JPH0313832A - Semiconductor pressure sensor - Google Patents

Semiconductor pressure sensor

Info

Publication number
JPH0313832A
JPH0313832A JP14887689A JP14887689A JPH0313832A JP H0313832 A JPH0313832 A JP H0313832A JP 14887689 A JP14887689 A JP 14887689A JP 14887689 A JP14887689 A JP 14887689A JP H0313832 A JPH0313832 A JP H0313832A
Authority
JP
Japan
Prior art keywords
pressure
semiconductor
sensitive element
semiconductor pressure
pressure sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14887689A
Other languages
Japanese (ja)
Inventor
Yasuhiro Koike
靖弘 小池
Norihiro Imai
今井 典浩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Industries Corp
Original Assignee
Toyoda Automatic Loom Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyoda Automatic Loom Works Ltd filed Critical Toyoda Automatic Loom Works Ltd
Priority to JP14887689A priority Critical patent/JPH0313832A/en
Publication of JPH0313832A publication Critical patent/JPH0313832A/en
Pending legal-status Critical Current

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  • Measuring Fluid Pressure (AREA)
  • Pressure Sensors (AREA)

Abstract

PURPOSE:To make it possible to use a sensor under high pressure by using one surface of a semiconductor element as a pressure receiving surface on which external pressure is applied, providing a pressure sensitive element on the rear surface of the element, bonding a supporting member having a through hole to the rear surface of the semiconductor element, and taking out the output of the pressure sensitive element by way of the through hole. CONSTITUTION:Two diaphragms 22 are formed on a lower surface 21a of a semiconductor pressure sensitive element 21. Strain gages 23 are formed on a region 21b which is held with the diaphragms 22. Said semiconductor pressure sensitive element 21 is bonded to a stage 25 having a through hole 25a. When external pressure is applied on an upper surface 21c of the semiconductor pressure sensitive element 21, the semiconductor pressure sensitive element 21 receives strain. The strain causes the change in resistance value of each strain gage 23. At this time, the pressure (a) which is applied on the pressure receiving surface 21c of the semiconductor pressure sensitive element 21 acts on the bonding surface of the stage 25 as the stress in the compressing direction. The stress in the direction for peeling the bonding surface does not act on. Therefore, this sensor can be used even under high pressure.

Description

【発明の詳細な説明】 〔概  要〕 本発明は、半導体素子の一方の面を外部からの圧力の加
わる受圧面とし、その裏面に感圧素子を設け、さらにそ
の半導体素子の裏面に、貫通孔を有する支持部材を接合
し、上記感圧素子の出力を貫通孔を介して取り出したも
のである。これにより、感圧素子が圧力検出を行う検出
媒体に直接さらされることが無いので、圧力センサの構
造を簡素にでき、しかも高圧力下でも使用可能となる。
[Detailed description of the invention] [Summary] The present invention has one surface of a semiconductor element as a pressure-receiving surface to which external pressure is applied, a pressure-sensitive element on the back surface, and a penetrating surface on the back surface of the semiconductor element. A support member having a hole is bonded to the support member, and the output of the pressure sensitive element is taken out through the through hole. As a result, the pressure sensitive element is not directly exposed to the detection medium that performs pressure detection, so the structure of the pressure sensor can be simplified and it can be used even under high pressure.

。 〔産業上の利用分野〕 本発明は、例えば油圧制御や自動車等の吸気圧、排気圧
などの検出に使用される半導体圧力センサに関する。
. [Industrial Application Field] The present invention relates to a semiconductor pressure sensor used for, for example, hydraulic control and detection of intake pressure and exhaust pressure of automobiles and the like.

