JPH03154066A - Production of electrophotographic sensitive body - Google Patents

Abstract

PURPOSE:To enhance the adhesive property of a surface protective layer consisting of an org. material and to prevent peeling by forming a photosensitive layer consisting of a selenium material in such a manner that ten-point mean roughness and the max. height attain specific values. CONSTITUTION:The temp. of a conductive base body 1 is held at >=50 deg.C to the glass transition temp. of a selenium material or below and the selenium material is deposited by vacuum evaporation to form the photosensitive layer 2 having the surface roughness within the range of 0.3 to 0.8mum ten-point mean roughness Rz and <=1.0mum max. height. The surface protective layer 3 consisting of an org. material is then applied and formed on the layer 2. The layer 2 can be formed of As2Se3 (170 deg.C glass transition temp.) and the layer 3 of alkoxyorgano silanol and acryl polyol.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an electrophotographic device that is used in an electrophotographic device and includes a photosensitive layer made of a selenium-based material and a surface protective layer made of an organic material provided thereon. The present invention relates to a method of manufacturing a photoreceptor for use in a photoreceptor.

[Conventional technology]

In recent years, requirements regarding the quality of images obtained with electrophotographic devices have become increasingly strict. This requirement is met by damage to the surface of electrophotographic photoreceptors.

In order to prevent deterioration, improve image quality, and stably obtain high-quality images over a long period of time, it has been proposed to provide a surface protective layer on the photosensitive layer.

For example, JP-A-58-139154, JP-A-5
8=217942, a method of providing a crosslinked polymer or copolymer as a protective layer proposed in JP-A-57-16459, JP-A-57-204,559,
A method of providing a protective layer using fluororesin, silicone resin, polyester resin, aromatic polyamide resin, etc., as proposed in JP-A-5638055, and JP-A-58-130343 and JP-A-57-30846.
A method of providing a polymeric resin layer containing an inorganic material such as a metal or a metal oxide as a protective layer, as proposed in the above publication, has been proposed.

[Problem to be solved by the invention]

However, in the case of a selenium photoreceptor having a photosensitive layer made of a selenium-based material, the surface of the aluminous photosensitive layer and the above-mentioned organic material generally have poor wettability, making it difficult to form a coating film. When the protective layer is a thermoset film, the difference in thermal expansion during the baking process becomes a problem, and furthermore, the adhesion between the photosensitive layer and the protective layer is weak, and the mechanical stress applied to the surface of the photoreceptor during the electrophotographic process causes protection. There was a problem that the layers easily peeled off.

The present invention solves the above-mentioned problems and provides an electrophotographic photoreceptor in which an organic material is firmly adhered to a selenium photosensitive layer without impairing the electrophotographic properties, thereby forming a surface protective layer with excellent adhesion. The objective is to provide a manufacturing method.

[Means to solve the problem]

According to the present invention, the above problem is solved in a method for manufacturing an electrophotographic photoreceptor comprising a photosensitive layer made of a selenium-based material on a conductive substrate and a surface protection layer made of an organic material provided thereon. By maintaining the temperature of the conductive substrate within a range of 50° C. or higher and lower than the glass transition temperature of the selenium-based material, and vacuum-depositing the selenium-based material onto the conductive substrate, the surface roughness is reduced to a 10-point average. Roughness Rz: 0.3μm
The maximum height is within the range of 0.8 μm or more and the maximum height is Rma
This problem can be solved by forming a photosensitive layer having x of 1.0 μm or less, and forming a surface protective layer made of an organic material thereon.

C action] On a photosensitive layer having an appropriately uniform surface roughness formed by vacuum-depositing a selenium-based material onto a conductive substrate maintained at a temperature below the glass transition temperature of the material, A strongly adhering coating film made of organic material can be easily formed, resulting in a surface protective layer with good adhesion. If the temperature of the conductive substrate becomes too low, the required electrophotographic properties cannot be obtained, so it is necessary that the temperature of the conductive substrate be 50° C. or higher.

〔Example〕

FIG. 1 is a schematic cross-sectional view of a photoreceptor manufactured by an embodiment of the manufacturing method according to the present invention, and is a conductive substrate! A single-layer photosensitive layer 2 made of a selenium-based material is formed thereon, and a surface protection layer 3 made of an organic material is formed thereon.

Example 1 After performing the required machining on an A1 alloy cylinder as the conductive substrate 1, its outer surface was roughened to a ten-point average roughness Rz of 0.7μ.
The surface roughness is uniformly roughened to m. After cleaning this conductive substrate, it was attached to a rotating support shaft of a vacuum evaporation apparatus, heated and maintained at a temperature of 175°C, and
^s, Se, (glass transition temperature 170
℃) was deposited to a thickness of about 55 μm to form the photosensitive layer 2. The surface roughness of this photosensitive layer 2 is 0.0 in ten-point average roughness Rz. l
pm, and the maximum height Rmax was 0.4 μm.

On this photosensitive layer, a material prepared by mixing alkoxyorganosilanol and acrylic polyol at a weight ratio of 7:3 was applied by a dip method to form a surface protective layer 3 having a thickness of approximately 2 μm, thereby producing a photoreceptor. .

Example 2 A photoreceptor was produced in the same manner as in Example 1, except that the temperature of the conductive substrate in AsxSe3MM was 155°C.

The surface roughness of the photosensitive layer at this time is Q in Rz, 3 μ
m and Rmax were 0.5 μm.

Example 3 A photoreceptor was produced in the same manner as in Example 1, except that the temperature of the conductive substrate during AszSes vapor deposition was 120°C.

