JPH03110554A - Production of amidophenols - Google Patents
Production of amidophenolsInfo
- Publication number
- JPH03110554A JPH03110554A JP1248793A JP24879389A JPH03110554A JP H03110554 A JPH03110554 A JP H03110554A JP 1248793 A JP1248793 A JP 1248793A JP 24879389 A JP24879389 A JP 24879389A JP H03110554 A JPH03110554 A JP H03110554A
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- nhcor
- group
- reaction
- amidophenols
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- -1 carboxylic acid halide Chemical class 0.000 claims abstract description 74
- 239000002904 solvent Substances 0.000 claims abstract description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 18
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000002798 polar solvent Substances 0.000 claims abstract description 8
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical group CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 36
- 125000000217 alkyl group Chemical group 0.000 claims description 18
- 150000001875 compounds Chemical class 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 11
- 239000003960 organic solvent Substances 0.000 claims description 11
- 125000005843 halogen group Chemical group 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 8
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical group CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 125000000623 heterocyclic group Chemical group 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 125000003277 amino group Chemical group 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 150000001408 amides Chemical class 0.000 claims description 2
- 150000002431 hydrogen Chemical group 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 15
- 238000000034 method Methods 0.000 abstract description 5
- 230000035484 reaction time Effects 0.000 abstract description 4
- 238000001556 precipitation Methods 0.000 abstract description 2
- 239000012295 chemical reaction liquid Substances 0.000 abstract 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 8
- 125000001424 substituent group Chemical group 0.000 description 8
- 150000004820 halides Chemical class 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 229910052799 carbon Inorganic materials 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical compound NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 4
- 235000017557 sodium bicarbonate Nutrition 0.000 description 4
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000005110 aryl thio group Chemical group 0.000 description 3
- 125000004104 aryloxy group Chemical group 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 125000005521 carbonamide group Chemical group 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 238000000921 elemental analysis Methods 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- DSQOWEHKNGDZLP-UHFFFAOYSA-N 2-ethyl-2-phenoxyheptadecanamide Chemical compound C(CCCCCCCCCCCCCC)C(C(=O)N)(CC)OC1=CC=CC=C1 DSQOWEHKNGDZLP-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- OPFJDXRVMFKJJO-ZHHKINOHSA-N N-{[3-(2-benzamido-4-methyl-1,3-thiazol-5-yl)-pyrazol-5-yl]carbonyl}-G-dR-G-dD-dD-dD-NH2 Chemical compound S1C(C=2NN=C(C=2)C(=O)NCC(=O)N[C@H](CCCN=C(N)N)C(=O)NCC(=O)N[C@H](CC(O)=O)C(=O)N[C@H](CC(O)=O)C(=O)N[C@H](CC(O)=O)C(N)=O)=C(C)N=C1NC(=O)C1=CC=CC=C1 OPFJDXRVMFKJJO-ZHHKINOHSA-N 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229940125904 compound 1 Drugs 0.000 description 2
- 229940126086 compound 21 Drugs 0.000 description 2
- 229940125898 compound 5 Drugs 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- ILRSCQWREDREME-UHFFFAOYSA-N dodecanamide Chemical compound CCCCCCCCCCCC(N)=O ILRSCQWREDREME-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 235000010755 mineral Nutrition 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical compound O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 2
- 125000000565 sulfonamide group Chemical group 0.000 description 2
- XZZITYVICUAZNB-UHFFFAOYSA-N (3,5-dichloro-4-ethyl-2-hydroxyphenyl)azanium;chloride Chemical compound Cl.CCC1=C(Cl)C=C(N)C(O)=C1Cl XZZITYVICUAZNB-UHFFFAOYSA-N 0.000 description 1
- LYAHJFZLDZDIOH-VURMDHGXSA-N (Z)-2-(2-furyl)-3-(5-nitro-2-furyl)acrylamide Chemical compound C=1C=COC=1/C(C(=O)N)=C/C1=CC=C([N+]([O-])=O)O1 LYAHJFZLDZDIOH-VURMDHGXSA-N 0.000 description 1
- UGMUDSKJLAUMTC-UHFFFAOYSA-N 2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-pentadecafluorooctanamide Chemical compound NC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F UGMUDSKJLAUMTC-UHFFFAOYSA-N 0.000 description 1
- AFMYXEGROVYATK-UHFFFAOYSA-N 2-carbamoylbenzenesulfonyl chloride Chemical compound NC(=O)C1=CC=CC=C1S(Cl)(=O)=O AFMYXEGROVYATK-UHFFFAOYSA-N 0.000 description 1
- PYLOWNCLKBCNPW-UHFFFAOYSA-N 2-dodecoxy-2-phenoxyacetamide Chemical compound C(CCCCCCCCCCC)OC(C(=O)N)OC1=CC=CC=C1 PYLOWNCLKBCNPW-UHFFFAOYSA-N 0.000 description 1
- HTEVSXOUBZKHQW-UHFFFAOYSA-N 2-ethyl-2-phenoxyheptanamide Chemical compound C(CCCC)C(C(=O)N)(CC)OC1=CC=CC=C1 HTEVSXOUBZKHQW-UHFFFAOYSA-N 0.000 description 1
- RRDWVDLCWOMMJX-UHFFFAOYSA-N 2-octadecoxybenzamide Chemical compound CCCCCCCCCCCCCCCCCCOC1=CC=CC=C1C(N)=O RRDWVDLCWOMMJX-UHFFFAOYSA-N 0.000 description 1
- XYBMEDCRQLHBNC-UHFFFAOYSA-N 2-pentylbenzamide Chemical compound CCCCCC1=CC=CC=C1C(N)=O XYBMEDCRQLHBNC-UHFFFAOYSA-N 0.000 description 1
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 1
- SXGXVOZDLWXVKM-UHFFFAOYSA-N 3-dodecylpyrrolidine-2,5-dione Chemical compound CCCCCCCCCCCCC1CC(=O)NC1=O SXGXVOZDLWXVKM-UHFFFAOYSA-N 0.000 description 1
- YNFCHBXJGYXTDB-UHFFFAOYSA-N 3-pentyl-2-phenoxybenzamide Chemical compound C(CCCC)C=1C(=C(C(=O)N)C=CC1)OC1=CC=CC=C1 YNFCHBXJGYXTDB-UHFFFAOYSA-N 0.000 description 1
