JPH0313935A - Silver halide photographic sensitive material - Google Patents

Abstract

PURPOSE:To decrease the scratches and sticking of the photosensitive material by adding a specific surfactant to emulsion layers contg. prescribed silver halide particles or a protective layer and adding a specific slipping agent into the protective layer. CONSTITUTION:The photosensitive silver halide particles consisting of planar particles having >=5 average aspect ratio are incorporated at >=80% of the entire particle into the silver halide emulsion layers of this photosensitive material and the protective layer is provided on the uppermost layer. The fluorine- contg. surfactant (e.g., the compd. expressed by formula I) is added to the emulsion layers of the protective layer; in addition, the slipping agent (e.g., the compd. expressed by formula II) selected from a silicone system, ester system and ether system is added to the protective layer. In the formula II, R denotes an aliphat. group, aryl; R1 denotes H, aliphat. group; R2 denotes alkyl, alkoxyalkyl; A denotes the residual group of aliphat. hydrocarbon; x+y+z denotes 5 to 250.

Description

[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to improving the physical properties of silver halide photographic light-sensitive materials, and more specifically, the present invention relates to improving the physical properties of silver halide photographic light-sensitive materials. The present invention also relates to a silver halide photographic material with improved stickiness between films or with other films.

[Background of the invention]

Silver halide photographic light-sensitive material (hereinafter simply referred to as light-sensitive material).

) uses various devices, machines, cameras, etc. during manufacturing processes such as coating, drying, and processing, as well as during handling such as winding, rewinding, and transportation during filming, developing, printing, and projection. Undesirable effects are often caused by contact friction with adhering materials such as dust and fibers, or contact friction between the surface of the photosensitive material and the back surface.

For example, the occurrence of scratches on the surface or back surface of the photosensitive material, deterioration of the drivability of the photosensitive material in cameras and other equipment, the production of film scraps in cameras and other equipment, and even frictional charging. Therefore, it is necessary to increase the scratch resistance of the constituent layers of the photosensitive material or reduce the sliding friction of the photosensitive material to prevent damage to camera gates such as film magazines, camera gates, projector gates, etc. Various methods have been proposed to obtain improved photosensitive materials that allow free movement.

In this way, there are "sliding agents" that are used in conjunction with matting agents to reduce contact resistance, and representative compounds include organosiloxanes, waxes, etc., for example, as described in US Pat. No. 3,042,522, JP-A-60-140342,
It is widely known from Publication No. 64-38745.

However, although many of these slip agents reduce the occurrence of scratches, a new problem arises in that they increase the phenomenon of sticking between photosensitive materials or with other materials.

It has been found that this phenomenon depends on the type of surfactant used at the same time.

On the other hand, it is a well-known technique to use fine particles such as silica and titanium dioxide to prevent scratches on photosensitive materials, but when used in sufficient amounts as a matting agent, scratches can be easily blackened. A phenomenon was observed that resulted in the worst image quality after development.

This phenomenon was particularly noticeable when tabular silver halide grain emulsions were used.

The present inventor has achieved the present invention shown below based on these two problems and the results of their analysis.

[Purpose of the invention]

A first object of the present invention is to provide a silver halide photographic light-sensitive material that is free from scratches and blackening caused by scratches.

A second object of the present invention is to provide a silver halide photographic light-sensitive material that does not cause cracking between films or with other materials. Other objectives will become apparent from the description below.

[Structure of the invention]

As a result of intensive studies on the above-mentioned object, the present inventors have found that the above object can be achieved by the present invention as described below.

That is, in a silver halide photographic material having at least one silver halide emulsion layer on a support and a protective layer on the uppermost layer, the silver halide grains in the silver halide emulsion layer account for at least 80% or more. are tabular grains with an average aspect ratio of 5 or more, and the silver halide emulsion layer or the protective layer contains at least one fluorine-containing surfactant, and the protective layer contains a silicon-based, ester, etc. This is achieved by using a silver halide photographic light-sensitive material containing at least one of a lubricant selected from a lubricating agent selected from a lubricant type, and an ether type lubricant.

The present invention will be explained in more detail below.