The surface roughness of the photosensitive layer at this time was 0.8 μm in Rz.
, 1 at Rmax. It was Opm.

Example 4 A photosensitive layer was produced in the same manner as in Example 3, except that the surface roughness of the conductive substrate was set to 1.0 μm in Rz. The surface roughness of the photosensitive layer at this time is 1.0 pm in Rz and Rm
It was 1.2 μm in ax.

Comparative example.

A photoreceptor was produced in the same manner as in Example 1, except that the temperature of the conductive substrate during vapor deposition was 220° C. according to a conventional manufacturing method. At this time, the surface of the photosensitive layer became a mirror surface.

For these photoreceptors, the adhesion of the surface protective layer was evaluated by a peel test using an adhesive tape. The results are shown in Table 1 together with the surface roughness of the conductive substrate, As, Se, temperature of the conductive substrate during vapor deposition, and surface roughness of the photosensitive layer.

Table 1 As shown in Table 1, in the case of the comparative photoreceptor in which the photosensitive layer was deposited using the conventional manufacturing method at a temperature considerably higher than the glass transition temperature of the conductive substrate during vapor deposition, the surface of the photosensitive layer was It becomes a mirror surface, and it can be seen that the adhesion of the surface protective layer provided thereon is weak.

In addition, in the case of the photoreceptor of Example 1, in which the conductive substrate temperature during vapor deposition is higher than the glass transition temperature of ^52Se, the surface roughness of the photosensitive layer is small, and the adhesion of the surface protective layer is lower than that of the comparative example. Although improved over the photoconductor, the strength was not satisfactory. In the case of the photoreceptor of Example 2.3, the material of the surface protective layer well wrapped around the irregularities on the surface of the photosensitive layer, resulting in good adhesion.

In the case of the photoreceptor of Example 4, the surface roughness of the photosensitive layer was slightly too large, and the surface protective layer material was insufficiently wrapped around the recesses, resulting in some areas with weak adhesion. The surface should be moderately large, preferably 0.4 μm to 0.9 μm in Rz.
By using a conductive substrate with a roughness of 100 mL and performing evaporation while keeping the temperature of the conductive substrate at a temperature lower than the glass transition temperature, a photosensitive layer having an appropriate and uniform rough surface can be formed.
It can be seen that a surface protective layer with good adhesion can be formed thereon. The surface roughness of the photosensitive layer is 0.3 μm or more and 0.8 in Rz.
Less than μm.

It is preferable that Rmax is 1.0 μm or less.

The photoreceptor of Example 2.3 was subjected to a printing durability test by image reproduction using a commercially available plain paper copying machine, and as a result, no peeling of the surface protective layer occurred up to 100,000 copies, and satisfactory adhesion was confirmed. .

Furthermore, the electrophotographic characteristics of these photoreceptors were evaluated. The results are shown in Table 2 together with the thickness of the surface protective layer. Sensitivity was expressed as half-reduced exposure E172 (lux/second), and humidity resistance was evaluated by changes in characteristics when left in an atmosphere at a temperature of 35° C. and relative humidity of 80% for 100 hours.

/ 7/ / / / / Table 2 As shown in Table 2, when a surface protective layer with a thickness of about 2 μm was provided, the electrophotographic characteristics were as in Example.

There was no difference between the photoreceptors of Comparative Examples, and the results were good.

In the above example, AS2Se is used as the constituent material of the photosensitive layer.

However, it is not limited to this, and even if other selenium-based materials are used, the temperature of the conductive substrate can be maintained at 50°C or higher and lower than the glass transition temperature depending on the material. , the same effect can be obtained. Further, the layer structure of the photosensitive layer is not limited to a single layer, and a functionally separated multilayer structure is equally effective. Furthermore, the constituent material of the surface protective layer is not limited to the examples.

〔Effect of the invention〕

According to this invention, a selenium-based material is vacuum-deposited on a conductive substrate kept at a temperature of 50° C. or higher and lower than the glass transition temperature, and the surface roughness is 0.63 μm or higher in Rz and 0.8 am or lower, and 1 in Rmax. , 0 μm or less, and a surface protective layer made of an organic material is formed thereon to produce a photoreceptor.

By using this manufacturing method, the organic material can be easily and firmly adhered to the selenium photosensitive layer without impairing the electrophotographic properties, and a surface protective layer with excellent adhesion can be formed, resulting in improved durability. It is possible to obtain an electrophotographic photoreceptor that is excellent and can provide high-quality images over a long period of time.

[Brief explanation of the drawing]

FIG. 1 is a schematic cross-sectional view of a photoreceptor manufactured by an embodiment of the manufacturing method according to the present invention. 1 conductive substrate, 2 photosensitive layer, 3 surface protective layer. Diagram

Claims (1)

[Claims] 1) In a method for manufacturing an electrophotographic photoreceptor comprising a photosensitive layer made of a selenium-based material on a conductive substrate and a surface protection layer made of an organic material provided thereon, the temperature of the conductive substrate is set to 50°C. By maintaining the temperature within a range below the glass transition temperature of the selenium-based material and vacuum-depositing the selenium-based material on the conductive substrate, the surface roughness is 0.3 μm or more in ten-point average roughness Rz. An electrophotographic photoreceptor comprising a photosensitive layer having a maximum height Rmax of 0.8 μm or less and a maximum height Rmax of 1.0 μm or less, and a surface protective layer made of an organic material formed thereon. manufacturing method.