JPH03120785A - Manufacture of printed-wiring board - Google Patents
Manufacture of printed-wiring boardInfo
- Publication number
- JPH03120785A JPH03120785A JP25836189A JP25836189A JPH03120785A JP H03120785 A JPH03120785 A JP H03120785A JP 25836189 A JP25836189 A JP 25836189A JP 25836189 A JP25836189 A JP 25836189A JP H03120785 A JPH03120785 A JP H03120785A
- Authority
- JP
- Japan
- Prior art keywords
- electrodeposition
- carbon dioxide
- air
- eliminated
- wiring board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 238000004070 electrodeposition Methods 0.000 claims abstract description 38
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000001569 carbon dioxide Substances 0.000 claims abstract description 14
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000011889 copper foil Substances 0.000 claims abstract description 3
- 238000000576 coating method Methods 0.000 claims description 17
- 239000011248 coating agent Substances 0.000 claims description 15
- 239000011347 resin Substances 0.000 claims description 2
- 229920005989 resin Polymers 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 17
- 238000003756 stirring Methods 0.000 abstract description 8
- 239000007864 aqueous solution Substances 0.000 abstract description 6
- 239000007788 liquid Substances 0.000 abstract description 6
- 229910052802 copper Inorganic materials 0.000 abstract description 4
- 239000010949 copper Substances 0.000 abstract description 4
- 239000006185 dispersion Substances 0.000 abstract description 4
- 238000007747 plating Methods 0.000 abstract description 3
- 238000010521 absorption reaction Methods 0.000 abstract description 2
- 230000002411 adverse Effects 0.000 abstract description 2
- 239000000428 dust Substances 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract description 2
- 238000010422 painting Methods 0.000 abstract 3
- 239000003513 alkali Substances 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 13
- 239000000758 substrate Substances 0.000 description 7
- 239000011342 resin composition Substances 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 239000013049 sediment Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 238000007766 curtain coating Methods 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 240000000220 Panda oleosa Species 0.000 description 1
- 235000016496 Panda oleosa Nutrition 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- HCLJOFJIQIJXHS-UHFFFAOYSA-N tetraethylene glycol diacrylate Substances C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、プリント配線板の製造盪者埒−箒誓(従来の
技術)
従来、プリント配線板を製造するに際しては。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a manufacturer of printed wiring boards (prior art) Conventionally, when manufacturing printed wiring boards.
まず基板上に光硬化性樹脂組成物の層を形成し。First, a layer of a photocurable resin composition is formed on a substrate.
ついで活性光線を画儂状に照射し、未硬化部分を現像除
去し、レジストパターンを形成している。Then, actinic light is irradiated in an imagewise manner, and the uncured portions are developed and removed to form a resist pattern.
この工程において、光硬化性樹脂組成物の層の形成には
1種々の方法が採用されている。例えばデイツプコート
、ロールコート、カーテンコート等の光硬化性樹脂組成
物溶液(塗液)を用いる方法。In this step, various methods are employed to form the layer of the photocurable resin composition. For example, methods using a photocurable resin composition solution (coating liquid) such as dip coating, roll coating, and curtain coating.
あるいは光硬化性樹脂組成物のフィルム(感光性フィル
ム)を積層する方法が知られている。これらの方法のう
ち、感光性フィルムを積層する方法は、簡便に均一な厚
みの光硬化性樹脂組成物の層が形成できることから、現
在主流の方法として採用されている。Alternatively, a method is known in which films of photocurable resin compositions (photosensitive films) are laminated. Among these methods, the method of laminating photosensitive films is currently adopted as the mainstream method because it can easily form a layer of a photocurable resin composition with a uniform thickness.
最近、プリント配線板の高密度、高精度化が進むに伴い
、レジストパターンはよシ高品質のものが必要となって
きている。即ち、ピンホールがなく、下地の基板表面に
よく密着したレジストパターンであることが望まれてい
る。かかる要求に対して、現在主流となっている感光性
フィルムを積層する方法では限界のあることが知られて
いる。Recently, as printed wiring boards have become more dense and precise, resist patterns of higher quality have become necessary. That is, it is desired that the resist pattern be free of pinholes and that is in close contact with the surface of the underlying substrate. It is known that the currently mainstream method of laminating photosensitive films has limitations in meeting such demands.