- 125000004801 4-cyanophenyl group Chemical group [H]C1=C([H])C(C#N)=C([H])C([H])=C1* 0.000 description 1
- ZOQYQHLEDJOHOK-UHFFFAOYSA-N 6-amino-2,4-dichloro-3-methylphenol;hydron;chloride Chemical compound Cl.CC1=C(Cl)C=C(N)C(O)=C1Cl ZOQYQHLEDJOHOK-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- UWMIGHCCNWXECE-UHFFFAOYSA-N C(CCCCCCCCCCC)N1C(C(CC1=O)C1=CC=CC=C1)=O Chemical compound C(CCCCCCCCCCC)N1C(C(CC1=O)C1=CC=CC=C1)=O UWMIGHCCNWXECE-UHFFFAOYSA-N 0.000 description 1
- GRJXGXDNRHJLTC-UHFFFAOYSA-N C(CCCCCCCCCCCCCCCCC)NC(=O)C1=C2C(C(=O)NC2=O)=CC=C1 Chemical compound C(CCCCCCCCCCCCCCCCC)NC(=O)C1=C2C(C(=O)NC2=O)=CC=C1 GRJXGXDNRHJLTC-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- MHABMANUFPZXEB-UHFFFAOYSA-N O-demethyl-aloesaponarin I Natural products O=C1C2=CC=CC(O)=C2C(=O)C2=C1C=C(O)C(C(O)=O)=C2C MHABMANUFPZXEB-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- DXNQLZJOTVNBOZ-UHFFFAOYSA-N [O]C(=O)Nc1ccccc1 Chemical group [O]C(=O)Nc1ccccc1 DXNQLZJOTVNBOZ-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 238000007112 amidation reaction Methods 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- DNSISZSEWVHGLH-UHFFFAOYSA-N butanamide Chemical compound CCCC(N)=O DNSISZSEWVHGLH-UHFFFAOYSA-N 0.000 description 1
- OVIZSQRQYWEGON-UHFFFAOYSA-N butane-1-sulfonamide Chemical compound CCCCS(N)(=O)=O OVIZSQRQYWEGON-UHFFFAOYSA-N 0.000 description 1
- DVECBJCOGJRVPX-UHFFFAOYSA-N butyryl chloride Chemical compound CCCC(Cl)=O DVECBJCOGJRVPX-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- COMFSPSZVXMTCM-UHFFFAOYSA-N dodecane-1-sulfonimidic acid Chemical compound CCCCCCCCCCCCS(N)(=O)=O COMFSPSZVXMTCM-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- ZCRZCMUDOWDGOB-UHFFFAOYSA-N ethanesulfonimidic acid Chemical compound CCS(N)(=O)=O ZCRZCMUDOWDGOB-UHFFFAOYSA-N 0.000 description 1
- 150000002168 ethanoic acid esters Chemical class 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- ARBOVOVUTSQWSS-UHFFFAOYSA-N hexadecanoyl chloride Chemical compound CCCCCCCCCCCCCCCC(Cl)=O ARBOVOVUTSQWSS-UHFFFAOYSA-N 0.000 description 1
- YWGHUJQYGPDNKT-UHFFFAOYSA-N hexanoyl chloride Chemical compound CCCCCC(Cl)=O YWGHUJQYGPDNKT-UHFFFAOYSA-N 0.000 description 1
- 125000005462 imide group Chemical group 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- HNQIVZYLYMDVSB-UHFFFAOYSA-N methanesulfonimidic acid Chemical compound CS(N)(=O)=O HNQIVZYLYMDVSB-UHFFFAOYSA-N 0.000 description 1
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- PJPQRXHORPQPNC-UHFFFAOYSA-N n-butyldecanamide Chemical compound CCCCCCCCCC(=O)NCCCC PJPQRXHORPQPNC-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- NLWIMJPEFDUCJU-UHFFFAOYSA-N nonane-1-sulfonamide Chemical compound CCCCCCCCCS(N)(=O)=O NLWIMJPEFDUCJU-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
- 125000004149 thio group Chemical group *S* 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Nitrogen- Or Sulfur-Containing Heterocyclic Ring Compounds With Rings Of Six Or More Members (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は写真用薬品に供されるアミドフェノール類の製
造方法に関し、さらに詳しくは簡便かつ高収率で高純度
の目的物を得ることができるアミドフェノール類の製造
方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for producing amide phenols used in photographic chemicals, and more specifically, to a method for producing amide phenols used in photographic chemicals, and more specifically, a method for producing a highly purified target product in a simple manner and in a high yield. The present invention relates to a method for producing amidophenols.
一般にカラー写真用薬品として用いられるアミドフェノ
ール化合物を製造する場合は、アミノ化合物と酸ハライ
ドとの反応を利用するのが一般的である。例えば特開昭
60−24547号公報には5−アミノ−2−アミドフ
ェノールと酸ハライドとの反応例が記載されているが、
5−アミノ2−アミドフェノールをアセトニトリルと酢
酸エチルに懸濁させ、酸ハライドを1時間で滴下した後
、4時間加熱還流し、次いで冷却して結晶を濾取後、酢
酸エチル/n−ヘキサンで再結晶して目的とするアミド
化合物を得ている。また特開昭61−69065号公報
では5〜アミノ−2−アミドフェノールをジメチルアセ
トアミドに溶解し、カルボン酸ハライドを滴下して反応
させ、その反応生成物を室温で撹拌後、水及び酢酸エチ
ルを添加し、目的とするアミドフェノール化合物を酢酸
エチルにより抽出し、この酢酸エチル層を水で洗浄後N
a縮し、更にこの濃縮物をメタノールに加熱溶解後、晶
析させることにより目的とするアミドフェノール化合物
を得ている。When producing amide phenol compounds, which are generally used as chemicals for color photography, it is common to utilize a reaction between an amino compound and an acid halide. For example, JP-A No. 60-24547 describes an example of the reaction between 5-amino-2-amidophenol and an acid halide.
5-amino 2-amidophenol was suspended in acetonitrile and ethyl acetate, and acid halide was added dropwise over 1 hour. The mixture was heated under reflux for 4 hours, cooled, and the crystals were collected by filtration. The desired amide compound was obtained by recrystallization. Furthermore, in JP-A No. 61-69065, 5-amino-2-amidophenol is dissolved in dimethylacetamide, carboxylic acid halide is added dropwise to react it, and after stirring the reaction product at room temperature, water and ethyl acetate are dissolved. The desired amide phenol compound was extracted with ethyl acetate, and the ethyl acetate layer was washed with water and then soaked with N.
The desired amide phenol compound is obtained by condensing the mixture, heating and dissolving this concentrate in methanol, and crystallizing it.
しかし特開昭60−24547号公報に記載された製造
法は、反応時間が長くかつ高温反応であるため不純物が
副生じ、目的物の含量が低下するため再結晶が必要であ
ること、また反応で副生ずるHCIガスの中和・除去が
行われていないため、晶析・濾過・乾燥などの後処理工
程で設備の腐食が問題となるし、目的物の収率も60%
程度と低い。However, the production method described in JP-A No. 60-24547 requires a long reaction time and a high temperature reaction, so impurities are produced as by-products and the content of the target product decreases, requiring recrystallization. Since the HCI gas produced as a by-product is not neutralized or removed, corrosion of equipment becomes a problem in post-processing steps such as crystallization, filtration, and drying, and the yield of the target product is also 60%.
The degree is low.
