic material! After t, physical treatment is performed, and then treatment is performed with a water-insoluble inorganic material. The obtained rubbing water is stored in the structured water ffi' 6. (9) Raw water or After physically treating the water in the gas, it is treated with a water-insoluble organic substance, then treated with a water-insoluble organic substance,
The obtained structured water is stored in the h'il desalination tank 6. (10) After treating raw water or water in gas with a water-insoluble inorganic substance, and then treating it with a water-insoluble organic substance, the resulting till water is sent to the Structured Water Tank 1. It accumulates to 6. (II) Treat raw water or water in gas with water-insoluble inorganic substances! After L. After treatment with a water-insoluble organic substance, the resulting water is treated with a water-insoluble organic substance. In is stored in tank 6. (12) After physically treating raw water or water in gas, treat it with water-insoluble inorganic substances! L. Next, non-aqueous 1: Treat with organic matter! L, . The obtained structural water is called structural water ffi'
Iti' is stored in tank 6. do. (13) After physical treatment of raw water or water in gas, treatment with a water-insoluble organic substance, treatment with a water-insoluble intermetallic compound, and then treatment with a water-insoluble metal. The structured water is stored in the structured water 1ri'' tank 6. (!4》After physically treating the raw water or the water in the two bodies, it is treated with a water-soluble substance to form a non-water-soluble gold-K compound. The resulting structured water 1r7 4ft B was treated with tri'Ffr.
f. (l51 After physical treatment of raw water or water in gas, it is treated with a water-insoluble substance.No. 1: Treatment with a water-soluble metallurgy. Shosui wo Suri Shosui 1
It is stored in Chosuri 6. (16) After physically treating the raw water or water in the gas, it is then treated with a water-insoluble intermetallic compound, and then with a water-insoluble metal, and the obtained surimi water is poured into the structural water storage tank 6. Iti' accumulates. (l7) After physical treatment of raw water or water in gas. Next, it is treated with a water-insoluble gold compound, and the resulting structured water is stored in structured water storage M6. Accumulate. (18} After physically treating the raw water or water in the gas, it is then treated with a water-insoluble metal! L. The obtained rubbing water is collected in the structured water 1r? 〇. (+q) I+; 6lf'*('
After a combination treatment of Nt silicon oxide), aluminum oxide (alumina), and silicon carbide, treatment with silver and then 1i
t Magnetic wave irradiation is performed, and the obtained suriho water is transferred to the structural water storage tank 6.
r? Accumulate. {20} Water in raw water or gas can be treated with # (silicon oxide), aluminum oxide (alumina), iron oxide, nickel oxide,
After treatment with a combination of cobalt oxide and titanium oxide, treatment with silver, and then electromagnetic wave irradiation, the obtained IllI
The produced water is stored in the structured water tank 6. (21) The water components in the raw water or gas are converted into silicic acid (6F. After the combined treatment, the treated water is treated with water-insoluble A material P+H L.. Then it is treated with silver! t., .Next, electromagnetic wave irradiation is performed, and the obtained scraped water is transferred to the structural water storage tank 6. (22) Combining J≦1 water or water components in the body with silicic acid (silicon oxide), densified aldinium, silicon nitride, silicon nitride, densified phosphor 1c, and other ceramics. After treatment, treat with non-aqueous organic substances!L, [l,
The obtained structured water is called structured water 1j? Is it in tank 6? Accumulate. (
z3) After treating raw water or water in gas with a combination of gold JiA oxide, metal sulfide, and other non-aqueous welding metals, J1
Processed with water-soluble JF machine! L. Next, silver is F+;
After L, irradiation with magnetic waves is performed once, and the obtained suriho water is stored in the structured water IriI tank 6. (24) Calculate the water content in raw water or gas! (silicon oxide), iron oxide, and nickel lvide.
After treatment with a non-hydrophobic Ifa product. After treatment with silver, electromagnetic wave irradiation (e.g. A-rays, χ-rays, ultraviolet rays, IQ visual rays, far-infrared rays, infrared rays (far-infrared Kanoha Sen)) is performed to remove the treated water or treated gas. The water-containing components are obtained, and the obtained structured water is stored in the structured water storage tank 6. (25) After performing ceramic treatment on the water contained in the raw water or gas, the water is treated with a button to obtain the water contained in the treated water or the treated gas. The obtained water is made into structured water 1ri' 4fl6 2Iri' fffft
6-(26) After treating the water-containing components in the raw water or gas with a water-insoluble substance, treating with silver to obtain the water-containing components in the treated water or the treated gas, The obtained construction water is used as construction water! r? Ml fs. (27
) Treat water components in raw water or gas with water-insoluble organic substances! After that, process it with silver! L. Then, apply the obtained structured water to structured water 1r;
28) After treating the 4-T-containing component of water in raw water or gas with a water-insoluble inorganic substance, it is treated with silver, and the resulting structured water is stored in the structured water+rt' tank 6. (29) The water components in raw water or gas are treated with a water-insoluble 4i organic substance, and then treated with a water-insoluble inorganic substance, and then treated with silver. Water is stored in the water tri"W96. Water is stored in the water tri"W96. Then, after treatment with a water-insoluble inorganic substance, treatment with silver was carried out, and the resulting rubbing water was poured into structured water tank 6.