この方法では、基板製造時の打痕、研磨の不均一性、基
板内層のガラス布の網目9表面への銅めつきのビット等
の不均一等によって生起する基板表面の凹凸への追従性
が乏しく、十分な密着性を得ることが困難である。この
困難はフィルムの積層を減圧下で行なうこと(特公昭5
9−3740号公報参照)Kよって回避できるが、これ
には特殊で高価な装置が必要となる。This method has poor ability to follow irregularities on the substrate surface caused by dents during substrate manufacturing, nonuniform polishing, and nonuniformity of copper plating bits on the surface of the mesh 9 of the glass cloth in the inner layer of the substrate. , it is difficult to obtain sufficient adhesion. This difficulty can be solved by laminating the films under reduced pressure (Tokuko Kokō 5).
(see Japanese Patent No. 9-3740), this can be avoided, but this requires special and expensive equipment.
このようなことが理由となって、近年再びデイツプコー
ト、ロールコート、カーテンコート等の溶液塗工の方法
が艶面されるようKなってきた。For these reasons, in recent years, solution coating methods such as dip coating, roll coating, and curtain coating have become more glossy.
しかしこれらの塗工法では膜厚の制御が困難、膜厚の均
一性が不十分、ピンホールの発生等の問題がある。However, these coating methods have problems such as difficulty in controlling the film thickness, insufficient uniformity of the film thickness, and occurrence of pinholes.
そこで最近新たな方法として電着塗装によシ感光膜を形
成する方法が提案されている(特開昭62−23549
6号公報参照)。この方法によると、■レジストの密着
性が向上する。■基板表面の凹凸への追従性が良好、■
短時間で膜厚の均一な感光膜を形成できる。■塗液が水
溶液のため。Recently, a new method of forming a photoresist film by electrodeposition coating has been proposed (Japanese Patent Laid-Open No. 62-23549).
(See Publication No. 6). According to this method, (1) the adhesion of the resist is improved; ■Good followability to irregularities on the substrate surface, ■
A photoresist film with uniform thickness can be formed in a short time. ■Because the coating liquid is an aqueous solution.
作業環境の汚染が防止でき、防災上にも問題がない等の
利点がある。It has advantages such as preventing contamination of the working environment and causing no problems in terms of disaster prevention.
(発明が解決しようとする課題)
ところで、感光膜の電着塗装を行なう場合、を清液は通
常、固形分が20チ以下にうすめられた分散系なので、
沈降を防ぐために攪拌が重要になってくる。攪拌は電着
中塗膜を損じる原因となる電解ガスの局部集中を少なく
する効果があり、空気の噴出によるエア攪拌法などは装
置の構造も簡単で攪拌効率もそれほど悪くはない。(Problem to be Solved by the Invention) By the way, when electrocoating a photoresist film, the clear liquid is usually a dispersion system with a solid content of 20% or less.
Stirring is important to prevent sedimentation. Stirring has the effect of reducing local concentration of electrolytic gas, which causes damage to the electrodeposited coating film, and the air agitation method using air jets has a simple structure and the stirring efficiency is not so bad.
しかし、電着液を長時間エア攪拌すると、空気中の二酸
化炭素により電着液中のアミンが消費され、pHが低下
し、電着塗装樹脂組成物の分散や塗膜外観が低下する等
の問題があった。However, when the electrodeposition solution is air-stirred for a long time, the amine in the electrodeposition solution is consumed by carbon dioxide in the air, the pH decreases, and the dispersion of the electrodeposition coating resin composition and the appearance of the coating film deteriorate. There was a problem.
(課題を解決するための手段)
以上のような電着液のエア攪拌法における欠点を克服す
べき種々検討した結果9本発明者らは。(Means for Solving the Problems) As a result of various studies to overcome the drawbacks of the above-described air agitation method for electrodeposition liquid, the inventors of the present invention have made the following.