The average grain size of the tabular silver halide grains according to the present invention is 0.
2 to 3.0 μm is preferable, particularly preferably 0.5 to 2
．． It is 0 μm.

The tabular silver halide emulsion of the present invention has a grain diameter/thickness (
The average value (referred to as aspect ratio) (referred to as average aspect ratio) is 5 or more, preferably 6 to 60, more preferably 7 to 50, particularly preferably 8 to 20.

The average thickness of the tabular silver halide emulsion of the present invention is 0.3μ
m or less, more preferably 0.10 μm or less,
Particularly preferably, it is 0.01 to 0.08 μm.

In the present invention, the diameter of a silver halide grain is defined as the diameter of a circle having an area equal to the projected area of the grain from observation of an electron micrograph of the silver halide grain.

In the present invention, the thickness of a silver halide grain is defined as the minimum distance between two parallel planes constituting a tabular silver halide grain.

The thickness of the tabular silver halide grains can be determined from an electron micrograph showing a shadow of the silver halide grains or from an electron micrograph of a cross section of a sample obtained by coating a support with a silver halide emulsion and drying it.

To determine the average aspect ratio, a minimum of 100 samples are measured.

In the tabular silver halide emulsion of the present invention, the ratio of silver halide grains having an aspect ratio of 5 or more to the total silver halide grains is 80% or more, particularly preferably 9
It is 0% or more.

The tabular silver halide emulsion of the present invention is preferably monodisperse, and contains 50% by weight or more of silver halide grains within a grain size range of ±20% around the average grain size d. It is particularly preferably used.

The tabular silver halide emulsion of the present invention includes silver chloride, silver bromide,
Although the halogen composition such as silver iodide, silver chlorobromide, silver iodobromide, etc. is arbitrary, silver iodobromide is preferable from the viewpoint of high sensitivity, and the normal content is preferably 20 mol% or less, and more preferably 10 mol% or less. Preferably, 0.1 to 3.5 mol% is particularly preferable.

Silver chloride may be contained within a range that does not impair the effects of the present invention.

Further, in the tabular silver halide emulsion of the present invention, the halogen composition may be uniform within the grains, or silver iodide may be localized, but preferably localized in the center. used.

A method for producing tabular silver halide emulsions is disclosed in JP-A-58-1.
No. 13926, No. 58-113927, No. 58-11
No. 3928, No. 58-113934, No. 59-105
No. 636, No. 60-147727, No. 62-1855
European Patent No. 219.849, European Patent No. 219.8
You can also refer to Publication No. 50 and the like.

Further, as a method for producing a monodisperse tabular silver halide emulsion, reference may be made to JP-A-61-6643.

A method for producing a tabular silver iodobromide emulsion with a high aspect ratio is to generate seed crystals by simultaneously adding a silver nitrate aqueous solution or a silver nitrate aqueous solution and a halide aqueous solution to a gelatin aqueous solution whose pBr is maintained at 2 or less. It can then be obtained by growing it by a double jet method.

The size of the tabular silver halide grains can be controlled by the temperature during grain formation and the rate of addition of the silver salt and halide aqueous solution.

The average silver iodide content of the tabular silver halide emulsion can be controlled by changing the composition of the aqueous halide solution added, that is, the ratio of bromide to iodide.

Further, when producing tabular silver halide grains, a silver halide solvent such as ammonia, thioether, thiourea, etc. can be used as necessary.

The emulsion was subjected to the Tardel water washing method to remove soluble salts, 7
Water washing methods such as zero curation sedimentation method or ultrafiltration method may be used. Preferred water washing methods include, for example, the method using an aromatic hydrocarbon aldehyde resin containing a sulfo group as described in Japanese Patent Publication No. 35-16086, or the method described in Japanese Patent Publication No. 16086
Example G3 of the agglomerated polymer agent described in No. 3-158644. G8
Particularly preferred desalting methods include methods using the following methods.