〔従来の技術〕[Conventional technology]

第5図は、従来の半導体圧力センサの断面図である。同
図において、ステムl上には台座2が接合又は接着され
て固定されている。この台座2上にはシリコン基板上に
歪みゲージ3を形成してなる半導体感圧素子4が接合さ
れ、この半導体感圧素子4の裏面と台座2との間には真
空に保たれた基準圧力室5が設けられている。これら台
座2及び半導体感圧素子4とで圧力素子6を構成してい
る。また、上記半導体感圧素子4上には歪みゲージ3に
接続する電極7が形成され、この電極7はステム1を貫
通して設けられたリード端子8にボンディングワイヤ9
を介して接続されている。
FIG. 5 is a sectional view of a conventional semiconductor pressure sensor. In the figure, a pedestal 2 is fixed on a stem 1 by being bonded or glued. A semiconductor pressure-sensitive element 4 formed by forming a strain gauge 3 on a silicon substrate is bonded onto the pedestal 2, and a reference pressure maintained in a vacuum is maintained between the back surface of the semiconductor pressure-sensitive element 4 and the pedestal 2. A chamber 5 is provided. The pedestal 2 and the semiconductor pressure sensitive element 4 constitute a pressure element 6. Further, an electrode 7 connected to the strain gauge 3 is formed on the semiconductor pressure sensitive element 4, and this electrode 7 is connected to a lead terminal 8 provided through the stem 1 with a bonding wire 9.
connected via.

また、上記ステム1には金属ダイアフラム10が溶接等
により接合され、その内部にはシリコンオイル11等の
不活性液が封入されている。
Further, a metal diaphragm 10 is joined to the stem 1 by welding or the like, and an inert liquid such as silicone oil 11 is sealed inside the metal diaphragm 10.

上記構成の半導体センサでは、金属ダイアフラムlOに
圧力が加わると、その圧力はシリコンオイル11を圧力
媒体として半導体感圧素子4に加わり、半導体感圧素子
4を歪ませる。そして、その歪みに応じて歪みゲージ3
の抵抗値が変化し、その抵抗値の変化がリード端子8を
介して外部回路で検出され、外部から加わった圧力が検
出される。
In the semiconductor sensor having the above configuration, when pressure is applied to the metal diaphragm IO, the pressure is applied to the semiconductor pressure sensitive element 4 using the silicone oil 11 as a pressure medium, and the semiconductor pressure sensitive element 4 is distorted. Then, depending on the strain, strain gauge 3
The resistance value changes, and the change in resistance value is detected by an external circuit via the lead terminal 8, and the pressure applied from the outside is detected.

第6図は従来の他の半導体圧力センサの断面図である。FIG. 6 is a sectional view of another conventional semiconductor pressure sensor.

同図において、第5図に示したものと同じ部材には同一
符号を付けて説明を省略する。
In this figure, the same members as those shown in FIG. 5 are given the same reference numerals, and their explanations will be omitted.

この半導体センサにおいては、半導体感圧素子4の台座
2との接合面側には凹部12が設けられている。さらに
、台座2及びステム1の中心軸に沿って貫通孔13が設
けられ、その貫通孔13は半導体感圧素子4の凹部12
に通じている。
In this semiconductor sensor, a recess 12 is provided on the surface of the semiconductor pressure-sensitive element 4 that is connected to the pedestal 2 . Further, a through hole 13 is provided along the central axis of the pedestal 2 and the stem 1, and the through hole 13 is connected to the recess 12 of the semiconductor pressure sensitive element 4.
It is familiar to

上記構成の半導体圧力センサでは、外部の圧力はステム
1及び台座2の貫通孔13を介して半導体感圧素子4の
凹部12に加わり、半導体感圧素子4を歪ませる。その
歪みにより歪みゲージ3の抵抗値が変化し、抵抗値変化
がリード端子8を介して外部回路で検出され圧力検出が
行われる。
In the semiconductor pressure sensor configured as described above, external pressure is applied to the recess 12 of the semiconductor pressure sensitive element 4 through the through hole 13 of the stem 1 and the pedestal 2, thereby distorting the semiconductor pressure sensitive element 4. The resistance value of the strain gauge 3 changes due to the strain, and the change in resistance value is detected by an external circuit via the lead terminal 8 to perform pressure detection.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した半導体圧力センサでは、半導体表面に形成され
る感圧素子(例えば歪みゲージ)や電極が、圧力検出を
行う圧力媒体(気体又は液体)により侵されないように
、感圧素子が圧力媒体に直接触れないような構造にして
いる。
In the above-mentioned semiconductor pressure sensor, the pressure-sensitive element is directly exposed to the pressure medium (gas or liquid) to prevent the pressure-sensitive element (for example, strain gauge) and electrodes formed on the semiconductor surface from being attacked by the pressure medium (gas or liquid) that performs pressure detection. The structure is such that it cannot be touched.

