JPH0292547A - Base for liquid jet recording head and liquid jet recording head equipped with such base - Google Patents

Base for liquid jet recording head and liquid jet recording head equipped with such base

Info

Publication number
JPH0292547A
JPH0292547A JP24511688A JP24511688A JPH0292547A JP H0292547 A JPH0292547 A JP H0292547A JP 24511688 A JP24511688 A JP 24511688A JP 24511688 A JP24511688 A JP 24511688A JP H0292547 A JPH0292547 A JP H0292547A
Authority
JP
Japan
Prior art keywords
liquid
recording head
jet recording
heat generating
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24511688A
Other languages
Japanese (ja)
Other versions
JP2664220B2 (en
Inventor
Akira Asai
朗 浅井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP24511688A priority Critical patent/JP2664220B2/en
Publication of JPH0292547A publication Critical patent/JPH0292547A/en
Application granted granted Critical
Publication of JP2664220B2 publication Critical patent/JP2664220B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14016Structure of bubble jet print heads
    • B41J2/14032Structure of the pressure chamber
    • B41J2/1404Geometrical characteristics
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2002/14379Edge shooter
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2202/00Embodiments of or processes related to ink-jet or thermal heads
    • B41J2202/01Embodiments of or processes related to ink-jet heads
    • B41J2202/11Embodiments of or processes related to ink-jet heads characterised by specific geometrical characteristics

Landscapes

  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)

Abstract

PURPOSE:To improve quality of an image by improving reproducibility of boiling by a method wherein an electricity-heat converter of a shape of increasing a thickness is established in a part containing a position at which a bubble to be generated in recording liquid on a recording liquid contact surface corresponding to a heat generation part disappears, and a temperature difference between inside and outside the position at which the bubble disappears attains a specific value. CONSTITUTION:A bubble disappearing position is determined by a shape of a liquid path 1 to which a heating resistor is arranged, an arranged position, temperature, other ambient conditions, etc., is influenced by an inertia component Z of hydrodynamic impedance in a bubble peripheral drainage basin, and the bubble disappears near a position at which the heating resistor is proportionally allocated by an reverse ratio of Z. The bubble disappearing position is obtained by the formulas [I], [II] from the inertia component Z of impedance of the drainage basin. Herein, lengths of the drainage basin are l1, l2, sectional area of the liquid path is S, and density of liquid is rho. The bubble disappears near a position to be determined by those relation formulas. Then, by increasing a thickness of a heating resistor 107 layer at a part containing said position, heat flux transmitted to upper liquid decreased. Then, a difference in temperature between a peak value of surface temperature of the heating resistor and a peak value of surface temperature of an area in which the layer thickness is increased is 25 deg.C or higher up to and including 100 deg.C.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、液体噴射記録ヘッドおよび該記録ヘッドに用
いる基板に関し、特に記録用液体に熱エネルギを作用さ
せることにより液体を沸騰させ、これにより液滴を噴射
(吐出)して記録を行う形態の液体噴射記録ヘッド、お
よび通電に応じて上記熱エネルギを発生する電気熱変換
体を含む基体に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a liquid jet recording head and a substrate used for the recording head, and in particular to a liquid jet recording head that boils the liquid by applying thermal energy to the recording liquid. The present invention relates to a liquid jet recording head that performs recording by jetting (discharging) droplets, and a substrate that includes an electrothermal transducer that generates the thermal energy in response to energization.

[従来の技術] この種液体噴射記録ヘッドないし電気熱変換体に要求さ
れる性能としては、高速駆動時の応答性が高いこと、液
体を沸騰させるのに充分な加熱が可能であることに加え
、耐久性が高いことがある。そのために従来より材料、
構成の面で種々の改良がなされてきた。
[Prior Art] Performances required of this type of liquid jet recording head or electrothermal converter include high responsiveness during high-speed driving, and the ability to heat the liquid sufficiently to boil it. , may be highly durable. For this purpose, we have traditionally used materials,
Various improvements have been made in terms of construction.

例えば、本願人の出願になる特開昭58−:13471
号では、電気熱変換体を、電極との接続部における電流
密度を低下させるような抵抗分布を有する構成とし、電
気的耐久性を向上した記録ヘッドを開示している。
For example, JP-A-58-13471, which is filed by the applicant.
No. 6, No. 2003-11-112, discloses a recording head in which the electrothermal transducer has a resistance distribution that reduces the current density at the connection portion with the electrode, thereby improving electrical durability.

また、同しく特開昭60−208246号では、電気熱
変換体に、液体供給に伴って生じる機械的衝撃を回避す
る部材を設け、機械的耐久性を向上した記録ヘッドを開
示している。
Furthermore, Japanese Patent Application Laid-Open No. 60-208246 discloses a recording head in which the electrothermal transducer is provided with a member for avoiding mechanical shock caused by liquid supply, thereby improving mechanical durability.

また、特開昭59−95155号では、電気熱変換体(
抵抗器)の中心部に導電領域を設ける構成が開示されて
いる。
Furthermore, in JP-A No. 59-95155, an electrothermal converter (
A configuration is disclosed in which a conductive region is provided in the center of a resistor.

さらに、本願人の出願になる特開昭62−73588号
では、電極および電気熱変換体(発熱抵抗体)に丸みを
付けることによって電流集中をなくすようにした構成を
開示している。
Furthermore, Japanese Patent Laid-Open No. 62-73588 filed by the applicant discloses a structure in which current concentration is eliminated by rounding the electrodes and the electrothermal converter (heating resistor).

[発明が解決しようとする課題] しかしながら、吐出エネルギ発生手段に電気熱変換体を
有する記録ヘッドにあっては、上記条件に加え、沸騰の
再現性が高いことが要求される。
[Problems to be Solved by the Invention] However, in a recording head having an electrothermal converter in the ejection energy generating means, in addition to the above conditions, high reproducibility of boiling is required.

本願の発明者によれば、液体を繰り返し沸騰させる場合
、電気熱変換体に前回に与えた駆動信号(加熱パルス)
によって発生した気泡が消滅す′る際に、微視的残留気
体が電気熱変換体の表面にランダムに付着し、それが次
のパルス加熱の初期気泡発生時において発泡核となるた
めに沸騰の再現性が保証されないということが確聞され
ている。
According to the inventor of the present application, when repeatedly boiling a liquid, the drive signal (heating pulse) previously given to the electrothermal converter
When the bubbles generated in It has been confirmed that reproducibility is not guaranteed.

