JPH0279499A - Chemical doping method for high molecular film - Google Patents
Chemical doping method for high molecular filmInfo
- Publication number
- JPH0279499A JPH0279499A JP22979188A JP22979188A JPH0279499A JP H0279499 A JPH0279499 A JP H0279499A JP 22979188 A JP22979188 A JP 22979188A JP 22979188 A JP22979188 A JP 22979188A JP H0279499 A JPH0279499 A JP H0279499A
- Authority
- JP
- Japan
- Prior art keywords
- film
- solvent
- high molecular
- polymer
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 25
- 239000000126 substance Substances 0.000 title claims description 6
- 239000002120 nanofilm Substances 0.000 title abstract 2
- 239000002904 solvent Substances 0.000 claims abstract description 18
- 239000000243 solution Substances 0.000 claims abstract description 16
- 239000007800 oxidant agent Substances 0.000 claims abstract description 11
- 230000007935 neutral effect Effects 0.000 claims abstract description 9
- 150000001491 aromatic compounds Chemical class 0.000 claims abstract description 8
- 239000012266 salt solution Substances 0.000 claims abstract description 6
- 239000000758 substrate Substances 0.000 claims abstract description 5
- 238000005406 washing Methods 0.000 claims abstract description 5
- 229920001940 conductive polymer Polymers 0.000 claims description 11
- 229920000642 polymer Polymers 0.000 abstract description 14
- 150000001450 anions Chemical class 0.000 abstract description 9
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 abstract description 8
- 229920006254 polymer film Polymers 0.000 abstract description 7
- 230000001590 oxidative effect Effects 0.000 abstract description 4
- 239000000203 mixture Substances 0.000 abstract description 3
- 239000003960 organic solvent Substances 0.000 abstract description 3
- 206010034972 Photosensitivity reaction Diseases 0.000 abstract description 2
- 230000036211 photosensitivity Effects 0.000 abstract description 2
- 241001053161 Oriolus oriolus Species 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- -1 3- xylpyrrole Chemical compound 0.000 description 19
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 229930192474 thiophene Natural products 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 150000003233 pyrroles Chemical class 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- FXPOCCDGHHTZAO-UHFFFAOYSA-N 4-methyl-1h-pyrrole-3-carboxylic acid Chemical compound CC1=CNC=C1C(O)=O FXPOCCDGHHTZAO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001448 anilines Chemical class 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 2
- SZNYYWIUQFZLLT-UHFFFAOYSA-N 2-methyl-1-(2-methylpropoxy)propane Chemical compound CC(C)COCC(C)C SZNYYWIUQFZLLT-UHFFFAOYSA-N 0.000 description 2
- QENGPZGAWFQWCZ-UHFFFAOYSA-N 3-Methylthiophene Chemical compound CC=1C=CSC=1 QENGPZGAWFQWCZ-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N N-phenyl amine Natural products NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- CUFNKYGDVFVPHO-UHFFFAOYSA-N azulene Chemical compound C1=CC=CC2=CC=CC2=C1 CUFNKYGDVFVPHO-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- DOYOPBSXEIZLRE-UHFFFAOYSA-N pyrrole-3-carboxylic acid Chemical compound OC(=O)C=1C=CNC=1 DOYOPBSXEIZLRE-UHFFFAOYSA-N 0.000 description 2
- 150000003577 thiophenes Chemical class 0.000 description 2
- QCGCRYCJISUGQX-UHFFFAOYSA-N (4-methyl-1h-pyrrol-3-yl)methanamine Chemical compound CC1=CNC=C1CN QCGCRYCJISUGQX-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CRGPDAFGMYENEW-UHFFFAOYSA-N 1-(1h-pyrrol-3-yl)dodecan-1-one Chemical compound CCCCCCCCCCCC(=O)C=1C=CNC=1 CRGPDAFGMYENEW-UHFFFAOYSA-N 0.000 description 1
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 1
- QNIZTJWJJFGIDS-UHFFFAOYSA-N 3-benzylthiophene Chemical compound C=1C=CC=CC=1CC=1C=CSC=1 QNIZTJWJJFGIDS-UHFFFAOYSA-N 0.000 description 1
