JPH03115585A - Formation of insulating film for grain oriented silicon steel sheet - Google Patents
Formation of insulating film for grain oriented silicon steel sheetInfo
- Publication number
- JPH03115585A JPH03115585A JP25213489A JP25213489A JPH03115585A JP H03115585 A JPH03115585 A JP H03115585A JP 25213489 A JP25213489 A JP 25213489A JP 25213489 A JP25213489 A JP 25213489A JP H03115585 A JPH03115585 A JP H03115585A
- Authority
- JP
- Japan
- Prior art keywords
- steel sheet
- silicon steel
- mgo
- insulating film
- annealing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910000976 Electrical steel Inorganic materials 0.000 title claims abstract description 21
- 230000015572 biosynthetic process Effects 0.000 title description 3
- 238000000137 annealing Methods 0.000 claims abstract description 14
- 239000002002 slurry Substances 0.000 claims abstract description 12
- 239000011362 coarse particle Substances 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 7
- 229910052839 forsterite Inorganic materials 0.000 abstract description 8
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 abstract description 8
- 229910000831 Steel Inorganic materials 0.000 abstract description 6
- 239000010959 steel Substances 0.000 abstract description 6
- 239000003795 chemical substances by application Substances 0.000 abstract description 5
- 230000001105 regulatory effect Effects 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000010008 shearing Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000005261 decarburization Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Chemical Treatment Of Metals (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は、方向性珪素鋼板の製造方法に係り、特に表面
のスベリ性の均一なフォルステライト絶縁被膜形成法に
関するものである。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a method for producing a grain-oriented silicon steel sheet, and particularly to a method for forming a forsterite insulating film with uniform surface smoothness.
〈従来の技術〉
方向性珪素鋼板の絶縁被膜形成に関連して、MgOを中
心とするgAst!分離剤に関する特許は、多数提案さ
れているが、それらは全て磁性向上、被膜の均一性、密
着性の改善を狙いとしており、スベリ性に関するものは
一つもない。<Prior art> In connection with the formation of an insulating film on grain-oriented silicon steel sheets, gAst!, mainly containing MgO, is used. Many patents related to separating agents have been proposed, but all of them aim to improve magnetism, film uniformity, and adhesion, and none of them relate to slipperiness.
例えば、特公昭52−31296号公報ではMgOの粒
度分布を規制しているが、その目的は均一な絶縁被膜を
得て、鋼板の凹凸歪の発生を防止するものであり、本発
明の狙いと異なり、また粒度範囲もラップするものでは
ない。For example, in Japanese Patent Publication No. 52-31296, the particle size distribution of MgO is regulated, but the purpose of this is to obtain a uniform insulation coating and prevent the occurrence of uneven distortion in the steel plate, which is the aim of the present invention. They are different and do not overlap in particle size range.
ところで、電磁鋼板を加工する段階、例えば定尺剪断時
に、寸法誤差が大きくなったり、積み重ねた場合に占積
率が低下することはしばしば経験するところである。By the way, it is often experienced that dimensional errors become large during processing of electromagnetic steel sheets, for example, when shearing them to a fixed length, or that the space factor decreases when stacked.
本発明者はこの原因が被膜表面のスベリ性にあることを
知見した。The inventor of the present invention found that the cause of this problem lies in the slipperiness of the coating surface.
〈発明が解決しようとする課題〉
そこで、本発明は、MgOを主成分として塗布する方向
性珪素鋼板の絶縁被膜形成において、定尺剪断時の寸法
誤差や占積率の低下につながる絶縁被膜表面のザラツキ
をなくすことを目的とするものである。<Problems to be Solved by the Invention> Therefore, the present invention aims to solve the problem of forming an insulation coating on a grain-oriented silicon steel sheet coated with MgO as a main component, which may lead to dimensional errors and a decrease in space factor during shearing at a fixed length. The purpose is to eliminate roughness.
〈課題を解決するための手段〉
本発明は、方向性珪素鋼板の絶縁被膜形成を目的として
鋼板表面にMgOを主成分とした焼鈍分離剤をスラリー
化して塗布する際に、その焼鈍分離剤中の200メツシ
ュ金網未通分あるいは粒度74pm以上の粗粒分を、重
量比で1,0%以下とすることを特徴とする方向性珪素
鋼板の絶縁被膜形成方法である。<Means for Solving the Problems> The present invention provides a method for applying an annealing separator containing MgO as a main component to the surface of a grain-oriented silicon steel sheet in the form of a slurry for the purpose of forming an insulating film on the surface of the steel sheet. This is a method for forming an insulating film on a grain-oriented silicon steel sheet, characterized in that the unthreaded portion of the 200-mesh wire mesh or the coarse grain portion with a particle size of 74 pm or more is 1.0% or less by weight.
〈作用〉
方向性珪素鋼板の1!!縁被膜形成は、下記の反応で行
われる。<Function> 1 of grain-oriented silicon steel sheets! ! Edge film formation is carried out with the following reaction.