例えば、第5図に示した半導体圧力センサでは、金属ダ
イアフラム10でシリコンオイル11を封止することで
、半導体感圧素子4が圧力媒体に直接触れないようにし
ている。
For example, in the semiconductor pressure sensor shown in FIG. 5, silicone oil 11 is sealed with a metal diaphragm 10 to prevent the semiconductor pressure-sensitive element 4 from coming into direct contact with the pressure medium.

また、第6図に示した半導体圧力センサでは、感圧素子
及び電極等が形成された面の裏面を受圧面とすることに
より、感圧素子及び電極の形成された面が外部の圧力媒
体に直接触れないようにしている。
In addition, in the semiconductor pressure sensor shown in Fig. 6, by using the back side of the surface on which the pressure-sensitive element and electrodes are formed as the pressure-receiving surface, the surface on which the pressure-sensitive element and electrodes are formed is exposed to an external pressure medium. I try not to touch it directly.

しかしながら、第5図のような構造とした場合には、金
属ダイアフラム10をステム1に溶接し、さらにその金
属ダイアフラム10内にシリコンオイルを封入する必要
があり、半導体圧力センサの構造が複雑になるという欠
点があった。また、封入されたシリコンオイル等の温度
特性により検出圧力の零点が変動するという欠点があっ
た。
However, in the case of the structure shown in FIG. 5, it is necessary to weld the metal diaphragm 10 to the stem 1 and further seal silicone oil in the metal diaphragm 10, which complicates the structure of the semiconductor pressure sensor. There was a drawback. Another drawback is that the zero point of the detected pressure fluctuates depending on the temperature characteristics of the sealed silicone oil or the like.

また、第6図のような構造とした場合には、半導体感圧
素子4の凹部12に加わる圧力が、半導体感圧素子4と
台座2との接合面に引っ張り応力として作用する為に、
接合面の破損等が生じ易く高圧力の検出には使用できな
いという欠点があった。
Furthermore, in the case of the structure shown in FIG. 6, the pressure applied to the recess 12 of the semiconductor pressure-sensitive element 4 acts as a tensile stress on the joint surface between the semiconductor pressure-sensitive element 4 and the pedestal 2.
This method has the drawback that it cannot be used to detect high pressures because it tends to cause damage to the bonding surfaces.

さらに、上記いずれの構造の半導体圧力センサにおいて
も、例えば圧力基準室5及び外部の圧力を加えるための
凹部12をエツチング等により形成した後、その裏面に
歪みゲージ3等の感圧部を形成する場合には、エツチン
グ部の位置に対し歪みゲージ3の位置がずれないように
位置合わせを行う必要があり、素子作成の工程が煩雑と
なるという問題点もあった。
Furthermore, in any of the above semiconductor pressure sensors, after the pressure reference chamber 5 and the recess 12 for applying external pressure are formed by etching or the like, a pressure sensitive part such as the strain gauge 3 is formed on the back surface thereof. In this case, it is necessary to align the strain gauge 3 so as not to deviate from the position of the etched portion, which causes the problem that the process of manufacturing the device becomes complicated.

本発明の課題は、簡単な構造で、かつエツチング部との
位置合わせを不要とし、広い圧力範囲で使用可能な半導
体圧力センサを提供することである。
An object of the present invention is to provide a semiconductor pressure sensor that has a simple structure, does not require alignment with an etched portion, and can be used over a wide pressure range.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は、外部から加わる圧力を半導体素子上に設けら
れた感圧素子で検出する半導体圧力センサにおいて、半
導体素子の一方の面を外部から加わる圧力の受圧面とし
、その裏面に感圧素子を設け、上記半導体素子の裏面に
、貫通孔を有する支持部材を接合し、上記感圧素子の出
力を支持部材の貫通孔を介して取り出したものである。
The present invention provides a semiconductor pressure sensor that detects pressure applied from the outside with a pressure-sensitive element provided on a semiconductor element, in which one surface of the semiconductor element is used as a pressure-receiving surface for the pressure applied from the outside, and the pressure-sensitive element is placed on the back surface of the semiconductor element. A support member having a through hole is bonded to the back surface of the semiconductor element, and the output of the pressure sensitive element is taken out through the through hole of the support member.