'Accumulate. +3+) 16 (6t of water content in water or gas)
NI (oxidation 61). l'l Aluminum dioxide (alumina), silicon carbide, nickel #2. Cobalt Vide. l'll
Titanium oxide, aluminum oxide, *6L oxide, silicon nitride, nitride, other ceramics, metal oxides, metal sulfides,
After being treated with other non-water-soluble outer metals, it is treated with steel, and the resulting rope water is stored in the structural water 1ri' tank 6. 132》Raw water or 2 (after treating the 4i components of the water in the body with a non-aqueous soluble aluminum alloy compound, and then treating with silver, the components contained in the water in the treated water or treated gas) obtained,
The obtained structured water is poured into a bucket. Store in W96. (33
) The water components in raw water or gas are treated with water-insoluble Kinjo, and then treated with silver to obtain the water components in the treated water or treated gas. Water is stored in the structure water storage tank 6. {30 Components contained in water in raw water or gas are water-insoluble gold!
After being treated with a compound, it was treated with a water-insoluble metal, and then treated with a forceps. treated water or treated 'x
The water content in the L body is 1! i. f! Is the structural water removed ff? 1 in tank 6? Accumulate. The wipe test result h1 is as follows. 'A growth h1 table (191 and (20)) (however 1
u Place P ``Water'' that was not subjected to magnetic wave treatment 1゜ Shinji L1 Kenkyomoto Yoshihigashi V. 1312, 1st year of adulthood
-1 We will report the requested specimen as follows. I{・
: 1... 1 1 ゜; な１勺戊１＜l l
} Shows the planting table for J 2 611-III 3011 fruit cluster examples (3 liters). I would like to report the samples requested by IJIIIIN in the first year of Kosei 1st year as follows. lh 『-... １ ； F Prosecutor Zemitsu Ito / i East ↑嘗5゜F Total proof = l Business Registration No. 13 Designated by Minister Atsuo No. 22 Chit Ftt L Ina District Kuwa Prison Chairman Nonaruta 1 Naichi University? I'ri JIS Department 9 TEL (02
65) 72-58511”VhQ IJ'l26
We would like to report on the samples requested in 11 as follows. Yokoai [1 1999 1jl2Brl~2JJIll Illustrate the lit table according to Example 《20》. A table of 1 adult bird obtained by horizontally combining the treated water treated in Example 31 and then irradiated with electromagnetic waves is shown. ■Effective! I! ] The present invention is * If jL! Due to the untreated water (raw water) receiving tank weight, the untreated water (raw water) is converted into structured water that matches the water quality analysis tank 7 and 1. 8. If the condition can be met. 4F organic impurities and inorganic impurities are removed by the TS organic impurity remover 71 2 and the inorganic impurity remover 1d3 and made into pure water.
It can be used as a government office. Moreover, the water stored in 4ft4 of pure water is 11! The desired structure water of 11 points can be obtained by using electromagnetic waves with the magnetic wave irradiation tube 1n5. By being able to perform this continuously and dynamically, the present invention can produce 9112 molecularly arranged water and specific molecular arrays. , promotion −P> +L. ．． It has a very wide range of applications because the suppression can be reduced to 1°/1 peak. For example, it promotes cell division. It is a feed because it promotes the increase in +IE permanent cells, i.e. -L production. I can make 2a3th skewer,
It can be used to cultivate and promote biotechnology, and can be applied to promote the effects of Chinese herbal medicine, medicines, and general chemical reactions, as well as to promote chemical reaction equilibrium and chemical reaction suppression. etc., the Icheon area is large.
第１図は本発明方法に使用する袈１ｎのＮ ｉｌｌと系
統を表わした図．第２図は１“１１磁波照ｌ｝ｌｒｉｌ
と反応生成物１．量とをグラフで表わした図である。
（〜受水タンク
２〜ｆ〕機不純物除大装置
３〜無機不純物除去装置
４〜純水Ｉｔ？槽
５〜電磁波照射袈Ｆ（
６〜＋ＩｌｌｔＴｉ水貯槽
７〜受水タンクの水質調整袈１ａ
８〜純水１ｒ？摺の水質調幣装置
９〜電磁波発生装１ｎ
１０〜７ｕ磁波コントロール装；ｒｌ
１１〜受水タンクの白動水質分析装『Ｃ１２〜純水貯槽
の１１動水質分析装置
Ｅ−電磁波発生装１ｎの電源
手 ｔｏ”ｄ −？−市 ｔ．Ｉｈ 犯Ｆ１．串件
の表示
％Ｆ成１年特許願第１１３６５９号
２．発明の名称
水溶液及び気体中の水の含有成分を変えることなく，水
の分Ｊ’ ＋Ｍ造を変え、反応速度をコントロールする
方法
３．補正をする青
’ｌ件との関係 特許出願人