510! + 2 MgO→2 MgO・SIO。510! +2 MgO→2 MgO・SIO.
sio、は、脱炭焼鈍時に鋼板表面に酸化層として形成
され、その後、焼鈍分離剤として塗布されたhgOと仕
上焼鈍中に反応して、フォルステライト被膜が形成され
る。ここで、このMgOの中に粗粒のMgOが含まれる
と粗粒11goがフォルステライト表面に固着し、表面
の粗度が大きくなり、その結果として、表面の摩擦抵抗
が大きくなり、電磁鋼板を加工する段階の定尺剪断時に
寸法誤差が太き(なったり、積み重ねた場合の占積率が
低下する等の問題が生ずることを本発明者は知見した。sio is formed as an oxide layer on the surface of the steel sheet during decarburization annealing, and then reacts with hgO applied as an annealing separator during final annealing to form a forsterite film. Here, if coarse particles of MgO are included in this MgO, the coarse particles 11go will stick to the forsterite surface, increasing the roughness of the surface, and as a result, the frictional resistance of the surface will increase, making the electrical steel sheet The inventors of the present invention have found that problems such as large dimensional errors and a decrease in the space factor when stacked are caused during shearing to a fixed length in the processing stage.
そこで、本発明者は、さらに珪素鋼板表面の付着物を精
密に分析調査したところ、その粒径は、880−150
1I、付着物の成分はMgOであり、その付着物は、フ
ォルステライト被膜の上に焼結していることが明らかと
なった。Therefore, the inventor further precisely analyzed and investigated the deposits on the surface of the silicon steel plate, and found that the particle size was 880-150.
1I, the component of the deposit was MgO, and the deposit was found to be sintered on the forsterite film.
ところで、焼鈍分離剤はスラリー状で塗布され乾燥され
ているが、塗布直前のスラリー中の粗粒比率と仕上焼鈍
後の表面のザラツキの関係を実験したところ、第1図に
示す結果を得たよごれより粗粒比率が増加するに従って
、ザラツキも増加することが明らかとなった。Incidentally, the annealing separator is applied in the form of a slurry and dried, but when we conducted an experiment to determine the relationship between the coarse particle ratio in the slurry immediately before application and the roughness of the surface after final annealing, we obtained the results shown in Figure 1. It became clear that as the ratio of coarse particles to dirt increased, the roughness also increased.
これらの知見より、MgOスラリー中の74μm以上あ
るいは200メツシュ金網未通分の粗粒分を乾燥状態の
重量比で1.0%以下とすることにより、この表面のザ
ラツキ発生を実質的に許容できる範囲に減少できること
が確認された。From these findings, the occurrence of surface roughness can be substantially tolerated by controlling the coarse particles of 74 μm or larger or those not passed through the 200-mesh wire mesh in the MgO slurry to a dry weight ratio of 1.0% or less. It was confirmed that the range could be reduced.
ところで珪素用MgOの平均粒径は1.0〜1.5μm
であり、通常は、80μm以上の粗粒分は、わずかしか
含まれていないが、粗粒分の発生原因とじては、その他
MgOをスラリーにした段階で、水への分散不良分が残
留する場合、あるいは、スラリーを塗布装置へ送給する
配管系路内に析出付着している固形物が脱落混入する場
合等も考えられる。By the way, the average particle size of MgO for silicon is 1.0 to 1.5 μm.
Usually, only a small amount of coarse particles with a diameter of 80 μm or more is included, but the cause of the coarse particles is that particles poorly dispersed in water remain when MgO is made into a slurry. In other cases, solid matter deposited in the piping system that feeds the slurry to the coating device may fall off and become mixed in.
そこで、これらの粗粒分を、減少あるいは除去する手段
として、前者の原因については、ミキサーでの攪拌効率
を良くする。後者については、フルイで濾過する等の手
段があるが、本発明においては、これらの手段を限定す
るものではない、要するに、鋼板に塗布する直前のMg
Oスラリー中の粗粒分比率を規定の範囲に維持すること
が必要である。Therefore, as a means to reduce or remove these coarse particles, for the former cause, improve the stirring efficiency in the mixer. Regarding the latter, there are methods such as filtering with a sieve, but the present invention is not limited to these methods.
It is necessary to maintain the coarse particle content ratio in the O slurry within a specified range.
当然二〇粗粒分比率は、本来O%が好ましいが、1.0
%は工業生産において、ザラツキ小で許容される上限と
して規定される。Naturally, 20 coarse particles ratio is originally preferably 0%, but 1.0
% is defined as an allowable upper limit for small roughness in industrial production.
なお粗度74μm以上と200メツシュ金網未通分とは
実質的に同一粗粒分を指している。Note that the roughness of 74 μm or more and the portion not passed through the 200-mesh wire mesh refer to substantially the same coarse particles.
〈実施例〉
Si 3.0%を含む珪素鋼板を湿水素雰囲気中で脱炭
焼鈍し、しかるのち、表1に示す3種類のMgOスラリ
ーを塗布し、コイル状に巻取り、同−箱型炉において仕
上げ焼鈍を施し、フォルステライト被膜を形成し、その
表面のザラツキを評価した。<Example> A silicon steel plate containing 3.0% Si was decarburized and annealed in a wet hydrogen atmosphere, then coated with three types of MgO slurries shown in Table 1, wound into a coil shape, and made into a box shape. Finish annealing was performed in a furnace to form a forsterite film, and the roughness of the surface was evaluated.