また特開昭61−69065号公報に記載された製造法
は、反応生成物を水と酢酸エチルで抽出水洗して、まず
良溶媒のジメチルアセトアミドと酸分を除去し、次いで
酢酸エチル層を濃縮後貧溶媒のメタノールで置換晶析し
、目的とするアミド化合物を得ているが、この製造法で
は抽出時に中和を行っていないため酸分が残存し、後処
理工程で設備の腐食が生じること、さらに酢酸エチル層
の濃縮、貧溶媒への置換が必要なことから作業面で煩雑
である。また晶析濾液へのロスが大きく、収率も84%
と低い。In addition, the production method described in JP-A No. 61-69065 involves extracting and washing the reaction product with water and ethyl acetate to first remove dimethylacetamide, a good solvent, and the acid component, and then concentrating the ethyl acetate layer. The target amide compound is obtained by substitutional crystallization with methanol, which is a poor solvent. However, this production method does not perform neutralization during extraction, so acid content remains and corrosion of equipment occurs in the post-processing process. In addition, it is complicated in terms of work because it requires concentration of the ethyl acetate layer and replacement with a poor solvent. Also, there is a large loss to the crystallization filtrate, and the yield is 84%.
and low.
本発明は、アミノフェノール類とカルボン酸ハライドと
の反応により生成するアミドフェノール類を高純度かつ
高収率で得ることにあり、しかも反応時間が短く、かつ
簡便な操作と特別な反応容器を使用せずにアミドフェノ
ール類を得る、−船釣で大量生産に適した製造法の提供
にある。The present invention aims to obtain amide phenols produced by the reaction of aminophenols and carboxylic acid halides with high purity and high yield, and moreover, requires a short reaction time, and uses simple operation and a special reaction vessel. To provide a manufacturing method suitable for mass production by boat fishing, to obtain amide phenols without having to do so.
本発明のアミドフェノール類の製造方法は、2−アミノ
フェノール類または5−アミノ−2−アミドフェノール
類とカルボン酸ハライドとを、水と混和しない有i溶媒
を添加した極性溶媒及びアルカリ水溶液とからなる不均
一系中で反応させてアミドフェノール類を生成させた後
、分離した有機溶媒層に貧溶媒を加えてアミドフェノー
ル類を沈澱させることを特徴とする。The method for producing amidophenols of the present invention is to prepare 2-aminophenols or 5-amino-2-amidophenols and a carboxylic acid halide from a polar solvent and an alkaline aqueous solution to which a water-immiscible solvent is added. The method is characterized in that after reacting in a heterogeneous system to produce amide phenols, a poor solvent is added to the separated organic solvent layer to precipitate the amide phenols.
以下、本発明の詳細な説明する。The present invention will be explained in detail below.
2−アミノフェノール類または5−アミノ−2−アミド
フェノール類は、下記式(1)で示されX
(式中Rは、−NH!(・M)n又は−N HCORt
Wは、水素原子、
Xは、水素又はカシプリング離脱基、
Yは、上記Rが−NHz CM)、基の時には、水素
、低級アルキル基又は
−NHCOR,、
上記Rが−NHCOR1基の時には
N Hz (・M)、。2-aminophenols or 5-amino-2-amidophenols are represented by the following formula (1) X (wherein R is -NH!(・M)n or -N HCORt
W is a hydrogen atom; (・M),.
Zは、水素又はハロゲン原子、
Rz、Rxは、同一でも異なっていてもよく、それぞれ
アルキル基、アリール基
又はへテロ環、
Mは、アミノ基と塩を作り得る酸、
nは、0又は1
を示す、)
アミノフェノール類は、1つの水酸基と1つの遊離アミ
ノ基を有し、他に通常ベンゼン核に置換しうる一OH,
−NH!以外の任意の置換基を有していてもよい。アミ
ノ基は塩の形でもよく、Mは鉱酸又は有機酸である。Z is hydrogen or a halogen atom; Rz and Rx may be the same or different and each represents an alkyl group, an aryl group, or a heterocycle; M is an acid capable of forming a salt with an amino group; n is 0 or 1 ) Aminophenols have one hydroxyl group and one free amino group, in addition to 1OH, which can be substituted on the benzene nucleus.
-NH! It may have any substituent other than. The amino group may also be in the form of a salt, and M is a mineral or organic acid.
また、カルボン酸ハライドは下記式(n)で示される。Further, the carboxylic acid halide is represented by the following formula (n).
R,COX ・・・(I[)(
式中R1は、アルキル基、Xはハロゲン原子を示す。)
カルボン酸ハライドに含まれる炭素数は1〜30であり
、好ましくは式(U>で示され、ハライドを構成するハ
ロゲン原子は塩素が好ましい。R, COX...(I[)(
In the formula, R1 represents an alkyl group, and X represents a halogen atom. ) The number of carbon atoms contained in the carboxylic acid halide is 1 to 30, preferably represented by the formula (U>), and the halogen atom constituting the halide is preferably chlorine.
R8のアルキル基は置換基を有していてもよい。The alkyl group of R8 may have a substituent.
置換基は、カルボン酸ハライドとは反応しにくい置換基
であることが好ましい。これらの好ましい置換基の例は
、了り−ルオキシ基、了り−ル基、アリールチオ基、ハ
ロゲン原子、ヒドロキシ基である。The substituent is preferably a substituent that hardly reacts with carboxylic acid halide. Examples of these preferred substituents are an aryoloxy group, an arylthio group, an arylthio group, a halogen atom, and a hydroxyl group.
生成するアミドフェノール類は下記式(I[[)%式%
(式中R’ は、−NHCOR,又は−N HCORt
Y″は、上記R″が−NHCOR,の時には−NHCO
R,又は低級アルキル基
上記R゛が、−NHCORlの時には
−NHCOR,を示し、
他は上記式(+)、(II)と同じである。)で示され
る化合物である。The generated amide phenols have the following formula (I[[)% formula% (in the formula, R' is -NHCOR, or -NHCORt
Y'' is -NHCO when the above R'' is -NHCOR.
