JPH0310211A - Optical shutter element - Google Patents

Optical shutter element

Info

Publication number
JPH0310211A
JPH0310211A JP14572589A JP14572589A JPH0310211A JP H0310211 A JPH0310211 A JP H0310211A JP 14572589 A JP14572589 A JP 14572589A JP 14572589 A JP14572589 A JP 14572589A JP H0310211 A JPH0310211 A JP H0310211A
Authority
JP
Japan
Prior art keywords
parts
optical shutter
convex portion
shutter element
projection part
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14572589A
Other languages
Japanese (ja)
Inventor
Yukio Toyoda
幸夫 豊田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Sumitomo Special Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Special Metals Co Ltd filed Critical Sumitomo Special Metals Co Ltd
Priority to JP14572589A priority Critical patent/JPH0310211A/en
Publication of JPH0310211A publication Critical patent/JPH0310211A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To reduce the quantity of leakage light due to the working strain by providing notched parts on both end parts on the top surface of a projection part and forming a light transmission surface except the notched parts. CONSTITUTION:The notched parts 5 are provided on both end parts on the top surface of the projection part 3 and the light transmission surface 4 is formed except the notched parts 5. Namely, the projection part 3 is formed previously to easy-to-work size and the notched parts having necessary width are provided on both end parts on the top surface of the projection part 3 according to the requested width size W of the light transmission surface. When the distance between adjacent projection parts 3 is limited and the size ratio W/H of the projection parts decreases inevitably to disable the attainment of the purpose only by the effect of the notched parts 5, step parts 7 are formed on both sides of the root part of the projection part 3 to increase the thickness of the projection part substantially, and consequently the working strain which is generated in the vicinity is reduced to reduce the leakage light. Consequently, the leakage light due to the working strain of an optical shutter is reduce.

Description

【発明の詳細な説明】 利用産業分野 この発明は、電気光学効果を利用した光シャ・ツタ素子
の改良に係り、特に、基板に凹凸形成された凸部上面を
光透過面とする溝型電極において、凸部の高さが比較的
高い光シャッタ素子の凸部」二面の両側端部に切欠き部
を設けて製造性を向上させ、さらに溝部形状を階段状に
して凸部に発生した加工歪に起因する漏れ光量を低減し
た光シャッタ素子に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of Application This invention relates to the improvement of optical shutter elements that utilize electro-optic effects, and particularly relates to a groove-shaped electrode whose light-transmitting surface is the upper surface of a protrusion formed on a substrate. In this method, notches were provided on both sides of the two sides of the convex part of the optical shutter element, which has a relatively high convex height, to improve manufacturability, and the groove shape was further made step-like to reduce the occurrence of the convex part. The present invention relates to an optical shutter element that reduces the amount of light leakage caused by processing distortion.

背景技術 電気光学効果を利用した光シャッタは、偏光方向が相互
に直交するー、&Jの偏光素子間に、(PbLaXZr
Ti)Oa(以下PLZT)、LiNbO3、B112
SiO2o等のセラミックス基板からなり、電界方向が
大側光の偏光方向と45°交差角度を形成した光シャッ
タ素子を配置して構成し、光学式プリンタの書込みデバ
イス、光学カメラのシャッタなど多方面に用いられてい
る。
BACKGROUND ART An optical shutter using the electro-optic effect has a structure in which (PbLaXZr
Ti) Oa (hereinafter referred to as PLZT), LiNbO3, B112
It is made of a ceramic substrate such as SiO2O, and is constructed by arranging an optical shutter element in which the electric field direction forms a 45° intersection angle with the polarization direction of the large side light. It is used.

光シャッタ素子としては、第3図に示す如く、電気光学
効果を有する基板(1)表面に、外周刃カッター等にて
所要の溝部(2)、凸部(3)を並列形成し、凸部(3
)上面を光透過面(4)とし、上記四部(2)に所要の
電極材料(6)を被着してなる溝型電極を形成した構成
のものが知られている。
For the optical shutter element, as shown in Fig. 3, the required grooves (2) and convexes (3) are formed in parallel on the surface of a substrate (1) having an electro-optical effect using a peripheral blade cutter, etc. (3
) A structure is known in which the upper surface is a light transmitting surface (4) and a groove-shaped electrode is formed by covering the four parts (2) with a required electrode material (6).

