JPH03116150A - Photosensitive resin composition and printing plate material using the same - Google Patents
Photosensitive resin composition and printing plate material using the sameInfo
- Publication number
- JPH03116150A JPH03116150A JP25598989A JP25598989A JPH03116150A JP H03116150 A JPH03116150 A JP H03116150A JP 25598989 A JP25598989 A JP 25598989A JP 25598989 A JP25598989 A JP 25598989A JP H03116150 A JPH03116150 A JP H03116150A
- Authority
- JP
- Japan
- Prior art keywords
- copolymer
- resin composition
- photosensitive resin
- parts
- polyvinyl alcohol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 18
- 238000007639 printing Methods 0.000 title claims abstract description 11
- 239000000463 material Substances 0.000 title claims description 8
- 229920001577 copolymer Polymers 0.000 claims abstract description 24
- 229920002451 polyvinyl alcohol Polymers 0.000 claims abstract description 18
- 239000000178 monomer Substances 0.000 claims abstract description 16
- 239000004372 Polyvinyl alcohol Substances 0.000 claims abstract description 14
- 239000003999 initiator Substances 0.000 claims abstract description 12
- 150000001732 carboxylic acid derivatives Chemical group 0.000 claims abstract description 6
- 230000009477 glass transition Effects 0.000 claims description 7
- 206010034972 Photosensitivity reaction Diseases 0.000 claims 1
- 230000036211 photosensitivity Effects 0.000 claims 1
- 239000011347 resin Substances 0.000 abstract description 9
- 229920005989 resin Polymers 0.000 abstract description 9
- 239000000976 ink Substances 0.000 abstract description 6
- 239000003125 aqueous solvent Substances 0.000 abstract description 5
- 229920005601 base polymer Polymers 0.000 abstract description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 63
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 37
- 238000006116 polymerization reaction Methods 0.000 description 21
- 150000003839 salts Chemical class 0.000 description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- -1 ethylene, propylene, 1-butene Chemical class 0.000 description 14
- 229920000642 polymer Polymers 0.000 description 13
- 239000011118 polyvinyl acetate Substances 0.000 description 13
- 229920002689 polyvinyl acetate Polymers 0.000 description 13
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 11
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 7
- 150000003573 thiols Chemical class 0.000 description 7
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 4
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 4
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 4
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 4
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 4
- 230000005587 bubbling Effects 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 4
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 4
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2,2'-azo-bis-isobutyronitrile Substances N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 3
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical group OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 3
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000007644 letterpress printing Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 229920001451 polypropylene glycol Polymers 0.000 description 3
- 238000001226 reprecipitation Methods 0.000 description 3
- 150000003613 toluenes Chemical class 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 3
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 2
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 2
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- MWKAGZWJHCTVJY-UHFFFAOYSA-N 3-hydroxyoctadecan-2-one Chemical compound CCCCCCCCCCCCCCCC(O)C(C)=O MWKAGZWJHCTVJY-UHFFFAOYSA-N 0.000 description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- HETCEOQFVDFGSY-UHFFFAOYSA-N Isopropenyl acetate Chemical compound CC(=C)OC(C)=O HETCEOQFVDFGSY-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000003926 acrylamides Chemical class 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000005395 methacrylic acid group Chemical group 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- WFKDPJRCBCBQNT-UHFFFAOYSA-N n,2-dimethylprop-2-enamide Chemical compound CNC(=O)C(C)=C WFKDPJRCBCBQNT-UHFFFAOYSA-N 0.000 description 2
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 2
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 2
- ZIWDVJPPVMGJGR-UHFFFAOYSA-N n-ethyl-2-methylprop-2-enamide Chemical compound CCNC(=O)C(C)=C ZIWDVJPPVMGJGR-UHFFFAOYSA-N 0.000 description 2
- SWPMNMYLORDLJE-UHFFFAOYSA-N n-ethylprop-2-enamide Chemical compound CCNC(=O)C=C SWPMNMYLORDLJE-UHFFFAOYSA-N 0.000 description 2
- YPHQUSNPXDGUHL-UHFFFAOYSA-N n-methylprop-2-enamide Chemical compound CNC(=O)C=C YPHQUSNPXDGUHL-UHFFFAOYSA-N 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- AAYRWMCIKCRHIN-UHFFFAOYSA-N propane-1-sulfonic acid;prop-2-enamide Chemical compound NC(=O)C=C.CCCS(O)(=O)=O AAYRWMCIKCRHIN-UHFFFAOYSA-N 0.000 description 2
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 2
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 2
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- LAYAKLSFVAPMEL-UHFFFAOYSA-N 1-ethenoxydodecane Chemical compound CCCCCCCCCCCCOC=C LAYAKLSFVAPMEL-UHFFFAOYSA-N 0.000 description 1
- QJJDJWUCRAPCOL-UHFFFAOYSA-N 1-ethenoxyoctadecane Chemical compound CCCCCCCCCCCCCCCCCCOC=C QJJDJWUCRAPCOL-UHFFFAOYSA-N 0.000 description 1
- OVGRCEFMXPHEBL-UHFFFAOYSA-N 1-ethenoxypropane Chemical compound CCCOC=C OVGRCEFMXPHEBL-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- SJIXRGNQPBQWMK-UHFFFAOYSA-N 2-(diethylamino)ethyl 2-methylprop-2-enoate Chemical group CCN(CC)CCOC(=O)C(C)=C SJIXRGNQPBQWMK-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- TURITJIWSQEMDB-UHFFFAOYSA-N 2-methyl-n-[(2-methylprop-2-enoylamino)methyl]prop-2-enamide Chemical compound CC(=C)C(=O)NCNC(=O)C(C)=C TURITJIWSQEMDB-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- POWRWAPGWNDTQS-UHFFFAOYSA-N 3-[3-(3-amino-2-methyl-3-oxoprop-1-enyl)phenyl]-2-methylprop-2-enamide Chemical compound CC(=Cc1cccc(C=C(C)C(N)=O)c1)C(N)=O POWRWAPGWNDTQS-UHFFFAOYSA-N 0.000 description 1
- PWTKJPFBOJYYEG-UHFFFAOYSA-N 3-[3-(3-amino-3-oxoprop-1-enyl)phenyl]prop-2-enamide Chemical compound NC(=O)C=CC1=CC=CC(C=CC(N)=O)=C1 PWTKJPFBOJYYEG-UHFFFAOYSA-N 0.000 description 1
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- JXMKDGGWYUDALV-UHFFFAOYSA-N 4-[3-(4-amino-4-oxobut-2-enyl)phenyl]but-2-enamide Chemical compound NC(=O)C=CCC1=CC=CC(CC=CC(N)=O)=C1 JXMKDGGWYUDALV-UHFFFAOYSA-N 0.000 description 1