- XCMISAPCWHTVNG-UHFFFAOYSA-N 3-bromothiophene Chemical compound BrC=1C=CSC=1 XCMISAPCWHTVNG-UHFFFAOYSA-N 0.000 description 1
- JEDHEMYZURJGRQ-UHFFFAOYSA-N 3-hexylthiophene Chemical compound CCCCCCC=1C=CSC=1 JEDHEMYZURJGRQ-UHFFFAOYSA-N 0.000 description 1
- FEKWWZCCJDUWLY-UHFFFAOYSA-N 3-methyl-1h-pyrrole Chemical compound CC=1C=CNC=1 FEKWWZCCJDUWLY-UHFFFAOYSA-N 0.000 description 1
- WHBGQMUVLIUNQW-UHFFFAOYSA-N 3-methyl-4-phenylthiophene Chemical compound CC1=CSC=C1C1=CC=CC=C1 WHBGQMUVLIUNQW-UHFFFAOYSA-N 0.000 description 1
- LJDRAKFYYGCAQC-UHFFFAOYSA-N 3-phenyl-1h-pyrrole Chemical compound N1C=CC(C=2C=CC=CC=2)=C1 LJDRAKFYYGCAQC-UHFFFAOYSA-N 0.000 description 1
- ZDQZVKVIYAPRON-UHFFFAOYSA-N 3-phenylthiophene Chemical compound S1C=CC(C=2C=CC=CC=2)=C1 ZDQZVKVIYAPRON-UHFFFAOYSA-N 0.000 description 1
- IZAUZUSKFWENMY-UHFFFAOYSA-N 4-phenyl-1h-pyrrole-3-carboxylic acid Chemical compound OC(=O)C1=CNC=C1C1=CC=CC=C1 IZAUZUSKFWENMY-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- 229910016874 Fe(NO3) Inorganic materials 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 229910015221 MoCl5 Inorganic materials 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 238000001479 atomic absorption spectroscopy Methods 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- BZWSVDVWQNBWFB-UHFFFAOYSA-N benzyl 4-methyl-1h-pyrrole-3-carboxylate Chemical compound CC1=CNC=C1C(=O)OCC1=CC=CC=C1 BZWSVDVWQNBWFB-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- HOTRSVWEXSMQEG-UHFFFAOYSA-N dodecyl 4-methyl-1h-pyrrole-3-carboxylate Chemical compound CCCCCCCCCCCCOC(=O)C1=CNC=C1C HOTRSVWEXSMQEG-UHFFFAOYSA-N 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- WLBNVSIQCFHAQB-UHFFFAOYSA-N methyl 1h-pyrrole-3-carboxylate Chemical compound COC(=O)C=1C=CNC=1 WLBNVSIQCFHAQB-UHFFFAOYSA-N 0.000 description 1
- YLYNQUULCLJVSW-UHFFFAOYSA-N methyl 4-benzyl-1h-pyrrole-3-carboxylate Chemical compound COC(=O)C1=CNC=C1CC1=CC=CC=C1 YLYNQUULCLJVSW-UHFFFAOYSA-N 0.000 description 1
- CXMYWJRJTQUXQD-UHFFFAOYSA-N methyl 4-methyl-1h-pyrrole-3-carboxylate Chemical compound COC(=O)C1=CNC=C1C CXMYWJRJTQUXQD-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- GICWIDZXWJGTCI-UHFFFAOYSA-I molybdenum pentachloride Chemical compound Cl[Mo](Cl)(Cl)(Cl)Cl GICWIDZXWJGTCI-UHFFFAOYSA-I 0.000 description 1
- USKNBOCCKUXDPF-UHFFFAOYSA-N n',n',4-trimethyl-1h-pyrrole-3-carbohydrazide Chemical compound CN(C)NC(=O)C1=CNC=C1C USKNBOCCKUXDPF-UHFFFAOYSA-N 0.000 description 1
- 125000004971 nitroalkyl group Chemical group 0.000 description 1
- RKAJFLASFMLMPE-UHFFFAOYSA-N octadecyl 1h-pyrrole-3-carboxylate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C=1C=CNC=1 RKAJFLASFMLMPE-UHFFFAOYSA-N 0.000 description 1
- MXPWRYONIVPIAH-UHFFFAOYSA-N octadecyl 4-phenyl-1h-pyrrole-3-carboxylate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C1=CNC=C1C1=CC=CC=C1 MXPWRYONIVPIAH-UHFFFAOYSA-N 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- RHPRWMDBANPVGV-UHFFFAOYSA-N phenyl 4-methyl-1h-pyrrole-3-carboxylate Chemical compound CC1=CNC=C1C(=O)OC1=CC=CC=C1 RHPRWMDBANPVGV-UHFFFAOYSA-N 0.000 description 1
- 238000000710 polymer precipitation Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 150000005839 radical cations Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Non-Insulated Conductors (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、導電性高分子の化学的ドーピング方法に係り
、特に電磁波シールド材、静電防止材および他の電気化
学的デバイス用材料として好適な導電性高分子のドーピ
ング方法に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for chemically doping conductive polymers, and is particularly suitable as an electromagnetic shielding material, an antistatic material, and a material for other electrochemical devices. This invention relates to a method for doping conductive polymers.
