JPH029848A - Novel diamine - Google Patents
Novel diamineInfo
- Publication number
- JPH029848A JPH029848A JP63160419A JP16041988A JPH029848A JP H029848 A JPH029848 A JP H029848A JP 63160419 A JP63160419 A JP 63160419A JP 16041988 A JP16041988 A JP 16041988A JP H029848 A JPH029848 A JP H029848A
- Authority
- JP
- Japan
- Prior art keywords
- polyimide
- diamine
- formula
- raw material
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000004985 diamines Chemical class 0.000 title claims abstract description 16
- 229920001721 polyimide Polymers 0.000 abstract description 25
- 239000004642 Polyimide Substances 0.000 abstract description 24
- 239000002994 raw material Substances 0.000 abstract description 11
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 abstract description 8
- 239000002904 solvent Substances 0.000 abstract description 6
- 150000001875 compounds Chemical class 0.000 abstract description 5
- 229920006015 heat resistant resin Polymers 0.000 abstract description 5
- 239000003795 chemical substances by application Substances 0.000 abstract description 4
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 abstract description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract description 3
- 239000003822 epoxy resin Substances 0.000 abstract description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract description 3
- 239000003960 organic solvent Substances 0.000 abstract description 3
- 229920000647 polyepoxide Polymers 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 2
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 abstract description 2
- COPUOMGHQGSBQO-UHFFFAOYSA-N 3-[2-(4-aminophenyl)propan-2-yl]phenol Chemical compound C=1C=CC(O)=CC=1C(C)(C)C1=CC=C(N)C=C1 COPUOMGHQGSBQO-UHFFFAOYSA-N 0.000 abstract 1
- 239000000010 aprotic solvent Substances 0.000 abstract 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 8
- 229910001873 dinitrogen Inorganic materials 0.000 description 8
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 6
- 239000002966 varnish Substances 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- GPAPPPVRLPGFEQ-UHFFFAOYSA-N 4,4'-dichlorodiphenyl sulfone Chemical compound C1=CC(Cl)=CC=C1S(=O)(=O)C1=CC=C(Cl)C=C1 GPAPPPVRLPGFEQ-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000012043 crude product Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000004811 liquid chromatography Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000012778 molding material Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- OKISUZLXOYGIFP-UHFFFAOYSA-N 4,4'-dichlorobenzophenone Chemical group C1=CC(Cl)=CC=C1C(=O)C1=CC=C(Cl)C=C1 OKISUZLXOYGIFP-UHFFFAOYSA-N 0.000 description 2
- 235000010893 Bischofia javanica Nutrition 0.000 description 2
- 240000005220 Bischofia javanica Species 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 2
- 150000008041 alkali metal carbonates Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 125000001033 ether group Chemical group 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 235000011181 potassium carbonates Nutrition 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- 230000004580 weight loss Effects 0.000 description 2
- NLMDJJTUQPXZFG-UHFFFAOYSA-N 1,4,10,13-tetraoxa-7,16-diazacyclooctadecane Chemical compound C1COCCOCCNCCOCCOCCN1 NLMDJJTUQPXZFG-UHFFFAOYSA-N 0.000 description 1