このように沸騰現象が安定しないと、発生する気泡の形
状や大きさが一定しなくなり、従って液滴径や吐出速度
にバラツキが生じ、ひいては画像品位が低下するという
問題点が生じつる。
If the boiling phenomenon is not stabilized in this manner, the shape and size of the generated bubbles will not be constant, resulting in variations in droplet diameter and ejection speed, which will lead to problems such as deterioration of image quality.

本発明の目的は、沸騰の再現性の高い記録ヘッドおよび
その基板を提供することにある。
An object of the present invention is to provide a recording head with high boiling reproducibility and a substrate thereof.

本発明の他の目的は、液滴径や吐出速度にバラツキが生
じず、画像品位の高い液体噴射記録ヘッドを提供するこ
とにある。
Another object of the present invention is to provide a liquid jet recording head with high image quality without variations in droplet diameter or ejection speed.

[課題を解決するための手段] そのために、本発明に係る液体噴射記録ヘッド用基体で
は、支持体と、支持体上に配され、発熱抵抗体層および
発熱抵抗体層に電気的に接続された一対の電極を有し、
一対の電極間に熱発生部か形成されている電気熱変換体
であって、熱発生部に対応する記録用液体接触面上の記
録用液体に生しる気泡が消滅する位置を含む部分で、厚
みを犬とした形状を有する当該電気熱変換体とを具備し
、ΔTTH−TOか20℃以上100℃以下であること
を特徴とする。
[Means for Solving the Problems] To this end, the substrate for a liquid jet recording head according to the present invention includes a support, a heating resistor layer disposed on the support and electrically connected to the heating resistor layer. It has a pair of electrodes,
An electrothermal transducer having a heat generating part formed between a pair of electrodes, which includes a position where bubbles generated in the recording liquid on the recording liquid contact surface corresponding to the heat generating part disappear. , and the electrothermal transducer having a dog-shaped thickness, and is characterized in that ΔTTH-TO is 20°C or more and 100°C or less.

また、本発明の他の形態に係る液体噴射記録ヘッドでは
、支持体と、支持体上に配され、発熱抵抗体層および発
熱抵抗体層に電気的に接続された一対の電極を有し、一
対の電極間に熱発生部が形成されている電気熱変換体で
あって、熱発生部に対応する記録用液体接触面上の記録
用液体に生じる気泡が消滅する位置を含む部分で、厚み
を犬とした形状を有する当該電気熱変換体とを有し、Δ
T −T I、−T Oが20℃以上100℃以下であ
る基体と、記録用液体の液路を形成するために基体上に
設けた部材とを具備したことを特徴とする。
Further, a liquid jet recording head according to another embodiment of the present invention includes a support and a pair of electrodes arranged on the support and electrically connected to a heating resistor layer and the heating resistor layer, An electrothermal transducer in which a heat generating part is formed between a pair of electrodes, and a portion including a position where air bubbles generated in the recording liquid on the recording liquid contact surface corresponding to the heat generating part disappear. and the electrothermal converter having a dog shape, and Δ
It is characterized by comprising a base body in which T - T I, -T O is 20° C. or more and 100° C. or less, and a member provided on the base body to form a liquid path for a recording liquid.

これらにおいて、TOは気泡が消滅する位置ての、記録
用液体が存在しないときの電気熱変換体の駆動状態の温
度のピーク値、THはその位置以外の位置での、記録用
液体が存在しないときの電気熱変換体の駆動状態での温
度のピーク値である。
In these, TO is the peak value of the temperature of the electrothermal converter in the driving state when no recording liquid is present at the position where the bubble disappears, and TH is the peak value of the temperature in the driving state of the electrothermal converter when no recording liquid is present at a position other than that position. This is the peak value of temperature when the electrothermal converter is in operation.

[作 用] 本発明によれは、電気熱変換体の層厚を、電極との電極
との間の電流の通り道の部分であって気泡が消滅する位
置を含む部分において犬とすることにより、電気熱変換
体から上部の液体に伝わる熱流束か、その部分において
小さくなる。
[Function] According to the present invention, by making the layer thickness of the electrothermal transducer thicker in the portion where the current passes between the electrodes and including the position where bubbles disappear, The heat flux transferred from the electrothermal converter to the upper liquid becomes smaller in that region.

従って、この部分は他の部分に比べて温度が低く、気泡
消滅後にその部分に微視的残留気体が付着していても、
続く駆動時にこれが発泡核となることがない。
Therefore, this part has a lower temperature than other parts, and even if there is microscopic residual gas attached to that part after the bubbles disappear,
This will not become a foaming nucleus during subsequent driving.

また、当該温度差を適切に選定して構成することにより
、高い吐出性能を維持し、これによる効果とあいまフて
、沸騰の再現性が向上し、ひいては良好な記録品位が得
られる。
In addition, by appropriately selecting and configuring the temperature difference, high ejection performance can be maintained, and combined with this effect, the reproducibility of boiling can be improved, and good recording quality can be obtained.

[実施例] 以下、図面を参照して本発明の詳細な説明する。[Example] Hereinafter, the present invention will be described in detail with reference to the drawings.

第1図(八) および(B)は、本発明を適用可能な液
体噴射記録ヘッドの一例として、複数の液路、電気熱変
換体および吐出口(オリフィス)を含む吐出部を複数集
積して配置した形態の液体噴射記録ヘッドを示す斜視図
およびそのX−X ’ 線断面図である。
FIGS. 1(8) and 1(B) show an example of a liquid jet recording head to which the present invention can be applied, in which a plurality of ejection portions including a plurality of liquid paths, electrothermal transducers, and ejection ports (orifices) are integrated. FIG. 2 is a perspective view and a cross-sectional view taken along line X-X′ of the liquid jet recording head in an arranged form.