大 槻 れ 之
人 槻 ト゜｛ 久
４．代Ｆ１！人〒１０５
１．添付図面第１図及び第２図を別紙の通り補正る．
２．先の出願の出願番号平成１年特許願第４６６４６号
を記載した願．リを別紙の通り補ｉＥする．５．補屯命
令の［１付
１′一成１年８ＪＪ２２ｒｌ（発送［１〉６．補正の対
象FIG. 1 is a diagram showing the Nill and the system of the kea 1n used in the method of the present invention. Figure 2 is 1"11 magnetic wave light l}lril
and reaction product 1. FIG. (~Water tank 2~F) Organic impurity removal device 3~Inorganic impurity removal device 4~Pure water It? tank 5~Electromagnetic wave irradiation shaft F (6~+IlltTi water storage tank 7~Water quality adjustment shaft of water receiving tank 1a 8 ~Pure water 1r?Water quality control device 9~Electromagnetic wave generation device 1n 10~7u Magnetic wave control device;rl 11~Water receiving tank white dynamic water quality analyzer ``C12~Pure water storage tank 11 dynamic water quality analyzer E- Power source for electromagnetic wave generator 1n to"d -?- City t.Ih Criminal F1. Indication of skewer % F Patent Application No. 113659 1999 2. Name of the invention Changing the content of water in aqueous solutions and gases Method of controlling the reaction rate by changing the J'+M structure of water without causing any damage 3.Relationship with the correction blue'l matter 1. Amend the attached drawings Figures 1 and 2 as shown in the attached sheet. 2. Amend the application that describes the earlier application, application number 1999 Patent Application No. 46646, as shown in the attached sheet.5. Reinforcement order [1 Attachment 1' 1991 8JJ22rl (Despatch [1> 6. Subject of amendment
Claims (1)
質にて処理した後、電磁波（例えばα線、ｘ線、紫外線
、可視光線、遠赤外線、赤外線、超遠赤外電波）照射、
磁気照射、音波照射（音波、超音波等）、加熱冷却、圧
力、振動、噴射等の物理的処理を行い、処理水または処
理された気体中の水の含有成分を得ることを特徴とする
水溶液及び気体中の水の含有成分を変えることなく水の
分子構造を変え、反応速度をコントロールする方法。 （２）原水または気体中の水の含有成分を、電磁波（例
えばα線、ｘ線、紫外線、可視光線、遠赤外線、赤外線
、超遠赤外電波）照射、磁気照射、音波照射（音波、超
音波等）、加熱冷却、圧力、振動、噴射等の物理的処理
を行った後、非水溶性物質にて処理して、処理水または
処理された気体中の水の含有成分を得ることを特徴とす
る水溶液及び気体中の水の含有成分を変えることなく水
の分子構造を変え、反応速度をコントロールする方法。 （３）原水または気体中の水の含有成分を、非水溶性有
機物にて処理した後、電磁波（例えばα線、ｘ線、紫外
線、可視光線、遠赤外線、赤外線、超遠赤外電波）照射
、磁気照射、音波照射（音波、超音波等）、加熱冷却、
圧力、振動、噴射等の物理的処理を行い、処理水または
処理された気体中の水の含有成分を得ることを特徴とす
る水溶液及び気体中の水の含有成分を変えることなく水
の分子構造を変え、反応速度をコントロールする方法。 （４）原水または気体中の水の含有成分を、電磁波（例
えばα線、ｘ線、紫外線、可視光線、遠赤外線、赤外線
、超遠赤外電波）照射、磁気照射、音波照射（音波、超
音波等）、加熱冷却、圧力、振動、噴射等の物理的処理
を行った後、非水溶性有機物にて処理した処理水または
処理された気体中の水の含有成分を得ることを特徴とす
る水溶液及び気体中の水の含有成分を変えることなく、
水の分子構造を変え、反応速度をコントロールする方法
。 （５）原水または気体中の水の含有成分を、非水溶性無
機物にて処理した後、電磁波（例えばα線、ｘ線、紫外
線、可視光線、遠赤外線、赤外線、超遠赤外電波）照射
、磁気照射、音波照射（音波、超音波等）、加熱冷却、
圧力、振動、噴射等の物理的処理を行い、処理水または
処理された気体中の水の含有成分を得ることを特徴とす
る水溶液及び気体中の水の含有成分を変えることなく、
水の分子構造を変え、反応速度をコントロールする方法
。 （６）原水または気体中の水の含有成分を、電磁波（例
えばａ線、ｘ線、紫外線、可視光線、遠赤外線、赤外線
、超遠赤外電波）照射、磁気照射、音波照射（音波、超
音波等）、加熱冷却、圧力、振動、噴射等の物理的処理
を行い、非水溶性無機物にて処理水または処理された気
体中の水の含有成分を得ることを特徴とする水溶液及び
気体中の水の含有成分を変えることなく、水の分子構造
を変え、反応速度をコントロールする方法。 （７）原水または気体中の水の含有成分を、非水溶性有
機物及び非水溶性無機物にて処理した後、電磁波（例え
ばα線、ｘ線、紫外線、可視光線、遠赤外線、赤外線、
超遠赤外電波）照射、磁気照射、音波照射（音波、超音
波等）、加熱冷却、圧力、振動、噴射等の物理的処理を
行い、処理水または処理された気体中の水の含有成分を
得ることを特徴とする水溶液及び気体中の水の含有成分
を変えることなく、水の分子構造を変え、反応速度をコ
ントロールする方法。 （８）原水または気体中の含有成分を、非水溶性有機物
にて処理した後、電磁波（例えばα線、ｘ線、紫外線、
可視光線、遠赤外線、赤外線、超遠赤外電波）照射、磁
気照射、音波照射（音波、超音波等）、加熱冷却、圧力
、振動、噴射等の物理的処理を行い、次に非水溶性無機
物にて処理して処理水または処理された気体中の水の含
有成分を得ることを特徴とする水溶液及び気体中の水の
含有成分を変えることなく、水の分子構造を変え、反応
速度をコントロールする方法。 （９）原水または気体中の水の含有成分を、電磁波（例
えばα線、ｘ線、紫外線、可視光線、遠赤外線、赤外線
、超遠赤外電波）照射、磁気照射、音波照射（音波、超
音波等）、加熱冷却、圧力、振動、噴射等の物理的処理
を行い、次に非水溶性有機物にて処理した後、非水溶性
無機物にて処理して、処理水または処理された気体中の
水の含有成分を得ることを特徴とする水溶液及び気体中
の水の含有成分を変えることなく水の分子構造を変え、
反応速度をコントロールする方法。 （１０）原水または気体中の水の含有成分を、非水溶性
無機物にて処理した後、非水溶性有機物にて処理し、次
に電磁波（例えばα線、ｘ線、紫外線、可視光線、遠赤
外線、赤外線、超遠赤外電波）照射、磁気照射、音波照
射（音波、超音波等）、加熱冷却、圧力、振動、噴射等
の、物理的処理を行い、処理水または処理された気体中
の水の含有成分を得ることを特徴とする水溶液及び気体
中の水の含有成分を変えることなく水の分子構造を変え
、反応速度をコントロールする方法。 （１１）原水または気体中の水の含有成分を、非水溶性
無機物にて処理した後、電磁波（例えばα線、ｘ線、紫
外線、可視光線、遠赤外線、赤外線、超遠赤外電波）照
射、磁気照射、音波照射（音波、超音波等）、加熱冷却
、圧力、振動、噴射等の物理的処理を行い、次に非水溶
性有機物にて処理して処理水または処理された気体中の
水の含有成分を得ることを特徴とする水溶液及び気体中
の水の含有成分を変えることなく水の分子構造を変え、
反応速度をコントロールする方法。 （１２）原水または気体中の水の含有成分を、電磁波（
例えばα線、ｘ線、紫外線、可視光線、遠赤外線、赤外
線、超遠赤外電波）照射、磁気照射、音波照射（音波、
超音波等）、加熱冷却、圧力、振動、噴射等の物理的処
理を行った後、非水溶性無機物にて処理を行い、次に非
水溶性物にて処理して処理水または処理された気体中の
水の含有成分を得ることを特徴とする水溶液及び気体中
の水の含有成分を変えることなく、水の分子構造を変え
、反応速度をコントロールする方法。 （１３）原水または気体中の水の含有成分を、電磁波（