ピロール類、チオフェン類等の重合体は、ドーピング処
理を行うことにより、導電性力10−”S/cI11程
度の絶縁体から10’S/cm程度の導電性を有する特
徴ある高分子である。このため、これらの導電性高分子
はその導電性及びドーピング機構を利用した巾広い応用
が可能で、多くの研究がなされている。Polymers such as pyrroles and thiophenes are characteristic polymers that have a conductivity ranging from an insulator with a conductivity of about 10'S/cI to about 10'S/cm by performing a doping treatment. Therefore, these conductive polymers can be used in a wide range of applications utilizing their conductivity and doping mechanism, and many studies have been conducted on them.
導電性高分子を得る方法として、(1)種々の電解質を
溶解した溶液中でモノマーを酸化的に電解し陽極上に重
合体を析出させる電解酸化重合方法が知られている。電
極に析出した重合体は、モノマーの酸化電位より低いた
め電極上で更に酸化され、ラジカルカチオンとなり、電
解質アニオンと塩を形成し、ドーピングされた(酸化状
態)導電体として得られる。これらはまた電解質アニオ
ンを変えた塩を用いることにより各種アニオンがドーピ
ングされた重合体を得ることができる。この様な方法で
導電性高分子の機能化がなされ、EC材料等への応用が
報告されている。As a method for obtaining conductive polymers, (1) an electrolytic oxidative polymerization method is known in which a monomer is oxidatively electrolyzed in a solution containing various electrolytes to deposit a polymer on an anode. Since the polymer deposited on the electrode has an oxidation potential lower than that of the monomer, it is further oxidized on the electrode, becomes a radical cation, forms a salt with the electrolyte anion, and is obtained as a doped (oxidized state) conductor. By using salts with different electrolyte anions, polymers doped with various anions can be obtained. Conductive polymers have been functionalized using such methods, and their application to EC materials and the like has been reported.
また−旦、Cl−1C夏04−1BFa−等の塩として
重合体を得て、電気化学的方法により他のアニオンへの
変換も可能である。Furthermore, it is also possible to obtain the polymer as a salt such as Cl-1Cnatsu04-1BFa- and convert it into other anions by electrochemical methods.
しかしながら上記した方法は電解セルを必要とした煩雑
性があり、また電着する電極の形状によって、制限され
た高分子形状となり高分子特有の形状制御が難かしい。However, the above method is complicated because it requires an electrolytic cell, and the shape of the polymer is limited depending on the shape of the electrode to be electrodeposited, making it difficult to control the shape unique to the polymer.
(2) 一方酸化剤を使用した化学的酸化方法により
、溶媒東もしくは無溶媒で重合させる方法もよく知られ
ている。この方法では使用した酸化剤またはその副生物
によりドーピングされ、一般に得られる重合体は導電性
を存する。前述した様な各種アニオンで変換することは
比較的困難である。(2) On the other hand, a chemical oxidation method using an oxidizing agent to polymerize in a solvent or without a solvent is also well known. In this method, the resulting polymer is doped with the oxidizing agent or its by-products and generally has electrical conductivity. It is relatively difficult to convert with various anions as mentioned above.
本発明は形状制御が容易な、高分子フィルムの化学的ド
ーピング方法を提供することがある。The present invention may provide a method for chemically doping polymeric films that is easy to control shape.