これら図において、基板103上に発熱抵抗体107 
(107−1〜107−6)、および通電のための電極
として共通電極1061選択電極105が配されており
、発熱抵抗体107が丁度溝蓋板102に形成された隔
壁101a 〜101gにより限界された溝101 (
101−1〜101−6)と一致するように接着層10
4 (104−1〜104−7)によって接合する。こ
れに液体(インク)を導入し、通電により発熱抵抗体1
07を加熱すると、発熱抵抗体107上の液体に急峻な
状態変化によって気泡が生じ、その体積増加に対応した
液滴が溝蓋板102 と基板103とによって形成され
たオリフィスより吐出される。
In these figures, a heating resistor 107 is placed on a substrate 103.
(107-1 to 107-6), and a common electrode 1061 and a selection electrode 105 are arranged as electrodes for energization, and the heating resistor 107 is just limited by the partition walls 101a to 101g formed on the groove cover plate 102. groove 101 (
101-1 to 101-6) to match the adhesive layer 10.
4 (104-1 to 104-7). A liquid (ink) is introduced into this, and when electricity is applied, the heating resistor 1
07, bubbles are generated in the liquid on the heating resistor 107 due to a sudden change in state, and droplets corresponding to the increase in volume are discharged from the orifice formed by the groove cover plate 102 and the substrate 103.

本例に係る発熱抵抗体107は、後述のように、気泡消
滅位置において層厚が大となった部分を有する構成とす
る。
The heating resistor 107 according to this example has a structure in which the layer thickness is increased at the bubble extinguishing position, as will be described later.

ここで、気泡消滅位置(消泡位置)について考察する。Here, the bubble disappearance position (bubble extinction position) will be considered.

消泡位置は、発熱抵抗体を配設した液路の形状、配設位
置、温度その他の環境条件などにより定まり、気泡周辺
の流域における流体力学的インピーダンスの慣性成分Z
の影舌を受け、そのZの逆比で発熱抵抗体を比例配分し
た位置付近で消泡することを本願の発明者は確認した。
The point at which the bubble disappears is determined by the shape of the liquid path in which the heating resistor is installed, its location, temperature, and other environmental conditions, and is determined by the inertial component Z of the hydrodynamic impedance in the area around the bubble.
The inventor of the present application confirmed that foam disappears near the position where the heating resistors are proportionally distributed in accordance with the inverse ratio of Z.

ここに、着目する流域について、流れの方向にとった位
置をX、流域の位置xにおける断面積をS lxl 、
流域の長さを1.流体(記録用液体)の密度をρとする
と、流域のインピーダンスの慣性成分Zは、 によって求められる。
Here, regarding the basin of interest, the position taken in the flow direction is X, the cross-sectional area at the position x of the basin is S lxl ,
The length of the basin is 1. If the density of the fluid (recording liquid) is ρ, then the inertial component Z of the impedance of the basin can be found as follows.

例えば、第1図示のように、発熱抵抗体107に対して
、液体の供給方向と吐出方向とが一致する形態のものに
あっては、第2図に示すように、断面積S、x、−S・
一定とすると、 L−p Il、 r/S、 Z2−7) 12/S  
     (2)C1:C2:z、:Z+−12:Il
 r        (3)となる。すなわち、この関
係式により定まる位置付近で消泡することになる。
For example, as shown in FIG. 1, if the heating resistor 107 has a configuration in which the supply direction and discharge direction of the liquid are the same, the cross-sectional area S, x, -S・
Assuming constant, L-p Il, r/S, Z2-7) 12/S
(2) C1:C2:z, :Z+-12:Il
r (3). That is, bubbles disappear near the position determined by this relational expression.

そこで、その位置を含む部位で発熱抵抗体107の層を
厚くしておけば、上部の液体に伝わる熱流束がその部分
において小となる。
Therefore, if the layer of the heat generating resistor 107 is made thicker in a region including that position, the heat flux transmitted to the liquid above becomes smaller in that region.

以上が一般的な関係であるが、簡易的に位置Xにおける
ノズル天井の高さをh (x)としたとき、冑、−0ζ
”El/h(x)dxl、  +112−7[1/h(
x)ldx   (4)として、C,:C2@III、
:W、なる位置において気泡が消滅するとしても十分で
あった。
The above is a general relationship, but if the height of the nozzle ceiling at position
”El/h(x)dxl, +112-7[1/h(
x) ldx (4) as C,:C2@III,
:W, even if the bubbles disappeared at the position, it was sufficient.

次に、当該消泡位置を含む領域がそれ以外の領域と何程
の温度差を有している場合に吐出性能を良好に維持でき
るかについて考察する。
Next, we will consider how much of a temperature difference the region including the defoaming position has from other regions to maintain good discharge performance.

第3図は発熱抵抗体の表面温度のピーク値Tl+と、層
厚を大とした領域に対応した表面温度のピーク値T。と
の差ΔT (” TH−TO)について、液滴吐出速度
の平均値7および速度の標準偏差Ovをプロットしたも
のである。ただし、ここに温度差ΔTは、流路内にイン
クを存在させない状態での値である。
FIG. 3 shows the peak value Tl+ of the surface temperature of the heating resistor and the peak value T of the surface temperature corresponding to the region where the layer thickness is increased. The average value 7 of the droplet ejection speed and the standard deviation Ov of the speed are plotted for the difference ΔT ("TH-TO) between It is the value in the state.

図より明らかなように、温度差ΔTが20℃以上てあれ
ば、Ovがほぼ一定となり、吐出のばらつきが安定する
が、100℃を超えると平均速度が低下することが確認
された。これより、この場合には温度差ΔTは20℃以
上100℃以下が好ましいことがわかる。
As is clear from the figure, when the temperature difference ΔT is 20° C. or more, Ov becomes almost constant and the discharging variation becomes stable, but it was confirmed that when the temperature difference ΔT exceeds 100° C., the average speed decreases. From this, it can be seen that in this case, the temperature difference ΔT is preferably 20° C. or more and 100° C. or less.