- VPRASHHJMIOEKY-UHFFFAOYSA-N 4-[4-(4-amino-4-oxobut-2-enyl)phenyl]but-2-enamide Chemical compound NC(=O)C=CCC1=CC=C(CC=CC(N)=O)C=C1 VPRASHHJMIOEKY-UHFFFAOYSA-N 0.000 description 1
- MAGFQRLKWCCTQJ-UHFFFAOYSA-N 4-ethenylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(C=C)C=C1 MAGFQRLKWCCTQJ-UHFFFAOYSA-N 0.000 description 1
- RWHRFHQRVDUPIK-UHFFFAOYSA-N 50867-57-7 Chemical class CC(=C)C(O)=O.CC(=C)C(O)=O RWHRFHQRVDUPIK-UHFFFAOYSA-N 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- QSJXEFYPDANLFS-UHFFFAOYSA-N Diacetyl Chemical group CC(=O)C(C)=O QSJXEFYPDANLFS-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- NVLHKSGUMYMKRR-UHFFFAOYSA-N dodeca-2,10-dienediamide Chemical compound NC(=O)C=CCCCCCCC=CC(N)=O NVLHKSGUMYMKRR-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- YCUBDDIKWLELPD-UHFFFAOYSA-N ethenyl 2,2-dimethylpropanoate Chemical compound CC(C)(C)C(=O)OC=C YCUBDDIKWLELPD-UHFFFAOYSA-N 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- GLVVKKSPKXTQRB-UHFFFAOYSA-N ethenyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OC=C GLVVKKSPKXTQRB-UHFFFAOYSA-N 0.000 description 1
- GFJVXXWOPWLRNU-UHFFFAOYSA-N ethenyl formate Chemical compound C=COC=O GFJVXXWOPWLRNU-UHFFFAOYSA-N 0.000 description 1
- AFSIMBWBBOJPJG-UHFFFAOYSA-N ethenyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OC=C AFSIMBWBBOJPJG-UHFFFAOYSA-N 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- HWJHWSBFPPPIPD-UHFFFAOYSA-N ethoxyethane;propan-2-one Chemical compound CC(C)=O.CCOCC HWJHWSBFPPPIPD-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethyl mercaptane Natural products CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 238000001192 hot extrusion Methods 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- YMDZGJOTVBKZQK-UHFFFAOYSA-N n,n-dimethylpropan-1-amine;2-methylprop-2-enamide Chemical compound CCCN(C)C.CC(=C)C(N)=O YMDZGJOTVBKZQK-UHFFFAOYSA-N 0.000 description 1
- QQGJWWNPACORPU-UHFFFAOYSA-N n,n-dimethylpropan-1-amine;prop-2-enamide Chemical compound NC(=O)C=C.CCCN(C)C QQGJWWNPACORPU-UHFFFAOYSA-N 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 231100000289 photo-effect Toxicity 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002589 poly(vinylethylene) polymer Polymers 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920000346 polystyrene-polyisoprene block-polystyrene Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 229910000144 sodium(I) superoxide Inorganic materials 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
A、産業上の利用分野
本発明は感光性樹脂組成物およびそれを用いた刷版材に
関する。DETAILED DESCRIPTION OF THE INVENTION A. Field of Industrial Application The present invention relates to a photosensitive resin composition and a printing plate material using the same.
B 従来技術
従来フィルムベースとなる重合体、ラジカル重合可能な
エチレン性モノマー(以下、重合性モノマーという)お
よび光重合開始剤を含有する組成物は感光性樹脂組成物
と呼ばれ、たとえば印刷用凸版材料として広く利用され
ている。B. Prior Art Conventionally, a composition containing a polymer serving as a film base, a radically polymerizable ethylenic monomer (hereinafter referred to as a polymerizable monomer), and a photopolymerization initiator is called a photosensitive resin composition, and is used, for example, in letterpress printing plates. Widely used as a material.
上記、感光性樹脂組成物は金属板やフィルム板のごとき
支持体上にシート状に調整された後(これを感光性樹脂
板という)、露光、現像を経て樹脂凸版となる。The photosensitive resin composition described above is prepared in the form of a sheet on a support such as a metal plate or a film plate (this is referred to as a photosensitive resin plate), and then exposed and developed to become a resin letterpress.
従来水現像が可能な感光性樹脂組成物としてポリビニル
アルコール系重合体やナイロン系重合体をベース重合体
としたものが使用されてきているが、硬化後の耐水性が
必ずしも十分ではなく水性インキが使用できない等の問
題がある。Conventionally, water-developable photosensitive resin compositions using polyvinyl alcohol-based polymers or nylon-based polymers as base polymers have been used, but the water resistance after curing is not necessarily sufficient and water-based inks are difficult to use. There are problems such as unusability.
一方フレキソ版は、1.2−ポリブタジェンやスチレン
−イソプレン−スチレンブロック共重合体をベースとす
るいわゆる有機溶剤現像型が現在でも主流であり、水現
像可能で水性インキの使用できる感光性樹脂組成物で満
足のいく性質を持ったものは見当らないのが現状である
。On the other hand, flexo plates are still mainly of the so-called organic solvent developable type based on 1,2-polybutadiene or styrene-isoprene-styrene block copolymers, and photosensitive resin compositions that are water-developable and can be used with water-based inks. At present, we have not found anything with satisfactory properties.
Cが 決しよ゛とする問題
本発明は水系溶剤による現像が可能で、しかも水性イン
キの使用が可能な十分な耐水性を有し、可撓性、および
耐衝撃性があり、かつ弾性を有した高級な印字品質が得
られる印刷版材、とりわけフレキソ印刷に使用可能な十
分な弾性と柔軟性を有する感光性樹脂組成物を提供せん
とするものである。Problem to be solved by C The present invention is capable of developing with an aqueous solvent, has sufficient water resistance to allow the use of an aqueous ink, is flexible, has impact resistance, and has elasticity. The object of the present invention is to provide a photosensitive resin composition that has sufficient elasticity and flexibility to be used for printing plate materials that can provide high quality printing, particularly for flexographic printing.
01課題を 決するための
本発明者らは、上記課題について鋭意検討した結果、ポ
リビニルアルコール系マクロモノマー単位を含有する共
重合体(A)をペースポリマーとして採用することによ
り目的が達成されることを見い出し、本発明を完成した
ものである。As a result of intensive study on the above-mentioned problem, the present inventors have determined that the object can be achieved by employing a copolymer (A) containing polyvinyl alcohol-based macromonomer units as a pace polymer. The heading completes the invention.
以下本発明の詳細な説明する。The present invention will be explained in detail below.
本発明はポリビニルアルコール系マクロモノマー単位お
よびエチレン性不飽和カルボン酸単位を含有する水不飽
和溶性の共重合体(入)、ラジカル重合可能なエチレン
性モノマーおよび光重合開始剤を含有することを特徴と
する。The present invention is characterized by containing a water-unsaturated soluble copolymer containing a polyvinyl alcohol macromonomer unit and an ethylenically unsaturated carboxylic acid unit, a radically polymerizable ethylenic monomer, and a photopolymerization initiator. shall be.
本発明に使用される共重合体(A)は、水に不溶でアル
カリ水に可溶な重合体であり、以下の(a)、(b)お
よび(c)の各単位から構成される。ポリビニルアルコ
ール系マクロモノマー(a)単位は、ビニルアルコール
単位の含量が50モル%以上である数平均重合度3〜5
00のポリビニルアルコール系重合体を有するものであ
れば、マクロモノマー単位を接続する主鎖部分は特定の
構造である必要はなく、たとえばメタクリル酸エステル
構造のものが例示される。単位(a)の例として、製造
時の共重合性が良好で、比較的に疎水的性質の強くない
下記の一般式(a−1)で表されるマクロモノマー単位
が挙げられる。The copolymer (A) used in the present invention is a polymer that is insoluble in water and soluble in alkaline water, and is composed of the following units (a), (b), and (c). The polyvinyl alcohol macromonomer (a) unit has a number average degree of polymerization of 3 to 5 and has a vinyl alcohol unit content of 50 mol% or more.
