JPH03142980A - Discharge type pulse laser equipment - Google Patents

Abstract

PURPOSE:To operate a saturable reactor at the optimum saturation operating point in response to an applied voltage, by installing unit core selecting switches for resetting each unit core constituting the saturable reactor. CONSTITUTION:A saturable reactor 1 of a discharge excitation circuit is constituted by installing the following; bias power supplies 13, 16, 19 for setting the residual magnetic flux density of unit cores 11, 14, 17 constituting a saturable reactor 1, and switches 12, 15, 18 to select a unit core to be reset out of the unit cores 11, 14, 17. Thereby only some of the unit cores 11, 14, 17 can be reset by only some of the bias circuits. As a result, by increasing or decreasing the number of bias circuit switches 12, 15, 18 to be turned ON, the operating region B and the saturation magnetic flux PHI3 of the saturable reactor 1 can be controlled. Thereby the saturation point and the inductance of the saturable reactor can be changed.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a discharge type pulse laser device.

[Conventional technology]

The 51st JJ is, for example, a magazine (Japanese Jour).
nal orApplied Physics Vol.
, 24 No. 11. PP, 855) is a circuit configuration diagram of a discharge excitation circuit of a conventional pulsed laser device using a saturable reactor.

In the figure, (1) is a saturable reactor composed of multiple unit cores, (2) is a saturable reactor bias power supply, (3) is a saturable reactor bias circuit switch, and (4) is a first main electrode. , (5) is the second main electrode,
(6) is an auxiliary electrode for pre-ionization, (7) is a peaking capacitor, (8) is a storage capacitor, (
9) is a laser excitation circuit switch, and 01 is an inductance for charging the storage capacitor.

Next, the operation will be explained. FIG. 6 shows an example of a B-H characteristic curve of a magnetic material conventionally used for the saturable reactor 111. Point B51 + point Blt is the residual magnetic flux density when a bias voltage is applied to the saturable reactor, and the operating regions ΔB and ΔBt of the saturable reactor are thereby determined, respectively. Here, if the core cross-sectional area of the saturable reactor is S, then the saturation magnetic flux Φ, = ΔB
−3, and the time integral of the applied voltage V is 111. t
, and Φ.

(1°"V-dt-Φ,), the saturable reactor becomes saturated.

In Figure 5, the charge stored in the storage capacitor (8) by the high voltage power supply is transferred to the laser excitation circuit switch (
By turning on the peaking capacitor (7)
). On the other hand, the saturable reactor ill is
Initially, it is in an unsaturated state, and only a minute leakage current flows through the saturable reactor +11. Eventually, when the time integral of the voltage V applied to the saturable reactor reaches Φ, the saturable reactor (1) becomes saturated, Main discharge electrode +41. +5
A large current flows between 1 and 1 to excite the laser medium.

Note that the switching characteristics of the saturable reactor are largely influenced by the B-H characteristic curve of the magnetic material used for the core material. In order to improve the switching characteristics, it is necessary to change the magnetic flux from an unsaturated state to a saturated state with a small magnetomotive force.
It is desirable to use one having a −H characteristic curve.

[Problem i1 to be solved by the invention] The excitation circuit of a conventional discharge type pulsed laser device is configured as described above, and when changing the applied voltage of the excitation circuit, the saturation magnetic flux Φ3 of the saturable reactor is adjusted. The need arises. At this time, when a magnetic material having a -H characteristic curve as shown in Fig. 6 is used for the saturable reactor,
If the operating region of the saturable reactor changes as ΔB1ΔB2 by adjusting the applied bias voltage, the saturation magnetic flux Φ of the saturable reactor can be adjusted.
The range is limited to a region where ΔB changes significantly by adjusting the bias voltage. Furthermore, when using a 6R material having a rectangular B-H characteristic curve as shown in Fig. 7, the operating range ΔB of the saturable reactor is approximately the same as that shown in Fig. 6 even if the applied bias voltage is changed. , does not change significantly, so it was not possible to adjust the saturation magnetic flux Φ of the saturable reactor. Therefore, in order to operate the saturable reactor at a different laser excitation voltage, it was necessary to replace the saturable reactor with one suitable for that voltage.

This invention was made to alleviate the above-mentioned problems, and provides a discharge type pulsed laser device that can change the saturation point and inductance of a saturable reactor without replacing the saturable reactor. With the goal.

[Means to solve the problem]

The discharge type pulsed laser device according to the present invention is provided with a bias power supply for setting the residual magnetic flux density of each unit core constituting the saturable reactor, and a switch for selecting the unit core to be reset from among the unit cores, The saturable reactor of the excitation circuit is fllfj.

[Effect]

The discharge type pulse laser device according to the present invention can select and reset some of the unit cores constituting the saturable reactor to change the saturation point and inductance of the saturable reactor.

〔Example〕

An embodiment of the present invention will be described below with reference to the drawings. 1st
In the figure, αD is a first unit core that constitutes a saturable reactor, (2) is a bias circuit switch that resets the unit core 7011, a3 is a bias circuit power supply that sets the residual magnetic flux density of the unit core αl,
041 is the second unit core that constitutes the saturable reactor all a, α9 is the bias circuit switch that resets the unit core Qa, 0 is the bias circuit power supply for the unit core Q4), and α power is the saturable reactor. The nth uni that makes up +11.

01 is a bias circuit switch for resetting the unit core αD, and 01 is a bias circuit power supply for the unit core an.