より好ましくは、液体の吐出速度の標準偏差については
ある程度無視し得る場合、すなわち液体の吐出速度を主
として考慮した場合には、ΔTは20℃以上50℃以下
、液体の吐出速度をある程度無視し得る場合、すなわち
上記標準偏差を主として考慮した場合にはΔTは25℃
以上100℃以下であった。さらに、最も好ましくは、
ΔTは25℃以上60℃以下であった。
More preferably, when the standard deviation of the liquid ejection speed can be ignored to some extent, that is, when the liquid ejection speed is mainly considered, ΔT is 20° C. or more and 50° C. or less, and the liquid ejection speed can be ignored to some extent. In other words, when the above standard deviation is mainly considered, ΔT is 25°C.
The temperature was above 100°C. Furthermore, most preferably,
ΔT was 25°C or more and 60°C or less.

さらに、本実施例においては、発熱抵抗層の層厚を大と
した消泡位置を含む領域の寸法を適切に定める。
Furthermore, in this embodiment, the dimensions of the region including the defoaming position where the layer thickness of the heating resistor layer is increased are appropriately determined.

第4図は、当該領域の発熱部面積S。と発熱抵抗体の全
発熱部面積Sllとの比S。/SHについて、7および
aVをプロットしたものである。図より明らかなように
、So/S++を1710以上1/2以下としたと幹に
■およびOv値が安定し、吐出性能が良好となることが
確認された。
FIG. 4 shows the heat generating area area S of the region. and the total heat generating area Sll of the heat generating resistor. 7 and aV are plotted for /SH. As is clear from the figure, it was confirmed that when So/S++ was set to 1710 or more and 1/2 or less, the stem ■ and Ov value became stable and the discharge performance became good.

より好ましくは、液体の吐出速度の標準偏差については
ある程度無視し得る場合、すなわち液体の吐出速度を主
として考慮した場合にはS。/S□は1/10以上1/
4以下、液体の吐出速度をある程度無視し得る場合、す
なわち上記標準偏差を主として考慮した場合にはS。/
SHは1/8以上l/2以下であった。さらに、最も好
ましくは、So/S、4はl/8以上1/4以下であっ
た。
More preferably, it is S when the standard deviation of the liquid ejection speed can be ignored to some extent, that is, when the liquid ejection speed is mainly considered. /S□ is 1/10 or more 1/
4 or less, S if the liquid ejection speed can be ignored to some extent, that is, if the standard deviation above is mainly considered. /
SH was 1/8 or more and 1/2 or less. Furthermore, most preferably, So/S, 4 is 1/8 or more and 1/4 or less.

(実施例1) 第5図(A)および(B)は本発明に係る基板の第1の
実施例を示し、それぞれ、第1図(八)において液路方
向に沿った平面図およびその八−A’線断面図である。
(Example 1) FIGS. 5A and 5B show a first example of the substrate according to the present invention, and FIG. -A' line sectional view.

ここで、lは例えば厚さ525μmの基板であり、ガラ
スまたはSt等で形成できる。、2は厚さ2.5μmの
表面酸化5i02層であり、蓄熱層として用いる。3は
例えばスパッタリング法で形成した厚さ0.1μm1発
熱部幅30μm1発熱部長さ 150μmのHf82か
ら成る発熱抵抗体層であり、気泡が消滅する位置を含む
3−1の部分(式(2)において11=、Q2とすれば
、電極4間の電流の通り道の半ば付近)ではその層厚を
0.2μmとしたものである。4は例えばEB蒸着法で
形成した厚さ 0.5μmのA1等の電極である。
Here, l is a substrate having a thickness of 525 μm, for example, and can be made of glass, St, or the like. , 2 is a surface oxidized 5i02 layer with a thickness of 2.5 μm, which is used as a heat storage layer. 3 is a heat generating resistor layer made of Hf82 with a thickness of 0.1 μm, a width of a heat generating part of 30 μm, a length of a heat generating part of 150 μm, formed by sputtering, for example, and the part 3-1 including the position where bubbles disappear (in equation (2) 11=, Q2, the layer thickness is 0.2 μm near the middle of the current path between the electrodes 4). Reference numeral 4 denotes an electrode such as A1 having a thickness of 0.5 μm formed by, for example, an EB evaporation method.

5は、例えばスパッタリング法で形成した厚さ1.5μ
mのSiO□、SiN等の層、6は例えばスパッタリン
グ法で形成した厚さ0.1μmのTa205等の層、7
はスパッタリング法で形成した厚さ0.5μaのTa等
の層であり、これらは保護層として機能する。また、8
は沸騰させられる液体(インク)である。
5 has a thickness of 1.5μ formed by sputtering, for example.
6 is a layer of Ta205 or the like with a thickness of 0.1 μm formed by sputtering method, 7 is a layer of SiO□, SiN, etc.;
is a layer of Ta or the like having a thickness of 0.5 μa formed by a sputtering method, and functions as a protective layer. Also, 8
is a liquid (ink) that is boiled.

本実施例において、発熱抵抗層3の部分3−1の層厚d
と、空焚き時(インクを導入せずに通電を行ったとき)
の温度差ΔTの間の関係は次の通りてあった。
In this embodiment, the layer thickness d of the portion 3-1 of the heating resistance layer 3 is
and when dry firing (when energizing without introducing ink)
The relationship between the temperature difference ΔT was as follows.

従って、部分3−1の厚みは0.135μm以上0.1
55μm以下であるのが適当であり、本例ではd=0.
14μmとした。
Therefore, the thickness of the portion 3-1 is 0.135 μm or more and 0.1
It is appropriate that it is 55 μm or less, and in this example, d=0.
It was set to 14 μm.

また、部分3−1の長さを25μmとし、ここに5o=
30x25(μm2) 、 5H=30x150(μm
2)であり、従ってS。/SHは1/6であるので、第
4図について説明した条件も満たしている。
Also, the length of portion 3-1 is 25 μm, where 5o=
30x25(μm2), 5H=30x150(μm
2) and therefore S. Since /SH is 1/6, the condition explained in connection with FIG. 4 is also satisfied.

なお、発熱抵抗体層3および電8i4の平面パターンは
エツチングによって形成した。また、図より明らかなよ
うに、電極4と発熱抵抗体層3との接続部において角に
丸みをつけ、電流集中に伴う耐久性の低下や局所的な発
泡が生じない構成としである。
Note that the planar patterns of the heating resistor layer 3 and the electrodes 8i4 were formed by etching. Furthermore, as is clear from the figure, the corners at the connection between the electrode 4 and the heat generating resistor layer 3 are rounded to prevent deterioration in durability and local bubbling due to current concentration.