- QBNABJXQGRVIRA-UHFFFAOYSA-N 1-bromo-4-(4-bromophenyl)sulfonylbenzene Chemical compound C1=CC(Br)=CC=C1S(=O)(=O)C1=CC=C(Br)C=C1 QBNABJXQGRVIRA-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- PLVUIVUKKJTSDM-UHFFFAOYSA-N 1-fluoro-4-(4-fluorophenyl)sulfonylbenzene Chemical compound C1=CC(F)=CC=C1S(=O)(=O)C1=CC=C(F)C=C1 PLVUIVUKKJTSDM-UHFFFAOYSA-N 0.000 description 1
- SEXYSVQSALJPBA-UHFFFAOYSA-N 2-[2-(2-aminophenoxy)propan-2-yl]phenol Chemical compound OC1=C(C=CC=C1)C(C)(C)OC1=C(C=CC=C1)N SEXYSVQSALJPBA-UHFFFAOYSA-N 0.000 description 1
- OWNSSKQAQSMBRP-UHFFFAOYSA-N 2-[2-(4-aminophenyl)propan-2-yl]phenol Chemical compound OC1=C(C=CC=C1)C(C)(C)C1=CC=C(C=C1)N OWNSSKQAQSMBRP-UHFFFAOYSA-N 0.000 description 1
- LSQARZALBDFYQZ-UHFFFAOYSA-N 4,4'-difluorobenzophenone Chemical compound C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 LSQARZALBDFYQZ-UHFFFAOYSA-N 0.000 description 1
- OAPDPORYXWQVJE-UHFFFAOYSA-N 4-propylaniline Chemical compound CCCC1=CC=C(N)C=C1 OAPDPORYXWQVJE-UHFFFAOYSA-N 0.000 description 1
- -1 Alkali metal alkoxides Chemical class 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000010533 azeotropic distillation Methods 0.000 description 1
- SLUNEGLMXGHOLY-UHFFFAOYSA-N benzene;hexane Chemical compound CCCCCC.C1=CC=CC=C1 SLUNEGLMXGHOLY-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- LFABNOYDEODDFX-UHFFFAOYSA-N bis(4-bromophenyl)methanone Chemical compound C1=CC(Br)=CC=C1C(=O)C1=CC=C(Br)C=C1 LFABNOYDEODDFX-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000003983 crown ethers Chemical class 0.000 description 1
- 239000002739 cryptand Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- RBBOWEDMXHTEPA-UHFFFAOYSA-N hexane;toluene Chemical compound CCCCCC.CC1=CC=CC=C1 RBBOWEDMXHTEPA-UHFFFAOYSA-N 0.000 description 1
- LRTFPLFDLJYEKT-UHFFFAOYSA-N para-isopropylaniline Chemical compound CC(C)C1=CC=C(N)C=C1 LRTFPLFDLJYEKT-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical group 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229960003975 potassium Drugs 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- RPDAUEIUDPHABB-UHFFFAOYSA-N potassium ethoxide Chemical compound [K+].CC[O-] RPDAUEIUDPHABB-UHFFFAOYSA-N 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は耐熱性樹脂の原料や硬化剤として用いることの
できる新規ジアミンに関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a novel diamine that can be used as a raw material for heat-resistant resins or as a curing agent.
ポリイミド等の耐熱性樹脂の原料として、例えば、特開
昭62−10051号公報には、下記式(n)・・・(
II)
(ただし、式中、XはcoまたはSO2である)で表わ
されるジアミンが示されている。For example, as raw materials for heat-resistant resins such as polyimide, the following formula (n)...
II) in which X is co or SO2.
また、上記公開公報には、一般式(n)で表わされるジ
アミンと酸二無水物(例えばピロメリット酸二無水物)
とから得られるポリイミドは成形加工性、熱安定性に優
れることが示され、該ポリイミドを成形材料として利用
する例、すなわち該ポリイミドを高温下に圧縮して成形
体を製造する例及び該ポリイミドを接着剤として利用す
る例、すなわち該ポリイミドのフィルムをスチール板で
はさみ、高温下に圧縮してスチール板を接続する例が示
されている。In addition, the above-mentioned publication discloses a diamine represented by the general formula (n) and an acid dianhydride (for example, pyromellitic dianhydride).
It has been shown that the polyimide obtained from and has excellent moldability and thermal stability, and there are examples of using this polyimide as a molding material, that is, examples of producing a molded article by compressing the polyimide at high temperature, and cases where the polyimide is used as a molding material. An example of using the polyimide as an adhesive, that is, sandwiching the polyimide film between steel plates and compressing them at high temperatures to connect the steel plates is shown.
