JPH03156347A - Transmittance measuring method - Google Patents
Transmittance measuring methodInfo
- Publication number
- JPH03156347A JPH03156347A JP1295516A JP29551689A JPH03156347A JP H03156347 A JPH03156347 A JP H03156347A JP 1295516 A JP1295516 A JP 1295516A JP 29551689 A JP29551689 A JP 29551689A JP H03156347 A JPH03156347 A JP H03156347A
- Authority
- JP
- Japan
- Prior art keywords
- pellicle
- transmittance
- photomask
- bonded
- reflected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002834 transmittance Methods 0.000 title claims abstract description 29
- 238000000034 method Methods 0.000 title claims description 6
- 238000005259 measurement Methods 0.000 claims description 9
- 238000000691 measurement method Methods 0.000 claims description 4
- 230000004907 flux Effects 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、ペリクルが装着されたフォトマスクに関する
。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a photomask equipped with a pellicle.
第２図は、従来のペリクルの透過率の測定方法の図であ
る。FIG. 2 is a diagram of a conventional method for measuring transmittance of a pellicle.
ペリクル（２１）は、ペリクル枠（２２）に接着固定さ
れており、更に、接着剤を介してペリクル枠（２２）が
フォトマスクに接着される。The pellicle (21) is adhesively fixed to a pellicle frame (22), and the pellicle frame (22) is further adhered to a photomask via an adhesive.
従来の技術では、ペリクル（２１）の透過率測定は、ペ
リクル枠（２２）をフォトマスクに接着固定する前に光
束（２３）を透過し、検出器（２４）によって、その強
度を検出した。入射光束（２３）の強度と透過した光束
の強度よりペリクル（２１）の透過率を算出していた。In the conventional technology, the transmittance of the pellicle (21) was measured by transmitting a light beam (23) before adhesively fixing the pellicle frame (22) to a photomask, and detecting its intensity with a detector (24). The transmittance of the pellicle (21) was calculated from the intensity of the incident light beam (23) and the intensity of the transmitted light beam.
〔発明が解決しようとする課題］
しかし、前述の従来技術では、以下のような課題を有す
る。[Problems to be Solved by the Invention] However, the above-mentioned prior art has the following problems.
ペリクル（２１）の透過率測定方法において。In a method for measuring transmittance of a pellicle (21).
従来の技術では、ペリクル（２１）をフォトマスクに接
着固定した後では、ペリクル（２１）の透過率を測定す
ることができなかった。現在、主流のｇ線投影露出装置
では、ペリクルの経時的劣化による透過率の変化は、は
とんどないが、次期のｉ線投影露光出装置では、ペリク
ルの経時的劣化が激しく、その透過率変化は無視できな
い、よって、これからのペリクルを装着したフォトマス
クでは、定期的なペリクルの透過率測定が必要である。With the conventional technology, it was not possible to measure the transmittance of the pellicle (21) after the pellicle (21) was adhesively fixed to the photomask. Currently, in the mainstream G-line projection exposure equipment, there is almost no change in transmittance due to pellicle deterioration over time, but in the next generation I-line projection exposure equipment, the pellicle deteriorates drastically over time, and the transmission Changes in the transmittance cannot be ignored, and therefore, future photomasks equipped with pellicles will require periodic pellicle transmittance measurements.
そこで本発明は、このような課題を解決するもので、そ
の目的とするところは、ペリクルをフォトマスクに接着
固定した後も容易にペリクルの透過率を測定するところ
にある。SUMMARY OF THE INVENTION The present invention aims to solve these problems, and its purpose is to easily measure the transmittance of a pellicle even after the pellicle is adhesively fixed to a photomask.
