JPH03118874A - Dip coating method - Google Patents
Dip coating methodInfo
- Publication number
- JPH03118874A JPH03118874A JP25839889A JP25839889A JPH03118874A JP H03118874 A JPH03118874 A JP H03118874A JP 25839889 A JP25839889 A JP 25839889A JP 25839889 A JP25839889 A JP 25839889A JP H03118874 A JPH03118874 A JP H03118874A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- tank
- cylindrical
- coating tank
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000003618 dip coating Methods 0.000 title claims description 11
- 238000000576 coating method Methods 0.000 claims abstract description 111
- 239000011248 coating agent Substances 0.000 claims abstract description 109
- 239000007788 liquid Substances 0.000 claims abstract description 55
- 239000000758 substrate Substances 0.000 claims description 71
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000011038 discontinuous diafiltration by volume reduction Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Landscapes
- Photoreceptors In Electrophotography (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Abstract
Description
【発明の詳細な説明】
(a)産業上の利用分野
この発明は、複数の円筒状基体を塗工槽の塗液の中に浸
漬、引き上げることにより円筒状基体表面に塗膜を形成
する浸漬塗布方法に関する。DETAILED DESCRIPTION OF THE INVENTION (a) Industrial Field of Application This invention relates to a dipping method in which a plurality of cylindrical substrates are immersed in a coating liquid in a coating tank and then pulled up to form a coating film on the surface of the cylindrical substrates. Regarding the coating method.
(b)従来の技術
基体の表面に、その基体と異なる材質の層を形成する方
法の一つに、塗液の収容された塗工槽中に基体を浸漬し
引き上げる方法がある。(b) Prior Art One method for forming a layer of a material different from that of the substrate on the surface of the substrate is to immerse the substrate in a coating tank containing a coating liquid and then pull it up.
第3図は、従来の浸漬塗布方法を説明する図である。FIG. 3 is a diagram illustrating a conventional dip coating method.
同図(A)は円筒状基体を塗工槽の塗液中に完全に浸漬
した状態を表している。円筒状基体1を図示せぬ昇降装
置の保持部2が保持し、塗液4が収容されている塗工槽
3の中に浸ンQする。塗工槽3の上部には浸漬したとき
に溢れる塗液を受ける受皿31が設けられ、前記受皿3
1には戻りパイプ32が連結され図示せぬ撹拌槽ユニッ
トへと溢れた塗液が回収される。塗工槽の下部には塗液
供給・回収用のパイプ33が配管されている。同図(B
)は昇降装置が円筒状基体1を引き上げていく途中の状
態を表している。塗液から引き上げられた円筒状基体1
の表面には塗膜41が形成されている。同(C)は昇降
装置が円筒状基体を完全に引き上げて塗布が終了した状
態を表している。Figure (A) shows the state in which the cylindrical substrate is completely immersed in the coating liquid in the coating tank. A cylindrical substrate 1 is held by a holding part 2 of a lifting device (not shown), and is immersed into a coating tank 3 in which a coating liquid 4 is stored. A saucer 31 is provided at the top of the coating tank 3 to receive the coating liquid that overflows when the coating tank 3 is immersed.
A return pipe 32 is connected to 1 to recover the overflowing coating liquid to a stirring tank unit (not shown). A pipe 33 for supplying and recovering the coating liquid is installed at the bottom of the coating tank. The same figure (B
) represents a state in which the lifting device is lifting up the cylindrical base 1. Cylindrical substrate 1 lifted from the coating liquid
A coating film 41 is formed on the surface. (C) shows a state in which the lifting device has completely lifted up the cylindrical substrate and coating has been completed.
引き上げられた円筒状基体の表面には塗膜41が形成さ
れている。A coating film 41 is formed on the surface of the cylindrical substrate that has been pulled up.
また、量産ラインでは、通常、複数の塗工槽を並べ、昇
降装置が複数の円筒状基体を一度に保持して塗布すると
いう方法が採られている。Furthermore, in mass production lines, a method is usually adopted in which a plurality of coating tanks are lined up and a lifting device holds and coats a plurality of cylindrical substrates at once.
(C1発明が解決しようとする課題
しかしながら、以上のような塗布方法では次のような欠
点があった。(C1 Problem to be Solved by the Invention However, the above coating method had the following drawbacks.