かかる構成において、電極4の間に電圧を印加すると、
発熱抵抗体層3に電流が流れ、発熱が起こる。発熱抵抗
体層3で発生する単位時間・単位面積当たりの発熱量は
発熱抵抗体層の厚みに反比例するから、部分3−1から
上部層5.6および7を通して液体8に伝えられる熱は
、発熱抵抗体3層の他の部分から液体に伝えられる熱に
比べて少なくなる。
In such a configuration, when a voltage is applied between the electrodes 4,
A current flows through the heating resistor layer 3 and heat generation occurs. Since the amount of heat generated in the heating resistor layer 3 per unit time and unit area is inversely proportional to the thickness of the heating resistor layer, the heat transferred from the portion 3-1 to the liquid 8 through the upper layers 5.6 and 7 is: This amount is less than the heat transferred to the liquid from other parts of the three layers of heating resistors.

本実施例に係る基板を用いて実際に気泡を発生させてみ
たところ、第6図に示すように、部分3−1の上部の場
所9において気泡10が消滅することが観察されたが、
この部分に伝わる熱は少なく、残りの部分に比べて温度
が低いために残留気体が付着してもそこからランダムな
核沸騰が起きて気泡発生を乱すということはなく、残り
の部分から極めて再現性の高い膜沸騰が起きていた。こ
の場合、気泡の形状・大きさは毎回一定であった。そし
て、この基板を第1図のように記録ヘッドに用いて記録
を行ったところ、FL滴径・吐出速度が均一となり、良
好な画像が得られた。
When bubbles were actually generated using the substrate according to this example, it was observed that the bubbles 10 disappeared at the location 9 in the upper part of the portion 3-1, as shown in FIG.
There is little heat transmitted to this part, and the temperature is lower than the rest of the part, so even if residual gas adheres, random nucleate boiling will not occur from there and disturb bubble generation, which is highly reproducible from the rest of the part. Highly sensitive film boiling was occurring. In this case, the shape and size of the bubbles were constant each time. Then, when this substrate was used in a recording head as shown in FIG. 1 to perform recording, the FL droplet diameter and ejection speed were uniform, and a good image was obtained.

部分3−1の上部以外の部分での沸騰の再現性が高いの
は残留気体が付着していない上に液体8が患部に加熱さ
れるために、液体8が過熱限界付近に到達し、液体内部
の分子運動に基づく自発的核生成現象によって気泡が形
成されるからである。
The reason for the high reproducibility of boiling in parts other than the upper part of part 3-1 is that there is no residual gas attached and the liquid 8 is heated to the affected area, so the liquid 8 reaches near the superheating limit and the liquid This is because bubbles are formed by a spontaneous nucleation phenomenon based on internal molecular motion.

比較例 第7図(従来例)は、発熱抵抗体層3の多層を均一とし
た以外は本実施例と同一の構成からなる電気熱変換体を
用いて気泡を発生させた場合の図を示し、本実施例とは
異なり気泡10が消滅する場所からランダムな核沸騰が
起こり、気泡発生の再現性が低下している。
Comparative Example FIG. 7 (conventional example) shows a case where air bubbles are generated using an electrothermal converter having the same structure as the present example except that the multilayer heating resistor layer 3 is made uniform. , unlike the present example, random nucleate boiling occurs from the location where the bubbles 10 disappear, reducing the reproducibility of bubble generation.

すなわち図中(a)の場合には核沸騰の起こる場所が1
筒所であって比較的良好な気泡生成が実現しているが、
いつもそのような気泡生成が実現するわけではなく、図
中(b)あるいは(C)のように?!数の場所から核沸
騰が起こる場合もあり、その場合核沸騰熱伝達によって
熱エネルギが液体中に逃げ、気泡体積が小さくなってし
まう。このような例では、気泡の形状・大きさが一定で
ないために、記録ヘッドを構成して記録を行ったところ
、液滴径や吐出速度にバラツキが生じ、画像の品位が低
下することが観察された。
In other words, in the case of (a) in the figure, the location where nucleate boiling occurs is 1.
Although it is a tube place, relatively good bubble generation has been achieved,
Such bubble formation does not always occur, as shown in (b) or (C) in the figure. ! Nucleate boiling may occur from several locations, in which case nucleate boiling heat transfer causes thermal energy to escape into the liquid, reducing the bubble volume. In such cases, it has been observed that because the shape and size of the bubbles are not constant, when the print head is configured to perform printing, variations occur in droplet diameter and ejection speed, resulting in a decrease in image quality. It was done.

(実施例2) 第8図は、本発明に係る基板の第2の実施例を示す。(Example 2) FIG. 8 shows a second embodiment of the substrate according to the invention.

上記第1の実施例では部分3−1を発熱抵抗体層3と同
時形成したのに対し、本実施例では発熱抵抗体層3′の
形成後に同じく電気熱変換体をなす部分3′−1を形成
した重層構成としである。この重層部分3′−1は、発
熱抵抗体層3′ と同じ材質(例えばHfBz)で形成
してもよく、あるいは異なる材質(例えばTaと Ta
AJ2 )を用いてもよい。この実施例においても(実
施例1)と同様の効果が得られた。
In the first embodiment, the portion 3-1 was formed at the same time as the heating resistor layer 3, whereas in this example, the portion 3'-1, which also constitutes an electrothermal transducer, was formed after the heating resistor layer 3' was formed. It has a multi-layered structure. This multilayer portion 3'-1 may be formed of the same material (for example, HfBz) as the heating resistor layer 3', or may be formed of a different material (for example, Ta and Ta).
AJ2) may also be used. In this example as well, the same effects as in (Example 1) were obtained.

このように、気泡が消滅する位置が完全に含まれるもの
であれば、層を厚くする部分の形成態様はいかなるもの
であってもよい。
In this way, the portion where the layer is thickened may be formed in any manner as long as the position where the bubbles disappear is completely included.