上記一般式(■)で表わされるジアミンを使用して得ら
れるポリイミドは、上記のとおり熱安定性に優れるとい
う利点を有するが、このことは、換言すれば、該ポリイ
ミドが高いガラス転移点及び高い軟化点を有することで
ある。従って、該ポリイミドを成形材料として利用する
場合及び接着剤として利用する場合に高温加熱が必要で
ある。The polyimide obtained using the diamine represented by the above general formula (■) has the advantage of being excellent in thermal stability as described above.In other words, this means that the polyimide has a high glass transition point and a high It has a softening point. Therefore, high-temperature heating is required when using the polyimide as a molding material or as an adhesive.
よって該ポリイミドは比較的低温での加熱が必要な場合
には、実用的な材料とならない。また、該ポリイミドは
有機溶剤への溶解性に劣る。Therefore, the polyimide is not a practical material when heating at a relatively low temperature is required. Moreover, the polyimide has poor solubility in organic solvents.
このようにポリイミドの性質は、その原料(ジアミン)
によって決定される面があり、このことから、上記の問
題点を解決するために、新規な原料(ジアミン)の開発
が望まれる。In this way, the properties of polyimide depend on its raw material (diamine)
Therefore, in order to solve the above problems, it is desired to develop a new raw material (diamine).
本発明は、一般式(I) %式%(I) 示す)で表わされるジアミンに関する。 The present invention relates to general formula (I) % formula %(I) ).
上記一般式(I)で表わされるジアミンは、4゜4′−
ジハロゲノベンゾフェノン又は4.4′ジハロゲノジフ
エニルスルホンと2− (3−ヒドロキシフェニル)−
2−(4’ −アミノフェニル)プロパンとを塩基の存
在下、非プロトン性極性溶媒中で反応させることによっ
て製造することができる。以下、この製造法について詳
述する。The diamine represented by the above general formula (I) is 4゜4'-
Dihalogenobenzophenone or 4,4' dihalogenodiphenyl sulfone and 2-(3-hydroxyphenyl)-
It can be produced by reacting 2-(4'-aminophenyl)propane in an aprotic polar solvent in the presence of a base. This manufacturing method will be described in detail below.
上記4,4′−ジハロゲノベンゾフェノンとしては4,
4′−ジクロロベンゾフェノン、4゜4′−ジフルオロ
ベンゾフェノン、4.4’ −ジブロモベンゾフェノン
等であり、収率の点からは4.4′−ジフルオロベンゾ
フェノンが好ましく、工業的には4,4′−ジクロロベ
ンゾフェノンが好ましい。4,4′−ジハロゲノジフェ
ニルスルポンとしては4,4′−ジクロロジフェニルス
ルホン、4,4′−ジフルオロジフェニルスルホン。The above 4,4'-dihalogenobenzophenone is 4,
4'-dichlorobenzophenone, 4゜4'-difluorobenzophenone, 4,4'-dibromobenzophenone, etc. 4,4'-difluorobenzophenone is preferred from the viewpoint of yield, and 4,4'- Dichlorobenzophenone is preferred. Examples of 4,4'-dihalogenodiphenylsulfone include 4,4'-dichlorodiphenylsulfone and 4,4'-difluorodiphenylsulfone.
4.4′−ジブロモジフェニルスルホン等を用いること
ができ、工業的には4,4′−ジクロロジフェニルスル
ホンが好ましい。4,4'-dibromodiphenyl sulfone and the like can be used, and 4,4'-dichlorodiphenyl sulfone is industrially preferred.
4.4′−ジハロゲノベンゾフェノン又は4゜4′−ジ
ハロゲノジフェニルスルホンの反応の相手である2−(
ヒドロキシフェニル)−2−(4アミノフエニル)プロ
パンの使用量はジハロゲノベンゾフェノンまたはジハロ
ゲノジフェニルスルホンに対して2倍モル以上であり、
2〜3倍モル量が好ましい。2-(, which is the reaction partner of 4.4'-dihalogenobenzophenone or 4゜4'-dihalogenodiphenylsulfone)
The amount of hydroxyphenyl)-2-(4-aminophenyl)propane used is at least twice the molar amount of dihalogenobenzophenone or dihalogenodiphenylsulfone,
2 to 3 times the molar amount is preferred.