本発明者らは先に酸化剤、溶媒にピロール類、チオフェ
ン類、アニリン類に代表される芳香族性化合物を加え、
重合体の析出のみられない均一な混合溶液を単にキャス
トすることにより、導電性、膜強度の優れた高分子フィ
ルムの製造法を見い出した( PCT/JPNS100
764ン、これらの重合体フィルムを有機溶媒により洗
浄し、過剰の酸化剤、可溶な低重合物を除去することに
より、中性状a(脱ドープ状態)のフィルムとして得ら
れることを見い出した。さらにこの膜を各種アニオンを
対イオンとして有する塩の溶液中に浸すだけで容易にド
ーピングされ、導電性を存する高分子となることがわか
った。すなわち本発明は、芳香族性化合物、酸化剤、溶
媒を含有する均一安定な溶液を調整し、該溶液を碁打上
に旅こした後、溶媒を蒸発除去して導電性高分子フィル
ムを製造し、該高分子フィルムを溶媒により洗浄して中
性のフィルムとし、次いで塩の溶液中に浸漬することを
特徴とする高分子フィルムの化学的ドービ、ング方法で
ある。The present inventors first added aromatic compounds represented by pyrroles, thiophenes, and anilines to an oxidizing agent and a solvent,
We have discovered a method for producing a polymer film with excellent conductivity and film strength by simply casting a uniform mixed solution that does not show polymer precipitation (PCT/JPNS100
It has been found that by washing these polymer films with an organic solvent to remove excess oxidizing agents and soluble low polymers, a neutral a (undoped state) film can be obtained. Furthermore, it was found that simply by immersing this membrane in a salt solution containing various anions as counterions, it could be easily doped and become a conductive polymer. That is, the present invention prepares a homogeneous and stable solution containing an aromatic compound, an oxidizing agent, and a solvent, transfers the solution to a Go board, and then evaporates and removes the solvent to produce a conductive polymer film. , is a method for chemical doping of polymer films, which comprises washing the polymer film with a solvent to make it a neutral film, and then immersing it in a salt solution.
上記の導電性高分子フィルムの製造法(以下キャスト成
膜法という、)はすでにPCT/JP88100764
で出願した成膜法であって以下その要旨を説明する。The method for producing the above-mentioned conductive polymer film (hereinafter referred to as the cast film formation method) has already been published in PCT/JP88100764.
This film-forming method was applied for in 2011, and its gist will be explained below.
11液jと或」た
(+) 芳香族性化合物
(ピロール及びその誘導体)
ピロール、ピロールダイマー、3,3゛−ジメチル−2
,2′−ビピロール4.4′−ジカルボン酸ジステアリ
ル、3.3′−ジメチル−2゜2゛−ビピロール−4,
4”−ジカルボン酸ジヘキシル、4−メチルピロール−
3−カルボン酸、4−フェニルピロール−3−カルボン
酸、4−メチルピロール−3−カルボン酸メチル、4−
メチルビロール−3−カルボン酸エチル、4−n−プロ
ピルピロール−3−カルボン酸メチル、4−n−プロピ
ルビロール−3−カルボン酸エチル、ピロール−3−カ
ルボン酸メチル、3−メチルビロール、3−へキシルピ
ロール、ピロール−3−カルボン酸、4−メチルピロー
ル−73−カルボン酸ヘキシル、4−ベンジルピロール
−3−カルボン酸メチル、4−メチルビロール−3−カ
ルボン酸ドデシル、ピロール−3−カルボン酸ステアリ
ル、4−フェニルピロール−3−カルボン酸ステアリル
、3−フェニルピロール、3−アセトピロール、3−ウ
ンデシルカルボニルピロール、3−アミノメチル−4−
メチルビロール、3−アミツメデル−4−フェニルピロ
ール、3−アセトアミノメチル−4−フェニルピロール
、3−ペイシイルビロール、3−メチル−4−ジメチル
アミノカルバモイルピロール、3−メチル−4−ジメチ
ルアミノチルピロール、4−メチルピロール−3−カル
ボン酸フェニル、4−メチルビロール−3−カルボン酸
ベンジル、4−メチルピロール−3−カルボン酸(4−