When R or the lower alkyl group R is -NHCORl, it represents -NHCOR, and the others are the same as in formulas (+) and (II) above. ) is a compound represented by
式(1)〜(I[I)について、さらに詳しく説明する
。これらの式中Rt、Rj又はR2のアルキル基は、直
鎖、分枝鎖、環状いずれでもよく、またN換アルキル基
をも包含する。ここで置換基としてはハロゲン原子(例
えば塩素原子、フッ素原子)、アルコキシ基(例えばメ
トキシ、プロポキシ、アミルオキシメトキシ、オクトキ
シ、ドデシルオキシ、シアミルシクロへキシルオキシ、
オクタデシルオキシ)、アルキルチオ基(例えばメチル
チオ、ブチルチオ、オクチルチオ、ドデシルチオ、オク
タデシルチオ)、アリールオキシ基(例えばフェノキシ
、アミルフェノキシ、シアミルフェノキシ、ペンタデシ
ルフェノキシ、ドデシルオキシフェノキシ、クロロテト
ラデシルフェノキシ、オクタデカンアミドフェノキシ、
N−メチル−N−オクタデシルスルファモイルフェノキ
シ、ジ(メトキシカルボニル)フェノキシ、ドデシルサ
クシンイミドフェノキシ)、カルボンアミド基(例えば
N−ブチルデカンアミド、シアミルフェノキシアセトア
ミド、オクタデシルオキシベンズアミド、ペンタデシル
フェノキシブタンアミド)、カルバモイル基(例えばN
、N−ジエチルカルバモイル、N−ヘキサデシルカルバ
モイル、N−テトラデシルオキシフェニルカルバモイル
、N−ブチル−N−ドデシルカルバモイル、N−シアミ
ルフェノキシフェニルカルバモイル)、アルコキシカル
ボニル基(例えばエトキシカルボニル、ドデシルオキシ
カルボニル、エトキシカルボニルペンタデシルオキシカ
ルボニル)、了り−ル基(例えばフェニル、トリデシル
カルボニルフェニル、N−テトラデシルスルフォニルフ
ェニル、シアミルフェノキシアセトアミドフェニル、ヘ
キサデシルオキシフェニル、エトキシカルボニルドデシ
ルオキシフェニル、メトキシカルポニルヘネイコサンア
ミドフェニル、オクタデシルサクシンイミドフェニル)
、複素環基(例えばN−ドデシルフェニルサクシンイミ
ド、ドデシルサクシンイミド、オクタデシルカルバモイ
ルフタリミド)等が挙げられる。Formulas (1) to (I[I) will be explained in more detail. In these formulas, the alkyl group represented by Rt, Rj or R2 may be linear, branched or cyclic, and also includes N-substituted alkyl groups. Here, substituents include halogen atoms (e.g. chlorine atom, fluorine atom), alkoxy groups (e.g. methoxy, propoxy, amyloxymethoxy, octoxy, dodecyloxy, cyamylcyclohexyloxy,
octadecyloxy), alkylthio groups (e.g. methylthio, butylthio, octylthio, dodecylthio, octadecylthio), aryloxy groups (e.g. phenoxy, amylphenoxy, cyamylphenoxy, pentadecylphenoxy, dodecyloxyphenoxy, chlorotetradecylphenoxy, octadecaneamidophenoxy) ,
N-methyl-N-octadecylsulfamoylphenoxy, di(methoxycarbonyl)phenoxy, dodecylsuccinimidophenoxy), carbonamide groups (e.g. N-butyldecanamide, cyamylphenoxyacetamide, octadecyloxybenzamide, pentadecylphenoxybutanamide) ), carbamoyl group (e.g. N
, N-diethylcarbamoyl, N-hexadecylcarbamoyl, N-tetradecyloxyphenylcarbamoyl, N-butyl-N-dodecylcarbamoyl, N-cyamylphenoxyphenylcarbamoyl), alkoxycarbonyl groups (e.g. ethoxycarbonyl, dodecyloxycarbonyl, ethoxycarbonylpentadecyloxycarbonyl), oryl groups (e.g. phenyl, tridecylcarbonylphenyl, N-tetradecylsulfonylphenyl, cyamylphenoxyacetamidophenyl, hexadecyloxyphenyl, ethoxycarbonyldodecyloxyphenyl, methoxycarponylheneico) Sanamidophenyl, octadecylsuccinimidophenyl)
, heterocyclic groups (for example, N-dodecyl phenylsuccinimide, dodecylsuccinimide, octadecylcarbamoylphthalimide), and the like.
前記−綴代(f)もしくは(il+)において、R2又
はR4で示されるアリール基は、置換了り−ル基をも包
含する。ここで置換基としてはアルキル基(例えばアミ
ル、オクタデシル)、アリール基(例えばフェニル、ト
リル)、アルコキシ基(例えばアミルオキシ)、アリー
ルオキシ基(例えばフェノキシ、アミルフェノキシ、シ
アミルフェノキシ)、カルボンアミド基(例えばアミル
フェノキシブタンアミド、アミルフェノキシベンズアミ
ド、ジ(メトキシカルボニル)フェニルカルバモイルペ
ンタンアミド、ジ(メトキシカルボニルメトキシ)ベン
ズアミド)、スルフアモイル基(例えばジ(メトキシカ
ルボニル)フェニルスルファモイル、オクタデシルスル
フ1モイル)等が挙げられる。The aryl group represented by R2 or R4 in the above-mentioned -spelling allowance (f) or (il+) also includes a substituted -l group. Examples of substituents here include alkyl groups (e.g. amyl, octadecyl), aryl groups (e.g. phenyl, tolyl), alkoxy groups (e.g. amyloxy), aryloxy groups (e.g. phenoxy, amylphenoxy, cyamylphenoxy), carbonamide groups ( For example, amylphenoxybutanamide, amylphenoxybenzamide, di(methoxycarbonyl)phenylcarbamoylpentanamide, di(methoxycarbonylmethoxy)benzamide), sulfamoyl group (e.g. di(methoxycarbonyl)phenylsulfamoyl, octadecylsulf 1 moyl), etc. can be mentioned.
前記−綴代(1)もしくは(I[l)において、W。In the above-mentioned binding allowance (1) or (I[l), W.
Y及びZは同一でも異なってもよく、各々、水素原子、
ハロゲン原子(例えば塩素原子、臭素原子)、アルキル
基(例えばメチル、オクチル、ペンタデシル)、アリー
ル基(例えばフェニル、アミルフェニル)、アルコキシ
基(例えばメトキシ、ドデシルオキシ)、カルボンアミ
ド基(例えばアセトアミド、ベンズアミド、ドデカンア
ミド、シアミルフェノキシアセトアミド、クロロスルホ
ニルベンズアミド、アミルベンズアミド、フリルアミド
、ジ(メトキシカルボニル)フェニルカルバモイルペン
タンアミド、ペンタデシルフェノキシブタンアミド、テ
トラフルオロプロパンアミド、パーフルオロオクタンア
ミド、ブチルヒドロキシフェノキシテトラデカンアミド
、ドデシルオキシフェノキシアセトアミド、ドデカフル
オロへブタンアミドベンズアミド)、スルホンアミド基
(例えばメチルスルホンアミド、ドデシルスルホンアミ
ド、フェニルスルホンアミド、N−ドデカンアミドフェ
ニルスルホンアミド)、カルバモイル基(例えばN、N
−ジエチルカルバモイル基、N−ブチル−N−ドデシル
カルバモイル、フェニルカルバモイル)、またはスルフ
ァモイル(メチルスルファモイル、オクチルスルファモ
イル、N、N−ジエチルスルファモイル、フェニルスル
ファモイル)を表す。Y and Z may be the same or different, and each represents a hydrogen atom,
Halogen atoms (e.g. chlorine atom, bromine atom), alkyl groups (e.g. methyl, octyl, pentadecyl), aryl groups (e.g. phenyl, amyl phenyl), alkoxy groups (e.g. methoxy, dodecyloxy), carbonamide groups (e.g. acetamide, benzamide) , dodecaneamide, cyamylphenoxyacetamide, chlorosulfonylbenzamide, amylbenzamide, furylamide, di(methoxycarbonyl)phenylcarbamoylpentanamide, pentadecylphenoxybutanamide, tetrafluoropropanamide, perfluorooctaneamide, butylhydroxyphenoxytetradecanamide, dodecyloxyphenoxyacetamide, dodecafluorohebutanamide benzamide), sulfonamide groups (e.g. methylsulfonamide, dodecylsulfonamide, phenylsulfonamide, N-dodecanamide phenylsulfonamide), carbamoyl groups (e.g. N,N
-diethylcarbamoyl group, N-butyl-N-dodecylcarbamoyl, phenylcarbamoyl), or sulfamoyl (methylsulfamoyl, octylsulfamoyl, N,N-diethylsulfamoyl, phenylsulfamoyl).