Next, the operation will be explained. Since each unit core αυ, Oa, 01 that constitutes the saturable reactor (11) is provided with an individual bias circuit, it is possible to turn on only an appropriate number of each bias circuit switch (2) α9 Ql. Whereas the entire saturation reactor is reset, in the configuration of this invention, only some unit cores can be reset by some bias circuits.
This makes it possible to control the operating range ΔB and saturation magnetic flux Φ of the saturable reactor by increasing or decreasing the number of bias circuit switches that are turned on.

FIG. 2 shows an example of saturable reactor switching characteristics when the configuration of the above embodiment is used. The horizontal axis shows time and the vertical axis shows voltage. When all n unit cores constituting the saturable reactor are reset and used by the bias circuit, time Lm ni! He”V dt
=Φ, and the saturable reactor becomes saturated and switches. If the bias circuit of the saturable reactor has a conventional configuration and cannot control the saturation magnetic flux Φ of the core, 1R
It was not possible to switch the saturable reactor at any other time. On the other hand, when the configuration of the present invention is used, the number of unit cores to be reset by the bias circuit is increased from n to n-1.

Since the saturation magnetic flux density Φ of the saturable reactor can be controlled by changing n-2 pieces, etc., the switching time of the saturable reactor can be changed accordingly to t
It can be changed as n 11-1...
The charging voltage changes accordingly to V□V, -, Vll-,...
・Can change to That is, in FIG. 1, the saturation magnetic flux density of each unit core αo aa Q7) is Φ and Φ1Φ, respectively.
7, the saturation magnetic flux density is ΦI (Φ,=Φ
.

+Φ8 +Φ7), and the switching time is t7, and the charging voltage is v. When switch Ql is turned off, φ
1 - Φ1 + Φ2, and the switching time is ). ”
Time tz when Vdt=Φ (charging voltage is Vt)
(see Figure 2), similarly, switch a
When 9 is turned off, Φ=Φ1, and the switching time changes to 1+ (charging voltage is V).

Further, FIG. 3 shows another example of saturable reactor switching characteristics when the configuration of the present invention is used.

The horizontal axis shows time and the vertical axis shows voltage.

Now, the charging voltage of the peaking capacitor (7) is V, and the saturation magnetic flux Φ1 of the saturable reactor is saturated at time t, when the voltage applied to the saturable reactor becomes vll (Φ, -). t”Vdt- (curve A)
, where the charging voltage of the peaking capacitor (7) is V,
(Curve B), if the saturation magnetic flux Φ of the core cannot be controlled with the conventional configuration, the saturable reactor will have a voltage Vc (< Vb ), which causes switching to occur from the peaking capacitor (7) to the main electrode (41
, (The energy transmission efficiency between 51 and 51 decreases.On the other hand, when using the TL of this invention, the saturation magnetic flux of the saturable reactor is changed by changing the number of unit cores to be reset by the bias circuit. Then Φ
, If we select the unit core to be reset and set the saturation magnetic flux Φ, ° so that ゛=1゜''Vdt, we can switch the saturable reactor at time t, when the voltage applied to the saturable reactor becomes V, By using the power of this invention in this way, the peaking capacitor (
7) to the main electrodes (41, (51) can be maintained at 100%.

In the above embodiment, a bias power supply was prepared for each bias circuit of each unit core constituting the saturable reactor, but as shown in Fig. 4, the bias power supply was one variable voltage source, and the bias circuit switch ( 2), Q'9. α
The saturation operating point and inductance of the saturable reactor (+1) may be adjusted only by turning on and off the switch and adjusting the voltage of the variable voltage source (2).

In addition, in the above embodiment, the laser excitation circuit is of the capacitance transfer type, but the laser excitation circuit is of the P F N (I'ulse Forming Ne
Other excitation circuit methods such as the twork) method may also be used, and the same effects as in the above embodiments can be achieved.

〔Effect of the invention〕

As described above, according to the present invention, the saturable reactor used in the discharge circuit of the discharge type pulsed laser device includes a bias power supply for setting the residual magnetic flux density of each unit core constituting the saturable reactor, and a bias power supply for setting the residual magnetic flux density of each unit core constituting the saturable reactor. Since a switch is provided to select the unit core to be reset, the saturation point and inductance of the saturable reactor can be easily changed, so that the saturable reactor operates at the optimal saturation operating point according to the applied voltage. This has the effect of providing controllability.

[Brief explanation of the drawing]

FIG. 1 is a circuit configuration diagram showing a discharge excitation circuit of a discharge type pulsed laser device according to an embodiment of the present invention, and FIGS. 2 and 3 are switching characteristics of a saturable reactor according to an embodiment of the present invention, respectively. FIG. 4 is a circuit configuration diagram showing a discharge excitation circuit of a discharge type pulsed laser device according to another embodiment of the present invention, and FIG. 5 is a circuit diagram showing a discharge excitation circuit of a conventional discharge type pulsed laser device. Configuration diagram and Fig. 6. and FIG. 7 are characteristic diagrams showing the B-H characteristics of the magnetic materials used in the saturable reactor. In the figure, +11 is a saturable reactor, aDaωαD
01(19+Igl) is the unit core, 01(19+Igl is the bias circuit switch, a → αea rumor is the bias power supply, (to) is the variable voltage source. In the figure, the same reference numerals indicate the same - or equivalent parts.

Claims (1)

[Claims] In a discharge type pulsed laser device equipped with a discharge circuit having a saturable reactor configured using a plurality of unit cores, the saturable reactor is provided with a bias power supply for setting the residual magnetic flux density of each of the unit cores; A discharge-type pulse laser device characterized in that a switch is provided for selecting a unit core to be reset from among each unit core.