例えばα線、ｘ線、紫外線、可視光線、遠赤外線、赤外
線、超遠赤外電波）照射、磁気照射、音波照射（音波、
超音波等）、加熱冷却、圧力、振動、噴射等の物理的処
理を行った後、非水溶性有機物にて処理を行い、次に非
水溶性金属間化合物にて処理し、次に非水溶性金属にて
処理して、処理水または処理された気体中の水の含有成
分を得ることを特徴とする水溶液及び気体中の水の含有
成分を変えることなく、水の分子構造を変え、反応速度
をコントロールする方法。 （１４）原水または気体中の水の含有成分を、電磁波（
例えばα線、ｘ線、紫外線、可視光線、遠赤外線、赤外
線、超遠赤外電波）照射、磁気照射、音波照射（音波、
超音波等）、加熱冷却、圧力、振動、噴射等の物理的処
理を行った後、非水溶性物質にて処理を行い、次に非水
溶性金属間化合物にて処理して、処理水または処理され
た気体中の水の含有成分を得ることを特徴とする水溶液
及び気体中の水の含有成分を変えることなく、水の分子
構造を変え、反応速度をコントロールする方法。 （１５）原水または気体中の水の含有成分を、電磁波（
例えばα線、ｘ線、紫外線、可視光線、遠赤外線、赤外
線、超遠赤外電波）照射、磁気照射、音波照射（音波、
超音波等）、加熱冷却、圧力、振動、噴射等の物理的処
理を行ない、非水溶性物質にて処理し、更に非水溶性金
属にて処理して、処理水または処理された気体中の水の
含有成分を得ることを特徴とする水溶液及び気体中の水
の含有成分を変えることなく、水の分子構造を変え、反
応速度をコントロールする方法。 （１６）原水または気体中の水の含有成分を、電磁波（
例えばα線、ｘ線、紫外線、可視光線、遠赤外線、赤外
線、超遠赤外電波）照射、磁気照射、音波照射（音波、
超音波等）、加熱冷却、圧力、振動、噴射等の物理的処
理を行ない、非水溶性金属間化合物にて処理し、次に非
水溶性金属にて処理して、処理水または処理された気体
中の水の含有成分を得ることを特徴とする水溶液及び気
体中の水の含有成分を変えることなく、水の分子構造を
変え、反応速度をコントロールする方法。 （１７）原水または気体中の水の含有成分を、電磁波（
例えばα線、ｘ線、紫外線、可視光線、遠赤外線、赤外
線、超遠赤外電波）照射、磁気照射、音波照射（音波、
超音波等）、加熱冷却、圧力、振動、噴射等の物理的処
理を行ない、非水溶性金属間化合物にて処理して、処理
水または処理された気体中の水の含有成分を得ることを
特徴とする水溶液及び気体中の水の含有成分を変えるこ
となく、水の分子構造を変え、反応速度をコントロール
する方法。 （１８）原水または気体中の水の含有成分を、電磁波（
例えばα線、ｘ線、紫外線、可視光線、遠赤外線、赤外
線、超遠赤外電波）照射、磁気照射、音波照射（音波、
超音波等）、加熱冷却、圧力、振動、噴射等の物理的処
理を行ない、非水溶性金属にて処理して、処理水または
処理された気体中の水の含有成分を得ることを特徴とす
る、水溶液及び気体中の水の含有成分を変えることなく
、水の分子構造を変え、反応速度をコントロールする方
法。 （１９）原水または気体中の水の含有成分を、硅酸（酸
化硅素）、酸化アルミニウム（アルミナ）炭化硅素を組
合せ処理し、次に銀にて処理した後、電磁波照射（例え
ばα線、ｘ線、紫外線、可視光線、遠赤外線、赤外線、
超遠赤外電波等）にて処理して、処理水または処理され
た気体中の水の含有成分を得ることを特徴とする水溶液
及び気体中の水の含有成分を変えることなく、水の分子
構造を変え、反応速度をコントロールする方法。 （２０）原水または気体中の水の含有成分を、硅酸（酸
化硅素）、酸化アルミニウム、酸化鉄、酸化ニッケル、
酸化コバルト及び酸化チタンを組合せ処理し、次に銀に
て処理した後電磁波照射（例えばα線、ｘ線、紫外線、
可視光線、遠赤外線、赤外線、超遠赤外電波等）にて処
理して処理水または処理された気体中の水の含有成分を
得ることを特徴とする水溶液及び気体中の水の含有成分
を変えることなく、水の分子構造を変え、反応速度をコ
ントロールする方法。 （２１）原水または気体中の水の含有成分を、硅酸（酸
化硅素）、酸化アルミニウム（アルミナ）、炭化硅素を
組合せて処理して、更に非水溶性有機物にて処理した後
銀にて処理し、次に電磁波照射（例えばα線、ｘ線、紫
外線、可視光線、遠赤外線、赤外線、超遠赤外電波等）
にて処理して、処理水または処理された気体中の水の含
有成分を得ることを特徴とする水溶液及び気体中の水の
含有成分を変えることなく、水の分子構造を変え、反応
速度をコントロールする方法。 （２２）原水または気体中の水の含有成分を、窒化アル
ミ、窒化硅素、窒化ホーソその他のセラミックを組合せ
にて処理し、次に非水溶性有機物及び銀にて処理して電
磁波照射（例えばα線、ｘ線、紫外線、可視光線、遠赤
外線、赤外線、超遠赤外電波等）を施して、処理水また
は処理された気体中の水の含有成分を得ることを特徴と
する水溶液及び気体中の水の含有成分を変えることなく
、水の分子構造を変え、反応速度をコントロールする方
法。 （２３）原水または気体中の水の含有成分を、金属酸化
物、金属硫化物、その他の非水溶性金属を組合せ処理し
、次に非水溶性有機物及び銀にて処理して電磁波照射（
例えばα線、ｘ線、紫外線、可視光線、遠赤外線、赤外
線、超遠赤外電波等）を行って、処理水または処理され
た気体中の水の含有成分を得ることを特徴とする水溶液
及び気体中の水の含有成分を変えることなく、水の分子
構造を変え、反応速度をコントロールする方法。 （２４）原水または気体中の水の含有成分を硅酸（酸化
硅素）、酸化鉄、酸化ニッケルを組合せ処理して、次に
非水溶性有機物にて処理した後、銀にて処理して、次に
電磁波照射（例えばα線、ｘ線、紫外線、可視光線、遠
赤外線、赤外線、超遠赤外電波等）を行って処理水また
は処理された気体中の水の含有成分を得ることを特徴と
する水溶液及び気体中の水の含有成分を変えることなく
、水の分子構造を変え、反応速度をコントロールする方
法。 （２５）原水または気体中の水の含有成分を、セラミッ
ク処理を行った後、銀にて処理して、処理水または処理
された気体中の水の含有成分を得ることを特徴とする水
溶液及び気体中の水の含有成分を変えることなく、水の
分子構造を変え、反応速度をコントロールする方法。 （２６）原水または気体中の水の含有成分を、非水溶性
物質で処理を行った後、銀にて処理して、処理水または
処理された気体中の水の含有成分を得ることを特徴とす
る水溶液及び気体中の水の含有成分を変えることなく、
水の分子構造を変え、反応速度をコントロールする方法
。 （２１）原水または気体中の水の含有成分を、非水溶性
有機物で処理を行った後、銀にて処理して、処理水また
は処理された気体中の水の含有成分を得ることを特徴と
する水溶液及び気体中の水の含有成分を変えることなく
、水の分子構造を変え、反応速度をコントロールする方
法。 （２８）原水または気体中の水の含有成分を、非水溶性
熊機物で処理をを行った後、銀にて処理して、処理水ま
たは処理された気体中の水の含有成分を得ることを特徴
とする水溶液及び気体中の水の含有成分を変えることな
く、水の分子構造を変え、反応速度をコントロールする
方法。 （２９）原水または気体中の水の含有成分を、非水溶性
有機物で処理し、更に、非水溶性無機物で処理を行った
後、銀にて処理して、処理水または処理された気体中の
水の含有成分を得ることを特徴とする水溶液及び気体中
の水の含有成分を変えることなく、水の分子構造を変え
、反応速度をコントロールする方法。 （３０）原水または気体中の水の含有成分を、非水溶性
物質で処理し更に、非水溶性有機物質にて処理し、次に
非水溶性無機物で処理した後、銀にて処理して、処理水
または処理された気体中の水の含有成分を得ることを特
徴とする水溶液及び気体中の水の含有成分を変えること
なく、本の分子構造を変え、反応速度をコントロールす
る方法。 （３１）原水または気体中の水の含有成分を、硅酸（酸
化硅素）、酸化アルミニウム（アルミナ）、炭化硅素、
酸化鉄、酸化ニッケル、酸化コバルト、酸化チタン、窒
化アルミ、窒化硅素、窒化ホウソ、その他のセラミック
、金属酸化物、金属硫化物、その他の非水溶性金属を組
合せて処理を行った後、銀にて処理して、処理水または
処理された気体中の水の含有成分を得ることを特徴とす
る水溶液及び気体中の水の含有成分を変えることなく、
水の分子構造を変え、反応速度をコントロールする方法
。 （３２）原水または気体中の水の含有成分を、非水溶性
金属間化合物にて処理した後、銀にて処理して、処理水
または処理された気体中の水の含有成分を得ることを特
徴とする水溶液及び気体中の水の含有成分を変えること
なく、水の分子構造を変え、反応速度をコントロールす
る方法。 （３３）原水または気体中の水の含有成分を非水溶性金
属にて処理した後、銀にて処理して、処理水または処理
された気体中の水の含有成分を得ることを特徴とする水
溶液及び気体中の水の含有成分を変えることなく、水の
分子構造を変え、反応速度をコントロールする方法。 （３４）原水または気体中の水の含有成分を非水溶性金
属間化合物にて処理した後、非水溶性金属にて処理し、
さらに銀にて処理して、処理水または処理された気体中
の水の含有成分を得ることを特徴とする水溶液及び気体
中の水の含有成分を変えることなく、水の分子構造を変