かかる溝型電極構成では、電界が凸部(3)内部に有効
に浸透分布するため、駆動電圧の低減を図ることができ
、近年の小型化低駆動電圧の要求に適した構成であるこ
とから多用される傾向にある。
In such a groove-type electrode configuration, the electric field is effectively permeated and distributed inside the convex portion (3), so it is possible to reduce the driving voltage, and the configuration is suitable for the recent demands for miniaturization and low driving voltage. It tends to be used frequently.

従来技術の問題点 詳述した第3図の光シャッタ素子は前述の如き長所を有
するが、今日では小型化が要求されるのみならず、新に
種々のシャッタ機能が要求されており、まずまず光透過
面、溝部の寸法が制限され、しかも形状が複雑となる傾
向にある。
The optical shutter element shown in FIG. 3, which details the problems of the prior art, has the advantages mentioned above, but today not only is there a need for miniaturization, but also various new shutter functions are required, and The dimensions of the transmission surface and the groove are limited, and the shape tends to be complicated.

特に、光透過面の幅が、狭くなる傾向が強く、また駆動
電圧の低減の要請から、溝部の深さを浅くすることは望
ましくなく、必然的に凸部(3)の高さ(H)と光透過
面の幅(W)との比(W / H)が小さくなっている
In particular, there is a strong tendency for the width of the light transmitting surface to become narrow, and due to the need to reduce the driving voltage, it is undesirable to make the depth of the groove shallow, and the height (H) of the convex portion (3) must be reduced. The ratio (W/H) of the width of the light transmitting surface and the width (W) of the light transmitting surface is small.

従って、製造に際して機械加工が非常に煩雑になるばか
りでなく、破損しやすくなり歩留りが悪く、さらに外周
刃カッター等での加工時に、凸部(3)内に加工歪が発
生して、これに基因する漏光が増加することが確認きれ
た。
Therefore, not only is the machining process extremely complicated during manufacturing, but it is also easily damaged, resulting in poor yields.Furthermore, when machining with a peripheral blade cutter, etc., machining distortion occurs within the convex portion (3), resulting in damage to the convex portion (3). It was confirmed that the underlying light leakage increased.

本発明者の実験によれば、加工歪は溝部の深さ方向と垂
直方向に発生し、加工の深さが増すにつれて大きくなり
、特に、凸部(3)の高さ(H)と光透過面(4)の幅
(W)との比(W/H)が0.5以下の構成において前
述の漏れ光が著しいことが解った。
According to the inventor's experiments, machining distortion occurs in the direction perpendicular to the depth direction of the groove, and increases as the machining depth increases, and in particular, the height (H) of the protrusion (3) It has been found that the aforementioned leakage of light is significant in a structure in which the ratio (W/H) to the width (W) of the surface (4) is 0.5 or less.

発明の目的 この発明は、上述した凸部の高さ(H)に対する光透過
面の幅(W)との比(W/H)が小さな構成からなる光
シャッタに要求される特性の向上を目的とし、特に、加
工時の破損を防止し、加工歪に起因する漏れ光を低減で
きる構成からなる光シャッタ素子の提供を目的としてい
る。
Purpose of the Invention The purpose of the invention is to improve the characteristics required of an optical shutter having a structure in which the ratio (W/H) of the width (W) of the light transmitting surface to the height (H) of the convex portion described above is small. In particular, it is an object of the present invention to provide an optical shutter element having a structure that can prevent damage during processing and reduce leakage light caused by processing distortion.

発明の概要 3− この発明は、 電気光学効果を有する基板表面に複数の溝部を並列して
所要凸部を複数併設し、該凸部上面を光透過面とした光
シャッタ素子において、 前記凸部上面の両側端部に切欠き部を設け、該切欠き部
を除く部分を光透過面としたことを特徴とし、あるいは
さらに、 前記溝部を階段状となして、前記凸部両側に溝底部から
立上る段差部を少なくとも1段形成したことを特徴とす
る光シャッタ素子である。
Summary of the Invention 3 - The present invention provides an optical shutter element in which a plurality of grooves are arranged in parallel on the surface of a substrate having an electro-optic effect, and a plurality of required convex portions are provided, and the upper surface of the convex portion is a light transmitting surface. It is characterized in that notches are provided at both ends of the top surface, and the portion excluding the notches is a light-transmitting surface, or further, the groove is step-shaped, and a groove is formed on both sides of the convex portion from the bottom of the groove. The present invention is an optical shutter element characterized in that at least one rising step portion is formed.