また前記−綴代(1)もしくは(IIりにおいて、Xは
水素原子またはカンプリング離脱基を表す。In addition, in the above-mentioned (1) or (II), X represents a hydrogen atom or a Campling leaving group.
ここでカンプリング離脱基なる語は、写真用色形成カプ
ラーの分野において通常よく用いられる用語であって、
写真用色形成カプラーがカラー現像主薬(例えば芳香族
−級アミン現像主薬)の酸化生成物とカンプリングする
際、離脱し得る原子または基を包含する。カンプリング
離脱基の例としては、ハロゲン原子(例えば塩素原子、
フッ素原子、ヨウ素原子)、アルコキシ基(例えばメト
キシ、プロポキシ、メトキシエトキシ、メチルスルファ
モイルエトキシ、N−プロピルアミノプロポキシ)、ア
リールオキシ基(例えばフェノキシ、エチルフェノキシ
、クロロフヱノキシ、ニトロフェノキシ、アミノフェノ
キシ、ブチルカルバモイルフェノキシ、エチルスルファ
モイルフェノキシ、フェニルスルホニルフェノキシ、ナ
フチルオキシ)、カルボニルオキシ基(例えばアセデル
オキシ、ブチロイルオキシ、ベンゾイルオキシ、アミル
ベンゾイルオキシ、ステアロイルオキシ、エトキシカル
ボニルオキシ、フェノキシカルボニルオキシ、カルバモ
イルオキシ、メチルカルバモイルオキシ、フェニルカル
バモイルオキシ)、スルホニルオキシ基(例えばメチル
スルホニルオキシ、エトキシエチルスルホニルオキシ、
N−メチルアミノエチルスルホニルオキシ、メチルスル
ホニルプロピルスルホニルオキシ)、スルホンアミド基
(例えばエチルスルホンアミド、ブチルスルホンアミド
、ノニルスルホンアミド、フェニルスルホンアミド、ナ
フチルスルホンアミド)、アリールアゾ基(例えばフェ
ニルアゾ、ナフチルアゾ)、アルキルチオ基(例えばメ
チルチオ、オクヂルチオ)、アリールチオ基(例えばフ
ェニルチオ、ニトロフェニルチオ)、ヘテロ環チオ基(
例えばテトラゾリルチオ、ベンツチアゾリルチオ、ベン
ツオキサゾリルチオ)、ヘテロ環基(例えばトリアゾリ
ル、ベンツトリアゾリル)、環状イミド基(例えばサク
シンイミド、フタルイミド)等が挙げられる。Here, the term "campling separation group" is a term commonly used in the field of photographic color-forming couplers.
Photographic color-forming couplers include atoms or groups that can be dissociated upon campling with the oxidation products of color developing agents (e.g., aromatic-grade amine developing agents). Examples of campling leaving groups include halogen atoms (e.g. chlorine atoms,
fluorine atom, iodine atom), alkoxy groups (e.g. methoxy, propoxy, methoxyethoxy, methylsulfamoylethoxy, N-propylaminopropoxy), aryloxy groups (e.g. phenoxy, ethylphenoxy, chlorophenoxy, nitrophenoxy, aminophenoxy, butyloxy) carbonyloxy groups (e.g. acedeloxy, butyroyloxy, benzoyloxy, amylbenzoyloxy, stearoyloxy, ethoxycarbonyloxy, phenoxycarbonyloxy, carbamoyloxy, methylcarbamoyloxy) , phenylcarbamoyloxy), sulfonyloxy groups (e.g. methylsulfonyloxy, ethoxyethylsulfonyloxy,
N-methylaminoethylsulfonyloxy, methylsulfonylpropylsulfonyloxy), sulfonamide groups (e.g. ethylsulfonamide, butylsulfonamide, nonylsulfonamide, phenylsulfonamide, naphthylsulfonamide), arylazo groups (e.g. phenylazo, naphthylazo), Alkylthio groups (e.g. methylthio, ocdylthio), arylthio groups (e.g. phenylthio, nitrophenylthio), heterocyclic thio groups (
Examples include tetrazolylthio, benzthiazolylthio, benzoxazolylthio), heterocyclic groups (eg, triazolyl, benztriazolyl), and cyclic imide groups (eg, succinimide, phthalimide).
弐N)の中で、好ましい組み合わせは、R=N+(z
(−M)、1
W=H
X=01、又はOもしくはNで離脱する離脱基Y=メチ
ル基又はエチル基
z=x=c I!
又は
R= −N HCORz
W=H
X=CZ、又はOもしくはNで離脱する離脱基Y=NH
,(−M)。2N), the preferred combination is R=N+(z
(-M), 1 W=H X=01, or leaving group Y=methyl or ethyl group z=x=c I! or R= -N HCORz W=H X=CZ, or leaving group Y=NH leaving at O or N
, (-M).
−H ある。-H be.
前記−綴代において、R+、Rzが無置換のアルキル基
、フッ素原子により部分的にもしくは完全に置換された
アルキル基、または次の一般式(IV)または(V)で
示される基である化合物は特に宵月である。A compound in which R+ and Rz in the above-mentioned binding margin are an unsubstituted alkyl group, an alkyl group partially or completely substituted with a fluorine atom, or a group represented by the following general formula (IV) or (V). Especially on Yoigetsu.
(式中、Aはアルキル基、R8は水素原子またはアルキ
ル基を、R2及びR1は、同一でも異なってもよく、各
々、水素原子、アルキル基またはアルコキシ基を、nは
0または1を表す。)(V)
(式中、R4及びR1は、同一でも異なってもよく、各
々アルキル基を表す、)
本発明で使用される極性溶媒とは、分子内部に固定的に
電子双極子をもつ液体であって、かなり大きな誘電率を
もつものをいい、−C式(I)で示される化合物を溶解
するものが望ましい。好ましくは25℃において、比誘
電率εが10〜200の液体である。これらの液体は、
例えば化学便覧(改定3版、基礎編11−502ページ
)J、A。(In the formula, A is an alkyl group, R8 is a hydrogen atom or an alkyl group, R2 and R1 may be the same or different and each represents a hydrogen atom, an alkyl group, or an alkoxy group, and n represents 0 or 1. )(V) (In the formula, R4 and R1 may be the same or different and each represents an alkyl group.) The polar solvent used in the present invention is a liquid that has an electronic dipole fixedly inside the molecule. , which has a fairly large dielectric constant, and is preferably one that can dissolve the compound represented by the -C formula (I). Preferably, the liquid has a dielectric constant ε of 10 to 200 at 25°C. These liquids are
For example, Chemistry Handbook (revised 3rd edition, basic edition, pages 11-502) J, A.