〔作   用〕[For production]

上記構成の半導体圧力センサにおいて、感圧素子を受圧
面の裏面に設けたので、感圧素子が圧力雰囲気に直接さ
らされることが無い、しかも、支持部材の貫通孔を介し
て感圧素子の出力を取り出すことにより、外部から加わ
る圧力が半導体素子と支持部材との接合面に圧縮応力と
して作用する面を受圧面とすることができ、高圧力まで
使用できる圧力センサを実現できる。
In the semiconductor pressure sensor having the above configuration, since the pressure sensing element is provided on the back side of the pressure receiving surface, the pressure sensing element is not directly exposed to the pressure atmosphere, and the output of the pressure sensing element is transmitted through the through hole of the support member. By taking out the pressure, the surface on which pressure applied from the outside acts as compressive stress on the bonding surface between the semiconductor element and the support member can be used as the pressure receiving surface, and a pressure sensor that can be used up to high pressure can be realized.

〔実  施  例〕〔Example〕

以下、本発明の実施例を図面を参照して説明する。 Embodiments of the present invention will be described below with reference to the drawings.

第1図は、本発明の一実施例の半導体圧力センサの断面
図である。
FIG. 1 is a sectional view of a semiconductor pressure sensor according to an embodiment of the present invention.

同図おいて、例えばシリコン基板からなる半導体感圧素
子21の下面21aには、2つのダイアフラム(凹部)
22がエツチング等により形成されている。それら2つ
のダイアフラム22に挟まれた領域21b上には、拡散
等により歪みゲージが形成されている。
In the figure, there are two diaphragms (recesses) on the lower surface 21a of the semiconductor pressure-sensitive element 21 made of, for example, a silicon substrate.
22 is formed by etching or the like. A strain gauge is formed on the region 21b sandwiched between the two diaphragms 22 by diffusion or the like.

第2図は、上記半導体圧力センサの主要部の透視斜視図
である。
FIG. 2 is a transparent perspective view of the main parts of the semiconductor pressure sensor.

2つのダイアフラム22に挟まれた領域21b上には、
4個の歪みゲージ23が形成されている。
On the region 21b sandwiched between the two diaphragms 22,
Four strain gauges 23 are formed.

各歪みゲージ間は導電性のパターンにより接続され、全
体としてフルブリッジ回路を構成している。
Each strain gauge is connected by a conductive pattern, forming a full bridge circuit as a whole.

さらに、半導体感圧素子下面21aには、4個の電極バ
ッド24が形成され、それら電極バッド24は上記フル
ブリッジ回路の各接続点に接続されている。この電極バ
ッド24は、領域24b上に形成しても良い。
Furthermore, four electrode pads 24 are formed on the lower surface 21a of the semiconductor pressure sensitive element, and these electrode pads 24 are connected to each connection point of the full bridge circuit. This electrode pad 24 may be formed on the region 24b.

本実施例においては、半導体感圧素子21の上面21c
を受圧面としたとき、受圧面に加わる圧力による半導体
感圧素子21の歪みが良く検出できるように、2つのダ
イアフラム22を設けて、半導体感圧素子21の断面形
状をE字状にしているが、ダイアフラム22の形状、個
数及び歪みゲージ23の配置は他の構成とすることもで
きる。
In this embodiment, the upper surface 21c of the semiconductor pressure sensitive element 21
Two diaphragms 22 are provided, and the cross-sectional shape of the semiconductor pressure-sensitive element 21 is made into an E-shape so that distortion of the semiconductor pressure-sensitive element 21 due to the pressure applied to the pressure-receiving surface can be well detected when the pressure-receiving surface is However, the shape and number of the diaphragms 22 and the arrangement of the strain gauges 23 may be other configurations.