Next, as the surfactant used in the above-mentioned tabular silver halide emulsion layer and protective layer according to the present invention, a fluorine-containing surfactant is used. It cannot be obtained with conventionally known surfactants such as anionic surfactants such as acid salts, carboxylates, and sulfosuccinates, polyalkylene oxide type nonionic surfactants, amphoteric surfactants, and even saponin. The stickiness prevention effect is coupled with the fluorine-containing surfactant according to the present invention described below.

The fluorine-containing surfactant to be added and contained in at least one layer of the silver halide photographic light-sensitive material of the present invention includes those having a nonionic, anionic, cationic or betaine structure, preferably having a carbon number of 4 or more. It has a fluoroalkyl group.

Examples of ionic groups include anionic surfactants such as sulfonic acid or its salts, carboxylic acids or its salts, and phosphoric acid or its salts, or amine salts, ammonium salts, sulfonium salts, phosphonium salts, and aromatic amine salts. Examples include cationic or betaine type surfactants, and nonionic surfactants having polyalkylene oxide groups, polyglyceryl groups, and the like.

These fluorine-containing surfactants are disclosed in U.S. Patent No. 4.33.
5,201, British Patent No. 4,347,308, British Patent No. 1,417.915, British Patent No. 1,439,402, Japanese Patent Publication No. 52-26687, British Patent No. 57-26719, British Patent No. 5
No. 9-38573, JP-A No. 55-149938, No. 5
No. 4-48520, No. 54-14224, No. 58-2
No. 00235, No. 57-146248, No. 58-19
Examples include compounds described in the specification of No. 6544 and the like.

Preferred specific examples of these are shown below, but the present invention is not limited thereto.

F　　　　　CsF+ySO3K F　　　　CyF+sCOONa F-3 CaF, CH2CH20SO, Na-4 C,H.

C,F,7SO2N-CH,C00K -7 C,I7 CsF+ 7sOaN(CHzCH,O')2('CH
, JSO, NaH(CF, hCH200C-C)12H(CF:)icHzoOc CH5OsNa-11 (JsOOCCH5OsNa-18 CHl-20-21 CHl♂H3-22 CM.

-12 CHl CH.

−13 CH9 CHl −14 CH.

−15 C.I.

CH -17 CHl H's IC, F l , 5o2NCH, CH2N-C) I2CH
2SO, eCH.

CaF15CONCH2CH2N C2H5ae 2H5 4 CH.

Φ: CrJx□SO* N CH2CHzCH2NCH
2CHZOHr0 CH2CH20H CH.

-26 C7F　1scOo(CH2CH20)ToH-27 CIllF21COOiceH2CHxO)riH-29 CH.

C,F,,So□N+cTocH20),HC5Flr
SOzN +CH2CHzO)-r-1HCaF r
ysOzN (TTH-33 C,H in CHzCHz.

C, F, 7so, N(CH-CH,-0)r(CHz
CHz0)11HHs −34 CaF + ? CH2CH2O (CHzCHxOh7H
CsF+tSO2NCH2COO(CH2CH20hH
-37 C9FI 5o(CH2CH20hCHiThe above-mentioned fluorine-containing surfactant according to the present invention may be added to any of the constituent layers of the silver halide photographic light-sensitive material, for example, the surface protective layer, the intermediate layer, and the undercoat. It is added to non-light sensitive layers such as layers or backing layers or silver halide emulsion layers.

More preferred are the emulsion layer and its surface protective layer, and the backing layer and its surface protective layer. These may be used not only in one-sided layers but also in both-sided layers at the same time.

The fluorine-containing surfactants according to the present invention may be used in combination of two types or in combination with other synthetic surfactants.

The amount added varies depending on the type of compound, but is 10 to 2 per mff of the silver halide photographic material according to the present invention.
00 mg, preferably 15 to 100 mg.

Next, the slipping agent used in the present invention may be any silicone-based slipping agent, ester-based slipping agent, or ether-based slipping agent, but preferably the following general formula [I], general formula [
(2)] or an alkylborisylosane represented by the general formula (III).

