JPH0282031U - - Google Patents

Info

Publication number
JPH0282031U
JPH0282031U JP16288788U JP16288788U JPH0282031U JP H0282031 U JPH0282031 U JP H0282031U JP 16288788 U JP16288788 U JP 16288788U JP 16288788 U JP16288788 U JP 16288788U JP H0282031 U JPH0282031 U JP H0282031U
Authority
JP
Japan
Prior art keywords
spout
chemical vapor
generation device
vapor phase
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16288788U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16288788U priority Critical patent/JPH0282031U/ja
Publication of JPH0282031U publication Critical patent/JPH0282031U/ja
Pending legal-status Critical Current

Links

JP16288788U 1988-12-14 1988-12-14 Pending JPH0282031U (US20030199744A1-20031023-C00003.png)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16288788U JPH0282031U (US20030199744A1-20031023-C00003.png) 1988-12-14 1988-12-14

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16288788U JPH0282031U (US20030199744A1-20031023-C00003.png) 1988-12-14 1988-12-14

Publications (1)

Publication Number Publication Date
JPH0282031U true JPH0282031U (US20030199744A1-20031023-C00003.png) 1990-06-25

Family

ID=31447123

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16288788U Pending JPH0282031U (US20030199744A1-20031023-C00003.png) 1988-12-14 1988-12-14

Country Status (1)

Country Link
JP (1) JPH0282031U (US20030199744A1-20031023-C00003.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007108401A1 (ja) * 2006-03-20 2007-09-27 Hitachi Kokusai Electric Inc. 半導体装置の製造方法および基板処理装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007108401A1 (ja) * 2006-03-20 2007-09-27 Hitachi Kokusai Electric Inc. 半導体装置の製造方法および基板処理装置
US8304328B2 (en) 2006-03-20 2012-11-06 Hitachi Kokusai Electric Inc. Manufacturing method of semiconductor device and substrate processing apparatus

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