【課題を解決するための手段１
フォトマスクに装着されたペリクルの透過率測定方法に
おいて、前記フォトマスクの少なくとも１ケ所に反射板
を設け、透過率測定光を前記ペリクルを通して、前記反
射板に対して、ある一定の角度を保って斜め方向から入
射し、前記反射板で反射され、再度、前記ペリクルを通
過した反射光の強度を測定し、前記透過率測定光の入射
強度と反射強度の関係から、前記ペリクルの透過率を求
めることを特徴とする。[Means for Solving the Problem 1] In a method for measuring the transmittance of a pellicle attached to a photomask, a reflector is provided at at least one location on the photomask, and transmittance measurement light is passed through the pellicle and directed against the reflector. Then, the intensity of the reflected light that enters from an oblique direction while maintaining a certain angle, is reflected by the reflector, and passes through the pellicle again is measured, and the relationship between the incident intensity and the reflected intensity of the transmittance measurement light is determined. The transmittance of the pellicle is determined from the above.
［実 施 例］ 第１図は、本発明測定方法の一実施例を示す図である。[Example] FIG. 1 is a diagram showing an embodiment of the measuring method of the present invention.
従来技術と同様に、ペリクル（１１）は、ペリクル枠（
１３）に接着されており、更にこのペリクル枠（１３）
がフォトマスク（１４）に接着固定されている。このフ
ォトマスク（１４）のペリクル（１１）とペリクル枠（
１３）に覆われる領域のパターニングされている部分（
１２）の外側に円形の反射板（１５）が取り付けられて
いる。Similar to the prior art, the pellicle (11) has a pellicle frame (
13), and this pellicle frame (13)
is adhesively fixed to the photomask (14). The pellicle (11) and pellicle frame (
13) The patterned part of the area covered by (
12), a circular reflection plate (15) is attached to the outside.
そして、透過率測定用のＨｅ−Ｎｅレーザーの入射光束
（１６）図の様に斜めから入射し、反射板（１５）によ
って反射させる０反射光（１７）は、再びペリクル面（
１１）を透過し検出器（１８）で反射光（１７）の強度
が検出される。Then, the incident light beam (16) of the He-Ne laser for transmittance measurement is incident obliquely as shown in the diagram, and the zero reflected light (17) is reflected by the reflector plate (15).
11) and the intensity of the reflected light (17) is detected by a detector (18).
このことにより、以下のような利点が得られる。This provides the following advantages.
第１図に示した測定方法により、反射板（１５）での入
射光束（１６）の減衰やペリクル（ｌｌ）を２度、透過
することを考慮することにより、従来の！！！１定方法
では、不可能だったペリクル（１１）をフォトマスク（
１４）に接着固定された後でもペリクル面（１１）の透
過率を算出することができる。By using the measurement method shown in FIG. 1 and taking into account the attenuation of the incident light beam (16) at the reflector (15) and the fact that it passes through the pellicle (ll) twice, the conventional measurement method can be improved. ! ! A photomask (
The transmittance of the pellicle surface (11) can be calculated even after it is adhesively fixed to the pellicle surface (14).
以上、本発明の一実施例を述べたがこれ以外にも。Although one embodiment of the present invention has been described above, there are other embodiments as well.
ｌ）反射板（１５）に誘電体ミラーを用いることにより
、測定に用いる光束の波長において、その反射率を９９
．９％にでき、反射光（１７）検出の際、安定した反射
強度を得られると同時に補正の必要性がなくなる。誘電
体被膜には、ｒ−Ａｌ友Ｏ３を用いる。l) By using a dielectric mirror as the reflector (15), the reflectance can be reduced to 99% at the wavelength of the light beam used for measurement.
．． 9%, and when detecting the reflected light (17), stable reflection intensity can be obtained and at the same time there is no need for correction. For the dielectric film, r-Al alloy O3 is used.
２）ｒ−Ａｌｘ Ｏｓ以外の誘電体被膜を用いる。2) Use a dielectric film other than r-AlxOs.
３）反射板を複数個、設けることにより測定精度をあげ
る。3) Increase measurement accuracy by providing multiple reflectors.
４）測定時の入射の角度を任意に変化させる。4) Arbitrarily change the angle of incidence during measurement.
などについても、本実施例と同様の利点が得られること
はいうまでもない。It goes without saying that the same advantages as in this embodiment can be obtained also with respect to the above.