例えば、半導体感圧素子21の裏面に1つの凹部(ダイ
アフラム)を設け、その凹部の底面に歪みゲージ23を
配置することもできる。
For example, it is also possible to provide one recess (diaphragm) on the back surface of the semiconductor pressure-sensitive element 21 and arrange the strain gauge 23 on the bottom surface of the recess.

第1図に戻り、半導体感圧素子21は、上記歪みゲージ
23及び電極バッド24が露出する程度の大きさの貫通
孔25aを有する台座25に接合され、その台座25は
、台座25の貫通孔25aと同じ大きさもしくは、それ
以上の大きさの貫通孔26aを有するステム26に固定
されている。
Returning to FIG. 1, the semiconductor pressure sensitive element 21 is joined to a pedestal 25 having a through hole 25a large enough to expose the strain gauge 23 and the electrode pad 24; It is fixed to a stem 26 having a through hole 26a that is the same size as or larger than 25a.

また、歪みゲージ23に接続された電極バッド24は、
ステム26の下面に設けられた電極27に、ボンディン
グワイヤ28を介して接続されている。
Further, the electrode pad 24 connected to the strain gauge 23 is
It is connected to an electrode 27 provided on the lower surface of the stem 26 via a bonding wire 28.

以上のような構成の圧力センサにおいて、半導体感圧素
子21の上面に、外部から圧力が加わると、半導体感圧
素子21が歪み、その歪みが2つのダイアフラム22に
挟まれた領域21b上に形成された歪みゲージ23の抵
抗値の変化となって現れる。このとき半導体感圧素子2
1の受圧面に加わる圧力は、台座25との接合面に対し
て圧縮方向の応力として作用し、接合面を剥離する方向
の応力は働かないので高圧力下でも零圧カセンサを使用
することができる。
In the pressure sensor configured as described above, when pressure is applied from the outside to the top surface of the semiconductor pressure-sensitive element 21, the semiconductor pressure-sensitive element 21 is distorted, and the distortion is formed on the region 21b sandwiched between the two diaphragms 22. This appears as a change in the resistance value of the strain gauge 23. At this time, the semiconductor pressure sensitive element 2
The pressure applied to the pressure-receiving surface of 1 acts as a stress in the compressive direction on the joint surface with the pedestal 25, and the stress in the direction of peeling off the joint surface does not work, so the zero-pressure sensor can be used even under high pressure. can.

上記歪みゲージ23の抵抗値の変化は、電極27を介し
て外部回路(図示せず)で検出され、圧力センサに加わ
った圧力が検出される。
Changes in the resistance value of the strain gauge 23 are detected by an external circuit (not shown) via the electrodes 27, and the pressure applied to the pressure sensor is detected.

上述したように半導体感圧素子21の受圧面の裏面に歪
みゲージ23などの感圧素子を形成したので、感圧素子
が圧力検出を行う気体又は液体に直接触れる事が無く、
腐食性の気体又は液体であっても感圧素子が腐食するこ
とがない。従って、従来のように金属ダイアフラム等を
用いて圧力センサを封止構造とする必要がないので、封
入したシリコンオイル等の熱膨張による圧力誤差が生じ
ることが無く、しかも圧力センサの構造を簡素にできる
ので、圧力センサの製造コストを低減できる。
As described above, since the pressure sensing element such as the strain gauge 23 is formed on the back side of the pressure receiving surface of the semiconductor pressure sensing element 21, the pressure sensing element does not come into direct contact with the gas or liquid for which pressure is to be detected.
The pressure sensitive element will not be corroded even by corrosive gas or liquid. Therefore, there is no need to seal the pressure sensor using a metal diaphragm or the like as in the past, so pressure errors due to thermal expansion of sealed silicone oil, etc. do not occur, and the structure of the pressure sensor can be simplified. Therefore, the manufacturing cost of the pressure sensor can be reduced.