え、反応速度をコントロールする方法。[Scope of Claims] (1) After treating water components in raw water or gas with a water-insoluble substance, electromagnetic waves (e.g. alpha rays, x rays, ultraviolet rays, visible light, far infrared rays, infrared rays, Far-infrared radio wave) irradiation,
An aqueous solution characterized by performing physical treatments such as magnetic irradiation, sonic irradiation (sonic waves, ultrasonic waves, etc.), heating and cooling, pressure, vibration, jetting, etc. to obtain the components contained in water in treated water or treated gas. and a method of controlling the reaction rate by changing the molecular structure of water without changing the water content in the gas. (2) The water components in raw water or gas are irradiated with electromagnetic waves (e.g. alpha rays, It is characterized by performing physical treatments such as sound waves, etc.), heating and cooling, pressure, vibration, jetting, etc., and then treating with a water-insoluble substance to obtain treated water or water components in the treated gas. A method of controlling the reaction rate by changing the molecular structure of water without changing the water content in the aqueous solution or gas. (3) After treating water components in raw water or gas with water-insoluble organic substances, irradiation with electromagnetic waves (e.g. alpha rays, x-rays, ultraviolet rays, visible light, far infrared rays, infrared rays, ultra-far infrared radio waves) , magnetic irradiation, sonic irradiation (sonic waves, ultrasonic waves, etc.), heating and cooling,
An aqueous solution characterized by performing physical treatment such as pressure, vibration, injection, etc. to obtain the water content in treated water or treated gas without changing the water content in the water solution or gas. How to change the reaction rate and control the reaction rate. (4) The water components in raw water or gas are irradiated with electromagnetic waves (e.g. alpha rays, After performing physical treatments such as sound waves, etc.), heating and cooling, pressure, vibration, injection, etc., the treated water treated with a water-insoluble organic substance or the water components in the treated gas are obtained. without changing the water content in aqueous solutions and gases.
A method of controlling the reaction rate by changing the molecular structure of water. (5) After treating water components in raw water or gas with a water-insoluble inorganic substance, irradiation with electromagnetic waves (e.g. alpha rays, x-rays, ultraviolet rays, visible light, far infrared rays, infrared rays, ultra-far infrared radio waves) , magnetic irradiation, sonic irradiation (sonic waves, ultrasonic waves, etc.), heating and cooling,
Physical treatment such as pressure, vibration, injection, etc. is performed to obtain the water content in treated water or treated gas without changing the water content in the aqueous solution or gas,
A method of controlling the reaction rate by changing the molecular structure of water. (6) The water components in raw water or gas are irradiated with electromagnetic waves (e.g. A-rays, Aqueous solutions and gases that are characterized by performing physical treatments such as sound waves, etc.), heating and cooling, pressure, vibration, injection, etc. to obtain treated water or water components in treated gases with water-insoluble inorganic substances. A method of controlling the reaction rate by changing the molecular structure of water without changing the water content. (7) After treating water components in raw water or gas with water-insoluble organic substances and water-insoluble inorganic substances, electromagnetic waves (e.g. alpha rays, x-rays, ultraviolet rays, visible light, far infrared rays, infrared rays,
Physical treatments such as ultra-far infrared radio wave (ultra-far infrared radio wave) irradiation, magnetic irradiation, sonic irradiation (sonic waves, ultrasonic waves, etc.), heating and cooling, pressure, vibration, injection, etc. are performed to remove water components in treated water or treated gas. A method of controlling the reaction rate by changing the molecular structure of water without changing the components of water in an aqueous solution or gas. (8) After treating the components contained in raw water or gas with water-insoluble organic substances, electromagnetic waves (e.g. alpha rays, x-rays, ultraviolet rays,