換言すれば、この発明は、予め加工しやすい寸法にて凸
部を形成したのち、要求される光透過面の幅(W)寸法
に応じて、凸部上面両端部に所要幅(WO)の切欠き部
を設け、幅(W)の光透過面とすることができ、加工が
容易であり、また凸部の破損や加工歪の低減ができる。
In other words, in this invention, after forming the convex portion in advance with dimensions that are easy to process, a required width (WO) is formed at both ends of the upper surface of the convex portion according to the required width (W) of the light transmitting surface. A notch can be provided to form a light-transmitting surface with a width (W), making it easy to process and reducing damage to the convex portion and processing distortion.

また、この発明は、隣接する凸部の距離が制限され、必
然的に凸部の寸法比W/Hが小さくなり切欠き部の効果
だけは目的を達成できないような構成において、さらに
、溝部の底部近傍、いわゆ4− る凸部のつけ根部の両側に所要寸法からなる段差、部を
形成することにより、実質的に凸部の厚さを増加し、こ
の近傍に発生ずる加工歪みを低減し、漏れ光を低減する
構成からなる。
Further, in a structure in which the distance between adjacent convex portions is limited and the dimensional ratio W/H of the convex portions becomes inevitably small, and the effect of the notch portion alone cannot achieve the purpose, By forming a step or part of the required dimensions on both sides of the base of the so-called 4-shaped convex part near the bottom, the thickness of the convex part is substantially increased and the processing distortion that occurs in this vicinity is reduced. The structure also reduces leakage light.

発明の構成 この発明に用いる基板としては、ポッケルス効果等の電
気光学効果を有するPLZT、 LiNb0a、B11
2Si020等の公知のセラミックス基板を採用できる
Structure of the Invention The substrates used in this invention include PLZT, LiNb0a, and B11 having electro-optic effects such as Pockels effect.
A known ceramic substrate such as 2Si020 can be used.

近年、光シャッタ素子としては、光透過面の幅(W)が
30〜1100j1程度で、また凸部の高さ(H)が1
00〜500jlrn程度のものが多用されている。
In recent years, as optical shutter elements, the width (W) of the light transmitting surface is about 30 to 1100j1, and the height (H) of the convex part is about 1
Those with a size of about 00 to 500 Jlrn are often used.

しかし、凸部の寸法比(W / H)が0.5を超える
構成の光シャッタ素子においては、比較的加工歪の影響
を受は難く前述の問題が少ないため、この発明は、W/
H≦0.5の構成からなる光シャッタ素子において特に
有効である。
However, in an optical shutter element having a configuration in which the dimensional ratio (W/H) of the convex portion exceeds 0.5, it is relatively less susceptible to the effects of processing distortion and the above-mentioned problems are less likely to occur.
This is particularly effective in an optical shutter element having a configuration in which H≦0.5.

凸部の上面の両側端部に形成する切欠部の幅(WO)は
要求される光透過面の幅(W)によって決定されるが、
切欠部の深さ(1)は光透過面の幅(W)を決定する要
因とならない。切欠部の電極用金属膜は、被着されても
、被着されなくてもよい。
The width (WO) of the notch formed at both ends of the upper surface of the convex portion is determined by the required width (W) of the light transmitting surface.
The depth (1) of the notch is not a factor in determining the width (W) of the light transmitting surface. The electrode metal film in the notch may or may not be coated.

凸部の両側面に形成される段差部の凸部並列方向の寸法
Wは、必ずしも同寸法である必要はないが、各凸部の溝
底幅がW+2wで、同幅部が底部よりh高となった段差
部において、W≦115W、 h≦2/3Hを満足する
ことが好ましい。
The dimensions W of the stepped portions formed on both sides of the convex portion in the parallel direction of the convex portions do not necessarily have to be the same size, but the groove bottom width of each convex portion is W + 2w, and the same width portion is h higher than the bottom. In the stepped portion, it is preferable that W≦115W and h≦2/3H be satisfied.

ずなわち、Wが115Wを超えると、段差部を設けた効
果がさほど向上せず、実質的に凸部全体の幅を厚くする
ことになり、隣接する凸部間の距離が限定され、限られ
た範囲に多くの光透過面を形成することが困難となる。
In other words, if W exceeds 115W, the effect of providing the stepped portion will not improve much, and the width of the entire convex portion will become substantially thicker, and the distance between adjacent convex portions will be limited. It becomes difficult to form many light transmitting surfaces in the area where the light is transmitted.