さらに、歪みゲージ23及び電極バッド24とエツチン
グにより形成するダイアフラム22とを同一面に設けた
ので、従来のように半導体感圧素子の一方の面に基準圧
力室などの凹部を設け、他方の面に歪みゲージなどを形
成する場合に必要となる両者の位置合わせが不要となり
、素子の製造工程を簡単にすることができる。
Furthermore, since the strain gauge 23 and the electrode pad 24 are provided on the same surface as the diaphragm 22 formed by etching, a concave portion such as a reference pressure chamber is provided on one surface of the semiconductor pressure-sensitive element, and the other surface is This eliminates the need for alignment between the two, which is required when forming a strain gauge or the like, and the manufacturing process of the element can be simplified.

次に第3図は、本発明の第2の実施例の圧力センサの断
面図である。
Next, FIG. 3 is a sectional view of a pressure sensor according to a second embodiment of the present invention.

本実施例では、ステム29をシリコン基板などからなる
半導体感圧素子21とほぼ同じ線膨張係数を有するガラ
ス、セラミックなどで構成し、そのステム29上に半導
体感圧素子21を接合、接着などにより固定したもので
ある。本実施例によれば、圧力センサの構造をさらに簡
素にでき、ステム29の貫通孔を介してのボンディング
ワイヤ28の引き出しがより容易になる。
In this embodiment, the stem 29 is made of glass, ceramic, or the like having approximately the same coefficient of linear expansion as the semiconductor pressure-sensitive element 21 made of a silicon substrate, etc., and the semiconductor pressure-sensitive element 21 is bonded onto the stem 29 by bonding, gluing, or the like. It is fixed. According to this embodiment, the structure of the pressure sensor can be further simplified, and the bonding wire 28 can be drawn out more easily through the through hole of the stem 29.

さらに、第4図は、本発明の第3の実施例の圧力センサ
の断面図である。
Furthermore, FIG. 4 is a sectional view of a pressure sensor according to a third embodiment of the present invention.

本実施例では、ステム30上に半導体感圧素子21を接
合し、その半導体感圧素子21上に台座31を接合した
ものである0本実施例によれば、ステム30の貫通孔を
介してのボンディングワイヤ28の引き出しを容易にで
きると共に、台座31で半導体感圧素子21を補強して
、ステム30と半導体感圧素子21との間に生じる熱応
力等による半導体感圧素子21の歪みを低減することが
できる。
In this embodiment, the semiconductor pressure-sensitive element 21 is bonded to the stem 30, and the pedestal 31 is bonded to the semiconductor pressure-sensitive element 21. The bonding wire 28 can be easily drawn out, and the semiconductor pressure-sensitive element 21 is reinforced with the pedestal 31 to prevent distortion of the semiconductor pressure-sensitive element 21 due to thermal stress generated between the stem 30 and the semiconductor pressure-sensitive element 21. can be reduced.

尚、半導体感圧素子は上述したシリコン基板上に歪みゲ
ージを設けたものに限らず、圧力を検出できるものであ
ればなんでも良い。
Note that the semiconductor pressure-sensitive element is not limited to the above-described one in which a strain gauge is provided on a silicon substrate, but any element that can detect pressure may be used.