Physical treatments such as visible light, far infrared rays, infrared rays, ultra-far infrared radio waves) irradiation, magnetic irradiation, sonic irradiation (sonic waves, ultrasonic waves, etc.), heating and cooling, pressure, vibration, injection, etc. are performed, and then water-insoluble Processing with an inorganic substance to obtain the water content in treated water or treated gas, which changes the molecular structure of water and increases the reaction rate without changing the water content in the aqueous solution or gas. How to control. (9) Water components in raw water or gas are irradiated with electromagnetic waves (e.g. alpha rays, (sonic waves, etc.), heating and cooling, pressure, vibration, jetting, etc., then treatment with a water-insoluble organic substance, and then treatment with a water-insoluble inorganic substance. changing the molecular structure of water without changing the water content in an aqueous solution or gas,
How to control reaction rates. (10) Water components in raw water or gas are treated with a water-insoluble inorganic substance, then treated with a water-insoluble organic substance, and then electromagnetic waves (e.g. alpha rays, x-rays, ultraviolet rays, visible light, far-field radiation, Physical treatment such as infrared rays, infrared rays, ultra-far infrared radio wave) irradiation, magnetic irradiation, sonic irradiation (sonic waves, ultrasonic waves, etc.), heating and cooling, pressure, vibration, injection, etc. is performed, and the treated water or treated gas is A method for controlling the reaction rate by changing the molecular structure of water without changing the water content in an aqueous solution or gas. (11) After treating water components in raw water or gas with a water-insoluble inorganic substance, irradiation with electromagnetic waves (e.g. alpha rays, x-rays, ultraviolet rays, visible light, far infrared rays, infrared rays, ultra-far infrared radio waves) , magnetic irradiation, sonic irradiation (sonic waves, ultrasonic waves, etc.), heating and cooling, pressure, vibration, injection, etc. are performed, and then treated with water-insoluble organic substances to treat the treated water or treated gas. Changing the molecular structure of water without changing the water content in an aqueous solution or gas, which is characterized by obtaining a water content,
How to control reaction rates. (12) Detect water components in raw water or gas by electromagnetic waves (
For example, alpha rays,
After physical treatment such as ultrasonic waves, etc.), heating and cooling, pressure, vibration, and injection, treatment is performed with a water-insoluble inorganic substance, and then treated with a water-insoluble substance to produce treated water or treated water. A method for controlling the reaction rate by changing the molecular structure of water without changing the water content in an aqueous solution or gas, which is characterized by obtaining a water content in a gas. (13) Detect water components in raw water or gas by electromagnetic waves (
For example, alpha rays,
After physical treatment such as ultrasonic waves, heating and cooling, pressure, vibration, injection, etc., treatment with water-insoluble organic substances, then treatment with water-insoluble intermetallic compounds, and then treatment with water-insoluble intermetallic compounds. The process involves changing the molecular structure of water and reacting without changing the water content in the aqueous solution or gas by treating the water with a reactive metal to obtain the water content in the treated water or treated gas. How to control speed. (14) Detect water components in raw water or gas by electromagnetic waves (
For example, alpha rays,