フェニルアゾフェニル)、4−メチルピロール−3−カ
ルボン酸(16−ブロモ−2,3゜5.6,8,9,1
1.12−オクタヒドロ−1,4゜7、10.13−ベ
ンゾペンタオキサシクロペンタデシン−15−イル)メ
チル等。(+) Aromatic compounds (pyrrole and its derivatives) Pyrrole, pyrrole dimer, 3,3゛-dimethyl-2
, 2'-bipyrrole 4.4'-dicarboxylic acid distearyl, 3.3'-dimethyl-2゜2゛-bipyrrole-4,
4”-dihexyl dicarboxylate, 4-methylpyrrole-
3-carboxylic acid, 4-phenylpyrrole-3-carboxylic acid, methyl 4-methylpyrrole-3-carboxylate, 4-
Ethyl methyl pyrrole-3-carboxylate, methyl 4-n-propyl pyrrole-3-carboxylate, ethyl 4-n-propyl pyrrole-3-carboxylate, methyl pyrrole-3-carboxylate, 3-methyl pyrrole, 3- xylpyrrole, pyrrole-3-carboxylic acid, hexyl 4-methylpyrrole-73-carboxylate, methyl 4-benzylpyrrole-3-carboxylate, dodecyl 4-methylpyrrole-3-carboxylate, stearyl pyrrole-3-carboxylate, Stearyl 4-phenylpyrrole-3-carboxylate, 3-phenylpyrrole, 3-acetopyrrole, 3-undecylcarbonylpyrrole, 3-aminomethyl-4-
Methylpyrrole, 3-amizmedel-4-phenylpyrrole, 3-acetaminomethyl-4-phenylpyrrole, 3-peishylpyrrole, 3-methyl-4-dimethylaminocarbamoylpyrrole, 3-methyl-4-dimethylaminotylpyrrole , phenyl 4-methylpyrrole-3-carboxylate, benzyl 4-methylpyrrole-3-carboxylate, 4-methylpyrrole-3-carboxylic acid (4-
phenylazophenyl), 4-methylpyrrole-3-carboxylic acid (16-bromo-2,3°5.6,8,9,1
1.12-octahydro-1,4°7,10.13-benzopentaoxacyclopentadecin-15-yl)methyl, etc.
特に、ピロール−3−カルボン酸アルキル、4−メチル
ビロール−3−カルボン酸アルキル、4−ベンジルピロ
ール−3−カルボン酸アルキル等の、3または4位に−
COOR(式中、Rはアルキル基、ベンジル基またはフ
ェニル基を示す)基を有する3、4位非対称置換ピロー
ル誘導体が好ましい。In particular, - at the 3 or 4 position of alkyl pyrrole-3-carboxylate, alkyl 4-methylpyrrole-3-carboxylate, alkyl 4-benzylpyrrole-3-carboxylate, etc.
A 3- and 4-position asymmetrically substituted pyrrole derivative having a COOR group (wherein R represents an alkyl group, benzyl group, or phenyl group) is preferred.
(チオフェン、及びその誘導体)
チオフェン、3−メチルチオフェン、3.4−ジメチル
チオフェン、3−へキシルチオフェン、3−ステアリル
チオフェンなどのアルキルt IAチオフェン、3−ブ
ロモチオフェンなどのハロゲンz ?Aチオフェン、3
−メトキシジエトシメチルチオフェンなどのポリエーテ
ル置換アルキルチオフェン、
3−フェニルチオフェン、3−ベンジルチオフェン、3
−メチル−4−フェニルチオフェン、2,3゜−ビチオ
フェン、2.2゛−ビチオフエン、2.2′2゛。(Thiophene and derivatives thereof) Alkyl t such as thiophene, 3-methylthiophene, 3.4-dimethylthiophene, 3-hexylthiophene, and 3-stearylthiophene Halogen z such as IAthiophene and 3-bromothiophene? A thiophene, 3
-polyether-substituted alkylthiophene such as methoxydiethoshimethylthiophene, 3-phenylthiophene, 3-benzylthiophene, 3
-Methyl-4-phenylthiophene, 2,3゜-bithiophene, 2.2゛-bithiophene, 2.2'2゛.
−チルチオフェン等、特にC4以上のアルキルで置換さ
れたチオフェン類が好ましい。In particular, thiophenes substituted with C4 or higher alkyl, such as -thylthiophene, are preferred.