円筒状基体を塗工槽から引き上げると円筒状基体の体積
分(内部空間を含む)の液面低下が塗工槽中で生じるた
め、塗工槽内壁には第2図の(B)、(C)のように塗
液が付着した部分42ができる。付着した塗液は溶剤が
蒸発し易く凝集物となり、塗液に混入する。これは塗布
ムラの原因となるため、均一な塗膜を形成することがで
きなかった。When the cylindrical substrate is lifted out of the coating tank, the liquid level decreases in the coating tank by the volume of the cylindrical substrate (including the internal space), so the inner wall of the coating tank is coated with parts (B) and ( in Figure 2). A portion 42 to which the coating liquid has adhered is formed as shown in C). The solvent in the adhered coating liquid easily evaporates and forms aggregates, which are mixed into the coating liquid. Since this causes uneven coating, it was not possible to form a uniform coating film.
さらに、同じ塗工槽で径の異なる円筒状基体を塗工する
場合、円筒状基体を引き上げるときに生じる液面の低下
が円筒状基体の径(液面低下速度はサイズのうち径のみ
関係する。)により異なる。そのため、引き上げによっ
て生じる塗工槽内の塗液の液面低下速度が、円筒状基体
の径によって異なる。従って、このことを考慮して円筒
状基体の塗工速度(引き上げる速度)を径ごとに変える
必要があり、煩雑で操作性が極めて悪かった。Furthermore, when coating cylindrical substrates with different diameters in the same coating tank, the drop in the liquid level that occurs when the cylindrical substrate is pulled up is due to the diameter of the cylindrical substrate (the rate of drop in liquid level is related only to the diameter of the size). ). Therefore, the rate at which the level of the coating liquid in the coating tank decreases due to lifting differs depending on the diameter of the cylindrical substrate. Therefore, in consideration of this, it is necessary to change the coating speed (pulling speed) of the cylindrical substrate depending on the diameter, which is complicated and has extremely poor operability.
そこでこの発明の目的は、塗工槽内の塗液が常にほぼ一
定の液面の高さを保ち、液面低下のない浸漬塗布方法を
提供することにある。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a dip coating method in which the coating liquid in a coating tank always maintains a substantially constant liquid level, and the liquid level does not drop.
(d)課題を解決するための手段
この発明の浸漬塗布方法では、塗布されるべき同じサイ
ズの複数の円筒状基体のうち、初めにその半数の円筒状
基体を、塗液を収容した塗工槽に浸漬し、その後前記半
数の円筒状基体を塗工槽から引き上げるときに、その引
き上げ速度と同一速度で前記複数の円筒状基体の残りの
半数の円筒状基体を前記塗工槽に浸漬していくことを特
徴とする。(d) Means for Solving the Problems In the dip coating method of the present invention, of a plurality of cylindrical substrates of the same size to be coated, half of the cylindrical substrates are first coated with a coating liquid. immersing the plurality of cylindrical substrates in a tank, and then, when pulling up the half of the cylindrical substrates from the coating tank, immersing the remaining half of the plurality of cylindrical substrates in the coating tank at the same speed as the lifting speed. It is characterized by going.
(e)作用
この発明に係る浸漬塗布方法では、同じサイズの複数の
円筒状基体を同時に塗布するのに、まず前記複数の円筒
状基体の半数の円筒状基体を塗工槽中の塗液に浸漬し、
その後その浸漬した半数の円筒状基体を引き上げるとき
に、その引き上げ速度と同一速度で前記複数の円筒状基
体のうち残りの半数の円筒状基体を同じ塗工槽へと浸漬
していく。複数の円筒状基体は径だけでなく全て同じサ
イズであるため、引き上げて塗液から出た円筒状基体の
体積と浸漬して塗液の中に入った円筒状基体の体積とが
等しく、引き上げによる液面低下と浸漬による液面上昇
とが相殺して液面は常にほぼ一定の高さを保ち液面低下
が起こらない。従って、塗工槽の内壁が塗液が付着した
状態で露出することがなく、凝集物ができない。(e) Effect In the dip coating method according to the present invention, when a plurality of cylindrical substrates of the same size are coated simultaneously, half of the cylindrical substrates of the plurality of cylindrical substrates are first immersed in the coating liquid in the coating tank. Soak,
Thereafter, when half of the immersed cylindrical substrates are pulled up, the remaining half of the plurality of cylindrical substrates are immersed into the same coating tank at the same speed as the lifting speed. Since the multiple cylindrical substrates are all the same size as well as the diameter, the volume of the cylindrical substrate that comes out of the coating liquid after being pulled up is equal to the volume of the cylindrical substrate that is immersed in the coating liquid and is pulled up. The drop in the liquid level caused by this and the rise in the liquid level caused by immersion cancel each other out, so that the liquid level always remains at a nearly constant height and no drop in the liquid level occurs. Therefore, the inner wall of the coating tank is not exposed with the coating liquid attached, and no aggregates are formed.