電着塗装時に、二酸化炭素を除去した空気で電着液を攪
拌することによシ、良好な電着液の分散安定性及び塗膜
外観を連続して維持し得ることの事実を見い出した。It has been discovered that by stirring the electrodeposition solution with air from which carbon dioxide has been removed during electrodeposition coating, it is possible to continuously maintain good dispersion stability and coating film appearance of the electrodeposition solution.
すなわち本発明は、感光膜を電着塗装で形成してプリン
ト配線板を製造する方法において、感光性樹脂を含む電
着浴を二酸化炭素を除去した空気で攪拌しなから銅箔も
しくは銅めっきを施した基板に感光膜を電着塗装するこ
とを特徴としたプリント配線の製造方法に関する。That is, the present invention provides a method for manufacturing a printed wiring board by forming a photosensitive film by electrodeposition, in which an electrodeposition bath containing a photosensitive resin is stirred with air from which carbon dioxide has been removed, and then copper foil or copper plating is applied. The present invention relates to a method for manufacturing printed wiring, characterized by electrodepositing a photoresist film on a printed circuit board.
空気中の二酸化炭素の除去法としては1例えばアルカリ
水溶液への吸収法によシ行なうことができる。また二酸
化炭素を吸収させる際には、塵等の電着塗装に悪影響を
及ばず物質の除去が同時に行なえる効果も有する。Carbon dioxide in the air can be removed by, for example, absorption into an aqueous alkaline solution. Further, when absorbing carbon dioxide, it has the effect of simultaneously removing substances such as dust without adversely affecting the electrodeposition coating.
本発明において、この二酸化炭素を除去した空気は循還
再使用が可能である。以下実施例及び比較例によって具
体例を示す。In the present invention, the air from which carbon dioxide has been removed can be recycled and reused. Specific examples will be shown below using Examples and Comparative Examples.
(実施例)
実施例1
まず、メタクリル酸/メタクリル酸メチル/アクリル酸
エチル/アクリル酸オクチル(20150/20/10
重量比)共重合体(分子量70,000)の50重量%
ジオキサン溶液130重量部、トリメチロールプロパン
トリアクリレート20重量部。(Example) Example 1 First, methacrylic acid/methyl methacrylate/ethyl acrylate/octyl acrylate (20150/20/10
Weight ratio) 50% by weight of copolymer (molecular weight 70,000)
130 parts by weight of dioxane solution, 20 parts by weight of trimethylolpropane triacrylate.
5−
テトラエチレングリコールジアクリレー)10重量部の
混合溶液をトリエチルアミンを0.6当量用いて中和し
たものに、光重合開始剤としてベンゾフェノン3重量部
、ミヒラーケトン1重量部、安定剤としてハイドロキノ
ン0.5重量部及び着色剤としてビクトリアピュアブル
ー0.2重量部を10重量部のメチルエチルケトンに溶
解した溶液を添加したのち、固形分含有率が10重量%
になるよう水を加えて電着塗装浴(pH9)とした。A mixed solution of 10 parts by weight of 5-tetraethylene glycol diacrylate was neutralized using 0.6 equivalents of triethylamine, 3 parts by weight of benzophenone as a photopolymerization initiator, 1 part by weight of Michler's ketone, and 0 parts by weight of hydroquinone as a stabilizer. After adding .5 parts by weight and a solution of 0.2 parts by weight of Victoria Pure Blue as a coloring agent dissolved in 10 parts by weight of methyl ethyl ketone, the solid content was 10% by weight.
Water was added to make an electrodeposition coating bath (pH 9).
電着槽は、5Qwt%水酸化す) IJウム水溶液中を
通過させ二酸化炭素を除去した空気を、電着液槽底部に
取り付けたエアパイプから約101/minの速度で電
着液中に吹き込んで電着液を攪拌する構造のものとした
。同じ条件の電着槽で。The electrodeposition tank was made using 5Qwt% hydroxide) Air, which had been passed through an IJium aqueous solution to remove carbon dioxide, was blown into the electrodeposition solution at a rate of about 101/min from an air pipe attached to the bottom of the electrodeposition solution tank. The structure was designed to stir the electrodeposition solution. in an electrodeposition bath under the same conditions.