前記の反応に用いることができる塩基としては、水酸化
カリウム、水酸化ナトリウムなどの水酸化アルカリ、炭
酸カリウム、炭酸ナトリウムなどのアルカリ金属の炭酸
塩、炭酸水素カリウム、炭酸水素ナトリウムなどのアル
カリ金属の炭酸水素塩。Bases that can be used in the above reaction include alkali hydroxides such as potassium hydroxide and sodium hydroxide, alkali metal carbonates such as potassium carbonate and sodium carbonate, and alkali metal carbonates such as potassium hydrogen carbonate and sodium hydrogen carbonate. Bicarbonate.
カリウムエトキシド、ナトリウムメトキシド等のアルカ
リ金属のアルコキシド類である。これらの’42Nの使
用量は2−(ヒドロキシフェニル)−2−(4−アミノ
フェニル)プロパンに対してほぼ当モルであり、0.9
〜1.2倍モル量が好ましく、0.9〜1.0倍モル量
が特に好ましい。Alkali metal alkoxides such as potassium ethoxide and sodium methoxide. The amount of '42N used is approximately equivalent mole to 2-(hydroxyphenyl)-2-(4-aminophenyl)propane, which is 0.9
A molar amount of ~1.2 times is preferred, and a molar amount of 0.9 to 1.0 times is particularly preferred.
前記反応に用いることのできる非プロトン性極性溶媒と
しては、N−メチル−2−ピロリドン、N、N−ジメチ
ルホルムアミド、N、N−ジメチルアセトアミド、ジメ
チルスルホキシド、スルホラン、ヘキサメチルリン酸ト
リアミド、1,3−ジメチル−2−イミダゾリトン等で
あり、使用量は通常、原料の1〜10倍量である。これ
らの溶媒にトルエン、ベンゼン、キシレン、クロルベン
ゼン等水と共沸する溶媒を混合して用いることもできる
。Examples of aprotic polar solvents that can be used in the reaction include N-methyl-2-pyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide, dimethylsulfoxide, sulfolane, hexamethylphosphoric triamide, 1, 3-dimethyl-2-imidazolitone, etc., and the amount used is usually 1 to 10 times the amount of the raw material. It is also possible to use a mixture of these solvents with a solvent that is azeotropic with water, such as toluene, benzene, xylene, or chlorobenzene.
前記反応は通常100〜250℃で行ない、120〜2
00℃で行なうのが好ましい。反応時間は用いる原料、
溶媒によって異なるが、生成物を液体クロマトグラフィ
ーなどで確認しながら。The reaction is usually carried out at a temperature of 100 to 250°C, and a temperature of 120 to 2
Preferably, it is carried out at 00°C. The reaction time depends on the raw materials used,
Although it varies depending on the solvent, the product is confirmed by liquid chromatography, etc.
反応終結まで行えばよい。また、触媒として、クラウン
エーテル、クリプタンド、ポリエチレングリコール、ポ
リエチレングリコールアルキルエーテル、4級アンモニ
ウム塩、4級ホスホニウム塩等を用いてもよい。It is sufficient to carry out the reaction until the end of the reaction. Further, as a catalyst, crown ether, cryptand, polyethylene glycol, polyethylene glycol alkyl ether, quaternary ammonium salt, quaternary phosphonium salt, etc. may be used.