General formula CI) 2 In the formula, R is an aliphatic group (for example, an alkyl group (preferably one having 1 to 18 carbon atoms), a substituted alkyl group (for example, an aralkyl group, an alkoxyalkyl group, an aryloxyalkyl group, etc.)), or Represents an aryl group (for example, a phenyl group). R1 represents a hydrogen atom or an aliphatic group (for example, an alkyl group (preferably one having 1 to 12 carbon atoms), a substituted alkyl group, etc.). R2 represents an alkyl group (such as a methyl group) or an alkoxyalkyl group (such as a methoxymethyl group). A represents a divalent residue of an aliphatic monohydrocarbon. n is O or an integer of 1 to 12, p is a number of O to 50, q is a number of 2 to 50 (preferably 2 to 30), X is 0
−100, y is a number from 1 to 50, 2 is a number from 0 to 100, x y + z is a number from 5 to 250 (preferably lO to 5
0).

Specific examples of R include methyl, ethyl, propyl, pentyl, cyclopentyl, cyclohexyl, dimethylpentyl, heptyl, methylhexyl, octyl, dodecyl, octadecyl, phenylethyl, methylphenylethyl, phenylpropyl, cyclohexylpropyl, benzyloxy. Includes propyl, phenoxypropyl, ethyloxypropyl, butyloxyethyl, phenyl, etc.

The group represented by A is methylene, 1-one-trimethylene,
Examples include 2-methyl-1-one-trimethylene. The alkyl group represented by R1 is methyl, ethyl,
Propyl. Examples include butyl, amyl, hexyl, heptyl, oxytyl, nonyl, decyl, and dodecyl groups.

General formula CI+, ] General formula (n) is a cyclic siloxane having a siloxane unit represented by the following general formula (If-1) and a general formula (
It includes a linear siloxane having a siloxane unit represented by It-1) and a terminal group represented by the following general formula [ri-2).

General formula (II-1) General formula (n-2) In the formula, R1 is an alkyl group having 5 to 2 carbon atoms, a cycloalkyl group, an alkoxyalkyl group, an arylalkyl group,
Represents an aryloxyalkyl group or a glycidyloxyalkyl group.

R2 represents an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, an alkoxyalkyl group, an arylalkyl group, an aryloxyalkyl group, and a glycidyloxyalkyl group.

Q represents 0 or a number of 1 or more, m represents a number of 1 or more, and Q10m represents a number of 1-1000. Preferably ff+m is 2 to 5
It is 00.

Specific examples of R1 in the compound represented by formula (I[) include pentyl, methylpentyl, cyclopentyl, cyclohexyl, dimethylpentyl, heptyl, methylhexyl, octyl, eicosyl, phenylethyl, methylphenylethyl, phenylpropyl, cyclo Hexylpropyl, penzyloxypropyl, phenoxypropyl, tolyloxypropyl, naphthylpropyl, ethyloxypropyl, butyloxyethyl, oxtadecyloxypropyl, glycidyloxypropyl, general formula C
I[[] In the formula, R3 represents an alkyl group having 1 to 3 carbon atoms, and R represents an alkyl group having 1 to 3 carbon atoms or an alkoxy group having 1 to 2 carbon atoms. m is an integer from 0 to 2000.

Next, as the ester slip agent, for example, a compound represented by the following general formula is used.

General formula (IV) RICOOR.

(In the formula, each R1 represents an alkyl group having 10 to 2 carbon atoms.) Examples of representative compounds of the above general formula are shown below.

IV l n-C+5HztCOOC+5H3
3(n)■2 n-C+sHi+C00C1J3
3(n)pi-3n -CIJtrCOOC2oH4+
(n)IV 4 n ClsH3+C00C
zoHa+(n) Next, as the ether type slip agent, for example, a compound represented by the following general formula is used.

General formula (V) R+ OCHzCHCHz O(R30)n R
zH (In the formula, R1 and R2 are alkyl groups having 8 to 24 carbon atoms.
3 represents an alkylene group having 0 to 6 carbon atoms) Representative compounds of the above general formula are shown below.