(実施例3) 以上の実施例では、液路が直線状である記録ヘッドに本
発明を適用した場合について述べたが、供給方向と吐出
方向とが異なる形態の記録ヘッド、例えば第9図に示す
ように、基板1′ に対して垂直方向に吐出がなされる
形態のものであっても、図示の消泡位置9を含む部分に
おいて発熱抵抗体層107′ の層厚を大とすることに
より、上述と同様の効果が得られる。
(Example 3) In the above example, a case was described in which the present invention was applied to a recording head in which the liquid path was linear. However, in the example shown in FIG. As shown, even if the discharge is perpendicular to the substrate 1', by increasing the thickness of the heating resistor layer 107' in the portion including the defoaming position 9 shown in the figure. , the same effect as described above can be obtained.

(さらに他の実施例) 本発明は、発熱抵抗体の形状によらず適用できるのは勿
論である。すなわち、上述した従来例において採用され
ている発熱抵抗体に対しても、その消泡位置に層を厚く
した部分を設ければよい。
(Further other embodiments) Of course, the present invention can be applied regardless of the shape of the heating resistor. That is, even for the heating resistor employed in the conventional example described above, a thicker layer may be provided at the defoaming position.

また、近年開発されている階調表現が可能な形状の電気
熱変換体を有する記録ヘッド、例えば本願人の提案にな
る特公昭59−31943号に開示されるようなものに
対しても有効に適用可能である。すなわち、電気熱変換
体を、その発熱部において入力される信号のレベルに応
じて制御可能な温度分布を生しる構造(発熱量調整構造
)とし、信号レベルに応じて気泡を多段階に調整するよ
うな構成の記録ヘッドに対しても適用できる。
It is also effective for recording heads that have electrothermal transducers shaped to be able to express gradation, which have been developed in recent years, such as the one disclosed in Japanese Patent Publication No. 31943/1983 proposed by the applicant. Applicable. In other words, the electrothermal converter has a structure (heat generation adjustment structure) that produces a controllable temperature distribution according to the level of the signal input in the heat generating part, and the bubbles are adjusted in multiple stages according to the signal level. The present invention can also be applied to a recording head having such a configuration.

例えば、第1O図(A)〜(C)に示すような電気熱変
換体において、消泡位置が符号9″で示す位置にあれば
、そこを含む部分(破線で示す部分)で電気熱変換体1
07″ないし発熱抵抗体層3″の層厚を犬とすればよい
。また、生じる気泡の大きさによって消泡位置が異なる
のであれば、そのような幅広の部分を複数設けてもよい
(第10図(A)の点鎖線で示す部分を参照)。
For example, in the electrothermal converter as shown in Figures 1O (A) to (C), if the defoaming position is at the position indicated by the symbol 9'', the electrothermal conversion is performed at the part including that position (the part indicated by the broken line). body 1
The layer thickness of the heating resistor layer 3'' may be set to 0.07'' to 0.07''. Further, if the bubble extinguishing position differs depending on the size of bubbles generated, a plurality of such wide portions may be provided (see the portion indicated by the dotted chain line in FIG. 10(A)).

また、気泡を多段階に調整するために発熱抵抗体層の層
厚を電流の向きに沿って変化させた構造(特開昭59−
31943号)や、発熱抵抗体層の厚さを中心線側に向
かって段階的に厚くしたような構造(特開昭62−20
1255号)に対しても適用できる。
In addition, in order to adjust the bubbles in multiple stages, we have developed a structure in which the thickness of the heating resistor layer is changed along the direction of the current (Japanese Patent Application Laid-Open No.
31943), and a structure in which the thickness of the heating resistor layer is gradually increased toward the center line (Japanese Patent Laid-Open No. 62-20
1255).

すなわち、例えば前者にあっては、第11図に示すよう
に、消泡位置を含む部分30−1で発熱抵抗体層30を
部分的に厚くすればよい。もちろん、消泡位置が気泡の
大きさによって変化するのであれば、これを複数設ける
こともできる。
That is, for example, in the former case, as shown in FIG. 11, the heating resistor layer 30 may be partially thickened in a portion 30-1 including the defoaming position. Of course, if the defoaming position changes depending on the size of the bubbles, a plurality of these can be provided.

加えて、本発明は、電気熱変換体を吐出エネルギ発生手
段とするものであれば、第1図に示したような集積型の
ものに限られることなく適用できるのは勿論であり、さ
らにシリアル走査される形態の記録ヘッドや、記録媒体
の全幅にわたって吐出口を選別させたフルマルチ形態の
記録ヘラ]〜にも通用できるのは言うまでもない。
In addition, the present invention is of course applicable to any device that uses an electrothermal converter as a discharge energy generating means without being limited to the integrated type shown in FIG. Needless to say, the present invention can also be applied to a scanning type recording head and a fully multi-type recording spatula in which the ejection ports are selected over the entire width of the recording medium.