(芳香族アミン及びその誘導体)
アニリン、N−モノ置換アニリン(置換基としてはアル
キル、フェニル、p−アミノフェニル、N−モノアルキ
ルアミノフェニル、N−モノフェニルアミノフェニル、
N−モノフェニルアミノジフェニル等)、置換アニリン
〔置換基としては〇−アミノ、m−アミノ、p−(p−
アミノフェノキシ)、p−(p−アミノフェニル)等〕
、ナフチルアミン、ペリレン等の多核縮合芳香族アミン
類等であり、これらの芳香族アミン類は、ベンゼン環上
に置換基を有していてもよい、特に無置換アニリンが好
ましい。(Aromatic amines and derivatives thereof) Aniline, N-monosubstituted aniline (substituents include alkyl, phenyl, p-aminophenyl, N-monoalkylaminophenyl, N-monophenylaminophenyl,
N-monophenylamino diphenyl, etc.), substituted aniline [substituents include 〇-amino, m-amino, p-(p-
aminophenoxy), p-(p-aminophenyl), etc.]
, naphthylamine, perylene, and the like, and these aromatic amines may have a substituent on the benzene ring, and unsubstituted aniline is particularly preferred.
(その他)
ベンセン、ジフェニル、ナフタレン、アントラセン、ア
ズレン、カルバゾール、ベンゾチオフェン等であり、こ
れらは置換基を存していてもよい。(Others) These include benzene, diphenyl, naphthalene, anthracene, azulene, carbazole, benzothiophene, etc., and these may have a substituent.
上記芳香族性化合物は同種又は異種の混合物として用い
ることもできる。The above aromatic compounds can also be used as a mixture of the same or different types.
(2)酸化剤
FeC11、CuCIt、Fe(NO3)3.5bC1
,、MoCl5等又はこれらの水和物あるいはこれらの
混合物、特にpec+*、FeCl5.6H20、Fe
(NOs)i ・9H!0が好ましい。使用量は、上記
芳香族性化合物1モルに対して1〜10モル使用するの
が好ましく、特に1〜4モルがよい。(2) Oxidizing agent FeC11, CuCIt, Fe(NO3)3.5bC1
,, MoCl5 etc. or their hydrates or mixtures thereof, especially pec++, FeCl5.6H20, Fe
(NOs)i ・9H! 0 is preferred. The amount used is preferably 1 to 10 mol, particularly 1 to 4 mol, per 1 mol of the aromatic compound.
(3) 溶媒
ジエチルエーテル、ジイソブチルエーテル、ジー n−
7’チルエーテル、ジイソプロピルエーテル、ジメトキ
シエタン等の脂肪族エーテル類、THF、ジオキサン等
の環式エーテル類、メタノール、エタノール、イソプロ
ピルアルコール等のアルコールR1塩化メチレン、クロ
ロホルム等のハロゲン化炭化水素、ベンゼン、トルエン
、キシレン等の芳香族炭化水素、ヘキサン、ヘプタン等
の脂肪族炭化水素、シクロヘキサン等の脂環族炭化水素
、酢酸エチル、酢酸ブチル等のエステル類、アセトン、
メチルエチルケトン、メチルイソブチルケトン、シクロ
ヘキサノン等の脂肪族、脂環族ケトン類、ニトロメタン
等のニトロアルカン類等あるいはこれらの混合溶媒、特
に、ジエチルエーテル、メタノール、THFなど、およ
びそれらの混合溶媒が好ましい、使用量は、酸化剤が溶
解して均一溶液となるに必要な量からその50倍容量が
好ましく、とりわけ、10〜30倍容量がよい。(3) Solvent diethyl ether, diisobutyl ether, di-n-
7' Aliphatic ethers such as thyl ether, diisopropyl ether and dimethoxyethane, cyclic ethers such as THF and dioxane, alcohols such as methanol, ethanol and isopropyl alcohol R1 Halogenated hydrocarbons such as methylene chloride and chloroform, benzene and toluene , aromatic hydrocarbons such as xylene, aliphatic hydrocarbons such as hexane and heptane, alicyclic hydrocarbons such as cyclohexane, esters such as ethyl acetate and butyl acetate, acetone,
Aliphatic and alicyclic ketones such as methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone, nitroalkanes such as nitromethane, etc., or mixed solvents thereof, particularly diethyl ether, methanol, THF, etc., and mixed solvents thereof are preferably used. The amount is preferably 50 times the amount required to dissolve the oxidizing agent to form a homogeneous solution, and particularly preferably 10 to 30 times the amount.