V-I C, □Has 0CHzCH
CHzOCaHrtH V 2 C+1His 0CHzCH
CHzOC+1His01( V 3 ClJ2s 0CH2CHC
H20C+1HisH V -4Cl2H,6-OCHICHCH! 0-(CH
2CH! 0) 2-C,H! H In carrying out the present invention, the amount of the slipping agent used is 5 to 50% for all silicone-based, ester-based, and ether-based slipping agents.
0 mg/m" preferably 10 to 200 mg/m" and 0.02 to 10 based on the weight of solids in the applied resuscitator.
(by weight) percent, preferably 0.1 to 6 (by weight) percent.

Specific compound examples of the slipping agent according to the present invention Compound examples of general formula () General formula CI [I] The above slipping agents are all known compounds, for example, US Pat. No. 3,042,522. , British Patent 95
5゜061, U.S. Patent No. 3,080,317, U.S. Patent No. 4,0
No. 04,927, No. 4,047.958, No. 3,48
No. 9.567, silicone slip agents described in British Patent No. 1,143.118, etc., and US Patent No. 2.588.7.
No. 65, No. 3,121,060, British Patent No. 1.19
Examples include ester-based and ether-based slipping agents described in Japanese Patent No. 8,387, etc., and are described in detail in these publications, including synthesis methods. The above-mentioned slipping agent according to the present invention is added to the uppermost layer of the light-sensitive material, that is, the protective layer that is the uppermost layer of the silver halide emulsion layer, or the back layer, the anti-nolation layer, or the protective layer that is the uppermost layer thereof. This achieves the desired effects of the present invention.

The addition method is water or a hydrophilic organic solvent such as methanol,
It may be added after being dissolved in ethanol or the like.

The amount added may be in the range of 4 to 600 mg, preferably 10 to 250+ ng, per m2 of the photosensitive material.

Note that the effects of the present invention can be further improved by containing colloidal silica in the photosensitive material according to the present invention. The layer containing colloidal silica may be the silver halide emulsion layer or any layer thereof, but it is preferably added to the protective layer.

A preferable amount of addition is, for example, 2 to 15%, particularly preferably 3.5 to 10%, based on the amount of gelatin used in the /10 silver germide emulsion layer.

Specific examples of colloidal silica include E,! .

du Pont de Nemours & Co, (
USA) to Ludox AM.

LudoxAS, LudoxLS, Lud
Mon5antoco, (USA) sells products such as Snowtex 20, Snowtex C1, Snowtex Nox N, and Snowtex O from Nissan Chemical Co., Ltd. (Tokyo, Japan) under product names such as oxTM and LudoxHS.
5yton C-30, 5ynson 200, etc., and Na1co Chem, Co. (USA
) is Na1c.

ag1030, Nalcoag 1060, Nalco
Examples include those commercially available under trade names such as ag ID 21-64.

The average particle size of colloidal silica is 7 to 120.
μm, its main component is silicon dioxide, and may contain alumina or sodium alginate as a minor component.

These colloidal silica stabilizers may also contain inorganic bases such as sodium hydroxide, potassium hydroxide, lithium hydroxide, ammonium hydroxide, and organic salts such as tetramethylammonium ion. In particular, as a stabilizer for colloidal silica, colloidal silica made of potassium hydroxide or ammonium hydroxide is preferred.

Nao, for more information on colloidal silica, please visit Egon
Edited by Matijevic, 5surface and Co.
Volume 6 of 11oid 5science, pp. 3-100 (
(1973, John Wiley & 5ons).

Various photographic additives can be used in the emulsion according to the present invention in the steps before and after physical ripening or chemical ripening. Examples of known additives include compounds described in Research Disclosure No. 17643 (December 1978) and Research Disclosure No. 18716 (November 1979).

The types of compounds shown in these two research disclosures and their descriptions are listed in the table below: Additives Chemical sensitizers Sensitizing dyes Development accelerators Anti-capri agents Stabilizers Color stain inhibitors Image stabilizers Ultraviolet absorbers Filter dyes Brightener Hardener Coating aid Surfactant Plasticizer Slip agent Static prevention agent Matting agent RD-17643RD-18716 Page Classification Page Classification 〃 25 ■ 25 ■ 25-26 ■ // 4 V 6 X 26-27II 26-27m 27. The photosensitive material according to the invention is based on the above-mentioned RD-17643-2.
It can be developed by the usual method described in Section XX on page 9 or in the left column on page 651 of RD-18716.