[発明の効果] 以上説明したように、本発明によれば、電気熱変換体(
発熱抵抗体層)の厚みを、気泡が消滅する位置を含む部
分において犬とすることによって、沸騰の再現性が向上
し、得られる画像の品位が向上するという効果が得られ
た。
[Effects of the Invention] As explained above, according to the present invention, the electrothermal converter (
By making the thickness of the heat-generating resistor layer (heat-generating resistor layer) uniform in the portion including the position where the bubbles disappear, the reproducibility of boiling was improved and the quality of the resulting image was improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(A>および(B)は、それぞれ、本発明の実施
例に係る液体噴射記録ヘッドの分解斜視図および正面図
、 第2図はその消泡位置を説明するための説明図、 第3図は吐出に最適な温度差の範囲を説明するための説
明図、 第4図は同じく面積比を説明するための説明図、 第5図(A)および(B)は、それぞれ、本発明に係る
基板の第1実施例を示す平面図およびそのA−へ′線断
面図、 第6図は本発明を用いた場合の二へ泡挙動を示す説明図
、 第7図は従来例における気泡挙動を示す説明図、 第8図は本発明の第2実施例に係る基板の断面図、 第9図は本発明の第3実施例に係る記録ヘッドを示す説
明図、 第10図(A)〜(C)および第11図は本発明のさら
に他の実施例を示す平面図である。 1 、 1 ′  ・・・基才反、 2・・・蓄熱層、 3.3′ 53″・・・発熱抵抗体層、3−1.3’−
1,30−1・・・発熱抵抗体層3の厚みを犬とした部
分、 4・・・電極、 5・・・保護層(Si(h)、 6・・・保護層(Ta20s)、 7・・・保護層(Ta)、 8・・・液体、 9.9.9″・・・気泡の消滅位蓋、 10・・・気泡。 第2図 (T+−TO)=Δ丁 第3図 01/10 1/2 o158 第4図 吐出口 第9図 凸 凸 C=さエビ=:き こ)2−と二二≧ 第7図 第1O図
1 (A> and (B) are respectively an exploded perspective view and a front view of a liquid jet recording head according to an embodiment of the present invention, FIG. 2 is an explanatory diagram for explaining the defoaming position, Figure 3 is an explanatory diagram for explaining the range of temperature difference that is optimal for discharge, Figure 4 is an explanatory diagram for explaining the area ratio, and Figures 5 (A) and (B) are respectively 6 is an explanatory diagram showing the behavior of bubbles in the case of using the present invention, and FIG. 7 is a diagram showing the bubble behavior in the conventional example. FIG. 8 is a cross-sectional view of a substrate according to a second embodiment of the present invention; FIG. 9 is an explanatory diagram showing a recording head according to a third embodiment of the present invention; FIG. 10 (A) -(C) and FIG. 11 are plan views showing still other embodiments of the present invention. 1, 1'... Basic resistance, 2... Heat storage layer, 3.3'53''...・Heating resistor layer, 3-1.3'-
1, 30-1... Portion with the thickness of the heating resistor layer 3 as a dog, 4... Electrode, 5... Protective layer (Si(h), 6... Protective layer (Ta20s), 7 ...Protective layer (Ta), 8...Liquid, 9.9.9''...Bubble disappearance lid, 10...Bubble. Fig. 2 (T+-TO) = ΔT Fig. 3 01/10 1/2 o158 Fig. 4 Discharge port Fig. 9 Convex/convex C = Saebi =: Kiko) 2- and 22 ≧ Fig. 7 Fig. 1O

Claims (1)