00 polyvinyl alcohol-based polymer, the main chain portion connecting the macromonomer units does not need to have a specific structure, such as a methacrylic acid ester structure. An example of the unit (a) is a macromonomer unit represented by the following general formula (a-1), which exhibits good copolymerizability during production and does not have relatively strong hydrophobic properties.
Hs
ここで、−R’−S−はメタクリル酸エステル部分とポ
リビニルアルコール系重合体部分との連結基であり、R
1は分岐を有していてもよい炭素数2から20までのア
ルキレン基で、Sは硫黄原子である。R1の具体例とし
ては、−(cHt)t−−(cHt)3(CH=)s
(CHt) lo CH(CaHls)C
HtC)I(C+oHt+)CHt−等が挙げられる。Hs Here, -R'-S- is a linking group between the methacrylic acid ester part and the polyvinyl alcohol polymer part, and R
1 is an alkylene group having 2 to 20 carbon atoms which may have a branch, and S is a sulfur atom. A specific example of R1 is -(cHt)t--(cHt)3(CH=)s
(CHt) lo CH(CaHls)C
HtC)I(C+oHt+)CHt- and the like.
(PVA)は、数平均重合度が3〜5001好ましくは
5〜300の範囲にあるビニルアルコール含量が50モ
ル%以上の1価のポリビニルアルコール系重合体である
。1価のポリビニルアルコール系重合体を構成するビニ
ルアルコール単位以外の単位は50モル%未満であれば
種類、量に特に制限はなく、例えば共重合や高分子反応
によって導入可能な単位から選ばれる。(PVA) is a monovalent polyvinyl alcohol polymer having a number average degree of polymerization of 3 to 5001, preferably 5 to 300, and a vinyl alcohol content of 50 mol% or more. The type and amount of units other than vinyl alcohol units constituting the monovalent polyvinyl alcohol polymer are not particularly limited as long as they are less than 50 mol%, and are selected from units that can be introduced, for example, by copolymerization or polymer reaction.
この様な単位の例として以下のものが挙げられる。Examples of such units include:
すなわちエチレン、プロピレン、1−ブテン、イソブチ
ン等のオレフィン類、酢酸ビニル、蟻酸ビニル、プロピ
オン酸ビニル、酪酸ビニル、ピバリン酸ビニル、パーサ
ティック酸ビニル、ラウリン酸ビニル、ステアリン酸ビ
ニル、安息香酸ビニル等のビニルエステル類、アクリル
酸またはその塩、アクリル酸メチル、アクリル酸エチル
、アクリル酸n−プロピル、アクリル酸量−プロピル、
アクリル酸n−ブチル、アクリル酸i−ブチル、アクリ
ル酸t−ブチル、アクリル酸2−エチルヘキンル、アク
リル酸ドデシル、アクリル酸オクタデンル等のアクリル
酸エステル類、メタクリル酸またはその塩、メタクリル
酸メチル、メタクリル酸エチル、メタクリル酸n−プロ
ピル、メタクリル酸l−プロピル、メタクリル酸n−ブ
チル、メタクリル酸i−ブチル、メタクリル酸し一ブチ
ル、メタクリル酸2−エチルヘキンル、メタクリル酸ド
デシル、メタクリル酸オクタデシル等のメタクリル酸エ
ステル類、アクリルアミド、N−メチルアクリルアミド
、N−エチルアクリルアミド、N。That is, olefins such as ethylene, propylene, 1-butene, isobutyne, vinyl acetate, vinyl formate, vinyl propionate, vinyl butyrate, vinyl pivalate, vinyl persate, vinyl laurate, vinyl stearate, vinyl benzoate, etc. Vinyl esters, acrylic acid or its salts, methyl acrylate, ethyl acrylate, n-propyl acrylate, propyl acrylate,
Acrylic acid esters such as n-butyl acrylate, i-butyl acrylate, t-butyl acrylate, 2-ethylhexyl acrylate, dodecyl acrylate, and octadenyl acrylate, methacrylic acid or its salts, methyl methacrylate, methacrylic acid Methacrylic acid esters such as ethyl, n-propyl methacrylate, l-propyl methacrylate, n-butyl methacrylate, i-butyl methacrylate, monobutyl methacrylate, 2-ethylhexyl methacrylate, dodecyl methacrylate, and octadecyl methacrylate. acrylamide, N-methylacrylamide, N-ethylacrylamide, N.
N−ジメチルアクリルアミド、ジアセトンアクリルアミ
ド、アクリルアミドプロパンスルホン酸またはその塩、
アクリルアミドプロピルツメチルアミンまたはその塩お
上びその4級塩、N−メチロールアクリルアミドまたは
その誘導体等のアクリルアモト誘導体、メタクリルアミ
ド、N−メチルメタクリルアミド、N−エチルメタクリ
ルアミド、メタクリルアミドプロパンスルホン酸および
その塩、メタクリルアミドプロピルジメチルアミンまた
はその塩およびその4級塩、N−メチロールアクリルア
ミドまたはその誘導体等のメタクリルアミド誘導体、メ
チルビニルエーテル、エチルビニルエーテル、n−プロ
ピルビニルエーテル、i−ブロビルビニルエーテル、n
−ブチルビニルエーテル、i−ブチルビニルエーテル、
し−ブチルビニルエーテル、ドデシルビニルエーテル、
ステアリルビニルエーテル等のビニルエーテル類、アク
リロニトリル、メタクリロニトリル等のニトリル類、塩
化ビニル、塩化ヒニリデン、フッ化ビニル、フッ化ビニ
リデン等のハロゲン化ビニル類、酢酸アリル、塩化アリ
ル等のアリル化合物、マレイン酸またはその塩およびそ
のエステル、イタコン酸またはその塩およびそのエステ
ル、ビニルトリメトキシシラン等のビニルシリル化合物
、酢酸イソプロペニル等である。N-dimethylacrylamide, diacetone acrylamide, acrylamide propane sulfonic acid or its salt,
Acrylamidopropylzmethylamine or its salts and quaternary salts thereof, acrylamide derivatives such as N-methylolacrylamide or its derivatives, methacrylamide, N-methylmethacrylamide, N-ethylmethacrylamide, methacrylamidepropanesulfonic acid and its salts , methacrylamide propyl dimethylamine or its salt and its quaternary salt, methacrylamide derivatives such as N-methylolacrylamide or its derivatives, methyl vinyl ether, ethyl vinyl ether, n-propyl vinyl ether, i-brobyl vinyl ether, n
-butyl vinyl ether, i-butyl vinyl ether,
butyl vinyl ether, dodecyl vinyl ether,
Vinyl ethers such as stearyl vinyl ether, nitriles such as acrylonitrile and methacrylonitrile, vinyl halides such as vinyl chloride, hnylidene chloride, vinyl fluoride, and vinylidene fluoride, allyl compounds such as allyl acetate and allyl chloride, maleic acid or These include salts thereof and esters thereof, itaconic acid or salts thereof and esters thereof, vinylsilyl compounds such as vinyltrimethoxysilane, isopropenyl acetate, and the like.