前記反応における一般的な操作としては、2−(ヒドロ
キシフェニル)−2−(アミノフェノキシ)プロパン、
塩基、溶媒を反応容器に入れ加熱し、フェノール塩とし
た後、ジハロゲノベンゾフェノンまたはジハロゲノジフ
ェニルスルホンを加えて反応させるか、全原料を初めか
ら同時に加えて反応させるかいずれの方法によってもよ
い。また、反応によって系内に水が生成する場合には、
窒素ガス等を吹き込む方法、水と共沸する溶剤を加えて
共沸させる方法等によって水を除去するのが好ましい。General operations in the above reaction include 2-(hydroxyphenyl)-2-(aminophenoxy)propane,
Either a base and a solvent may be placed in a reaction vessel and heated to form a phenol salt, and then dihalogenobenzophenone or dihalogenodiphenylsulfone is added and reacted, or all raw materials are added simultaneously from the beginning and reacted. In addition, if water is generated in the system due to the reaction,
It is preferable to remove water by a method such as blowing nitrogen gas or the like, adding a solvent that is azeotropic with water to cause azeotropic distillation, or the like.
反応が終了した後、反応液を水中に注いで生成物を沈殿
させる方法、塩をろ過して除いた後、濃縮するか、ある
いは水で再沈する方法等によって目的の化合物を得るこ
とができる。After the reaction is completed, the desired compound can be obtained by pouring the reaction solution into water to precipitate the product, filtering out the salt and then concentrating it, or reprecipitating it with water, etc. .
本発明に係る一般式(I)で示されるジアミンは、ポリ
イミド、ポリアミド、ポリマレイミド等耐熱樹脂の原料
として用いられるばかりでなく、エポキシ樹脂等の硬化
剤としても用いることができる。The diamine represented by the general formula (I) according to the present invention can be used not only as a raw material for heat-resistant resins such as polyimide, polyamide, and polymaleimide, but also as a curing agent for epoxy resins and the like.
以下、実施例により本発明の詳細な説明するが、本発明
はこれらの範囲に限定されるものではない。Hereinafter, the present invention will be explained in detail with reference to Examples, but the present invention is not limited to these scopes.
実施例1
冷却管、温度計、攪拌機、窒素ガス導入管を備えた4つ
ロフラスコに、2− (3−ヒドロキシフユニ/L/)
−2−(4’−アミノフェニル)プロパン45.4g、
ジメチルスルホキシド10omQ。Example 1 2-(3-Hydroxyfunyuni/L/) was placed in a four-bottle flask equipped with a cooling tube, thermometer, stirrer, and nitrogen gas introduction tube.
-2-(4'-aminophenyl)propane 45.4g,
Dimethyl sulfoxide 10omQ.
クロルベンゼン120muを加え室温で溶解した接水醸
化カリウム13gを同量の水に溶解した水溶液を加えた
。窒素ガスを流しながら加熱撹拌し、水を演出させた。An aqueous solution prepared by dissolving 13 g of water-brewed potassium in the same amount of water to which 120 mu of chlorobenzene was added and dissolved at room temperature was added. Water was produced by heating and stirring while flowing nitrogen gas.
水の演出がとまった後、温度を100℃に下げ、4,4
′−ジフルオロベンゾフェノン21.8 g を加え
、165℃で4時間反応させた。室温まで冷却し、沈殿
をろ過して除いた後、水中に注ぎ粗生成物を得た。粗生
成物をトルエン−ヘキサン混合溶媒より再結晶し、目的
の化合物4.41−ビス(3−(4−アミノ−α。After the water production has stopped, lower the temperature to 100℃ and heat 4,4
21.8 g of '-difluorobenzophenone was added and reacted at 165°C for 4 hours. After cooling to room temperature and removing the precipitate by filtration, the mixture was poured into water to obtain a crude product. The crude product was recrystallized from a toluene-hexane mixed solvent to obtain the target compound 4.41-bis(3-(4-amino-α).