基並立1且
本発明で前記高分子物質の前駆体溶液を施す基材の具体
例を挙げる。ガラス板、金属板、ポリマーフィルム、セ
ラミック板、導電性フィルムで被覆したガラス板、繊維
、祇、棒、パイプ等、これらの基材表面には、予めシラ
ンカフプリング剤などを用いて下地処理を施こしても良
い。Specific examples of the base material to which the precursor solution of the polymeric substance is applied in the present invention will be given below. Surfaces of glass plates, metal plates, polymer films, ceramic plates, glass plates coated with conductive films, fibers, wires, rods, pipes, etc. should be pretreated with a silane cuff pulling agent. You can also administer it.
噴 の への
前記前駆体溶液の前記基材への施用方法として、キャス
ティング法、浸漬法、スプレー法、超音波霧化法、スピ
ンコーティング法等が採用される。As a method for applying the precursor solution to the substrate by spraying, a casting method, a dipping method, a spray method, an ultrasonic atomization method, a spin coating method, etc. are employed.
六 の芸 、
溶媒の除去方法として、溶液を施こした基材を熱風乾燥
器、減圧恒温乾燥器などを用いて約0〜約200°C1
好ましくは室温〜100°Cに保持する方法が採用され
る。また防塵フード中で溶液を施こした基材をホットプ
レートに乗せて加熱する方法、赤外線ランプを用いて加
熱する方法等を使用することもできる。Six tricks: As a method for removing the solvent, the base material coated with the solution is heated to about 0 to about 200°C using a hot air dryer, a vacuum constant temperature dryer, etc.
Preferably, a method of maintaining the temperature between room temperature and 100°C is employed. Further, it is also possible to use a method of heating the substrate coated with the solution on a hot plate in a dust-proof hood, a method of heating using an infrared lamp, and the like.
本発明において導電性高分子フィルムを洗浄する溶媒は
、メタノール、メタノールとTHFの混合溶媒などが好
ましい。In the present invention, the solvent for cleaning the conductive polymer film is preferably methanol, a mixed solvent of methanol and THF, or the like.
本発明では洗浄して得られるぼり導電率10−”S/C
I程度の中性のフィルムを各種アニオンを対イオンとし
て有する塩の溶液中に浸漬して、ドーピングすることが
できる。In the present invention, the conductivity of the stream obtained by cleaning is 10-”S/C
A neutral film of about I can be doped by immersing it in a salt solution having various anions as counterions.
塩の種類としてはFeC11,5nCIa等のルイス酸
、トリクロル酢酸、トリフルオロ酢酸、メタンスルホン
酸、ベンゼンスルホン酸、P−)ルエンスルホン酸、塩
酸、硫酸、IC104等の強酸類が挙げられる。Examples of the salt include Lewis acids such as FeC11,5nCIa, strong acids such as trichloroacetic acid, trifluoroacetic acid, methanesulfonic acid, benzenesulfonic acid, P-)luenesulfonic acid, hydrochloric acid, sulfuric acid, and IC104.
次に実施例を挙げて、本発明を更に詳細に説明するが、
これにより本発明は何ら制限を受けるものではない。Next, the present invention will be explained in more detail with reference to Examples.
This does not limit the present invention in any way.
実施例1
ルボン酸ベンジル)0.215g
(1,0X10−mol)を、FeCl5 0.487
g (3,OX10−’so夏)と乾燥エーテル10
#j!の溶液を加え、ドライボックス中ガラス板上にキ
ャストし、乾燥空気を流通させながらエーテルを飛+1
tさせ、黒色の重合物を得た。Example 1 0.215 g (1,0×10-mol) of benzyl rubonate was added to 0.487 g of FeCl5
g (3,OX10-'so summer) and dry ether 10
#j! Add a solution of
A black polymer was obtained.
土企先基
黒色の重合物(ガラス板上)をビーカーに入れ、100
dの有機溶媒を加え、スターラーにより攪拌した。直ち
に黄褐色の溶液となったので、デカンテーションし、同
一の純溶媒を100ae加え撹拌した。この操作を4〜
5くり返すと、溶液はもはや着色しなくなり終点とした
。乾燥後書後により原子吸光法によりFe含有量を調べ
た。結果を第1表に示した。Put the black polymer (on the glass plate) into a beaker and add 100
The organic solvent of d was added and stirred with a stirrer. Since it immediately became a yellowish brown solution, it was decanted, and 100 ae of the same pure solvent was added and stirred. Repeat this operation from 4 to
After 5 repetitions, the solution was no longer colored and was considered the end point. After drying, the Fe content was determined by atomic absorption spectrometry. The results are shown in Table 1.