ポリビニルアルコール系マクロモノマー(a)単位の含
有量については特に制限はないが、場合により、50w
t%を越えると耐水性に問題を生じ、3wt%未満では
後述する強度補強や架橋の効果が発現しないことがある
ために、好ましくは3〜50wt%である。There is no particular restriction on the content of the polyvinyl alcohol macromonomer (a) unit, but depending on the case, 50w
If it exceeds t%, problems will occur in water resistance, and if it is less than 3wt%, the strength reinforcement and crosslinking effects described below may not be achieved, so the content is preferably 3 to 50wt%.
エチレン性不飽和カルボン酸(b)としては、アクリル
酸、メタクリル酸、クロトン酸、イタコン酸またはその
モノエステル、およびそのモノ塩、マレイン酸またはそ
のモノエステルおよびそのモノ塩、フマル酸またはその
モノエステルおよびそのモノ塩等が挙げられる。エチレ
ン性不飽和カルボン酸(b)の含有量については特に制
限がないが、場合により、1wt%未満であると水系溶
剤による現像性が十分に得られず、逆に20wt%を越
えると現像性は問題ないが耐水性が劣り版が硬くなる等
の問題を生じることがあるために、好ましくは1〜20
vt%である。共重合体(A)の分子量は製膜性と現像
性のバランスを考えて、適宜選択される。As the ethylenically unsaturated carboxylic acid (b), acrylic acid, methacrylic acid, crotonic acid, itaconic acid or its monoester and its monosalt, maleic acid or its monoester and its monosalt, fumaric acid or its monoester and its monosalt. There is no particular restriction on the content of ethylenically unsaturated carboxylic acid (b), but in some cases, if it is less than 1 wt%, sufficient developability with aqueous solvents may not be obtained, and conversely, if it exceeds 20 wt%, developability may be impaired. is not a problem, but it may cause problems such as poor water resistance and hardness of the plate, so it is preferably 1 to 20.
vt%. The molecular weight of the copolymer (A) is appropriately selected in consideration of the balance between film formability and developability.
(a)単位および(b)単位以外のその他の単位(c)
は該共重合体の主鎖を構成する単位であり、(a)単位
および(b)単位以外のエチレン性モノマー単位からな
り、その含量については特に制限はないが、30〜96
wt%が好ましい。単位(e)として使用できる単位に
は特に制限はなく、目的とする版材の性質によって適宜
選択される。たとえば硬度の高いものが必要な場合には
、該重合体のガラス転移温度を高める単量体が、逆に柔
軟性や弾性を要求される場合にはガラス転移温度を低下
させる単量体が選択される。共重合体(A)のガラス転
移温度により、版材の種類が限定されないが、−例とし
ては以下のものを挙げることができる。共重合体(A)
のガラス転移温度が一80〜30℃の場合には、ゴム弾
性を有するために、特に水性フレキソ版用に好適に用い
られ、また凸版用にも好適に用いることができる。逆に
、共重合体(A)のガラス転移温度が30〜100℃の
場合には凸版用に好適に用いられる。通常使用される単
位としては以下のモノマー単位が例示される。すなわち
、エチレン、プロピレン、l−ブテン、イソブチン等の
オレフィン類、アクリル酸メチル、メタクリル酸メチル
、メタクリル酸エチル、メタクリル酸n−プロピル、メ
タクリル酸i−プロピル、メタクリル酸n−ブチル、メ
タクリル酸l−ブチル、メタクリル酸し一ブチル、メタ
クリル酸2−エチルヘキシル、メタクリル酸ドデシル、
メタクリル酸オクタデシル、メタクリル酸2−ヒドロキ
シエチル、メタクリル酸2−ジメチルアミノエチルまた
はその塩、およびその4級塩、メタクリル酸2−ジエチ
ルアミノエチルまたはその塩およびその4級塩、メタク
リル酸(2−ヒドロキシ)ジメチルアミノプロピル、メ
タクリル酸3−トリメトキシシリルプロピル等のメタク
リル酸エステル類、スチレン、p−メチルスチレン、α
−メチルスチレン、クロロメチルスチレン、p−スチレ
ンスルホン酸またはその塩、p−ヒドロキンスチレンま
たはその誘導体等のスチレンまたはその誘導体等のスチ
レン類、アクリルアミド、N−メチルアクリルアミド、
N−エチルアクリルアミド、N、N−ジメチルアクリル
アミド、ジアセトンアクリルアミド、アクリルアミドプ
ロパンスルホン酸およびその塩、アクリルアミドプロピ
ルジメチルアミンまたはその塩およびその4級塩、N−
メチロールアクリルアミドまたはその誘導体等のアクリ
ルアミド誘導体、メタクリルアミド、N−メチルメタク
リルアミド、N−エチルメタクリルアミド、メタクリル
アミドプロパンスルホン酸またはその塩、メタクリルア
ミドプロピルジメチルアミンまたはその塩およびその4
級塩、N−メチロールメタクリルアミドまたはその誘導
体等のメタクリルアミド誘導体、アクリロニトリル、メ
タシクロニトリル等のニトリル類、塩化ビニル、塩化ビ
ニリデン、フッ化ビニル、フッ化ビニリデン等のハロゲ
ン化ビニル類、酢酸イソプロペニル、N−ビニルピロリ
ドン等のほかポリオキシアルキレン、ポリオキシアルキ
レン燐酸エステル、ポリスチレン、ポリメタクリル酸メ
チル、ポリシロキサン等のマクロモノマー類が挙げられ
る。(a) Units and (b) Other units other than units (c)
is a unit constituting the main chain of the copolymer, and is composed of ethylenic monomer units other than the (a) unit and (b) unit, and there is no particular restriction on its content, but it is from 30 to 96
wt% is preferred. There is no particular restriction on the unit that can be used as the unit (e), and it is appropriately selected depending on the properties of the intended plate material. For example, if high hardness is required, a monomer that increases the glass transition temperature of the polymer is selected; conversely, if flexibility or elasticity is required, a monomer that lowers the glass transition temperature is selected. be done. Although the type of plate material is not limited depending on the glass transition temperature of the copolymer (A), examples include the following. Copolymer (A)
When the glass transition temperature is 180 to 30° C., it has rubber elasticity and is particularly suitable for use in water-based flexographic printing plates, and can also be suitably used for letterpress printing. On the other hand, when the copolymer (A) has a glass transition temperature of 30 to 100°C, it is suitably used for letterpress printing. Examples of commonly used units include the following monomer units. That is, olefins such as ethylene, propylene, l-butene, and isobutyne, methyl acrylate, methyl methacrylate, ethyl methacrylate, n-propyl methacrylate, i-propyl methacrylate, n-butyl methacrylate, and l-methacrylate. Butyl, monobutyl methacrylate, 2-ethylhexyl methacrylate, dodecyl methacrylate,
Octadecyl methacrylate, 2-hydroxyethyl methacrylate, 2-dimethylaminoethyl methacrylate or its salt, and its quaternary salt, 2-diethylaminoethyl methacrylate or its salt, and its quaternary salt, methacrylic acid (2-hydroxy) Methacrylic acid esters such as dimethylaminopropyl and 3-trimethoxysilylpropyl methacrylate, styrene, p-methylstyrene, α
- Styrenes such as styrene or its derivatives such as methylstyrene, chloromethylstyrene, p-styrenesulfonic acid or its salts, p-hydroquinestyrene or its derivatives, acrylamide, N-methylacrylamide,
N-ethylacrylamide, N,N-dimethylacrylamide, diacetone acrylamide, acrylamide propane sulfonic acid and its salts, acrylamide propyldimethylamine or its salts and its quaternary salts, N-
Acrylamide derivatives such as methylolacrylamide or its derivatives, methacrylamide, N-methylmethacrylamide, N-ethylmethacrylamide, methacrylamidepropanesulfonic acid or its salt, methacrylamidepropyldimethylamine or its salt and its 4
methacrylamide derivatives such as N-methylolmethacrylamide or its derivatives, nitriles such as acrylonitrile and metacyclonitrile, vinyl chloride, vinylidene chloride, vinyl fluoride, vinyl halides such as vinylidene fluoride, isopropenyl acetate , N-vinylpyrrolidone, etc., as well as macromonomers such as polyoxyalkylene, polyoxyalkylene phosphate, polystyrene, polymethyl methacrylate, and polysiloxane.