さらに液面低下が起こらないので、塗工速度を設定する
ときに液面低下速度を考慮する必要がなく、どんな径の
円筒状基体でも同じ速度で塗工することができる。Furthermore, since the liquid level does not drop, there is no need to consider the rate of drop in the liquid level when setting the coating speed, and cylindrical substrates of any diameter can be coated at the same speed.
(fl実施例
第1図は、この発明の実施例である浸漬塗布方法の概略
を説明する図である。なお、第2図と同一部分は同一番
号で表し説明を省略する。(fl Embodiment FIG. 1 is a diagram for explaining the outline of a dip coating method that is an embodiment of the present invention. The same parts as in FIG. 2 are denoted by the same numbers and the explanation will be omitted.
本実施例では複数の円筒状基体は2本とする。In this embodiment, there are two cylindrical substrates.
塗工槽は図に示すように2つの塗工槽3aと3bから構
成され、それらは下部でバイブ30により連結されてい
る。塗工槽3aと3bの前記パイプ30の部分には整流
板5aと5bが設けられている。図示せぬ昇降装置の保
持部2aと2bは各々円筒状基体1aと1bを保持して
おり、保持部2aと2bは各々別個に昇降することがで
きる。As shown in the figure, the coating tank consists of two coating tanks 3a and 3b, which are connected by a vibrator 30 at the bottom. Current plates 5a and 5b are provided at the pipe 30 portions of the coating tanks 3a and 3b. Holding parts 2a and 2b of a lifting device (not shown) hold cylindrical base bodies 1a and 1b, respectively, and the holding parts 2a and 2b can be raised and lowered separately.
同図(A)は塗工槽3bに円筒状基体1b(半数の基体
)が完全に浸漬されている状態を表している。この状態
で塗液4は両方の塗工槽3a、3bに満たされた状態と
なっている。この後円筒状基体1bを塗工槽3bから引
き上げ、円筒状基体la(残りの半数の基体)を塗工槽
3bへと浸漬させる。Figure (A) shows a state in which the cylindrical substrates 1b (half of the substrates) are completely immersed in the coating tank 3b. In this state, both coating tanks 3a and 3b are filled with the coating liquid 4. Thereafter, the cylindrical substrate 1b is lifted from the coating tank 3b, and the cylindrical substrate la (the remaining half of the substrates) is immersed into the coating tank 3b.
同図(B)は円筒状基体1bを塗工槽3bから半分引き
上げ、円筒状基体1aを塗工槽3aへ半分浸漬した状態
を表している。円筒状基体1bの引き上げ速度と円筒状
基体1aの浸漬速度を同一にしであるので、円筒状基体
1bを引き上げることによる体積減少が、同一速度で塗
工槽3aに浸潰される円筒状基体1aの体積増加がパイ
プ30を通って塗工槽3bへと流れて相殺され、塗工槽
3b内の液面低下が防止される。塗工槽から塗工槽への
塗液の流れによる、塗液の液面の波立ちは整流板5a、
5bにより防止される。なお、引き上げられた円筒状基
体1bには塗膜41が形成され、その分の塗液は減少す
るが、塗液全体からみれば非常に微量であり、塗工槽3
a、3bとも塗液の液面は一定に保たれているといえる
。The figure (B) shows a state in which the cylindrical substrate 1b is half lifted from the coating tank 3b and the cylindrical substrate 1a is half immersed in the coating tank 3a. Since the pulling speed of the cylindrical substrate 1b and the dipping speed of the cylindrical substrate 1a are the same, the volume reduction due to pulling up the cylindrical substrate 1b is equal to that of the cylindrical substrate 1a which is immersed in the coating tank 3a at the same speed. The increase in volume flows through the pipe 30 to the coating tank 3b and is offset, thereby preventing a drop in the liquid level in the coating tank 3b. Ripples on the liquid surface of the coating liquid due to the flow of the coating liquid from one coating tank to another are caused by a rectifier plate 5a,
5b. Note that a coating film 41 is formed on the cylindrical substrate 1b that has been pulled up, and the coating liquid decreases by that amount, but it is a very small amount compared to the entire coating liquid, and the coating film 41 is
It can be said that the liquid level of the coating liquid is kept constant in both cases a and 3b.
