JPH0315134A - Injection rate control device for injection solution - Google Patents

Abstract

PURPOSE:To make a predetermined quantity of injection at all times by providing a means which periodically measure a flow rate for a fixed time of a fluorescent material slurry circulation system, a means which injects slurry until the quantity of the slurry reaches a quantity set according to its measured value, and a means which determines whether the injection ends within a set limited time. CONSTITUTION:The flow rate of fluorescent material slurry 2 discharged through a nozzle 7 for a fixed time in a fixed period by an automatic nonprocess mechanism is measured with a measuring device 21 (a control processing device) controlled by a sequencer. A flow rate per second obtained by measurement is updated and stored whenever it is measured by the measuring device 21. The device 21 checks a value of flow rate given in advance as an electrical signal at every measurement to operate a time necessary for injection from the nozzle 7 according to a flow rate per second inputted from a flow rate measure 30 and to control a flow rate such that an injection solenoid valve 5 can be opened only for an injection time of the slurry. A judgement means determines whether a required injection time is within a limited time fixed according to a tact time of the device 21, and reports the result of determination.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a device for adjusting the amount of injection liquid such as phosphor slurry to a constant amount in the manufacturing process of, for example, a cathode ray tube phosphor screen. [Prior Art] A device for adjusting the injection amount of phosphor slurry will be explained below as an example. Figure 2 is a schematic diagram showing the configuration of the phosphor slurry circulation system and injection amount control system of a conventional phosphor slurry injection amount adjustment device. In the figure, the slurry for injection (2) stored at a certain level in the injection tank (1) is pumped by the pump (3).
For injection through piping such as a vinyl hose 0)
It is sent to the Itm valve (5) and inside the glass panel (6).
It is injected from the nozzle (7). When the predetermined injection time has elapsed, the home magnet valve (5) is switched and the phosphor slurry (2)
The liquid flows out from the other outlet of the solenoid valve (5) and is returned to the injection tank (1) through the receiving funnel (8). The phosphor slurry (2) injected into the glass panel (8) is spread on the inner surface by the rotation of the glass panel (8), and then the glass panel (8) is moved to the operating position of the salvage cap (9) at +71 high speed. Excess amount is recovered by recycling and returned to the original injection tank (1) through pipe 0). This phosphor slurry (2) circulation system is also equipped with an automatic emptying mechanism for periodically flushing out the phosphor slurry (2) staying in the nozzle (7). That is, the saucer (10) moves under the nozzle (7) at regular intervals to empty the phosphor slurry (2) for a predetermined period of time, and then returns to the injection tank (1) through the piping (4). It has been done. Note that replenishment of the reduced amount that occurs during repeated application and collection of phosphor slurry is detected by a liquid level detector (l1) installed in the injection tank (1), and the replenishment valve (12) is activated. This is done by replenishing the injection tank (1) with a separately prepared phosphor slurry until the liquid level of the slurry (2) in the injection tank (1) recovers to a certain level. The circulation system of the phosphor slurry is controlled by, for example, a sequencer (13), and a glass panel (
6) The amount of phosphor slurry (2) injected into the chamber is controlled by a timer (not shown) installed in the control system. Also, in order to obtain an appropriate flow rate, please use the bomb (3).
This is done by adjusting the output of the pump or the pinch cock (14) attached to the pipe (4). [Problems to be Solved by the Invention] In the conventional phosphor slurry injection amount adjustment device, the means for keeping the injection amount of phosphor slurry constant is to use a timer to perform injection for a certain period of time. The amount of phosphor slurry injected from the nozzle (7) is periodically measured using a measuring cylinder, and adjusted to a predetermined value by adjusting the flow rate with a pinch cock (l4) or by changing the set time of a timer. There was a need. this is,
As a result of fluctuations over time, if the amount of injection increases, bubbles will form in the slurry, causing the "Awamura J (15)" as shown in Figure 3, and if the amount decreases, the slurry will not spread over the entire surface of the glass panel (Figure 4). This is because it causes "poor spreading" (16) such as
7) It can also occur due to clogging of the filter installed inside the filter over time. Since these unevenness (15) and poor spreading (16) occur continuously and contradictoryly, it is difficult to adjust the injection amount of the phosphor slurry to keep it constant, which causes a decrease in manufacturing yield. It had become. This invention was made to solve the above-mentioned problems, and it is possible to maintain the amount of phosphor slurry injected at a constant amount without being affected by fluctuations in the circulatory system.
It is an object of the present invention to provide a phosphor slurry injection amount adjusting device that can detect when the amount deviates from an automatically adjustable range.

[! Means for Solving Problem i] The phosphor slurry injection amount adjusting device according to the present invention includes a means for periodically measuring the flow rate of the phosphor slurry circulation system at a certain time, and a means for adjusting the amount of phosphor slurry injection based on the measured value. means for injecting the phosphor slurry until a set injection amount is reached;
The device is characterized by having a means for determining whether or not the injection is completed within a predetermined time limit. [Operation] The phosphor slurry flow rate measuring means of the present invention uses an automatic emptying mechanism to discharge the phosphor slurry from a nozzle at regular intervals for a fixed period of time, and the amount thereof is measured by a measuring device controlled by a sequencer. The injection amount adjustment means adjusts the injection time so that a predetermined injection amount is achieved. The determining means determines whether or not the required injection time is within a time limit determined from the takt time of the apparatus, and notifies the result.