After physical treatment such as ultrasonic waves, etc.), heating and cooling, pressure, vibration, and jetting, treatment is performed with a water-insoluble substance, and then treatment is performed with a water-insoluble intermetallic compound to transform the treated water or A method for controlling the reaction rate by changing the molecular structure of water without changing the water content in an aqueous solution or gas, characterized by obtaining the water content in the treated gas. (15) Detect water components in raw water or gas by electromagnetic waves (
For example, alpha rays,
Ultrasonic waves, etc.), heating and cooling, pressure, vibration, jetting, and other physical treatments, treatment with a water-insoluble substance, and further treatment with a water-insoluble metal, to reduce the amount of water in treated water or treated gas. A method for controlling the reaction rate by changing the molecular structure of water without changing the water content in an aqueous solution or gas, characterized by obtaining a water content. (16) Detect water components in raw water or gas by electromagnetic waves (
For example, alpha rays,
Ultrasonic waves, etc.), heating and cooling, pressure, vibration, jetting, and other physical treatments, followed by treatment with a water-insoluble intermetallic compound, and then treatment with a water-insoluble metal, resulting in treated water or treated water. A method for controlling the reaction rate by changing the molecular structure of water without changing the water content in an aqueous solution or gas, which is characterized by obtaining a water content in a gas. (17) Detect water components in raw water or gas by electromagnetic waves (
For example, alpha rays,
Ultrasonic waves, etc.), heating and cooling, pressure, vibration, injection, and other physical treatments to obtain treated water or water components in the treated gas by treating with a water-insoluble intermetallic compound. A method of controlling the reaction rate by changing the molecular structure of water without changing the water content in aqueous solutions or gases. (18) Detect water components in raw water or gas by electromagnetic waves (
For example, alpha rays,
It is characterized by performing physical treatment such as ultrasonic waves, etc.), heating and cooling, pressure, vibration, injection, etc., and processing with a water-insoluble metal to obtain treated water or water components in the treated gas. A method of controlling the reaction rate by changing the molecular structure of water without changing the water content in the aqueous solution or gas. (19) Water components in raw water or gas are treated with a combination of silicic acid (silicon oxide), aluminum oxide (alumina), and silicon carbide, then treated with silver, and then irradiated with electromagnetic waves (e.g., alpha rays, rays, ultraviolet rays, visible light, far infrared rays, infrared rays,
(ultra-infrared radio waves, etc.) to obtain water molecules in treated water or treated gas without changing the water content in the aqueous solution or gas. A method of changing the structure and controlling the reaction rate. (20) Components contained in water in raw water or gas are silicic acid (silicon oxide), aluminum oxide, iron oxide, nickel oxide,
After treatment with a combination of cobalt oxide and titanium oxide, and then with silver, electromagnetic irradiation (e.g. alpha rays, x-rays, ultraviolet rays,
Aqueous solutions and water components in gases that are treated with visible light, far infrared rays, infrared rays, ultra-far infrared radio waves, etc.) to obtain water components in treated water or treated gases. A method of controlling the reaction rate by changing the molecular structure of water without changing it. (21) Water components in raw water or gas are treated with a combination of silicic acid (silicon oxide), aluminum oxide (alumina), and silicon carbide, further treated with a water-insoluble organic substance, and then treated with silver. Then, electromagnetic wave irradiation (e.g. alpha rays, x-rays, ultraviolet rays, visible light, far infrared rays, infrared rays, ultra-far infrared radio waves, etc.)