【特許請求の範囲】 1)支持体と、 該支持体上に配され、発熱抵抗体層および該発熱抵抗体
層に電気的に接続された一対の電極を有し、前記一対の
電極間に熱発生部が形成されている電気熱変換体であっ
て、前記熱発生部に対応する記録用液体接触面上の記録
用液体に生じる気泡が消滅する位置を含む部分で、厚み
を大とした形状を有する当該電気熱変換体と を具備し、ΔT=T_H−T_Oが20℃以上100℃
以下であることを特徴とする液体噴射記録ヘッド用基体
。 T_O:前記位置での、記録用液体が存在しないときの
前記電気熱変換体の駆動状態の温度のピーク値。 T_H:前記位置以外の位置での、記録用液体が存在し
ないときの前記電気熱変換体の駆動状態での温度のピー
ク値。 2)より好ましくは、前記ΔTを、主として前記記録用
液体の吐出速度を考慮した場合には20℃以上60℃以
下、主として前記記録用液体の吐出速度の標準偏差を考
慮した場合には25℃以上100℃以下、最も好ましく
は前記ΔTを25℃以上60℃以下としたことを特徴と
する請求項1記載の液体噴射記録ヘッド用基体。 3)前記記録用液体の液路に沿った前記熱発生部の長さ
を前記液路に沿った前記熱発生部の両側にある流域の流
体力学的インピーダンスの慣性成分Zの逆比で比例配分
した位置を、前記気泡が消滅する位置としたことを特徴
とする請求項1記載の液体噴射記録ヘッド用基体。 ▲数式、化学式、表等があります▼ [x:着目する流域について流れ方向にとった位置、l
:着目する流域の長さ、S(x):位置xにおける液路
の断面積、ρ:記録用液体の密度] 4)流域について記録用液体の流れ方向にとった位置x
における液路の高さをh(x)としたとき、前記両側の
▲数式、化学式、表等があります▼の逆比で前記熱発生
部 の前記長さを比例配分した位置を、前記気泡が消滅する
位置としたことを特徴とする請求項3記載の液体噴射記
録ヘッド用基体。 5)前記部分に対応した前記熱発生部上の面積S_Oと
、前記熱発生部上の全面積S_Hとの比S_O/S_H
を、好ましくは1/10以上1/2以下、より好ましく
は、主として液体の吐出速度を考慮した場合には1/1
0以上1/4以下、主として液体の吐出速度の標準偏差
を考慮した場合には1/8以上1/2以下、最も好まし
くは1/8以上1/4以下としたことを特徴とする請求
項1に記載の液体噴射記録ヘッド用基体。 6)支持体と、 該支持体上に配され、発熱抵抗体層および該発熱抵抗体
層に電気的に接続された一対の電極を有し、前記一対の
電極間に熱発生部が形成されている電気熱変換体であっ
て、前記熱発生部に対応する記録用液体接触面上の記録
用液体に生じる気泡が消滅する位置を含む部分で、厚み
を大とした形状を有する当該電気熱変換体と を有し、ΔT=T_H−T_Oが20℃以上100℃以
下である基体と、 前記記録用液体の液路を形成するために前記基体上に設
けた部材と を具備したことを特徴とする液体噴射記録ヘッド。 T_O:前記位置での、記録用液体が存在しないときの
前記電気熱変換体の駆動状態の温度のピーク値。 T_H:前記位置以外の位置での、記録用液体が存在し
ないときの前記電気熱変換体の駆動状態での温度のピー
ク値。 7)より好ましくは、前記ΔTを、主として前記記録用
液体の吐出速度を考慮した場合には20℃以上60℃以
下、主として前記記録用液体の吐出速度の標準偏差を考
慮した場合には25℃以上100℃以下、最も好ましく
は前記ΔTを25℃以上60℃以下としたことを特徴と
する請求項6記載の液体噴射記録ヘッド。 8)前記記録用液体の液路に沿った前記熱発生部の長さ
を前記液路に沿った前記熱発生部の両側にある流域の流
体力学的インピーダンスの慣性成分Zの逆比で比例配分
した位置を、前記気泡が消滅する位置としたことを特徴
とする請求項6記載の液体噴射記録ヘッド。▲数式、化
学式、表等があります▼ 9)流域について記録用液体の流れ方向にとつた位置x
における液路の高さをh(x)としたとき、前記両側の
▲数式、化学式、表等があります▼の逆比で前記熱発生
部 の前記長さを比例配分した位置を、前記気泡が消滅する
位置としたことを特徴とする請求項8記載の液体噴射記
録ヘッド。 10)前記部分に対応した前記熱発生部上の面積S_O
と、前記熱発生部上の全面積S_Hとの比S_O/S_
Hを、好ましくは1/10以上1/2以下、より好まし
くは、主として液体の吐出速度を考慮した場合には1/
10以上1/4以下、主として液体の吐出速度の標準偏
差を考慮した場合には1/8以上1/2以下、最も好ま
しくは1/8以上1/4以下としたことを特徴とする請
求項6に記載の液体噴射記録ヘッド用基体。
[Scope of Claims] 1) A support, a heating resistor layer disposed on the support, and a pair of electrodes electrically connected to the heating resistor layer, and between the pair of electrodes. An electrothermal transducer in which a heat generating portion is formed, and the thickness is increased in a portion including a position where air bubbles generated in the recording liquid on the recording liquid contact surface corresponding to the heat generating portion disappear. and the electrothermal converter having a shape, ΔT=T_H−T_O is 20°C or more and 100°C
A substrate for a liquid jet recording head characterized by the following: T_O: Peak value of the temperature in the driving state of the electrothermal transducer when no recording liquid is present at the position. T_H: Peak value of temperature at a position other than the above position in the driving state of the electrothermal transducer when no recording liquid is present. 2) More preferably, the ΔT is 20° C. or more and 60° C. or less when mainly considering the ejection speed of the recording liquid, and 25° C. when mainly considering the standard deviation of the ejecting speed of the recording liquid. 2. The substrate for a liquid jet recording head according to claim 1, wherein the ΔT is greater than or equal to 25°C and less than or equal to 60°C, most preferably greater than or equal to 25°C and less than or equal to 60°C. 3) The length of the heat generating section along the liquid path of the recording liquid is proportionally distributed by the inverse ratio of the inertial component Z of the hydrodynamic impedance of the flow area on both sides of the heat generating section along the liquid path. 2. The substrate for a liquid jet recording head according to claim 1, wherein the position where the bubble disappears is set as the position where the bubble disappears. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ [x: Position in the flow direction of the basin of interest, l
: Length of the basin of interest, S(x): Cross-sectional area of the liquid path at position x, ρ: Density of the recording liquid] 4) Position x of the basin in the flow direction of the recording liquid
Let h(x) be the height of the liquid path at 4. The substrate for a liquid jet recording head according to claim 3, wherein the substrate is located at a position where the liquid jet recording head disappears. 5) Ratio S_O/S_H of the area S_O on the heat generating part corresponding to the part and the total area S_H on the heat generating part
is preferably 1/10 or more and 1/2 or less, more preferably 1/1 when mainly considering the liquid ejection speed.
A claim characterized in that the ratio is 0 or more and 1/4 or less, and when the standard deviation of liquid ejection speed is mainly considered, 1/8 or more and 1/2 or less, most preferably 1/8 or more and 1/4 or less. 1. The substrate for a liquid jet recording head according to 1. 6) It has a support, a heating resistor layer disposed on the support, and a pair of electrodes electrically connected to the heating resistor layer, and a heat generating portion is formed between the pair of electrodes. The electrothermal transducer has a thicker shape at a portion including a position where bubbles generated in the recording liquid on the recording liquid contact surface corresponding to the heat generating part disappear. a converter, and a base body in which ΔT=T_H−T_O is 20°C or more and 100°C or less, and a member provided on the base body to form a liquid path for the recording liquid. A liquid jet recording head. T_O: Peak value of the temperature in the driving state of the electrothermal transducer when no recording liquid is present at the position. T_H: Peak value of temperature at a position other than the above position in the driving state of the electrothermal transducer when no recording liquid is present. 7) More preferably, the ΔT is 20° C. or more and 60° C. or less when mainly considering the ejection speed of the recording liquid, and 25° C. when mainly considering the standard deviation of the ejecting speed of the recording liquid. 7. The liquid jet recording head according to claim 6, wherein the ΔT is set to be at least 25 degrees Celsius and not more than 60 degrees Celsius, most preferably at least 25 degrees Celsius and not more than 60 degrees Celsius. 8) The length of the heat generating section along the liquid path of the recording liquid is proportionally distributed by the inverse ratio of the inertial component Z of the hydrodynamic impedance of the basin on both sides of the heat generating section along the liquid path. 7. The liquid jet recording head according to claim 6, wherein the position where the bubble disappears is determined as the position where the bubble disappears. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ 9) Position x of the basin in the flow direction of the recording liquid
Let h(x) be the height of the liquid path at 9. The liquid jet recording head according to claim 8, wherein the liquid jet recording head is at a position where the liquid jet recording head disappears. 10) Area S_O on the heat generating part corresponding to the part
and the total area S_H on the heat generating part S_O/S_
H is preferably 1/10 or more and 1/2 or less, more preferably 1/1 when mainly considering the liquid ejection speed.
A claim characterized in that the ratio is 10 or more and 1/4 or less, and when the standard deviation of liquid ejection speed is mainly considered, 1/8 or more and 1/2 or less, most preferably 1/8 or more and 1/4 or less. 6. The substrate for a liquid jet recording head according to 6.
JP24511688A 1988-09-29 1988-09-29 Liquid jet recording head Expired - Fee Related JP2664220B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24511688A JP2664220B2 (en) 1988-09-29 1988-09-29 Liquid jet recording head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24511688A JP2664220B2 (en) 1988-09-29 1988-09-29 Liquid jet recording head

Publications (2)

Publication Number Publication Date
JPH0292547A true JPH0292547A (en) 1990-04-03
JP2664220B2 JP2664220B2 (en) 1997-10-15

Family

ID=17128860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24511688A Expired - Fee Related JP2664220B2 (en) 1988-09-29 1988-09-29 Liquid jet recording head

Country Status (1)

Country Link
JP (1) JP2664220B2 (en)

Also Published As

Publication number Publication date
JP2664220B2 (en) 1997-10-15

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