同図(C)は円筒状基体1bが塗工槽3bから完全に引
き上げられ、円筒状基体1aが塗工槽3aに完全に浸漬
された状態を表している。同図(B)の場合と同様の原
理で液面の低下は起こらず、常に一定である。従って、
塗工槽の内壁面が露出することがなく、塗液の凝集物が
発生せず、塗布ムラができず均一な塗膜を形成すること
ができる。Figure (C) shows a state in which the cylindrical substrate 1b has been completely pulled up from the coating tank 3b, and the cylindrical substrate 1a has been completely immersed in the coating tank 3a. Due to the same principle as in the case shown in FIG. 5(B), the liquid level does not drop and remains constant. Therefore,
The inner wall surface of the coating tank is not exposed, no agglomerates of the coating liquid are generated, and a uniform coating film can be formed without uneven coating.
また、どのようなサイズの円筒状基体の塗布の場合でも
、複数の円筒状基体が全て同一サイズであるため塗工槽
内の液面低下がなく、径により塗工速度を換えることが
不要となり操作性が向上した。In addition, when coating cylindrical substrates of any size, since the multiple cylindrical substrates are all the same size, there is no drop in the liquid level in the coating tank, and there is no need to change the coating speed depending on the diameter. Improved operability.
本実施例の浸漬塗布方法では、パイプで連結した基体と
同数の塗工槽を用い、連結部を底部にしたが、中部、上
部、あるいは複数箇所に設けても差し支えない。また、
連結した複数の塗工槽ではなく、第2図に示すような塗
工槽を使用することもできる。すなわち、複数の塗工槽
3Cと3dを全体的に連結して実質的には一つの塗工槽
となっている。この場合は塗工槽3Cと3dとに浸漬さ
れる円筒状基体による液面の波立ちを防止するために、
塗工槽3Cと3dとの間に整流板5を設ける。In the dip coating method of this embodiment, the same number of coating tanks as the substrates were connected by pipes, and the connection part was located at the bottom, but it may be provided at the middle, the top, or at multiple locations. Also,
Instead of a plurality of connected coating tanks, a coating tank as shown in FIG. 2 can also be used. That is, the plurality of coating tanks 3C and 3d are connected as a whole to form substantially one coating tank. In this case, in order to prevent the liquid surface from undulating due to the cylindrical substrates immersed in the coating tanks 3C and 3d,
A current plate 5 is provided between the coating tanks 3C and 3d.
なお、塗布される円筒状基体をサイズの異なる円筒状基
体へと切り換えるとき、各々同一サイズのダミー基体を
最初と最後に用いることにより、液面の低下を防ぐ。Note that when switching the cylindrical substrate to be coated to a cylindrical substrate of a different size, a drop in the liquid level is prevented by using dummy substrates of the same size first and last.