Riddick[“Organic 5olvent
s (John Wiley & 5ons
。Riddick[“Organic 5olvent
s (John Wiley & 5ons
.
1986)により容易に特定できる。より好ましいεは
30〜40である。ジメチルホルムアミド(No、44
2>DMF ε=36.71、及びジメチルアセトア
ミド(No、445)DMACε=37.78は最も好
ましい。(1986) can be easily identified. More preferable ε is 30-40. Dimethylformamide (No. 44)
2>DMF ε=36.71 and dimethylacetamide (No, 445) DMAC ε=37.78 are most preferred.
また極性溶媒は1種以上を混合して使用でき、この場合
には混合物のεが規定の範囲にあればよい。極性溶媒は
少なくとも10容量%、好ましくは]、 5−100容
量%使用する(内%)。Further, one or more types of polar solvents can be used as a mixture, and in this case, it is sufficient that ε of the mixture is within a specified range. The polar solvent is used in an amount of at least 10% by volume, preferably 5-100% by volume.
使用する因は一般式(+)の化合物の0.1〜100重
量部であり、好ましくは0. 1〜10重量部であり、
特に好ましくは0.3〜2重量部である。The factor used is 0.1 to 100 parts by weight of the compound of general formula (+), preferably 0.1 to 100 parts by weight. 1 to 10 parts by weight,
Particularly preferably 0.3 to 2 parts by weight.
添加する有機溶媒としては、水と混和しない溶媒が好ま
しく、例えばトルエン、酢酸エチルであり、使用する量
は一般式(1)で示される化合物に対して0.1〜10
0重量部であり、好ましくは1〜10重量部、特に好ま
しくは1.5〜5重量部である。The organic solvent to be added is preferably a solvent that is immiscible with water, such as toluene or ethyl acetate, and the amount used is 0.1 to 10% based on the compound represented by general formula (1).
0 parts by weight, preferably 1 to 10 parts by weight, particularly preferably 1.5 to 5 parts by weight.
また反応に使用するアルカリ化合物は、炭酸水素ナトリ
ウム、炭酸水素カリウムいずれでもよく、水に対して溶
解していても、してなくともよい。The alkaline compound used in the reaction may be either sodium hydrogen carbonate or potassium hydrogen carbonate, and may or may not be dissolved in water.
アルカリ化合物の使用量は、−綴代(1)で示される化
合物に対して0.5〜2当量であり、好ましくは当量で
ある。The amount of the alkali compound to be used is 0.5 to 2 equivalents, preferably equivalent, to the compound represented by (1).
また−綴代(1)で示される化合物がアミン塩であれば
、これをフリー化するための量の炭酸水素塩を添加する
ことが望ましい。この炭酸水素塩水溶液は、−度に添加
しても、滴下して添加してもよい。Moreover, if the compound represented by - Tsuzuriyo (1) is an amine salt, it is desirable to add an amount of hydrogen carbonate to free it. This aqueous hydrogen carbonate solution may be added in batches or dropwise.
貧溶媒とは、目的物たるアミド類を溶解しない又はほと
んど溶解しない溶媒である。A poor solvent is a solvent that does not dissolve or hardly dissolves the target amide.
例えば低級アルコール類、n−ヘキサン等の石油系溶媒
、アセトニトリル、水等がある。低級アルコール類は炭
素数1〜10までのものであり、好ましくはメタノール
、エタノール、イソプロパツールであり、特に好ましく
はメタノールである。Examples include lower alcohols, petroleum solvents such as n-hexane, acetonitrile, water, and the like. The lower alcohol has 1 to 10 carbon atoms, preferably methanol, ethanol, and isopropanol, particularly preferably methanol.
使用にあたっては含水アルコール、含水アセトニトリル
の形で使用するとよく、アルコール及び水の量は、水と
混和しない有′a溶媒である酢酸エステル類のO,1〜
10重量部であり、好ましくは0.3〜4重量部であり
、特に好ましくは0.3〜2重量部である。When using it, it is best to use it in the form of hydrous alcohol or acetonitrile, and the amount of alcohol and water is determined by the amount of O,1 to acetic acid esters, which are aqueous solvents that are immiscible with water.
The amount is 10 parts by weight, preferably 0.3 to 4 parts by weight, particularly preferably 0.3 to 2 parts by weight.
本発明において、まず−綴代(1)に示すアミノフェノ
ール又はその鉱酸塩を、水と混和しない有機溶媒および
アルカリ水溶液を極性溶媒中に添加した不均一系中に添
加し、攪拌する。次いで、−綴代(II)で示す酸ハラ
イドを添加して反応させる。酸ハライドの量はアミノフ
ェノールに対し0.5〜2.0当量であるが、コストメ
リット、反応性を考慮すると、1.0〜1.2当量であ
り、特に好ましくは「実質的に当モル」である1、
0〜1.02当盪である。In the present invention, first, the aminophenol or its mineral acid salt shown in (1) is added to a heterogeneous system in which a water-immiscible organic solvent and an alkaline aqueous solution are added to a polar solvent, and the mixture is stirred. Next, an acid halide represented by (II) is added and reacted. The amount of acid halide is 0.5 to 2.0 equivalents relative to the aminophenol, but considering cost merit and reactivity, it is 1.0 to 1.2 equivalents, and particularly preferably ``substantially equimolar amount''. ” 1,
It is 0 to 1.02 points.
また、反応温度は一20°C〜40℃が良く、好ましく
は0℃〜30℃である。Further, the reaction temperature is preferably -20°C to 40°C, preferably 0°C to 30°C.
反応時間は、酸ハライドの投入直後から10時間程度ま
で問題はないが、生産性を考慮すると1時間以内が望ま
しい。Although there is no problem with the reaction time up to about 10 hours immediately after the addition of the acid halide, in consideration of productivity it is preferably within 1 hour.
反応終了後、攪拌を止め2層に分離する水層を分液除去
し、有1t9ン容媒層にアルコール類、水を添加し、目
的とするアミド化合物を沈澱させる。After the reaction is completed, stirring is stopped, the aqueous layer is separated into two layers, and an alcohol and water are added to the aqueous medium layer to precipitate the desired amide compound.
本発明の方法により製造されるアミノフェノール類の具
体的化合物例を以下に示す。しかし本発明はこれら化合
物にのみ限定されるものではない。Specific examples of aminophenols produced by the method of the present invention are shown below. However, the present invention is not limited only to these compounds.
(以下余白) 但し、 下表において (t)CsHロア を示す。(Margin below) however, In the table below (t) CsH lower shows.
() 内のnはアルキル基炭素数、 また (n。() n is the number of carbon atoms in the alkyl group, Also (n.
2) における2は、 (n。2) 2 in is, (n.
2) 基にお ける置換基Zを表す。2) Based on represents a substituent Z.