Supports that can be used in the photosensitive material of the present invention include, for example, the above-mentioned RD-17643, page 28 and R
Examples include those described in the left column of page 647 of D-18716. Suitable supports include plastic films and paper, and the surfaces of these supports may generally be provided with a subbing layer or subjected to corona discharge, ultraviolet irradiation, etc. in order to improve the adhesion of the coating layer. The emulsion according to the present invention can then be coated on one or both sides of the support thus treated.

The present invention is applicable to all silver halide photographic materials, but is particularly suitable for high-sensitivity black-and-white photographic materials.

When applying the present invention to medical X-ray radiography,
For example, a fluorescent intensifying screen whose main component is a phosphor that generates near-ultraviolet light or visible light when exposed to penetrating radiation is used. It is desirable to expose this material in close contact with both surfaces of a light-sensitive material prepared by coating both surfaces with the emulsion of the present invention.

The penetrating radiation herein refers to high-energy electromagnetic waves, and means X-rays and gamma rays.

Further, the fluorescent intensifying screen refers to, for example, an intensifying screen whose fluorescent component is mainly calcium tungstate, or a fluorescent intensifying screen whose main component is a rare earth compound activated with terbium.

〔Example〕

Prepare tabular A&X emulsion Em according to the following procedure.
I.

That is, 30 g of gelatin in 112 g of water, 10 g of potassium bromide.
．． 5g, thioether (HO(CHz)zS(CHz)
2s(CHz)zS(CHz)xOH) 0.5wt%
10 ml of aqueous solution was added and dissolved, and 30 ml of 0.88 mol silver nitrate solution (2 and 0.8
After simultaneously adding 30 mQ of a mixed solution of 8 mol of potassium iodide and potassium bromide (molar ratio 97:3) in 15 seconds, a solution of 600 ml of 1 mol silver nitrate solution (molar ratio 96:3) was added.
．． A tabular silver iodobromide emulsion was prepared by simultaneously adding 600 ml of a 1 mol mixed solution of potassium bromide and potassium iodide (5:3.5) over 70 minutes.

The obtained tabular silver halide grains had an average grain size of 1.15.
In μm, thickness 0.10. um, silver iodide content is 3.0
It was mol%. This emulsion was desalted by the usual precipitation method, chemically sensitized using gold and sulfur sensitization, and after adding phenol, 4-hydroxy-6.methyl-1°3.3a
, 7-chitrazaindene was added for stabilization.

Thereafter, the following emulsion additives were added to prepare an emulsion coating solution.

Emulsion additives (Additional amounts are shown in amounts per mole of silver halide) Lime geo-ossein gelatin 80 g t-butylcatechol 400 mg polyvinylpyrrolidone (molecular weight 10,000) 1.0 g trimethylolpropane 10 g styrene-maleic anhydride copolymer Combined 2.5 g diethylene glycol 5 g nitrophenyl-triphenyl 7 male 7 onium chloride)' 50 mg
Ammonium 1.3-dihydroxybenzene-4-sulfonate 4g2-
Mercaptobenzimidazole-1, todimethylol-1-bromo-1-nitromethane 70mg
1-phenyl-5-mercaptotetrazole 4 mg A protective layer coating solution was prepared with the following composition.

The amount added is expressed per 1f2 of coating liquid.

Lime-treated inert gelatin 58g acid-treated gelatin 2g surfactant
(Listed in the table) Slip agent
(Listed in the table) Polymethyl methacrylate colloidal silica with an average particle size of 5 μm (average particle size 0.013 μm) 1.3.
2% aqueous solution of 5-triazine sodium salt 35% formalin (hardening agent) 40% glyoxal aqueous solution 1.8 g 0 g 0 mQ mQ 1.5 m12 The following surfactants were used for comparison.