基板の材質、凸部の寸法比(W / H)の値、要求さ
れる緒特性等に応じて適宜選定することが望ましい。
It is desirable to select it appropriately depending on the material of the substrate, the value of the dimensional ratio (W/H) of the convex portion, the required strength characteristics, etc.

また、凸部両側に配置する電極間の距離を広げることに
なり、駆動電圧低減の観点からは好ましくない。
Furthermore, the distance between the electrodes arranged on both sides of the convex portion is increased, which is not preferable from the viewpoint of reducing drive voltage.

段差部の高さ(h)は、凸部の寸法比(W/H)の値等
に応じて適宜選定するが、通常凸部高さHの2/3以下
で良く、1/2以下でも十分な効果を得ることができる
The height (h) of the stepped portion is appropriately selected depending on the value of the dimensional ratio (W/H) of the convex portion, etc., but it is usually 2/3 or less of the convex portion height H, and even 1/2 or less. A sufficient effect can be obtained.

段差部の形状は、後述の実施例の如き断面矩形状のもの
に限定されることはなく、段部の上部に比べ下部を広く
したいわゆるテーパ状や、多段にする等、加工手段、凹
凸部の形状寸法等に応じて選定することが可能であるが
、最大厚さ、最大高さは、前述の範囲内で選定する。
The shape of the stepped portion is not limited to a rectangular cross-sectional shape as in the embodiments described below, and may be formed into a so-called tapered shape in which the lower part is wider than the upper portion of the stepped portion, or may be multi-staged, etc. The maximum thickness and maximum height are selected within the above-mentioned ranges.

この発明の光シャッタ素子には、Ni、 Cu、 Au
等の公知の電極用金属を用いることができる。
The optical shutter element of this invention includes Ni, Cu, Au.
Known metals for electrodes, such as, can be used.

特に、電極を被着形成するに際しては、本発明者が先に
提案(特願昭63−249527号)した方法を採用す
ることにより、極少面積の光透過面を有するこの発明の
光シャッタ素子を安定して提供することができる。
In particular, when forming electrodes, the optical shutter element of the present invention having a light transmitting surface with an extremely small area can be obtained by adopting the method previously proposed by the present inventor (Japanese Patent Application No. 63-249527). can be provided stably.

すなわち、予め鏡面仕上げを施した板状基板表面にレジ
スI・を塗布したのち、上記の形状からなる凹凸部を形
成する。
That is, after applying a resist I to the surface of a plate-shaped substrate which has been mirror-finished in advance, the uneven portion having the above-mentioned shape is formed.

この後、無電解めっき法にて、前記加工でレジストが除
去された基板面に、厚さ1〜32程度の7 Ni等の電極用金属膜を被着し、さらに基板表面に残存
するレジストを化学的処理にて除去し、所要形状の光シ
ャッタ素子とする。
After that, by electroless plating, a metal film for electrodes such as 7Ni with a thickness of about 1 to 32 mm is deposited on the substrate surface from which the resist has been removed in the above processing, and the resist remaining on the substrate surface is further coated. It is removed by chemical treatment to obtain a light shutter element with a desired shape.

この方法によれば、予め鏡面仕上げを施した基板を用い
るため、所要形状寸法に加工した後、光透過面を鏡面仕
上げする必要がないことから、光透過面が微小であって
も損傷することがなく、本発明の光シャッタ素子の製造
に有効である。
According to this method, since a substrate that has been mirror-finished in advance is used, there is no need to mirror-finish the light-transmitting surface after processing it into the required shape and dimensions, so even if the light-transmitting surface is minute, it will not be damaged. This is effective for manufacturing the optical shutter element of the present invention.

図面に基づ〈発明の開示 第1図と第2図はこの発明による光シャッタ素子の構成
を示す斜視説明図である。
Based on the Drawings (Disclosure of the Invention) FIGS. 1 and 2 are perspective explanatory views showing the structure of an optical shutter element according to the present invention.

図面には最も簡単な構成からなるものを示しているが、
この発明はさらに複雑な構成からなる光シャッタ素子に
も適用できる。また、図面においては基板に形成する凹
凸部、段差部等を誇張して図示しである。
Although the drawing shows the simplest configuration,
The present invention can also be applied to optical shutter elements having more complicated configurations. Furthermore, in the drawings, the uneven portions, stepped portions, etc. formed on the substrate are exaggerated.