一般にこの種アミド化反応は短時間にほぼ定量的に進行
するが、反応を、水と混和しない有機溶媒を添加した有
機溶媒とアルカリ水溶液との不均一系中で行い、次いで
二層に分離した反応液における有機溶媒層に貧溶媒を添
加することにより、再結晶による副反応生成物の除去が
不要となり、単純な析出法により高純度で収率良く、目
的物を得ることができる。また脱酸のための抽出、中和
、分液操作やそれに伴う抽出溶媒の濃縮工程が不用とな
り、コストダウン効果が大きく、フェノール系シアンカ
プラーを大量生産するのに適した製造法となしうるちの
である。Generally, this type of amidation reaction proceeds almost quantitatively in a short time, but the reaction was carried out in a heterogeneous system of an aqueous alkaline solution and an organic solvent to which an organic solvent immiscible with water was added, and then separated into two layers. By adding a poor solvent to the organic solvent layer in the reaction solution, the removal of side reaction products by recrystallization becomes unnecessary, and the target product can be obtained with high purity and good yield by a simple precipitation method. In addition, extraction, neutralization, and liquid separation operations for deacidification and the associated extraction solvent concentration steps are no longer necessary, resulting in a significant cost reduction effect and making it a manufacturing method suitable for mass production of phenolic cyan couplers. It is.
以下、本発明を実施例により説明するが、本発明の実施
の態様はこれにより限定されるものではない。EXAMPLES The present invention will be explained below with reference to Examples, but the embodiments of the present invention are not limited thereto.
〔実施例1〕
5−メチル−4,6−ジクロロ−2−〔α(2,4−ジ
ーtert−アミルフェノキシ)ブチルアミド〕フェノ
ール(化合物1)の合成。[Example 1] Synthesis of 5-methyl-4,6-dichloro-2-[α(2,4-di-tert-amylphenoxy)butyramide]phenol (Compound 1).
5−メチル−4,6−ジクロロ−2−アミノフェノール
塩酸塩17.2gと、ジメチルアセトアミド10端β、
酢酸エチル50蒙βを20%炭酸水素ナトリウム水溶液
74−1に添加し、pH5゜7とし、窒素雰囲気上攪拌
した。17.2 g of 5-methyl-4,6-dichloro-2-aminophenol hydrochloride, 10-end β of dimethylacetamide,
Fifty percent of ethyl acetate was added to 20% aqueous sodium bicarbonate solution 74-1 to adjust the pH to 5.7, followed by stirring under a nitrogen atmosphere.
次にα−(2,4−ジーtert−アミルフェノキシ)
ブタノイルクロリド25.4g (1当量)を、10℃
以下で30分間かけて滴下した。Then α-(2,4-di-tert-amylphenoxy)
25.4 g (1 equivalent) of butanoyl chloride was added at 10°C.
The mixture was added dropwise over a period of 30 minutes.
この後、加温溶解し、静置汲水層を捨て、メタノール8
0m1を加え、更に水40m1を35℃で加え、5℃で
1時間冷却し、濾別し、化合物1の白色結晶36g (
y=97%)を得た。After this, dissolve by heating, discard the aqueous layer left standing, and methanol 8
0 ml of water was added thereto, and further 40 ml of water was added at 35°C, cooled at 5°C for 1 hour, filtered, and 36 g of white crystals of Compound 1 (
y=97%) was obtained.
融点:149.5〜152℃
元素分析値:実測値 H: 7.51%C:
65.65%
N: 2.81 %
C1l:14.30%
計算値 H: 7.54%
C: 65.58%
N: 2゜ 83%
CI:14.34%
〔実施例2〕
5−エチル−4,6−ジクロロ−2−ヘキサテカノイル
アミドフェノール(化合物5)の合成5−エチル−4,
6−ジクロロ−2−アミノフェノール塩酸塩18.2g
を、ジメチルアセトアミド20I111、酢酸エチル9
0m1.8%炭酸水素ナトリウム水溶液100mffに
添加し、窒素雰囲気下、攪拌した。Melting point: 149.5-152°C Elemental analysis value: Actual value H: 7.51%C:
65.65% N: 2.81% C1l: 14.30% Calculated value H: 7.54% C: 65.58% N: 2° 83% CI: 14.34% [Example 2] 5-ethyl -Synthesis of 4,6-dichloro-2-hexatecanoylamidophenol (compound 5) 5-ethyl-4,
6-dichloro-2-aminophenol hydrochloride 18.2g
, dimethylacetamide 20I111, ethyl acetate 9
The mixture was added to 100 mff of a 1.8% sodium hydrogen carbonate aqueous solution and stirred under a nitrogen atmosphere.
次に、ヘキサデカノイルクロリド20.6g(1当りを
20℃以下で15分間かけて滴下した。30分間反応後
、加温し、静置後、水層を分液除去する一方、有機溶媒
層にメタノール40m1を添加し、次いで30℃で水3
01111を滴下した。5℃に冷却して30分間晶析し
、化合物5の白色結晶32.2g (y=98%)を得
た。Next, 20.6 g of hexadecanoyl chloride (1 portion was added dropwise over 15 minutes at 20°C or lower. After 30 minutes of reaction, it was heated and allowed to stand. After separating and removing the aqueous layer, the organic solvent layer Add 40 ml of methanol to the solution, then add 3 ml of water at 30°C.
01111 was added dropwise. The mixture was cooled to 5° C. and crystallized for 30 minutes to obtain 32.2 g of white crystals of Compound 5 (y=98%).
融点ニア7.5〜79℃
元素分析値:実測fiH: 8.80%C: 6
5.01%
N: 3.12%
01:15.90%
計算イ直 H: 8.84 %C:
64.85 %
N: 3.15 %
C1:15.95 %
〔実施例3〕
2−(4−シアノフェニル)ウレイド−5〔α−(2,
4−ジーtert−アミルフェノキシ)ヘキシルアミド
シフエノール(化合物21)の合成。Melting point near 7.5-79°C Elemental analysis value: Actual fiH: 8.80%C: 6
5.01% N: 3.12% 01:15.90% Direct calculation H: 8.84 %C:
64.85% N: 3.15% C1: 15.95% [Example 3] 2-(4-cyanophenyl)ureido-5[α-(2,
Synthesis of 4-di-tert-amylphenoxy)hexylamidocyphenol (Compound 21).
2− (4−シアノフェニル)ウレイ1!−5−アミノ
フェノール34.4gを、ジメチルアセトアミド35m
!、酢酸エチル120m1.20%炭酸水素ナトリウム
水溶液140*ffi中に加え、窒素雰囲気下撹拌し、
更にα−(2,4−ジーtert−アミルフェノキシ)
ヘキサノイルクロリド47.5g (1,01当量)を
、25℃以下、30分間かけて滴下した。30分間反応
させた後、加温溶解し、静置して水層を分液除去する一
方、有機溶媒層にメタノール260mlを加え、次いで
水155mAを35℃で滴下した。このあと水冷後1.
濾別し、化合物21の白色結晶71.3g(y=91%
)を得た。2- (4-cyanophenyl)urei 1! -34.4 g of 5-aminophenol was added to 35 m of dimethylacetamide.