本発明に使用される重合性モノマーとして使用されるラ
ジカル重合可能なエチレン性モノマー(B)は、光重合
開始剤によるラジカル重合が可能なものはいずれも使用
可能であるが、本発明に使用される共重合体(A)や光
重合開始剤(C)と相溶性のよいものが好んで用いられ
、そのような例としてたとえば以下のものが挙げられる
。すなわち、エチレングリコール、ジエチレングリコー
ル、トリエチレングリコール、ポリエチレングリコール
、プロピレングリコール、ジプロピレングリコール、ポ
リプロピレングリコール、ポリテトラメチレングリコー
ル、エチレングリコールとプロピレングリコールの共重
合体等に代表されるアルキレングリコールやポリアルキ
レングリコールのモノアクリル酸エステル、モノアルキ
ルモノアクリル酸エステル、ジアクリル酸エステル、モ
ノメタクリル酸エステル、モノアルキルモノメタクリル
酸エステル、ジメタクリル酸エステル、N−2−オキシ
エチルアクリルアミド、N−2−オキジメタクリルアミ
ド、N−メチロールアクリルアミド、Nメチロールメタ
クリルアミド、N−3−オキシプロピルアクリルアミド
、N−3−オキジプロピルメタクリルアミド、N、N−
ビス(2−オキジエチル)アクリルアミド、N、N−ビ
ス(2−オキシエチル)メタクリルアミド、N−p−オ
シキフェニルアクリルアミド、N−p−オシキフェニル
メタクリルアミド、アクリルアミド、メタクリルアミド
、m−キシリレンビスアクリルアミド、mキシリレンビ
スメタクリルアミド、p−キシリレンビスアクリルアミ
ド、p−キンリレンビスメタクリルアミド、m−フェニ
レンビスアクリルアミド、m−フェニレンビスメタクリ
ルアミド、エチレンジアミンビスアクリルアミド、エチ
レンジアミンビスメタクリルアミド、ヘキサメチレンビ
スアクリルアミド、ヘキサメチレンビスメタクリルアミ
ド等のアクリルアミド誘導体、メタクリルアミド誘導体
等であり、これらの単量体は単独もしくは混合して使用
される。As the radically polymerizable ethylenic monomer (B) used as the polymerizable monomer in the present invention, any monomer that can be radically polymerized with a photopolymerization initiator can be used. Those having good compatibility with the copolymer (A) and the photopolymerization initiator (C) are preferably used, and examples of such materials include the following. That is, alkylene glycols and polyalkylene glycols represented by ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, polypropylene glycol, polytetramethylene glycol, copolymers of ethylene glycol and propylene glycol, etc. Monoacrylic ester, monoalkyl monoacrylic ester, diacrylic ester, monomethacrylic ester, monoalkyl monomethacrylic ester, dimethacrylic ester, N-2-oxyethylacrylamide, N-2-oxydimethacrylamide, N-methylol acrylamide, N-methylol methacrylamide, N-3-oxypropylacrylamide, N-3-oxypropyl methacrylamide, N,N-
Bis(2-oxyethyl)acrylamide, N,N-bis(2-oxyethyl)methacrylamide, N-p-oxycyphenylacrylamide, N-p-oxycyphenylmethacrylamide, acrylamide, methacrylamide, m-xylylenebisacrylamide, m-xylylenebismethacrylamide, p-xylylenebisacrylamide, p-quinrylenebismethacrylamide, m-phenylenebisacrylamide, m-phenylenebismethacrylamide, ethylenediaminebismethacrylamide, ethylenediaminebismethacrylamide, hexamethylenebisacrylamide, hexa These monomers include acrylamide derivatives such as methylene bismethacrylamide, methacrylamide derivatives, and the like, and these monomers may be used alone or in combination.
本発明で使用される光重合開始剤(C)は、上記説明し
た共重合体(A)とエチレン性モノマー(B)の系に溶
解するものであればよく、たとえばベンゾフェノン、ベ
ンゾイン、p、p−ツメチルベンゾイン、ベンゾインメ
チルエーテル、ベンゾインイソプロピルエーテル、アシ
ロインまたは核置換芳香族アシロインあるいはアシロイ
ンアルキルエーテル、ジアセチル、ベンジル、ケトカル
ボニル化合物、1.1−アゾシクロヘキサンカルボニト
リル、アゾニトリル、9.10−アントラキノン、クロ
ロアントラキノン、1.4−ナフトキノン、9゜10−
フエナントロキノン等が挙げられる。The photopolymerization initiator (C) used in the present invention may be one that dissolves in the system of the copolymer (A) and ethylenic monomer (B) described above, such as benzophenone, benzoin, p, p -Trimethylbenzoin, benzoin methyl ether, benzoin isopropyl ether, acyloin or nuclear substituted aromatic acyloin or acyloin alkyl ether, diacetyl, benzyl, ketocarbonyl compound, 1.1-azocyclohexanecarbonitrile, azonitrile, 9.10-anthraquinone , chloroanthraquinone, 1,4-naphthoquinone, 9゜10-
Examples include phenanthroquinone.
本発明の共重合体(A)、エチレン性モノマー(B)お
よび光重合開始剤(C)を含有する感光性樹脂組成物は
、(A)成分100重量部あたり(B)30〜250重
量部、(C)成分0.01〜15重量部の範囲で使用さ
れるのが好ましい。さらに(A)、(B)および(C)
以外の成分、たとえば通常のポリビニルアルコール系重
合体やポリアミド系重合体等を本発明の趣旨を損なわな
い範囲内で使用するのはなんらさしつかえない。また該
感光性樹脂組成物の貯蔵安定性を向上させる目的で、公
知の熱重合防止剤あるいは貯蔵安定剤を含有してもよく
、さらに必要に応じて着色剤、顔料、可塑剤等の池の添
加物を含有してもよい。また水系溶剤での現像性向上や
光効果促進のために塩基性化合物を添加することもでき
、たとえばNaOH−NaC0t、トリエタノールアミ
ン、メチルノエタノールアミン、ジメチルアミノエタノ
ール等が挙げられる。The photosensitive resin composition containing the copolymer (A), the ethylenic monomer (B), and the photopolymerization initiator (C) of the present invention contains 30 to 250 parts by weight of (B) per 100 parts by weight of component (A). , component (C) is preferably used in a range of 0.01 to 15 parts by weight. Furthermore, (A), (B) and (C)
There is no problem in using other components, such as ordinary polyvinyl alcohol polymers and polyamide polymers, within the scope of the invention. In addition, for the purpose of improving the storage stability of the photosensitive resin composition, it may contain a known thermal polymerization inhibitor or storage stabilizer, and if necessary, it may contain colorants, pigments, plasticizers, etc. It may contain additives. Further, a basic compound may be added to improve developability in an aqueous solvent or to promote a photoeffect, such as NaOH-NaC0t, triethanolamine, methylnoethanolamine, dimethylaminoethanol, and the like.