α′−ジメチルベンジル)フェノキシ〕ジフェニルケト
ンを得た。収量45.5g 、融点107〜111℃液
体クロマトグラフィー(カラム:東ソー(株)TSK
Gel G2000H及びG3000Hを連結、溶離液
テトラヒドロフラン)による純度99.0%(面積比)
であった。α'-dimethylbenzyl)phenoxy]diphenylketone was obtained. Yield 45.5g, melting point 107-111℃ Liquid chromatography (column: Tosoh Corporation TSK)
Connecting Gel G2000H and G3000H, purity 99.0% (area ratio) using eluent tetrahydrofuran
Met.
このジアミンの分析結果は次のとおりである。The analysis results of this diamine are as follows.
(I)元素分析値(%)C43H*。N20゜CHN
計算値 81.65 6.33 4.43実測値
81,57 6,41 4.32(2)赤外線吸収スペ
クトル(IR)の吸収位置(KBr錠剤法、C11−’
)
3460.3390 (アミノ基)
2970.2870 (メチル基)
1600 (カルボニル基)1250
(エーテル基)
(3)核磁気共鳴吸収(NMR)のスペクトル位置(D
M SC−ds+ppm)
157 (I2H−重線)
4.86 (4H−重線)
6.4〜7.8 (24H多重線)
注)DMS○はジメチルスルホキシドの意味である。(I) Elemental analysis value (%) C43H*. N20゜CHN Calculated value 81.65 6.33 4.43 Actual value
81,57 6,41 4.32 (2) Absorption position of infrared absorption spectrum (IR) (KBr tablet method, C11-'
) 3460.3390 (amino group) 2970.2870 (methyl group) 1600 (carbonyl group) 1250
(ether group) (3) Nuclear magnetic resonance absorption (NMR) spectral position (D
M SC-ds+ppm) 157 (I2H-multiplet) 4.86 (4H-multiplet) 6.4-7.8 (24H-multiplet) Note) DMS○ means dimethyl sulfoxide.
実施例2
冷却管、温度計、撹拌機、窒素ガス導入管を備えた4つ
ロフラスコに、2−(3−ヒドロキシフェニル)−2−
(4’−アミノフェニル)プロパン68.1g、ジメチ
ルスルホキシド150mΩ、クロルベンゼン180mA
、4,4′−ジクロルジフェニルスルホン40.75g
、無水炭酸カリウム20.5 g を仕込み、窒素ガ
ス通気下に加熱撹拌し、水を演出させた。165℃で4
時間反応させた後、室温まで冷却した。反応液を水中に
注いで粗生成物を得た。ベンゼン−ヘキサン混合溶媒で
再結晶して目的の化合物4,4′−ビス〔3−(4−ア
ミノ−α、α′−ジメチルベンジル)フェノキシフジフ
ェニルスルホン71.1 g を得た。融点67〜7
0℃、液体クロマトグラフィーによる純度は99.4%
であった。Example 2 2-(3-hydroxyphenyl)-2- was placed in a four-bottle flask equipped with a cooling tube, thermometer, stirrer, and nitrogen gas introduction tube.
(4'-aminophenyl)propane 68.1g, dimethyl sulfoxide 150mΩ, chlorobenzene 180mA
, 40.75 g of 4,4'-dichlorodiphenylsulfone
, 20.5 g of anhydrous potassium carbonate were charged, and the mixture was heated and stirred under nitrogen gas to produce water. 4 at 165℃
After reacting for an hour, the mixture was cooled to room temperature. The reaction solution was poured into water to obtain a crude product. Recrystallization from a benzene-hexane mixed solvent gave 71.1 g of the target compound 4,4'-bis[3-(4-amino-α,α'-dimethylbenzyl)phenoxyfudiphenylsulfone. Melting point 67-7
Purity by liquid chromatography at 0°C is 99.4%
Met.
このジアミンの分析結果は次のとおりである。The analysis results of this diamine are as follows.