! , 120ml of ethyl acetate, added to 140*ffi of 20% aqueous sodium bicarbonate solution, stirred under nitrogen atmosphere,
Further α-(2,4-di-tert-amylphenoxy)
47.5 g (1.01 equivalents) of hexanoyl chloride was added dropwise at 25° C. or below over 30 minutes. After reacting for 30 minutes, the mixture was dissolved by heating, left to stand, and the aqueous layer was separated and removed, while 260 ml of methanol was added to the organic solvent layer, and then 155 mA of water was added dropwise at 35°C. After cooling with water, 1.
Separated by filtration, 71.3 g of white crystals of compound 21 (y = 91%
) was obtained.
融点:185〜189.5℃ 元素分析値;実測値 Hニア、82% C:12.05% N:9.41% 計算値 H:1.14% Cニア2.21% N:9.35% 出 願 人 富士写真フィルム株式会社にMelting point: 185-189.5℃ Elemental analysis value: Actual value H near, 82% C: 12.05% N: 9.41% Calculated value H: 1.14% C near 2.21% N:9.35% Application to Fuji Photo Film Co., Ltd.
Claims (3)
アミドフェノール類とカルボン酸ハライドとを、水と混
和しない有機溶媒を添加した極性溶媒及びアルカリ水溶
液とからなる不均一系中で反応させてアミドフェノール
類を生成させた後、分離した有機溶媒層に貧溶媒を加え
てアミドフェノール類を沈澱させることを特徴とするア
ミドフェノール類の製造方法。(1) 2-aminophenols or 5-amino-2-
Amidophenols and carboxylic acid halides are reacted in a heterogeneous system consisting of a polar solvent containing an organic solvent immiscible with water and an alkaline aqueous solution to produce amidephenols, and then the separated organic solvent layer is A method for producing amide phenols, which comprises adding a poor solvent to precipitate amide phenols.
チルフォルムアミドであり、また有機溶媒が酢酸エチル
であり、更に貧溶媒が含水アルコールである請求項1記
載のアミドフェノール類の製造方法。(2) The method for producing amidophenols according to claim 1, wherein the polar solvent is dimethylacetamide or dimethylformamide, the organic solvent is ethyl acetate, and the poor solvent is hydrous alcohol.
2−アミドフェノール類が、下記式( I )で示され、 ▲数式、化学式、表等があります▼・・・( I ) (式中Rは、−NH_2(・M)_n又は−NHCOR
_2、Wは、水素原子、 Xは、水素又はカップリング離脱基、 Yは、上記Rが−NH_2(M)_n基の時には、水素
、低級アルキル基又は −NHCOR_3、 上記Rが−NHCOR_2基の時には −NH_2(・M)_n、 Zは、水素又はハロゲン原子、 R_2、R_3は、同一でも異なっていてもよく、それ
ぞれアルキル基、アリール基 又はヘテロ環、 Mは、アミノ基と塩を作り得る酸、 nは、0又は1 を示す。) また、前記カルボン酸ハライドが、下記式(II)で示さ
れ、 R_1COX・・・(II) (式中R_1は、アルキル基、Xはハロゲン原子を示す
。) 更に前記アミドフェノール類が下記式(III)で示され
る化合物であることを特徴とする請求項1、または2記
載のアミドフェノール類の製造方法。 ▲数式、化学式、表等があります▼・・・(III) (式中R’は、−NHCOR_1又は−NHCOR_2
Y’は、上記R’が−NHCOR_1の時には−NHC
OR_3又は低級アルキル基、 上記R’が、−NHCOR_2の時には −NHCOR_1を示し、 他は上記式( I )、(II)と同じである。)(3) The 2-aminophenols or 5-amino-
2-Amidophenols are represented by the following formula (I), ▲There are mathematical formulas, chemical formulas, tables, etc.▼...(I) (In the formula, R is -NH_2(・M)_n or -NHCOR
_2, W is a hydrogen atom, X is hydrogen or a coupling-off group, Y is hydrogen, a lower alkyl group or -NHCOR_3 when the above R is -NH_2(M)_n group, Sometimes -NH_2(・M)_n, Z is a hydrogen or halogen atom, R_2 and R_3 may be the same or different, and each is an alkyl group, an aryl group or a heterocycle, M can form a salt with an amino group Acid, n represents 0 or 1. ) Furthermore, the carboxylic acid halide is represented by the following formula (II), R_1COX...(II) (In the formula, R_1 is an alkyl group, and X represents a halogen atom.) Furthermore, the amide phenol is represented by the following formula: 3. The method for producing amidophenols according to claim 1, wherein the compound is a compound represented by (III). ▲There are mathematical formulas, chemical formulas, tables, etc.▼...(III) (R' in the formula is -NHCOR_1 or -NHCOR_2
Y' is -NHC when the above R' is -NHCOR_1
OR_3 or a lower alkyl group, When the above R' is -NHCOR_2, it represents -NHCOR_1, and the others are the same as the above formulas (I) and (II). )
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1248793A JP2578217B2 (en) | 1989-09-25 | 1989-09-25 | Method for producing amidophenols |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1248793A JP2578217B2 (en) | 1989-09-25 | 1989-09-25 | Method for producing amidophenols |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03110554A true JPH03110554A (en) | 1991-05-10 |
JP2578217B2 JP2578217B2 (en) | 1997-02-05 |
Family
ID=17183483
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1248793A Expired - Lifetime JP2578217B2 (en) | 1989-09-25 | 1989-09-25 | Method for producing amidophenols |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0711758A2 (en) | 1994-11-14 | 1996-05-15 | Fuji Photo Film Co., Ltd. | Method of manufacturing a 3-substituted-3-oxo-2-halopropionic acid amide compound and method of manufacturing a 3-substituted-3-oxo-2-(5,5-dimethylhydantoin-3-yl) propionic acid amide compound |
EP0608896B2 (en) † | 1993-01-29 | 2000-11-02 | Sumitomo Chemical Company Limited | Process for producing aromatic amide compounds useful as cyan coupler for color photographs |
JP2011020969A (en) * | 2009-07-17 | 2011-02-03 | National Cancer Center | Pharmaceutical composition making nutrient starvation resistance control indicator |
-
1989
- 1989-09-25 JP JP1248793A patent/JP2578217B2/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0608896B2 (en) † | 1993-01-29 | 2000-11-02 | Sumitomo Chemical Company Limited | Process for producing aromatic amide compounds useful as cyan coupler for color photographs |
EP0711758A2 (en) | 1994-11-14 | 1996-05-15 | Fuji Photo Film Co., Ltd. | Method of manufacturing a 3-substituted-3-oxo-2-halopropionic acid amide compound and method of manufacturing a 3-substituted-3-oxo-2-(5,5-dimethylhydantoin-3-yl) propionic acid amide compound |
JP2011020969A (en) * | 2009-07-17 | 2011-02-03 | National Cancer Center | Pharmaceutical composition making nutrient starvation resistance control indicator |
Also Published As
Publication number | Publication date |
---|---|
JP2578217B2 (en) | 1997-02-05 |
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