また、受圧面の裏面に形成する凹部(ダイアフラム22
)は、上述した形状に限らず、使用する半導体感圧素子
の材質、形状等により、圧力検出に適した形状にすれば
良い。
In addition, a recess formed on the back side of the pressure receiving surface (diaphragm 22
) is not limited to the above-described shape, but may be any shape suitable for pressure detection depending on the material, shape, etc. of the semiconductor pressure-sensitive element used.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、受圧面の裏面に歪みゲージなどの感圧
素子を形成できるので、検出する圧力媒体と感圧素子と
が直接触れることが無く、圧力センサの構造を簡素にで
き、圧力センサの小型化、低コスト化が図れる。しかも
、受圧面の圧力が半導体感圧素子と台座等との接合面に
対し圧縮応力として作用するので、高圧力下でも使用で
きる。
According to the present invention, since a pressure sensing element such as a strain gauge can be formed on the back side of the pressure receiving surface, the pressure medium to be detected and the pressure sensing element do not come into direct contact with each other, and the structure of the pressure sensor can be simplified. can be made smaller and lower in cost. Moreover, since the pressure on the pressure-receiving surface acts as compressive stress on the joint surface between the semiconductor pressure-sensitive element and the pedestal, it can be used even under high pressure.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明の第1の実施例の断面図、第2図は、
第1の実施例の主要部の透視斜視図、第3図は、本発明
の第2の実施例の断面図、第4図は、本発明の第3の実
施例の断面図、第5図及び第6図は従来の半導体圧力セ
ンサの断面図である。 21・・・半導体感圧素子、 22・・・ダイアフラム、 25・・・台座、 25a・・・貫通孔、 26・・・ステム、 27・・・電極、 28・・・ボンディングワイヤ。 第1図
FIG. 1 is a sectional view of the first embodiment of the present invention, and FIG. 2 is a sectional view of the first embodiment of the present invention.
3 is a sectional view of the second embodiment of the present invention, FIG. 4 is a sectional view of the third embodiment of the present invention, and FIG. 5 is a perspective view of the main parts of the first embodiment. and FIG. 6 are cross-sectional views of a conventional semiconductor pressure sensor. 21... Semiconductor pressure sensitive element, 22... Diaphragm, 25... Pedestal, 25a... Through hole, 26... Stem, 27... Electrode, 28... Bonding wire. Figure 1

Claims (1)

【特許請求の範囲】 1)外部から加わる圧力を半導体素子上に設けた感圧素
子で検出する半導体圧力センサにおいて、半導体素子の
一方の面を外部から加わる圧力の受圧面とし、その裏面
に感圧素子を設け、 該半導体素子の裏面に、貫通孔を有する支持部材を接合
し、 前記半導体素子の裏面に設けた感圧素子の出力を、前記
支持部材の貫通孔を介して取り出したことを特徴とする
半導体圧力センサ。 2)半導体素子の受圧面の裏面に少なくとも2つの凹部
を設け、該2つの凹部に挟まれる領域上に感圧素子を設
け、 該感圧素子の出力と前記支持部材上に設けた出力端子と
を、前記支持部材の貫通孔を介しボンディングワイヤに
より接続したことを特徴する請求項1記載の半導体圧力
センサ。
[Claims] 1) In a semiconductor pressure sensor that detects pressure applied from the outside with a pressure sensing element provided on a semiconductor element, one surface of the semiconductor element is used as a pressure receiving surface for the pressure applied from the outside, and the back surface is used as a pressure sensing surface. A pressure element is provided, a support member having a through hole is bonded to the back surface of the semiconductor element, and an output of the pressure sensitive element provided on the back surface of the semiconductor element is taken out through the through hole of the support member. Features of semiconductor pressure sensor. 2) At least two recesses are provided on the back side of the pressure-receiving surface of the semiconductor element, a pressure-sensitive element is provided on the area sandwiched between the two recesses, and the output of the pressure-sensitive element and the output terminal provided on the support member are connected. 2. The semiconductor pressure sensor according to claim 1, wherein the semiconductor pressure sensor is connected by a bonding wire through a through hole of the support member.
JP14887689A 1989-06-12 1989-06-12 Semiconductor pressure sensor Pending JPH0313832A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14887689A JPH0313832A (en) 1989-06-12 1989-06-12 Semiconductor pressure sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14887689A JPH0313832A (en) 1989-06-12 1989-06-12 Semiconductor pressure sensor

Publications (1)

Publication Number Publication Date
JPH0313832A true JPH0313832A (en) 1991-01-22

Family

ID=15462700

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14887689A Pending JPH0313832A (en) 1989-06-12 1989-06-12 Semiconductor pressure sensor

Country Status (1)

Country Link
JP (1) JPH0313832A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012013616A (en) * 2010-07-02 2012-01-19 Denso Corp Semiconductor mechanical quantity sensor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012013616A (en) * 2010-07-02 2012-01-19 Denso Corp Semiconductor mechanical quantity sensor
US8552514B2 (en) 2010-07-02 2013-10-08 Denso Corporation Semiconductor physical quantity sensor

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