(I)元素分析値(%)C42H4゜N20.SCHN
S
計算値 75,45 5,99 4.19 4.79
実測値 75,18 6.03 4.02 4.66
(2)IRの吸収位置(KBrBr法、(n−’)34
50.3390 (アミノ基)
2970.2870 (メチル基)
1290.1110 (スルホニル基)1250
(エーテル基)(3)NMRのスペクトル位置
(DMS○−dc+ppm)1.55 (I2H
−重線)
4.87 (4H−重線)
6.4〜8.0 (24H多重線)
応用例1
撹拌機、温度計、窒素ガス導入管、下向き冷却管を備え
た4つロフラスコに実施例1で得られた4、4′−ビス
(3−(4−アミノ−α、αジメチルベンジル)フェノ
キシ〕ベンゾフェノン3.16 g とビスフェノー
ルAビストリメリテートニ無水物2.88g、N−メチ
ルピロリドン(NMP)15mQ、亜リン酸トリフェニ
ル0.2gを入れ、窒素ガスを流しながら200℃で5
時間反応させてポリイミドワニスを得た。このワニスを
水に注いで再沈し、粉砕、乾燥してポリイミド粉末を得
た。このポリイミドは、還元粘度(DMF中、濃度0.
1g/dR1温度30℃)が0.47d 27g、軟化
点(荷重10kg/cdで高化式フローテスタ)が16
5℃、5%重量減少温度が437℃であリジメチルホル
ムアミド(DMF)N−メチルピロリドン(NMP)、
ジオキサン、テトラヒドロフラン及び塩化メチレンそれ
ぞれに室温で可溶であった(ポリイミドの濃度5重量%
)。(I) Elemental analysis value (%) C42H4°N20. SCHN
S Calculated value 75,45 5,99 4.19 4.79
Actual value 75,18 6.03 4.02 4.66
(2) IR absorption position (KBrBr method, (n-') 34
50.3390 (amino group) 2970.2870 (methyl group) 1290.1110 (sulfonyl group) 1250
(ether group) (3) NMR spectral position (DMS○-dc+ppm) 1.55 (I2H
- double line) 4.87 (4H-multiple line) 6.4 to 8.0 (24H multiple line) Application example 1 Implemented in a four-loop flask equipped with a stirrer, thermometer, nitrogen gas inlet tube, and downward cooling tube. 3.16 g of 4,4'-bis(3-(4-amino-α,αdimethylbenzyl)phenoxy)benzophenone obtained in Example 1, 2.88 g of bisphenol A bistrimelitate dianhydride, and N-methylpyrrolidone. (NMP) 15mQ and 0.2g of triphenyl phosphite were added and heated to 200°C while flowing nitrogen gas.
A polyimide varnish was obtained by reacting for a period of time. This varnish was poured into water and reprecipitated, ground and dried to obtain polyimide powder. This polyimide has a reduced viscosity (in DMF, concentration 0.
1g/dR1 temperature 30℃) is 0.47d 27g, softening point (load 10kg/cd, Koka type flow tester) is 16
Lydimethylformamide (DMF) N-methylpyrrolidone (NMP) at 5°C and 5% weight loss temperature of 437°C;
It was soluble in dioxane, tetrahydrofuran and methylene chloride at room temperature (at a polyimide concentration of 5% by weight).
).
応用例2
撹拌機、温度計、塩化カルシウム管、窒素ガス導入管の
ついた4つロフラスコに実施例2で得られた4、4′−
ビス(3−(4−アミノ−α。Application Example 2 The 4,4'- obtained in Example 2 was placed in a four-loaf flask equipped with a stirrer, a thermometer, a calcium chloride tube, and a nitrogen gas introduction tube.
Bis(3-(4-amino-α.
α′−ジメチルベンジル)フェノキシ〕ジフェニルスル
ホン3.34g とN、N−ジメチルホルムアミド(
DMF)20mQを入れ溶解する。5℃以下に冷却しな
がらビスフェノールAビストリメリテートニ無水物2.
88 g を少しずつ加えた後。3.34 g of α'-dimethylbenzyl)phenoxy]diphenylsulfone and N,N-dimethylformamide (
Add 20 mQ of DMF and dissolve. Bisphenol A bistrimelitate dianhydride while cooling to below 5°C2.