構戴J 電気光学効果を有する基板(1)表面に、外周カッター
等にて所要の溝部(2)と凸部(3)を形成して所要の
凹凸形状となし、さらに、凸部(3)の上面両側端一 部に幅(WO)、深さC1)からなる切欠き部(5)を
設け、切欠き部(5)を除く凸部(3)」−面を光透過
面(4)としている。
Structure J: On the surface of the substrate (1) having an electro-optical effect, use a peripheral cutter or the like to form the required grooves (2) and convex portions (3) into the desired uneven shape, and further, form the convex portions (3). A notch (5) consisting of a width (WO) and a depth C1) is provided at a portion of both ends of the upper surface, and the convex portion (3) excluding the notch (5) is turned into a light transmitting surface (4). It is said that

ここでは、凸部(3)の高さ(H)と光透過面(4)の
幅(W)との比(W/H)は0.5以下になっている。
Here, the ratio (W/H) between the height (H) of the convex portion (3) and the width (W) of the light transmitting surface (4) is 0.5 or less.

切欠き部(5)を含む凸部(3)の側部に、所要の電極
利料(6)を被着して溝型電極を形成している。
A groove-shaped electrode is formed by depositing a required electrode material (6) on the side of the protrusion (3) including the notch (5).

構成1は、予め加工しやすい寸法にて仕」二げた後、要
求される光透過面(4)の幅(W)寸法になるよう、該
凸部(3)の上面両側端部のみを所要寸法の幅(WO)
で切欠くだけであるので、極めて加工が容易であり、加
工途中の破損を著しく低減できる。
In configuration 1, only the upper side ends of the convex part (3) are required to have the required width (W) of the light transmitting surface (4) after finishing it in advance to a size that is easy to process. Width of dimensions (WO)
Since it is only necessary to make a notch, machining is extremely easy, and damage during machining can be significantly reduced.

僅基2 第1図に示す構成1において、さらに、前記加工時、溝
部(2)を階段状に加工し、換言すれば、凸部部(3)
に溝部(2)底から立ち」二がる段差部(7)を形成し
である。
In the configuration 1 shown in FIG. 1, the groove portion (2) is further processed into a stepped shape during the processing, in other words, the convex portion (3)
A stepped portion (7) is formed which rises from the bottom of the groove portion (2).

段差部(7)は凸部(3)の両側に設けられ、凸部(3
)幅(W)方向寸法(w)、高さ(b、)からなる段部
である。
The stepped portions (7) are provided on both sides of the convex portion (3), and are provided on both sides of the convex portion (3).
) It is a stepped portion consisting of a width (W) direction dimension (w) and a height (b, ).

段差部(7)を含む凸部(3)の側部に、所要の電極材
料(6)を被着して溝型電極を形成している。
A groove-shaped electrode is formed by depositing a desired electrode material (6) on the sides of the convex portion (3) including the stepped portion (7).

この段差部の効果により、凸部(3)内に発生ずる加工
歪が低減され、凸部(3)上面の光透過面(4)から入
射した光(図示せず)のほとんどが漏れることなく、か
つ凸部(3)の両側面の電極(6X6)間に形成される
電界によって効率良く偏光し、基板(1)の平端面(図
中の下面)から外部へ導出される。
Due to the effect of this stepped portion, processing distortion occurring within the convex portion (3) is reduced, and most of the light (not shown) incident from the light transmitting surface (4) on the top surface of the convex portion (3) does not leak. , and is efficiently polarized by the electric field formed between the electrodes (6×6) on both sides of the convex portion (3), and is led out from the flat end surface (lower surface in the figure) of the substrate (1).

これらの構成は、特に光プリンターのドツト密度を上げ
る場合に各々の光透過面の形状を小さくする必要があり
が、かかる構成に有効である。
These configurations are particularly effective when increasing the dot density of an optical printer, although it is necessary to reduce the shape of each light-transmitting surface.

実施例 実施例1 基板として9/65/35の組成比にて表わされるPL
ZTを用い、この発明による光シャッタ素子(第1図、
第2図)及び従来構成(第3図)からなる光シャッタ素
子を作製した。
Examples Example 1 PL expressed as a substrate with a composition ratio of 9/65/35
An optical shutter element according to the present invention (Fig. 1,
An optical shutter element having a conventional structure (FIG. 2) and a conventional structure (FIG. 3) was manufactured.

溝型電極は無電界めっき法にて、厚さ1よのNiめっき
層として形成した。
The groove-shaped electrode was formed as a Ni plating layer with a thickness of about 1 by electroless plating.