本発明の感光性樹脂組成物は、通常、アルカリ水、アル
コール、その池の溶剤からのキャストや熱溶融成形、熱
押出成形によって金属板、プラスチック板、ゴム板、ガ
ラス板等の支持体上にシート状に成形され使用される。The photosensitive resin composition of the present invention is usually cast onto a support such as a metal plate, plastic plate, rubber plate, glass plate, etc. by casting from alkaline water, alcohol, or other solvents, hot melt molding, or hot extrusion molding. It is formed into a sheet and used.
E、実施例
以下、参考例や実施例により本発明をさらに具体的に説
明するが、本発明はこれらによりなんら限定されるもの
ではない。なお参考例や実施例中の「部」および「%」
は、特にことわりのない限り、それぞれ「重量部」およ
び「重量%」を表す。E. Examples Hereinafter, the present invention will be explained in more detail with reference examples and examples, but the present invention is not limited by these in any way. In addition, "part" and "%" in reference examples and examples
represent "parts by weight" and "% by weight", respectively, unless otherwise specified.
参考例1
撹拌機、還流冷却管、窒素導入管および温度計を備えた
反応器に、酢酸ビニルモノマー2400部とメタノール
600部を仕込み、窒素ガスを15分バブリングして脱
気した。別途、2−メルカプトエタノール0.78部を
メタノール50部に溶解したチオールの初期添加液、2
−メルカプトエタノール60部にメタノールを加えて全
量を100容量部にしたチオールの連続添加液およびメ
タノール50部に22′−アゾビスイソブチロニトリル
1.81部を溶解した開始剤溶液をそれぞれ調整し、窒
素ガスのバブリングにより窒素置換した。Reference Example 1 2,400 parts of vinyl acetate monomer and 600 parts of methanol were charged into a reactor equipped with a stirrer, a reflux condenser, a nitrogen inlet tube, and a thermometer, and degassed by bubbling nitrogen gas for 15 minutes. Separately, thiol initial addition solution prepared by dissolving 0.78 parts of 2-mercaptoethanol in 50 parts of methanol, 2
- A continuous addition solution of thiol was prepared by adding methanol to 60 parts of mercaptoethanol to make the total amount 100 parts by volume, and an initiator solution was prepared by dissolving 1.81 parts of 22'-azobisisobutyronitrile in 50 parts of methanol. , Nitrogen replacement was performed by bubbling nitrogen gas.
反応器の昇温を開始し、内温か60℃となったところで
、別途調整したチオールの初期添加液と開始剤溶液をこ
の順序に添加し、重合を開始した。The temperature of the reactor was started to rise, and when the internal temperature reached 60° C., a separately prepared initial addition solution of thiol and an initiator solution were added in this order to start polymerization.
直ちにチオールの連続添加液の添加を開始し、重合を続
けた。チオールの連続添加は、重合の進行に伴う反応器
内の固形分濃度の増加に合わせて下表の値を目標に実施
した。なお固形分濃度はサンプリングによりチエツクし
た。Immediately, continuous addition of the thiol solution was started to continue polymerization. Continuous addition of thiol was carried out with the aim of achieving the values shown in the table below in accordance with the increase in solid content concentration in the reactor as the polymerization progressed. The solid content concentration was checked by sampling.
固形分(%) 10 20 30 4
0 50連続添加量(容量部) 15,5 31,
3 47.2 63.1 79.0チオールを連続添加
しながら3時間重合し、冷却して重合を停止した。この
時の固形成分濃度は51.0%で、連続添加したチオー
ル溶液は82.0容量部であった。続いて30℃1減圧
下でメタノールを時どき添加しながら、未反応の酢酸ビ
ニルモノマーの除去を行い、ポリ酢酸ビニルのメタノー
ル溶液とした。このメタノール溶液の一部をエーテル中
に投入してポリ酢酸ビニルを回収し、アセトン−エーテ
ルで2回再沈精製した後、40℃で減圧乾燥した。この
精製ポリ酢酸ビニルについて、CDCl3を溶媒にして
プロトンNMR(日本電子(株)製GX−500で測定
以下同じ)を測定したところ、数平均重合度が31の
片末端に水酸基を有する構造のポリ酢酸ビニルであった
。Solid content (%) 10 20 30 4
0 50 continuous addition amount (parts by volume) 15,5 31,
3 47.2 63.1 79.0 Polymerization was carried out for 3 hours while continuously adding thiol, and the polymerization was stopped by cooling. The solid component concentration at this time was 51.0%, and the amount of the thiol solution continuously added was 82.0 parts by volume. Subsequently, unreacted vinyl acetate monomer was removed while occasionally adding methanol under 1 reduced pressure at 30° C. to obtain a methanol solution of polyvinyl acetate. A portion of this methanol solution was poured into ether to recover polyvinyl acetate, which was purified by reprecipitation twice with acetone-ether and then dried under reduced pressure at 40°C. When this purified polyvinyl acetate was measured by proton NMR (measured using GX-500 manufactured by JEOL Ltd., the same applies hereafter) using CDCl3 as a solvent, it was found that the number average degree of polymerization was 31, and the polyvinyl acetate had a structure with a hydroxyl group at one end. It was vinyl acetate.
参考例2
参考例1に示したポリ酢酸ビニルのメタノール溶液を、
40℃、減圧下にメタノールをトルエンとともに除去す
る操作を行ない、片末端に水酸基を持つポリ酢酸ビニル
のトルエン溶液(温度63,4%)とした。撹拌機、還
流冷却器および滴下ロートを備えた反応器に、このトル
エン溶液100部とピリジン4.16部を取り、室温で
よく撹拌した。続いて直前に蒸留したメタクリル酸クロ
ライド5゜50部と脱水したトルエン10部を滴下ロー
トに取りよく混合した後、室温下撹拌しながら1時間に
わたって均一に滴下した。滴下終了後さらに3時間室温
で撹拌を続けた。次ぎにメタノールを1.70部添加し
て1時間撹拌した後、トルエン400部を4回に分けて
添加しながら減圧下40℃でトルエン、メタノール等を
留去し、生成した白色沈澱物をろ化除去して53.2%
のトルエン溶液を得た。このトルエン溶液の一部をヘキ
サン中に投入してポリ酢酸ビニルを回収し、アセトン−
ヘキサンで2回再沈精製した後、40℃で減圧乾燥した
。この精製ポリ酢酸ビニルについて、CDCl3を溶媒
にしてプロトンNMRを測定したところ、数平均重合度
が31の片末端にメタクリル酸エステル構造を有する下
記の構造のポリ酢酸ビニルマクロモノマーであった。Reference Example 2 The methanol solution of polyvinyl acetate shown in Reference Example 1 was
Methanol was removed together with toluene under reduced pressure at 40°C to obtain a toluene solution (temperature 63.4%) of polyvinyl acetate having a hydroxyl group at one end. 100 parts of this toluene solution and 4.16 parts of pyridine were placed in a reactor equipped with a stirrer, a reflux condenser, and a dropping funnel, and the mixture was thoroughly stirred at room temperature. Subsequently, 5.50 parts of methacrylic acid chloride distilled just before and 10 parts of dehydrated toluene were placed in a dropping funnel, mixed well, and then uniformly added dropwise over 1 hour while stirring at room temperature. After the dropwise addition was completed, stirring was continued for an additional 3 hours at room temperature. Next, 1.70 parts of methanol was added and stirred for 1 hour, and then toluene, methanol, etc. were distilled off at 40°C under reduced pressure while adding 400 parts of toluene in 4 portions, and the white precipitate formed was filtered. 53.2% after removing
A toluene solution of was obtained. A portion of this toluene solution was poured into hexane to recover polyvinyl acetate, and acetone
After reprecipitation purification with hexane twice, the product was dried under reduced pressure at 40°C. When this purified polyvinyl acetate was measured by proton NMR using CDCl3 as a solvent, it was found to be a polyvinyl acetate macromonomer having the following structure with a number average degree of polymerization of 31 and a methacrylic acid ester structure at one end.