After adding 88 g little by little.
5℃以下で3時間、室温で1時間反応させてポリアミド
酸ワニスを得た。このワニスに無水酢酸1.3g、ピリ
ジン1.0g を加え室温で3時間反応させてポリイミ
ドワニスを得た。このワニスを水に注いで再沈し、粉砕
、乾燥してポリイミド粉末を得た。このポリイミドは、
還元粘度(DMF中、a度0.1g/d Q、 温度3
0°C)カ0.33d 27g、軟化点(荷重10kg
/−で高化式フローテスタ)は162℃であった。A polyamic acid varnish was obtained by reacting at 5° C. or lower for 3 hours and at room temperature for 1 hour. To this varnish, 1.3 g of acetic anhydride and 1.0 g of pyridine were added and reacted at room temperature for 3 hours to obtain a polyimide varnish. This varnish was poured into water and reprecipitated, ground and dried to obtain polyimide powder. This polyimide is
Reduced viscosity (in DMF, a degree 0.1 g/d Q, temperature 3
0°C) force 0.33d 27g, softening point (load 10kg
/- and Koka type flow tester) was 162°C.
このポリイミド粉末は、室温でDMF、ジオキサン、テ
トラヒドロフラン及び塩化メチレンそれぞれに室温で可
溶であった(ポリイミドの濃度5重量%)。また5%重
量減少温度は432°Cであった。This polyimide powder was soluble at room temperature in each of DMF, dioxane, tetrahydrofuran, and methylene chloride (polyimide concentration 5% by weight). Further, the 5% weight loss temperature was 432°C.
本発明に係るジアミンは新規化合物であり、該ジアミン
は耐熱性樹脂の原料、エポキシ樹脂の硬化剤等に有用で
あり、該ジアミンを使用して得られるポリイミドは有機
溶剤に可溶であって低軟化−4:The diamine according to the present invention is a new compound, and the diamine is useful as a raw material for heat-resistant resins, a curing agent for epoxy resins, etc., and the polyimide obtained using the diamine is soluble in organic solvents and has a low Softening-4:
Claims (1)
▼又は▲数式、化学式、表等があります▼を 示す)で表わされるジアミン。[Claims] 1. General formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼...(I) (However, in the formula, X is ▲There are mathematical formulas, chemical formulas, tables, etc.▼ or ▲Mathematical formula , chemical formula, table, etc.) Diamine represented by ▼).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63160419A JPH0751545B2 (en) | 1988-06-28 | 1988-06-28 | New diamine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63160419A JPH0751545B2 (en) | 1988-06-28 | 1988-06-28 | New diamine |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH029848A true JPH029848A (en) | 1990-01-12 |
JPH0751545B2 JPH0751545B2 (en) | 1995-06-05 |
Family
ID=15714521
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63160419A Expired - Fee Related JPH0751545B2 (en) | 1988-06-28 | 1988-06-28 | New diamine |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0751545B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000061658A1 (en) * | 1999-04-09 | 2000-10-19 | Kaneka Corporation | Polyimide resin, resin composition with improved moisture resistance comprising the same, adhesive solution, filmy bonding member, layered adhesive film, and processes for producing these |
-
1988
- 1988-06-28 JP JP63160419A patent/JPH0751545B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000061658A1 (en) * | 1999-04-09 | 2000-10-19 | Kaneka Corporation | Polyimide resin, resin composition with improved moisture resistance comprising the same, adhesive solution, filmy bonding member, layered adhesive film, and processes for producing these |
US6693162B2 (en) | 1999-04-09 | 2004-02-17 | Kaneka Japan Corporation | Polyimide resin and resin composition, adhesive solution, film-state joining component,and adhesive laminate film improved in moisture resistance using it, and production methods therefor |
Also Published As
Publication number | Publication date |
---|---|
JPH0751545B2 (en) | 1995-06-05 |
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