第1表
メタノール、メタノール/THFが良好な洗浄効果を示
すことが分った。又フィルムの色から10−’S/cm
程度の中性状態にあることも分った。It was found that methanol and methanol/THF in Table 1 showed good cleaning effects. Also, 10-'S/cm from the color of the film
It was also found that it was in a somewhat neutral state.
重合したフィルムは、基板から剥離し、メタノールで十
分に洗浄した。乾燥後フィルムの導電率及びFe含有率
を測定した結果、導電率10−”S/cm程度でフィル
ム中のFe含有率は0.1%以下(原子吸光法)であっ
た。The polymerized film was peeled off from the substrate and thoroughly washed with methanol. After drying, the electrical conductivity and Fe content of the film were measured, and the electrical conductivity was about 10-''S/cm, and the Fe content in the film was 0.1% or less (by atomic absorption method).
この洗浄したフィルムはFeC1520mg/エーテル
10d、5nCIs Ig/ニトロメタン10dの溶液
に室温(25°C)、5時間浸漬し、それぞれの純溶媒
で洗浄しデシケータ−中−昼夜乾燥後直ちに4端子法に
より導電性を測定した。結果を第2表に示した。The washed film was immersed in a solution of 1520 mg of FeC/10 d of ether and 10 d of 5 nCIs Ig/nitromethane at room temperature (25°C) for 5 hours, washed with each pure solvent, dried in a desiccator day and night, and immediately conductive using the four-terminal method. The sex was measured. The results are shown in Table 2.
第2表
〔発明の効果〕
本発明のキャスト成膜法で得られた高分子フィルムは、
溶媒で洗浄することによりはV 10−’ S /1程
度の中性フィルムとして得られる。この中性フィルムを
各種アニオンの塩の溶液中に浸漬するだけで簡単に化学
的ドーピングができる。Table 2 [Effects of the invention] The polymer film obtained by the cast film forming method of the present invention is as follows:
By washing with a solvent, a neutral film of about V 10-' S /1 can be obtained. Chemical doping can be easily performed by simply immersing this neutral film in a solution of various anion salts.
各種アニオン種について、光感応性、電気的感応性等を
有する機能性基を選定すると機能を有した導電性高分子
を容易に得ることができる。For various anion species, if a functional group having photosensitivity, electrical sensitivity, etc. is selected, a functional conductive polymer can be easily obtained.
Claims (1)
溶液を調整し、該溶液を基材上に施こした後、溶媒を蒸
発除去して導電性高分子フィルムを製造し、該高分子フ
ィルムを溶媒により洗浄して中性のフィルムとし、次い
で塩の溶液中に浸漬することを特徴とする高分子フィル
ムの化学的ドーピング方法A homogeneous and stable solution containing an aromatic compound, an oxidizing agent, and a solvent is prepared, and the solution is applied onto a substrate.The solvent is then evaporated off to produce a conductive polymer film. A method for chemical doping of polymeric films, characterized by washing the film with a solvent to make it a neutral film, and then immersing it in a salt solution.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22979188A JPH0279499A (en) | 1988-09-16 | 1988-09-16 | Chemical doping method for high molecular film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22979188A JPH0279499A (en) | 1988-09-16 | 1988-09-16 | Chemical doping method for high molecular film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0279499A true JPH0279499A (en) | 1990-03-20 |
Family
ID=16897729
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22979188A Pending JPH0279499A (en) | 1988-09-16 | 1988-09-16 | Chemical doping method for high molecular film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0279499A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011508954A (en) * | 2008-01-04 | 2011-03-17 | オルメコン・ゲーエムベーハー | Method for producing coating film showing high conductivity based on polythiophene and its derivatives |
-
1988
- 1988-09-16 JP JP22979188A patent/JPH0279499A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011508954A (en) * | 2008-01-04 | 2011-03-17 | オルメコン・ゲーエムベーハー | Method for producing coating film showing high conductivity based on polythiophene and its derivatives |
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