CI’t。CI’t.
CH,=C
C−0−CHICH,−5(CH,−CH)n−HI3
0 0COCHjまた
GPCを、LC−6A (島津製作所(株)製)にHS
G20)1. )ISG−40Hおよびusc−60S
(島津製作所(株)製)を接続した装置を使用し、T
HF溶媒、流速1.0偽1/min、 25℃で測定(
以下の測定も同一条件)したところ、重量平均重合度と
数平均重合度の比は、P w/ P n= 2.2であ
った。CH,=C C-0-CHICH,-5(CH,-CH)n-HI3 0 0 COCH
G20)1. ) ISG-40H and usc-60S
(manufactured by Shimadzu Corporation).
HF solvent, flow rate 1.0 min/min, measured at 25°C (
The following measurements were also carried out under the same conditions), and the ratio of the weight average degree of polymerization to the number average degree of polymerization was P w / P n = 2.2.
実施例1
撹拌機、還流冷却管、窒素導入管および温度計を備えた
反応器に、参考例2で得たポリ酢酸ビニルマクロモノマ
ー(ポリ酢酸ビニル部分の数平均重合度31)のトルエ
ン溶液(濃度48.5%) 61.9部、メタクリル酸
ラウリル54部、メタクリル酸6部およびトルエン48
.1部を仕込み、室温で窒素ガスをバブリングして窒素
置換をした。反応器の昇温を開始し、内温か60℃にな
ったところで、2.2−アゾビスイソブチロニトリル0
.09部をトルエン10部に溶解し窒素置換した開始剤
溶液を添加して重合を開始し20時間撹拌下に重合を続
けた。重合停止後重合液を過剰のメタノール中に投入し
生成した重合体を回収、トルエン−メタノ再沈を繰り返
し精製し乾燥した。テトラヒドロフラン中でGPC測定
したポリスチレン概算の重量平均分子量は125000
であった。続いてこの重合体10部をテトラヒドロフラ
ン71部に溶解し、40℃に調温しLOvt%の水酸化
ナトリウムメタノール溶液29部を添加して酢酸ビニル
単位を加メタノール分解した。Example 1 A toluene solution of the polyvinyl acetate macromonomer (number average degree of polymerization of the polyvinyl acetate portion: 31) obtained in Reference Example 2 was placed in a reactor equipped with a stirrer, a reflux condenser, a nitrogen inlet tube, and a thermometer. Concentration: 48.5%) 61.9 parts, lauryl methacrylate 54 parts, methacrylic acid 6 parts, and toluene 48 parts
.. One part was charged, and nitrogen substitution was performed by bubbling nitrogen gas at room temperature. Start heating up the reactor, and when the internal temperature reaches 60°C, 2.2-azobisisobutyronitrile 0.
.. Polymerization was started by adding an initiator solution in which 09 parts of toluene was dissolved in 10 parts of toluene and replaced with nitrogen, and the polymerization was continued for 20 hours with stirring. After the polymerization was terminated, the polymerization solution was poured into excess methanol, the resulting polymer was recovered, purified by repeating toluene-methano reprecipitation, and dried. The approximate weight average molecular weight of polystyrene measured by GPC in tetrahydrofuran is 125,000.
Met. Subsequently, 10 parts of this polymer was dissolved in 71 parts of tetrahydrofuran, the temperature was adjusted to 40°C, and 29 parts of a methanol solution of sodium hydroxide of LOvt% was added to decompose the vinyl acetate unit with methanol.
反応終了後酢酸、メタノールで洗浄して乾燥しポリビニ
ルアルコールマクロモノマー単位21.3wt%、メタ
クリル酸単位70.8wt%およびメタクリル酸ラウリ
ル単位7.9wt%とからなる重合体(共重合体l)を
得た。After the reaction was completed, it was washed with acetic acid and methanol and dried to obtain a polymer (copolymer 1) consisting of 21.3 wt% polyvinyl alcohol macromonomer units, 70.8 wt% methacrylic acid units, and 7.9 wt% lauryl methacrylate units. Obtained.
(a)共重合体1100 部
(b)エチレングリコールラメタフリレート 4
0 部メタクリル酸2−エチルヘキシル 1
0 部(C)ベンゾインイソプロピルエーテル
10 部メチルヒトミキノン
0.5部上記各成分を加圧ニーグー
中に入れ70℃の加熱下15分間混練し、アルミ板上に
プレス成形して0.5mm厚の感光性樹脂板を得た。こ
の樹脂板にネガを密着させて320〜400mμの波長
を持つ水銀灯を3分照射し、未露光部を25℃のNaO
H水溶液で5分水洗、後酢酸水溶液で洗浄して網点再現
性を観察した。(a) Copolymer 1100 parts (b) Ethylene glycol methafrylate 4
0 parts 2-ethylhexyl methacrylate 1
0 parts (C) Benzoin isopropyl ether
10 parts methylhuman quinone
0.5 parts of each of the above ingredients were placed in a pressurized Neegoo and kneaded for 15 minutes under heating at 70°C, followed by press molding on an aluminum plate to obtain a 0.5 mm thick photosensitive resin plate. A negative was attached to this resin plate and irradiated with a mercury lamp with a wavelength of 320 to 400 mμ for 3 minutes, and the unexposed area was covered with NaO2 at 25°C.
After washing with an aqueous H solution for 5 minutes and then an aqueous acetic acid solution, halftone reproducibility was observed.
また樹脂板に320〜400a+μの波長を持つ水銀灯
を10分照射して全面露光した硬化物を得、5℃、30
%RH下での硬化膜の柔軟性および20℃での弾性を調
べた。In addition, the resin plate was irradiated with a mercury lamp having a wavelength of 320 to 400 a+μ for 10 minutes to obtain a cured product that was fully exposed.
The flexibility of the cured films under %RH and elasticity at 20°C were investigated.
結果を表1に示す。The results are shown in Table 1.