Comparison (b) - So, Na Using the obtained emulsion coating liquid and protective layer coating liquid, the amount of gelatin applied in the protective layer was 1.15 g/m so that the amount of hydrophilic colloid in the emulsion layer was 2.3 g/m''. 50 wt% glycidyl methacrylate, 10 wt% methyl acrylate, 1" butyl methacrylate, and 1" 4 m of glycidyl methacrylate at a speed of 65 m/min using two slide hopper type coaters so that
A 175 μm polyethylene terephthalate film base coated with an aqueous copolymer dispersion obtained by diluting a 0wt% copolymer consisting of three heptads to a concentration of 1Qvt% as an undercoat liquid. It was coated on both sides at the same time and dried in 2 minutes and 55 seconds to obtain a sample.

In addition, the amount of Ag attached per one side is 2.75 for each of the following.
g/m'.

Note that samples Nos. 1 to 6 were prepared in which the amount of the matting agent used in the protective layer solution was varied. As a comparison emulsion, a silver iodobromide core/shell emulsion with an average silver iodide content of 2.5 mol% and an average grain size of 1.2 μm was prepared by a conventional method.
, 0.82 μm and 0.70 μm, respectively.
Em was used at a ratio of 5:60:15.

For the obtained samples, "New Edition Lighting Data Book"
(Illumination Institute of Japan, 1st edition, 2nd side) Using the standard light B described on page 39 as the light source and exposure time of 0.08 seconds, 3.2CM
White exposure was performed using S without a filter.

This sample was processed for 90 seconds using an XD-90 developing solution using a KX-500 automatic processor manufactured by Konica Corp., and the sensitivity of each sample was determined. Sensitivity deteriorates by exposure, density is 1.0
It was calculated as the reciprocal of the amount of light required to increase the amount of light. Table 1 shows the relative values with the sensitivity of sample No. 5 set as 100.

In addition, the scratch resistance was evaluated as follows. That is, 10c
A sample cut into m×10 cm was heated to a temperature of 25°C and a relative humidity of 7.
After conditioning the humidity in an atmosphere of 0% RH for 3 hours, two identical samples were stacked on top of each other and a load of 1 kg was placed on them. Thereafter, the upper film is pulled along with the load at a speed of 30 mm/sec. Thereafter, development was performed in the automatic developing machine without exposure to light, and the resulting developer samples were visually evaluated for scratches and blackening of the scratches, and the results are shown in Table 1. (1~2
This is at a level that cannot be put to practical use. ) Furthermore, the woodpecker resistance was evaluated as follows. That is, a 15 cm x 15 cm sample was conditioned for 4 hours in an atmosphere with a temperature of 25° C. and a relative humidity of 80%, and then 3 sheets of the same sample were stacked and left to stand for 24 hours under a load of 1 kg.

Thereafter, evaluation was performed and the results are shown in Table-1. (Note that a stickiness rating of 1 to 2 is at a level that cannot be put to practical use.

Kutsutsuki evaluation criteria 5. Not attached at all.

(Less than 5% of the total sample area) 4. It's a little stuck.

(5 to 10% of the total area of the sample) 3 They stick together, but easily separate due to the weight of the film.

2 More than 60% of the total area is stuck, and if you try to peel it off, the surface of the film will come off.

l More than 80% of the total area is stuck and cannot be peeled off.

As is clear from Table 1 above, the samples of the present invention are silver halide photographic light-sensitive materials that have less scratches and blackening caused by scratches than the comparative samples, and have superior scratch resistance compared to other samples. It turns out that it is.

〔Effect of the invention〕

According to the present invention, a silver halide photographic material free from scratches and blackening caused by scratches was obtained.

Furthermore, the films had excellent resistance to scratching with each other or with other films.

Claims (1)

[Claims] In a silver halide photographic light-sensitive material having at least one silver halide emulsion layer on a support and a protective layer on the uppermost layer thereof, the light-sensitive silver halide grains in the silver halide emulsion layer account for at least 80% or more. are tabular grains with an average aspect ratio of 5 or more, and the silver halide emulsion layer or the protective layer contains at least one fluorine-containing surfactant, and the protective layer contains a silicon-based, ester, etc. system,
A silver halide photographic light-sensitive material, characterized in that it contains at least one lubricant selected from ether-based and ether-based lubricants.