[Embodiment of the Invention] An embodiment of the invention will be described below. FIG. 1 is a diagram showing the configuration of the main parts of this embodiment, where (l7) is a measuring cylinder, (18) is a solenoid valve, and (19) is a measuring cylinder (13).
) is a photosensor array arranged along the tube axis on side Q, and (20) is a light source arranged so as to face the photosensor array (l9) across the measurement cylinder (l7),
(17) to (20) constitute the flow rate measuring device (30).*' (21) is a control processing unit, which is composed of a microcomputer. In this embodiment, in order to accurately measure the amount of phosphor slurry actually injected from the nozzle (7), the automatic emptying amount mechanism described in the conventional example is used. In other words, the flow noise is measured for one out of two times of the automatic blanking operation that is repeated at each index (20 seconds) on the self* coating line, and the control processing unit 1 (21) In response to this, each device operates in the order described below. First, when the empty tray (10) is moved under the nozzle (7) by the moving 7-m, the 1! The magnetic valve (18) is closed,
Next, the phosphor slurry is ejected from the nozzle (7) for exactly one second. The discharged phosphor slurry (2) passes from the saucer (10) through the pipe 0) to the measuring cylinder (17).
) and the liquid level will be according to the injection amount. 12 seconds after the start of injection, the photo sensor (l9) and light source (20)
After measuring the liquid level and reading the data, the ML magnetic valve (18) is opened and the phosphor slurry (2)
The liquid passes through 'Piping 0' and is transferred to the receiving funnel (8) explained in Figure 2.
) and returned to Injection Tanok (1). Flow rate per second (cc) obtained from this measurement operation
is updated and stored in the control device (21) every time a measurement is made. Control unit 1 (21) sets the actual amount of phosphor slurry to be injected into the panel, not by the injection time, but by the final amount of liquid required. That is, given in advance!
& The amount value is checked as an electrical signal every time, and the time required to inject from the nozzle (7) is calculated based on the gt amount per second input from the flow rate measuring device (30).
When injecting the phosphor slurry into the glass panel during the injection time, the injection semi-magnetic valve (5) is controlled to open. To explain more precisely, l8”, 2!”, 25”
In a line that applies phosphor slurry to glass panels, the flow rate per unit time was measured to be 14 cc, and the injection capacity of each tube type was 85 cc, 85 cc, and 120 cc, respectively.
If it was set to c, 65/14 4.8 seconds, 85/14 8.1 seconds, and 120/14 8
．． Each injection time is 5 seconds. According to this embodiment, even if the unit flow rate changes midway through, the injection time is adjusted accordingly. The injection volume does not change. As a result, the “Awamura” mentioned earlier
The occurrence of "defective spreading" was almost eliminated, and the yield improved by about 3%. The above series of operation commands is executed by a sequencer. Or it is carried out using a microcomputer.
It's nothing particularly special. Further, the flow rate measuring device (30) of this embodiment has an inner diameter of 0,8
0 on the side wall of the measuring cylinder (17) with a height of 20 cm and a height of 20 cm.
．． A photosensor array (19) is used in which a photo sensor is placed every 51 holes. It is configured to allow flow rate measurement with LCC accuracy. In addition, the increase or decrease in the injection time due to changes in ytn is managed and controlled separately from the takt time of the autologous blood line, so in this example, the minimum injection time is set to 3 seconds and the maximum injection time is set to 10 seconds. If the injection time is less than 3 seconds or more than 10 seconds, please inform the patient of this fact. It is configured to maintain the circulation system for the phosphor slurry. In the above example, the flow i was measured using a photosensor array and a light source, but electrodes may also be used. In addition, in the above embodiment, the amount of phosphor slurry sent out from the nozzle during automatic emptying was measured, but the time required to obtain, for example, 20 cc was measured using a flow meter installed in the circulation system. It may also be configured to calculate the flow rate per unit time from the measurement time. Furthermore, in the above embodiment, p1 of the phosphor slurry! Although the spring line has been described, it can be similarly applied to injection systems for various liquids that change over time. means for measuring the flow rate per unit time in the system at predetermined time intervals; means for calculating the time to obtain a predetermined injection amount based on this flow rate per unit time; and the calculated injection time at the time of injection. Since the present invention is equipped with a control means for injecting only a predetermined amount, it is possible to obtain an injection m adjustment device that can always inject a predetermined amount even if the flow of the injectate in the circulation system changes with time. be.

[Brief explanation of the drawing]

Fig. 1 is a diagram showing an embodiment of the present invention, and Fig. 2 is a diagram showing a phosphor slurry circulation system and injection amount adjustment structure in a conventional phosphor slurry coating device. T! Figures IJ3 and 4 are perspective views of glass panels showing unevenness and spreading defects that occur in the phosphor coating in conventional equipment. (2)...phosphor, (5)...injection solenoid valve, (7
)...Nozzle, (+7)...Measuring cylinder, (
18)... Solenoid valve, (l9)... Photo sensor array. (20)...Light source, (21)...Control processing device. (30)...Flow rate measuring device. In each figure, the same symbols indicate the same or equivalent parts.

Claims (1)

[Claims] (1) A means for measuring the flow rate per unit time of the injected liquid in the circulation system at predetermined time intervals, and calculating the time required to obtain a predetermined injection amount from the measured flow rate per unit time. and means for injecting the injection liquid for the calculated injection time.