その結果を表1に示すが、MgOスラリー中の74μm
フルイ未通分の多いものは、表面にザラザラした付着物
が認められ、表面の摩擦係数を調査したが、明らかに差
が認められた。The results are shown in Table 1.
For those with a large amount of unfiltered material, rough deposits were observed on the surface, and when the friction coefficient of the surface was investigated, a clear difference was observed.
〈発明の効果〉
本発明により、珪素鋼板表面のスベリ性が均一となり、
珪素鋼板加工段階でのスベリ性の差による巻きずれ、定
尺剪断時の寸法誤差拡大を防止することが可能となった
。また占積率の劣化も防止できた。<Effects of the Invention> According to the present invention, the smoothness of the silicon steel sheet surface becomes uniform,
It is now possible to prevent winding misalignment due to differences in slipperiness during the processing of silicon steel sheets and the expansion of dimensional errors during shearing to a fixed length. It was also possible to prevent deterioration of the space factor.
第1図はMgOスラリー中の粗粒MgO比率と、ザラツ
キ発生率の関係を示すグラフである。FIG. 1 is a graph showing the relationship between the coarse MgO ratio in the MgO slurry and the roughness occurrence rate.
Claims (1)
MgOを主成分とした焼鈍分離剤をスラリー化して塗布
する際に、その焼純分離剤中の200メッシュ金網未通
分あるいは粒度74μm以上の粗粒分を、重量比で1.
0%以下とすることを特徴とする方向性珪素鋼板の絶縁
被膜形成方法。When applying a slurry of an annealing separator mainly composed of MgO to the surface of a grain-oriented silicon steel sheet for the purpose of forming an insulating film, the annealing separator contains particles that do not pass through the 200-mesh wire mesh or particles with a particle size of 74 μm or more. The coarse particle content is 1.
A method for forming an insulating film on a grain-oriented silicon steel sheet, the method comprising: forming an insulating film on a grain-oriented silicon steel sheet.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1252134A JP2790674B2 (en) | 1989-09-29 | 1989-09-29 | Method of forming insulating coating on grain-oriented silicon steel sheet |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1252134A JP2790674B2 (en) | 1989-09-29 | 1989-09-29 | Method of forming insulating coating on grain-oriented silicon steel sheet |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03115585A true JPH03115585A (en) | 1991-05-16 |
JP2790674B2 JP2790674B2 (en) | 1998-08-27 |
Family
ID=17232952
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1252134A Expired - Fee Related JP2790674B2 (en) | 1989-09-29 | 1989-09-29 | Method of forming insulating coating on grain-oriented silicon steel sheet |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2790674B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001083848A1 (en) * | 2000-05-01 | 2001-11-08 | Tateho Chemical Industries Co., Ltd. | Magnesium oxide particle aggregate |
WO2002034965A1 (en) * | 2000-10-25 | 2002-05-02 | Tateho Chemical Industries Co., Ltd. | Magnesium oxide particle aggregate |
US20140215860A1 (en) * | 2013-02-01 | 2014-08-07 | Stix, LLC | Magnetically coupleable footwear |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS535800A (en) * | 1976-07-05 | 1978-01-19 | Kawasaki Steel Co | Highhmagneticcflux density oneeway siliconnsteellfolstellite insulator film and method of formation thereof |
JPS6196081A (en) * | 1984-10-18 | 1986-05-14 | Kawasaki Steel Corp | Method for coating mgo in process for production of grain oriented silicon steel strip |
-
1989
- 1989-09-29 JP JP1252134A patent/JP2790674B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS535800A (en) * | 1976-07-05 | 1978-01-19 | Kawasaki Steel Co | Highhmagneticcflux density oneeway siliconnsteellfolstellite insulator film and method of formation thereof |
JPS6196081A (en) * | 1984-10-18 | 1986-05-14 | Kawasaki Steel Corp | Method for coating mgo in process for production of grain oriented silicon steel strip |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001083848A1 (en) * | 2000-05-01 | 2001-11-08 | Tateho Chemical Industries Co., Ltd. | Magnesium oxide particle aggregate |
US6835250B2 (en) | 2000-05-01 | 2004-12-28 | Tateho Chemical Industries Co., Ltd. | Magnesium oxide particle aggregate |
WO2002034965A1 (en) * | 2000-10-25 | 2002-05-02 | Tateho Chemical Industries Co., Ltd. | Magnesium oxide particle aggregate |
US6899768B2 (en) | 2000-10-25 | 2005-05-31 | Tateho Chemical Industries Co., Ltd. | Magnesium oxide particle aggregate |
US20140215860A1 (en) * | 2013-02-01 | 2014-08-07 | Stix, LLC | Magnetically coupleable footwear |
Also Published As
Publication number | Publication date |
---|---|
JP2790674B2 (en) | 1998-08-27 |
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