to obtain the water content in the treated water or the treated gas.Change the molecular structure of the water and increase the reaction rate without changing the water content in the aqueous solution or gas. How to control. (22) Water components in raw water or gas are treated with a combination of aluminum nitride, silicon nitride, hoso nitride, and other ceramics, then treated with water-insoluble organic substances and silver, and irradiated with electromagnetic waves (e.g. α rays, x-rays, ultraviolet rays, visible light, far-infrared rays, infrared rays, ultra-far infrared radio waves, etc.) to obtain water-containing components in treated water or treated gases. A method of controlling the reaction rate by changing the molecular structure of water without changing the water content. (23) Water components in raw water or gas are treated with a combination of metal oxides, metal sulfides, and other water-insoluble metals, then treated with water-insoluble organic substances and silver, and then irradiated with electromagnetic waves (
An aqueous solution characterized in that water components in treated water or treated gas are obtained by applying irradiation (for example, alpha rays, x-rays, ultraviolet rays, visible light, far infrared rays, infrared rays, ultra-far infrared radio waves, etc.) A method of controlling the reaction rate by changing the molecular structure of water without changing the water content in the gas. (24) Water components in raw water or gas are treated with a combination of silicic acid (silicon oxide), iron oxide, and nickel oxide, then treated with a water-insoluble organic substance, and then treated with silver, Next, electromagnetic wave irradiation (e.g., alpha rays, x-rays, ultraviolet rays, visible light, far infrared rays, infrared rays, ultra-far infrared radio waves, etc.) is performed to obtain the components contained in water in the treated water or treated gas. A method of controlling the reaction rate by changing the molecular structure of water without changing the water content in the aqueous solution or gas. (25) An aqueous solution characterized in that the water content in raw water or gas is subjected to ceramic treatment and then treated with silver to obtain the water content in treated water or treated gas. A method of controlling the reaction rate by changing the molecular structure of water without changing the water content in the gas. (26) The water content in raw water or gas is treated with a water-insoluble substance and then treated with silver to obtain the water content in treated water or the treated gas. without changing the water content in the aqueous solution or gas.
A method of controlling the reaction rate by changing the molecular structure of water. (21) The water components in raw water or gas are treated with a water-insoluble organic substance and then treated with silver to obtain the water components in the treated water or treated gas. A method of controlling the reaction rate by changing the molecular structure of water without changing the water content in the aqueous solution or gas. (28) After treating the water content in raw water or gas with a water-insoluble material, the water content in the treated water or gas is obtained by treating it with silver. A method for controlling the reaction rate by changing the molecular structure of water without changing the components of water in an aqueous solution or gas, characterized by: (29) The components of water in raw water or gas are treated with a water-insoluble organic substance, further treated with a water-insoluble inorganic substance, and then treated with silver, and the water contained in the treated water or gas is A method for controlling the reaction rate by changing the molecular structure of water without changing the water content in an aqueous solution or gas. (30) Water components in raw water or gas are treated with a water-insoluble substance, further treated with a water-insoluble organic substance, then treated with a water-insoluble inorganic substance, and then treated with silver. , a method for changing the molecular structure of the book and controlling the reaction rate without changing the water content in the aqueous solution or gas, characterized by obtaining the water content in treated water or treated gas. (31) Components contained in water in raw water or gas can be replaced with silicic acid (silicon oxide), aluminum oxide (alumina), silicon carbide,
After processing with a combination of iron oxide, nickel oxide, cobalt oxide, titanium oxide, aluminum nitride, silicon nitride, borax nitride, other ceramics, metal oxides, metal sulfides, and other water-insoluble metals, silver is produced. without changing the water content in the aqueous solution or gas, characterized in that the water content in the treated water or the treated gas is obtained by processing
A method of controlling the reaction rate by changing the molecular structure of water. (32) After treating the water content in raw water or gas with a water-insoluble intermetallic compound, the water content in the treated water or the treated gas is obtained by treating it with silver. A method of controlling the reaction rate by changing the molecular structure of water without changing the water content in aqueous solutions or gases. (33) A method characterized by treating water components in raw water or gas with a water-insoluble metal and then treating with silver to obtain water components in treated water or treated gas. A method of controlling the reaction rate by changing the molecular structure of water without changing the water content in aqueous solutions or gases. (34) After treating the water content in raw water or gas with a water-insoluble intermetallic compound, treating it with a water-insoluble metal,
Furthermore, the molecular structure of water is changed without changing the water content in the aqueous solution or gas, and the water content in the treated water or the treated gas is obtained by treatment with silver. How to control speed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11365989A JPH0316636A (en) | 1989-03-01 | 1989-05-08 | Method for changing molecular structure of water and controlling reaction rate without changing component contained in aqueous solution and water in gas |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4664689 | 1989-03-01 | ||
| JP1-46646 | 1989-03-01 | ||
| JP11365989A JPH0316636A (en) | 1989-03-01 | 1989-05-08 | Method for changing molecular structure of water and controlling reaction rate without changing component contained in aqueous solution and water in gas |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0316636A true JPH0316636A (en) | 1991-01-24 |
Family
ID=26386753
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11365989A Pending JPH0316636A (en) | 1989-03-01 | 1989-05-08 | Method for changing molecular structure of water and controlling reaction rate without changing component contained in aqueous solution and water in gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0316636A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7566142B2 (en) * | 2004-02-13 | 2009-07-28 | Jam Strait, Inc. | Changing color LEDS |
| JP2010142698A (en) * | 2008-12-16 | 2010-07-01 | Toru Furuya | Fluid treating apparatus |
| JP4768179B2 (en) * | 1999-06-25 | 2011-09-07 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Vehicle headlamp and vehicle |
-
1989
- 1989-05-08 JP JP11365989A patent/JPH0316636A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4768179B2 (en) * | 1999-06-25 | 2011-09-07 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Vehicle headlamp and vehicle |
| US7566142B2 (en) * | 2004-02-13 | 2009-07-28 | Jam Strait, Inc. | Changing color LEDS |
| JP2010142698A (en) * | 2008-12-16 | 2010-07-01 | Toru Furuya | Fluid treating apparatus |
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