なお、溝部の加工は厚さ401tmの外周刃カッターを
用いて作製した。
Note that the grooves were processed using a peripheral blade cutter with a thickness of 401 tm.

各構成に共通な寸法 W=601imSH=200.m この発明による切欠き部外法は、wo=57□n□、l
 = 5.、、段着部寸法は、w= 5pm、 h= 
11007zである。
Dimensions common to each configuration W=601imSH=200. m The notch outside method according to this invention is wo=57□n□, l
= 5. ,, The dimensions of the tiered part are w = 5pm, h =
It is 11007z.

実施例2 これらの光シャッタ素子に、λ=633nmのレーザー
光を入射°し、漏れ光を測定したところ、第3図の従来
構造では漏れ光が4%程度あったが、第1図、第2図の
この発明の構造では、漏れ光が1.5%および1%程度
と大幅に低減した。
Example 2 When a laser beam of λ=633 nm was incident on these optical shutter elements and the leakage light was measured, the leakage light was about 4% in the conventional structure shown in FIG. In the structure of the present invention shown in FIG. 2, leakage light was significantly reduced to about 1.5% and 1%.

【図面の簡単な説明】[Brief explanation of drawings]

第1図、第2図はこの発明による光シャッタ素子の構成
を示す斜視説明図である。 第3図は従来の光シャッタ素子の構成を示す斜視説明図
である。 1・・・基板、2・・溝部、3・・・凸部、4・・・光
透過面、5・・・切欠き部、6・・・電極材料、7・・
・段差部。 溌 亡 占
FIGS. 1 and 2 are perspective explanatory views showing the structure of an optical shutter element according to the present invention. FIG. 3 is a perspective explanatory view showing the configuration of a conventional optical shutter element. DESCRIPTION OF SYMBOLS 1... Substrate, 2... Groove part, 3... Convex part, 4... Light transmission surface, 5... Notch part, 6... Electrode material, 7...
・Step part. fortune-telling

Claims (1)

【特許請求の範囲】 1 電気光学効果を有する基板表面に複数の溝部を並列して
所要凸部を複数併設し、該凸部上面を光透過面とした光
シャッタ素子において、 前記凸部上面の両側端部に切欠き部を設け、該切欠き部
を除く部分を光透過面としたことを特徴とする光シャッ
タ素子。 2 電気光学効果を有する基板表面に複数の溝部を並列して
所要凸部を複数併設し、該凸部上面を光透過面とした光
シャッタ素子において、 前記溝部を階段状となして、前記凸部両側に溝底部から
立上る段差部を少なくとも1段形成し、かつ、前記凸部
上面の両側端部に切欠き部を設け、該切欠き部を除く部
分を光透過面としたたことを特徴とする光シャッタ素子
[Scope of Claims] 1. An optical shutter element in which a plurality of grooves are arranged in parallel on the surface of a substrate having an electro-optic effect and a plurality of required convex portions are provided, and the upper surface of the convex portion is a light transmitting surface, comprising: An optical shutter element characterized in that notches are provided at both end portions, and the portion excluding the notches is a light transmitting surface. 2. In an optical shutter element in which a plurality of grooves are arranged in parallel on the surface of a substrate having an electro-optic effect and a plurality of required convex portions are provided, and the upper surface of the convex portion is a light transmitting surface, the groove portion is formed into a step shape, and the convex portion is At least one stepped portion rising from the bottom of the groove is formed on both sides of the convex portion, and notches are provided at both end portions of the upper surface of the convex portion, and the portion other than the notch portion is a light transmitting surface. Characteristic optical shutter element.
JP14572589A 1989-06-07 1989-06-07 Optical shutter element Pending JPH0310211A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14572589A JPH0310211A (en) 1989-06-07 1989-06-07 Optical shutter element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14572589A JPH0310211A (en) 1989-06-07 1989-06-07 Optical shutter element

Publications (1)

Publication Number Publication Date
JPH0310211A true JPH0310211A (en) 1991-01-17

Family

ID=15391692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14572589A Pending JPH0310211A (en) 1989-06-07 1989-06-07 Optical shutter element

Country Status (1)

Country Link
JP (1) JPH0310211A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63159823A (en) * 1986-12-23 1988-07-02 Minolta Camera Co Ltd Optical shutter array

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63159823A (en) * 1986-12-23 1988-07-02 Minolta Camera Co Ltd Optical shutter array

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