［発明の効果］ 以上のように本発明によれば。[Effect of the invention] According to the present invention as described above.
ペリクルを装着したフォトマスクでペリクルに覆われる
領域にあるフォトマスク面の少なくとも１ケ所に反射板
をつけたフォトマスクにおいて、ペリクルの透過率測定
時に、入射光をある一定の角度で入射する測定方法によ
り、従来の技術では困難だったペリクルをフォトマスク
に装着した後でもペリクルの透過率測定を容易に行える
という効果を有するものである。A measurement method in which incident light is incident at a certain angle when measuring the transmittance of a pellicle in a photomask equipped with a pellicle, with a reflecting plate attached to at least one place on the photomask surface in the area covered by the pellicle. This has the effect that the transmittance of the pellicle can be easily measured even after the pellicle is attached to the photomask, which was difficult with conventional techniques.
第１図は、本発明の実施例の透過率測定方法を説明する
図である。
第２図は、従来の技術によるペリクルの透過率測定方法
を説明する図である。
・ペリクル
・クロムパターン面
・ペリクル枠
・フォトマスク
・反射板
ｌ ６ ・
１７ ・
１８ ・
２ ｌ ・
２２ ・
２３ ・
２４ ・
・入射光束
・反射光束
・検出器
・ペリクル
・ペリクル枠
・光束
・検出器FIG. 1 is a diagram illustrating a transmittance measuring method according to an embodiment of the present invention. FIG. 2 is a diagram illustrating a conventional method for measuring transmittance of a pellicle.・Pellicle・Chrome pattern surface・Pellicle frame・Photomask・Reflector plate l 6 ・ 17 ・ 18 ・ 2 l ・ 22 ・ 23 ・ 24 ・ ・Incoming light flux ・Reflected light flux ・Detector ・Pellicle ・Pellicle frame ・Light flux ・Detector
Claims (1)
おいて、前記フォトマスクの少なくとも１ケ所に反射板
を設け、透過率測定光を前記ペリクルを通して、前記反
射板に対して、ある一定の角度を保って斜め方向から入
射し、前記反射板で反射され、再度、前記ペリクルを通
過した反射光の強度を測定し、前記透過率測定光の入射
強度と反射強度の関係から、前記ペリクルの透過率を求
めることを特徴とする透過率測定方法。In a method for measuring transmittance of a pellicle attached to a photomask, a reflector is provided at at least one location on the photomask, and transmittance measurement light is passed through the pellicle while maintaining a certain angle with respect to the reflector. The intensity of the reflected light that is incident from an oblique direction, reflected by the reflector, and passed through the pellicle again is measured, and the transmittance of the pellicle is determined from the relationship between the incident intensity and the reflected intensity of the transmittance measurement light. A transmittance measurement method characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1295516A JPH03156347A (en) | 1989-11-14 | 1989-11-14 | Transmittance measuring method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1295516A JPH03156347A (en) | 1989-11-14 | 1989-11-14 | Transmittance measuring method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03156347A true JPH03156347A (en) | 1991-07-04 |
Family
ID=17821634
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1295516A Pending JPH03156347A (en) | 1989-11-14 | 1989-11-14 | Transmittance measuring method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03156347A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016072598A (en) * | 2014-09-30 | 2016-05-09 | エスアイアイ・セミコンダクタ株式会社 | Reticle transmissivity measuring method, projection exposure device and projection exposure method |
| CN109142284A (en) * | 2018-09-03 | 2019-01-04 | 重庆惠科金渝光电科技有限公司 | Penetrance detection method, device and computer readable storage medium |
-
1989
- 1989-11-14 JP JP1295516A patent/JPH03156347A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016072598A (en) * | 2014-09-30 | 2016-05-09 | エスアイアイ・セミコンダクタ株式会社 | Reticle transmissivity measuring method, projection exposure device and projection exposure method |
| CN109142284A (en) * | 2018-09-03 | 2019-01-04 | 重庆惠科金渝光电科技有限公司 | Penetrance detection method, device and computer readable storage medium |
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