(釦発明の効果
以上のようにこの発明によれば、同じサイズの複数の円
筒状基体を同時に塗布するのに、まずその半数の円筒状
基体を塗工槽中の塗液に浸漬し、その後その浸漬した半
数の円筒状基体を引き上げるときに、その引き上げ速度
と同一速度で残りの半数の円筒状基体を同じ塗工槽へと
浸漬していく。このため、引き上げて塗液から出いてい
く円筒状基体の体積と浸漬して塗液の中に入っていく円
筒状基体の体積とが等しくなる。すなわち、引き上げに
よる液面低下と浸漬による液面上昇とが相殺して液面が
低下せず、塗工槽の内壁が塗液が付着した状態で露出せ
ず、凝集物ができない。従って、塗布ムラができず均一
な塗膜を形成することができる。(Effects of the Button Invention As described above, according to this invention, in order to simultaneously coat a plurality of cylindrical substrates of the same size, first half of the cylindrical substrates are immersed in the coating liquid in the coating tank, and then When half of the immersed cylindrical substrates are pulled up, the other half of the cylindrical substrates are dipped into the same coating tank at the same speed as the lifting speed.For this reason, they are pulled up and out of the coating liquid. The volume of the cylindrical substrate becomes equal to the volume of the cylindrical substrate immersed into the coating liquid.In other words, the drop in the liquid level due to lifting and the rise in the liquid level due to immersion cancel each other out, causing the liquid level to drop. First, the inner wall of the coating tank is not exposed with the coating liquid attached to it, and no aggregates are formed.Therefore, a uniform coating film can be formed without uneven coating.
さらに液面低下速度を考慮する必要がなく、どんな径の
円筒状基体でも複数本ずつ同じ速度で塗工することがで
き、操作性の向上を図ることができる。Furthermore, there is no need to consider the rate of drop in the liquid level, and a plurality of cylindrical substrates of any diameter can be coated at the same speed, thereby improving operability.
第1図は、この発明の実施例である浸漬塗布方法を説明
する図である。同図(A)は一方の円筒状基体が完全に
浸漬されている状態を表している。同図(B)は一方の
円筒状基体を塗工槽から半分引き上げ、他方の円筒状基
体を塗工槽へ半分浸漬した状態を表している。同図(C
)は一方の円筒状基体が塗工槽から完全に引き上げられ
、他方の円筒状基体が塗工槽に完全に浸漬された状態を
表している。第2図は同浸漬塗布方法を実施する塗布装
置の変形例の概略図である。第3図(A)(B)、(C
)は従来の浸漬塗布方法の概略を説明する図である。
1a、1b−円筒状基体、
2a、2b−昇降装置の保持部、
3a、3b−塗工槽、4−塗液、
5.5a、5b−整流板。FIG. 1 is a diagram illustrating a dip coating method according to an embodiment of the present invention. Figure (A) shows a state in which one cylindrical substrate is completely immersed. Figure (B) shows a state in which one cylindrical substrate is half lifted out of the coating tank, and the other cylindrical substrate is half immersed in the coating tank. The same figure (C
) represents a state in which one cylindrical substrate is completely lifted out of the coating tank and the other cylindrical substrate is completely immersed in the coating tank. FIG. 2 is a schematic diagram of a modified example of a coating apparatus for carrying out the same dip coating method. Figure 3 (A) (B), (C
) is a diagram illustrating an outline of a conventional dip coating method. 1a, 1b - cylindrical substrate, 2a, 2b - holding part of the lifting device, 3a, 3b - coating tank, 4 - coating liquid, 5.5a, 5b - rectifier plate.
Claims (1)
うち、初めにその半数の円筒状基体を、塗液を収容した
塗工槽に浸漬し、その後前記半数の円筒状基体を塗工槽
から引き上げるときに、その引き上げ速度と同一速度で
前記複数の円筒状基体の残りの半数の円筒状基体を前記
塗工槽に浸漬していくことを特徴とする浸漬塗布方法。(1) Among multiple cylindrical substrates of the same size to be coated, half of them are first immersed in a coating tank containing a coating liquid, and then half of the cylindrical substrates are coated. A dip coating method characterized in that, when the cylindrical substrates are pulled up from the tank, the remaining half of the plurality of cylindrical substrates are dipped into the coating tank at the same speed as the pulling speed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25839889A JPH03118874A (en) | 1989-10-02 | 1989-10-02 | Dip coating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25839889A JPH03118874A (en) | 1989-10-02 | 1989-10-02 | Dip coating method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03118874A true JPH03118874A (en) | 1991-05-21 |
Family
ID=17319685
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25839889A Pending JPH03118874A (en) | 1989-10-02 | 1989-10-02 | Dip coating method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03118874A (en) |
-
1989
- 1989-10-02 JP JP25839889A patent/JPH03118874A/en active Pending
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