実施例2
撹拌機、還流冷却管、窒素導入管および温度計を備えた
反応器に、参考例2に示したと同様の方法で得たポリ酢
酸ビニルマクロモノマー(ポリ酢酸ビニル部分の数平均
重合度24)のトルエン溶液からトルエンを除去しメタ
ノール溶液としたもの(濃度48.5%) 108.2
部、メタクリル酸4.8部、ポリプロピレングリコール
モノメタクリレート92.7部およびメタノール84.
3部を仕込み、室温で窒素ガスをバブリングして窒素置
換をした。反応器の昇温を開始し内温か60℃になった
ところで2゜2゛−アゾビスイソブチロニトリル0.1
5部をメタノール10部に溶解し窒素置換した開始剤溶
液を添加して重合を開始し、20時間撹拌下に重合を続
けた。実施例1と同様にして測定したところ、重合平均
分子量は153,000であった。続いてメタノール−
5部を添加して40℃に調温し、10wt%の水酸化ナ
トリウムメタノール溶液58部を添加して酢酸ビニル単
位を加メタノール分解した。反応終了後酢酸、メタノー
ルで洗浄して乾燥しポリビニルアルコールマクロモノマ
ー単位22.6wt%、メタクリル酸単位3.8wt%
およびポリプロピレングリコールモノメタクリレート単
位73.6w’t%からなる重合体
(共重合体2)を得た。Example 2 A polyvinyl acetate macromonomer (number average degree of polymerization of the polyvinyl acetate portion) obtained in the same manner as shown in Reference Example 2 was placed in a reactor equipped with a stirrer, a reflux condenser, a nitrogen inlet tube, and a thermometer. 24) Toluene was removed from the toluene solution to make a methanol solution (concentration 48.5%) 108.2
4.8 parts of methacrylic acid, 92.7 parts of polypropylene glycol monomethacrylate and 84.9 parts of methanol.
3 parts were charged, and nitrogen substitution was performed by bubbling nitrogen gas at room temperature. When the temperature of the reactor started to rise and the internal temperature reached 60°C, 0.1 of 2゜2゛-azobisisobutyronitrile was added.
Polymerization was started by adding an initiator solution in which 5 parts were dissolved in 10 parts of methanol and the atmosphere was replaced with nitrogen, and the polymerization was continued with stirring for 20 hours. When measured in the same manner as in Example 1, the polymerization average molecular weight was 153,000. followed by methanol-
The temperature was adjusted to 40° C., and 58 parts of a 10 wt% methanol solution of sodium hydroxide was added to decompose the vinyl acetate unit with methanol. After the reaction is completed, it is washed with acetic acid and methanol and dried to give polyvinyl alcohol macromonomer units of 22.6 wt% and methacrylic acid units of 3.8 wt%.
A polymer (copolymer 2) consisting of 73.6 wt % of polypropylene glycol monomethacrylate units was obtained.
(a)共重合体2100部
(b) エチνングリコーシフメタクリレート
10部メタクリル酸2−エチルヘキシル
41メチルヒトαキノン
05部上記各成分を実施例1と同様成形して
試験した。(a) 2100 parts of copolymer (b) Ethyl glycosifu methacrylate
10 parts 2-ethylhexyl methacrylate
41 methyl human alpha quinone
05 parts Each of the above components was molded and tested in the same manner as in Example 1.
結果を表1に示す。The results are shown in Table 1.
比較例1
ベース重合体として、共重合体(A)にかえて、PVA
205 (重合度550.けん化度88モル%)を用い
た以外は、前記の実施例および2と同様にして試験を行
った。結果を表1に示す。Comparative Example 1 As the base polymer, PVA was used instead of copolymer (A).
The test was conducted in the same manner as in Examples and 2 above, except that 205 (degree of polymerization: 550, degree of saponification: 88 mol%) was used. The results are shown in Table 1.
表1
(*1) O:おり曲げても割れないもの×:おり曲
げると簡単に割れるもの
(*2)JIS−に6301の方法による20℃での測
定値O:反発弾性を示すもの
X:反発弾性を示さないもの
本発明によれば水系溶剤での現像が可能で、しかも水性
インキが使用できるだけの十分な耐水性を有した耐衝撃
性、可撓性、さらには弾性のある高級な印字品質を与え
る樹脂板となる感光性樹脂組成物が得られる。該感光性
樹脂のさらなる効果は、水性タイプのフレキソ印刷版と
して使用できるだけの弾性と耐水性を有した感光性樹脂
組成物が得られる点にある。Table 1 (*1) O: Items that do not break even when bent. ×: Items that easily break when bent. (*2) Measured value at 20°C according to JIS-6301 method. O: Items that exhibit rebound resilience. Items that do not exhibit rebound resilience According to the present invention, high-quality printing that can be developed with a water-based solvent and has sufficient water resistance to allow the use of water-based inks, has impact resistance, flexibility, and even elasticity. A photosensitive resin composition that becomes a resin plate that provides quality is obtained. A further advantage of the photosensitive resin is that a photosensitive resin composition can be obtained that has enough elasticity and water resistance to be used as a water-based flexographic printing plate.
Claims (5)
びエチレン性不飽和カルボン酸単位を含有する水不溶性
の共重合体(A)、ラジカル重合可能なエチレン性モノ
マー(B)および光重合開始剤(C)を含有することを
特徴とする感光性樹脂組成物。(1) Contains a water-insoluble copolymer (A) containing a polyvinyl alcohol macromonomer unit and an ethylenically unsaturated carboxylic acid unit, a radically polymerizable ethylenic monomer (B), and a photopolymerization initiator (C) A photosensitive resin composition characterized by:
ロモノマー単位の含有量3〜50重量%およびエチレン
性不飽和カルボン酸単位の含有量1〜20重量%である
請求項1記載の感光性樹脂組成物。(2) Photosensitivity according to claim 1, wherein the copolymer (A) has a polyvinyl alcohol macromonomer unit content of 3 to 50% by weight and an ethylenically unsaturated carboxylic acid unit content of 1 to 20% by weight. Resin composition.
で、30℃以下である請求項1または2記載の感光性樹
脂組成物。(3) The photosensitive resin composition according to claim 1 or 2, wherein the copolymer (A) has a glass transition temperature of -80°C or higher and 30°C or lower.
、100℃以下である請求項1または2記載の感光性樹
脂組成物。(4) The photosensitive resin composition according to claim 1 or 2, wherein the copolymer (A) has a glass transition temperature of higher than 30°C and lower than 100°C.
樹脂組成物からなる刷版材。(5) A printing plate material comprising the photosensitive resin composition according to any one of claims 1 to 4.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25598989A JPH03116150A (en) | 1989-09-29 | 1989-09-29 | Photosensitive resin composition and printing plate material using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25598989A JPH03116150A (en) | 1989-09-29 | 1989-09-29 | Photosensitive resin composition and printing plate material using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03116150A true JPH03116150A (en) | 1991-05-17 |
Family
ID=17286360
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25598989A Pending JPH03116150A (en) | 1989-09-29 | 1989-09-29 | Photosensitive resin composition and printing plate material using the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03116150A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3420047B1 (en) * | 2016-02-23 | 2023-01-11 | Ecolab USA Inc. | Hydrazide crosslinked polymer emulsions for use in crude oil recovery |
-
1989
- 1989-09-29 JP JP25598989A patent/JPH03116150A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3420047B1 (en) * | 2016-02-23 | 2023-01-11 | Ecolab USA Inc. | Hydrazide crosslinked polymer emulsions for use in crude oil recovery |
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