それぞれエア攪拌を始めてから0,1.24時間後の電
着浴を用いて塗装を行なった。Coating was carried out using the electrodeposition bath 0 and 1.24 hours after air stirring was started, respectively.
電着の条件は、陽極に表面を研磨した銅張積層板(日立
化成工業■製MCL−E−61)を用い。The conditions for electrodeposition were as follows: A copper-clad laminate (MCL-E-61 manufactured by Hitachi Chemical Co., Ltd.) with a polished surface was used as the anode.
陰極にはステンレス板(8U8−304)を用い。A stainless steel plate (8U8-304) is used for the cathode.
印加電圧150Vで3分間で行Aつた。Row A was completed in 3 minutes with an applied voltage of 150V.
6−
なお、電着直前に電着液をサンプリングし、ろ通接でろ
過し沈降物の有無を調べた。6- In addition, the electrodeposition solution was sampled immediately before electrodeposition, and was filtered through a filter to examine the presence or absence of sediment.
電着終了後、基板を電着浴から取多出し、水洗。After electrodeposition is complete, remove the substrate from the electrodeposition bath and wash with water.
乾燥(80℃、5分間)を行なった。次に3kW超高圧
水銀灯(オーク社製HMW−201B )で。Drying was performed (80°C, 5 minutes). Next, I used a 3kW ultra-high pressure mercury lamp (HMW-201B manufactured by Oak).
ネガフィルムを通して300mJ/cm”照射した。300 mJ/cm'' was irradiated through the negative film.
照射後、1wt%Na2COs水溶液で現像し、露出し
た銅表面を塩化第二銅水溶液でエツチングし。After irradiation, the film was developed with a 1 wt % Na2COs aqueous solution, and the exposed copper surface was etched with a cupric chloride aqueous solution.
最後に、未露光部の塗膜を3wt%NaOH水溶液で剥
離し、良好なプリント配線板を作製した。Finally, the coating film on the unexposed area was peeled off with a 3 wt % NaOH aqueous solution to produce a good printed wiring board.
比較例1
電着の工程で、二酸化炭素を除去しない空気を使用した
以外は、実施例と同様にしてプリント配表
○沈降物なし
△わずかに沈降物が認められる
×かなυの沈降物が認められる
(発明の効果)
本発明は、二酸化炭素を除いた空気を用いて電着液を攪
拌することによシ、電着浴の劣化を防ぎ。Comparative Example 1 Printed out in the same manner as in Example except that air without removing carbon dioxide was used in the electrodeposition process ○ No sediment △ Slight sediment observed × Kana υ sediment observed (Effects of the Invention) The present invention prevents deterioration of the electrodeposition bath by stirring the electrodeposition solution using air excluding carbon dioxide.
電着で得られる感光膜の性能を低下させることがないの
で、その後の工程もスムーズに進み、良好なプリント配
線板を得ることができる。Since the performance of the photoresist film obtained by electrodeposition is not deteriorated, the subsequent steps proceed smoothly and a good printed wiring board can be obtained.
Claims (1)
する方法において,感光性樹脂を含む電着浴を二酸化炭
素を除去した空気で攪拌しながら,銅箔もしくは銅めつ
きを施した基板に感光膜を電着塗装することを特徴とし
たプリント配線板の製造方法。1. In the method of manufacturing printed wiring boards by forming a photosensitive film by electrodeposition coating, an electrodeposition bath containing a photosensitive resin is stirred with air from which carbon dioxide has been removed, and a copper foil or copper-plated board is coated with the electrodeposition bath. A method for producing a printed wiring board characterized by electrodepositing a photosensitive film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25836189A JPH03120785A (en) | 1989-10-03 | 1989-10-03 | Manufacture of printed-wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25836189A JPH03120785A (en) | 1989-10-03 | 1989-10-03 | Manufacture of printed-wiring board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03120785A true JPH03120785A (en) | 1991-05-22 |
Family
ID=17319168
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25836189A Pending JPH03120785A (en) | 1989-10-03 | 1989-10-03 | Manufacture of printed-wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03120785A (en) |
-
1989
- 1989-10-03 JP JP25836189A patent/JPH03120785A/en active Pending
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